JP2006295112A - Substrate washing apparatus and substrate feeding device equipped therewith - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate washing apparatus for washing various kinds of contamination, dust, and the like adhered to the surface of a substrate easily even if the surface of the substrate wears static electricity all over or partly. <P>SOLUTION: The substrate washing apparatus includes a frame for supporting the substrate in a freely moving way, and a roll brush mounted on the frame in a freely rotating way. The surface of the substrate is rubbed by the roll brush, and washed in the substrate washing apparatus. In this case, the roll brush consists of conductive brush. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a substrate cleaning apparatus and a substrate supply apparatus including the substrate cleaning apparatus.

As a device for cleaning the surface of a printed circuit board, a cleaning machine described in the following Patent Document 1 has been proposed.
This cleaning machine is equipped with a conveyor belt that carries an edge portion of a substrate and conveys the substrate, a suction roller that makes pressure contact with the substrate conveyed by the conveyor belt, and a pressure that rotates while rotating the suction roller. An adhesive roller that makes contact, and means for moving the suction roller to a position away from the position that makes contact with the substrate.

  In this cleaning machine, the suction roller is brought into pressure contact with the surface of the substrate transported by the transport belt. The suction roller is formed of a silicone rubber resin, and the substrate is cleaned by adsorbing dust and dirt on the surface of the substrate due to wettability. Since the adsorption roller does not have an adhesive material or the like on its surface, it is possible to prevent an accident in which the adhesive material adheres to the substrate from the roller. Garbage and the like adsorbed on the adsorption roller are transferred from the adsorption roller to the adhesion roller when the adsorption roller is further brought into pressure contact with the adhesion roller. Therefore, the suction roller can maintain the cleaning effect for a long time. In this cleaning machine, the edge portion of the substrate is held by the conveyor belt, and only one surface on the opposite side of the conveyor belt is cleaned. Therefore, even when the back surface of the substrate on which the electronic component is mounted is cleaned, the cleaning process can be performed by placing the electronic component on the bottom surface and placing the back surface on the top surface and placing it on the transport belt. Further, when a substrate that is not processed or cannot be processed by the cleaning machine is loaded, the suction roller moves to a position away from a position in contact with the substrate. As a result, the cleaning machine can cope with various types of substrates, and can be incorporated into a printed circuit board production line. By making the cleaning machine inline in this way, the substrate can be immediately moved to the printing process after being cleaned, so that the substrate can be prevented from becoming dusty and the cleaning effect can be further improved. .

By the way, various kinds of dust, dust, and the like are attached to the surface of the printed circuit board, and sometimes a part of or the entire surface of the printed circuit board is charged with static electricity. If the surface of the printed circuit board is charged with static electricity, the above dust or dust adheres to the printed circuit board more firmly. There was a risk that it could not be removed.
JP 2002-353598 A

  The present invention has been made in view of the above circumstances, and even if the surface of the substrate is partially or wholly charged with static electricity, it easily cleans various kinds of dust and dust adhering to the surface of the substrate. An object of the present invention is to provide a substrate cleaning apparatus capable of performing the above. Moreover, it aims at providing the board | substrate supply apparatus provided with the board | substrate cleaning apparatus.

In order to achieve the above object, the present invention employs the following configuration.
The substrate cleaning apparatus of the present invention includes a frame that movably supports the substrate and a roll brush that is rotatably attached to the frame, and the surface of the substrate is rubbed and cleaned by the roll brush. A substrate cleaning apparatus, wherein the roll brush is a conductive brush.
Moreover, it is preferable that a nozzle for ejecting a charged fluid is provided at a position where the substrate moved by being supported by the frame is desired.
According to this configuration, the substrate can be easily cleaned by using the conductive brush. Furthermore, since the substrate is discharged by ejecting a charged fluid toward the substrate, the substrate can be more easily cleaned with a roll brush.

In the substrate cleaning apparatus of the present invention, it is preferable that the nozzle is disposed on either one or both of the upstream side and the downstream side in the substrate transport direction with respect to the roll brush.
According to this configuration, the same effect as described above can be obtained.

In the substrate cleaning apparatus of the present invention, the frame has a main body provided with a transport rail for transporting the substrate, and a box-shaped cleaning attached to the upper portion of the main body and provided with the roll brush inside. It is preferable that the cleaning part is movable in the vertical direction with respect to the main body part.
According to this configuration, since the cleaning unit is movable in the vertical direction with respect to the main body, the distance between the transport rail and the roll brush can be adjusted according to the thickness of the substrate, thereby It becomes possible to adjust the pressing amount of the roll brush appropriately.

In the substrate cleaning apparatus of the present invention, the frame has a main body provided with a transport rail for transporting the substrate, and a box-shaped cleaning attached to the upper portion of the main body and provided with the roll brush inside. A dust collecting and discharging nozzle for cleaning the roll brush is provided in the cleaning unit, and the frame blocks an airflow flowing between the cleaning unit and the roll brush. Preferably, a blocking member is provided, and the blocking member is movable along the longitudinal direction of the roll brush in conjunction with the transport rail.
According to this configuration, since the dust collecting / discharging nozzle is provided in the cleaning unit, the air in the cleaning unit can be sucked from the dust collecting / discharging nozzle to remove the dirt attached to the roll brush.
Further, the frame is provided with a blocking member that is movable in conjunction with the transport rail, and the transport member is positioned in the cleaning unit in accordance with the size of the substrate. On the other hand, the roll brush is divided into a contact part that contacts the substrate and a non-contact part corresponding to the size of the substrate, and dirt adheres only to the contact part. Since the blocking member that blocks the airflow is arranged at the boundary between the contact portion and the non-contact portion of this roll brush, the air flow generated by the suction of the dust collecting discharge nozzle is circulated only to the contact portion of the roll brush, and the non-contact portion It is possible to prevent the airflow from flowing into. Thereby, the cleaning efficiency of the roll brush by suction of the dust collection discharge nozzle can be improved.

Next, a substrate supply apparatus according to the present invention includes a storage rack that stores a substrate, a lifting device that lifts and lowers the storage rack, and a transport device that transports the substrate. The substrate cleaning apparatus is attached.
According to such a configuration, the substrate can be transported to the substrate cleaning apparatus, and the substrate is neutralized by ejecting the charged fluid toward the transported substrate. Therefore, the substrate can be easily cleaned by the roll brush. The cleaned substrate can be supplied to a post-processing apparatus.

As described above, according to the substrate cleaning apparatus of the present invention, by using the conductive brush, even if the surface of the substrate is partially or entirely charged with static electricity, various kinds of materials attached to the surface of the substrate can be obtained. Dust and dust can be easily cleaned.
Moreover, even if the surface of the substrate is charged with static electricity, the static electricity can be removed by ejecting a charged fluid toward the substrate, thereby more efficiently cleaning the substrate with a roll brush. be able to.

Hereinafter, a substrate cleaning apparatus and a substrate supply apparatus according to embodiments of the present invention will be described in detail with reference to the drawings. However, the present invention is not limited thereto.
1 is a front view showing an example of the substrate supply apparatus, FIG. 2 is a perspective view of the substrate cleaning apparatus, FIG. 3 is an enlarged view of a main part of the substrate cleaning apparatus, and FIG. It is a disassembled perspective view.

  A substrate supply apparatus 1 according to this embodiment shown in FIG. 1 cleans a lifting device 2, a transport device 3 that supplies and discharges a storage rack 4 to and from the lifting device 2, and a printed circuit board (hereinafter simply referred to as a substrate). A substrate cleaning device 5 and an extrusion cylinder 6 for pushing the substrate P to the substrate cleaning device 5 are provided. The lifting device 2 is provided with a table 9 that moves up and down along the ball screw 7 and the guide shafts 8 and 8, and the storage rack 4 is placed on the table 9. The transport device 3 is configured in two upper and lower stages. The lower stage is a supply conveyor 10 that transports the storage rack 4 toward the lifting device 2 and supplies it, and the upper stage receives the storage rack 4 from the lifting device 2. It becomes the discharge conveyor 11 which discharges. Further, a conveyor 12 for completely moving the storage rack 4 to a predetermined position on the table is installed on the table 9 of the lifting device 2.

  In the substrate supply apparatus 1 having such a configuration, after the storage rack 4 conveyed by the supply conveyor 10 is placed on the table 9, the table 9 is raised to supply the substrate P and the uppermost substrate P in the storage rack. The height of the substrate cleaning apparatus 5 provided in front of the apparatus 1 is adjusted to the height of the transfer rail 13. Thereafter, the substrate P is pushed out from the rear end face 4b side of the storage rack 4 onto the transport rail disposed below the substrate cleaning device 5 by the extrusion cylinder 6 reciprocating in the horizontal direction.

Next, as shown in FIG. 2, the substrate cleaning apparatus 5 is for cleaning the surface of the transported substrate P, and is rotatably attached to the frame 29 and the frame 29 for supporting the substrate P in a movable manner. The roll brush 17 is generally configured.
The frame 29 includes a main body 29a having the transport rail 13 and a cleaning unit 29b attached to the upper part of the main body 29a.
As shown in FIG. 2, a cleaning unit A is built in the cleaning unit 29b. As shown in FIG. 3, the cleaning unit A is disposed between the casing 15, the two static elimination devices 16 attached to the casing 15, and the two static elimination devices 16, and is rotatable on the casing 15. An attached roll brush 17, a rotation motor 18 that rotationally drives the roll brush 17, and a controller 19 that controls the static eliminator 16 are attached.
Next, a pair of transport rails 13 for guiding the substrate P pushed out from the substrate supply device 1 are attached to the main body 29 a below the roll brush 17. The transport rail 13 is positioned with respect to the roll brush 17 so that the substrate surface contacts the roll brush 17 when the substrate P guided by the transport rail 13 passes below the roll brush 17.

  As shown in FIG. 4, the static eliminator 16 includes a fluid supply unit 20 and a supply pipe 21, and a plurality of nozzles (not shown) are formed in the supply pipe 21 along the longitudinal direction of the supply pipe 21. Has been. The nozzle is opened toward the surface side of the substrate P. The fluid supply unit 20 is provided with a flow path having a discharge mechanism (not shown), and can perform corona discharge on the fluid such as air passing through the flow path to charge the fluid such as air. It is like that. The supply pipe 21 is attached to a position where the substrate P transported along the transport rail 13 is desired. Further, a nozzle (not shown) is provided on the supply pipe 21 on the substrate side to be transported. With this configuration, fluid such as air charged from a plurality of nozzles (not shown) can be sprayed onto the substrate surface in the middle of conveyance. A bearing portion 23 having a bearing 22 is provided at one end of one static elimination device 16. The roll brush 17 is made of a material selected from nylon, horse hair, and the like, and has a brush shaft 23. The roll brush 17 may be a conductive brush. The conductive brush uses a conductive material such as copper or carbon for the bristle.

  When assembling the substrate cleaning device 5, the support 24 and the side wall portions 26 and 27 of the housing 15 are connected, and the two static elimination devices 16 are attached to the support 24 and the side wall portion 26. Next, one end of the roll shaft 28 of the roll brush 17 is attached to the bearing 22 of the static eliminator 16, and the other end of the roll shaft 28 is fixed by the support 25. Finally, the cleaning unit A is completed by attaching the controller 19 to the housing 15 and attaching the rotation motor 18 to the bearing portion 23 of one of the charge removal devices 16. Then, the cleaning unit A is incorporated in the cleaning unit 29 b, and the cleaning unit 29 a is attached to the upper part of the main body unit 29 having the transport rail 13. In this way, the substrate cleaning apparatus 5 is assembled.

  Next, with reference to FIG. 1 and FIG. 2, the cleaning process of the surface of the substrate P in the substrate cleaning apparatus 5 of the present embodiment will be described. The substrate P pushed out by the cylinder 6 moves on a transport rail 13 provided below the substrate cleaning device 5 and is transported below the substrate cleaning device 5. The transported substrate P is sprayed with a fluid such as air charged from one static eliminating device 16a along the direction indicated by the arrow B, whereby the surface of the substrate P is neutralized. Next, the discharged substrate P passes under the roll brush 17 rotating at 600 rpm while the substrate P is in contact with the roll brush 17. Since the substrate surface has been previously neutralized, dirt such as dust adhering to the substrate surface can be easily removed simply by rubbing the substrate surface with the roll brush 17. Thereafter, the surface of the substrate P is discharged again by the other discharging device 16b. The substrate P that has been neutralized and cleaned in this way is transferred to the post-process apparatus 30.

  As described above, according to the substrate cleaning apparatus of this embodiment, the substrate can be easily cleaned by using the conductive brush. Further, since the surface of the substrate is discharged by blowing air charged by the static eliminator onto the substrate, it is possible to weaken the electrostatic attraction force of the object to be removed such as dust adhering to the substrate surface to the substrate. Thus, the removal object such as dust having weakened adsorption force can be easily removed by rubbing the substrate surface with a roll brush. Thereby, the cleanliness of the substrate can be dramatically increased.

Next, FIGS. 5 to 7 show another example of the substrate cleaning apparatus 51 of the present embodiment.
The difference between the substrate cleaning apparatus 51 shown in FIGS. 5 to 7 and the substrate cleaning apparatus 1 shown in FIGS. 1 to 4 is that the neutralizing device is omitted in the substrate cleaning apparatus 51 and the conductive brush is disposed above the conductive brush. A dust collection discharge nozzle is provided and the transport rail is further shortened.

As shown in FIG. 5 to FIG. 7, the substrate cleaning device 51 is schematically configured from a frame 79 that supports the substrate P so as to be movable and a roll brush 67 that is rotatably attached to the frame 79. The roll brush 67 is a conductive brush formed by using a conductive material such as copper or carbon for the brush bristles.
The frame 79 includes a main body part 79a having a transport rail 63 and a cleaning part 79b attached to the upper part of the main body part 79a.

  As shown in FIGS. 5 to 7, the cleaning unit 79 b is a hood-like (box-shaped) member provided with an opening 79 c on the lower side, and a dust collection / discharge nozzle 80 is attached to the upper side. . A dust collector (not shown) is attached to the tip of the dust collection discharge nozzle 80. The cleaning unit 79b is provided with a roll brush 67 rotatably supported by the cleaning unit 79b and a motor housing 68 in which a motor for rotating the roll brush 67 is built. The roll brush 67 is attached directly below the dust collection discharge nozzle 80.

Then the body portion 79a is a metal member of substantially L-shape composed of ₂ Metropolitan piece 79a ₁ and other pieces 79a, piece 79a ₁ are bolted to the board supply device 1, also other pieces 79a ₂ It is joined to the cleaning part 79b. Thus, the main body 79a connects the substrate supply apparatus 1 and the cleaning unit 79b.
In addition, a pair of transport rails 63 for guiding the substrate P pushed out from the substrate supply apparatus 1 is attached to the main body portion 79a. The transport rail 63 is positioned with respect to the roll brush 67 so that the substrate surface contacts the roll brush 67 when the substrate P guided by the transport rail 63 passes below the roll brush 67.

As shown in FIG. 6, the main body 79 a is provided with a gap adjusting mechanism for the transport rail 63. The width adjusting mechanism M includes slide rails 81 and 81 spanned between the other pieces 79a ₂ and 79a ₂ of the main body 79a, a stopper 82 fixed to the slide rails 81 and 81, a slide rail 81, The adjustment slider 83 is movably attached to 81. The transport rails 63, 63 are attached to the stopper 82 and the adjustment slider 83. By adjusting the position of the adjustment slider 83, the interval between the transport rails 63 and 63 can be adjusted to the width of the substrate P.

  The cleaning process of the surface of the substrate P in the substrate cleaning apparatus 51 will be described. The substrate P pushed out by the cylinder 6 from the substrate supply apparatus moves on the transport rail 63 provided below the substrate cleaning apparatus 51 to move the substrate cleaning apparatus. It is conveyed below 51. The conveyed substrate P passes under the roll brush 67 rotating at 600 rpm. At this time, the substrate surface is rubbed by the roll brush 67, and dirt such as dust adhering to the substrate surface is easily removed. Thereafter, the dirt adhering to the roll brush 67 is sucked into a dust collector (not shown) through the dust collection discharge nozzle 80. In this way, the dirt is removed from the roll brush 67 and used again to remove the dirt on the substrate surface. The substrate P thus cleaned is transferred to a post-process apparatus.

According to the substrate cleaning apparatus 51 described above, since the substrate supply apparatus 1 and the cleaning unit 79b are connected by the main body part 79a, the distance between the substrate supply apparatus 1 and the roll brush 67 is reduced. Thus, the transport rail 63 can be shortened, and the substrate cleaning device 51 can be downsized.
Further, since the roll brush 67 is disposed inside the hood-like cleaning unit 69b, dirt attached to the roll brush 67 can be obtained by attaching and sucking an external dust collector to the dust collection discharge nozzle 80 of the cleaning unit 69b. Can be easily removed. Thereby, the roll brush 67 can always be kept clean, the maintenance frequency of the roll brush 67 is reduced, and the substrate cleaning apparatus 51 can be operated continuously for a long time.

  Next, FIG. 8 shows still another example of the substrate cleaning apparatus of the present embodiment. A substrate cleaning apparatus 101 shown in FIG. 8 is an apparatus in which a cleaning unit of a frame is movable up and down with respect to a main body unit. Similar to the substrate cleaning apparatus 51, the substrate cleaning apparatus 101 is roughly configured by a frame 179 that supports the substrate P so as to be movable, and a roll brush (not shown) that is rotatably attached to the frame 179. Yes. The frame 179 includes a main body 179a having a transport rail 163 and a cleaning unit 179b attached to the upper part of the main body 179a.

  The cleaning unit 179b is a hood-like (box-shaped) member having an opening 179c on the lower side, and a dust collection / discharge nozzle 180 is attached on the upper side. A dust collector (not shown) is attached to the tip of the dust collection / discharge nozzle 180. The cleaning unit 179b is provided with a motor housing 168 in which a roll brush (not shown) rotatably supported by the cleaning unit 179b and a motor that drives the roll brush to rotate are incorporated. The roll brush is attached immediately below the dust collection discharge nozzle 180.

Body portion 179a is a fitting substantially L-shaped comprising _two Metropolitan piece 179a ₁ and other pieces 179a, piece 179a ₁ is joined by bolts to the board supply device 1, also the other pieces 179a ₂ cleaning unit 79b. The other piece 179a ₂ is provided with a protruding piece 179a ₃ projecting toward the cleaning part 179b, and this protruding piece 179a ₃ is connected to the cleaning part 179b via a fixing member such as a bolt 179a ₄ . In this way, the cleaning unit 179b is rotatably supported to the main body portion 179a by a fixing member such as a bolt 179a ₄ axially.
Further, a protrusion 179a ₅ is provided at a position away from the bolt 179a ₄ of the other piece 179a ₂ , and this protrusion 179a ₅ is inserted into a long hole 179b ₁ provided in the cleaning part 179. By inserting the protrusion 179a ₅ into the long hole 179b ₁ , the rotation range of the cleaning unit 179b is restricted. Further, the longitudinal direction of the long hole 179b ₁ is directed in a substantially oblique direction or a substantially vertical direction with respect to the substrate surface of the substrate P on the transport rail 163.
With the above configuration, the cleaning unit 179b is movable in the vertical direction with respect to the main body unit 179a.
The protrusion 179a ₅ may be provided with a male screw portion, and a nut or the like may be attached to the male screw portion. By attaching a nut or the like to the male screw portion provided on the protrusion 179a ₅ , the cleaning portion 179b can be fixed at an appropriate position with respect to the main body portion 179a.

According to the substrate cleaning apparatus 101 shown in FIG. 8, since the cleaning unit 179b is movable in the vertical direction with respect to the main body unit 179a, the distance between the transport rail 163 and the roll brush according to the thickness of the substrate P. Thus, the pressing amount of the roll brush against the substrate P can be adjusted appropriately. Further, adjusting the distance between the transfer rail 163 and the roll brush, for example, it can be easily adjusted by loosening the nuts mounted on the male screw portion of the projection 179a _5.

  Next, FIG. 9 shows another example of the substrate cleaning apparatus of this embodiment. A substrate cleaning apparatus 201 shown in FIG. 9 is an apparatus provided with a blocking member that blocks airflow flowing between the cleaning unit and the roll brush. Similar to the substrate cleaning apparatus 51 described above, the substrate cleaning apparatus 201 is generally configured by a frame 279 that supports the substrate P in a movable manner and a roll brush 267 that is rotatably attached to the frame 279. The frame 279 includes a main body 279a having a transport rail 263 and a cleaning unit 279b attached to the upper part of the main body 279a.

  The cleaning unit 279b is a hood-like (box-shaped) member having an opening 279c on the lower side, and a dust collection / discharge nozzle 280 is attached on the upper side. A dust collector (not shown) is attached to the tip of the dust collection / discharge nozzle 280. The cleaning unit 279b is provided with a roll brush 267 rotatably supported by the cleaning unit 279b and a motor housing 268 in which a motor for rotating the roll brush 267 is built. The roll brush 267 is attached directly below the dust collection discharge nozzle 280.

  As shown in FIG. 9, the body portion 279 a is provided with a distance adjustment mechanism M for the transport rail 263. The width adjusting mechanism M is movably attached to the slide rails 81, 81, the stopper 282 fixed to the slide rails 81, 81, and the slide rails 81, 81 similarly to the substrate cleaning apparatus 51. Adjustment slider 283. The transport rails 263 and 263 are attached to the stopper 282 and the adjustment slider 283. By adjusting the position of the adjustment slider 283, the interval between the transport rails 263 and 263 can be adjusted to the width of the substrate P.

In addition, a blocking member 290 is provided inside the cleaning unit 279. The blocking member 290 is joined to one of the conveyance rails 263, so that the blocking member 290 is movable along the longitudinal direction of the roll brush 267 in conjunction with the conveyance rail 263.
As shown in FIGS. 9 and 10, the blocking member 290 includes a blocking plate 291 provided with a passage portion 291 a of the roll brush 267, and a plurality of guide members protruding from the blocking plate 291 along the longitudinal direction of the roll brush 267. 292. The guide member 292 is slidable with respect to the inner surface of the cleaning part 279b of the frame 279. Further, the shielding plate 291 is installed substantially perpendicular to the longitudinal direction of the roll brush 267. The installation angle of the shielding plate 291 may be inclined with respect to the longitudinal direction of the roll brush 267. With the above configuration, the airflow flowing between the cleaning unit 279 b and the roll brush 267 can be blocked by the shielding plate 291.

  The cleaning unit 279b of the frame 279 is provided with a blocking member 290 that is movable in conjunction with the transport rail 263. The transport member 290 corresponds to the size of the substrate P in the cleaning unit 279b. Positioned. On the other hand, as shown in FIG. 9, the roll brush 267 is divided into a contact portion C that contacts the substrate P and a non-contact portion N corresponding to the size of the substrate P, and dirt adheres only to the contact portion C. Since the blocking member 290 that blocks the airflow is disposed at the boundary between the contact portion C and the non-contact portion N of the roll brush 267, only the contact portion C of the roll brush 267 generates an airflow generated by the suction of the dust collecting discharge nozzle 280. The airflow to the non-contact part N can be prevented. Thereby, the cleaning efficiency of the roll brush 267 by the suction of the dust collection discharge nozzle 280 can be improved.

The technical scope of the present invention is not limited to the above embodiment, and various modifications can be made without departing from the spirit of the present invention. For example, in this embodiment, two static eliminators are used, but a static eliminator may be provided only on the upstream side of the roll brush. Moreover, although the form which wash | cleans a printed circuit board with the washing | cleaning apparatus was shown in this embodiment, board | substrates other than a printed circuit board may be sufficient.
Further, the substrate cleaning apparatus of the present invention is not limited to the substrate supply apparatus, and can be attached to all apparatuses for supplying a substrate and performing various processes, such as a printing machine, a stamping machine, and an inspection machine.

It is a front view which shows an example of the board | substrate cleaning apparatus and board | substrate supply apparatus concerning this invention. It is a perspective view of the board | substrate cleaning apparatus shown in FIG. It is a principal part enlarged view of the board | substrate cleaning apparatus shown in FIG. FIG. 2 is an exploded perspective view of the substrate cleaning apparatus shown in FIG. 1. It is a perspective view which shows another example of a board | substrate cleaning apparatus. FIG. 6 is a front view of the substrate cleaning apparatus shown in FIG. 5. FIG. 6 is a side view of the substrate cleaning apparatus shown in FIG. 5. It is a perspective view which shows another example of a board | substrate cleaning apparatus. It is a front view which shows the other example of a board | substrate cleaning apparatus. It is a side view which shows the principal part of the board | substrate cleaning apparatus shown in FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Substrate supply apparatus, 2 ... Elevating apparatus, 3 ... Conveying apparatus, 4 ... Storage rack, 5, 51, 101, 201 ... Substrate cleaning apparatus, 13, 63, 163, 263 ... Conveying rail, 17, 67, 267 ... Roll brush, 29, 79, 179, 279 ... Frame, 29a, 79a, 179a, 279a ... Main body, 29b, 79b, 179b, 279b ... Cleaning unit, 280 ... Dust collecting discharge nozzle, 290 ... Blocking member, A ... Cleaning unit, P ... Printed circuit board

Claims (6)

  A substrate cleaning apparatus comprising: a frame that movably supports a substrate; and a roll brush that is rotatably attached to the frame, wherein the surface of the substrate is cleaned by being rubbed with the roll brush. A substrate cleaning apparatus, wherein the roll brush is a conductive brush.   The substrate cleaning apparatus according to claim 1, wherein a nozzle for ejecting a charged fluid is provided at a position where the substrate moved by being supported by the frame is desired.   3. The substrate cleaning apparatus according to claim 1, wherein the nozzle is disposed on one or both of an upstream side and a downstream side in the transport direction of the substrate with respect to the roll brush.   The frame includes a main body provided with a transport rail for transporting the substrate, and a box-shaped cleaning unit attached to an upper part of the main body and provided with the roll brush therein, 4. The substrate cleaning apparatus according to claim 1, wherein the substrate cleaning apparatus is movable up and down with respect to the main body.   The frame is composed of a main body portion having a transport rail for transporting the substrate, and a box-shaped cleaning portion attached to the upper portion of the main body portion and having the roll brush inside, and the cleaning portion Is provided with a dust collecting and discharging nozzle for cleaning the roll brush, and the frame is provided with a blocking member for blocking an airflow flowing between the cleaning portion and the roll brush, The substrate cleaning apparatus according to any one of claims 1 to 3, wherein the substrate cleaning apparatus is movable along a longitudinal direction of the roll brush in conjunction with the transport rail. 6. A substrate cleaning apparatus according to claim 1, further comprising: a storage rack that stores a substrate; a lifting device that lifts and lowers the storage rack; and a transport device that transports the substrate. A substrate supply apparatus, wherein the apparatus is attached.

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