JP2007022089A - Emboss roll and intermediate film for laminated glass - Google Patents

Emboss roll and intermediate film for laminated glass Download PDF

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JP2007022089A
JP2007022089A JP2006210159A JP2006210159A JP2007022089A JP 2007022089 A JP2007022089 A JP 2007022089A JP 2006210159 A JP2006210159 A JP 2006210159A JP 2006210159 A JP2006210159 A JP 2006210159A JP 2007022089 A JP2007022089 A JP 2007022089A
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semi
roll
embossing roll
laminated glass
polished
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JP2007022089A5 (en
JP4324183B2 (en
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Yoshinari Sannomiya
伊成 三宮
Hiroshi Kawate
洋 川手
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Sekisui Chemical Co Ltd
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Sekisui Chemical Co Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
    • B32B17/1055—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer
    • B32B17/10559—Shape of the cross-section
    • B32B17/10577—Surface roughness
    • B32B17/10587—Surface roughness created by embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C3/00—Abrasive blasting machines or devices; Plants
    • B24C3/32—Abrasive blasting machines or devices; Plants designed for abrasive blasting of particular work, e.g. the internal surfaces of cylinder blocks

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  • Joining Of Glass To Other Materials (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide an emboss roll capable of manufacturing an intermediate film for a laminated glass which is prevented from the generation of a blocking of films with each other during storage, good in handling and working property at the time of superposing glass sheets and the film, and good in deaeration property at the time of pasting together the glass sheets and it, and an intermediate film for the laminated glass obtained by using the emboss roll. <P>SOLUTION: The emboss roll of the invention is characterised in that, on the surface of a metal roll, an embossment comprising projected lines 2 and recessed grooves 1 is formed by an engraving mill method or an etching method, fine ruggedness is formed on the embossed surface by a blast treatment, and fine upper parts of the projected parts formed on the projected lines forming the embossment are half ground. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、合わせガラス用中間膜の製造に用いるエンボスロール及びエンボスロールを用いて製造された合わせガラス用中間膜に関する。   The present invention relates to an embossing roll used for manufacturing an interlayer film for laminated glass and an interlayer film for laminated glass manufactured using the embossing roll.

熱可塑性樹脂シートの表面に多数の微細なエンボス（凹凸）が形成されたエンボス付き熱可塑性樹脂シートは、合わせガラス用中間膜、その他の用途に広く使用されている。例えば、合わせガラス用中間膜の表面には、膜同士のブロッキング防止、ガラス板と中間膜とを重ね合わせる際の取扱い作業性（ガラス板との滑り性）、ガラス板との貼り合わせ加工時の脱気性をよくするために、一般にエンボスロールを用いて多数の微細なエンボスが形成されている。   BACKGROUND ART An embossed thermoplastic resin sheet in which a large number of fine embosses (irregularities) are formed on the surface of a thermoplastic resin sheet is widely used for interlayer films for laminated glass and other applications. For example, on the surface of the interlayer film for laminated glass, blocking between the films, handling workability when laminating the glass plate and the interlayer film (sliding property with the glass plate), and bonding process with the glass plate In order to improve the deaeration property, many fine embosses are generally formed by using an emboss roll.

中間膜にエンボスを形成するために用いられるエンボスロールは、一般に金属ロールの表面にブラスト処理、エッチング処理、彫金処理、彫刻ミル（マザーミル）等の処理を施すことにより凹凸を形成する方法により製造される。   Embossing rolls used to form embossing on an interlayer film are generally manufactured by a method of forming irregularities by subjecting the surface of a metal roll to blasting, etching, engraving, engraving mill (mother mill), etc. The

エッチング処理又は彫金処理又は彫刻ミル処理だけで製造されたエンボスロールにより中間膜にエンボスを転写すると、凸部の高さがほぼ揃ったエンボスが形成され、凸部の高さのランダム性とシャープさが得られず、特に扱き方式ではガラス板に対して中間膜の滑り性が悪く、ずれの修正がし難いという取扱い作業性に問題があった。   When embossing is transferred to the intermediate film by an embossing roll manufactured only by etching, engraving, or engraving mill processing, embosses with almost the same height are formed, and the height of the protrusions is random and sharp. In particular, the handling method has a problem in handling workability in that the slippage of the interlayer film is poor with respect to the glass plate, and it is difficult to correct the deviation.

又、ブラスト処理で製造されたエンボスロールは、エンボスの凹部がランダムに形成され、このエンボスが転写されたシートは凸部がランダムに配置されたものになるので、ガラス板に対して滑り性が悪く、取扱いにくい。   In addition, the embossing roll manufactured by the blasting process has concave portions of the embossing formed at random, and the sheet on which the embossing is transferred has the convex portions arranged randomly, so that it is slippery with respect to the glass plate. Bad and difficult to handle.

更に、ブラスト処理だけで形成されたエンボスには脱気性の問題がある。即ち、ブラスト処理するとエンボス面に多くの過大ピーク（高さが不揃いの突出した凸部）が生じる。   Furthermore, embossing formed only by blasting has a problem of deaeration. That is, when the blast treatment is performed, many excessive peaks (protruding protrusions having uneven heights) are generated on the embossed surface.

このような過大ピークが存在すると、それが中間膜表面に転写される際に深い窪みとなり、この窪み内に空気が閉じ込められてガラス板と中間膜との密着性が悪くなり、貼り合わせ加工時に脱気され難くなる。特に、真空バッグ方式よりも扱きロール方式で脱気を行う場合に空気の抜け方が悪く、得られる合わせガラスに空気溜まりが発生し、このため合わせガラスとの密着不良等が生じる。更に、シール不良による周辺微発泡が生じる。   If such an excessive peak exists, it becomes a deep depression when it is transferred to the surface of the intermediate film, and air is trapped in this depression, resulting in poor adhesion between the glass plate and the intermediate film, and during bonding processing. It becomes difficult to be deaerated. In particular, when deaeration is performed by the handling roll method rather than the vacuum bag method, air is not easily removed, and air pools are generated in the resulting laminated glass, resulting in poor adhesion to the laminated glass. Further, peripheral fine foaming occurs due to poor sealing.

一方、酸化アルミニウムや酸化硅素等のブラスト材を吹き付けて微細なエンボスを形成するブラスト処理も行われている。ミル加工により筋状のエンボスを形成した後、この面をブラストすることにより微細なエンボスをランダムに形成する方法が考えられる。しかしこの方法により製造されたエンボスロールには、ブラスト処理により空気を閉じ込める凹部が多数形成される。このエンボスが転写された中間膜をガラス板に積層する際、真空減圧方式では脱気され易いが、扱き方式ではガラス板との貼り合わせ周辺に空気が残り、密着不良となる。更に、シール不良による周辺微発泡が生じる。   On the other hand, blasting is also performed in which a fine boss is formed by spraying a blasting material such as aluminum oxide or silicon oxide. A method is conceivable in which fine embossing is randomly formed by blasting the surface after forming streak-like embossing by milling. However, the embossing roll manufactured by this method has a large number of recesses that trap air by blasting. When the intermediate film to which the emboss is transferred is laminated on the glass plate, it is easy to deaerate in the vacuum decompression method, but in the handling method, air remains around the bonding with the glass plate, resulting in poor adhesion. Further, peripheral fine foaming occurs due to poor sealing.

上記の問題点を解決するものとして、特許文献１には、金属ロールに１０〜６０メッシュの酸化アルミニウム粉を用いてブラスト処理し、次に、比較的小さなガラスビーズを吹き付けるか、又はラッピング材料を用いて半研磨することにより、過大ピークのサイズ及び量を減少させて、中間膜に過大な窪みを転写させないことにより、ブロッキングを防止し、滑り性を改良した中間膜が記載されている。   In order to solve the above problems, Patent Document 1 discloses that a metal roll is blasted with 10 to 60 mesh aluminum oxide powder, and then sprayed with relatively small glass beads or a wrapping material. An intermediate film is described in which blocking and anti-slip properties are improved by reducing the size and amount of the excessive peak by semi-polishing and preventing the excessive depression from being transferred to the intermediate film.

上記特許文献１に記載のロールによると、ブラスト後のロール表面は面積比率で凹部凸部ともに約５０％で構成されている。ここで研磨比率が小さいとロールの凸部が多く、中間膜面の凹部が多くなってガラス面との密着性が改良されない。そこでロールの凸部をほぼ無くすには５０％以上を研磨する必要がある。しかし、研磨比率を５０％以上にすると中間膜の平坦部分が増えてブロッキングが起こり易くなるという問題がある。   According to the roll described in Patent Document 1, the surface of the roll after blasting is composed of about 50% of the concave and convex portions by area ratio. Here, when the polishing ratio is small, there are many convex portions on the roll, and there are many concave portions on the surface of the intermediate film, so that the adhesion with the glass surface is not improved. Therefore, it is necessary to polish 50% or more to substantially eliminate the convex portion of the roll. However, when the polishing ratio is 50% or more, there is a problem that the flat portion of the intermediate film increases and blocking is likely to occur.

上記の問題を解決する方法として、ブラスト処理したロール表面を半研磨し、更にブラスト処理を少し行う（小ブラスト）ことでブロッキングを防止する方法が考えられる。しかし、例え小ブラストであっても多くの凹部が形成され、この凹部に空気が閉じ込められてガラスとの密着性が悪くなる。
特公昭５４−２１２０９号公報 As a method for solving the above problem, a method of preventing blocking by semi-polishing the roll surface subjected to blasting and further performing a little blasting (small blasting) can be considered. However, even with a small blast, many concave portions are formed, and air is trapped in the concave portions, resulting in poor adhesion to glass.
Japanese Patent Publication No.54-21209

本発明は上記従来の問題点を解消し、合わせガラス用中間膜の保管中に膜同士のブロッキング発生が防止され、ガラス板と中間膜とを重ね合わせる際の取扱い作業性がよく、更に、これらを貼り合わせ加工する際の脱気性に優れた中間膜を製造することができるエンボスロール及びこれを用いて得られる合わせガラス用中間膜を提供することを目的とする。   The present invention solves the above-mentioned conventional problems, prevents the occurrence of blocking between the films during storage of the interlayer film for laminated glass, has good handling workability when the glass plate and the interlayer film are overlapped, and these It aims at providing the embossing roll which can manufacture the intermediate film excellent in the deaeration at the time of carrying out the bonding process, and the intermediate film for laminated glasses obtained using this.

本発明のエンボスロールは、金属ロールの表面に彫刻ミル法またはエッチング法により凸条と凹溝とからなるエンボスが形成され、該エンボス面にブラスト処理により微細な凹凸が形成され、エンボスを形成する凸条に形成された微細な凸部の上部が半研磨されてなることを特徴とするものである。   In the embossing roll of the present invention, an emboss made of ridges and grooves is formed on the surface of a metal roll by an engraving mill method or an etching method, and fine unevenness is formed on the embossed surface by blasting to form an emboss. The upper part of the fine convex part formed in the convex line is semi-polished.

また、本発明の合わせガラス用中間膜は、本発明のエンボスロールを用いて製造されることを特徴とするものである。   In addition, the interlayer film for laminated glass of the present invention is manufactured using the embossing roll of the present invention.

本発明のエンボスロールに使用される金属ロールとしては、鏡面研磨加工されたチルド鉄ロールなどが好適である。本発明では、先ず金属ロールの周方向にミル加工又はエッチング加工によりによりエンボス加工する。エンボス加工の目的は、これにより形成される凸条部を被研磨面パターンとし、半研磨後は凹溝部に平面部を残すためである。   As the metal roll used for the embossing roll of the present invention, a mirror-polished chilled iron roll or the like is suitable. In the present invention, first, the metal roll is embossed by milling or etching in the circumferential direction. The purpose of embossing is to make the ridges formed thereby a surface pattern to be polished, and leave a flat part in the groove after semi-polishing.

エンボス形状は、エンボスロールによりエンボス加工された中間膜がガラス板に密着されるとき、ガラス面との滑り性がよく、ガラス面との間の空気が抜け易い形状とする必要がある。そのため、エンボスロールの周方向に凸条と凹溝が並行して形成されたものとする。又、ガラスとの密着性をよくするためには凸条が格子状に形成されたものも使用できる。凸条の幅、高さ、ピッチ等は、脱気性及び自着性を調節するために、半研磨部分即ち凸条の面積を小さく抑えつつ、その配置を空気の抜けをよくするための各種パターンを選択することができる。   When the intermediate film embossed by the embossing roll is brought into close contact with the glass plate, the embossed shape needs to have a good slip property with respect to the glass surface and allow air between the glass surface to easily escape. Therefore, it is assumed that the ridge and the groove are formed in parallel in the circumferential direction of the embossing roll. Moreover, in order to improve adhesiveness with glass, what formed the protruding item | line in the grid | lattice form can also be used. The width, height, pitch, etc. of the ridges are various patterns for improving the escape of air while keeping the area of the semi-polished portion, that is, the ridges small, in order to adjust the deaeration and self-adhesiveness. Can be selected.

ブラスト処理で用いられるブラスト材は、主として酸化アルミニウム（アルミナ）や鋼球を用いる。鋼球は砕けた場合ロール表面に突き刺さったり、錆が発生することがあるので、酸化アルミニウムを用いることが好ましい。酸化アルミニウムの粒径は、一般的に粒径がＪＩＳ規格の＃２０〜＃１２０が好ましく、より好ましくは＃３０〜＃８０のものである。ブラストするときの吐出圧力は一般的に４０×１０4 〜１５×１０5 Ｐａであり、所望の表面粗さが得られるまでブラスト処理する。上記ブラストによりシャープな形状の微細な凹凸をランダムに形成することができ、脱気性が確保される。 As the blasting material used in the blasting treatment, aluminum oxide (alumina) or steel balls are mainly used. When the steel ball is crushed, it may pierce the roll surface or rust may be generated. Therefore, it is preferable to use aluminum oxide. In general, the particle size of aluminum oxide is preferably JIS standard # 20 to # 120, more preferably # 30 to # 80. The discharge pressure during blasting is generally 40 × 10 4 to 15 × 10 5 Pa, and blasting is performed until a desired surface roughness is obtained. By the blasting, fine irregularities with a sharp shape can be randomly formed, and deaeration is ensured.

本発明のエンボスロールの製造方法では、ブラスト処理した後、該処理面に半研磨を行う。半研磨とは金属ロールの表面に形成された多数の凸部の上部を一様に研磨して平滑にすることをいう。半研磨の方法としては、金属ロールを回転させながらエンボス表面に研磨砥石を押しつける方法、研磨砥石を回転させた状態でエンボス表面に押圧し、金属ロールを回転させる方法等がある。研磨砥石の押圧力は、一般的に２×１０4 〜１０×１０5 Ｐａとされる。 In the embossing roll manufacturing method of the present invention, after the blast treatment, the treated surface is semi-polished. Semi-polishing refers to uniformly polishing and smoothing the upper portions of many convex portions formed on the surface of a metal roll. As a semi-polishing method, there are a method of pressing a polishing grindstone against the embossed surface while rotating the metal roll, a method of pressing the embossing surface while rotating the polishing grindstone, and a method of rotating the metal roll. The pressing force of the grinding wheel is generally 2 × 10 4 to 10 × 10 5 Pa.

上記研磨砥石としては、一般にＪＩＳ規格の＃２００〜＃２０００、好ましくは＃４００〜＃１０００の酸化アルミニウムや炭化珪素が好適に用いられる。尚、研磨砥石としてサンドペーパーを用いることもできる。   In general, JIS standard # 200 to # 2000, preferably # 400 to # 1000 aluminum oxide or silicon carbide is suitably used as the polishing wheel. Sandpaper can also be used as the grinding wheel.

半研磨の程度（半研磨面積比率）は、一般的にＪＩＳ Ｂ ０６０１で規定される負荷長さ率（ｔｐ）を用いて表わされる。即ち、半研磨後のエンボスロールの粗さ曲線から、その平均線方向に基準長さだけ抜き取り、この抜き取り部分の粗さ曲線の山頂線に平行なレベルにおける切断長さの和の基準長さに対する比率（半研磨面積比率）が、好ましくは２０〜６０％、より好ましくは３０〜５０％となるように半研磨する。半研磨面積比率が２０％未満では脱気性向上の効果が小さく、６０％を超えるとブロッキングが起こり易くなる。   The degree of semi-polishing (semi-polished area ratio) is generally expressed using a load length ratio (tp) defined by JIS B 0601. That is, from the roughness curve of the embossed roll after semi-polishing, the reference length is extracted in the direction of the average line, and the sum of the cutting lengths at the level parallel to the peak line of the roughness curve of the extracted portion is relative to the reference length. Semi-polishing is carried out so that the ratio (semi-polished area ratio) is preferably 20 to 60%, more preferably 30 to 50%. If the semi-polished area ratio is less than 20%, the effect of improving deaeration is small, and if it exceeds 60%, blocking tends to occur.

また、半研磨面積比率が大きい場合には、上記半研磨したエンボス面に、例えば、粒径が５μｍ以下の粒子を低い密度で分散ブラストすることにより、微細な凸部に更に極微細な凹凸を形成してもよい。極微細な凹凸は、それぞれが独立した凹凸であることが好ましく、これにより、ガラス板との滑り性が維持され、更によいブロッキング防止効果が得られる。   If the semi-polished area ratio is large, for example, finer irregularities can be formed on the fine convex portions by dispersing and blasting particles having a particle size of 5 μm or less at a low density on the semi-polished embossed surface. It may be formed. The extremely fine irregularities are preferably irregularities that are independent of each other, and thereby, the slipperiness with the glass plate is maintained, and a better blocking prevention effect is obtained.

半研磨の後で上記分散ブラストした後、常法によりエンボスの粗さや形状に沿ってクロムメッキ、ニッケルメッキ、亜鉛メッキ等の金属メッキを施す。金属メッキは電気メッキ、化学メッキのいずれで行ってもよいが、化学メッキによるとエンボスの粗さや形状に沿って平滑で均一な厚みのメッキ層を形成できるので好ましい。   After the above-mentioned dispersion blasting after semi-polishing, metal plating such as chrome plating, nickel plating, galvanization or the like is performed along the roughness and shape of the emboss by a conventional method. Metal plating may be performed by either electroplating or chemical plating, but chemical plating is preferable because a plating layer having a smooth and uniform thickness can be formed along the roughness and shape of the emboss.

金属メッキの厚さはエンボスの粗さや形状を維持する点で薄い方が好ましく、一方、耐薬品性や防錆効果の点では厚い方が好ましい。これら両方を考慮すると５〜２０μｍの範囲が好ましい。最終的に得られるエンボスの粗さはＪＩＳ Ｂ０６０１で定義される十点平均粗さで２０〜５０μｍとするのが好ましい。   The thickness of the metal plating is preferably thinner in terms of maintaining the roughness and shape of the embossment, while the thicker one is preferable in terms of chemical resistance and rust prevention effect. Considering both of these, a range of 5 to 20 μm is preferable. The roughness of the emboss finally obtained is preferably 20 to 50 μm in terms of 10-point average roughness defined by JIS B0601.

次に、上記のようにして得られたエンボスロールを用いて製造された合わせガラス用中間膜について説明する。   Next, the interlayer film for laminated glass manufactured using the embossing roll obtained as described above will be described.

合わせガラス用中間膜の材料としては、従来より安全ガラス用中間膜の樹脂として用いられているポリビニルアセタール樹脂が好適であり、特に、ブチラール化度６０〜７０モル％、重合度１０００〜２０００のポリビニルブチラール樹脂が最適である。   As a material for the interlayer film for laminated glass, polyvinyl acetal resin that has been conventionally used as a resin for interlayer films for safety glass is suitable, and in particular, polyvinyl having a butyralization degree of 60 to 70 mol% and a polymerization degree of 1000 to 2000. Butyral resin is most suitable.

上記合わせガラス用中間膜に用いられる可塑剤としては、例えば、トリエチレングリコールジ−２−エチルブチレート、トリエチレングリコールジ−ヘプタノエート、トリエチレングリコールジ−２−エチルヘキサノエート、テトラエチレングリコールジ−２−エチルブチレート、テトラエチレングリコールジ−ヘプタノエート、テトラエチレングリコールジ−２−エチルヘキサノエート等のグリコール系；ジヘキシルアジペート、ジオクチルアジペート等のアジペート系；ジベンジルフタレート等のフタル酸系などのものを単独又は２種以上併用して用いることができる。   Examples of the plasticizer used in the interlayer film for laminated glass include triethylene glycol di-2-ethylbutyrate, triethylene glycol di-heptanoate, triethylene glycol di-2-ethylhexanoate, and tetraethylene glycol diene. Glycols such as 2-ethylbutyrate, tetraethylene glycol di-heptanoate, tetraethylene glycol di-2-ethylhexanoate; adipates such as dihexyl adipate and dioctyl adipate; phthalic acids such as dibenzyl phthalate A thing can be used individually or in combination of 2 or more types.

本発明の合わせガラス用中間膜における可塑剤の添加量は、ポリビニルアセタール樹脂１００重量部に対して２０〜６０重量部の範囲とするのが好ましい。   The addition amount of the plasticizer in the interlayer film for laminated glass of the present invention is preferably in the range of 20 to 60 parts by weight with respect to 100 parts by weight of the polyvinyl acetal resin.

本発明の合わせガラス用中間膜には、紫外線吸収剤、酸化防止剤、接着力調整剤等の種々の添加剤が含有されていてもよい。   The interlayer film for laminated glass of the present invention may contain various additives such as an ultraviolet absorber, an antioxidant, and an adhesive strength modifier.

本発明の合わせガラス用中間膜は、前記本発明のエンボスロールを用いてエンボス加工されたものであるから、ガラス板面との滑り性がよいので重ね合わせ作業し易く、脱気性に優れ、ガラス板との密着性に優れたものである。   Since the interlayer film for laminated glass according to the present invention is embossed using the embossing roll according to the present invention, it is easy to superimpose because it has good slipperiness with the glass plate surface, and has excellent degassing properties. It has excellent adhesion to the plate.

本発明のエンボスロールは、ガラス板と中間膜とを重ね合わせる際の取扱い作業性がよく、これらを貼り合わせるための予備圧着工程での脱気性に優れ、能率よく中間膜を製造することができる。   The embossing roll of the present invention has good workability when superposing a glass plate and an intermediate film, has excellent degassing performance in a pre-bonding step for bonding them together, and can efficiently produce an intermediate film. .

又、本発明の合わせガラス用中間膜は保管中に膜同士のブロッキング発生が防止され、ガラス板との適当な滑り性を有するので貼り合わせ作業性に優れたものである。   Further, the interlayer film for laminated glass of the present invention is excellent in laminating workability because blocking between the films is prevented during storage and it has appropriate slipperiness with the glass plate.

以下に本発明の実施例を説明する。   Examples of the present invention will be described below.

（実施例１）
鏡面研磨されたチルド鉄ロール（直径３５０ｍｍ）を回転させながら、その表面の周方向にミル加工により多数の凹溝と凸条を形成した。図１は上記ミル加工された状態を拡大して示す斜視図であり、１は凹溝、２は凸条である（Ｈ＝４０μｍ、Ｌ1 ＝４０μｍ、Ｌ2 ＝８０μｍ、Ｌ3 ＝３２０μｍ）。次に、酸化アルミニウム（＃３６；飽和条件で６５μｍ粗さとなる条件）からなるブラスト材を吐出圧力５０×１０4 Ｐａで吐出してブラスト処理を行った。その後、研磨砥石を押しつけて半研磨を行い、上記ブラスト処理によるランダム形状部分が７０％、半研磨による平滑部が３０％であり、平滑部が回転方向（膜の流れ方向）に一定の幅を有するエンボスロールが得られた。図２は半研磨された状態を示す平面図であり、１は凹溝、３は半研磨による平滑部である。 Example 1
While rotating a mirror-polished chilled iron roll (diameter 350 mm), a large number of grooves and ridges were formed in the circumferential direction of the surface by milling. FIG. 1 is an enlarged perspective view showing the milled state, where 1 is a groove and 2 is a ridge (H = 40 μm, L 1 = 40 μm, L 2 = 80 μm, L 3 = 320 μm). . Next, a blasting treatment was performed by discharging a blasting material made of aluminum oxide (# 36; a condition of 65 μm roughness under saturation conditions) at a discharge pressure of 50 × 10 4 Pa. After that, the polishing wheel is pressed to perform semi-polishing, and the random shape portion by the blast treatment is 70%, the smooth portion by semi-polishing is 30%, and the smooth portion has a certain width in the rotation direction (film flow direction). An embossing roll was obtained. FIG. 2 is a plan view showing a state of being semi-polished, wherein 1 is a groove and 3 is a smooth portion by semi-polishing.

（実施例２）
鏡面研磨されたチルド鉄ロール（直径３５０ｍｍ）の周方向に、ミル加工により図３の拡大斜視図で示すような多数の凹溝１１及び凸条２、凸条２１（Ｈ＝４０μｍ、Ｌ4 ＝８０μｍ、Ｌ5 ＝１２０μｍ）を形成した。 (Example 2)
In the circumferential direction of a mirror-polished chilled iron roll (diameter 350 mm), a large number of grooves 11 and protrusions 2 and protrusions 21 (H = 40 μm, L 4 = L) as shown in the enlarged perspective view of FIG. 80 μm, L 5 = 120 μm).

この鉄ロールに、半研磨面積比率が５０％となるように半研磨したこと以外は実施例１と同様にしてブラスト処理を行い、ランダム形状部分が５０％であり、平滑部が回転方向（膜の流れ方向）に一定の幅を有するエンボスロールを得た。図４はこのエンボスロールの表面状態を示す平面図であり、１１は凹部、４は半研磨による平滑部である。   The iron roll was blasted in the same manner as in Example 1 except that the semi-polished area ratio was 50%, and the random shape portion was 50%, and the smooth portion was in the direction of rotation (film The embossing roll having a certain width in the flow direction) was obtained. FIG. 4 is a plan view showing the surface state of this embossing roll, 11 is a concave portion, and 4 is a smooth portion by semi-polishing.

（実施例３）
鏡面研磨されたチルド鉄ロール（直径３５０ｍｍ）の表面に、図５に示すように多数の凹部１２と凸条２２をミル加工で格子状に形成した（Ｈ＝４０μｍ、Ｌ1＝７０μｍ、Ｌ2 ＝３０μｍ、Ｌ3 ＝３２０μｍ）。図６はこのロール表面を示す平面図である。酸化アルミニウム（＃３６番；飽和する条件で６５μｍの粗さとなる条件）からなるブラスト材を用いて吐出圧力５０×１０4 Ｐａでブラスト処理を行った。この面に半研磨面積比率が５０％となるように半研磨した。 (Example 3)
On the surface of a mirror-polished chilled iron roll (diameter 350 mm), as shown in FIG. 5, a large number of recesses 12 and ridges 22 were formed in a grid by milling (H = 40 μm, L 1 = 70 μm, L 2 = 30 μm, L 3 = 320 μm). FIG. 6 is a plan view showing the roll surface. A blasting treatment was performed at a discharge pressure of 50 × 10 4 Pa using a blasting material made of aluminum oxide (# 36; a condition of 65 μm roughness under saturated conditions). This surface was semi-polished so that the semi-polished area ratio was 50%.

図７は半研磨された表面の状態を示す平面図で、１２は凹部であり、５は半研磨による平滑部である。このロール表面はブラストによるランダム形状部分が５０％、半研磨による平滑部が５０％であり、平滑部が回転方向（膜の流れ方向）に直角方向で一定の幅を有するものであった。   FIG. 7 is a plan view showing the state of the semi-polished surface, 12 is a recess, and 5 is a smooth part by semi-polishing. The roll surface had 50% of a random shape portion by blasting and 50% of a smooth portion by semi-polishing, and the smooth portion had a certain width in a direction perpendicular to the rotation direction (film flow direction).

（実施例４）
図１と同様のミル加工した鉄ロールに、実施例１と同様にブラスト処理を行った後、半研磨面積比率が６０％となるように半研磨した。図８はその状態を示す平面図であり、１３は凹部、６は平滑部である。次に、上記半研磨面に酸化アルミニウム（＃１５０番；飽和する条件で１０μｍ粗さとなる条件）で表面の約２０％に凹部が生じるようにブラスト処理した。これにより、ブラスト処理によるランダム形状部分が４０％、半研磨による平滑部分が６０％であるが、平面部分が回転方向（膜の流れ方向）に直角方向で一定の幅を有するエンボスロールが得られた。 Example 4
The milled iron roll similar to that shown in FIG. 1 was blasted in the same manner as in Example 1 and then semi-polished so that the semi-polished area ratio was 60%. FIG. 8 is a plan view showing the state, in which 13 is a concave portion and 6 is a smooth portion. Next, the semi-polished surface was blasted with aluminum oxide (# 150; 10 μm roughness under saturated conditions) so that a recess was formed in about 20% of the surface. As a result, an embossing roll having a constant width in the direction perpendicular to the rotation direction (film flow direction) is obtained, although the random shape portion by blasting is 40% and the smooth portion by semi-polishing is 60%. It was.

（比較例１）
ミル加工を行わなかったこと以外は実施例１と同様にして、粗さ約６０μｍのブラスト処理により、ランダム形状部分が７０％、半研磨面の面積比率が３０％であるエンボスロールを得た。このエンボスロールは半研磨部分が不連続で空気の流れが阻害される形状であり、脱気性に欠けるものであった。図９はこのエンボスロールの表面状態を示す平面図であり、１４は凹部、７は半研磨による平滑部である。 (Comparative Example 1)
An embossing roll having a randomly shaped portion of 70% and a semi-polished surface area ratio of 30% was obtained by blasting with a roughness of about 60 μm in the same manner as in Example 1 except that milling was not performed. This embossing roll had a shape in which the semi-polished part was discontinuous and the air flow was hindered, and lacked deaeration. FIG. 9 is a plan view showing the surface state of this embossing roll, 14 is a concave portion, and 7 is a smooth portion by semi-polishing.

（比較例２）
ミル加工を行わなかったこと以外は実施例１と同様にして、粗さ約６０μｍのブラスト処理により、ランダム形状部分が５０％、半研磨面の面積比率が５０％であるエンボスロールを得た。図１０はこのエンボスロールの表面状態を示す平面図であり、半研磨による平滑部８が不連続で空気の流れが阻害される形状であり、脱気性に欠けるものであった。 (Comparative Example 2)
An embossing roll having a random shape portion of 50% and a semi-polished surface area ratio of 50% was obtained by blasting with a roughness of about 60 μm in the same manner as in Example 1 except that milling was not performed. FIG. 10 is a plan view showing the surface state of the embossing roll. The smooth portion 8 by semi-polishing has a shape that is discontinuous and obstructs the air flow, and lacks deaeration.

（比較例３）
ミル加工を行わず、酸化アルミニウム（＃２４番；飽和する条件で８０μｍの粗さとなる条件）で、粗さ約８０μｍのブラスト処理したこと以外は、実施例１と同様にして、ブラスト処理によるランダム形状部分が３５％、半研磨面の面積比率が６５％であるエンボスロールを得た。このエンボスロールはロール粗さが３７μｍであったが、成膜したものは転写し難く、膜粗さは３０μｍとなった。図１１はこのエンボスロールの表面状態を示す平面図であり、平滑部９は連続したものになったが、平滑部９の占める面積割合が大きく、成膜したものは滑り性が悪くブロッキングが生じた。 (Comparative Example 3)
Random by blasting in the same manner as in Example 1, except that milling was not performed, and aluminum oxide (# 24; a condition of 80 μm roughness under saturated conditions) and a blasting process with a roughness of about 80 μm was performed. An embossing roll having a shape portion of 35% and a semi-polished surface area ratio of 65% was obtained. This embossing roll had a roll roughness of 37 μm, but the deposited film was difficult to transfer, and the film roughness was 30 μm. FIG. 11 is a plan view showing the surface state of the embossing roll, and the smoothing portion 9 is continuous, but the area ratio occupied by the smoothing portion 9 is large, and the formed film has poor slipperiness and blocking. It was.

ミル加工されたエンボスロール表面の拡大斜視図。The enlarged perspective view of the embossing roll surface by which the mill process was carried out. 半研磨されたエンボスロールの表面の拡大斜視図。The expansion perspective view of the surface of the embossing roll by which semi-polishing was carried out. ミル加工された他のエンボスロール表面の拡大平面図。The enlarged plan view of the other embossing roll surface by which the mill process was carried out. 半研磨された他のエンボスロールの表面の拡大斜視図。The expansion perspective view of the surface of the other embossing roll by which semi-polishing was carried out. 格子状にミル加工されたエンボスロール表面の拡大斜視図。The expansion perspective view of the embossing roll surface milled in the grid | lattice form. 図５の平面図。FIG. 6 is a plan view of FIG. 5. 図５のエンボスロール表面が半研磨された状態を示す平面図。The top view which shows the state by which the embossing roll surface of FIG. 5 was semi-polished. 半研磨された別のエンボスロールの表面の拡大斜視図。The expansion perspective view of the surface of another embossing roll by which semi-polishing was carried out. 従来の方法で製造されたエンボスロール表面を示す平面図。The top view which shows the embossing roll surface manufactured by the conventional method. 従来の方法で製造された他のエンボスロール表面を示す平面図。The top view which shows the other embossing roll surface manufactured by the conventional method. 従来の方法で製造された更に他のエンボスロール表面を示す平面図。The top view which shows the other embossing roll surface manufactured by the conventional method.

符号の説明Explanation of symbols

１，１１，１２，１３：凹溝
２，２１，２２：凸条
３，４，５，６，７，８，９：平滑部 1, 11, 12, 13: groove 2, 21, 22: ridge 3, 4, 5, 6, 7, 8, 9: smooth part

Claims (3)

金属ロールの表面に彫刻ミル法またはエッチング法により凸条と凹溝とからなるエンボスが形成され、該エンボス面にブラスト処理により微細な凹凸が形成され、エンボスを形成する凸条に形成された微細な凸部の上部が半研磨されてなることを特徴とするエンボスロール。   An emboss made of ridges and grooves is formed on the surface of the metal roll by engraving mill method or etching method, and fine unevenness is formed on the embossed surface by blasting, and the fineness formed on the ridge forming embossing An embossing roll characterized in that the upper part of the convex part is semi-polished. 上部が半研磨された微細な凸部に、更に極微細な凹凸が形成されてなることを特徴とする請求項１記載のエンボスロール。   The embossing roll according to claim 1, wherein the fine convex and concave portions whose upper part is semi-polished are further formed with extremely fine irregularities. 請求項１又は２記載のエンボスロールを用いて製造されることを特徴とする合わせガラス用中間膜。   An interlayer film for laminated glass produced using the embossing roll according to claim 1.
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EP2161123A1 (en) 2008-09-09 2010-03-10 Fujifilm Corporation Method for producing polarizing plate, and automobile's windshield
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