JP2006342106A - Transition metal compound - Google Patents
Transition metal compound Download PDFInfo
- Publication number
- JP2006342106A JP2006342106A JP2005169673A JP2005169673A JP2006342106A JP 2006342106 A JP2006342106 A JP 2006342106A JP 2005169673 A JP2005169673 A JP 2005169673A JP 2005169673 A JP2005169673 A JP 2005169673A JP 2006342106 A JP2006342106 A JP 2006342106A
- Authority
- JP
- Japan
- Prior art keywords
- group
- containing group
- transition metal
- groups
- hydrocarbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000003623 transition metal compounds Chemical class 0.000 title claims abstract description 39
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract description 37
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 22
- 239000003446 ligand Substances 0.000 claims abstract description 21
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000001301 oxygen Substances 0.000 claims abstract description 16
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 16
- 239000002243 precursor Substances 0.000 claims abstract description 16
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 15
- 239000011593 sulfur Substances 0.000 claims abstract description 15
- 150000001875 compounds Chemical class 0.000 claims abstract description 14
- 125000005843 halogen group Chemical group 0.000 claims abstract description 14
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 13
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 10
- 229910052744 lithium Inorganic materials 0.000 claims abstract description 8
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 8
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 7
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 7
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 7
- 229910052791 calcium Inorganic materials 0.000 claims abstract description 6
- 150000003624 transition metals Chemical class 0.000 claims abstract description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 19
- 229910052710 silicon Inorganic materials 0.000 claims description 19
- 239000010703 silicon Substances 0.000 claims description 19
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 17
- 229910052732 germanium Inorganic materials 0.000 claims description 17
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 17
- 229910052718 tin Inorganic materials 0.000 claims description 17
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 15
- 229910052796 boron Inorganic materials 0.000 claims description 15
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 13
- 229910052698 phosphorus Inorganic materials 0.000 claims description 13
- 239000011574 phosphorus Substances 0.000 claims description 13
- 150000002391 heterocyclic compounds Chemical group 0.000 claims description 12
- 239000001257 hydrogen Substances 0.000 claims description 9
- 229910052736 halogen Inorganic materials 0.000 claims description 8
- 150000002367 halogens Chemical class 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052792 caesium Inorganic materials 0.000 claims description 6
- 229910052701 rubidium Inorganic materials 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 abstract description 14
- 125000001841 imino group Chemical group [H]N=* 0.000 abstract description 4
- 239000004215 Carbon black (E152) Substances 0.000 abstract description 2
- 229930195733 hydrocarbon Natural products 0.000 abstract description 2
- BPELEZSCHIEMAE-UHFFFAOYSA-N salicylaldehyde imine Chemical compound OC1=CC=CC=C1C=N BPELEZSCHIEMAE-UHFFFAOYSA-N 0.000 abstract 1
- -1 alkyl transition metal compound Chemical class 0.000 description 78
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 22
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 22
- 125000004432 carbon atom Chemical group C* 0.000 description 22
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 17
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 11
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 125000003118 aryl group Chemical group 0.000 description 10
- 239000010936 titanium Substances 0.000 description 8
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 6
- 238000005481 NMR spectroscopy Methods 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 125000003808 silyl group Chemical class [H][Si]([H])([H])[*] 0.000 description 6
- 239000002002 slurry Substances 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 5
- 125000003277 amino group Chemical group 0.000 description 5
- UHOVQNZJYSORNB-MZWXYZOWSA-N benzene-d6 Chemical compound [2H]C1=C([2H])C([2H])=C([2H])C([2H])=C1[2H] UHOVQNZJYSORNB-MZWXYZOWSA-N 0.000 description 5
- 125000004185 ester group Chemical group 0.000 description 5
- 150000001336 alkenes Chemical class 0.000 description 4
- 125000004104 aryloxy group Chemical group 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 239000000706 filtrate Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical group C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 3
- 125000002252 acyl group Chemical group 0.000 description 3
- 125000004414 alkyl thio group Chemical group 0.000 description 3
- 239000002168 alkylating agent Substances 0.000 description 3
- 229940100198 alkylating agent Drugs 0.000 description 3
- 125000003368 amide group Chemical group 0.000 description 3
- 125000005110 aryl thio group Chemical group 0.000 description 3
- 125000000068 chlorophenyl group Chemical group 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- 125000005462 imide group Chemical group 0.000 description 3
- 150000002466 imines Chemical class 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 125000000538 pentafluorophenyl group Chemical group FC1=C(F)C(F)=C(*)C(F)=C1F 0.000 description 3
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 3
- 125000000547 substituted alkyl group Chemical group 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 230000002194 synthesizing effect Effects 0.000 description 3
- 150000007970 thio esters Chemical group 0.000 description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 3
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 2
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 2
- AQZWEFBJYQSQEH-UHFFFAOYSA-N 2-methyloxaluminane Chemical compound C[Al]1CCCCO1 AQZWEFBJYQSQEH-UHFFFAOYSA-N 0.000 description 2
- 241000349731 Afzelia bipindensis Species 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 2
- 125000005234 alkyl aluminium group Chemical group 0.000 description 2
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 125000001727 boranediyl group Chemical group [H]B(*)* 0.000 description 2
- 125000002515 boranetriyl group Chemical group *B(*)* 0.000 description 2
- 125000003739 carbamimidoyl group Chemical group C(N)(=N)* 0.000 description 2
- 125000005587 carbonate group Chemical group 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 150000001244 carboxylic acid anhydrides Chemical group 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000012018 catalyst precursor Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000004643 cyanate ester Chemical group 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 2
- 125000005022 dithioester group Chemical group 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 150000004795 grignard reagents Chemical class 0.000 description 2
- 150000008282 halocarbons Chemical group 0.000 description 2
- 125000000717 hydrazino group Chemical group [H]N([*])N([H])[H] 0.000 description 2
- 125000005638 hydrazono group Chemical group 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910017053 inorganic salt Inorganic materials 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000002462 isocyano group Chemical group *[N+]#[C-] 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- IHLVCKWPAMTVTG-UHFFFAOYSA-N lithium;carbanide Chemical compound [Li+].[CH3-] IHLVCKWPAMTVTG-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000012452 mother liquor Substances 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 125000000018 nitroso group Chemical group N(=O)* 0.000 description 2
- 125000000864 peroxy group Chemical group O(O*)* 0.000 description 2
- 125000005561 phenanthryl group Chemical group 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000001863 phosphorothioyl group Chemical group *P(*)(*)=S 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- 229910000104 sodium hydride Inorganic materials 0.000 description 2
- 239000012312 sodium hydride Substances 0.000 description 2
- 238000012916 structural analysis Methods 0.000 description 2
- 125000004646 sulfenyl group Chemical group S(*)* 0.000 description 2
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 2
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 2
- 125000000565 sulfonamide group Chemical group 0.000 description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 2
- 125000003441 thioacyl group Chemical group 0.000 description 2
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M thiocyanate group Chemical group [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 2
- 125000000101 thioether group Chemical group 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Natural products C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 1
- CGCVLTOGUMLHNP-UHFFFAOYSA-N 2,3-dimethylbutane-2,3-diamine Chemical compound CC(C)(N)C(C)(C)N CGCVLTOGUMLHNP-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- MGADZUXDNSDTHW-UHFFFAOYSA-N 2H-pyran Chemical compound C1OC=CC=C1 MGADZUXDNSDTHW-UHFFFAOYSA-N 0.000 description 1
- 125000000242 4-chlorobenzoyl group Chemical group ClC1=CC=C(C(=O)*)C=C1 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical group CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical group NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 1
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical group NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- KCGKYAORRXGWMN-UHFFFAOYSA-N CNS(=O)=O Chemical group CNS(=O)=O KCGKYAORRXGWMN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 239000007818 Grignard reagent Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical group C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical group CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 230000029936 alkylation Effects 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- XKMRRTOUMJRJIA-UHFFFAOYSA-N ammonia nh3 Chemical compound N.N XKMRRTOUMJRJIA-UHFFFAOYSA-N 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- MEVHTHLQPUQANE-UHFFFAOYSA-N aziridine-2,3-dione Chemical group O=C1NC1=O MEVHTHLQPUQANE-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical group OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 230000009849 deactivation Effects 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- AXAZMDOAUQTMOW-UHFFFAOYSA-N dimethylzinc Chemical compound C[Zn]C AXAZMDOAUQTMOW-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-N ethanesulfonic acid Chemical group CCS(O)(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000004705 ethylthio group Chemical group C(C)S* 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical group C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- ZBKFYXZXZJPWNQ-UHFFFAOYSA-N isothiocyanate group Chemical group [N-]=C=S ZBKFYXZXZJPWNQ-UHFFFAOYSA-N 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 229910000103 lithium hydride Inorganic materials 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- GWLOGZRVYXAHRE-UHFFFAOYSA-N n,4-dimethylbenzenesulfonamide Chemical group CNS(=O)(=O)C1=CC=C(C)C=C1 GWLOGZRVYXAHRE-UHFFFAOYSA-N 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- OHLUUHNLEMFGTQ-AZXPZELESA-N n-methylacetamide Chemical group C[15NH]C(C)=O OHLUUHNLEMFGTQ-AZXPZELESA-N 0.000 description 1
- NCCHARWOCKOHIH-UHFFFAOYSA-N n-methylbenzamide Chemical group CNC(=O)C1=CC=CC=C1 NCCHARWOCKOHIH-UHFFFAOYSA-N 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000005029 naphthylthio group Chemical group C1(=CC=CC2=CC=CC=C12)S* 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000001181 organosilyl group Chemical class [SiH3]* 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000005420 sulfonamido group Chemical group S(=O)(=O)(N*)* 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- UBZYKBZMAMTNKW-UHFFFAOYSA-J titanium tetrabromide Chemical compound Br[Ti](Br)(Br)Br UBZYKBZMAMTNKW-UHFFFAOYSA-J 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- YXFVVABEGXRONW-JGUCLWPXSA-N toluene-d8 Chemical compound [2H]C1=C([2H])C([2H])=C(C([2H])([2H])[2H])C([2H])=C1[2H] YXFVVABEGXRONW-JGUCLWPXSA-N 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Abstract
Description
本発明は、オレフィン重合に用いることが出来る新規な遷移金属化合物およびその合成方法に関する。 The present invention relates to a novel transition metal compound that can be used for olefin polymerization and a synthesis method thereof.
配位子としてフェノキシ基とイミンのキレート型化合物を2つ有する4族遷移金属化合物が、オレフィン重合用触媒として優れた性能をもつことが開示されている(特許文献1)。また、フェノキシ基の代わりにピロリド基、インドリド基を持つ遷移金属化合物が、良好なオレフィン重合用触媒になることが示されている(特許文献2)。これらの一群のイミン結合含有遷移金属化合物においては、典型的には触媒前駆体としてのジハロゲン化物をメチルアルモキサン(MAO)などの有機アルミニウム化合物共触媒でアルキル化、活性化した後、オレフィン重合に供する方法が取られている。一方で有機アルミニウム化合物を用いずに、メタロセンなどの他の遷移金属錯体を活性化する方法が知られている。この場合は、触媒前駆体として少なくとも一つのアルキル基を有するアルキル遷移金属化合物を使用し、ルイス酸、プロトン酸、酸化剤などによって、触媒活性種を生成させる。 It is disclosed that a group 4 transition metal compound having two phenoxy group and imine chelate type compounds as ligands has excellent performance as an olefin polymerization catalyst (Patent Document 1). Moreover, it has been shown that a transition metal compound having a pyrrolide group or an indolide group instead of a phenoxy group is a good catalyst for olefin polymerization (Patent Document 2). In these group of imine bond-containing transition metal compounds, the dihalide as a catalyst precursor is typically alkylated and activated with an organoaluminum compound cocatalyst such as methylalumoxane (MAO), and then subjected to olefin polymerization. The method to offer is taken. On the other hand, a method of activating other transition metal complexes such as metallocene without using an organoaluminum compound is known. In this case, an alkyl transition metal compound having at least one alkyl group is used as a catalyst precursor, and a catalytically active species is generated by a Lewis acid, a proton acid, an oxidizing agent, or the like.
上記した遷移金属化合物のアルキル錯体はこれまでにほとんど知られていない。その理由としては、メタロセンのハロゲン化物あるいはアミド化合物のアルキル化などに用いられるアルキル化剤(アルキルリチウム、アルキルマグネシウム、アルキルアルミニウム、アルキル亜鉛など)は、イミン結合含有化合物との反応では、配位子のイミンを還元する副反応を防ぐことが出来ないことと、特に中心金属がチタンの場合低原子価チタンへの還元により所望の化合物が得られないことに起因する。また4族テトラアルキル錯体と酸性プロトンを有する配位子との反応でアルカンを脱離させながらジアルキル錯体を合成する方法も知られている。典型的にはテトラベンジル錯体など比較的安定で嵩高い遷移金属化合物がこの反応に用いられるが、反応収率が低いこと、テトラアルキル錯体を別途合成しなければならないこと、ベンジル基はラジカルとして脱離し、分子内でイミンと反応することがあることなどの欠点を有していた。 Almost no alkyl complexes of the above transition metal compounds have been known so far. The reason is that alkylating agents (alkyllithium, alkylmagnesium, alkylaluminum, alkylzinc, etc.) used for alkylation of metallocene halides or amide compounds, etc., can react with ligands containing imine bonds. This is because the side reaction of reducing the imine cannot be prevented, and in particular, when the central metal is titanium, the desired compound cannot be obtained by reduction to low-valent titanium. There is also known a method of synthesizing a dialkyl complex while removing an alkane by a reaction between a group 4 tetraalkyl complex and a ligand having an acidic proton. Typically, a relatively stable and bulky transition metal compound such as a tetrabenzyl complex is used for this reaction, but the reaction yield is low, the tetraalkyl complex must be synthesized separately, and the benzyl group is removed as a radical. And had drawbacks such as being able to react with imines within the molecule.
有機アルミニウム化合物を使用しないことにより、共触媒の熱安定性の向上、有機アルミニウム由来の副反応の抑制などの効果が考えられることから、イミン結合含有遷移金属化合物のアルキル錯体の簡便な合成方法が切望されていた。
上記の背景の下、本発明者らは、イミン結合含有遷移金属化合物のアルキル錯体を合成すべく鋭意検討を重ねた結果、特定の方法においてこのような化合物を合成することが可能であることを見出し、本発明を完成させるに至った。 Under the background described above, the present inventors have intensively studied to synthesize alkyl complexes of imine bond-containing transition metal compounds, and as a result, it is possible to synthesize such compounds in a specific method. The headline and the present invention have been completed.
本発明は、
下記一般式(I)で表される遷移金属化合物(A)と、
RnMX4-n・・・・(I)
〔式中、Mは4族の遷移金属を表す。nは1から4の整数であり、Xは、水素原子、炭化水素基、ハロゲン原子、酸素含有基、イオウ含有基、窒素含有基、ホウ素含有基、アルミニウム含有基、リン含有基、ハロゲン含有基、ヘテロ環式化合物残基、ケイ素含有基、ゲルマニウム含有基、またはスズ含有基を示し、Rは炭化水素基である。〕
下記のGroup Yから選ばれる一つの結合残基(y)と、下記のGroup Zから選ばれる結合残基(z)を共に含む配位子前駆体(B)、とを反応させることによって、
前記のR、結合残基(y)および結合残基(z)を共に含む遷移金属化合物(C)の製造方法に関する。
The present invention
A transition metal compound (A) represented by the following general formula (I):
R n MX 4-n ... (I)
[Wherein M represents a group 4 transition metal. n is an integer of 1 to 4, and X is a hydrogen atom, hydrocarbon group, halogen atom, oxygen-containing group, sulfur-containing group, nitrogen-containing group, boron-containing group, aluminum-containing group, phosphorus-containing group, halogen-containing group , A heterocyclic compound residue, a silicon-containing group, a germanium-containing group, or a tin-containing group, and R is a hydrocarbon group. ]
By reacting one binding residue (y) selected from the following Group Y with a ligand precursor (B) including both a binding residue (z) selected from the following Group Z:
The present invention relates to a process for producing a transition metal compound (C) containing both R, the binding residue (y) and the binding residue (z).
〔上記のGroup Yに示される結合残基を示す一般式(II)および(II’)において、R25〜R28は互いに同一でも異なっていてもよく、水素原子、ハロゲン原子、炭化水素基、ヘテロ環式化合物残基、酸素含有基、窒素含有基、ホウ素含有基、イオウ含有基、リン含有基、ケイ素含有基、ゲルマニウム含有基、またはスズ含有基を示し、Group Zに示される結合残基を示す一般式(III)および(III’)において、Eは水素、Li、Na、K、Rb、Cs、Mg又はCaであるか、或いはMg含有基、Ca含有基、Si含有基又はSn含有基である。〕 [In the general formulas (II) and (II ′) showing the binding residues shown in Group Y above, R 25 to R 28 may be the same or different from each other, and may be a hydrogen atom, a halogen atom, a hydrocarbon group, A bond residue shown in Group Z, indicating a heterocyclic compound residue, oxygen-containing group, nitrogen-containing group, boron-containing group, sulfur-containing group, phosphorus-containing group, silicon-containing group, germanium-containing group, or tin-containing group In the general formulas (III) and (III ′) showing, E is hydrogen, Li, Na, K, Rb, Cs, Mg, or Ca, or Mg-containing group, Ca-containing group, Si-containing group, or Sn-containing It is a group. ]
本発明記載の方法では、遷移金属化合物(A)を単離精製することなく次の配位子前駆体(B)との反応工程に用いることが出来る上に、一般に良く用いられるベンジル基以外の様々なアルキル基が導入された遷移金属化合物(C)を収率よく製造することが可能である。 In the method according to the present invention, the transition metal compound (A) can be used in the reaction step with the next ligand precursor (B) without isolation and purification, and in addition to the commonly used benzyl group. It is possible to produce the transition metal compound (C) into which various alkyl groups are introduced with good yield.
以下、本発明を実施するための最良の形態について説明する。
遷移金属化合物(A)
本発明に用いられる遷移金属化合物(A)は、下記一般式(I)で表される。
Hereinafter, the best mode for carrying out the present invention will be described.
Transition metal compound (A)
The transition metal compound (A) used in the present invention is represented by the following general formula (I).
RnMX4-n ・・・・(I)
〔式中、Mは4族の遷移金属を表す。nは1から4の整数であり、Xは、水素原子、炭化水素基、ハロゲン原子、酸素含有基、イオウ含有基、窒素含有基、ホウ素含有基、アルミニウム含有基、リン含有基、ハロゲン含有基、ヘテロ環式化合物残基、ケイ素含有基、ゲルマニウム含有基、またはスズ含有基を示し、Rは炭化水素基である。〕
R n MX 4-n ... (I)
[Wherein M represents a group 4 transition metal. n is an integer of 1 to 4, and X is a hydrogen atom, hydrocarbon group, halogen atom, oxygen-containing group, sulfur-containing group, nitrogen-containing group, boron-containing group, aluminum-containing group, phosphorus-containing group, halogen-containing group , A heterocyclic compound residue, a silicon-containing group, a germanium-containing group, or a tin-containing group, and R is a hydrocarbon group. ]
一般式(I)におけるXとしての炭化水素基は、炭化水素基として具体的には、メチル、エチル、n-プロピル、イソプロピル、n-ブチル、イソブチル、sec-ブチル、 tert-ブチル、ネオペンチル、n-ヘキシルなどの炭素原子数が1〜30、好ましくは1〜20の直鎖状または分岐状のアルキル基;ビニル、アリル、イソプロペニルなどの炭素原子数が2〜30、好ましくは2〜20の直鎖状または分岐状のアルケニル基;エチニル、プロパルギルなど炭素原子数が2〜30、好ましくは2〜20の直鎖状または分岐状のアルキニル基;シクロプロピル、シクロブチル、シクロペンチル、シクロヘキシル、アダマンチルなどの炭素原子数が3〜30、好ましくは3〜20の環状飽和炭化水素基;シクロペンタジエニル、インデニル、フルオレニルなどの炭素数5〜30の環状不飽和炭化水素基;フェニル、ベンジル、ナフチル、ビフェニル、ターフェニル、フェナントリル、アントラセニルなどの炭素原子数が6〜30、好ましくは6〜20のアリール基;トリル、iso-プロピルフェニル、t-ブチルフェニル、ジメチルフェニル、ジ-t-ブチルフェニルなどのアルキル置換アリール基などが挙げられる。炭化水素基の一つ以上の水素原子がハロゲンで置換されていてもよく、たとえば、トリフルオロメチル基、ペンタフルオロフェニル基、クロロフェニル基などの炭素原子数1〜30、好ましくは1〜20のハロゲン化炭化水素基が挙げられる。また、上記炭化水素基は、他の炭化水素基で置換されていてもよく、たとえば、ベンジル基、クミル基などのアリール基置換アルキル基などが挙げられる。さらに上記炭化水素基は、ホウ素、アルミニウム、ケイ素、ゲルマニウム、スズなどの他の13および14族元素で置換されていてもよく、たとえば、トリメチルシリルメチル基、ビス(トリメチルシリル)メチル基などが挙げられる。
ハロゲン原子としては、フッ素、塩素、臭素、ヨウ素が挙げられる。
The hydrocarbon group as X in the general formula (I) is specifically, as a hydrocarbon group, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, neopentyl, n A linear or branched alkyl group having 1 to 30 carbon atoms, preferably 1 to 20 carbon atoms such as hexyl; 2 to 30 carbon atoms, preferably 2 to 20 carbon atoms such as vinyl, allyl, isopropenyl, etc. A linear or branched alkenyl group; a linear or branched alkynyl group having 2 to 30, preferably 2 to 20 carbon atoms such as ethynyl and propargyl; cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, adamantyl and the like A cyclic saturated hydrocarbon group having 3 to 30, preferably 3 to 20 carbon atoms; cyclopentadienyl, indenyl, fluorenyl, etc. A cyclic unsaturated hydrocarbon group having 5 to 30 carbon atoms; an aryl group having 6 to 30 carbon atoms, preferably 6 to 20 carbon atoms, such as phenyl, benzyl, naphthyl, biphenyl, terphenyl, phenanthryl, anthracenyl; And alkyl-substituted aryl groups such as -propylphenyl, t-butylphenyl, dimethylphenyl, and di-t-butylphenyl. One or more hydrogen atoms of the hydrocarbon group may be substituted with halogen, for example, halogen having 1 to 30 carbon atoms, preferably 1 to 20 carbon atoms such as trifluoromethyl group, pentafluorophenyl group, chlorophenyl group, etc. A hydrocarbyl group. Moreover, the said hydrocarbon group may be substituted by other hydrocarbon groups, for example, aryl group substituted alkyl groups, such as a benzyl group and a cumyl group, etc. are mentioned. Furthermore, the hydrocarbon group may be substituted with other group 13 and 14 elements such as boron, aluminum, silicon, germanium, and tin, and examples thereof include a trimethylsilylmethyl group and a bis (trimethylsilyl) methyl group.
Examples of the halogen atom include fluorine, chlorine, bromine and iodine.
酸素含有基としては、アルコシキ基、アリーロキシ基、エステル基、エーテル基、アシル基、カルボキシル基、カルボナート基、ヒドロキシ基、ペルオキシ基、カルボン酸無水物基などが例示される。 Examples of the oxygen-containing group include an alkoxy group, an aryloxy group, an ester group, an ether group, an acyl group, a carboxyl group, a carbonate group, a hydroxy group, a peroxy group, and a carboxylic acid anhydride group.
イオウ含有基としては、メルカプト基、チオエステル基、ジチオエステル基、アルキルチオ基、アリールチオ基、チオアシル基、チオエーテル基、チオシアン酸エステル基、イソチアン酸エステル基、スルホンエステル基、スルホンアミド基、チオカルボキシル基、ジチオカルボキシル基、スルホ基、スルホニル基、スルフィニル基、スルフェニル基などを例示することができる。 Sulfur-containing groups include mercapto group, thioester group, dithioester group, alkylthio group, arylthio group, thioacyl group, thioether group, thiocyanate group, isothiocyanate group, sulfone ester group, sulfonamido group, thiocarboxyl group, Examples include a dithiocarboxyl group, a sulfo group, a sulfonyl group, a sulfinyl group, a sulfenyl group, and the like.
窒素含有基としては、アミノ基、イミノ基、アミド基、イミド基、ヒドラジノ基、ヒドラゾノ基、ニトロ基、ニトロソ基、シアノ基、イソシアノ基、シアン酸エステル基、アミジノ基、ジアゾ基、アミノ基がアンモニウム塩となったものなどを例示することができる。 Nitrogen-containing groups include amino groups, imino groups, amide groups, imide groups, hydrazino groups, hydrazono groups, nitro groups, nitroso groups, cyano groups, isocyano groups, cyanate ester groups, amidino groups, diazo groups, and amino groups. The thing which became ammonium salt can be illustrated.
ホウ素含有基としては、ボランジイル基、ボラントリイル基、ジボラニル基などが例示される。 Examples of the boron-containing group include a boranediyl group, a boranetriyl group, and a diboranyl group.
リン含有基としては、ホスフィド基、ホスホリル基、チオホスホリル基、ホスファト基などが例示される。 Examples of the phosphorus-containing group include a phosphide group, a phosphoryl group, a thiophosphoryl group, and a phosphato group.
アルミニウム含有基として具体的には、AlR4(Rは水素、アルキル基、置換基を有してもよいアリール基、ハロゲン原子等を示す)が挙げられる。 Specific examples of the aluminum-containing group include AlR4 (R represents hydrogen, an alkyl group, an aryl group which may have a substituent, a halogen atom, or the like).
ケイ素含有基としては、メチルシリル、フェニルシリルなどのモノ炭化水素置換シリル基;ジメチルシリル、ジフェニルシリルなどのジ炭化水素置換シリル基;トリメチルシリル、トリエチルシリル、トリプロピルシリル、トリシクロヘキシルシリル、トリフェニルシリル、ジメチルフェニルシリル、メチルジフェニルシリル、トリトリルシリル、トリナフチルシリルなどのトリ炭化水素置換シリル基;トリメチルシリルエーテルなどの炭化水素置換シリルのシリルエーテル基;トリメチルシリルメチルなどのケイ素置換アルキル基;トリメチルシリルフェニルなどのケイ素置換アリール基などが挙げられる。 Examples of silicon-containing groups include monohydrocarbon-substituted silyl groups such as methylsilyl and phenylsilyl; dihydrocarbon-substituted silyl groups such as dimethylsilyl and diphenylsilyl; trimethylsilyl, triethylsilyl, tripropylsilyl, tricyclohexylsilyl, triphenylsilyl, Trihydrocarbon-substituted silyl groups such as dimethylphenylsilyl, methyldiphenylsilyl, tolylsilylsilyl, trinaphthylsilyl; hydrocarbon-substituted silyl silyl ether groups such as trimethylsilyl ether; silicon-substituted alkyl groups such as trimethylsilylmethyl; trimethylsilylphenyl and the like Examples include silicon-substituted aryl groups.
ゲルマニウム含有基およびスズ含有基としては、前記ケイ素含有基のケイ素をゲルマニウムおよびスズに置換したものが挙げられる。 Examples of the germanium-containing group and tin-containing group include those obtained by substituting silicon of the silicon-containing group with germanium and tin.
一般式(I)におけるRとしての炭化水素基は、前記したXとしての炭化水素基を制限無く使用することができる。Rとしての炭化水素基の一つ以上の水素原子はハロゲンで置換されていてもよく、たとえば、トリフルオロメチル基、ペンタフルオロフェニル基、クロロフェニル基などの炭素原子数1〜30、好ましくは1〜20のハロゲン化炭化水素基が挙げられる。また、上記炭化水素基は、他の炭化水素基で置換されていてもよく、たとえば、ベンジル基、クミル基などのアリール基置換アルキル基などが挙げられる。さらに上記炭化水素基は、ホウ素、アルミニウム、ケイ素、ゲルマニウム、スズなどの他の13および14族元素で置換されていてもよく、たとえば、トリメチルシリルメチル基、ビス(トリメチルシリル)メチル基などが挙げられる。 As the hydrocarbon group as R in the general formula (I), the above-described hydrocarbon group as X can be used without limitation. One or more hydrogen atoms of the hydrocarbon group as R may be substituted with halogen, for example, 1 to 30 carbon atoms such as trifluoromethyl group, pentafluorophenyl group, chlorophenyl group, preferably 1 to There are 20 halogenated hydrocarbon groups. Moreover, the said hydrocarbon group may be substituted by other hydrocarbon groups, for example, aryl group substituted alkyl groups, such as a benzyl group and a cumyl group, etc. are mentioned. Furthermore, the hydrocarbon group may be substituted with other group 13 and 14 elements such as boron, aluminum, silicon, germanium, and tin, and examples thereof include a trimethylsilylmethyl group and a bis (trimethylsilyl) methyl group.
遷移金属化合物(A)は、エーテル系溶媒、あるいは炭化水素溶媒中で、MX4〔式中、MおよびXは、前記一般式(I)で表される遷移金属化合物(A)と同義である。〕とアルキル化剤とを反応させることによって合成することが出来る。以下に具体的な例を示すが、反応は、これらに限定されるものではない。反応溶媒としては、ジエチルエーテル、ジブチルエーテル、THF、トルエン、ペンタン、ベンゼンなどが好ましく、ジエチルエーテル、THFが特に好ましい。MX4〔式中、MおよびXは、前記一般式(I)で表される遷移金属化合物(A)と同義である。〕としては、MF4、MCl4、MBr4、MI4などのハロゲン化物、あるいはそのドナー性化合物との付加体、アミド類、M(NR2)4、およびアルコキシド類、M(OR)4(R=アルキル基、アリール基)などを用いることが出来るが、好ましくはハロゲン化物およびその付加体が用いられる。ドナー性化合物としては、THF、ジエチルエーテル、1,2−ジメトキシエタン、1,1,2,2−テトラメチルエチレンジアミンなどが用いられるが、好ましくはTHFおよび1,2−ジメトキシエタンである。アルキル化剤としてはアルキルリチウム試剤、グリニャー試薬、アルキルアルミニウム、アルキル亜鉛、アルキルスズ化合物などを用いることが可能である。好ましくはアルキルリチウム試剤、グリニャー試薬であり、特にアルキルリチウム試剤の使用が好ましい。反応生成物は、単離精製しても良く、また、そのまま、あるいは適当な溶媒に置換したあと次の反応に用いても良い。 The transition metal compound (A) is an ether solvent or a hydrocarbon solvent, and MX 4 [wherein, M and X have the same meaning as the transition metal compound (A) represented by the general formula (I). . And an alkylating agent can be synthesized. Specific examples are shown below, but the reaction is not limited thereto. As the reaction solvent, diethyl ether, dibutyl ether, THF, toluene, pentane, benzene and the like are preferable, and diethyl ether and THF are particularly preferable. MX 4 [wherein, M and X are synonymous with the transition metal compound (A) represented by the general formula (I). ], Halides such as MF 4 , MCl 4 , MBr 4 , MI 4 , or adducts thereof with donor compounds, amides, M (NR 2 ) 4 , and alkoxides, M (OR) 4 ( R = alkyl group, aryl group) and the like can be used, and halides and adducts thereof are preferably used. As the donor compound, THF, diethyl ether, 1,2-dimethoxyethane, 1,1,2,2-tetramethylethylenediamine and the like are used, and THF and 1,2-dimethoxyethane are preferable. As the alkylating agent, an alkyl lithium reagent, a Grignard reagent, an alkyl aluminum, an alkyl zinc, an alkyl tin compound, or the like can be used. Alkyllithium reagents and Grignard reagents are preferred, and the use of alkyllithium reagents is particularly preferred. The reaction product may be isolated and purified, or may be used in the next reaction as it is or after substitution with an appropriate solvent.
配位子前駆体(B)
本発明に用いられる配位子前駆体(B)は、下記のGroup Yから選ばれる一つの結合残基(y)と、下記のGroup Zから選ばれる結合残基(z)を共に含む。
Ligand precursor (B)
The ligand precursor (B) used in the present invention includes both one binding residue (y) selected from the following Group Y and one binding residue (z) selected from the following Group Z.
〔上記のGroup Yに示される結合残基を示す一般式(II)および(II’)において、R25〜R28は互いに同一でも異なっていてもよく、水素原子、ハロゲン原子、炭化水素基、ヘテロ環式化合物残基、酸素含有基、窒素含有基、ホウ素含有基、イオウ含有基、リン含有基、ケイ素含有基、ゲルマニウム含有基、またはスズ含有基を示し、Group Zに示される結合残基を示す一般式(III)および(III’)において、Eは水素、Li、Na、K、Rb、Cs、Mg又はCaであるか、或いはMg含有基、Ca含有基、Si含有基又はSn含有基である。〕 [In the general formulas (II) and (II ′) showing the binding residues shown in Group Y above, R 25 to R 28 may be the same as or different from each other, and may be a hydrogen atom, a halogen atom, a hydrocarbon group, A bond residue shown in Group Z, indicating a heterocyclic compound residue, oxygen-containing group, nitrogen-containing group, boron-containing group, sulfur-containing group, phosphorus-containing group, silicon-containing group, germanium-containing group, or tin-containing group In the general formulas (III) and (III ′) showing, E is hydrogen, Li, Na, K, Rb, Cs, Mg, or Ca, or Mg-containing group, Ca-containing group, Si-containing group, or Sn-containing It is a group. ]
一般式(II)または(II’)におけるR25〜R28としての炭化水素基は、水素原子がハロゲンで置換されていてもよく、たとえば、トリフルオロメチル基、ペンタフルオロフェニル基、クロロフェニル基などの炭素原子数1〜30、好ましくは1〜20のハロゲン化炭化水素基が挙げられる。 The hydrocarbon group as R 25 to R 28 in the general formula (II) or (II ′) may have a hydrogen atom substituted with a halogen, such as a trifluoromethyl group, a pentafluorophenyl group, a chlorophenyl group, etc. And a halogenated hydrocarbon group having 1 to 30 carbon atoms, preferably 1 to 20 carbon atoms.
また、上記炭化水素基は、他の炭化水素基で置換されていてもよく、たとえば、ベンジル基、クミル基などのアリール基置換アルキル基などが挙げられる。 Moreover, the said hydrocarbon group may be substituted by other hydrocarbon groups, for example, aryl group substituted alkyl groups, such as a benzyl group and a cumyl group, etc. are mentioned.
さらにまた、上記炭化水素基は、ヘテロ環式化合物残基;アルコシキ基、アリーロキシ基、エステル基、エーテル基、アシル基、カルボキシル基、カルボナート基、ヒドロキシ基、ペルオキシ基、カルボン酸無水物基などの酸素含有基;アミノ基、イミノ基、アミド基、イミド基、ヒドラジノ基、ヒドラゾノ基、ニトロ基、ニトロソ基、シアノ基、イソシアノ基、シアン酸エステル基、アミジノ基、ジアゾ基、アミノ基がアンモニウム塩となったものなどの窒素含有基;ボランジイル基、ボラントリイル基、ジボラニル基などのホウ素含有基;メルカプト基、チオエステル基、ジチオエステル基、アルキルチオ基、アリールチオ基、チオアシル基、チオエーテル基、チオシアン酸エステル基、イソチアン酸エステル基、スルホンエステル基、スルホンアミド基、チオカルボキシル基、ジチオカルボキシル基、スルホ基、スルホニル基、スルフィニル基、スルフェニル基などのイオウ含有基;ホスフィド基、ホスホリル基、チオホスホリル基、ホスファト基などのリン含有基、ケイ素含有基、ゲルマニウム含有基、またはスズ含有基を有していてもよい。 Furthermore, the hydrocarbon group is a heterocyclic compound residue; an alkoxy group, an aryloxy group, an ester group, an ether group, an acyl group, a carboxyl group, a carbonate group, a hydroxy group, a peroxy group, a carboxylic anhydride group, etc. Oxygen-containing group: amino group, imino group, amide group, imide group, hydrazino group, hydrazono group, nitro group, nitroso group, cyano group, isocyano group, cyanate ester group, amidino group, diazo group, amino group is ammonium salt Nitrogen-containing groups such as those; boron-containing groups such as boranediyl group, boranetriyl group, diboranyl group; mercapto group, thioester group, dithioester group, alkylthio group, arylthio group, thioacyl group, thioether group, thiocyanate group , Isothiocyanate ester group, sulfone ester group, Sulfur-containing groups such as sulfonamide groups, thiocarboxyl groups, dithiocarboxyl groups, sulfo groups, sulfonyl groups, sulfinyl groups, sulfenyl groups; phosphorus-containing groups such as phosphide groups, phosphoryl groups, thiophosphoryl groups, phosphato groups, silicon-containing groups , A germanium-containing group, or a tin-containing group.
これらのうち、特に、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、t-ブチル基、ネオペンチル基、n-ヘキシル基などの炭素原子数1〜30、好ましくは1〜20の直鎖状または分岐状のアルキル基;フェニル基、ナフチル基、ビフェニル基、ターフェニル基、フェナントリル基、アントラセニル基などの炭素原子数6〜30、好ましくは6〜20のアリール基;これらのアリール基にハロゲン原子、炭素原子数1〜30、好ましくは1〜20のアルキル基またはアルコキシ基、炭素原子数6〜30、好ましくは6〜20のアリール基またはアリーロキシ基などの置換基が1〜5個置換した置換アリール基などが好ましい。 Of these, the number of carbon atoms such as methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, t-butyl group, neopentyl group, n-hexyl group, etc. 1-30, preferably 1-20 linear or branched alkyl groups; 6-30 carbon atoms such as phenyl, naphthyl, biphenyl, terphenyl, phenanthryl, anthracenyl, etc., preferably 6 An aryl group having ˜20; a halogen atom, an alkyl group or alkoxy group having 1 to 30 carbon atoms, preferably 1 to 20 carbon atoms, an aryl group or aryloxy having 6 to 30 carbon atoms, preferably 6 to 20 carbon atoms A substituted aryl group substituted with 1 to 5 substituents such as a group is preferred.
酸素含有基、窒素含有基、ホウ素含有基、イオウ含有基、リン含有基としては、上記例示したものと同様のものが挙げられる。 Examples of the oxygen-containing group, nitrogen-containing group, boron-containing group, sulfur-containing group and phosphorus-containing group are the same as those exemplified above.
ヘテロ環式化合物残基としては、ピロール、ピリジン、ピリミジン、キノリン、トリアジンなどの含窒素化合物、フラン、ピランなどの含酸素化合物、チオフェンなどの含硫黄化合物などの残基、およびこれらのヘテロ環式化合物残基に炭素原子数が1〜30、好ましくは1〜20のアルキル基、アルコキシ基などの置換基がさらに置換した基などが挙げられる。 Heterocyclic compound residues include residues such as nitrogen-containing compounds such as pyrrole, pyridine, pyrimidine, quinoline, and triazine, oxygen-containing compounds such as furan and pyran, sulfur-containing compounds such as thiophene, and heterocyclic groups thereof. Examples thereof include a group further substituted with a substituent such as an alkyl group or alkoxy group having 1 to 30 carbon atoms, preferably 1 to 20 carbon atoms, in the compound residue.
ケイ素含有基としては、シリル基、シロキシ基、炭化水素置換シリル基、炭化水素置換シロキシ基など、具体的には、メチルシリル基、ジメチルシリル基、トリメチルシリル基、エチルシリル基、ジエチルシリル基、トリエチルシリル基、ジフェニルメチルシリル基、トリフェニルシリル基、ジメチルフェニルシリル基、ジメチル-t-ブチルシリル基、ジメチル(ペンタフルオロフェニル)シリル基などが挙げられる。これらの中では、メチルシリル基、ジメチルシリル基、トリメチルシリル基、エチルシリル基、ジエチルシリル基、トリエチルシリル基、ジメチルフェニルシリル基、トリフェニルシリル基などが好ましい。特にトリメチルシリル基、トリエチルシリル基、トリフェニルシリル基、ジメチルフェニルシリル基が好ましい。炭化水素置換シロキシ基として具体的には、トリメチルシロキシ基などが挙げられる。 Silicon-containing groups include silyl groups, siloxy groups, hydrocarbon-substituted silyl groups, hydrocarbon-substituted siloxy groups, and more specifically, methylsilyl groups, dimethylsilyl groups, trimethylsilyl groups, ethylsilyl groups, diethylsilyl groups, triethylsilyl groups , Diphenylmethylsilyl group, triphenylsilyl group, dimethylphenylsilyl group, dimethyl-t-butylsilyl group, dimethyl (pentafluorophenyl) silyl group and the like. Among these, methylsilyl group, dimethylsilyl group, trimethylsilyl group, ethylsilyl group, diethylsilyl group, triethylsilyl group, dimethylphenylsilyl group, triphenylsilyl group and the like are preferable. In particular, a trimethylsilyl group, a triethylsilyl group, a triphenylsilyl group, and a dimethylphenylsilyl group are preferable. Specific examples of the hydrocarbon-substituted siloxy group include a trimethylsiloxy group.
ゲルマニウム含有基およびスズ含有基としては、前記ケイ素含有基のケイ素をゲルマニウムおよびスズに置換したものが挙げられる。 Examples of the germanium-containing group and tin-containing group include those obtained by substituting silicon of the silicon-containing group with germanium and tin.
次に上記で説明したR25〜R28の例について、より具体的に説明する。
アルコキシ基として具体的には、メトキシ基、エトキシ基、n-プロポキシ基、イソプロポキシ基、n-ブトキシ基、イソブトキシ基、t-ブトキシ基などが挙げられる。アルキルチオ基として具体的には、メチルチオ基、エチルチオ基等が挙げられる。アリーロキシ基として具体的には、フェノキシ基、2,6-ジメチルフェノキシ基、2,4,6-トリメチルフェノキシ基などが挙げられる。アリールチオ基として具体的には、フェニルチオ基、メチルフェニルチオ基、ナフチルチオ基等が挙げられる。アシル基として具体的には、ホルミル基、アセチル基、ベンゾイル基、p−クロロベンゾイル基、p-メトキシベンゾイル基などが挙げられる。エステル基として具体的には、アセチルオキシ基、ベンゾイルオキシ基、メトキシカルボニル基、フェノキシカルボニル基、p-クロロフェノキシカルボニル基などが挙げられる。チオエステル基として具体的には、アセチルチオ基、ベンゾイルチオ基、メチルチオカルボニル基、フェニルチオカルボニル基などが挙げられる。アミド基として具体的には、アセトアミド基、N-メチルアセトアミド基、N-メチルベンズアミド基などが挙げられる。イミド基として具体的には、アセトイミド基、ベンズイミド基などが挙げられる。 アミノ基として具体的には、ジメチルアミノ基、エチルメチルアミノ基、ジフェニルアミノ基などが挙げられる。イミノ基として具体的には、メチルイミノ基、エチルイミノ基、プロピルイミノ基、ブチルイミノ基、フェニルイミノ基などが挙げられる。スルホンエステル基として具体的には、スルホン酸メチル基、スルホン酸エチル基、スルホン酸フェニル基などが挙げられる。スルホンアミド基として具体的には、フェニルスルホンアミド基、N-メチルスルホンアミド基、N-メチル-p-トルエンスルホンアミド基などが挙げられる。
Next, the examples of R 25 to R 28 described above will be described more specifically.
Specific examples of the alkoxy group include a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group, an n-butoxy group, an isobutoxy group, and a t-butoxy group. Specific examples of the alkylthio group include a methylthio group and an ethylthio group. Specific examples of the aryloxy group include a phenoxy group, a 2,6-dimethylphenoxy group, and a 2,4,6-trimethylphenoxy group. Specific examples of the arylthio group include a phenylthio group, a methylphenylthio group, and a naphthylthio group. Specific examples of the acyl group include formyl group, acetyl group, benzoyl group, p-chlorobenzoyl group, and p-methoxybenzoyl group. Specific examples of the ester group include an acetyloxy group, a benzoyloxy group, a methoxycarbonyl group, a phenoxycarbonyl group, and a p-chlorophenoxycarbonyl group. Specific examples of the thioester group include an acetylthio group, a benzoylthio group, a methylthiocarbonyl group, and a phenylthiocarbonyl group. Specific examples of the amide group include an acetamide group, an N-methylacetamide group, and an N-methylbenzamide group. Specific examples of the imide group include an acetimide group and a benzimide group. Specific examples of the amino group include a dimethylamino group, an ethylmethylamino group, and a diphenylamino group. Specific examples of the imino group include a methylimino group, an ethylimino group, a propylimino group, a butylimino group, and a phenylimino group. Specific examples of the sulfone ester group include a methyl sulfonate group, an ethyl sulfonate group, and a phenyl sulfonate group. Specific examples of the sulfonamide group include a phenylsulfonamide group, an N-methylsulfonamide group, and an N-methyl-p-toluenesulfonamide group.
R25、R26およびR27、R28は、互いに連結して脂肪環、芳香環または、窒素原子などの異原子を含む炭化水素環を形成していてもよく、これらの環はさらに置換基を有していてもよい。 R 25 , R 26 and R 27 , R 28 may be linked to each other to form an alicyclic ring, an aromatic ring, or a hydrocarbon ring containing a different atom such as a nitrogen atom, and these rings are further substituted. You may have.
一般式(III)または(III’)中、Eは水素、Li、Na、K、Rb、Cs、Mg又はCaであるか、或いはMg含有基、Ca含有基、Si含有基又はSn含有基である。Eが水素の場合は、アルコールおよびアミンであり、それぞれ適当な試薬、たとえば、アルキルリチウムや水素化ナトリウムと反応させることにより、対応するリチウム塩、ナトリウム塩を得ることが出来る。 In the general formula (III) or (III ′), E is hydrogen, Li, Na, K, Rb, Cs, Mg or Ca, or an Mg-containing group, a Ca-containing group, a Si-containing group or a Sn-containing group. is there. When E is hydrogen, it is an alcohol or an amine, and the corresponding lithium salt or sodium salt can be obtained by reacting with an appropriate reagent such as alkyl lithium or sodium hydride.
一般式(II)、(II’)、(III)または(III’)で表される結合残基y、zを共に含む配位子前駆体(B)として、下記式(IV)〜(VII)で表される化合物を挙げることが出来る。 As the ligand precursor (B) including both the binding residues y and z represented by the general formula (II), (II ′), (III) or (III ′), the following formulas (IV) to (VII) ) Can be mentioned.
〔上記式(IV)、(V)、(VI)および(VII)において、R1〜R24は、互いに同一でも異なっていてもよく、水素原子、ハロゲン原子、炭化水素基、ヘテロ環式化合物残基、酸素含有基、窒素含有基、ホウ素含有基、イオウ含有基、リン含有基、ケイ素含有基、ゲルマニウム含有基、またはスズ含有基を示し、Eは水素、Li、Na、K、Rb、Cs、Mg又はCaであるか、或いはMg含有基、Ca含有基、Si含有基又はSn含有基である。〕 [In the above formulas (IV), (V), (VI) and (VII), R 1 to R 24 may be the same or different from each other, and may be a hydrogen atom, a halogen atom, a hydrocarbon group or a heterocyclic compound. Residue, oxygen-containing group, nitrogen-containing group, boron-containing group, sulfur-containing group, phosphorus-containing group, silicon-containing group, germanium-containing group, or tin-containing group, E is hydrogen, Li, Na, K, Rb, Cs, Mg or Ca, or an Mg-containing group, Ca-containing group, Si-containing group or Sn-containing group. ]
一般式(IV)、(V)、(VI)および(VII)において、R1〜R24およびEは、一般式(II)、(II’)、(III)または(III)におけるR25〜R28およびEで例示したものと同様のものを挙げることが出来る。また、R1〜R24は、これらのうちの2個以上の基、好ましくは隣接する基が互いに連結して脂肪環、芳香環または、窒素原子などの異原子を含む炭化水素環を形成していてもよく、これらの環はさらに置換基を有していてもよい。 In the general formulas (IV), (V), (VI) and (VII), R 1 to R 24 and E represent R 25 to R in the general formula (II), (II ′), (III) or (III). it can be mentioned the same ones as exemplified for R 28 and E. R 1 to R 24 are two or more of these groups, preferably adjacent groups connected to each other to form an aliphatic ring, an aromatic ring, or a hydrocarbon ring containing a hetero atom such as a nitrogen atom. These rings may further have a substituent.
遷移金属化合物(C)
本発明に係る遷移金属化合物(C)は、上記で説明した遷移金属化合物(A)と配位子前駆体(B)とを反応させることにより効率よく得ることができる。
Transition metal compound (C)
The transition metal compound (C) according to the present invention can be efficiently obtained by reacting the transition metal compound (A) described above with the ligand precursor (B).
反応は、キシレン、トルエン、ベンゼンなどの芳香族系溶媒やヘキサン、ペンタンなどの脂肪族炭化水素溶媒、ジエチルエーテル、THF、ジブチルエーテルなどのエーテル系溶媒、塩化メチレン、クロロフォルム、クロロベンゼンなどのハロゲン化炭化水素溶媒およびこれらの混合物中で行うことが出来る。アルキル錯体は通常、水および酸素に対して敏感であるため乾燥した窒素やアルゴン、ヘリウムなどの不活性雰囲気下で反応を行うことが望ましい。(A)/(B)の仕込みモル比は0.01から10の間で用いることが可能であるが、好ましくは0.1から3、さらにより好ましくは0.3から1.5の間である。配位子前駆体(B)は2種以上の混合物を用いてもよく、また2種以上の配位子前駆体(B)を逐次的に添加して用いても良い。この結果、同一金属に異なる配位子が結合した遷移金属化合物を得ることが出来る。反応温度については、反応性生物の熱安定性と基質の組合せにより決まる反応速度との兼合いで決まるため化合物により非常に異なるが、一般に−78℃から200℃の間で行うことが好ましい。反応時間についても同様で一概には言えないが、通常0.1から100時間の間で行われる。反応は脱離する無機塩や有機化合物の生成により確認できる事が多い。反応生成物の単離は、無機塩が生成する場合はこれをろ別し、ろ液を濃縮あるいは適当な溶媒に置換した後再結晶するか、あるいは貧溶媒を加え固体として析出させる方法が好ましい。生成した遷移金属化合物は、1H あるいは 13C-NMR、X線回折による構造解析、質量分析スペクトル、元素分析などの各種方法を用いて同定することが可能である。本方法においては、遷移金属化合物(A)は、単離・精製して次の配位子前駆体(B)との反応に用いることも出来るが、特に遷移金属化合物(A)が不安定な場合など、遷移金属化合物(A)を合成した反応溶液をそのまま、あるいは適当な反応溶媒に置換して次の配位子前駆体(B)との反応に用いることも出来る。 Reactions include aromatic solvents such as xylene, toluene and benzene, aliphatic hydrocarbon solvents such as hexane and pentane, ether solvents such as diethyl ether, THF and dibutyl ether, and halogenated carbonization such as methylene chloride, chloroform and chlorobenzene. It can be carried out in a hydrogen solvent and mixtures thereof. Since alkyl complexes are usually sensitive to water and oxygen, it is desirable to carry out the reaction in an inert atmosphere such as dry nitrogen, argon or helium. The charge molar ratio of (A) / (B) can be used between 0.01 and 10, but is preferably between 0.1 and 3, and more preferably between 0.3 and 1.5. As the ligand precursor (B), a mixture of two or more kinds may be used, or two or more kinds of ligand precursors (B) may be sequentially added and used. As a result, a transition metal compound in which different ligands are bonded to the same metal can be obtained. The reaction temperature is determined depending on the balance between the thermal stability of the reactive organism and the reaction rate determined by the combination of the substrates, and therefore varies greatly depending on the compound, but it is generally preferable to carry out the reaction between -78 ° C and 200 ° C. The reaction time is the same and cannot be generally stated, but it is usually carried out for 0.1 to 100 hours. In many cases, the reaction can be confirmed by the formation of a leaving inorganic salt or organic compound. Isolation of the reaction product is preferably carried out by separating the inorganic salt when it is produced and recrystallizing it after concentrating the filtrate or substituting it with a suitable solvent, or adding a poor solvent to precipitate as a solid. . The produced transition metal compound can be identified by various methods such as 1 H or 13 C-NMR, structural analysis by X-ray diffraction, mass spectrometry spectrum, and elemental analysis. In this method, the transition metal compound (A) can be isolated and purified and used for the reaction with the next ligand precursor (B), but the transition metal compound (A) is particularly unstable. In some cases, the reaction solution obtained by synthesizing the transition metal compound (A) can be used in the reaction with the next ligand precursor (B) as it is or after replacing with a suitable reaction solvent.
このような遷移金属化合物(C)としては、下記一般式(VIII)〜(XI)で表される遷移金属アルキル錯体が好ましく例示される。(式中、M、R1〜R24、XおよびRは前記した定義に同一である。) As such a transition metal compound (C), transition metal alkyl complexes represented by the following general formulas (VIII) to (XI) are preferably exemplified. (In the formula, M, R 1 to R 24 , X and R are the same as defined above.)
以下、実施例によって本出願の発明内容を詳細に説明するが、本出願はこれら実施例によって制限を受けるものではない。 Hereinafter, although the invention content of this application is demonstrated in detail by an Example, this application is not restrict | limited by these Examples.
遷移金属化合物MeTiBr 3 (A)の合成
実験は全て乾燥窒素またはアルゴン雰囲気下で行った。30mLのシュレンクチューブに、テトラブロモチタン(TiBr4、6.959g、18.94mmol)を秤取し、乾燥ペンタン19mLを加えた。生成したスラリーを−78℃に冷却し、ジメチル亜鉛のヘキサン溶液(1.0M)9mL(9.0mmol)とペンタン1mLをシリンジで加えた。3時間かけて室温に戻し、生成したスラリーをセライトを通してろ過し、ペンタンで洗浄した。ろ液をー78℃に冷却しながら約2/3量に濃縮し、−78℃でろ過し、オレンジ色のろ液をー78℃で一晩静置した。生成した濃い紫色の固体をデカンテーションにより母液から分け低温で乾燥させた(1.83g)。母液を濃縮することにより、第2晶を得た(2.00g)。収率70%、1H NMR (benzene-d6) δ1.96 (s)。
All the synthesis experiments of the transition metal compound MeTiBr 3 (A) were performed under a dry nitrogen or argon atmosphere. Tetrabromotitanium (TiBr 4 , 6.959 g, 18.94 mmol) was weighed into a 30 mL Schlenk tube, and 19 mL of dry pentane was added. The resulting slurry was cooled to −78 ° C., and 9 mL (9.0 mmol) of dimethylzinc in hexane (1.0 M) and 1 mL of pentane were added by syringe. The resulting slurry was returned to room temperature over 3 hours, and the resulting slurry was filtered through celite and washed with pentane. The filtrate was concentrated to about 2/3 while cooling to −78 ° C., filtered at −78 ° C., and the orange filtrate was allowed to stand at −78 ° C. overnight. The resulting dark purple solid was separated from the mother liquor by decantation and dried at low temperature (1.83 g). A second crystal was obtained by concentrating the mother liquor (2.00 g). Yield 70%, 1 H NMR (benzene-d6) δ 1.96 (s).
配位子前駆体(B)の合成
サリチルアルジミン化合物(ア){C6F5N=CH(2-OH-3tBuC6H3)、2.99g、8.71mmol}のエーテル溶液を、−78℃に冷却した水素化ナトリウム(211.5mg、8.81mmol)のエーテルスラリー(10mL)へ滴下した。一夜間かけて室温まで昇温し、さらに室温で3時間攪拌した。生成物をろ過して得たに黄色の溶液を濃縮し、トルエンついでペンタンを加えて生成した黄色固体をろ別した。トルエン、ペンタンで洗浄した後、高真空ラインで乾燥し、2.65gの黄色固体C6F5N=CH(2-ONa-3tBuC6H3)を得た(収率83%)。
Synthesis of Ligand Precursor (B) Salicylaldimine Compound (A) {C 6 F 5 N═CH (2-OH-3tBuC 6 H 3 ), 2.99 g, 8.71 mmol} in ether solution at −78 ° C. It was added dropwise to an ether slurry (10 mL) of cooled sodium hydride (211.5 mg, 8.81 mmol). The temperature was raised to room temperature overnight, and the mixture was further stirred at room temperature for 3 hours. The yellow solution obtained by filtering the product was concentrated, and the yellow solid produced by adding toluene and pentane was filtered off. After washing with toluene and pentane, it was dried on a high vacuum line to obtain 2.65 g of a yellow solid C 6 F 5 N═CH (2-ONa-3tBuC 6 H 3 ) (yield 83%).
遷移金属化合物(C)の合成
上記で得た、MeTiBr3(311mg、1.03mmol)と配位子前駆体、C6F5N=CH(2-ONa-3tBuC6H3)(760mg,2.08mmol)をトルエン中、−78℃で2.5時間反応させた。冷媒をはずし、生成した固体をろ別し、ろ液を約半量に濃縮した。ペンタンを加え、−78℃に冷却したところ赤紫色の結晶494mgが得られた(収率58%)。遷移金属化合物、[C6F5N=CH(2-O-3-tBuC6H3)]2TiMeBrが得られたことが分析の結果、わかった。1H NMR(toluene-d8).δ7.55 (s, 1H, HC=N), 7.47 (s, 1H, HC=N), 7.44 (dd, J = 3.6, 1.7 Hz, 1H, ArH), 7.41 (dd, J = 3.6, 1.7 Hz, 1H, ArH), 6.91 (dd, J = 7.9, 1.7 Hz, 1H, ArH), 6.81 (dd, J = 7.9, 1.7 Hz, 1H, ArH), 6.69 (dt, J = 7.6 Hz, 2H, ArH), 1.97 (d, J = 2.0 Hz, 3H, CH3-Ti), 1.57 (s, 9H, tBu), 1.51 (s, 9H, tBu)。
Synthesis of transition metal compound (C) MeTiBr 3 (311 mg, 1.03 mmol) and ligand precursor obtained above, C 6 F 5 N═CH (2-ONa-3tBuC 6 H 3 ) (760 mg, 2.08 mmol) ) In toluene at −78 ° C. for 2.5 hours. The refrigerant was removed, the produced solid was filtered off, and the filtrate was concentrated to about half. When pentane was added and cooled to −78 ° C., 494 mg of reddish purple crystals were obtained (yield 58%). As a result of analysis, it was found that a transition metal compound, [C 6 F 5 N═CH (2-O-3-tBuC 6 H 3 )] 2 TiMeBr was obtained. 1 H NMR (toluene-d8) .δ7.55 (s, 1H, HC = N), 7.47 (s, 1H, HC = N), 7.44 (dd, J = 3.6, 1.7 Hz, 1H, ArH), 7.41 (dd, J = 3.6, 1.7 Hz, 1H, ArH), 6.91 (dd, J = 7.9, 1.7 Hz, 1H, ArH), 6.81 (dd, J = 7.9, 1.7 Hz, 1H, ArH), 6.69 (dt , J = 7.6 Hz, 2H, ArH), 1.97 (d, J = 2.0 Hz, 3H, CH 3 -Ti), 1.57 (s, 9H, tBu), 1.51 (s, 9H, tBu).
実施例1においてサリチルアルジミン化合物(ア)の代わりにサリチルアルジミン化合物(イ)を用いた以外は、同様にして実験を行い、[C6H5N=CH(2-O-3-tBuC6H3)]2TiMeBrを得た(収率53%)。1H NMR (benzene-d6).δ7.62 (s, 1H, HC=N), 7.51 (s, 1H, HC=N), 7.42 (m, 2H, ArH), 6.84-6.65 (m, 14H, ArH), 2.00 (s, 3H, CH3-Ti), 1.73 (s, 9H, tBu), 1.59 (s, 9H, tBu)。 An experiment was conducted in the same manner as in Example 1 except that the salicylaldimine compound (a) was used instead of the salicylaldimine compound (a), and [C 6 H 5 N = CH (2-O-3-tBuC 6 H 3 )] 2 TiMeBr was obtained (yield 53%). 1 H NMR (benzene-d6) .δ7.62 (s, 1H, HC = N), 7.51 (s, 1H, HC = N), 7.42 (m, 2H, ArH), 6.84-6.65 (m, 14H, ArH), 2.00 (s, 3H, CH 3 -Ti), 1.73 (s, 9H, tBu), 1.59 (s, 9H, tBu).
実施例1においてサリチルアルジミン化合物(ア)の代わりにサリチルアルジミン化合物(ウ)を用いた以外は、同様にして実験を行い、[2,4,6-F3-C6H2N=CH(2-O-3-tBuC6H3)]2TiMeBrを得た(収率53%)。1H NMR (benzene-d6).δ7.63 (s, 1H, HC=N), 7.59 (s, 1H, HC=N), 7.44 (dd, J = 7.6, 1.7 Hz, 2H, ArH), 6.82-6.66 (m, 4H, ArH), 6.19 (m, 2H, ArH), 5.87 (m, 2H, ArH),2.01 (d, J = 1.7 Hz,3H, CH3-Ti), 1.61 (s, 9H, tBu), 1.56 (s, 9H, tBu)。 An experiment was conducted in the same manner except that the salicylaldimine compound (c) was used instead of the salicylaldimine compound (a) in Example 1, and [2,4,6-F 3 -C 6 H 2 N═CH ( 2-O-3-tBuC 6 H 3 )] 2 TiMeBr was obtained (yield 53%). 1 H NMR (benzene-d6) .δ7.63 (s, 1H, HC = N), 7.59 (s, 1H, HC = N), 7.44 (dd, J = 7.6, 1.7 Hz, 2H, ArH), 6.82 -6.66 (m, 4H, ArH), 6.19 (m, 2H, ArH), 5.87 (m, 2H, ArH), 2.01 (d, J = 1.7 Hz, 3H, CH 3 -Ti), 1.61 (s, 9H , tBu), 1.56 (s, 9H, tBu).
テトラクロロチタンと1,2-ジメトキシエタンとの1:1付加体95.2mg(0.340mmol)にエーテル4mLを加え、薄黄色のスラリーを得た。ここに0℃でMeLiのエーテル溶液(1.14M)を0.30mL(0.334mmol)を加え、この温度で30分保持したあと−78℃まで冷却した。ここに実施例1と同様の方法で合成したC6F5N=CH(2-ONa-3tBuC6H3)を239.1mg(0.655mmol)のトルエンスラリーを加え、一夜間反応させた。反応混合物を蒸発乾固し、トルエンで抽出した。抽出溶液を濃縮しペンタンを加え、−78℃に冷却し茶褐色の固体を得た。ろ別した固体をペンタンで洗浄し、生成物[C6F5N=CH(2-O-3tBuC6H3)]2TiMeClを得た。1H NMR (benzene-d6).δ7.59 (s, 1H, HC=N), 7.44 (s, 1H, HC=N), 7.42-7.36 (m, 2H, ArH), 6.89 (dd, J =7.6, 1.7 Hz, 1H, ArH), 6.79 (dd, J = 7.9, 1.7 Hz, 1H, ArH), 6.66 (dt, J = 7.6, 2.3 Hz, 2H, ArH),),2.04 (s, ,3H, CH3-Ti), 1.50 (s, 9H, tBu), 1.45 (s, 9H, tBu)。 4mL of ether was added to 95.2 mg (0.340 mmol) of a 1: 1 adduct of tetrachlorotitanium and 1,2-dimethoxyethane to obtain a light yellow slurry. To this was added 0.30 mL (0.334 mmol) of a MeLi ether solution (1.14 M) at 0 ° C., kept at this temperature for 30 minutes, and then cooled to −78 ° C. Here, 239.1 mg (0.655 mmol) of toluene slurry was added to C 6 F 5 N═CH (2-ONa-3tBuC 6 H 3 ) synthesized in the same manner as in Example 1, and allowed to react overnight. The reaction mixture was evaporated to dryness and extracted with toluene. The extracted solution was concentrated, pentane was added, and the mixture was cooled to −78 ° C. to obtain a brown solid. The solid filtered off was washed with pentane to obtain the product [C 6 F 5 N═CH (2-O-3tBuC 6 H 3 )] 2 TiMeCl. 1 H NMR (benzene-d6) .δ7.59 (s, 1H, HC = N), 7.44 (s, 1H, HC = N), 7.42-7.36 (m, 2H, ArH), 6.89 (dd, J = 7.6, 1.7 Hz, 1H, ArH), 6.79 (dd, J = 7.9, 1.7 Hz, 1H, ArH), 6.66 (dt, J = 7.6, 2.3 Hz, 2H, ArH),), 2.04 (s,, 3H , CH 3 -Ti), 1.50 (s, 9H, tBu), 1.45 (s, 9H, tBu).
実施例4と、MeLiをTiに対して2当量加える以外は、ほぼ同様の方法で反応を行った。生成物はペンタンから再結晶して精製した。1H NMR (benzene-d6) δ7.52 (s, 2H, HC=N), 7.45 (dd, J = 7.6, 1.7 Hz, 2H, ArH), 6.88 (dd, J = 7.6, 1.7 Hz, 2H, ArH), 6.72 (t, J = 7.7 Hz, 2H, ArH), 1.65 (s, 6H, CH3-Ti), 1.58 (s, 18H, tBu)およびX線構造解析の結果から、この生成物は[C6F5N=CH(2-O-3tBuC6H3)]2TiMe2であることがわかった。 The reaction was performed in substantially the same manner as in Example 4, except that 2 equivalents of MeLi to Ti were added. The product was purified by recrystallization from pentane. 1 H NMR (benzene-d 6 ) δ7.52 (s, 2H, HC = N), 7.45 (dd, J = 7.6, 1.7 Hz, 2H, ArH), 6.88 (dd, J = 7.6, 1.7 Hz, 2H , ArH), 6.72 (t, J = 7.7 Hz, 2H, ArH), 1.65 (s, 6H, CH3-Ti), 1.58 (s, 18H, tBu) and X-ray structural analysis, this product is It was found that [C 6 F 5 N═CH (2-O-3tBuC 6 H 3 )] 2 TiMe 2 .
本発明によれば、遷移金属化合物(A)を単離精製することなく次の配位子前駆体(B)との反応工程に用いることが出来る上に、一般に良く用いられるベンジル基以外に様々なアルキル基を導入された遷移金属化合物(C)を収率よく合成することが可能である。得られた遷移金属化合物(C)は、メタロセンなどの他の遷移金属アルキル錯体を活性化する一般的な共触媒はもちろん幅広い範囲の共触媒を用いることが可能であり、失活の原因となる有機アルミニウム類の使用を最小限に抑えられることから、触媒の熱安定性や活性化効率の向上等の効果が期待できる。 According to the present invention, the transition metal compound (A) can be used in the reaction step with the next ligand precursor (B) without isolation and purification, and various other than the commonly used benzyl group. It is possible to synthesize a transition metal compound (C) into which an alkyl group is introduced with good yield. The obtained transition metal compound (C) can use a wide range of cocatalysts as well as general cocatalysts for activating other transition metal alkyl complexes such as metallocenes, which causes deactivation. Since the use of organoaluminums can be minimized, effects such as improvement in thermal stability and activation efficiency of the catalyst can be expected.
Claims (3)
RnMX4-n ・・・・(I)
〔式中、Mは4族の遷移金属を表す。nは1から4の整数であり、Xは、水素原子、炭化水素基、ハロゲン原子、酸素含有基、イオウ含有基、窒素含有基、ホウ素含有基、アルミニウム含有基、リン含有基、ハロゲン含有基、ヘテロ環式化合物残基、ケイ素含有基、ゲルマニウム含有基、またはスズ含有基を示し、Rは炭化水素基である。〕
下記のGroup Yから選ばれる一つの結合残基(y)と、下記のGroup Zから選ばれる結合残基(z)を共に含む配位子前駆体(B)、
を反応させることを特徴とする、前記のR、結合残基(y)、および結合残基(z)を共に含む遷移金属化合物(C)の製造方法。
R n MX 4-n ... (I)
[Wherein M represents a group 4 transition metal. n is an integer of 1 to 4, and X is a hydrogen atom, hydrocarbon group, halogen atom, oxygen-containing group, sulfur-containing group, nitrogen-containing group, boron-containing group, aluminum-containing group, phosphorus-containing group, halogen-containing group , A heterocyclic compound residue, a silicon-containing group, a germanium-containing group, or a tin-containing group, and R is a hydrocarbon group. ]
A ligand precursor (B) comprising both a binding residue (y) selected from the following Group Y and a binding residue (z) selected from the following Group Z;
A process for producing a transition metal compound (C) comprising both R, the binding residue (y), and the binding residue (z), characterized by reacting
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