JP2006310829A5 - - Google Patents

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Publication number
JP2006310829A5
JP2006310829A5 JP2006094490A JP2006094490A JP2006310829A5 JP 2006310829 A5 JP2006310829 A5 JP 2006310829A5 JP 2006094490 A JP2006094490 A JP 2006094490A JP 2006094490 A JP2006094490 A JP 2006094490A JP 2006310829 A5 JP2006310829 A5 JP 2006310829A5
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JP
Japan
Prior art keywords
fuse element
cutting
pulse
applying
cut
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JP2006094490A
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Japanese (ja)
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JP4946133B2 (en
JP2006310829A (en
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Priority to JP2006094490A priority Critical patent/JP4946133B2/en
Priority claimed from JP2006094490A external-priority patent/JP4946133B2/en
Publication of JP2006310829A publication Critical patent/JP2006310829A/en
Publication of JP2006310829A5 publication Critical patent/JP2006310829A5/ja
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Publication of JP4946133B2 publication Critical patent/JP4946133B2/en
Expired - Fee Related legal-status Critical Current
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Claims (4)

半導体基板上に形成されたヒューズ素子に、電気パルスを複数回印加し、該ヒューズ素子を切断する工程を含み、
前記電気パルスを複数回印加する工程において、印加回数の増加と共に、電気パルスのパルス幅を長くするヒューズ素子の切断方法。
A fuse element formed on a semiconductor substrate, an electrical pulse is applied a plurality of times, seen including the step of cutting the fuse element,
A method of cutting a fuse element, wherein in the step of applying the electric pulse a plurality of times, the pulse width of the electric pulse is increased as the number of times of application is increased .
半導体基板上に形成されたヒューズ素子に、電気パルスを複数回印加し、該ヒューズ素子を切断する工程を含み、Applying a plurality of electrical pulses to the fuse element formed on the semiconductor substrate and cutting the fuse element;
前記電気パルス電圧を複数回印加する工程において、印加回数の増加と共に、該ヒューズ素子に投入する1パルスあたりの電気エネルギを大きくするヒューズ素子の切断方法。A method for cutting a fuse element, wherein, in the step of applying the electric pulse voltage a plurality of times, the electric energy per pulse to be applied to the fuse element is increased as the number of times of application is increased.
前記電気パルスを複数回印加する工程が、
1つの電気パルスを印加した後、次の電気パルスを印加する前に、前記ヒューズ素子が切断されたか否かを検出し、該ヒューズ素子の切断が検出されたら、電気パルスの印加を停止する工程を含む請求項1〜のいずれかに記載のヒューズ素子の切断方法。
Applying the electrical pulse multiple times,
After applying one electric pulse, before applying the next electric pulse, detecting whether or not the fuse element is cut, and stopping the application of the electric pulse when the cut of the fuse element is detected The cutting method of the fuse element in any one of Claims 1-2 containing.
(a)半導体基板上に形成された評価用ヒューズ素子に、該評価用ヒューズ素子が切断されるまで電気パルスを複数回印加する工程と、
(b)前記工程aで前記評価用ヒューズ素子に与えられた電気エネルギの総量を求める工程と、
(c)前記工程bで求められた電気エネルギの総量に基づいて、前記評価用ヒューズ素子と同一の切断特性を持ったヒューズ素子を切断するための電気エネルギの総量に相当する切断閾値を決定する工程と、
(d)切断すべきヒューズ素子に印加する電気パルスの電圧及び電流の少なくとも一方、パルス幅、及びパルス数を、切断すべきヒューズ素子に投入される電気エネルギの総量が前記切断閾値以上になるように決定する工程と
を有するヒューズ素子切断手順の決定方法。
(A) applying an electrical pulse to the evaluation fuse element formed on the semiconductor substrate a plurality of times until the evaluation fuse element is cut;
(B) obtaining a total amount of electric energy given to the evaluation fuse element in the step a;
(C) Based on the total amount of electric energy obtained in the step b, a cutting threshold corresponding to the total amount of electric energy for cutting a fuse element having the same cutting characteristics as the evaluation fuse element is determined. Process,
(D) At least one of the voltage and current of the electric pulse applied to the fuse element to be cut, the pulse width, and the number of pulses so that the total amount of electric energy input to the fuse element to be cut is equal to or greater than the cut threshold. And determining the fuse element cutting procedure.
JP2006094490A 2005-03-30 2006-03-30 Method for determining fuse element cutting procedure Expired - Fee Related JP4946133B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006094490A JP4946133B2 (en) 2005-03-30 2006-03-30 Method for determining fuse element cutting procedure

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005099404 2005-03-30
JP2005099404 2005-03-30
JP2006094490A JP4946133B2 (en) 2005-03-30 2006-03-30 Method for determining fuse element cutting procedure

Publications (3)

Publication Number Publication Date
JP2006310829A JP2006310829A (en) 2006-11-09
JP2006310829A5 true JP2006310829A5 (en) 2009-05-07
JP4946133B2 JP4946133B2 (en) 2012-06-06

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Family Applications (1)

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JP2006094490A Expired - Fee Related JP4946133B2 (en) 2005-03-30 2006-03-30 Method for determining fuse element cutting procedure

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4871767B2 (en) * 2007-03-20 2012-02-08 日本電信電話株式会社 Manufacturing method of nanogap electrode
US7405590B1 (en) * 2007-07-18 2008-07-29 Kabushiki Kaisha Toshiba Systems and methods for controlling a fuse programming current in an IC
JP5435713B2 (en) 2009-07-23 2014-03-05 ルネサスエレクトロニクス株式会社 Semiconductor device manufacturing method, manufacturing program, and semiconductor device
JP2011091447A (en) * 2011-02-07 2011-05-06 Renesas Electronics Corp Method of fusing fuse
JP2013037749A (en) 2011-08-09 2013-02-21 Fujitsu Ltd Writing circuit, semiconductor integrated circuit, and writing method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6246496A (en) * 1985-08-23 1987-02-28 Sony Corp Writing method for fixed memory device
JP3354033B2 (en) * 1994-06-17 2002-12-09 株式会社豊田中央研究所 Semiconductor device and manufacturing method thereof
JP3104843B2 (en) * 1994-08-19 2000-10-30 川崎製鉄株式会社 Anti-fuse type semiconductor integrated circuit device

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