JP2006350307A5 - - Google Patents
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- Publication number
- JP2006350307A5 JP2006350307A5 JP2006131834A JP2006131834A JP2006350307A5 JP 2006350307 A5 JP2006350307 A5 JP 2006350307A5 JP 2006131834 A JP2006131834 A JP 2006131834A JP 2006131834 A JP2006131834 A JP 2006131834A JP 2006350307 A5 JP2006350307 A5 JP 2006350307A5
- Authority
- JP
- Japan
- Prior art keywords
- graft
- base material
- pattern
- unsaturated compound
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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- 238000000034 method Methods 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 7
- 238000010526 radical polymerization reaction Methods 0.000 claims description 7
- 229920000578 graft copolymer Polymers 0.000 claims description 6
- 238000010521 absorption reaction Methods 0.000 claims description 4
- 230000007261 regionalization Effects 0.000 claims description 4
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 2
- 239000003505 polymerization initiator Substances 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims 4
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims 2
- 239000005977 Ethylene Substances 0.000 claims 2
- 230000002452 interceptive effect Effects 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
Description
本発明者らは、検討の結果、エネルギー付与によりラジカル重合を開始しうる基材表面に、ラジカル重合によりグラフトポリマーを生成することで上記問題点を解決しうることを見出し、本発明を完成した。
即ち、本発明のグラフトパターン形成方法は、露光によりラジカルを発生しうる基材表面上に、ラジカル重合可能な不飽和化合物を接触させて、３６０ｎｍ〜７００ｎｍの波長のレーザにより像様露光し、該基材表面上に発生したラジカルとラジカル重合可能な不飽和化合物における重合性基とが反応して基材と結合したグラフトポリマーをパターン状に生成させることを特徴とする。このパターン形成方法により、基材と直接結合したグラフトポリマーをパターン状に生成させることができる。
ここで、露光によりラジカルを発生しうる基材中には、トリアジン系の重合開始剤と、３６０ｎｍ〜７００ｎｍの波長に極大吸収を有する増感剤とを含有することが感度の観点から好ましい。
前記方法において、基材表面上へのラジカル重合可能な不飽和化合物の接触は、該ラジカル重合可能な不飽和化合物と３６０ｎｍ〜７００ｎｍの波長に極大吸収を有する増感剤を含有する層を接触させることにより実施されることが好ましい。
また、本発明の請求項４に係る導電性パターン形成方法は、前記本発明のグラフトパターン形成方法により形成されたパターン状のグラフトポリマーに導電性を付与することを特徴とする。
As a result of the study, the present inventors have found that the above-mentioned problems can be solved by generating a graft polymer by radical polymerization on the surface of a substrate that can start radical polymerization by applying energy, and completed the present invention. .
That is, in the graft pattern forming method of the present invention, an unsaturated compound capable of radical polymerization is brought into contact with a substrate surface capable of generating radicals upon exposure, and imagewise exposure is performed with a laser having a wavelength of 360 nm to 700 nm. characterized in that to produce a graft polymer and a polymerizable group is engaged sintering and reacting with the substrate in the radical and radical-polymerizable unsaturated compounds generated on the substrate surface in a pattern. By this pattern formation method, the graft polymer directly bonded to the substrate can be generated in a pattern.
Here, it is preferable from the viewpoint of sensitivity that the base material capable of generating radicals upon exposure contains a triazine polymerization initiator and a sensitizer having a maximum absorption at a wavelength of 360 to 700 nm.
In the above method, the contact of the unsaturated compound capable of radical polymerization with the surface of the substrate brings the unsaturated compound capable of radical polymerization into contact with a layer containing a sensitizer having a maximum absorption at a wavelength of 360 nm to 700 nm. Is preferably carried out.
The conductive pattern forming method according to claim 4 of the present invention is characterized in that conductivity is imparted to the patterned graft polymer formed by the graft pattern forming method of the present invention.
Claims (6)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006131834A JP2006350307A (en) | 2005-05-20 | 2006-05-10 | Method of forming graft pattern and method of forming conductive pattern |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005148359 | 2005-05-20 | ||
| JP2006131834A JP2006350307A (en) | 2005-05-20 | 2006-05-10 | Method of forming graft pattern and method of forming conductive pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006350307A JP2006350307A (en) | 2006-12-28 |
| JP2006350307A5 true JP2006350307A5 (en) | 2011-09-29 |
Family
ID=37646155
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006131834A Abandoned JP2006350307A (en) | 2005-05-20 | 2006-05-10 | Method of forming graft pattern and method of forming conductive pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2006350307A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008260272A (en) * | 2007-03-16 | 2008-10-30 | Fujifilm Corp | Laminated body, graft film forming method, graft pattern forming method, metal pattern forming method, printed wiring board, thin layer transistor, apparatus, and photo-mask |
| JP2009220450A (en) * | 2008-03-17 | 2009-10-01 | Fujifilm Corp | Laminate, production process of polymer-metal composite and ultraviolet absorbing film, infrared absorbing film, photo-mask, electromagnetic wave shielding film, conductive material, printed wiring board and thin layer transistor obtained by the process |
| JP2009263703A (en) * | 2008-04-23 | 2009-11-12 | Fujifilm Corp | Method for producing material of surface metal film, material of surface metal film, method for producing material of patterned metal, material of patterned metal, and composition used for forming polymer layer |
| JP2010058403A (en) * | 2008-09-04 | 2010-03-18 | Fujifilm Corp | Polymer film and laminate |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002278049A (en) * | 2001-03-22 | 2002-09-27 | Fuji Photo Film Co Ltd | Photosensitive planographic printing plate |
| JP2005037881A (en) * | 2003-04-21 | 2005-02-10 | Fuji Photo Film Co Ltd | Pattern forming method, image forming method, fine particle adsorption pattern forming method, conductive pattern forming method, pattern forming material, and planographic printing plate |
| JP4348253B2 (en) * | 2003-08-20 | 2009-10-21 | 富士フイルム株式会社 | Conductive pattern material and method of forming conductive pattern |
-
2006
- 2006-05-10 JP JP2006131834A patent/JP2006350307A/en not_active Abandoned
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