JP2006518550A5 - - Google Patents
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- Publication number
- JP2006518550A5 JP2006518550A5 JP2006503312A JP2006503312A JP2006518550A5 JP 2006518550 A5 JP2006518550 A5 JP 2006518550A5 JP 2006503312 A JP2006503312 A JP 2006503312A JP 2006503312 A JP2006503312 A JP 2006503312A JP 2006518550 A5 JP2006518550 A5 JP 2006518550A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/371,603 | 2003-02-20 | ||
| US10/371,603 US7040330B2 (en) | 2003-02-20 | 2003-02-20 | Method and apparatus for megasonic cleaning of patterned substrates |
| US10/377,943 US7040332B2 (en) | 2003-02-28 | 2003-02-28 | Method and apparatus for megasonic cleaning with reflected acoustic waves |
| US10/377,943 | 2003-02-28 | ||
| PCT/US2004/003179 WO2004074931A2 (en) | 2003-02-20 | 2004-02-04 | Method and apparatus for megasonic cleaning of patterned substrates |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006518550A JP2006518550A (en) | 2006-08-10 |
| JP2006518550A5 true JP2006518550A5 (en) | 2007-03-22 |
| JP4733012B2 JP4733012B2 (en) | 2011-07-27 |
Family
ID=32911940
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006503312A Expired - Fee Related JP4733012B2 (en) | 2003-02-20 | 2004-02-04 | Processing method and processing apparatus |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1599298A4 (en) |
| JP (1) | JP4733012B2 (en) |
| KR (1) | KR100952087B1 (en) |
| TW (1) | TWI290729B (en) |
| WO (1) | WO2004074931A2 (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4027465B2 (en) | 1997-07-01 | 2007-12-26 | 株式会社半導体エネルギー研究所 | Active matrix display device and manufacturing method thereof |
| DE102006033372B4 (en) * | 2006-02-17 | 2010-04-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Ultrasonic actuator for cleaning objects |
| WO2010027583A1 (en) * | 2008-09-03 | 2010-03-11 | Universal Display Corporation | Phosphorescent materials |
| JP5420336B2 (en) * | 2009-07-23 | 2014-02-19 | 大日本スクリーン製造株式会社 | Substrate cleaning apparatus and substrate cleaning method |
| KR101639635B1 (en) | 2010-06-03 | 2016-07-25 | 삼성전자주식회사 | Method of megasonic cleaning and apparatus of cleaning |
| JP5183777B2 (en) * | 2011-07-12 | 2013-04-17 | 株式会社カイジョー | Ultrasonic cleaning apparatus and ultrasonic cleaning method |
| DE102013020518A1 (en) * | 2013-12-11 | 2015-06-11 | Forschungszentrum Jülich GmbH Fachbereich Patente | Process and device for the polymerization of a composition comprising hydridosilanes and subsequent use of the polymers for the production of silicon-containing layers |
| US11141762B2 (en) | 2015-05-15 | 2021-10-12 | Acm Research (Shanghai), Inc. | System for cleaning semiconductor wafers |
| JP6704714B2 (en) * | 2015-11-25 | 2020-06-03 | 株式会社ディスコ | Cutting equipment |
| WO2019095126A1 (en) * | 2017-11-15 | 2019-05-23 | Acm Research (Shanghai) Inc. | Method for cleaning semiconductor wafers |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60249331A (en) * | 1984-05-24 | 1985-12-10 | Nec Corp | Semiconductor wafer washing apparatus |
| JP2519869B2 (en) * | 1993-08-26 | 1996-07-31 | 株式会社プレテック | High frequency cleaning equipment |
| JPH09271729A (en) * | 1996-04-05 | 1997-10-21 | Sonic Fueroo Kk | Washing method |
| JPH10323635A (en) * | 1997-05-26 | 1998-12-08 | Sony Corp | Ultrasonic cleaning device |
| US6085764A (en) * | 1997-07-22 | 2000-07-11 | Tdk Corporation | Cleaning apparatus and method |
| JP3787024B2 (en) * | 1997-12-26 | 2006-06-21 | 株式会社カイジョー | Ultrasonic cleaning equipment |
| EP1057546A1 (en) * | 1999-06-01 | 2000-12-06 | Applied Materials, Inc. | Megasonic cleaner |
| US6276370B1 (en) | 1999-06-30 | 2001-08-21 | International Business Machines Corporation | Sonic cleaning with an interference signal |
| US6468362B1 (en) * | 1999-08-25 | 2002-10-22 | Applied Materials, Inc. | Method and apparatus for cleaning/drying hydrophobic wafers |
| US6188162B1 (en) * | 1999-08-27 | 2001-02-13 | Product Systems Incorporated | High power megasonic transducer |
| US6748961B2 (en) * | 2001-03-30 | 2004-06-15 | Lam Research Corporation | Angular spin, rinse, and dry module and methods for making and implementing the same |
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2004
- 2004-02-04 JP JP2006503312A patent/JP4733012B2/en not_active Expired - Fee Related
- 2004-02-04 WO PCT/US2004/003179 patent/WO2004074931A2/en active Search and Examination
- 2004-02-04 EP EP04708156A patent/EP1599298A4/en not_active Withdrawn
- 2004-02-04 KR KR1020057015366A patent/KR100952087B1/en not_active IP Right Cessation
- 2004-02-13 TW TW093103559A patent/TWI290729B/en not_active IP Right Cessation