JP2007025597A - Method for manufacturing color filter, color filter, and display apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a color filter by which a pattern can be formed with high definition, particularly, a black image with extremely little variance in line width can be efficiently formed by forming a desired imaging pattern on an exposure face of a photosensitive layer while suppressing production of jaggy without decreasing an exposure speed. <P>SOLUTION: The method for manufacturing a color filter includes imaging for exposure by tilting a light modulating means, wherein at least one of the arrangement pitch (a), tilt angle (b), imaging pitch (c) and phase difference (d) of drawn pixels is determined so that at least either the jaggy pitch or jaggy amplitude of jaggy produced when an image is reproduced by drawn pixels formed by imaging units is controlled to a specified value or less, and the imaging unit is controlled by modulation at a predetermined timing based on pattern information. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a manufacturing method of a color filter suitable for a liquid crystal display device (LCD) such as a portable terminal, a portable game machine, a notebook computer, a television monitor, a PALC (plasma address liquid crystal), a plasma display, and the like, and the manufacturing method. The present invention relates to a manufactured color filter and a display device using the color filter.

The color filter is an indispensable component for a liquid crystal display (hereinafter also referred to as “LCD” or “liquid crystal display device”). This liquid crystal display is very compact, is equivalent to or better than conventional CRT displays in terms of performance, and is replacing the CRT displays.
In the formation of the color pixels of the liquid crystal display, the light passing through the color filter is colored as it is into the colors of the pixels constituting the color filter, and the light of those colors is synthesized to form a color pixel. At present, a color pixel is formed by pixels of three colors of RGB.

In recent years, the development of technology for increasing the screen size and definition of liquid crystal displays (LCDs) has progressed, and the applications are from laptop computer displays to desktop personal computer monitors, and even television monitors (hereinafter sometimes referred to as “TV”). ). Against this background, LCDs are strongly required to reduce costs and improve display characteristics.
As the direction of cost reduction, not only the cost reduction of materials but also the simplification of the process is underway. In particular, the elimination of a photomask for exposure is being studied.
On the other hand, as a direction for improving display characteristics, high definition and the like in which the number of pixels per inch is increased are being studied.
In particular, since the black matrix formed so as to define the pixels of the three colors of RGB regulates the apparent pixel width, the variation in the line width of the black matrix is caused by moiré and It tends to cause display unevenness such as periodic unevenness. Therefore, there is a need for a method that can form a fine pattern of a black image forming a black matrix with high definition.

As a method for forming such a color filter, a photolithography method is generally known in which a fine pattern is formed by exposing and developing a photosensitive composition.
As an exposure apparatus for performing the photolithography method, without using a photomask, a laser beam such as a semiconductor laser or a gas laser is directly scanned on the photosensitive composition based on digital data such as a pixel pattern to perform patterning. An exposure apparatus using a laser direct imaging system (hereinafter sometimes referred to as “LDI”) is being studied (see, for example, Non-Patent Document 1 and Patent Document 1).

Conventionally, as a light modulation means, a spatial light modulation element such as a digital micromirror device (DMD) is used to form a drawing pattern (image) with a light beam modulated in accordance with pattern information (image data). Various exposure apparatuses for performing exposure have been proposed.
The DMD is a mirror device in which a number of micromirrors that change the angle of the reflecting surface in accordance with a control signal are two-dimensionally arranged on a semiconductor substrate such as silicon, and an exposure head equipped with this DMD is placed on an exposed surface. By performing relative movement in the scanning direction along the line, exposure to a desired range is performed.

  In general, the DMD micromirrors are arranged so that the arrangement direction of each row and the arrangement direction of each column are orthogonal to each other. By arranging such a DMD so as to be inclined with respect to the scanning direction, the interval between the scanning lines becomes close and the resolution can be increased.

For example, in Patent Document 2, in an illumination system that guides light to a sub-region (spatial light modulation element: image source) having a plurality of light valves, the sub-region is inclined with respect to the projection on the scanning line. Describes that the resolution can be increased.
According to this method, the resolution in the direction orthogonal to the scanning direction can be increased. Further, since the resolution in the scanning direction is usually determined by the scanning speed and the modulation speed of the spatial light modulation element, the exposure speed (scanning speed) is decreased or the modulation speed of the spatial light modulation element is increased. It is possible to increase the resolution.

By the way, in order to increase the resolution of the formed drawing pattern, when drawing is performed with the light irradiation means (spatial light modulation element) tilted as in the method of Patent Document 1, some drawing patterns cannot be ignored. There is a risk of jaggy.
For example, when forming a linear drawing pattern extending in the scanning direction or a direction orthogonal to the scanning direction, the position between each drawing pixel formed by the spatial light modulator and a desired drawing position of the drawing pattern Misalignment may be recognized as jaggy.
That is, a drawing pattern constituted by a set of a large number of discrete pixels is reproduced by discrete drawing pixels corresponding to the pixel part, and therefore, jagged jaggy is formed at the edge of the reproduced image. There is a risk that such a problem may occur that the line width of the drawing pattern based on the pattern information is reduced. When a pixel pattern or the like is formed by exposing the photosensitive layer with such a drawing pattern and then performing development or the like, there is a problem that a high-definition pixel pattern cannot be obtained.

  Therefore, by forming a desired drawing pattern with reduced jaggies on the exposed surface without reducing the exposure speed, the pixel pattern (color pixel and black image) of the color filter is formed with high definition, particularly black. A manufacturing method of a color filter that can be formed efficiently with very little variation in the line width of an image has not yet been provided, and the present situation is that further improvement and development are desired.

JP 2004-1244 A Special table 2001-500628 gazette Akihito Ishikawa “Development shortening and mass production application by maskless exposure”, “Electronics packaging technology”, Technical Research Committee, Vol. 18, no. 6, 2002, p. 74-79

  This invention is made | formed in view of this present condition, and makes it a subject to solve the said various problems in the past and to achieve the following objectives. That is, according to the present invention, in the color filter manufacturing method in which the light modulation means is tilted for exposure, the desired drawing in which the occurrence of jaggies is suppressed on the exposed surface of the photosensitive layer without reducing the exposure speed. A method of manufacturing a color filter that can form a pixel pattern (color pixel and black image) of a color filter with high definition, in particular, an extremely small line width variation of the black image, and can be formed efficiently by forming the pattern, and Manufactured by a color filter manufacturing method, excellent in display characteristics, and suitable for use in liquid crystal display devices (LCD) such as portable terminals, portable game machines, notebook computers, TV monitors, PALC (plasma address liquid crystal), plasma displays, etc. And a display device using the color filter. That.

Means for solving the problems are as follows. That is,
<1> A photosensitive composition comprising a binder, a polymerizable compound, a colorant, and a photopolymerization initiator, and for the photosensitive layer located on the surface of the substrate,
A light irradiating means, and n (where n is a natural number of 2 or more) two-dimensionally arranged picture elements that receive and emit light from the light irradiating means, and according to the pattern information, An exposure head provided with a light modulation means capable of controlling a picture element portion, wherein the exposure head is arranged such that a column direction of the picture element portion forms a predetermined inclination angle with respect to a scanning direction of the exposure head. And performing exposure by moving the exposure head relative to the scanning direction,
In the drawing pattern corresponding to the pattern information, at least one of jaggy jaggy pitch and jaggy amplitude generated by the exposure being reproduced by the drawing pixels formed by the picture element portion is equal to or less than a predetermined value.
(A) an arrangement pitch of the drawing pixels formed by the adjacent picture element portions;
(B) an inclination angle of the two-dimensional drawing pixel group composed of a plurality of the drawing pixels with respect to the scanning direction;
(C) a drawing pitch of the drawing pixels with respect to the scanning direction, and (d) a phase difference of a drawing position with respect to the scanning direction of the drawing pixels formed adjacent to a direction substantially orthogonal to the scanning direction,
An exposure step performed by performing modulation control on the picture element portion at a predetermined timing based on the pattern information,
And a development step of developing the photosensitive layer exposed in the exposure step. In the method for producing a color filter according to <1>, an exposure head provided with a light modulation unit is moved relative to the photosensitive layer in a predetermined scanning direction along the exposed surface of the photosensitive layer. The exposure is performed based on the pattern information, and (a) the arrangement pitch, (b) the tilt angle, and (c) the drawing pitch so that at least one of the jaggy pitch and the jaggy amplitude is equal to or less than a predetermined value. And (d) by setting at least one of the phase differences and performing modulation control on each pixel part at a predetermined timing in accordance with the pattern information, increasing the number of drawing pixels per unit area, etc. It is possible to set optimal drawing conditions and draw a drawing pattern (image) that suppresses the occurrence of jaggies without taking measures and without reducing the exposure speed (drawing speed). That. As a result, the photosensitive layer is exposed with high definition, and then the photosensitive layer is developed to form a high-definition pattern.
<2> The method for producing a color filter according to <1>, wherein the light modulation unit is a spatial light modulation element.
<3> The method for producing a color filter according to any one of <1> to <2>, wherein the spatial light modulation element is a digital micromirror device (DMD).

<4> The exposure is performed using an exposure apparatus including at least one of a drawing pixel group rotating unit, a drawing magnification changing unit, a drawing timing changing unit, a moving speed changing unit, and a phase difference changing unit. To <3>. The method for producing a color filter according to any one of the above.
<5> The color filter according to any one of <1> to <4>, wherein either the entire exposure head or the light modulation unit is rotated by the drawing pixel group rotating unit to change the tilt angle (b). It is a manufacturing method.
<6> The drawing magnification changing means changes the drawing magnification of the drawing pixels formed on the exposed surface of the photosensitive layer, and adjusts either the arrangement pitch (a) or the drawing pitch (c). > To <4>. The method for producing a color filter according to any one of <4>.
<7> The timing according to any one of <1> to <4>, wherein the drawing timing changing unit changes the drawing timing of the photosensitive layer on the exposed surface of the photosensitive layer and adjusts the drawing pitch (c). It is a manufacturing method of a color filter.
<8> The color filter according to any one of <1> to <4>, wherein the moving speed changing unit changes a relative moving speed of the exposure head with respect to the exposed surface of the photosensitive layer to adjust a drawing pitch (c). It is a manufacturing method.
<9> The color filter according to any one of <1> to <4>, wherein the phase difference changing unit changes the phase difference of the modulation control timing of adjacent pixel parts to change the phase difference (d). It is a manufacturing method.

<10> The method for producing a color filter according to any one of <1> to <9>, wherein the predetermined values of the jaggy pitch and the jaggy amplitude are a dot diameter of a drawing pixel formed on the exposed surface of the photosensitive layer. is there.
<11> A plurality of drawing pixel groups each including a plurality of picture element portions, and in each of the picture element portion groups, an arrangement pitch (a), an inclination angle (b), a drawing pitch (c), and a phase difference (d) The method for producing a color filter according to any one of <1> to <10>, wherein at least one of the above is individually set.
<12> An arrangement pitch (a) having a plurality of drawing pixel groups each including a plurality of pixel parts, and an average value of jaggy pitches and jaggy amplitudes generated in each of the pixel parts groups being equal to or less than a predetermined value. The method for producing a color filter according to any one of <1> to <10>, wherein at least one of tilt angle (b), drawing pitch (c), and phase difference (d) is set.
<13> Arrangement pitch (a), inclination angle (b), and drawing so that any one of jaggy pitch and jaggy amplitude generated in a drawing pattern orthogonal or substantially orthogonal to the scanning direction is equal to or less than a predetermined value. The method for producing a color filter according to any one of <1> to <12>, wherein at least one of pitch (c) and phase difference (d) is set.
<14> Any one of <1> to <13> in which at least one of the arrangement pitch (a), the inclination angle (b), the drawing pitch (c), and the phase difference (d) is set according to the drawing pattern A method for producing a color filter according to claim 1.
<15> The at least one of the arrangement pitch (a), the inclination angle (b), the drawing pitch (c), and the phase difference (d) is set according to the inclination angle of the drawing pattern with respect to the scanning direction <1>. To <14>. The method for producing a color filter according to any one of <14>.

<16> Adjustment of arrangement pitch (a), inclination angle (b), drawing pitch (c), and phase difference (d)
(E) the pitch of the control point sequence along the substantially scanning direction of the control point, the control point defined as the center point of the drawing pixel formed on the exposed surface of the photosensitive layer by the picture element unit,
(F) the arrangement direction of the control point sequence;
(G) a pitch of the control points with respect to the scanning direction, and (h) a phase difference of the control points adjacent to the direction substantially orthogonal to the scanning direction with respect to the scanning direction,
The method for producing a color filter according to any one of <1> to <15>, wherein at least one of the above is performed by controlling so as to reduce jaggy of a drawing pattern.
<17> At least one of the pitch (e), the arrangement direction (f) of the control point sequence, the pitch (g) of the control point with respect to the scanning direction, and the phase difference (h), and at least one of the jaggy pitch and the jaggy amplitude Find the correlation with the shape of the jaggy defined by
The method for producing a color filter according to any one of <1> to <16>, wherein any one of (e) to (h) is set or changed based on the correlation.
<18> At least one of the pitch (e) of the control point sequence in which the jaggy shape falls within the allowable range, the arrangement direction (f), the pitch (g) of the control point with respect to the scanning direction, and the phase difference (h) The method for producing a color filter according to any one of <1> to <17>, wherein the conditions are defined as selection conditions.
<19> At least one of the pitch (e) of the control point sequence where the jaggy shape is outside the allowable range, the arrangement direction (f), the pitch (g) of the control point with respect to the scanning direction, and the phase difference (h) The method for manufacturing a color filter according to any one of <1> to <18>, wherein the condition is defined as a prohibited condition.
<20> Corresponding to the direction of the drawing pattern, at least one of the pitch (e) of the control point sequence, the arrangement direction (f), the pitch (g) of the control points with respect to the scanning direction, and the phase difference (h) The method for producing a color filter according to any one of <1> to <19>, wherein a correlation with a jaggy shape defined by at least one of a jaggy pitch and a jaggy amplitude is obtained.
<21> The method for producing a color filter according to any one of <1> to <20>, wherein the direction of the drawing pattern is a representative direction of the drawing pattern included in a predetermined region of the drawing pattern. is there.
<22> The color filter according to any one of <1> to <21>, wherein a representative direction of the drawing pattern is included in a predetermined region of the drawing pattern and is a direction orthogonal or substantially orthogonal to the scanning direction. It is a manufacturing method.
<23> For each drawing pattern in a predetermined area, at least one of the pitch (e) of the control point sequence, the arrangement direction (f), the pitch (g) of the control points with respect to the scanning direction, and the phase difference (h) The method for producing a color filter according to any one of <1> to <22>, wherein a correlation between the shape and the shape of the jaggy defined by at least one of the jaggy pitch and the jaggy amplitude is obtained.
<24> For each drawing pattern in a predetermined region, at least one of the pitch (e) of the control point sequence, the arrangement direction (f), the pitch (g) of the control points with respect to the scanning direction, and the phase difference (h) It is a manufacturing method of the color filter in any one of said <1> to <23> which sets or changes these.

<25> At least one of the pitch (e), the arrangement direction (f) of the control point sequence, the pitch (g) of the control point with respect to the scanning direction, and the phase difference (h), and at least one of the jaggy pitch and the jaggy amplitude Correlation with the shape of jaggy defined by
<16 obtained based on a calculated value obtained from at least one of the pitch (e) of the control point sequence, the arrangement direction (f), the pitch (g) of the control point with respect to the scanning direction, and the phase difference (h). > To <24>. The method for producing a color filter according to any one of <24>.
<26> The pitch of the control point sequence from the preset pattern (e) of the control point sequence, the arrangement direction (f), the pitch of the control point with respect to the scanning direction (g), and the drawing pattern based on the phase difference (h). (E) Jagged shape defined by at least one of the arrangement direction (f), the pitch (g) of the control points with respect to the scanning direction, and the phase difference (h), and at least one of the jaggy pitch and the jaggy amplitude. The method for producing a color filter according to any one of <16> to <25>, wherein the correlation is obtained by measuring a correlation with the color filter.

<27> The method for producing a color filter according to any one of <1> to <26>, wherein the light irradiation unit emits laser light emitted from the semiconductor laser element.
<28> The method for producing a color filter according to any one of <1> to <27>, wherein the light irradiation unit can synthesize and irradiate two or more lights.

<29> The method for producing a color filter according to any one of <1> to <28>, wherein the photosensitive layer is formed by applying a photosensitive composition to a surface of a substrate and drying.
<30> Using a photosensitive transfer material having a photosensitive transfer layer made of a photosensitive composition on a support, the photosensitive layer is placed on the substrate so that the photosensitive transfer layer and the substrate are in contact with each other. The method for producing a color filter according to any one of <1> to <29>, wherein the color filter is formed by laminating and then peeling off the support.
<31> The method for producing a color filter according to any one of <1> to <30>, wherein the photosensitive composition is colored at least black (K).
<32> Using a photosensitive composition colored in at least the three primary colors of red (R), green (G), and blue (B), R, G, and B in a predetermined arrangement on the surface of the substrate The method for producing a color filter according to any one of <1> to <31>, wherein a color filter is formed by sequentially repeating the photosensitive layer forming step, the exposure step, and the developing step for each of the colors.
<33> At least pigment C.I. I. Pigment Red 254 is colored green (G) with pigment C.I. I. Pigment green 36 and pigment C.I. I. Pigment Yellow 139 and at least a pigment C.I. I. The method for producing a color filter according to any one of <1> to <32>, wherein Pigment Blue 15: 6 is used.
<34> Pigment C.I. I. Pigment red 254 and pigment C.I. I. Pigment Red 177 at least one pigment is changed to a green (G) coloring pigment C.I. I. Pigment green 36 and pigment C.I. I. Pigment Yellow 150 and at least blue (B) pigment C.I. I. Pigment blue 15: 6 and pigment C.I. I. The method for producing a color filter according to any one of <1> to <32>, wherein at least one pigment of pigment violet 23 is used.

<35> A color filter manufactured by the method for manufacturing a color filter according to any one of <1> to <34>.
<36> A display device using the color filter according to <35>.

  According to the present invention, a conventional problem can be solved, and in the method for manufacturing a color filter in which the light modulation unit is tilted for exposure, jaggies are formed on the exposed surface of the photosensitive layer without reducing the exposure speed. By forming a desired drawing pattern in which the occurrence of color is suppressed, the color filter pattern (color pixel and black image) can be formed with high definition, particularly with very little variation in the line width of the black image and with high efficiency. Manufacturing method of color filter and manufacturing method of the color filter, excellent display characteristics, for liquid crystal display devices (LCD) such as portable terminals, portable game machines, notebook computers, TV monitors, PALC (plasma address liquid crystal) , Color filters suitably used for plasma displays, etc., and use of the color filters The display device can be provided.

(Color filter manufacturing method)
The method for producing a color filter of the present invention includes at least an exposure step and a development step, and further includes other steps appropriately selected as necessary.
The color filter of the present invention is manufactured by the method for manufacturing the color filter of the present invention.
The display device of the present invention uses the color filter of the present invention, and further includes other means as necessary.
Hereinafter, the details of the color filter and display device of the present invention will be clarified through the description of the method of manufacturing the color filter of the present invention.

  The photosensitive layer is composed of the photosensitive composition containing a binder, a polymerizable compound, a colorant, and a photopolymerization initiator, and is not particularly limited as long as it is located on the surface of the substrate, and is appropriately selected according to the purpose. For example, it is formed on the surface of a substrate using a photosensitive composition containing a binder, a polymerizable compound, a colorant, and a photopolymerization initiator. Further, other layers appropriately selected as necessary are formed.

  The method for forming the photosensitive layer is not particularly limited and may be appropriately selected depending on the intended purpose. For example, the photosensitive layer may be formed by coating, or the sheet-like photosensitive layer may be pressurized or heated. The method of forming by laminating, combined use thereof, and the like are mentioned, and the photosensitive layer forming method of the first aspect and the photosensitive layer forming method of the second aspect shown below are preferable.

  As the photosensitive layer forming method of the first aspect, at least a photosensitive layer is formed on the surface of the base material by applying the photosensitive composition to the surface of the base material and drying, and further appropriately selected. The method of forming the other layer is mentioned.

  As a photosensitive layer forming method of the second aspect, a photosensitive transfer material having a photosensitive transfer layer (hereinafter sometimes simply referred to as “photosensitive layer”) made of a photosensitive composition on the support is used. The photosensitive transfer layer (photosensitive layer) is laminated on the surface of the substrate under at least one of heating and pressurization so that the photosensitive transfer layer (photosensitive layer) and the substrate are in contact with each other. The method of forming at least the photosensitive layer on the surface of the substrate and further forming other layers appropriately selected can be mentioned.

  In the photosensitive layer forming method of the first aspect, the method for applying and drying the photosensitive composition is not particularly limited and can be appropriately selected according to the purpose. For example, on the surface of the substrate, Examples include a method in which the photosensitive composition is dissolved, emulsified or dispersed in water or a solvent to prepare a photosensitive composition solution, and the solution is directly applied and dried for lamination.

  There is no restriction | limiting in particular as a solvent of the said photosensitive composition solution, According to the objective, it can select suitably.

The coating method is not particularly limited and can be appropriately selected depending on the purpose. For example, using a spin coater, a slit spin coater, a roll coater, a die coater, a curtain coater, etc. The method of apply | coating is mentioned. In this invention, it is preferable to carry out by the coating device (slit coater) using the slit-shaped nozzle which has a slit-shaped hole in the part which discharges a liquid. Specifically, JP-A-2004-89851, JP-A-2004-17043, JP-A-2003-170098, JP-A-2003-164787, JP-A-2003-10767, JP-A-2002-79163. Slit nozzles and slit coaters described in Japanese Patent Laid-Open No. 2001-310147 and the like are preferably used.
The drying conditions vary depending on each component, the type of solvent, the use ratio, and the like, but are usually about 60 to 110 ° C. for about 30 seconds to 15 minutes.

  There is no restriction | limiting in particular as thickness of the said photosensitive layer, According to the objective, it can select suitably, 0.5-10 micrometers is preferable, 0.75-6 micrometers is more preferable, and 1-3 micrometers is especially preferable.

Other layers formed in the photosensitive layer forming method of the first aspect are not particularly limited and may be appropriately selected depending on the purpose. For example, an oxygen blocking layer, a release layer, an adhesive layer, a light absorbing layer And a surface protective layer.
There is no restriction | limiting in particular as a formation method of the said other layer, According to the objective, it can select suitably, For example, the method of apply | coating on the said photosensitive layer, The method of laminating | stacking the other layer formed in the sheet form Etc.

In the method for forming a photosensitive layer according to the second aspect, as a method for forming a photosensitive layer on the surface of the substrate and other layers appropriately selected as necessary, a support and The photosensitive transfer material (photosensitive film) having a photosensitive layer formed by laminating a photosensitive composition on a support and other layers appropriately selected as necessary, is heated and pressurized at least either Specifically, using the photosensitive transfer material having a photosensitive layer formed by laminating the photosensitive composition on the support, the photosensitive layer being a substrate. A method of laminating so as to be on the surface side and then peeling the support from the photosensitive layer is preferable.
By peeling off the support, it is possible to prevent a blurred image from being formed on the image formed on the photosensitive layer due to light scattering or refraction by the support, and to obtain a predetermined pattern with high resolution. .
In addition, when the said photosensitive transfer material has a protective film mentioned later, this protective film is peeled and it laminates | stacks so that the said photosensitive layer may overlap with the said base material.

There is no restriction | limiting in particular as said heating temperature, Although it can select suitably according to the objective, For example, 70-130 degreeC is preferable and 80-110 degreeC is more preferable.
There is no restriction | limiting in particular as a pressure of the said pressurization, Although it can select suitably according to the objective, For example, 0.01-1.0 MPa is preferable and 0.05-1.0 MPa is more preferable.

  There is no restriction | limiting in particular as an apparatus which performs at least any one of the said heating and pressurization, According to the objective, it can select suitably, For example, a heat press, a heat roll laminator (for example, Hitachi Industries, Ltd.) , Lamic II type), vacuum laminator (for example, MVLP500 manufactured by Meiki Seisakusho) and the like are preferable.

  The support is not particularly limited and may be appropriately selected depending on the intended purpose. However, it is preferable that the photosensitive layer can be peeled off and that light transmittance is good, and that the surface is smooth. Is more preferable.

  There is no restriction | limiting in particular as thickness of the said support body, According to the objective, it can select suitably, For example, 4-300 micrometers is preferable, 5-175 micrometers is more preferable, and 10-100 micrometers is especially preferable.

  There is no restriction | limiting in particular as a shape of the said support body, Although it can select suitably according to the objective, A long shape is preferable. There is no restriction | limiting in particular as the length of the said elongate support body, For example, the thing of length 10m-20000m is mentioned.

The support is preferably made of synthetic resin and transparent, for example, polyethylene terephthalate, polyethylene naphthalate, polypropylene, polyethylene, cellulose triacetate, cellulose diacetate, poly (meth) acrylic acid alkyl ester, poly (Meth) acrylic acid ester copolymer, polyvinyl chloride, polyvinyl alcohol, polycarbonate, polystyrene, cellophane, polyvinylidene chloride copolymer, polyamide, polyimide, vinyl chloride / vinyl acetate copolymer, polytetrafluoroethylene, polytri Various plastic films such as fluoroethylene, cellulose-based film, nylon film and the like can be mentioned, and among these, polyethylene terephthalate is particularly preferable. These may be used alone or in combination of two or more.
As the support, for example, the support described in JP-A-4-208940, JP-A-5-80503, JP-A-5-173320, JP-A-5-72724, or the like is used. You can also.

  Formation of the photosensitive layer in the photosensitive transfer material can be performed by the same method as the application and drying of the photosensitive composition solution to the substrate (the photosensitive layer forming method of the first aspect).

The protective film is a film having a function of preventing and protecting the photosensitive layer from being stained and damaged.
There is no restriction | limiting in particular as thickness of the said protective film, According to the objective, it can select suitably, For example, 5-100 micrometers is preferable, 8-50 micrometers is more preferable, 10-40 micrometers is especially preferable.

  There is no restriction | limiting in particular as a location provided in the said photosensitive transfer material of the said protective film, Although it can select suitably according to the objective, Usually, it provides on the said photosensitive layer.

  When the protective film is used, the relationship between the adhesive force A of the photosensitive layer and the support and the adhesive force B of the photosensitive layer and the protective film is preferably adhesive force A> adhesive force B. .

The coefficient of static friction between the support and the protective film is preferably 0.3 to 1.4, and more preferably 0.5 to 1.2.
When the coefficient of static friction is less than 0.3, slipping is excessive, so that winding deviation may occur when the roll is formed. Sometimes.

The protective film is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include those used for the support, silicone paper, polyethylene, polypropylene laminated paper, polyolefin or polytetrafluoro. An ethylene sheet etc. are mentioned, Among these, a polyethylene film, a polypropylene film, etc. are mentioned as a particularly preferable thing.
Examples of the combination of the support and the protective film (support / protective film) include a combination described in paragraph No. 0151 of JP-A-2005-70767, a combination of polyethylene terephthalate / polyethylene terephthalate, and the like.

  As the protective film, in order to satisfy the above-described relationship of adhesive strength, it is preferable to perform surface treatment to adjust the adhesion between the protective film and the photosensitive layer. For example, as a method of the surface treatment, Examples include the method described in paragraph No. 0151 of JP-A-2005-70767.

  There is no restriction | limiting in particular as said other layer, According to the objective, it can select suitably, For example, a thermoplastic resin layer, an intermediate | middle layer, etc. are mentioned.

-Thermoplastic resin layer-
The thermoplastic resin layer (hereinafter sometimes referred to as a “cushion layer”) enables alkali development, and prevents the transfer target from being contaminated by the thermoplastic resin layer protruding during transfer. In view of the above, it is preferably alkali-soluble, and when transferring the photosensitive transfer material onto the transfer object, a cushion that effectively prevents transfer defects caused by unevenness present on the transfer object It preferably has a function as a material, and is more deformable according to the unevenness present on the transferred body when the photosensitive transfer material is heated and adhered onto the transferred body. preferable.

As the material used for the thermoplastic resin layer, for example, organic polymer substances described in JP-A-5-72724 are preferable, and the Viker Vicat method (specifically, American Material Testing Method ASTM D1235). It is particularly preferred that the softening point by the polymer softening point measurement method according to (1) is selected from organic polymer substances having a temperature of about 80 ° C. or lower. Specifically, polyolefins such as polyethylene and polypropylene, ethylene copolymers such as ethylene and vinyl acetate or saponified products thereof, ethylene and acrylic acid esters or saponified products thereof, polyvinyl chloride, vinyl chloride and vinyl acetate or saponified products thereof. Vinyl chloride copolymer such as fluoride, polyvinylidene chloride, vinylidene chloride copolymer, polystyrene, styrene copolymer such as styrene and (meth) acrylic acid ester or saponified product thereof, polyvinyl toluene, vinyl toluene and (meta ) Vinyl toluene copolymer such as acrylic ester or saponified product thereof, poly (meth) acrylic ester, (meth) acrylic ester copolymer such as butyl (meth) acrylate and vinyl acetate, vinyl acetate copolymer Combined nylon, copolymer nylon, N-alkoxymethylated sodium Ron, and organic polymers of the polyamide resins, such as N- dimethylamino nylon and the like.
The dry thickness of the thermoplastic resin layer is preferably 2 to 30 μm, more preferably 5 to 20 μm, and particularly preferably 7 to 16 μm.

-Intermediate layer-
The intermediate layer is provided on the photosensitive layer, and is provided between the photosensitive layer and the thermoplastic resin layer when the photosensitive transfer material has the thermoplastic resin layer. In forming the photosensitive layer and the thermoplastic resin layer, an organic solvent is used. Therefore, when the intermediate layer is located between them, the layers can be prevented from being mixed with each other.

The intermediate layer is preferably dispersed or dissolved in water or an aqueous alkali solution.
As the material for the intermediate layer, known materials can be used. For example, polyvinyl ether / maleic anhydride polymer, carboxyalkyl described in JP-A No. 46-2121 and JP-B No. 56-40824 Water-soluble salt of cellulose, water-soluble cellulose ether, water-soluble salt of carboxyalkyl starch, polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylamide, water-soluble polyamide, water-soluble salt of polyacrylic acid, gelatin, ethylene oxide polymer, various Water soluble salts of the group consisting of starch and the like, styrene / maleic acid copolymers, maleate resins, and the like.
These may be used alone or in combination of two or more. Among these, it is preferable to use a hydrophilic polymer, and among these hydrophilic polymers, it is preferable to use at least polyvinyl alcohol, and a combination of polyvinyl alcohol and polyvinyl pyrrolidone is particularly preferable.

There is no restriction | limiting in particular as said polyvinyl alcohol, Although it can select suitably according to the objective, The saponification rate has preferable 80% or more.
When using the said polyvinyl pyrrolidone, as content, 1-75 volume% is preferable with respect to solid content of this intermediate | middle layer, 1-60 volume% is more preferable, 10-50 volume% is especially preferable.
When the content is less than 1% by volume, sufficient adhesion to the photosensitive layer may not be obtained. On the other hand, when the content exceeds 75% by volume, the oxygen-blocking ability may be decreased. Absent.

  The intermediate layer preferably has a low oxygen permeability. When the oxygen permeability of the intermediate layer is large and the oxygen blocking ability is low, it may be necessary to increase the amount of light at the time of exposure to the photosensitive layer, or it may be necessary to lengthen the exposure time, and the resolution also decreases. May end up.

There is no restriction | limiting in particular as thickness of the said intermediate | middle layer, According to the objective, it can select suitably, It is preferable that it is about 0.1-5 micrometers, and 0.5-2 micrometers is more preferable.
If the thickness is less than 0.1 μm, oxygen permeability may be too high, and if it exceeds 5 μm, it takes a long time for development or removal of the intermediate layer, which is not preferable.

  The structure of the photosensitive transfer material is not particularly limited and may be appropriately selected depending on the purpose.For example, on the support, on the temporary support, a thermoplastic resin layer, an intermediate layer, The form etc. which have a photosensitive layer in this order are mentioned. The photosensitive layer may be a single layer or a plurality of layers.

  The photosensitive transfer material is preferably stored, for example, wound around a cylindrical core, wound in a long roll shape. There is no restriction | limiting in particular as the length of the said elongate photosensitive transfer material, For example, it can select suitably from the range of 10m-20,000m. In addition, slitting may be performed so that the user can easily use, and a long body in a range of 100 m to 1,000 m may be formed into a roll shape. In this case, it is preferable that the support is wound up so as to be the outermost side. Moreover, you may slit in the said roll-shaped photosensitive transfer material sheet form. When storing, from the viewpoint of protecting the end face and preventing edge fusion, it is preferable to install a separator (particularly moisture-proof and containing a desiccant) on the end face, and use a low moisture-permeable material for packaging. Is preferred.

  The photosensitive transfer material can be widely used for pattern formation of display members such as color filters, pillars, ribs, spacers, partition walls, etc. Among them, suitable for the method for producing a color filter of the present invention. Can be used.

  In addition, there is no restriction | limiting in particular as an exposure method to the laminated body which has the photosensitive layer formed by the photosensitive layer forming method of the said 2nd aspect, According to the objective, it can select suitably, For example, the said photosensitive layer In the case where a film-like photosensitive transfer material is laminated on a support via a cushion layer, the support and, if necessary, the cushion layer are also peeled off, and then the intermediate layer (oxygen barrier layer) is interposed. It is preferable to expose the photosensitive layer.

<Photosensitive layer>
The photosensitive layer (color resist layer) formed in the photosensitive layer forming step includes at least a binder, a colorant, a polymerizable compound, and a photopolymerization initiator, and further includes other components appropriately selected as necessary. It is formed using the photosensitive composition containing.

<< Binder >>
For example, the binder is preferably swellable in an alkaline aqueous solution, and more preferably soluble in an alkaline aqueous solution.
As the binder exhibiting swellability or solubility with respect to the alkaline aqueous solution, for example, those having an acidic group are preferably exemplified.

There is no restriction | limiting in particular as said acidic group, According to the objective, it can select suitably, For example, a carboxyl group, a sulfonic acid group, a phosphoric acid group etc. are mentioned, Among these, a carboxyl group is preferable.
Examples of the binder having a carboxyl group include a vinyl copolymer having a carboxyl group, a polyurethane resin, a polyamic acid resin, and a modified epoxy resin. Among these, the solubility in a coating solvent, the solubility in an alkali developer, and the like. From the viewpoints of solubility, suitability for synthesis, ease of preparation of film properties, etc., a vinyl copolymer having a carboxyl group is preferred.

  The vinyl copolymer having a carboxyl group can be obtained by copolymerization of at least (1) a vinyl monomer having a carboxyl group, and (2) a monomer copolymerizable therewith.

Examples of the vinyl monomer having a carboxyl group include (meth) acrylic acid, vinyl benzoic acid, maleic acid, maleic acid monoalkyl ester, fumaric acid, itaconic acid, crotonic acid, cinnamic acid, acrylic acid dimer, and hydroxyl group. An addition reaction product of a monomer (for example, 2-hydroxyethyl (meth) acrylate) and a cyclic anhydride (for example, maleic anhydride, phthalic anhydride, cyclohexanedicarboxylic anhydride), ω-carboxy-polycaprolactone mono Examples include (meth) acrylate. Among these, (meth) acrylic acid is particularly preferable from the viewpoints of copolymerizability, cost, solubility, and the like.
Moreover, you may use the monomer which has anhydrides, such as maleic anhydride, itaconic anhydride, and citraconic anhydride, as a precursor of a carboxyl group.

  The other copolymerizable monomer is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include (meth) acrylic acid esters, crotonic acid esters, vinyl esters, and maleic acid diesters. , Fumaric acid diesters, itaconic acid diesters, (meth) acrylamides, vinyl ethers, esters of vinyl alcohol, styrenes, (meth) acrylonitrile, heterocyclic groups substituted with vinyl groups (eg, vinylpyridine, Vinylpyrrolidone, vinylcarbazole, etc.), N-vinylformamide, N-vinylacetamide, N-vinylimidazole, vinylcaprolactone, 2-acrylamido-2-methylpropanesulfonic acid, phosphoric acid mono (2-acryloyloxyethyl ester), phosphorus Acid mono (1- Chill-2-acryloyloxyethyl ester), functional groups (e.g., a urethane group, a urea group, a sulfonamide group, a phenol group and a vinyl monomer and the like having an imide group).

  Examples of the (meth) acrylic acid esters include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, and isobutyl (meth) ) Acrylate, t-butyl (meth) acrylate, n-hexyl (meth) acrylate, cyclohexyl (meth) acrylate, t-butylcyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, t-octyl (meth) acrylate, Dodecyl (meth) acrylate, octadecyl (meth) acrylate, acetoxyethyl (meth) acrylate, phenyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-methoxyethyl (meth) acrylate 2-ethoxyethyl (meth) acrylate, 2- (2-methoxyethoxy) ethyl (meth) acrylate, 3-phenoxy-2-hydroxypropyl (meth) acrylate, benzyl (meth) acrylate, diethylene glycol monomethyl ether (meta ) Acrylate, diethylene glycol monoethyl ether (meth) acrylate, diethylene glycol monophenyl ether (meth) acrylate, triethylene glycol monomethyl ether (meth) acrylate, triethylene glycol monoethyl ether (meth) acrylate, polyethylene glycol monomethyl ether (meth) acrylate , Polyethylene glycol monoethyl ether (meth) acrylate, β-phenoxyethoxyethyl acrylate, Nylphenoxypolyethylene glycol (meth) acrylate, dicyclopentanyl (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, trifluoroethyl (meth) acrylate, octafluoropentyl (meth) Examples include acrylate, perfluorooctylethyl (meth) acrylate, tribromophenyl (meth) acrylate, and tribromophenyloxyethyl (meth) acrylate.

  Examples of the crotonic acid esters include butyl crotonate and hexyl crotonate.

  Examples of the vinyl esters include vinyl acetate, vinyl propionate, vinyl butyrate, vinyl methoxyacetate, vinyl benzoate, and the like.

  Examples of the maleic acid diesters include dimethyl maleate, diethyl maleate, and dibutyl maleate.

  Examples of the fumaric acid diesters include dimethyl fumarate, diethyl fumarate, dibutyl fumarate and the like.

  Examples of the itaconic acid diesters include dimethyl itaconate, diethyl itaconate, and dibutyl itaconate.

  Examples of the (meth) acrylamides include (meth) acrylamide, N-methyl (meth) acrylamide, N-ethyl (meth) acrylamide, N-propyl (meth) acrylamide, N-isopropyl (meth) acrylamide, N- n-butyl acrylic (meth) amide, Nt-butyl (meth) acrylamide, N-cyclohexyl (meth) acrylamide, N- (2-methoxyethyl) (meth) acrylamide, N, N-dimethyl (meth) acrylamide, Examples thereof include N, N-diethyl (meth) acrylamide, N-phenyl (meth) acrylamide, N-benzyl (meth) acrylamide, (meth) acryloylmorpholine, diacetone acrylamide and the like.

  Examples of the styrenes include styrene, methyl styrene, dimethyl styrene, trimethyl styrene, ethyl styrene, isopropyl styrene, butyl styrene, hydroxy styrene, methoxy styrene, butoxy styrene, acetoxy styrene, chlorostyrene, dichlorostyrene, bromostyrene, chloro Examples include methylstyrene, hydroxystyrene protected with a group that can be deprotected by an acidic substance (for example, t-Boc and the like), methyl vinylbenzoate, α-methylstyrene, and the like.

  Examples of the vinyl ethers include methyl vinyl ether, butyl vinyl ether, hexyl vinyl ether, and methoxyethyl vinyl ether.

  Examples of the other copolymerizable monomers other than those described above include, for example, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, benzyl (meth) acrylate, and (meth) acrylic. Preferable examples include 2-ethylhexyl acid, styrene, chlorostyrene, bromostyrene, and hydroxystyrene.

  The said other copolymerizable monomer may be used individually by 1 type, and may use 2 or more types together.

  The vinyl copolymer can be prepared by copolymerizing the corresponding monomers by a known method according to a conventional method. For example, it can be prepared by using a method (solution polymerization method) in which the monomer is dissolved in a suitable solvent and a radical polymerization initiator is added thereto to polymerize in a solution. Moreover, it can prepare by utilizing superposition | polymerization by what is called emulsion polymerization etc. in the state which disperse | distributed the said monomer in the aqueous medium.

  The suitable solvent used in the solution polymerization method is not particularly limited and may be appropriately selected depending on the monomer used and the solubility of the copolymer to be produced. For example, methanol, ethanol, propanol, Examples include isopropanol, 1-methoxy-2-propanol, acetone, methyl ethyl ketone, methyl isobutyl ketone, methoxypropyl acetate, ethyl lactate, ethyl acetate, acetonitrile, tetrahydrofuran, dimethylformamide, chloroform, toluene and the like. These solvents may be used alone or in combination of two or more.

  The radical polymerization initiator is not particularly limited, and examples thereof include 2,2′-azobis (isobutyronitrile) (AIBN) and 2,2′-azobis- (2,4′-dimethylvaleronitrile). Examples thereof include peroxides such as azo compounds and benzoyl peroxide, and persulfates such as potassium persulfate and ammonium persulfate.

There is no restriction | limiting in particular as content rate of the polymeric compound which has a carboxyl group in the said vinyl copolymer, Although it can select suitably according to the objective, For example, 5-50 mol% is preferable, 10-40 mol % Is more preferable, and 15 to 35 mol% is particularly preferable.
If the content is less than 5 mol%, developability to alkaline water may be insufficient, and if it exceeds 50 mol%, the developer resistance of the cured portion (pixel portion, image portion) may be insufficient. There is.

There is no restriction | limiting in particular as molecular weight of the binder which has the said carboxyl group, Although it can select suitably according to the objective, For example, 2,000-300,000 are preferable as a weight average molecular weight, 4,000-150 000 is more preferable.
When the weight average molecular weight is less than 2,000, the strength of the film tends to be insufficient and stable production may be difficult, and when it exceeds 300,000, developability may be deteriorated.

  The binder which has the said carboxyl group may be used individually by 1 type, and may use 2 or more types together. When two or more binders are used in combination, for example, a combination of two or more binders composed of different copolymerization components, two or more binders having different weight average molecular weights, two or more binders having different degrees of dispersion, etc. Is mentioned.

  The binder having a carboxyl group may be partially or entirely neutralized with a basic substance. The binder may be used in combination with resins having different structures such as polyester resin, polyamide resin, polyurethane resin, epoxy resin, polyvinyl alcohol, and gelatin.

  Moreover, as the binder, a resin soluble in an alkaline aqueous solution described in Japanese Patent No. 2873889 can be used.

There is no restriction | limiting in particular as content of the said binder in the said photosensitive layer, Although it can select suitably according to the objective, For example, 5-80 mass% is preferable, 10-70 mass% is more preferable, 15-15 50% by mass is particularly preferred.
When the content is less than 5% by mass, the alkali developability may be lowered, and when it exceeds 80% by mass, the stability with respect to the development time may be lowered. The content may be the total content of the binder and the polymer binder used in combination as necessary.

The acid value of the binder is not particularly limited and may be appropriately selected depending on the intended purpose. For example, it is preferably 70 to 250 mgKOH / g, more preferably 90 to 200 mgKOH / g, and 100 to 180 mgKOH / g. Particularly preferred.
When the acid value is less than 70 mgKOH / g, the developability may be insufficient or the resolution may be inferior, and the pattern may not be obtained with high definition. At least one of the liquidity and the adhesiveness may deteriorate, and the pattern may not be obtained with high definition.

<< polymerizable compound >>
The polymerizable compound is not particularly limited and may be appropriately selected depending on the intended purpose. However, the polymerizable compound has at least one addition-polymerizable group in the molecule and has a boiling point of 100 ° C. or higher at normal pressure. A compound is preferable, for example, at least 1 sort (s) selected from the monomer which has a (meth) acryl group is mentioned suitably.

  There is no restriction | limiting in particular as a monomer which has the said (meth) acryl group, According to the objective, it can select suitably, For example, polyethyleneglycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, phenoxyethyl (meth) ) Monofunctional acrylates and monofunctional methacrylates such as acrylates; polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, trimethylolethane triacrylate, trimethylolpropane triacrylate, trimethylolpropane diacrylate, neopentylglycol di (Meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (Meth) acrylate, dipentaerythritol penta (meth) acrylate, hexanediol di (meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) isocyanurate, tri (acryloyloxyethyl) cyanurate, glycerin Poly (functional) alcohols such as tri (meth) acrylate, trimethylolpropane, glycerin, bisphenol, etc., which are subjected to addition reaction with ethylene oxide and propylene oxide, and converted to (meth) acrylate, Japanese Patent Publication No. 48-41708, Japanese Patent Publication No. 50- Urethane acrylates described in JP-A-6034, JP-A-51-37193, etc .; JP-A-48-64183, JP-B-49-43191, JP-B-52-30 Polyester acrylates described in each publication of such 90 No.; and epoxy resin and (meth) polyfunctional acrylates or methacrylates such as epoxy acrylates which are reaction products of acrylic acid. Among these, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and dipentaerythritol penta (meth) acrylate are particularly preferable. These may be used individually by 1 type and may use 2 or more types together.

10-60 mass% is preferable, as for solid content in the said photosensitive composition solid content of the said polymeric compound, 15-50 mass% is more preferable, and 20-40 mass% is especially preferable. If the solid content is less than 10% by mass, problems such as deterioration in developability and reduction in exposure sensitivity may occur, and if it exceeds 60% by mass, the adhesiveness of the photosensitive layer may become too strong. Yes, not preferred.
The ratio of the polymerizable compound and the binder is a mass ratio, preferably polymerizable compound / binder = 0.5 to 1.5, more preferably 0.6 to 1.2, and 0.65 to 1.1. Particularly preferred. If this range is exceeded, problems such as residues may occur during development, and if it is less than this range, the durability of the completed color filter may be reduced.

<< photopolymerization initiator >>
The photopolymerization initiator is not particularly limited as long as it has the ability to initiate polymerization of the polymerizable compound, and can be appropriately selected from known photopolymerization initiators. For example, it is visible from the ultraviolet region. It is preferable to have photosensitivity to the light, and it may be an activator that produces some kind of action with a photoexcited sensitizer and generates active radicals, and initiates cationic polymerization depending on the type of monomer. Initiator may be used.
The photopolymerization initiator preferably contains at least one component having a molecular extinction coefficient of at least about 50 within a range of about 300 to 800 nm (more preferably 330 to 500 nm).

  Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, those having a triazine skeleton, those having an oxadiazole skeleton), phosphine oxide, hexaarylbiimidazole, oxime derivatives, organic peroxides, Examples include thio compounds, ketone compounds, aromatic onium salts, ketoxime ethers, and the like.

  Examples of the halogenated hydrocarbon compound having a triazine skeleton include those described in Wakabayashi et al., Bull. Chem. Soc. Japan, 42, 2924 (1969), a compound described in British Patent No. 1388492, a compound described in JP-A-53-133428, a compound described in German Patent No. 3333724 , F. C. J. Schaefer et al. Org. Chem. 29, 1527 (1964), a compound described in JP-A-62-258241, a compound described in JP-A-5-281728, a compound described in JP-A-5-34920, and U.S. Pat. No. 4,221,976. Compounds described in the specification, and the like.

  Further, the vicinal polyketaldonyl compound described in US Pat. No. 2,367,660, the acyloin ether compound described in US Pat. No. 2,448,828, and US Pat. No. 2,722,512 Aromatic acyloin compounds substituted with α-hydrocarbons described above, polynuclear quinone compounds described in US Pat. No. 3,046,127 and US Pat. No. 2,951,758, JP-A-2002-229194 Organic boron compounds, radical generators, triarylsulfonium salts (for example, salts with hexafluoroantimony and hexafluorophosphate), phosphonium salt compounds (for example, (phenylthiophenyl) diphenylsulfonium salts, etc.) (cationic polymerization initiators) Effective), International 01 / Such as onium salt compounds described in 1428 pamphlet can be mentioned.

  Wakabayashi et al., Bull. Chem. Soc. As a compound described in Japan, 42, 2924 (1969), for example, 2-phenyl-4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-chlorophenyl) -4,6 -Bis (trichloromethyl) -1,3,5-triazine, 2- (4-tolyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-methoxyphenyl)- 4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (2,4-dichlorophenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2, 4,6-tris (trichloromethyl) -1,3,5-triazine, 2-methyl-4,6-bis (trichloromethyl) -1,3,5-triazine, 2-n-nonyl-4,6- Bis (trichloromethyl) 1,3,5-triazine, and 2-(alpha, alpha, beta-trichloroethyl) -4,6-bis (trichloromethyl) -1,3,5-triazine.

Examples of the compound described in the British Patent No. 1388492 include 2-styryl-4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-methylstyryl) -4. , 6-Bis (trichloromethyl) -1,3,5-triazine, 2- (4-methoxystyryl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-methoxy) Styryl) -4-amino-6-trichloromethyl-1,3,5-triazine and the like.
Examples of the compound described in JP-A-53-133428 include 2- (4-methoxy-naphth-1-yl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-Ethoxy-naphth-1-yl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [4- (2-ethoxyethyl) -naphth-1-yl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4,7-dimethoxy-naphth-1-yl) -4,6-bis (trichloromethyl) -1,3,5 -Triazine, 2- (acenaphtho-5-yl) -4,6-bis (trichloromethyl) -1,3,5-triazine and the like.

  Examples of the compound described in German Patent No. 3333724 include 2- (4-styrylphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4 -(4-methoxystyryl) phenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (1-naphthylvinylenephenyl) -4,6-bis (trichloromethyl) -1, 3,5-triazine, 2-chlorostyrylphenyl-4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-thiophen-2-vinylenephenyl) -4,6-bis (trichloro Methyl) -1,3,5-triazine, 2- (4-thiophene-3-vinylenephenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-furan -2-vinylenephenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, and 2- (4-benzofuran-2-vinylenephenyl) -4,6-bis (trichloromethyl) -1 , 3,5-triazine and the like.

  F. above. C. J. Schaefer et al. Org. Chem. 29, 1527 (1964) include, for example, 2-methyl-4,6-bis (tribromomethyl) -1,3,5-triazine, 2,4,6-tris (tribromomethyl); -1,3,5-triazine, 2,4,6-tris (dibromomethyl) -1,3,5-triazine, 2-amino-4-methyl-6-tri (bromomethyl) -1,3,5- Examples include triazine and 2-methoxy-4-methyl-6-trichloromethyl-1,3,5-triazine.

  Examples of the compound described in JP-A-62-258241 include 2- (4-phenylethynylphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4 -Naphtyl-1-ethynylphenyl-4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4- (4-tolylethynyl) phenyl) -4,6-bis (trichloromethyl)- 1,3,5-triazine, 2- (4- (4-methoxyphenyl) ethynylphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4- (4-isopropyl) Phenylethynyl) phenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4- (4-ethylphenylethynyl) phenyl) -4,6-bis (trichloro Chill) -1,3,5-triazine.

  Examples of the compound described in JP-A-5-281728 include 2- (4-trifluoromethylphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (2 , 6-Difluorophenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (2,6-dichlorophenyl) -4,6-bis (trichloromethyl) -1,3,5 -Triazine, 2- (2,6-dibromophenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine and the like.

  Examples of the compounds described in JP-A-5-34920 include 2,4-bis (trichloromethyl) -6- [4- (N, N-diethoxycarbonylmethylamino) -3-bromophenyl]-. 1,3,5-triazine, trihalomethyl-s-triazine compounds described in US Pat. No. 4,239,850, 2,4,6-tris (trichloromethyl) -s-triazine, 2- (4 -Chlorophenyl) -4,6-bis (tribromomethyl) -s-triazine and the like.

  Examples of the compound described in US Pat. No. 4,221,976 include compounds having an oxadiazole skeleton (for example, 2-trichloromethyl-5-phenyl-1,3,4-oxadiazole, 2-trichloro Methyl-5- (4-chlorophenyl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (1-naphthyl) -1,3,4-oxadiazole, 2-trichloromethyl-5 (2-naphthyl) -1,3,4-oxadiazole, 2-tribromomethyl-5-phenyl-1,3,4-oxadiazole, 2-tribromomethyl-5- (2-naphthyl)- 1,3,4-oxadiazole; 2-trichloromethyl-5-styryl-1,3,4-oxadiazole, 2-trichloromethyl-5- (4-chlorostyryl) -1 3,4-oxadiazole, 2-trichloromethyl-5- (4-methoxystyryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (1-naphthyl) -1,3,4 -Oxadiazole, 2-trichloromethyl-5- (4-n-butoxystyryl) -1,3,4-oxadiazole, 2-tripromemethyl-5-styryl-1,3,4-oxadiazole Etc.).

  Examples of the oxime derivative suitably used in the present invention include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, and 2-acetoxy. Iminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3- (4-toluenesulfonyloxy) iminobutane-2- ON, and 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one.

  Further, as photopolymerization initiators other than the above, acridine derivatives (for example, 9-phenylacridine, 1,7-bis (9,9′-acridinyl) heptane, etc.), N-phenylglycine, and the like, polyhalogen compounds (for example, Carbon tetrabromide, phenyltribromomethylsulfone, phenyltrichloromethylketone, etc.), coumarins (for example, 3- (2-benzofuroyl) -7-diethylaminocoumarin, 3- (2-benzofuroyl) -7- (1-pyrrolidinyl) ) Coumarin, 3-benzoyl-7-diethylaminocoumarin, 3- (2-methoxybenzoyl) -7-diethylaminocoumarin, 3- (4-dimethylaminobenzoyl) -7-diethylaminocoumarin, 3,3′-carbonylbis (5 , 7-di-n-propoxycoumarin), 3,3′-carbonylbi (7-diethylaminocoumarin), 3-benzoyl-7-methoxycoumarin, 3- (2-furoyl) -7-diethylaminocoumarin, 3- (4-diethylaminocinnamoyl) -7-diethylaminocoumarin, 7-methoxy-3- (3-pyridylcarbonyl) coumarin, 3-benzoyl-5,7-dipropoxycoumarin, 7-benzotriazol-2-ylcoumarin, JP-A-5-19475, JP-A-7-271028, JP-A-2002-363206 , Coumarin compounds described in JP-A No. 2002-363207, JP-A No. 2002-363208, JP-A No. 2002-363209, etc.), amines (for example, ethyl 4-dimethylaminobenzoate, 4-dimethylaminobenzoate) Acid n-butyl, 4-dimethylaminobenzoic acid phenetic acid 4-dimethylaminobenzoic acid 2-phthalimidoethyl, 4-dimethylaminobenzoic acid 2-methacryloyloxyethyl, pentamethylenebis (4-dimethylaminobenzoate), phenethyl of 3-dimethylaminobenzoic acid, pentamethylene ester, 4- Dimethylaminobenzaldehyde, 2-chloro-4-dimethylaminobenzaldehyde, 4-dimethylaminobenzyl alcohol, ethyl (4-dimethylaminobenzoyl) acetate, 4-piperidinoacetophenone, 4-dimethylaminobenzoin, N, N-dimethyl- 4-toluidine, N, N-diethyl-3-phenetidine, tribenzylamine, dibenzylphenylamine, N-methyl-N-phenylbenzylamine, 4-bromo-N, N-dimethylaniline, tridodecyl Amines, aminofluoranes (ODB, ODBII, etc.), crystal violet lactone, leuco crystal violet, etc.), acylphosphine oxides (for example, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, bis (2, 6-dimethoxybenzoyl) -2,4,4-trimethyl-pentylphenylphosphine oxide, Lucirin TPO, etc.), metallocenes (for example, bis (η5-2,4-cyclopentadien-1-yl) -bis (2,6- Difluoro 3- (1H-pyrrol-1-yl) -phenyl) titanium, η5-cyclopentadienyl-η6-cumenyl-iron (1 +)-hexafluorophosphate (1-), etc.), JP-A-53-133428 Gazette, Japanese Patent Publication No.57-1819 No. 57-6096, and US Pat. No. 3,615,455, and the like.

  Examples of the ketone compound include benzophenone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 4-methoxybenzophenone, 2-chlorobenzophenone, 4-chlorobenzophenone, 4-bromobenzophenone, 2-carboxybenzophenone, 2-ethoxycarbonylbenzolphenone, benzophenonetetracarboxylic acid or tetramethyl ester thereof, 4,4′-bis (dialkylamino) benzophenone (for example, 4,4′-bis (dimethylamino) benzophenone, 4,4′- Bisdicyclohexylamino) benzophenone, 4,4′-bis (diethylamino) benzophenone, 4,4′-bis (dihydroxyethylamino) benzophenone, 4-methoxy-4′-dimethylamino Nzophenone, 4,4'-dimethoxybenzophenone, 4-dimethylaminobenzophenone, 4-dimethylaminoacetophenone, benzyl, anthraquinone, 2-t-butylanthraquinone, 2-methylanthraquinone, phenanthraquinone, xanthone, thioxanthone, 2-chloro -Thioxanthone, 2,4-diethylthioxanthone, fluorenone, 2-benzyl-dimethylamino-1- (4-morpholinophenyl) -1-butanone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino -1-propanone, 2-hydroxy-2-methyl- [4- (1-methylvinyl) phenyl] propanol oligomer, benzoin, benzoin ethers (for example, benzoin methyl ether, benzoin ethyl ether, In propyl ether, benzoin isopropyl ether, benzoin phenyl ether, benzyl dimethyl ketal), acridone, chloro acridone, N- methyl acridone, N- butyl acridone, N- butyl - such as chloro acrylic pyrrolidone.

  Examples of the hexaarylbiimidazole compound include 2,2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-tetraphenyl-1,2′-bisimidazole, 2,2′-bis (2 -Chlorophenyl) -4,4 ', 5,5'-tetrakis (4-ethoxycarbonylphenyl) biimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetrakis (4 -Phenoxycarbonylphenyl) biimidazole, 2,2'-bis (2,4-dichlorophenyl) -4,4 ', 5,5'-tetrakis (4-ethoxycarbonylphenyl) biimidazole, 2,2'-bis ( 2,4-dichlorophenyl) -4,4 ′, 5,5′-tetrakis (4-phenoxycarbonylphenyl) biimidazole, 2,2′-bis (2,4,6- Lichlorophenyl) -4,4 ′, 5,5′-tetrakis (4-ethoxycarbonylphenyl) biimidazole, 2,2′-bis (2,4,6-trichlorophenyl) -4,4 ′, 5,5 '-Tetrakis (4-phenoxycarbonylphenyl) biimidazole, 2,2'-bis (2-cyanophenyl) -4,4', 5.5'-tetrakis (4-ethoxycarbonylphenyl) biimidazole, 2,2 '-Bis (2-cyanophenyl) -4,4', 5,5'-tetrakis (4-phenoxycarbonylphenyl) biimidazole, 2,2'-bis (2-methylphenyl) -4,4 ', 5 , 5′-tetrakis (4-methoxycarbonylphenyl) biimidazole, 2,2′-bis (2-methylphenyl) -4,4 ′, 5,5′-tetrakis (4-e Xoxycarbonylphenyl) biimidazole, 2,2′-bis (2-methylphenyl) -4,4 ′, 5,5′-tetrakis (4-phenoxycarbonylphenyl) biimidazole, 2,2′-bis (2- Ethylphenyl) -4,4 ′, 5,5′-tetrakis (4-methoxycarbonylphenyl) biimidazole, 2,2′-bis (2-ethylphenyl) -4,4 ′, 5,5′-tetrakis ( 4-ethoxycarbonylphenyl) biimidazole, 2,2′-bis (2-ethylphenyl) -4,4 ′, 5,5′-tetrakis (4-phenoxycarbonylphenyl) biimidazole, 2,2′-bis ( 2-phenylphenyl) -4,4 ′, 5,5′-tetrakis (4-methoxycarbonylphenyl) biimidazole, 2,2′-bis (2-phenylphenyl) Enyl) -4,4 ′, 5,5′-tetrakis (4-ethoxycarbonylphenyl) biimidazole, 2,2′-bis (2-phenylphenyl) -4,4 ′, 5,5′-tetrakis (4 -Phenoxycarbonylphenyl) biimidazole, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,4-dichlorophenyl) -4 , 4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (2,4,6-trichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2 ′ -Bis (2-bromophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,4-dibromophenyl) -4,4', 5,5'-tetra Phenylbiimi Sol, 2,2′-bis (2,4,6-tribromophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (2-cyanophenyl) -4, 4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (2,4-dicyanophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis ( 2,4,6-tricyanophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (2-methylphenyl) -4,4 ′, 5,5′-tetra Phenylbiimidazole, 2,2′-bis (2,4-dimethylphenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (2,4,6-trimethylphenyl) -4,4 ', 5,5'-tetraphenylbiimidazole 2,2′-bis (2-ethylphenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (2,4-diethylphenyl) -4,4 ′ , 5,5′-tetraphenylbiimidazole, 2,2′-bis (2,4,6-triethylphenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis ( 2-phenylphenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (2,4-diphenylphenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole 2,2′-bis (2,4,6-triphenylphenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole and the like.

As content of the said photoinitiator, 0.1-50 mass% is preferable with respect to the total solid component in the said photosensitive composition, 0.5-30 mass% is more preferable, 1-20 mass% Is particularly preferred.
When the content of the photopolymerization initiator is expressed by a mass ratio with the polymerizable compound, the photopolymerization initiator / polymerizable compound is preferably 0.01 to 0.2, more preferably 0.02 to 0.1. Preferably, 0.03 to 0.08 is particularly preferable. If it exceeds this range, there is a problem that a development residue or a precipitation failure occurs. If it is less than this range, sufficient sensitivity may not be obtained.

In addition to the photopolymerization initiator, a sensitizer can be added for the purpose of adjusting exposure sensitivity and photosensitive wavelength in exposure to the photosensitive layer described later.
The sensitizer can be appropriately selected by visible light, ultraviolet light, visible light laser, or the like as a light irradiation means described later.
The sensitizer is excited by active energy rays and interacts with other substances (for example, radical generator, acid generator, etc.) (for example, energy transfer, electron transfer, etc.), thereby generating radicals, acids, etc. It is possible to generate a useful group of

  The sensitizer is not particularly limited and may be appropriately selected from known sensitizers according to the purpose. For example, known polynuclear aromatics (for example, pyrene, perylene, triphenylene), Xanthenes (for example, fluorescein, eosin, erythrosine, rhodamine B, rose bengal), cyanines (for example, indocarbocyanine, thiacarbocyanine, oxacarbocyanine), merocyanines (for example, merocyanine, carbomerocyanine), thiazines ( For example, thionine, methylene blue, toluidine blue), acridines (for example, acridine orange, chloroflavin, acriflavine), anthraquinones (for example, anthraquinone), squariums (for example, squalium), acridones (for example, acridone) Chloroacridone, N-methylacridone, N-butylacridone, 10-N-butyl-2-chloroacridone, etc.), coumarins (for example, 3- (2-benzofuroyl) -7-diethylaminocoumarin, 3- (2-benzofuroyl) -7- (1-pyrrolidinyl) coumarin, 3-benzoyl-7-diethylaminocoumarin, 3- (2-methoxybenzoyl) -7-diethylaminocoumarin, 3- (4-dimethylaminobenzoyl) -7- Diethylaminocoumarin, 3,3′-carbonylbis (5,7-di-n-propoxycoumarin), 3,3′-carbonylbis (7-diethylaminocoumarin), 3-benzoyl-7-methoxycoumarin, 3- (2 -Furoyl) -7-diethylaminocoumarin, 3- (4-diethylaminocinnamoyl) -7 Examples thereof include diethylaminocoumarin, 7-methoxy-3- (3-pyridylcarbonyl) coumarin, 3-benzoyl-5, 7-dipropoxycoumarin, and others, as well as JP-A-5-19475 and JP-A-7-271028. And JP-A 2002-363206, JP-A 2002-363207, JP-A 2002-363208, JP-A 2002-363209, and the like.

  Examples of the combination of the photopolymerization initiator and the sensitizer include, for example, an electron transfer start system described in JP-A-2001-305734 [(1) an electron donating initiator and a sensitizing dye, (2) A combination of an electron-accepting initiator and a sensitizing dye, (3) an electron-donating initiator, a sensitizing dye and an electron-accepting initiator (ternary initiation system)], and the like.

  As content of the said sensitizer, 0.05-30 mass% is preferable with respect to all the components in the said photosensitive composition, 0.1-20 mass% is more preferable, 0.2-10 mass% Is particularly preferred. When the content is less than 0.05% by mass, the sensitivity to active energy rays is reduced, the exposure process takes time, and productivity may be reduced. The sensitizer may be precipitated from the photosensitive layer.

The said photoinitiator may be used individually by 1 type, and may use 2 or more types together.
Particularly preferred examples of the photopolymerization initiator include halogenated carbonization having the phosphine oxides, the α-aminoalkyl ketones, and the triazine skeleton capable of supporting laser light having a wavelength of 405 nm in the exposure described later. Examples thereof include a composite photoinitiator, a hexaarylbiimidazole compound, or titanocene, which is a combination of a hydrogen compound and an amine compound as a sensitizer.

<< Colorant >>
There is no restriction | limiting in particular as said coloring agent, According to the objective, it can select suitably, For example, an organic pigment, an inorganic pigment, dye, etc. are mentioned.
Any one selected from dendritic branched molecules in which metal ions are coordinated as coloring agents, and dendritic branched molecules containing at least one metal particle of metal particles and alloy particles, separately or in combination with these colorants It is also possible to contain the following dendritic branched molecules.

  Examples of the colorant include yellow pigments, orange pigments, red pigments, violet pigments, blue pigments, green pigments, brown pigments, and black pigments. When forming a color filter, the photosensitive composition Since a plurality of colored compositions colored in three primary colors (B, G, R) and black (K) are used, a pigment such as a blue pigment, a green pigment, a red pigment, and a black pigment is preferably used. .

  Examples of the pigment include a coloring material described in paragraph Nos. 0038 to 0040 of JP-A No. 2005-17716, a pigment described in paragraph Nos. 0068 to 0072 of JP-A No. 2005-361447, and JP-A No. 2005-17521. Preferable examples include coloring agents described in paragraph numbers 0080 to 0088 of the publication.

  In addition, the said coloring agent may be used individually by 1 type, or can also be used in combination of 2 or more type.

  In the color filter of the present invention, the combination of the colorants for effectively realizing good display characteristics (darker color) in both the transmission mode and the reflection mode in a device such as a portable terminal or a portable game machine. (I) In the photosensitive composition of R, the pigment C.I. I. Pigment Red 254, and (ii) the pigment C.I. I. Pigment green 36 and pigment C.I. I. Pigment Yellow 139 is used in combination, and in the photosensitive composition of (iii) B, pigment C.I. I. Pigment Blue 15: 6 is preferably used.

Here, the C.I. I. The content of Pigment Red 254 is preferably 0.274 to 0.335 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and is preferably 0.280 to 0.329 g / m ^2. m ² is more preferable, and 0.290 to 0.320 g / m ² is particularly preferable.
C. in said (ii). I. The content of Pigment Green 36 is preferably 0.355 to 0.437 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and 0.364 to 0.428 g / m ^2. m ² is more preferable, and 0.376 to 0.412 g / m ² is particularly preferable.
C. in said (ii). I. The content of CI Pigment Yellow 139 is preferably 0.052~0.078g / ^{m 2,} more preferably from 0.060~0.070g / ^{m 2,} 0.062~0.068g / ^{m 2} is particularly preferred. In (ii), C.I. I. Pigment green 36 / C.I. I. The pigment yellow 139 ratio is preferably 5.4 to 6.7, more preferably 5.6 to 6.6, and particularly preferably 5.8 to 6.4.
C. in (iii) above. I. The content of Pigment Blue 15: 6 is preferably 0.28 to 0.38 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and preferably 0.29 to 0.36 g. / more preferably ^m is ^2, and particularly preferably 0.30～0.34G / ^{m 2.}

  In the color filter of the present invention, when used in a large-screen display device such as a notebook personal computer display or a television monitor, the above-described color filter can realize high display characteristics (wide color reproduction range and high color temperature). As the combination of the colorants, (I) in the red (R) photosensitive composition, pigment C.I. I. Pigment red 254 and C.I. I. Pigment Red 177 is used, and in the photosensitive composition of (II) green (G), pigment C.I. I. Pigment green 36 and pigment C.I. I. Pigment Yellow 150 is used in combination, and in the photosensitive composition of (III) blue (B), pigment C.I. I. Pigment blue 15: 6 and C.I. I. Pigment violet 23 is preferably used in combination.

Here, the C.I. I. The content of Pigment Red 254 is preferably 0.6 to 1.1 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and 0.80 to 0.96 g / m ^2. m ² is more preferable, and 0.82 to 0.94 g / m ² is particularly preferable.
C. in (I) above. I. The content of Pigment Red 177 is preferably 0.10 to 0.30 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and is preferably 0.20 to 0.24 g / m ^2. m ² is more preferable, and 0.21 to 0.23 g / m ² is particularly preferable.
C. in said (II). I. The content of Pigment Green 36 is preferably 0.80 to 1.45 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and preferably 0.90 to 1.34 g / m ^2. m ² is more preferable, and 0.95 to 1.29 g / m ² is particularly preferable.
C. in said (II). I. The content of pigment yellow 150 is preferably 0.30~0.65g / ^{m 2,} and more preferably 0.38~0.58g / ^{m 2.} In (II), C.I. I. Pigment green 36 / C.I. I. The pigment yellow 150 ratio is preferably 0.40 to 0.50.
C. in said (III). I. The content of Pigment Blue 15: 6 is preferably 0.50 to 0.75 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and is preferably 0.59 to 0.8. It is more preferably 67 g / m ² , and particularly preferably 0.60 to 0.66 g / m ² .
C. in said (III). I. The content of Pigment Violet 23 is preferably 0.03 to 0.10 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and preferably 0.06 to 0.08 g / m. ² is more preferable, and 0.066 to 0.074 g / m ² is particularly preferable. In (III), C.I. I. Pigment Blue 15: 6 / C.I. I. It is preferable that the pigment violet 23 ratio is 12-50.

  When the colorant as described above is used, the particle diameter of the pigment is preferably 1 nm to 200 nm, more preferably 10 to 80 nm, particularly preferably 20 to 70 nm, and particularly preferably 30 nm to 200 nm. Most preferably, it is 60 nm. Since the photosensitive layer is a thin layer, when the particle size of the pigment or the like is not in the above range, it cannot be uniformly dispersed in the resin layer, and it is difficult to produce a high-quality color filter. Therefore, it is not preferable.

<< Other ingredients >>
In the said photosensitive composition, you may contain components, such as a plasticizer, surfactant, a ultraviolet absorber, a thermal polymerization inhibitor, as another component.

The plasticizer may be added to control film physical properties (flexibility) of the photosensitive layer.
Examples of the plasticizer include dimethyl phthalate, dibutyl phthalate, diisobutyl phthalate, diheptyl phthalate, dioctyl phthalate, dicyclohexyl phthalate, ditridecyl phthalate, butyl benzyl phthalate, diisodecyl phthalate, diphenyl phthalate, diallyl phthalate, octyl capryl phthalate, and the like. Phthalic acid esters: Triethylene glycol diacetate, tetraethylene glycol diacetate, dimethylglycol phthalate, ethyl phthalyl ethyl glycolate, methyl phthalyl ethyl glycolate, butyl phthalyl butyl glycolate, triethylene glycol dicabrylate, etc. Glycol esters of tricresyl phosphate, triphenyl phosphate, etc. Acid esters; Amides such as 4-toluenesulfonamide, benzenesulfonamide, Nn-butylbenzenesulfonamide, Nn-butylacetamide; diisobutyl adipate, dioctyl adipate, dimethyl sebacate, dibutyl sepacate, dioctyl Aliphatic dibasic acid esters such as sepacate, dioctyl azelate, dibutyl malate; triethyl citrate, tributyl citrate, glycerin triacetyl ester, butyl laurate, 4,5-diepoxycyclohexane-1,2-dicarboxylic acid Examples include glycols such as dioctyl acid, polyethylene glycol, and polypropylene glycol.

  As content of the said plasticizer, 0.1-50 mass% is preferable with respect to all the components of the said photosensitive layer, 0.5-40 mass% is more preferable, 1-30 mass% is especially preferable.

The surfactant is not particularly limited and may be appropriately selected depending on the intended purpose. For example, the surfactant is appropriately selected from an anionic surfactant, a cationic surfactant, a nonionic surfactant, an amphoteric surfactant, and the like. You can choose.
Further, as the surfactant, the following formula (1)
^{_{C 8 F 17 SO 2 N (}} R 1) CH 2 CH 2 O (CH 2 CH 2 O n R 2) ··· (1)
Fluorosurfactants represented by the formula are preferred.
However, in the formula, ^{R 1} and ^{R 2} each represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, n is an integer of 2 to 30.
Examples of R ^1, a methyl group, an ethyl group, an isopropyl group is preferably mentioned, wherein the R ² is a hydrogen atom are preferably exemplified.
As said n, 10-25 are preferable and 10-20 are more preferable.
As specific examples of the surfactant represented by the above formula, Megafac F-141 (n = 5), F-142 (n = 10), F = 143 (n = 15), F-144 (n = 20) (Brand name: Dainippon Ink & Chemicals, Inc.).

Furthermore, as the surfactant, surfactants represented by the following formulas (2) to (5) are preferably exemplified.
_{Rf1-X- (CH 2 CH 2} O) n R 1 ··· (2)
Rf1-X- (CH ₂ CH ₂ O) _n R ² (3)
_{Rf1-X- (CH 2 CH 2} O) n (CH 2 CH 2 CH 2 O) m R 1 ··· (4)
_{Rf1-X- (CH 2 CH 2} O) n (CH 2 CH 2 CH 2 O) m Rf2 ··· (5)

In the formula (2) ~ (5), R 1 and ^{R 2} are Tansomoto 18, preferably 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms.
Examples of the alkyl group include a saturated alkyl group and an unsaturated alkyl group.
Examples of the structure of the alkyl group include those having a linear structure and a branched structure, and among these, those having a branched structure are preferably exemplified.
Specific examples of the alkyl group include methyl group, ethyl group, propyl group, butyl group, heptyl group, hexyl group, octyl group, nonyl group, decyl group, dodecyl group, tridecyl group, tetradecyl group, hexadecyl group, otatadecyl group Eicosanyl group, docosanyl group, 2-chloroethyl group, 2-promoethyl group, 2-cyanoethyl group, 2-methoxycarbonylethyl group, 2-methoxyethyl group, 3-promopropyl group and the like. In addition, these alkyl groups may be substituted with a halogen atom, an acyl group, an amino group, a cyano group, an alkyl group, an alkoxy group, an aryl group which may be substituted with alkyl or haloalkyl, an amide group, or the like.
In the formulas (2) to (5), Rf1 and Rf2 each independently represent a perfluoro group having 1 to 18 carbon atoms, preferably 2 to 12 carbon atoms, more preferably 4 to 10 carbon atoms.
Examples of the perfluoro group include a saturated perfluoro group and an unsaturated perfluoro group.
Examples of the structure of the perfluoro group include those having a linear structure and a branched structure. Among these, those having a branched structure are preferred, and at least one of Rf1 and Rf2 has a branched structure. A thing is mentioned more suitably.
Examples of the perfluoro group include perfluorononenyl, perfluoromethyl, perfluoropropylene, perfluorononinel, perfluorobenzoic acid, perfluoropropylene, perfluoropropyl, perfluoro (9-methyloctyl), perfluoro Fluoromethyloctyl, perfluorobutyl, perfluoro-3-methylbutyl, perfluorohexyl, perfluorooctyl, perfluoro 7-octylethyl, fluoroheptyl, perfluorodecyl, perfluorobutyl and the like can be mentioned. These perfluoro groups may be substituted with a halogen atom, acyl group, amino group, cyano group, alkyl group, alkoxy group, alkyl or haloalkyl, or may be substituted with an aryl group, an amide group, or the like. Good.
Rf1 and Rf2 may be the same as or different from each other.
In said Formula (2)-(5), n represents the integer of 1-40, Preferably the integer of 4-25 is represented.
In said Formula (2)-(5), m represents the integer of 0-40, Preferably the integer of 0-25 is represented.
In the formula (2) ~ (5), -X- _{is, - (CH 2) l -} (l 1 to 10, preferably represents an integer of 1 to 5), - CO-O -, - O -, -NHCO-, or -NHCOO- is represented.
The surfactants represented by the formulas (2) to (5) can be used singly or in combination of two or more.

As content of the said surfactant, 0.001-10 mass% is preferable with respect to solid content of the photosensitive composition.
When the content is less than 0.001% by mass, the effect of improving the surface shape may not be obtained, and when it exceeds 10% by mass, the adhesion may be deteriorated.

  When the photosensitive composition contains the surfactant, the fluidity as a coating liquid is improved, and the adhesion of the liquid in the nozzles and pipes and containers of spin coaters and slit coaters used in the coating process. Since the residue remaining as dirt in the nozzle can be effectively reduced, the amount of cleaning liquid required for cleaning when switching the coating liquid and the work time can be reduced, and the productivity of the color filter can be improved. Can do. In addition, it is possible to improve surface unevenness that occurs when the color resist layer is formed.

The thermal polymerization inhibitor is not particularly limited and may be appropriately selected depending on the intended purpose. For example, 4-methoxyphenol, hydroquinone, alkyl or aryl-substituted hydroquinone, t-butylcatechol, pyrogallol, 2-hydroxybenzophenone 4-methoxy-2-hydroxybenzophenone, cuprous chloride, phenothiazine, chloranil, naphthylamine, β-naphthol, 2,6-di-t-butyl-4-cresol, 2,2′-methylenebis (4-methyl- 6-t-butylphenol), pyridine, nitrobenzene, dinitrobenzene, picric acid, 4-toluidine, methylene blue, copper and organic chelating agent reactant, methyl salicylate, phenothiazine, nitroso compound, chelate of nitroso compound and Al, etc. It is done.
As content of the said thermal-polymerization inhibitor, 0.0001-10 mass% is preferable with respect to all the components of a photosensitive composition, 0.0005-5 mass% is more preferable, 0.001-1 mass% is Particularly preferred.

Examples of the ultraviolet absorber include salicylate-based, benzophenone-based, benzotriazole-based, cyanoacrylate-based, nickel chelate-based, hindered amine-based compounds and the like in addition to the compounds described in JP-A-5-72724.
Specifically, phenyl salicylate, 4-t-butylphenyl salicylate, 2,4-di-t-butylphenyl-3 ′, 5′-di-t-4′-hydroxybenzoate, 4-t-butylphenyl salicylate 2,4-di-hydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2-hydroxy-4-n-octoxybenzophenone, 2- (2′-hydroxy-5′-methylphenyl) benzotriazole, 2- (2'-hydroxy-3'-t-butyl-5'-methylphenyl) -5-chlorobenzotriazole, ethyl-2-cyano-3,3-di-phenyl acrylate, 2,2'-hydroxy-4- Methoxybenzophenone, nickel dibutyldithiocarbamate, bis (2,2,6,6-tetramethol-4-pyridine) -seba 4-t-butylphenyl salicylate, phenyl salicylate, 4-hydroxy-2,2,6,6-tetramethylpiperidine condensate, succinic acid-bis (2,2,6,6-tetramethyl-4 -Piperenyl) -ester, 2- [2-hydroxy-3,5-bis (α, α-dimethylbenzyl) phenyl] -2H-benzotriazole, 7-{[4-chloro-6- (diethylamino) -5 Triazin-2-yl] amino} -3-phenylcoumarin and the like.
In addition, 0.5-15 mass% is preferable, as for content of the ultraviolet absorber with respect to the total solid of a photosensitive composition, 1-12 mass% is more preferable, and 1.2-10 mass% is especially preferable.

The photosensitive composition for forming the photosensitive layer can be prepared using a solvent.
There is no restriction | limiting in particular as said solvent, According to the objective, it can select suitably, For example, alcohols, such as methanol, ethanol, n-propanol, isopropanol, n-butanol, sec-butanol, n-hexanol; acetone , Ketones such as methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, diisobutyl ketone; esters such as ethyl acetate, butyl acetate, n-amyl acetate, methyl sulfate, ethyl propionate, dimethyl phthalate, ethyl benzoate, and methoxypropyl acetate Aromatic hydrocarbons such as toluene, xylene, benzene, ethylbenzene; halogenated carbonization such as carbon tetrachloride, trichloroethylene, chloroform, 1,1,1-trichloroethane, methylene chloride, monochlorobenzene Motorui; tetrahydrofuran, diethyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethers such as 1-methoxy-2-propanol; dimethylformamide, dimethylacetamide, dimethyl sulfoxide, and sulfolane. These may be used alone or in combination of two or more. Among these, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexane, ethyl carbitol acetate, butyl Preferred examples include carbitol acetate and propylene glycol methyl ether acetate. These solvents can be used alone or in combination of two or more.

  There is no restriction | limiting in particular as the addition amount of the said solvent at the time of preparation of the said photosensitive composition, Although it can select suitably according to the objective, The total solid content concentration of the said photosensitive composition is 5-80 mass%. It is preferable to add so that it may become, It is more preferable to add so that it may become 10-60 mass%, It is especially preferable to add so that it may become 15-50 mass%.

The thickness of the photosensitive layer is preferably 0.3 to 10 μm, more preferably 0.75 to 6 μm, and particularly preferably 1.0 to 3 μm.
If the layer thickness is less than 0.3 μm, pinholes are likely to occur when the coating solution for the photosensitive layer is applied, and the production suitability may be reduced. If the thickness exceeds 10 μm, unexposed portions are removed during development. May take a long time

<Base material>
The substrate used in the photosensitive layer forming step is not particularly limited and may be appropriately selected from known materials having high surface smoothness to those having an uneven surface according to the purpose. However, a plate-like substrate (substrate) is preferable. Specifically, a glass plate (for example, soda glass plate, glass plate sputtered with silicon oxide, non-alkali glass plate, quartz glass plate, etc.), synthetic resin property Film, paper, and metal plate.

  The base material can be used by forming a laminate formed by laminating the photosensitive layer so that the photosensitive layer in the photosensitive layer overlaps the base material. That is, by exposing the photosensitive layer of the laminate to the photosensitive layer, the exposed region can be cured, and a pattern can be formed by a development process described later.

[Exposure process]
In the exposing step, the photosensitive layer is irradiated with light, and n (where n is a natural number of 2 or more) two-dimensionally arranged pixels that receive and emit light from the light irradiating means. An exposure head having a light modulation means capable of controlling the drawing unit according to pattern information, wherein a column direction of the drawing unit is inclined at a predetermined inclination with respect to a scanning direction of the exposure head. This is a step of performing exposure by using an exposure head arranged at an angle and moving the exposure head relatively in the scanning direction.

In the drawing pattern corresponding to the pattern information, the exposure is performed so that at least one of the jaggy pitch and the jaggy amplitude of jaggy generated by being reproduced by the drawing pixels formed by the picture element portion is a predetermined value or less.
(A) an arrangement pitch of the drawing pixels formed by the adjacent picture element portions;
(B) an inclination angle of the two-dimensional drawing pixel group composed of a plurality of the drawing pixels with respect to the scanning direction;
(C) a drawing pitch of the drawing pixels with respect to the scanning direction, and (d) a phase difference of a drawing position with respect to the scanning direction of the drawing pixels formed adjacent to a direction substantially orthogonal to the scanning direction,
Is set, and the pixel part is modulated and controlled at a predetermined timing based on the pattern information.

  Hereinafter, an example of an exposure apparatus according to the exposure process of the method for producing a color filter of the present invention will be described with reference to the drawings. The exposure method in the exposure step will be clarified through the description of the exposure apparatus.

<Configuration of exposure apparatus>
<< Appearance of exposure apparatus >>
FIG. 1 shows an exposure apparatus 10 of a flat bed type that is a drawing apparatus according to an embodiment of the present invention.
The exposure apparatus 10 includes a surface plate 14 that is supported by a plurality of legs 12 and is extremely small in deformation. On the surface plate 14, an exposure stage 18 reciprocates in the direction of an arrow via two guide rails 16. It is installed as possible. The exposure stage 18 adsorbs and holds a laminate F (hereinafter referred to as “photosensitive material F”) in which the photosensitive layer is laminated on a substrate to be processed.

  A gate-shaped column 20 is installed at the center of the surface plate 14 so as to straddle the guide rail 16. Cameras 22a and 22b for detecting alignment marks recorded on the photosensitive material F are fixed to one side of the column 20, and a drawing pattern (image) is applied to the photosensitive material F on the other side. A scanner 26 in which a plurality of exposure heads 24a to 24j (drawing heads) to be formed are positioned and held is fixed.

FIG. 2 shows the configuration of each of the exposure heads 24a to 24j.
For example, laser beams L output from a plurality of semiconductor lasers constituting the light source unit 28 serving as the light irradiation unit are combined and introduced into the exposure heads 24 a to 24 j through the optical fiber 30. A rod lens 32, a reflection mirror 34, and a digital micromirror device (DMD) 36 are arranged in order at the exit end of the optical fiber 30 into which the laser beam L is introduced.

As shown in FIG. 3, the DMD 36 includes a large number of micromirrors 40 (drawing elements) arranged in a lattice on an SRAM cell (memory cell) 38 in a swingable state. A material having high reflectivity such as aluminum is deposited on the surface of the mirror 40. When a digital signal according to the drawing data is written in the SRAM cell 38, each micromirror 40 is inclined in a predetermined direction centered on a diagonal line as shown in FIGS. 4 and 5 according to the state of the signal.
4 shows a case where the micromirror 40 is tilted in the direction of the on state, and FIG. 5 shows a case where the micromirror 40 is tilted in the direction of the off state. Therefore, the laser beam L is selectively applied to the photosensitive material F in accordance with the drawing data by controlling the inclination of each micromirror 40 of the DMD 36 with the modulation signal based on the pattern information (drawing data) supplied from the control unit 42. Thus, a desired drawing pattern (image) can be drawn.

In the emission direction of the laser beam L reflected by the micromirror 40 in the on state, a large number of lenses are arranged corresponding to the first imaging optical lenses 44 and 46 that are the magnifying optical system and each micromirror 40 of the DMD 36. The microlens array 48 and the second imaging optical lenses 50 and 52, which are a zoom optical system, are sequentially arranged.
Before and after the micro lens array 48, micro aperture arrays 54 and 56 for removing stray light and adjusting the laser beam L to a predetermined diameter are disposed.

As shown in FIG. 6, the exposure heads 24 a to 24 j configured as described above are arranged in a staggered pattern in two rows in a direction orthogonal to the scanning direction of the photosensitive material F (the moving direction of the exposure stage 18).
As shown in FIG. 7, the DMD 36 incorporated in each of the exposure heads 24a to 24j is set in a state inclined at a predetermined angle with respect to the scanning direction in order to achieve a high resolution. That is, by inclining the DMD 36 with respect to the scanning direction of the photosensitive material F, the interval with respect to the direction perpendicular to the scanning direction of the micromirrors 40 constituting the DMD 36 is narrowed, thereby reducing the resolution in the direction perpendicular to the scanning direction. Can be high.
It should be noted that the exposure areas 58a to 58j by the exposure heads 24a to 24j are set so as to overlap in a direction orthogonal to the scanning direction so that a joint between the exposure heads 24a to 24j does not occur.

  FIG. 8 is a block diagram of the main part of the control circuit of the exposure apparatus 10. A control unit 42 (control means) that controls the exposure apparatus 10 includes a synchronization signal generator 64 that generates a synchronization signal based on the position data of the exposure stage 18 detected by the encoder 62, and exposure based on the generated synchronization signal. An exposure stage driving unit 66 that moves the stage 18 in the scanning direction, a drawing data storage unit 68 that stores drawing data of a drawing pattern (image) drawn on the photosensitive material F, and the DMD 36 based on the synchronization signal and the drawing data. A DMD modulator 70 that controls the modulation of the SRAM cell 38 and drives the micromirror 40 is provided.

  The control unit 42 also adjusts the synchronization signal generated by the synchronization signal generation unit 64, such as a frequency changing unit 72 (drawing timing changing unit), a phase difference changing unit 74 (phase difference changing unit), and a moving speed changing unit 75 ( It is preferable that a moving speed changing means is provided.

The frequency changing unit 72 serving as the drawing timing changing unit changes the frequency for determining the on / off control timing with respect to the scanning direction of the micromirror 40 constituting the DMD 36 and supplies the same to the synchronization signal generating unit 64 for drawing on the photosensitive material F. The interval in the scanning direction of the pixels to be adjusted is adjusted.
The phase difference changing unit 74 as the phase difference changing unit changes the phase difference of the on / off control timings of the micromirrors 40 arranged adjacent to each other in a direction substantially orthogonal to the scanning direction and supplies it to the synchronization signal generating unit 64. Then, the phase difference with respect to the scanning direction of the pixels drawn on the photosensitive material F is adjusted.
The moving speed changing unit 75 as the moving speed changing unit adjusts the moving speed of the exposure stage 18 by changing the moving speed of the exposure stage 18 and supplying the changed moving speed to the synchronization signal generating unit 64.

  Further, the control unit 42 is preferably provided with an exposure head rotation driving unit 76 (drawing pixel group rotating unit) and an optical magnification changing unit 78 (drawing magnification changing unit) as necessary.

The exposure head rotation driving unit 76 serving as the drawing pixel group rotating unit rotates the exposure heads 24a to 24j by a predetermined angle around the optical axis of the laser beam L, and scans the pixel array formed on the photosensitive material F with respect to the scanning direction. Adjust the tilt angle. Note that the inclination angle of the pixel array may be adjusted by rotating some of the optical members of the exposure heads 24a to 24j.
The optical magnification changing unit 78 as the drawing magnification changing means controls the zoom optical system 79 constituted by the second imaging optical lenses 50 and 52 of the exposure heads 24a to 24j to change the optical magnification, and the adjacent micro The arrangement pitch of pixels formed on the photosensitive material F by the mirror 40 or the drawing pitch by the same micromirror 40 is adjusted.

<< Operation of exposure apparatus >>
The exposure apparatus 10 is basically configured as described above, and the operation when performing exposure using the exposure apparatus will be described below.
After the photosensitive material F is attracted and held on the exposure stage 18, the control unit 42 drives the exposure stage driving unit 66 to move the exposure stage 18 in one direction along the guide rail 16 of the surface plate 14. When the exposure stage 18 passes between the columns 20, the cameras 22a and 22b read the alignment marks recorded at predetermined positions on the photosensitive material F. The control unit 42 calculates position correction data of the photosensitive material F based on the read position data of the alignment mark.

  After the position correction data is calculated, the control unit 42 moves the exposure stage 18 in the other direction, and starts exposing the drawing pattern (image) to the photosensitive material F by the scanner 26.

  That is, the laser beam L output from the light source unit 28 as the light irradiating means is introduced into each exposure head 24 a to 24 j via the optical fiber 30. The introduced laser beam L enters the DMD 36 from the rod lens 32 via the reflection mirror 34.

  On the other hand, the drawing data (pattern information) read from the drawing data storage unit 68 and corrected by the position correction data is modulated by the DMD modulation unit 70 at a timing according to the synchronization signal supplied from the synchronization signal generation unit 64. And supplied to the DMD 36. As a result, each micromirror 40 constituting the DMD 36 is on / off controlled at a timing according to the synchronization signal according to the drawing data.

  As shown in FIGS. 4 and 5, the laser beam L selectively reflected in the desired direction by each micromirror 40 constituting the DMD 36 is expanded by the first imaging optical lenses 44 and 46, and then microscopically reflected. It is adjusted to a predetermined diameter via the aperture array 54, the micro lens array 48, and the micro aperture array 56, and then adjusted to a predetermined magnification by the second imaging optical lenses 50 and 52 constituting the optical magnification changing unit 78. Guided to photosensitive material F.

  In this case, the exposure stage 18 moves along the surface plate 14, and a desired two-dimensional pattern is formed on the photosensitive material F by a plurality of exposure heads 24a to 24j arranged in a direction orthogonal to the moving direction of the exposure stage 18. (Hereinafter referred to as “two-dimensional image”) is drawn.

  By the way, the two-dimensional image drawn on the photosensitive material F as described above is constituted by a set of a large number of discrete pixels based on the micromirrors 40 constituting the DMD 36. In this case, the original image before drawing is reproduced by being mapped to discrete drawing points on the photosensitive material F, and therefore, from the pixel corresponding to the pixel part, depending on the relationship between the original image and the arrangement of the drawing points. In such a reproduced image, there is a risk that a jaggy having a jagged end portion of the image may occur, or a defect such as a decrease in line width accuracy of the original image may occur.

In the color filter manufacturing method according to the present invention, the exposure method can suppress the occurrence of jaggies by adjusting the arrangement of the drawing pixels formed on the photosensitive material F, and enables the formation of an appropriate drawing pattern. It is.
The parameters that define the arrangement of the drawing pixels include (a) an arrangement pitch of the drawing pixels formed by the adjacent pixel parts, and (b) a two-dimensional drawing pixel group composed of a plurality of the drawing pixels. An inclination angle with respect to the scanning direction, (c) a drawing pitch of the drawing pixels with respect to the scanning direction, and (d) a drawing position with respect to the scanning direction of the drawing pixels formed adjacent to a direction substantially orthogonal to the scanning direction. Of at least one of them, and by setting at least one of these and controlling the modulation of the picture element portion at a predetermined timing, the occurrence of jaggy can be suppressed.
As a method of adjusting the parameters (a) to (d), a control point is defined as a center point of a drawing pixel formed on the exposed surface of the photosensitive layer by the picture element unit. (E) the pitch of the control point sequence along the substantially scanning direction of the control point, (f) the arrangement direction of the control point sequence, (g) the pitch of the control point with respect to the scanning direction, and (h) the scanning direction. And a phase difference with respect to the scanning direction of the control points adjacent to each other in a direction substantially perpendicular to the scanning direction, and a method of controlling at least one of them so that the jaggy of the drawing pattern is reduced.
Hereinafter, as an example, a case where jaggy caused by one DMD 36 is suppressed will be described.

FIG. 9 is a diagram schematically showing the arrangement of a large number of micromirrors 40 constituting one DMD 36.
In FIG. 9, the scanning direction of the photosensitive material F is defined as y, the direction orthogonal to the scanning direction y is defined as x, and the row of micromirrors 40 arranged substantially along the scanning direction y is defined as a swath 77. In this case, the swath 77 is set to a predetermined angle θs with respect to the x direction (hereinafter referred to as a swath inclination angle θs (≠ 90 °)) in order to increase the resolution of the drawn image in the x direction. Two micromirrors 40 adjacent on the swath 77 are designated as DMD pixels A and B.

FIG. 10 shows a control point (hereinafter referred to as an “address grid point”) defined by the DMD 36 and defined as the center point of the drawing pixel formed by the picture element portion on the photosensitive material F as shown in FIG. And a desired drawing pattern (hereinafter, referred to as “original image”) based on the pattern information. In FIG. 9, the address lattice points are indicated by solid circles and dotted circles, and the original image 80 is indicated as a linear drawing pattern.
In this case, the original image 80 is reproduced by a plurality of address lattice points indicated by solid line circles. The laser beam L forms pixels with a predetermined beam diameter (dot diameter) centering on each address lattice point. Accordingly, the image actually formed on the photosensitive material F is an image that is wider than the outline of the address lattice points indicated by the solid line, as indicated by the outline line 82.

  As shown in FIG. 10, there are three types of address lattice points, lattice point sequence 1, lattice point sequence 2, and lattice point sequence 3. The parameters characterizing each grid point sequence include the inclination angle θgi (i = 1 to 3) of the grid point sequence 1 to 3 with respect to the x direction, and the grid point pitch pgi ( i = 1 to 3) and the row pitch dgi (i = 1 to 3) of the lattice point rows 1 to 3.

  These parameters are the arrangement pitch of the address lattice points (hereinafter also referred to as address lattice points A and B) formed on the photosensitive material F by the adjacent DMD pixels A and B (see FIG. 9) on the swath 77. ps (pitch of control point sequence (e)), swath inclination angle θs (arrangement direction of control point sequence (f)) (however, counterclockwise with respect to the x direction as +), and each address lattice point It is determined by the drawing pitch py with respect to the y direction (pitch (g) with respect to the scanning direction of the control point). Hereinafter, the relationship between these parameters will be described.

<(I) Inclination angle θgi (i = 1 to 3)>
Consider three adjacent address grid points A, B ′, B ″ shown in FIG. 11. The tilt angle θg3 of the grid point array 3 is:
θg3 = 90 ° Formula (1)
It is. In addition, regarding the inclination angles θg1 and θg2 of the grid points 1 and 2,
N1 = integer (ps · sin θs / py)
(Integer represents a truncation operation.)
N2 = N1 + 1
Then, the distance Δy1 in the y direction of the address grid points B ′ and B ″ with respect to the address grid point A,
Δy2 (the phase difference (h) of the control point adjacent to the direction substantially orthogonal to the scanning direction with respect to the scanning direction) is
Δyi = ps · sin θs−py · N1 (i = 1, 2)
It becomes. Further, the drawing pitch px in the x direction of the address lattice points A, B ′, B ″ is
px = ps · cos θs
Because
tan θgi = Δyi / py (i = 1, 2) Equation (2)
It becomes. Therefore, the inclination angles θg1 and θg2 of the lattice point rows 1 to 3 are
θgi = tan ⁻¹ {(ps · sin θs−py · Ni) / (ps · cos θs)}
(I = 1, 2) Formula (3)
It is obtained as

<(II) Lattice point pitch pgi (i = 1 to 3)>
Since the lattice point sequence 3 is composed of address lattice points arranged in the y direction,
pg3 = py Formula (4)
It is. Also,
pgi = px / cos θgi (i = 1, 2) Equation (5)
It is.

<(III) row pitch dgi (i = 1 to 3)>
The row pitch dg3 of the lattice point row 3 is
dg3 = px equation (6)
It is. Also,
dgi = py · cos θgi (i = 1, 2) Equation (7)
It is.

On the other hand, jaggies that are generated when the original image 80 is reproduced by the address lattice points are generated by the lattice point sequences 1 to 3, and therefore, the parameters of the lattice point sequences 1 to 3 obtained above and the x direction of the original image 80 are determined. It can be defined using the inclination angle θL.
In this case, jaggy is defined by jaggy pitches pj1 to pj3 and jaggy amplitudes aj1 to aj3.

<(IV) Jaggy pitch pji (i = 1 to 3)>
The jaggy pitch pji is determined by the row pitch dgi of the lattice point rows 1 to 3 and the difference between the inclination angle θgi of the lattice point rows 1 to 3 and the inclination angle θL of the original image 80 (θgi−θL).
In this case, assuming that address lattice points are continuously formed on each lattice point sequence 1 to 3, the jaggy pitch pji as an average value is
pji = dgi / sin (θgi−θL) (i = 1 to 3) Equation (8)
It becomes.

<(V) Jaggy amplitude aji (i = 1 to 3)>
FIG. 12 is an explanatory diagram of jaggy that occurs between the grid point sequence 1 and the original image 80. In this case, the distance between the intersections of the boundary of the original image 80 and the grid point row 1 is the jaggy pitch pj1.
Further, the jaggy amplitude aj1 can be defined between the lattice point sequence 1 and the lattice point sequence 2, and the lattice point sequence 1 and the lattice point sequence 3. When the smaller one of these jaggy amplitudes aj1 is selected as the jaggy amplitude aj1 as a representative value, from the relationship shown in FIG.
aj1 = pj1 · tan θ′1 · tan θ′2 / (tan θ′2−tan θ′1)
(Θ′1 = θg1−θL)
It becomes. Therefore, the jaggy amplitude aji is
aji = pji · tan θ′i · tan θ′k / (tan θ′k−tan θ′i)
(I = 1 to 3, θ′i = θgi−θL, k = 1 to 3, i ≠ k)
Formula (9)
It is. Θ′k is an angle formed by the selected lattice point sequence having a small jaggy amplitude aji and the original image 80.

Jaggy in the drawing pattern reproduced on the photosensitive material F is visually recognized when both the jaggy pitch pji and the jaggy amplitude aji are large to some extent.
Each pixel that forms the drawing pattern formed by the drawing element portion is drawn with a predetermined diameter based on the beam diameter of the laser beam L with the address lattice point shown in FIG. 10 as the center, and therefore the jaggy pitch pji is small. In this case, the jaggy is not visually recognized even if the jaggy amplitude aji is large. Therefore, in order to reduce the visibility of jaggy, it is only necessary to set parameters so that either the jaggy pitch pji or the jaggy amplitude aji is equal to or less than a predetermined value.
The predetermined values of the jaggy pitch and the jaggy amplitude can be the dot diameter of the drawing pixel formed on the exposed surface of the photosensitive layer, that is, the beam diameter of the laser beam L.

The jaggy pitch pji and the jaggy amplitude aji are obtained from the equations (1) to (9), and the drawing pixel A formed by the DMD adjacent on the inclination angle θL, swath inclination angle θs, and swath 77 with respect to the x direction of the original image 80. And the arrangement pitch ps of B and the drawing pitch py with respect to the y direction of the address lattice points.
Accordingly, (a) an arrangement pitch of the drawing pixels formed by the adjacent picture element portions corresponding to these parameters, and (b) a two-dimensional drawing pixel group composed of a plurality of the drawing pixels with respect to the scanning direction. An inclination angle, (c) a drawing pitch of the drawing pixels with respect to the scanning direction, and (d) a phase difference of a drawing position with respect to the scanning direction of the drawing pixels formed adjacent to a direction substantially orthogonal to the scanning direction. By adjusting each parameter, it is possible to suppress the occurrence of jaggy and reproduce an image with reduced jaggy. Each parameter may be individually adjusted and set, or a plurality of parameters may be adjusted simultaneously.

In this case, the inclination angle θL, that is, the inclination angle (b) of the two-dimensional drawing pixel group composed of a plurality of drawing pixels with respect to the scanning direction is determined in advance by the original image 80 formed on the photosensitive material F.
The swath tilt angle θs is determined by the tilt angle of the DMD 36 incorporated in the exposure heads 24a to 24j. This tilt angle is determined by the exposure head rotation drive unit 76 by moving the exposure heads 24a to 24j around the optical axis by a predetermined angle. It can be adjusted by rotating. Note that the tilt angle can be adjusted by rotating some of the optical members of the exposure heads 24a to 24j, for example, the microlens array 48 and the microaperture arrays 54 and 56. It is also possible to arrange an image rotating element such as a Dove prism for rotating the optical image and adjust the tilt angle by rotating the image rotating element. The image rotation element can be disposed after the second imaging optical lenses 50 and 52. In the case of an apparatus configuration in which the laser beam L is directly imaged on the photosensitive material F by the microlens array 48 without providing the second imaging optical lenses 50 and 52, the image rotation element is replaced with a microlens array. 48 can be placed after.

The arrangement pitch ps, that is, the arrangement pitch (a) of the drawing pixels formed by the adjacent picture element portions depends on the interval between the micromirrors 40 constituting the DMD 36, but is zoomed by the optical magnification changing unit 78. The arrangement pitch ps on the photosensitive material F can be adjusted by changing the positions of the second imaging optical lenses 50 and 52 constituting the optical system 79.
The drawing pitch py, that is, the drawing pitch (c) of the drawing pixels with respect to the scanning direction is adjusted by the frequency change signal from the frequency changing unit 72 by adjusting the output timing of the synchronizing signal generated by the synchronizing signal generating unit 64, or Then, the moving speed change signal from the moving speed changing unit 75 is supplied to the synchronization signal generating unit 64 to change the output timing of the synchronizing signal, and the exposure stage driving unit 66 changes the moving speed of the exposure stage 18 in the y direction. Can be adjusted.

  For the original image 80 in which the inclination angle θL changes depending on the position in the y direction, it is difficult to quickly change the swath inclination angle θs according to the inclination angle θL of the original image 80. It is appropriate to change the drawing pitch py by the changing unit 72.

  Further, the jaggy pitch pji and the jaggy amplitude aji, for example, in FIG. 10, do not draw the drawing pixels A and B formed by DMD at the same time, but instead of drawing the DMD pixels A and B in the y direction by the phase difference changing unit 74. By shifting the drawing timing by a predetermined time, the phase difference Δyi between the DMD pixels B ′ and B ″ formed adjacent to the DMD pixel A in the x direction, that is, adjacent to the scanning direction is formed. The phase difference (d) of the drawing position of the drawing pixel with respect to the scanning direction can be changed, and as a result, the inclination angle θgi can be changed and adjusted.

FIGS. 13 to 15 and FIGS. 16 to 18 show that the respective parameters are set to predetermined values, and the jaggy pitches pji and the jaggy amplitudes aji of the respective lattice point sequences 1 to 3 are set according to the equations (8) and (9). The calculation result is shown.
Note that the absolute value of the smaller value is selected for the jaggy amplitude generated between grid point sequences. Further, the allowable range of the jaggy pitch pji is -5 μm to +5 μm, and the allowable range of the jaggy amplitude aji is −1 μm to +1 μm.

  In the grid point sequence 1 shown in FIG. 13, an unacceptable jaggy occurs in the range of the tilt angle θL = 0 ° to 55 ° of the original image 80, and in the grid point sequence 2 shown in FIG. An unacceptable jaggy occurs in the range of 110 ° to 135 °, and it is predicted that no jaggy occurs in the lattice point array 3 shown in FIG. In this case, for example, if the original image 80 includes a straight line having an inclination angle of about 15 °, there is a possibility that an unacceptable jaggy due to the grid point sequence 1 may occur on the straight line.

  On the other hand, in the grid point sequences 1 to 3 shown in FIGS. 16 to 18 in which the parameters are changed, jaggies do not occur before and after the inclination angle 15 ° of the original image 80, and therefore, good drawing is achieved. It is expected that a pattern will be obtained.

As described above, the case of suppressing jaggy caused by one DMD 36 has been described, but it is needless to say that the same adjustment can be performed on each DMD 36 constituting the plurality of exposure heads 24a to 24j. That is, a plurality of drawing pixel groups each including a plurality of the pixel parts can be provided, and the average value of any one of the jaggy pitch and the jaggy amplitude generated in each of the pixel parts can be adjusted to be a predetermined value or less. .
In this case, each parameter may be adjusted individually for each DMD of the exposure heads 24a to 24j. However, in order to reduce jaggies in the entire drawn image, the jaggy pitch of the jaggy generated by each exposure head 24a to 24j. Alternatively, for example, the moving speed of the exposure stage 18 may be adjusted so that the average value of the jaggy amplitude is not more than a predetermined value.

Each parameter may be set or changed according to the pattern of the original image 80, for example, the inclination angle θL with respect to the y direction of each original image 80.
In particular, when the pattern of the original image 80 is a line pattern extending in the x direction or the direction close to the x direction in which jaggy is conspicuous, it is preferable to adjust the parameters so that the jaggy with respect to this pattern is reduced most. .

  In addition, the correlation between the jaggy shape of the original image 80 defined by the jaggy pitch or the jaggy amplitude and each parameter for adjusting the jaggy is obtained, and an optimum parameter is set based on this correlation. Alternatively, if a parameter has already been set, an appropriate image can be easily obtained by changing the parameter.

In addition, a condition for each parameter capable of keeping the shape of the jaggy within an allowable range is obtained as a selection condition, and a desired parameter corresponding to the original image 80 is selected and set, or the shape of the jaggy is determined. It is also possible to obtain a parameter condition outside the allowable range as a prohibition condition, and prohibit the selection of the parameter according to the original image 80.
As an allowable range, an arbitrary range can be set. For example, the allowable range can be set based on the line width accuracy and edge roughness of the pattern to be formed.

  The correlation between the original image 80 and each of the parameters (e) to (h) indicates the direction of the pattern constituting the original image 80, for example, the direction of the dominant pattern in a predetermined region of the original image 80, the average The direction in which the histogram of values and directions becomes maximum can be selected and obtained. The original image 80 may be divided into a plurality of regions, the correlation is obtained for each region, and a parameter capable of reducing jaggy is set for each region.

Furthermore, parameters for reducing jaggies are set by drawing an image with initial parameters set, measuring the correlation between each parameter and the jaggy shape, etc., and searching for the optimum parameters. It is also possible.
That is, the control point sequence pitch (e), the arrangement direction (f), the pitch of the control points with respect to the scanning direction (g), and the drawing pattern based on the phase difference (h), the pitch of the control point sequence ( e) at least one of the alignment direction (f), the pitch (g) of the control points with respect to the scanning direction, and the phase difference (h), and the jaggy shape defined by at least one of the jaggy pitch and the jaggy amplitude; Can be obtained by measuring the correlation.

  In the above-described exposure method, the DMD 36 in which the micromirrors 40 are arranged on orthogonal grids is used, and the exposure is performed by inclining them. If the arranged DMDs are used, the DMDs can be incorporated into the exposure heads 24a to 24j without tilting to form an image in which jaggies are suppressed.

In the above-described exposure method, the DMD 36 that is a reflective spatial light modulator is used as the light modulator. However, as the light modulator other than the DMD, a transmissive spatial light modulator ( LCD) can also be used. For example, a liquid crystal shutter such as a MEMS (Micro Electro Mechanical Systems) type spatial light modulator (SLM), an optical element (PLZT element) that modulates transmitted light by an electro-optic effect, or a liquid crystal shutter (FLC). It is also possible to use a spatial light modulation element other than the MEMS type, such as an array. Note that MEMS is a general term for micro systems that integrate micro-sized sensors, actuators, and control circuits based on micro-machining technology based on IC manufacturing processes, and MEMS-type spatial light modulators have an electrostatic force. It means a spatial light modulation element that is driven by the electromechanical operation used.
Further, a plurality of grating light valves (GLVs) arranged in a two-dimensional shape can be used. In the configuration using these reflective spatial light modulation elements (GLV) and transmissive spatial light modulation elements (LCD), a lamp or the like can be used as a light source in addition to a laser as the light irradiation means.

  In the above-described exposure method, the light irradiation means has been described with respect to a mode in which a semiconductor laser is used as a light source. However, in addition to the semiconductor laser, for example, a solid laser, ultraviolet LD, infrared LD, or the like can be used. . Furthermore, a light source (for example, an LD array, an organic EL array, etc.) in which a plurality of light emitting points are arranged two-dimensionally can also be used.

  As the exposure apparatus, the flat bed type exposure apparatus 10 is taken as an example, but an exposure apparatus other than the flat bed type may be used. For example, an outer drum type in which a photosensitive material is wound around the outer peripheral surface of the drum. The exposure apparatus may be an inner drum type exposure apparatus in which a photosensitive material is mounted on the inner peripheral surface of the cylinder.

[Development process]
The developing step includes a step of developing the photosensitive layer by exposing the photosensitive layer by the exposing step and removing an unexposed portion.
There is no restriction | limiting in particular as the removal method of the said unhardened area | region, According to the objective, it can select suitably, For example, the method etc. which remove using a developing solution are mentioned.

  There is no restriction | limiting in particular as said developing solution, Although it can select suitably according to the objective, For example, alkaline aqueous solution, an aqueous developing solution, an organic solvent etc. are mentioned, Among these, weakly alkaline aqueous solution is preferable. Examples of the basic component of the weak alkaline aqueous solution include lithium hydroxide, sodium hydroxide, potassium hydroxide, lithium carbonate, sodium carbonate, potassium carbonate, lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, sodium phosphate, phosphorus Examples include potassium acid, sodium pyrophosphate, potassium pyrophosphate, and borax.

The pH of the weak alkaline aqueous solution is, for example, preferably about 8 to 12, and more preferably about 9 to 11. Examples of the weak alkaline aqueous solution include a 0.1 to 5% by mass sodium carbonate aqueous solution or a potassium carbonate aqueous solution, and a 0.01 to 0.1% by mass potassium hydroxide aqueous solution.
The temperature of the developer can be appropriately selected according to the developability of the photosensitive layer, and is preferably about 25 ° C. to 40 ° C., for example.

  The developer includes a surfactant, an antifoaming agent, an organic base (for example, ethylenediamine, ethanolamine, tetramethylammonium hydroxide, diethylenetriamine, triethylenepentamine, morpholine, triethanolamine, etc.) and development. Therefore, it may be used in combination with an organic solvent (for example, alcohols, ketones, esters, ethers, amides, lactones, etc.). The developer may be an aqueous developer obtained by mixing water or an aqueous alkali solution and an organic solvent, or may be an organic solvent alone.

The development method is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include paddle development, shower development, shower & spin development, and dip development.
Here, the shower development will be described. The uncured portion can be removed by spraying a developer onto the exposed photosensitive resin layer by shower. In addition, it is preferable to spray an alkaline solution having low solubility of the photosensitive resin layer by a shower or the like before development to remove the thermoplastic resin layer, the intermediate layer, and the like. Further, after the development, it is preferable to remove the development residue while spraying a cleaning agent or the like with a shower and rubbing with a brush or the like.

[Other processes]
There is no restriction | limiting in particular as said other process, Although selecting suitably from the processes in a well-known color filter manufacturing method is mentioned, For example, a hardening process process etc. are mentioned. These may be used alone or in combination of two or more.

-Curing process-
It is preferable to provide a curing treatment step for performing a curing treatment on the photosensitive layer after the development step.
There is no restriction | limiting in particular as said hardening process, Although it can select suitably according to the objective, For example, a whole surface exposure process, a whole surface heat processing, etc. are mentioned suitably.

Examples of the entire surface exposure processing method include a method of exposing the entire surface of the laminate on which the pattern is formed after the developing step. The entire surface exposure accelerates the curing of the resin in the photosensitive composition forming the photosensitive layer, and the surface of the formed pattern is cured.
There is no restriction | limiting in particular as an apparatus which performs the said whole surface exposure, Although it can select suitably according to the objective, For example, UV exposure machines, such as an ultrahigh pressure mercury lamp, are mentioned suitably.

Examples of the entire surface heat treatment method include a method of heating the entire surface of the laminate on which the pattern is formed after the developing step. The whole surface heating increases the film strength of the surface of the pattern.
As heating temperature in the said whole surface heating, 120-250 degreeC is preferable and 120-200 degreeC is more preferable. When the heating temperature is less than 120 ° C., the film strength may not be improved by heat treatment. When the heating temperature exceeds 250 ° C., the resin in the photosensitive composition is decomposed, and the film quality is weak and brittle. Sometimes.
As heating time in the said whole surface heating, 10 to 120 minutes are preferable and 15 to 60 minutes are more preferable.
There is no restriction | limiting in particular as an apparatus which performs the said whole surface heating, According to the objective, it can select suitably from well-known apparatuses, For example, a dry oven, a hot plate, IR heater etc. are mentioned.

In the method for producing a color filter of the present invention, as described above, a pixel composed of at least three colors (for example, RGB) is formed in a mosaic pattern on a transparent substrate such as a glass substrate by the pattern forming method of the present invention. They can be arranged in stripes.
There is no restriction | limiting in particular as a dimension of each pixel, According to the objective, it can select suitably, For example, it is preferable to set it as 40-200 micrometers. In the case of a stripe shape, a width of 40 to 200 μm is usually used.
As a method for producing the color filter, for example, using a photosensitive layer colored black on a transparent substrate, exposure and development were performed to form a black matrix, and then the color filter was colored in one of the three primary colors of RGB. A color in which the three primary colors of RGB are arranged in a mosaic or stripe pattern on the transparent substrate by repeating exposure and development sequentially for each color in a predetermined arrangement with respect to the black matrix using a photosensitive layer. The method of forming a filter is mentioned.

(Color filter)
The color filter of the present invention is manufactured by the method for manufacturing the color filter of the present invention.
The color filter has a pigment C.I. I. Pigment Red 254, green (G) coloring pigment C.I. I. Pigment green 36 and pigment C.I. I. Pigment Yellow 139, as well as blue (B) coloring pigment C.I. I. When manufactured using CI Pigment Blue 15: 6, the chromaticities of all the single colors of red (R), green (G), and blue (B) by the D65 light source are, for example, values shown in Table 1 below. It becomes. Within this range, the colors of the reflection mode and the transmission mode are balanced.

Here, the chromaticity is measured by a microspectroscopy hardness meter (manufactured by Olympus Optical Co., Ltd., OSP100 or 200), calculated as a result of a D65 light source field of view of 2 degrees, and expressed as an xyY value of the xyz color system. Further, the difference from the target chromaticity is represented by the ΔE ^* ab value of the L ^* a ^* b ^* color system.

  The color filter has a pigment C.I. I. Pigment red 254 and C.I. I. Pigment Red 177, pigment C.I. I. Pigment green 36 and pigment C.I. I. Pigment Yellow 150, and blue (B) coloring pigment C.I. I. Pigment blue 15: 6 and C.I. I. When manufactured using Pigment Violet 23, the chromaticities of all the single colors of red (R), green (G), and blue (B) by the F10 light source are, for example, the values shown in Table 2 below. . If it is this range, it is preferable as a color filter for TV with a wide color reproduction range and high color temperature.

Here, the chromaticity is measured with a microspectroscopy hardness meter (manufactured by Olympus Optical Co., Ltd., OSP100 or 200), calculated as a result of the F10 light source field of view of 2 degrees, and expressed as an xyY value of the xyz color system. Further, the difference from the target chromaticity is represented by the ΔE ^* ab value of the L ^* a ^* b ^* color system.

(Display device)
The display device of the present invention includes a liquid crystal sealed between a pair of substrates arranged opposite to each other, includes the color filter of the present invention, and further includes other members as necessary. Become.
The color filter of the present invention is not only intended to be formed on the counter substrate of the display device (the substrate on the side where there is no active element such as TFT), but also the COA method formed on the TFT substrate side, and only black on the TFT substrate side. The BOA method to be formed or the HA method having a high aperture structure on the TFT substrate can also be targeted.

An overcoat film or a transparent conductive film can be further formed on the color filter as necessary. After that, liquid crystal is sealed between the color filter and the counter substrate, and a display device is manufactured.
The liquid crystal display method to be applied is not particularly limited and is appropriately selected according to the purpose. For example, ECB (Electrically Controlled Birefringence), TN (Twisted Nematic), OCB (Optically Compensatory Bend), VA (Vertically Aligned), HAN (Hybrid Aligned Nematic), STN (Supper Twisted Nematic), IPS (In-Plane Switching), GH (Guest Host), FLC (ferroelectric liquid crystal), AFLC (antiferroelectric liquid crystal), and PDLC (Polymer dispersed liquid crystal).

  The basic configuration of the display device includes (1) a driving side substrate in which driving elements such as thin film transistors (hereinafter referred to as “TFTs”) and pixel electrodes (conductive layers) are arranged, a color filter, A color filter side substrate provided with a counter electrode (conductive layer) is disposed opposite to each other with a spacer interposed therebetween, and a liquid crystal material is sealed in the gap, and (2) the color filter is directly on the drive side substrate. Examples include a configuration in which the formed color filter integrated drive substrate and a counter substrate including a counter electrode (conductive layer) are arranged to face each other with a spacer interposed therebetween, and a liquid crystal material is sealed in the gap portion. .

The display device of the present invention can display a clear color in both the transmission mode and the reflection mode by using the color filter of the present invention having a good chromaticity in the D65 light source field of view of 2 degrees. And a device such as a portable terminal and a portable game machine that also use the reflection mode.
In addition, the display device of the present invention can achieve high color purity and color temperature by using the color filter of the present invention having good chromaticity in the F10 light source field of view of 2 degrees. It can be suitably used for a display device or the like.

  EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited thereto. Unless otherwise specified, “parts”, “%” and “molecular weight” represent “parts by mass”, “mass%” and “weight average molecular weight”, respectively.

Example 1
<Color filter pattern formation (coating method)>
(1) Formation of black matrix An alkali-free glass substrate was cleaned with a UV cleaning apparatus, then with a cleaning agent by brush cleaning, and further ultrasonically cleaned with ultrapure water. The substrate was heat-treated at 120 ° C. for 3 minutes to stabilize the surface state. After cooling the substrate and adjusting the temperature to 23 ° C., the composition described in Table 3 below is applied on a glass substrate coater (manufactured by FS Japan Co., Ltd., trade name: MH-1600) having a slit-like nozzle. The photosensitive composition K1 which consists of was apply | coated. Subsequently, after part of the solvent was dried by VCD (vacuum drying device, manufactured by Tokyo Ohka Kogyo Co., Ltd.) for 30 seconds to eliminate the fluidity of the coating layer, the substrate was surrounded by EBR (edge bead remover). Unnecessary coating solution was removed and prebaked at 120 ° C. for 3 minutes to form a photosensitive layer K1 having a thickness of 2 μm.

-Preparation of photosensitive composition K1-
K pigment dispersion 1 and propylene glycol monomethyl ether acetate in the amounts shown in Table 3 below were weighed out, mixed at a temperature of 24 ° C. (± 2 ° C.), and stirred at 150 rpm for 10 minutes. Next, methyl ethyl ketone, binder 2, hydroquinone monomethyl ether, DPHA solution, B-CIM (manufactured by Hodogaya Chemical Industry Co., Ltd.), NBCA (manufactured by Kurokin Kasei Co., Ltd.), N-phenyl mercaptobenzimidazole, in amounts shown in Table 3 below. The surfactant 1 was weighed and added in this order at a temperature of 25 ° C. (± 2 ° C.), stirred at a temperature of 40 ° C. (± 2 ° C.) at 150 RPM for 30 minutes, and filtered through a nylon mesh # 200. The photosensitive composition K1 was prepared by the above.

Of the compositions listed in Table 3,
The composition of K pigment dispersion 1 is 13.1% by mass of carbon black (Degussa), 0.65% by mass of a dispersant represented by the following formula (6), polymer (benzyl methacrylate / methacrylic acid = 72 / 28 mol ratio random copolymer, molecular weight 37,000) 6.72% by mass, and propylene glycol monomethyl ether acetate 79.53% by mass.
The composition of the binder 2 is composed of 27% by mass of a polymer (random copolymer of benzyl methacrylate / methacrylic acid = 78/22 molar ratio, molecular weight 38,000) and 73% by mass of propylene glycol monomethyl ether acetate.
The composition of the DPHA solution is composed of 76% by mass of dipentaerythritol hexaacrylate (containing 500 ppm of polymerization inhibitor MEHQ, manufactured by Nippon Kayaku Co., Ltd., trade name: KAYARAD DPHA), and 24% by mass of propylene glycol monomethyl ether.
The composition of the surfactant 1 is composed of 30% by mass of the following structure 1 and 70% by mass of methyl ethyl ketone (MEK).

However, in the formula of the structure 1, the numerical values of x and y represent a molar ratio.

-Exposure process-
The photosensitive layer K1 on the substrate is exposed to a black matrix pattern corresponding to 20 mJ / cm ^{2 with} a laser beam having a wavelength of 405 nm by an exposure apparatus and an exposure method described below, and a part of the photosensitive layer is exposed. The area of was cured. The exposure was performed in an N ₂ atmosphere so that a 15-step step wedge pattern (ΔOD = 0.15) and a stripe pattern with a line width of 25 μm were obtained.

<< Exposure equipment >>
As the exposure apparatus, the flat bed type exposure apparatus having the appearance shown in FIG. 1 and the exposure head having the configuration shown in FIG. 2 was used. The control unit 42 has a control circuit shown in FIG. In the exposure head, a semiconductor laser light source as the light irradiating means, and 1024 micromirrors 40 are arranged in the main scanning direction in the DMD 36 schematically shown in FIG. 3 as the light modulating means, and 768 in the sub scanning direction. A DMD 36 controlled so as to drive only 1024 × 256 rows among the array is provided.
The exposure head was arranged so that the DMD column direction was 15 ° with respect to the scanning direction, and exposure was performed by moving the exposure head relative to the scanning direction.

  Each parameter was set in the same manner as the values shown in FIG. 16, and exposure was performed. At this time, as apparent from FIG. 16, it is expected that no jaggy occurs before and after the inclination angle of 15 ° of the original image 80 and a good drawing pattern is obtained.

-Development process-
After the exposure is completed, pure water is sprayed onto the surface of the photosensitive layer K1 using a shower nozzle so as to be uniformly moistened, and then a KOH developer (KOH, containing a nonionic surfactant, trade name: CDK-1, FUJIFILM Electronics Materials Co., Ltd.) shower development at 23 ° C. for 80 seconds with a flat nozzle pressure of 0.04 MPa, and then spray ultrapure water at a pressure of 9.8 MPa using an ultrahigh pressure cleaning nozzle. The residue was removed to obtain a black matrix pattern. Thereafter, heat treatment was performed at 220 ° C. for 30 minutes.

(2) Formation of red (R) pixels The following photosensitive composition R1 having the composition described in Table 4 below is used on the substrate on which the black matrix is formed, and heat treatment is performed by the same process as the formation of the black matrix. An R pixel was formed. The R1 photosensitive layer thickness was 1.5 μm, and the coating amount of the pigment (CI Pigment Red 254) was 0.274 g / m ² .

-Preparation of photosensitive composition R1-
R pigment dispersion 1, R pigment dispersion 2, and propylene glycol monomethyl ether acetate in the amounts shown in Table 4 below were weighed out, mixed at a temperature of 24 ° C. (± 2 ° C.), and stirred at 150 rpm for 10 minutes. Subsequently, methyl ethyl ketone, cyclohexanone, binder 1, DPHA solution, B-CIM (manufactured by Hodogaya Chemical Co., Ltd.), NBCA (manufactured by Kurokin Kasei Co., Ltd.), N-phenyl mercaptobenzimidazole, and phenothiazine in the amounts shown in Table 4 below. Were added in this order at a temperature of 24 ° C. (± 2 ° C.) and stirred at 150 rpm for 30 minutes. Furthermore, the surfactant 1 in the amount shown in Table 4 below was weighed, added at a temperature of 24 ° C. (± 2 ° C.), stirred at 30 rpm for 5 minutes, and filtered through a nylon mesh # 200. By the above, photosensitive composition R1 was prepared.

Of the compositions listed in Table 4,
The composition of R pigment dispersion 1 is C.I. I. Pigment Red 254 (manufactured by Ciba Specialty Chemicals) 8% by mass, 0.8% by mass of a dispersant represented by the formula (6), a polymer (benzyl methacrylate / methacrylic acid = 72/28 molar ratio random copolymer, (Molecular weight 37,000) 8% by mass and propylene glycol monomethyl ether acetate 83% by mass.
The composition of R pigment dispersion 2 is C.I. I. Pigment Red 254 (manufactured by Ciba Specialty Chemicals) 5.3 mass%, acrylic acid mono (dimethylaminopropyl) amide / methacrylic acid (polyethylene glycol monomethyl ether) ester / methacrylic acid (polymethyl methacrylate-containing alcohol) ester 1.6 mass %, Propylene glycol monomethyl ether acetate 93% by mass.
The composition of the binder 1 is composed of 27% by mass of a polymer (random copolymer of benzyl methacrylate / methacrylic acid / methyl methacrylate = 38/25/37, molecular weight 38,000) and 73% by mass of propylene glycol monomethyl ether acetate.

-Exposure process and development process-
The photosensitive layer R1 on the substrate was exposed in the same manner as the photosensitive layer K1. The exposure amount was 20 mJ / cm ² . Further, for the evaluation, the photosensitive layer R1 was similarly formed on a substrate on which a black matrix was not formed, and a color filter pattern, a sensitivity evaluation pattern, and a resolution evaluation pattern (many holes having different diameters were formed. Pattern) and the step wedge pattern were used for the same processing. Then, it developed and heat-processed by the method similar to the formation method of a black matrix.

[Evaluation]
The formed red (R) color filter pattern (pixel) was evaluated for exposure sensitivity, resolution, jaggy generation, and unevenness by the following methods. The results are shown in Table 10 below.

<Exposure sensitivity>
In the obtained red (R) color filter pattern (pixel), the thickness of the cured region of the remaining photosensitive layer was measured. Subsequently, a sensitivity curve is obtained by plotting the relationship between the irradiation amount of the laser beam and the thickness of the cured layer. From the sensitivity curve thus obtained, the thickness of the cured region on the substrate is 1.5 μm, and the amount of light energy when the surface of the cured region is a glossy surface is the amount of light energy necessary to cure the photosensitive layer. .

<Resolution>
The surface of the obtained red (R) resolution evaluation pattern-formed substrate was observed with an optical microscope, and the minimum hole diameter with no residual film in the hole portion of the cured layer pattern was measured. . The smaller the numerical value, the better the resolution.

<Jaggie occurrence>
Using the exposure apparatus, the laminated body was irradiated and exposed so that a horizontal line pattern in a direction orthogonal to the scanning direction of the exposure head was formed, thereby forming a pattern.
Among the formed patterns, arbitrary five portions of a line having a line width of 30 μm were observed using a laser microscope (VK-9500, manufactured by Keyence Corporation; objective lens 50 ×) to evaluate the presence or absence of jaggy. The allowable range of the jaggy pitch pji was −5 μm to +5 μm, the allowable range of the jaggy amplitude aji was −1 μm to +1 μm, and those outside the allowable range were evaluated as having jaggy.

<Coating unevenness>
For evaluation, the substrate immediately after the formation of only the red (R) photosensitive layer was irradiated with an Na lamp obliquely in a dark room and visually observed to determine the presence or absence of unevenness.

<Display unevenness>
The substrate with the pixels on which patterning was completed (only the red (R) photosensitive layer was formed for evaluation) was irradiated obliquely with a Na lamp in a dark room and visually observed to determine whether or not unevenness had occurred. .
In addition, evaluation of these nonuniformity showed the example of red (R) from a viewpoint that nonuniformity is easy to observe.

(3) Formation of green (G) pixels The following photosensitive composition G1 having the composition shown in Table 5 below is used on the substrate on which the black matrix and red (R) pixels are formed, and is the same as the formation of the black matrix. Through this process, a heat-treated green (G) pixel was formed. The G1 photosensitive layer thickness is 1.4 μm, the coating amount of the pigment (CI Pigment Green 36) is 0.355 g / m ² , and the coating amount of the pigment (CI Pigment Yellow 139) is 0.052 g. / M ² . Exposure, development, and heat treatment were performed in the same manner as the black matrix formation method. The exposure amount was equivalent to 40 mJ / cm ² .

-Preparation of photosensitive composition G1-
G pigment dispersion 1, Y pigment dispersion 1 and propylene glycol monomethyl ether acetate in the amounts shown in Table 5 below were weighed out, mixed at a temperature of 24 ° C. (± 2 ° C.), and stirred at 150 rpm for 10 minutes. Next, the amounts of methyl ethyl ketone, binder 1, DPHA solution, B-CIM (Hodogaya Chemical Co., Ltd.), NBCA (Kurokin Kasei Co., Ltd.), N-phenyl mercaptobenzimidazole, and phenothiazine in the amounts shown in Table 5 below are measured. Were added in this order at a temperature of 24 ° C. (± 2 ° C.) and stirred at 150 rpm for 30 minutes. Further, the surfactant 1 in the amount shown in Table 5 below was weighed, added at a temperature of 24 ° C. (± 2 ° C.), stirred at 30 rpm for 5 minutes, and filtered through a nylon mesh # 200. The photosensitive composition G1 was prepared by the above.

In addition, among the compositions described in Table 5,
The composition of G pigment dispersion 1 is C.I. I. Pigment Green 36 (manufactured by Toyo Ink Manufacturing Co., Ltd., dispersion) 18% by mass, polymer (benzyl methacrylate / methacrylic acid = 72/28 molar ratio random copolymer, molecular weight 37,000) 12% by mass, cyclohexanone 35% by mass %, Propylene glycol monomethyl ether acetate 35% by mass.
The composition of the Y pigment dispersion 1 is C.I. I. Pigment Yellow 139 (manufactured by Toyo Ink Mfg. Co., Ltd., trade name: Pariol Yellow L1820) 18% by mass, polymer (random copolymer of benzyl methacrylate / methacrylic acid = 72/28 molar ratio, molecular weight 38,000) 15 It consists of 15% by mass of cyclohexanone, 52% by mass of propylene glycol monomethyl ether acetate.

(4) Formation of blue (B) pixel On the substrate on which the black matrix, red (R) pixel, and green (G) pixel are formed, the following photosensitive composition B1 having the composition described in Table 6 below is used. Through the same process as the formation of the black matrix, heat-treated blue (B) pixels were formed, and a target color filter was produced.
The film thickness of the B1 photosensitive layer was 1.4 μm, and the coating amount of pigment (CI Pigment Blue 15: 6) was 0.29 g / m ² . Exposure, development, and heat treatment were performed in the same manner as the K photosensitive layer. The exposure amount was 50 mJ / cm ² .

-Preparation of photosensitive composition B1-
B pigment dispersion 1 and propylene glycol monomethyl ether acetate in the amounts shown in Table 6 below were weighed out, mixed at a temperature of 24 ° C. (± 2 ° C.), and stirred at 150 rpm for 10 minutes. Next, the amounts of methyl ethyl ketone, binder 2, DPHA solution, B-CIM (Hodogaya Chemical Co., Ltd.), NBCA (Kurokin Kasei Co., Ltd.), N-phenyl mercaptobenzimidazole, and phenothiazine are measured in the amounts shown in Table 6 below. And added in this order at a temperature of 25 ° C. (± 2 ° C.) and stirred at a temperature of 40 ° C. (± 2 ° C.) at 150 rpm for 30 minutes. Furthermore, the surfactant 1 in the amount shown in Table 6 below was weighed out, added at a temperature of 24 ° C. (± 2 ° C.), stirred at 30 RPM for 5 minutes, and filtered through nylon mesh # 200. By the above, photosensitive composition B1 was prepared.

Of the compositions listed in Table 6,
The composition of B pigment dispersion 1 is C.I. I. Pigment Blue 15: 6 (manufactured by Toyo Ink Mfg. Co., Ltd.) 10% by mass, Dispersant 1 (EFKA-6745, EFKA ADDITIVES B.V) 0.5% by mass, Dispersant 2 (Disparon DA-725, Enomoto) (Made by Kasei Co., Ltd.) 0.63% by mass, polymer (benzyl methacrylate / methacrylic acid = 72/28 molar ratio random copolymer, molecular weight 37,000) 12.5% by mass, propylene glycol monomethyl ether acetate 76. 37% by mass

(Example 2)
[Color filter pattern formation (film method)]
<Production of photosensitive transfer material>
On a 75 μm-thick polyethylene terephthalate (PET) film temporary support, a coating solution for a thermoplastic resin layer having the following formulation H1 was applied and dried using a slit nozzle. Next, an intermediate layer coating solution having the following formulation P1 was applied and dried. Further, the colored photosensitive resin composition K1 is applied and dried, and a thermoplastic resin layer having a dry film thickness of 14.6 μm, an intermediate layer having a dry film thickness of 1.6 μm, and a dry layer are dried on the temporary support. A photosensitive resin layer having a thickness of 2 μm was provided, and a protective film (12 μm thick polypropylene film) was pressure-bonded.
Thus, a photosensitive resin transfer material K1 in which the temporary support, the thermoplastic resin layer, the intermediate layer (oxygen barrier film), and the black (K) photosensitive resin layer were integrated was produced.

-Coating solution for thermoplastic resin layer: Preparation of formulation H1-
11.1 parts by mass of methanol, 6.36 parts by mass of propylene glycol monomethyl ether acetate, 52.4 parts by mass of methyl ethyl ketone, methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer (copolymerization composition ratio (molar ratio)) = 55 / 11.7 / 4.5 / 28.8, molecular weight = 100,000, Tg≈70 ° C.) 5.83 parts by mass, styrene / acrylic acid copolymer (copolymerization composition ratio (molar ratio)) = 63 / 37, molecular weight = 10,000, Tg≈100 ° C.) 13.6 parts by mass, compound obtained by dehydration condensation of 2 equivalents of bisphenol A and pentaethylene glycol monomethacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., 2,2-bis [ 4- (methacryloxypolyethoxy) phenyl] propane) 9.1 parts by weight and the surfactant 1 0.54 parts by weight. A thermoplastic resin layer coating liquid was prepared.

-Coating solution for intermediate layer: Preparation of formulation P1-
32.2 parts by mass of PVA205 (polyvinyl alcohol, manufactured by Kuraray Co., Ltd., degree of saponification = 88%, degree of polymerization 550), polyvinylpyrrolidone (manufactured by ASP Japan Co., Ltd., K-30) 14.9 parts by mass, distillation An intermediate layer coating solution comprising 524 parts by mass of water and 429 parts by mass of methanol was prepared.

Next, except that the photosensitive composition K1 used in the production of the photosensitive transfer material K1 was changed to the following photosensitive compositions R101, G101 and B101 having the compositions shown in Tables 7 to 9 below. Photosensitive transfer materials R101, G101, and B101 were produced by the same method as described above.
In addition, the preparation method of photosensitive composition R101, G101, and B101 is based on the preparation method of the said photosensitive composition R1, G1, and B1, respectively.

(1) Formation of red (R) pixel An alkali-free glass substrate was washed with a rotating brush having nylon hair while spraying a glass detergent solution adjusted to 25 ° C. for 20 seconds by shower, and after washing with pure water shower, a silane cup A ring solution (0.3% by mass aqueous solution of N-β (aminoethyl) γ-aminopropyltrimethoxysilane, trade name: KBM603, manufactured by Shin-Etsu Chemical Co., Ltd.) was sprayed with a shower for 20 seconds and washed with pure water by shower. This substrate was heated at 100 ° C. for 2 minutes with a substrate preheating device and sent to the next laminator.
After peeling off the protective film of the photosensitive resin transfer material R101, a laminator (Lamic II type, manufactured by Hitachi Industries, Ltd.) was used to heat the substrate heated to 100 ° C, with a rubber roller temperature of 130 ° C and a linear pressure of 100N. / Cm, laminating at a conveyance speed of 2.2 m / min.

-Exposure process-
After peeling off the protective film, the exposure apparatus of Example 1 was used to irradiate a laser beam having a wavelength of 405 nm by irradiating a 15-step step wedge pattern (ΔOD = 0.15), a stripe shape and a dot shape, A part of the photosensitive layer was cured. In the same manner as in Example 1, in addition to the color filter pattern, a color filter pattern, a sensitivity evaluation pattern, and a resolution evaluation pattern were also formed on a substrate on which no black matrix was formed. The exposure amount was 20 mJ / cm ² and was performed in an air atmosphere.

-Development process-
Next, in a triethanolamine developer (2.5% by mass of triethanolamine, nonionic surfactant, polypropylene antifoam, trade name: T-PD1, manufactured by Fuji Photo Film Co., Ltd.) Shower development was performed at 30 ° C. for 50 seconds and a flat nozzle pressure of 0.04 MPa to remove the thermoplastic resin layer and the intermediate layer.
Subsequently, a sodium carbonate-based developer (0.06 mol / liter sodium bicarbonate, sodium carbonate of the same concentration, 1% sodium dibutylnaphthalenesulfonate, anionic surfactant, antifoaming agent, stabilizer, trade name: T-CD1, manufactured by Fuji Photo Film Co., Ltd.) was used for shower development at 35 ° C. for 35 seconds and a cone type nozzle pressure of 0.15 MPa to develop the photosensitive resin layer to obtain a patterned pixel.
Subsequently, detergent (phosphate, silicate, nonionic surfactant, antifoaming agent, stabilizer included, trade name: T-SD1, manufactured by Fuji Photo Film Co., Ltd., or sodium carbonate, phenoxyoxyethylene surfactant Containing, product name: T-SD2, manufactured by Fuji Photo Film Co., Ltd.), removing residue with a rotating brush having a shower and nylon bristles at 33 ° C. for 20 seconds and a cone type nozzle pressure of 0.02 MPa. A pixel of (R) was obtained. Thereafter, the substrate was further post-exposed with light of 500 mJ / cm ^{2 with} an ultrahigh pressure mercury lamp from the resin layer side, and then heat-treated (baked) at 220 ° C. for 15 minutes.
The film thickness of the R101 photosensitive layer was 2.0 μm, and the coating amount of pigment (CI Pigment Red 254) was 0.314 g / m ² .
The substrate on which the red (R) pixels were formed was again cleaned with a brush as described above, and after pure water shower cleaning, the silane coupling liquid was not used and the substrate was sent to a substrate preheating device.

  The sensitivity evaluation pattern and the resolution evaluation pattern were evaluated in the same manner as in Example 1 for exposure sensitivity, resolution, presence / absence of jaggies, and unevenness. The results are shown in Table 10 below.

(2) Formation of Green (G) Pixel Using the photosensitive transfer material G101, a heat-treated green (G) pixel was produced in the same process as the photosensitive transfer material R101. The exposure amount was 40 mJ / cm ² .
The photosensitive layer thickness of G101 is 2.0 μm, the coating amount of pigment (CI Pigment Green 36) is 0.396 g / m ² , and the coating amount of pigment (CI Pigment Yellow 139) is 0.0648 g. / M ² .
The substrate on which the red (R) and green (G) pixels are formed is again cleaned with a brush as described above, and after pure water shower cleaning, the silane coupling solution is not used and sent to the substrate preheating device. It was.

(3) Formation of Blue (B) Pixel Using the photosensitive transfer material B101, a heat-treated blue (B) pixel was produced in the same process as the photosensitive transfer material R101. The exposure amount was 50 mJ / cm ² .
The B101 photosensitive layer thickness was 2.0 μm, and the coating amount of the pigment (CI Pigment Blue 15: 6) was 0.32 g / m ² .
The substrate on which the red (R), green (G), and blue (B) pixels are formed is again cleaned with a brush as described above, and after washing with pure water, the substrate is used without using a silane coupling liquid. Sent to preheater.

(4) Formation of Black (K) Image and Black Matrix Using the photosensitive transfer material K1, in the same process as the photosensitive transfer material R101, a heat-treated black (K) image (the frame portion of the color filter) Formation) and a black matrix portion.
The exposure amount was 80 mJ / cm ² , and a 15-step step wedge pattern (ΔOD = 0.15) and a stripe pattern with a line width of 25 μm were obtained.

From the results of Table 10, since the color filter patterns of Examples 1 and 2 have little coating unevenness and display unevenness, exposure sensitivity and resolution are high, and generation of jaggies is suppressed, the method for producing the color filter of the present invention It was confirmed that a good color filter can be produced.

[Production and Evaluation of Display Device]
A reflective / transmissive display device having an LED backlight was produced using the color filters of Examples 1 and 2. It confirmed that the display apparatus using the color filter of Examples 1-2 showed a favorable display characteristic.

(Example 3)
[Color filter pattern formation] (for TV, coating method)
(1) Formation of Black Matrix In Example 1, a black matrix is formed in the same manner as in Example 1 except that exposure was performed with the parameters in the exposure apparatus set in the same manner as the values shown in FIG. did.

(2) Formation of Red (R) Pixels Using the photosensitive composition R2 having the composition shown in Table 11 below, exposure is performed by setting the parameters in the exposure apparatus in the same manner as the values shown in FIG. Except for the above, it was formed in the same manner as in Example 1. The coating film thickness was 2.0 μm.
Of the compositions listed in Table 11,
The composition of the R pigment dispersion 3 is C.I. I. 18 parts of Pigment Red 177 (manufactured by Ciba Specialty Chemicals), 12 parts of a polymer (random copolymer of benzyl methacrylate / methacrylic acid = 72/28 molar ratio), and 70 parts of propylene glycol monomethyl ether acetate.

(3) Formation of Green (G) Pixel Using photosensitive composition G2 having the composition shown in Table 12 below, exposure is performed with the parameters in the exposure apparatus set to the same values as shown in FIG. Except for the above, it was formed in the same manner as in Example 1. The coating film thickness was 1.6 μm.
Of the compositions shown in Table 12, Y Pigment Dispersion 2 was manufactured by using Gokoku Color Co., Ltd., trade name: CF Yellow EX3393.

(4) Formation of Blue (B) Pixels Using photosensitive composition B2 having the composition shown in Table 13 below, exposure was performed with the parameters in the exposure apparatus set to the same values as shown in FIG. Except for the above, it was formed in the same manner as in Example 1. The coating film thickness was 1.6 μm.
Of the compositions listed in Table 13,
-As the B pigment dispersion 2, the product name: CF Blue EX3357 manufactured by Mikuni Color Co., Ltd. was used.
-As the B pigment dispersion 3, the product name: CF blue EX3383 made from Mikuni Color Co., Ltd. was used.
The composition of the binder 3 is 27% by mass (random copolymer of benzyl methacrylate / methacrylic acid / methyl methacrylate = 36/22/42 molar ratio, molecular weight 38,000), and 73% by mass of propylene glycol monomethyl ether acetate. .

Example 4
[Color filter pattern formation] (for TV, film method)
(1) Formation of Black Matrix A black matrix was formed in the same manner as in Example 2 except that exposure was performed by setting the parameters in the exposure apparatus in the same manner as the values shown in FIG. However, the formation order was black (black matrix) first, and the black matrix and the peripheral frame portion were formed.

(2) Formation of Red (R) Pixels Using the photosensitive composition R102 having the composition shown in Table 14 below, exposure is performed with the parameters in the exposure apparatus set to the same values as shown in FIG. Except for the above, it was formed in the same manner as in Example 2. The coating film thickness was 2.0 μm.
In addition, among the compositions described in Table 14, the phosphate ester special activator 1 used was trade name: HIPLAAD ED152 manufactured by Enomoto Kasei Co., Ltd.

(3) Formation of Green (G) Pixel Using photosensitive composition G102 having the composition shown in Table 15 below, exposure was performed with the parameters in the exposure apparatus set to the same values as shown in FIG. Except for the above, it was formed in the same manner as in Example 2. The coating film thickness was 2.0 μm.

(4) Formation of blue (B) pixels Using photosensitive composition B102 having the composition shown in Table 16 below, exposure is performed with the parameters in the exposure apparatus set to the same values as shown in FIG. Except for the above, it was formed in the same manner as in Example 2. The coating film thickness was 1.6 μm.

  In Examples 3 and 4, the exposure sensitivity, resolution, presence / absence of jaggies, and unevenness were evaluated in the same manner as in Examples 1 and 2. The results are shown in Table 17.

From the results shown in Table 17, it can be seen that the color filter patterns of Examples 3 and 4 have less coating unevenness and display unevenness, high exposure sensitivity and resolution, and a good color filter can be produced by the method for producing a color filter of the present invention. It was.

<Evaluation of line width variation of black (K) image>
In the black matrix formed in the stripe shape of Examples 1 to 4, a line near the center of the screen was lined using a laser microscope (VK-9500, manufactured by Keyence Corporation; objective lens 50 times) over a length of 10 cm. The width was measured and the variation was obtained. The results are shown in Table 18.

(Comparative Example 1)
In Example 1, except that the exposure was performed without setting and changing each parameter, a color filter was formed in the same manner as in Example 1, and the presence or absence of jaggy occurrence of red (R) pixels was evaluated. The occurrence of jaggy was confirmed.
Further, the line width variation of the black matrix was evaluated by the same method as described above. The results are shown in Table 18.

(Comparative Example 2)
In Example 2, except that the exposure was performed without setting and changing each parameter, a color filter was formed in the same manner as in Example 2, and the presence or absence of jaggy occurrence of red (R) pixels was evaluated. The occurrence of jaggy was confirmed.
Further, the line width variation of the black matrix was evaluated by the same method as described above. The results are shown in Table 18.

From the results of Table 18, as compared with the black matrices of Comparative Examples 1 and 2, the line width variation of the black matrices of Examples 1 to 4 in which exposure was performed by setting the parameters during exposure so as to reduce jaggy. It turned out to be small and high definition.

  The color filter manufacturing method of the present invention forms a desired drawing pattern with reduced jaggies on the exposed surface without reducing the exposure speed, thereby forming a color filter pattern (color pixel and black image). The color filter manufactured by the method of manufacturing the color filter has excellent display characteristics and can be formed efficiently with high definition, in particular, with very little variation in the line width of the black image. It is suitable for liquid crystal display devices (LCD) such as personal computers and television monitors, PALC (plasma address liquid crystal), plasma displays, and the like.

FIG. 1 is an external perspective view of the exposure apparatus. FIG. 2 is a schematic block diagram of an exposure head in the exposure apparatus. FIG. 3 is a partially enlarged view showing a configuration of a digital micromirror device (DMD) as a light modulation means. FIG. 4 is an explanatory diagram when the micromirrors constituting the DMD shown in FIG. 3 are set to the on state. FIG. 5 is an explanatory diagram when the micromirrors constituting the DMD shown in FIG. 3 are set in the OFF state. FIG. 6 is a diagram illustrating the relationship between the exposure head in the exposure apparatus and the photosensitive material (exposed surface of the photosensitive layer) positioned on the exposure stage. FIG. 7 is an explanatory view of the relationship between the exposure head in the exposure apparatus and the exposure area on the photosensitive material (exposed surface of the photosensitive layer). FIG. 8 is a block diagram of the control circuit of the exposure apparatus. FIG. 9 is an explanatory diagram of an arrangement state of micromirrors constituting a DMD used for an exposure head in the exposure apparatus. FIG. 10 is an explanatory diagram of parameters of a drawing pattern formed by the exposure head. FIG. 11 is an explanatory diagram of parameters of a drawing pattern formed by the exposure head. FIG. 12 is an explanatory diagram of parameters of a drawing pattern formed by the exposure head. FIG. 13 is an explanatory diagram of calculation results of jaggy pitch and jaggy amplitude of a drawing pattern formed by the exposure head. FIG. 14 is an explanatory diagram of calculation results of jaggy pitch and jaggy amplitude of a drawing pattern formed by the exposure head. FIG. 15 is an explanatory diagram of calculation results of jaggy pitch and jaggy amplitude of a drawing pattern formed by the exposure head. FIG. 16 is an explanatory diagram of calculation results of jaggy pitch and jaggy amplitude of a drawing pattern formed by the exposure head. FIG. 17 is an explanatory diagram of calculation results of jaggy pitch and jaggy amplitude of a drawing pattern formed by the exposure head. FIG. 18 is an explanatory diagram of calculation results of jaggy pitch and jaggy amplitude of a drawing pattern formed by the exposure head.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Exposure apparatus 18 Exposure stage 24a-24j Exposure head 26 Scanner 28 Light source unit 36 DMD
38 SRAM cell 40 Micro mirror 42 Control unit 48 Micro lens array 58a to 58j Exposure area 64 Sync signal generation unit 66 Exposure stage drive unit 68 Drawing data storage unit 70 DMD modulation unit 72 Frequency change unit 74 Phase difference change unit 75 Movement speed change Section 76 Exposure head rotation drive section 77 Swath 78 Optical magnification changing section 79 Zoom optical system 80 Original image F Photosensitive material L Laser beam

Claims (25)

Consisting of a photosensitive composition containing a binder, a polymerizable compound, a colorant, and a photopolymerization initiator, for the photosensitive layer located on the surface of the substrate,
A light irradiating means, and n (where n is a natural number of 2 or more) two-dimensionally arranged picture elements that receive and emit light from the light irradiating means, and according to the pattern information, An exposure head provided with a light modulation means capable of controlling a picture element portion, wherein the exposure head is arranged such that a column direction of the picture element portion forms a predetermined inclination angle with respect to a scanning direction of the exposure head. And performing exposure by moving the exposure head relative to the scanning direction,
In the drawing pattern corresponding to the pattern information, at least one of jaggy jaggy pitch and jaggy amplitude generated by the exposure being reproduced by the drawing pixels formed by the picture element portion is equal to or less than a predetermined value.
(A) an arrangement pitch of the drawing pixels formed by the adjacent picture element portions;
(B) an inclination angle of the two-dimensional drawing pixel group composed of a plurality of the drawing pixels with respect to the scanning direction;
(C) a drawing pitch of the drawing pixels with respect to the scanning direction, and (d) a phase difference of a drawing position with respect to the scanning direction of the drawing pixels formed adjacent to a direction substantially orthogonal to the scanning direction,
An exposure step performed by performing modulation control on the picture element portion at a predetermined timing based on the pattern information,
And a development step of developing the photosensitive layer exposed in the exposure step.   2. The color according to claim 1, wherein the exposure is performed using an exposure apparatus including at least one of a drawing pixel group rotating unit, a drawing magnification changing unit, a drawing timing changing unit, a moving speed changing unit, and a phase difference changing unit. A method for manufacturing a filter.   3. The method of manufacturing a color filter according to claim 1, wherein the tilt angle (b) is changed by rotating either the entire exposure head or the light modulating unit by the drawing pixel group rotating unit.   The drawing magnification changing means changes the drawing magnification of drawing pixels formed on the exposed surface of the photosensitive layer, and adjusts either the arrangement pitch (a) or the drawing pitch (c). The manufacturing method of the color filter in any one.   The method for producing a color filter according to any one of claims 1 to 4, wherein the drawing timing changing means changes the drawing timing of the photosensitive element on the exposed surface of the photosensitive layer and adjusts the drawing pitch (c).   6. The method for producing a color filter according to claim 1, wherein the moving speed changing means changes the relative moving speed of the exposure head with respect to the exposed surface of the photosensitive layer to adjust the drawing pitch (c).   The method for producing a color filter according to any one of claims 1 to 6, wherein the phase difference changing means changes the phase difference of the modulation control timing of adjacent picture element portions to change the phase difference (d).   The arrangement pitch (a), the inclination angle (b), and the drawing pitch (c) so that any one of the jaggy jaggy pitch and the jaggy amplitude generated in the drawing pattern orthogonal or substantially orthogonal to the scanning direction is equal to or less than a predetermined value. ) And a phase difference (d) are set. The method for producing a color filter according to claim 1.   The color filter according to any one of claims 1 to 8, wherein at least one of an arrangement pitch (a), an inclination angle (b), a drawing pitch (c), and a phase difference (d) is set according to a drawing pattern. Manufacturing method.   The arrangement pitch (a), the inclination angle (b), the drawing pitch (c), or the phase difference (d) is set according to the inclination angle of the drawing pattern with respect to the scanning direction. A method for producing a color filter according to claim 1. Adjustment of arrangement pitch (a), inclination angle (b), drawing pitch (c), and phase difference (d)
(E) the pitch of the control point sequence along the substantially scanning direction of the control point, the control point defined as the center point of the drawing pixel formed on the exposed surface of the photosensitive layer by the picture element unit,
(F) the arrangement direction of the control point sequence;
(G) a pitch of the control points with respect to the scanning direction, and (h) a phase difference of the control points adjacent to the direction substantially orthogonal to the scanning direction with respect to the scanning direction,
The method for producing a color filter according to claim 1, wherein at least one of the above is performed by controlling so as to reduce jaggy of a drawing pattern. Defined by at least one of pitch (e), arrangement direction (f) of control point sequence, pitch (g) of control point with respect to scanning direction, and phase difference (h), and at least one of jaggy pitch and jaggy amplitude Find the correlation with the shape of the jaggy
The method for manufacturing a color filter according to claim 1, wherein any one of (e) to (h) is set or changed based on the correlation.   The control point sequence pitch (e), the arrangement direction (f), the pitch (g) of the control points with respect to the scanning direction, and the phase difference (h) at which the jaggy shape falls within the allowable range is set. The method for producing a color filter according to claim 1, wherein the color filter is defined as a selection condition.   The control point sequence pitch (e), the arrangement direction (f), the pitch (g) of the control points with respect to the scanning direction, and the phase difference (h) at which the jaggy shape falls outside the allowable range is set. The method for manufacturing a color filter according to claim 1, which is defined as a prohibition condition.   Corresponding to the direction of the drawing pattern, at least one of the pitch (e) of the control point sequence, the arrangement direction (f), the pitch (g) of the control point with respect to the scanning direction, and the phase difference (h), and the jaggy pitch The method for producing a color filter according to claim 1, wherein a correlation with a jaggy shape defined by at least one of the jaggy amplitude and the jaggy amplitude is obtained.   For each drawing pattern in a predetermined region, at least one of the pitch (e) of the control point sequence, the arrangement direction (f), the pitch (g) of the control points with respect to the scanning direction, and the phase difference (h), jaggy The color filter manufacturing method according to claim 1, wherein a correlation with a jaggy shape defined by at least one of pitch and jaggy amplitude is obtained.   The method for producing a color filter according to any one of claims 1 to 16, wherein the light irradiation means can synthesize and irradiate two or more lights.   The method for producing a color filter according to claim 1, wherein the photosensitive layer is formed by applying a photosensitive composition to a surface of a substrate and drying the photosensitive composition.   Using a photosensitive transfer material having a photosensitive transfer layer made of a photosensitive composition on a support, the photosensitive layer is laminated on the substrate so that the photosensitive transfer layer and the substrate are in contact with each other, Then, the manufacturing method of the color filter in any one of Claim 1 to 18 formed by peeling a support body.   The method for producing a color filter according to claim 1, wherein the photosensitive composition is colored at least black (K).   For each color of R, G, and B in a predetermined arrangement on the surface of the substrate, using a photosensitive composition colored in at least three primary colors of red (R), green (G), and blue (B) 21. The method for producing a color filter according to claim 1, wherein the color filter is formed by sequentially repeating the photosensitive layer forming step, the exposure step, and the developing step.   At least pigment C.I. I. Pigment Red 254 is colored green (G) with pigment C.I. I. Pigment green 36 and pigment C.I. I. Pigment Yellow 139 and at least a pigment C.I. I. The method for producing a color filter according to any one of claims 1 to 21, wherein Pigment Blue 15: 6 is used.   Pigment to red (R) coloring C.I. I. Pigment red 254 and pigment C.I. I. Pigment Red 177 at least one pigment is changed to a green (G) coloring pigment C.I. I. Pigment green 36 and pigment C.I. I. Pigment Yellow 150 and at least blue (B) pigment C.I. I. Pigment blue 15: 6 and pigment C.I. I. The method for producing a color filter according to any one of claims 1 to 21, wherein at least one pigment of pigment violet 23 is used.   24. A color filter manufactured by the method for manufacturing a color filter according to claim 1. A display device using the color filter according to claim 24.