JP2006287026A - Light emitting element and light emitting device employing it - Google Patents

Light emitting element and light emitting device employing it Download PDF

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JP2006287026A
JP2006287026A JP2005106063A JP2005106063A JP2006287026A JP 2006287026 A JP2006287026 A JP 2006287026A JP 2005106063 A JP2005106063 A JP 2005106063A JP 2005106063 A JP2005106063 A JP 2005106063A JP 2006287026 A JP2006287026 A JP 2006287026A
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light emitting
light
emitting device
semiconductor layer
emitting element
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Koji Takaku
浩二 田角
Masahisa Kamiya
真央 神谷
Yoshinobu Suehiro
好伸 末広
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Toyoda Gosei Co Ltd
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Toyoda Gosei Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a light emitting element capable of improving the external radiative efficiency of light generated in the light emitting element and not generating the incidence of light again whose external radiation is effected once, and a light emitting device employing it. <P>SOLUTION: A recessed side surface 200A consisting of a semicircular curved surface is provided on the side surface of a GaN system semiconductor layer 200 of an LED (Light Emitting Diode) element 2. According to this constitution, light radiated externally out of the GaN system semiconductor layer 200 can be increased. On the other hand, a projected part is formed of the semicircular curved surface so as to form a recessed shape whereby light, radiated externally once, hardly performs incidence again into the neighbored projected part. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、半導体材料からなる発光素子およびこれを用いた発光装置に関し、特に、発光素子で生じた光の外部放射効率を向上させることができるとともに、一旦外部放射された光の再入射を生じることのない発光素子およびこれを用いた発光装置に関する。   The present invention relates to a light-emitting element made of a semiconductor material and a light-emitting device using the same, and in particular, can improve the external radiation efficiency of light generated by the light-emitting element and cause re-incidence of light once emitted externally. TECHNICAL FIELD The present invention relates to a light emitting element having no problem and a light emitting device using the same.

従来、サファイア等の下地基板上にIII族窒化物系化合物半導体からなる半導体結晶を成長させることによって発光素子を製造する方法が知られている。このような発光素子において、発光層で生じた光が光吸収係数の高い層に閉じ込められ、層内を横伝搬する横伝搬光となることが問題となっている。特に、III族窒化物系化合物半導体のように光吸収係数が大の層内に閉じ込められた光は、横伝搬の距離が大になるにつれて減衰し、外部放射が不可能となる。     Conventionally, a method of manufacturing a light emitting device by growing a semiconductor crystal made of a group III nitride compound semiconductor on a base substrate such as sapphire is known. In such a light-emitting element, there is a problem that light generated in the light-emitting layer is confined in a layer having a high light absorption coefficient and becomes laterally propagated light that propagates in the layer. In particular, light confined in a layer having a large light absorption coefficient, such as a group III nitride compound semiconductor, is attenuated as the lateral propagation distance increases, and external radiation becomes impossible.

上記した発光素子において生じる横伝搬光を効率良く外部放射させるものとして、発光素子の側面を凹凸形状に形成し、この凹凸形状に基づいて側面の臨界角を分散させるようにした発光素子が提案されている(例えば、特許文献1参照。)。   In order to efficiently emit the laterally propagated light generated in the light emitting element described above, a light emitting element in which the side surface of the light emitting element is formed in an uneven shape and the critical angle of the side surface is dispersed based on the uneven shape is proposed. (For example, refer to Patent Document 1).

特許文献1の発光素子では、側面を三角波状、波状等の凹凸形状に形成することにより側面の法線方向の分散させて臨界角を分散させ、発光領域に閉じこめられた光、特に横方向に閉じこめられた光をより効率的に取り出すようにしている。
特開2003−110136号公報([0011]、図2)
In the light-emitting element of Patent Document 1, the side surface is formed into an irregular shape such as a triangular wave shape or a wavy shape to disperse the normal angle of the side surface to disperse the critical angle, and the light confined in the light emitting region, particularly in the lateral direction. The trapped light is extracted more efficiently.
Japanese Patent Laying-Open No. 2003-110136 ([0011], FIG. 2)

しかし、特許文献1に記載された発光素子によると、側面に凹凸を設ける際、その形状によっては一旦発光素子外部に放射された光が隣接する凹凸形状に再入射してしまうため、外部放射効率を向上させることができないという問題がある。   However, according to the light-emitting element described in Patent Document 1, when unevenness is provided on the side surface, depending on the shape, light once emitted to the outside of the light-emitting element may be re-incident on the adjacent uneven shape, so that the external radiation efficiency There is a problem that cannot be improved.

従って、本発明の目的は、発光素子で生じた光の外部放射効率を向上させることができるとともに、一旦外部放射された光の再入射を生じることのない発光素子およびこれを用いた発光装置を提供することにある。   Accordingly, an object of the present invention is to improve the external radiation efficiency of light generated by a light emitting element, and to provide a light emitting element that does not cause re-incidence of light once emitted externally and a light emitting device using the same. It is to provide.

本発明は、上記目的を達成するため、発光する層を含む半導体層の側面に傾きの変化した傾斜面と、前記傾斜面の先端に設けられる尖状凸部とからなる複数の凹状光取出し部を有することを特徴とする発光素子を提供する。   In order to achieve the above-mentioned object, the present invention provides a plurality of concave light extraction portions comprising an inclined surface whose inclination has changed on the side surface of a semiconductor layer including a light emitting layer and a pointed convex portion provided at the tip of the inclined surface. Provided is a light-emitting element including:

また、本発明は、上記目的を達成するため、発光する層を含む半導体層の側面に曲面からなる傾斜面と、前記傾斜面の先端に設けられる尖状凸部とからなる複数の凹状光取出し部を有することを特徴とする発光素子を提供する。   In order to achieve the above object, the present invention provides a plurality of concave light extractions comprising a sloped surface formed of a curved surface on a side surface of a semiconductor layer including a light emitting layer and a pointed convex portion provided at the tip of the sloped surface. Provided is a light-emitting element having a portion.

また、本発明は、上記目的を達成するため、発光する層を含む半導体層の側面に略放物線状の直線で形成される傾斜面と、前記傾斜面の先端に設けられる尖状凸部とからなる複数の凹状光取出し部を有することを特徴とする発光素子を提供する。   In order to achieve the above object, the present invention includes an inclined surface formed by a substantially parabolic straight line on a side surface of a semiconductor layer including a light emitting layer, and a pointed convex portion provided at the tip of the inclined surface. A light emitting device comprising a plurality of concave light extraction portions is provided.

また、本発明は、上記目的を達成するため、発光する層を含む半導体層の側面に傾きの変化した傾斜面と、前記傾斜面の先端に設けられる尖状凸部とからなる複数の凹状光取出し部を有する発光素子と、前記発光素子を搭載する基板と、前記発光素子を封止する封止部とを有することを特徴とする発光装置を提供する。   In order to achieve the above object, the present invention provides a plurality of concave light comprising an inclined surface whose inclination has changed on the side surface of a semiconductor layer including a light emitting layer and a pointed convex portion provided at the tip of the inclined surface. There is provided a light emitting device comprising: a light emitting element having an extraction part; a substrate on which the light emitting element is mounted; and a sealing part for sealing the light emitting element.

本発明によると、発光する層を含む半導体層の側面に傾きの変化した傾斜面からなる複数の凹状光取出し部を設けることにより、発光素子で生じた光の外部放射効率を向上させることができる。また、傾きの変化した傾斜面によって尖状凸部が形成されるように凹状光取出し部を形成することにより、一旦外部放射された光の再入射を生じることがない。   According to the present invention, it is possible to improve the external radiation efficiency of the light generated in the light emitting element by providing a plurality of concave light extraction portions made of inclined surfaces with varying inclinations on the side surfaces of the semiconductor layer including the light emitting layer. . Further, by forming the concave light extraction portion so that the pointed convex portion is formed by the inclined surface whose inclination has changed, the light once radiated to the outside is not re-incident.

(第1の実施の形態)
図1は、本発明の第1の実施の形態に係る発光装置を示し、(a)は発光装置の縦断面図、(b)は発光装置に搭載されるLED素子の拡大した縦断面図である。
(First embodiment)
1A and 1B show a light emitting device according to a first embodiment of the present invention, in which FIG. 1A is a longitudinal sectional view of the light emitting device, and FIG. 1B is an enlarged longitudinal sectional view of an LED element mounted on the light emitting device. is there.

この発光装置1は、図1(a)に示すようにフリップチップ型のLED素子2と、LED素子2を搭載する無機基板としてのAl基板3と、無機封止材料としてのガラス封止部4と、LED素子2の電極とAl基板3の実装面にタングステン(W)で形成される回路パターン30とを電気的に接続するAuスタッドバンプ5とを有する。 As shown in FIG. 1A, the light emitting device 1 includes a flip chip type LED element 2, an Al 2 O 3 substrate 3 as an inorganic substrate on which the LED element 2 is mounted, and a glass seal as an inorganic sealing material. The stop portion 4 and the Au stud bump 5 for electrically connecting the electrode of the LED element 2 and the circuit pattern 30 formed of tungsten (W) to the mounting surface of the Al 2 O 3 substrate 3 are provided.

Al基板3は、断面内にビアホール3Aを有し、このビアホール3Aに設けられるWからなるビアパターン32によって実装面の回路パターン30と裏面の回路パターン31とを電気的に接続している。 The Al 2 O 3 substrate 3 has a via hole 3A in the cross section, and the circuit pattern 30 on the mounting surface and the circuit pattern 31 on the back surface are electrically connected by a via pattern 32 made of W provided in the via hole 3A. Yes.

ガラス封止部4は、SiO‐Nb系(屈折率n=1.8)の低融点ガラスによって形成されており、平坦な側面41と、平坦な上面40とを有する。 The glass sealing portion 4 is formed of a low melting point glass of SiO 2 —Nb 2 O 5 system (refractive index n = 1.8), and has a flat side surface 41 and a flat upper surface 40.

LED素子2は、図1(b)に示すように、サファイア基板20上にGaNバッファ層21と、n−GaN層22、発光層23、p−GaN層24とを順次結晶成長させることによって形成されており、n−GaN層22、発光層23、およびp−GaN層24によってGaN系半導体層200を形成している。このGaN系半導体層200の側面には、曲面からなる複数の凹部を連続的に設けた凹状側面200Aが設けられており、さらに、p−GaN層24からn−GaN層22をエッチングによって除去することにより露出させたn−GaN層22に設けられるn−電極25と、p−GaN層22の表面に電流拡散層および光反射層としてのロジウム(Rh)からなるpコンタクト電極26とを有する。   The LED element 2 is formed by sequentially growing a GaN buffer layer 21, an n-GaN layer 22, a light emitting layer 23, and a p-GaN layer 24 on a sapphire substrate 20, as shown in FIG. The n-GaN layer 22, the light emitting layer 23, and the p-GaN layer 24 form a GaN-based semiconductor layer 200. The side surface of the GaN-based semiconductor layer 200 is provided with a concave side surface 200A in which a plurality of concave portions each having a curved surface are continuously provided, and the n-GaN layer 22 is removed from the p-GaN layer 24 by etching. The n-electrode 25 provided on the exposed n-GaN layer 22 and the p-contact electrode 26 made of rhodium (Rh) as a current diffusion layer and a light reflecting layer on the surface of the p-GaN layer 22 are provided.

LED素子の製造方法については、特に限定されないが、周知の有機金属気相成長法(MOCVD法)、分子線結晶成長法(MBE法)、ハライド系気相成長法(HVPE法)、スパッタ法、イオンプレーティング法、電子シャワー法等によって形成することができる。なお、LED素子の構成としては、ホモ構造、ヘテロ構造若しくはダブルへテロ構造のものを用いることができる。さらに、量子井戸構造(単一量子井戸構造若しくは多重量子井戸構造)を採用することもできる。   Although it does not specifically limit about the manufacturing method of a LED element, Well-known organometallic vapor phase epitaxy method (MOCVD method), molecular beam crystal growth method (MBE method), halide type | system | group vapor phase epitaxy method (HVPE method), sputtering method, It can be formed by an ion plating method, an electron shower method, or the like. In addition, as a structure of a LED element, the thing of a homo structure, a hetero structure, or a double hetero structure can be used. Furthermore, a quantum well structure (single quantum well structure or multiple quantum well structure) can also be adopted.

(LED素子2の構成)
図2は、第1の実施の形態に係るLED素子の構成を示し、(a)は電極形成面の平面図、(b)はGaN系半導体層に設けられる凹状側面の部分拡大図である。
(Configuration of LED element 2)
2A and 2B show the configuration of the LED element according to the first embodiment, in which FIG. 2A is a plan view of an electrode forming surface, and FIG. 2B is a partially enlarged view of a concave side surface provided in a GaN-based semiconductor layer.

LED素子2は、n−電極25の形成領域を除くGaN系半導体層200の側面に光取出し部としてエッチングによって形成された凹状側面200Aを有する。この凹状側面200Aは、図2(b)に示すように、半円状をなす曲面によって形成されており、曲面からなる尖状の凸部は、隣接する尖状の凸部と所定の間隔を有して形成されている。第1の実施の形態では、幅Wに対して凹状側面200Aは凸部の高さHが大になるように形成されている。   The LED element 2 has a concave side surface 200A formed by etching as a light extraction portion on the side surface of the GaN-based semiconductor layer 200 excluding the region where the n-electrode 25 is formed. As shown in FIG. 2B, the concave side surface 200A is formed by a semicircular curved surface, and the cusp-shaped convex portion formed of a curved surface has a predetermined interval from the adjacent cusp-shaped convex portion. It is formed. In the first embodiment, the concave side surface 200A with respect to the width W is formed so that the height H of the convex portion is large.

凹状側面200Aに入射する光Lは、図2(b)に示すように、曲面部202に入射する光L、Lのように法線方向については界面反射を生じることなくGaN系半導体層200から外部放射される。また、曲面部202に入射する光Lのように凹状側面200Aの臨界角内にあるものについては界面で屈折して外部放射される。このように、いずれの光L、L、およびLについても一旦外部放射された光は隣接する凸部に再入射することはない。 As shown in FIG. 2B, the light L incident on the concave side surface 200A does not cause interface reflection in the normal direction like the lights L 1 and L 3 incident on the curved surface portion 202, as shown in FIG. 200 radiates externally. Further, the light L 3 incident on the curved surface portion 202 that is within the critical angle of the concave side surface 200A is refracted at the interface and emitted externally. Thus, the light once radiated to the outside for any of the lights L 1 , L 3 , and L 3 does not re-enter the adjacent convex portion.

図3は、凹状側面を構成する形状に基づくLED素子の側面放射率を示す特性図である。図3においては、(a)に示すジャギー形状、(b)に示す曲面の凸形状からなるラウンド形状、(c)に示す曲面の凹形状からなる逆ラウンド形状、(d)に示す先丸ジャギー形状の4種の側面形状について、凹凸の高さHおよび幅Wを変化させたものである。本発明者によれば、H/W比が大になるにつれて、(a)のジャギー形状および(c)の逆ラウンド形状を有する凹状側面を設けたLED素子2の側面放射率が大になることを確認しており、特に、逆ラウンド形状の凹状側面を設けたLED素子2では、側面放射率がジャギー形状のものより向上することを確認している。   FIG. 3 is a characteristic diagram showing the side emissivity of the LED element based on the shape constituting the concave side surface. In FIG. 3, a jaggy shape shown in (a), a round shape consisting of a convex shape of a curved surface shown in (b), an inverted round shape consisting of a concave shape of a curved surface shown in (c), and a rounded jaggy shown in (d). The height H and width W of the unevenness are changed for the four types of side shapes. According to the inventors, as the H / W ratio increases, the side emissivity of the LED element 2 provided with the concave side surface having the jaggy shape of (a) and the reverse round shape of (c) increases. In particular, in the LED element 2 provided with the inverted round-shaped concave side surface, it has been confirmed that the side emissivity is higher than that of the jaggy shape.

凹状側面200Aについては、H/W比が0.125であると5%の光取出し効果があり、それより大になると光取出し効果は向上するものの、2以上になると発光する層の面積が小さくなって発光量が減少するため、0.125〜2の範囲が適している。   For the concave side surface 200A, if the H / W ratio is 0.125, there is a 5% light extraction effect. If the H / W ratio is larger than that, the light extraction effect is improved. Since the amount of emitted light is reduced, the range of 0.125 to 2 is suitable.

(第1の実施の形態の効果)
上記した第1の実施の形態によると、以下の効果が得られる。
(1)LED素子2のGaN系半導体層200側面に半円状をなす曲面で構成された凹状側面200Aを設けたので、GaN系半導体層200から外部放射される光を増やすことができる。また、凹状をなすように半円状をなす曲面で凸部を形成することで、一旦外部放射された光が隣接する凸部に再入射しにくくなる。
(Effects of the first embodiment)
According to the first embodiment described above, the following effects are obtained.
(1) Since the concave side surface 200A composed of a semicircular curved surface is provided on the side surface of the GaN-based semiconductor layer 200 of the LED element 2, the light emitted from the GaN-based semiconductor layer 200 can be increased. Further, by forming the convex portion with a semicircular curved surface so as to form a concave shape, it becomes difficult for light emitted once externally to re-enter the adjacent convex portion.

(2)凹状側面200Aを有するLED素子2をガラス封止部4で封止して発光装置1を形成したので、LED素子2からの光取出し性に優れ、かつLED素子2への光の再入射を生じることなく、高輝度で、優れた耐湿性を有し、長期にわたって安定した発光特性を有する発光装置1を提供できる。 (2) Since the light emitting device 1 is formed by sealing the LED element 2 having the concave side surface 200A with the glass sealing portion 4, the light extraction from the LED element 2 is excellent and the light to the LED element 2 is re-transmitted. The light emitting device 1 having high luminance, excellent moisture resistance, and stable light emission characteristics over a long period can be provided without incidence.

なお、上記した第1の実施の形態では、LED素子2をガラス封止したガラス封止型発光装置を説明したが、LED素子2を封止する封止部が他の材料で形成されていても良い。他の材料として、例えば、エポキシ樹脂、シリコン樹脂等の樹脂材料を用いることが可能である。   In the above-described first embodiment, the glass-sealed light emitting device in which the LED element 2 is glass-sealed has been described. However, the sealing portion that seals the LED element 2 is formed of another material. Also good. For example, a resin material such as an epoxy resin or a silicon resin can be used as the other material.

また、第1の実施の形態では、フリップチップタイプのLED素子2を用いた発光装置について説明したが、フェイスアップタイプのLED素子2に上記した凹状側面200Aを設けたものとすることも可能である。   In the first embodiment, the light emitting device using the flip-chip type LED element 2 has been described. However, the above-described concave side surface 200A may be provided on the face-up type LED element 2. is there.

(第2の実施の形態)
図4は、本発明の第2の実施の形態に係るLED素子の構成を示し、(a)は電極形成面の平面図、(b)はGaN系半導体層に設けられる凹状側面の部分拡大図、(c)は凹状側面の他の構成を示す部分拡大図である。
(Second Embodiment)
4A and 4B show the configuration of an LED element according to the second embodiment of the present invention, where FIG. 4A is a plan view of an electrode forming surface, and FIG. 4B is a partially enlarged view of a concave side surface provided in a GaN-based semiconductor layer. (C) is the elements on larger scale which show the other structure of a concave side surface.

このLED素子2は、略放物線状の曲面からなる逆ラウンド状の凹状側面200AをGaN系半導体層200の側面にエッチングによって設けた構成において第1の実施の形態と相違している。   This LED element 2 is different from that of the first embodiment in a configuration in which an inverted round concave side surface 200A having a substantially parabolic curved surface is provided on the side surface of the GaN-based semiconductor layer 200 by etching.

凹状側面200Aは、図4(b)に示すように、凸部202Aの高さHが隣接する凸部202Aとの幅Wより大(H/W比=1.5)に形成されている。例えば、曲面部202に入射する光Lは、曲面部202から出射する際に屈折し、隣接する凸部202Aに達するが、この凸部202Aの表面で反射されて凹部の外側に放射される。また、光Lは、曲面部202から出射する際に屈折しながら凹部の外側に放射される。また、光Lは、GaN系半導体層200からの出射時には屈折せず、曲面部202の表面で反射して外部放射される。このように、いずれの光L、L、およびLについても一旦外部放射された光は隣接する凸部に再入射することはない。 As shown in FIG. 4B, the concave side surface 200A is formed such that the height H of the convex portion 202A is larger than the width W of the adjacent convex portion 202A (H / W ratio = 1.5). For example, the light L 1 incident on the curved surface portion 202 is refracted when exiting from the curved surface portion 202 and reaches the adjacent convex portion 202A, but is reflected by the surface of the convex portion 202A and radiated to the outside of the concave portion. . Further, the light L 3 is radiated to the outside of the concave portion while being refracted when emitted from the curved surface portion 202. In addition, the light L 3 is not refracted when emitted from the GaN-based semiconductor layer 200, but is reflected from the surface of the curved surface portion 202 and emitted externally. Thus, the light once radiated to the outside for any of the lights L 1 , L 3 , and L 3 does not re-enter the adjacent convex portion.

なお、図4(b)に示す凸部202Aは、加工精度や制約により加工が安定しないことや、幅Wに対し高さHが大であるので、衝撃や内部応力によって破損を生じることがある。これらを防ぐものとして、図4(c)に示すようにGaN系半導体層200をエッチングする際に、凸部202Aの先端に未加工部204を設けて厚みを付与するようにしても良い。   Note that the convex portion 202A shown in FIG. 4B may not be stable due to processing accuracy or restrictions, or may be damaged by impact or internal stress because the height H is large relative to the width W. . In order to prevent these, as shown in FIG. 4C, when the GaN-based semiconductor layer 200 is etched, an unprocessed portion 204 may be provided at the tip of the convex portion 202A to give a thickness.

(第2の実施の形態の効果)
上記した第2の実施の形態によると、LED素子2のGaN系半導体層200側面に略放物線状の曲面からなる逆ラウンド状の凹状側面200Aを設けたので、第1の実施の形態の好ましい効果に加えて、GaN系半導体層200から外部放射される光をより増やすことができる。このため、GaN系半導体層200のエッチング面積が第1の実施の形態で説明したLED素子2より大になっても、側面反射率の向上によって発光装置1の高輝度化を図ることが可能になる。
(Effect of the second embodiment)
According to the second embodiment described above, since the reverse round concave side surface 200A having a substantially parabolic curved surface is provided on the side surface of the GaN-based semiconductor layer 200 of the LED element 2, the preferable effect of the first embodiment is achieved. In addition, the light emitted from the GaN-based semiconductor layer 200 can be further increased. Therefore, even when the etching area of the GaN-based semiconductor layer 200 is larger than that of the LED element 2 described in the first embodiment, it is possible to increase the luminance of the light emitting device 1 by improving the side reflectance. Become.

(第3の実施の形態)
図5は、本発明の第3の実施の形態に係るLED素子の構成を示し、(a)は電極形成面の平面図、(b)はGaN系半導体層に設けられる凹状側面の部分拡大図である。
(Third embodiment)
FIG. 5 shows a configuration of an LED element according to the third embodiment of the present invention, where (a) is a plan view of an electrode forming surface, and (b) is a partially enlarged view of a concave side surface provided in a GaN-based semiconductor layer. It is.

このLED素子2は、第2の実施の形態で説明した逆ラウンド状の凹状側面200Aの底部に直線からなる多角形部203を部分的に設けた構成において第2の実施の形態と相違している。   This LED element 2 is different from the second embodiment in a configuration in which a polygonal portion 203 made of a straight line is partially provided at the bottom of the reverse round concave side surface 200A described in the second embodiment. Yes.

(第3の実施の形態の効果)
上記した第3の実施の形態によると、加工精度や制約により曲線部加工が困難な場合、凹状側面200Aの一部を直線部で形成するようにしても、GaN系半導体層200から外部放射される光をより増やすことができる。
(Effect of the third embodiment)
According to the third embodiment described above, when it is difficult to process a curved portion due to processing accuracy or restrictions, even if a part of the concave side surface 200A is formed as a straight portion, the GaN-based semiconductor layer 200 is externally radiated. More light.

(第4の実施の形態)
図6は、本発明の第4の実施の形態に係るLED素子の構成を示し、(a)は電極形成面の平面図、(b)はGaN系半導体層に設けられる凹状側面の部分拡大図である。
(Fourth embodiment)
6A and 6B show a configuration of an LED element according to a fourth embodiment of the present invention, where FIG. 6A is a plan view of an electrode forming surface, and FIG. 6B is a partially enlarged view of a concave side surface provided in a GaN-based semiconductor layer. It is.

このLED素子2は、第2の実施の形態で説明した逆ラウンド状の凹状側面200Aを全て直線からなる多角形部203で設けた構成において第2の実施の形態と相違している。   This LED element 2 is different from the second embodiment in the configuration in which the reverse round concave side surface 200 </ b> A described in the second embodiment is provided by the polygonal portion 203 formed of a straight line.

(第4の実施の形態の効果)
上記した第4の実施の形態によると、加工精度や制約により曲線部加工が困難な場合、凹状側面200Aを全て直線部で形成するようにしても、GaN系半導体層200から外部放射される光をより増やすことができる。
(Effect of the fourth embodiment)
According to the above-described fourth embodiment, when curved portion machining is difficult due to processing accuracy and restrictions, the light radiated from the GaN-based semiconductor layer 200 is emitted even if all the concave side surfaces 200A are formed by straight portions. Can be increased more.

本発明の第1の実施の形態に係る発光装置を示し、(a)は発光装置の縦断面図、(b)は発光装置に搭載されるLED素子の拡大した縦断面図である。The light-emitting device which concerns on the 1st Embodiment of this invention is shown, (a) is a longitudinal cross-sectional view of a light-emitting device, (b) is the expanded longitudinal cross-sectional view of the LED element mounted in a light-emitting device. 第1の実施の形態に係るLED素子の構成を示し、(a)は電極形成面の平面図、(b)はGaN系半導体層に設けられる凹状側面の部分拡大図である。The structure of the LED element which concerns on 1st Embodiment is shown, (a) is a top view of an electrode formation surface, (b) is the elements on larger scale of the concave side surface provided in a GaN-type semiconductor layer. 凹状側面を構成する形状に基づくLED素子の側面放射率を示す特性図である。It is a characteristic view which shows the side surface emissivity of the LED element based on the shape which comprises a concave side surface. 本発明の第2の実施の形態に係るLED素子の構成を示し、(a)は電極形成面の平面図、(b)はGaN系半導体層に設けられる凹状側面の部分拡大図、(c)は凹状側面の他の構成を示す部分拡大図である。The structure of the LED element which concerns on the 2nd Embodiment of this invention is shown, (a) is a top view of an electrode formation surface, (b) is the elements on larger scale of the concave side surface provided in a GaN-type semiconductor layer, (c) FIG. 5 is a partially enlarged view showing another configuration of the concave side surface. 本発明の第3の実施の形態に係るLED素子の構成を示し、(a)は電極形成面の平面図、(b)はGaN系半導体層に設けられる凹状側面の部分拡大図である。The structure of the LED element which concerns on the 3rd Embodiment of this invention is shown, (a) is a top view of an electrode formation surface, (b) is the elements on larger scale of the concave side surface provided in a GaN-type semiconductor layer. 本発明の第4の実施の形態に係るLED素子の構成を示し、(a)は電極形成面の平面図、(b)はGaN系半導体層に設けられる凹状側面の部分拡大図である。The structure of the LED element which concerns on the 4th Embodiment of this invention is shown, (a) is a top view of an electrode formation surface, (b) is the elements on larger scale of the concave side surface provided in a GaN-type semiconductor layer.

符号の説明Explanation of symbols

1…発光装置、2…LED素子、3…Al基板、3A…ビアホール、4…ガラス封止部、5…Auスタッドバンプ、20…サファイア基板、21…GaNバッファ層、22…n−GaN層、23…発光層、24…p−GaN層、25…n−電極、26…pコンタクト電極、30…回路パターン、31…回路パターン、32…ビアパターン、40…上面、41…側面、200A…凹状側面、200…GaN系半導体層、202A…凸部、202…曲面部、203…多角形部、204…未加工部 1 ... light emitting device, 2 ... LED element, 3 ... Al 2 O 3 substrate, 3A ... hole, 4 ... glass sealing portion, 5 ... Au stud bump, 20 ... sapphire substrate, 21 ... GaN buffer layer, 22 ... n- GaN layer, 23 ... light emitting layer, 24 ... p-GaN layer, 25 ... n-electrode, 26 ... p contact electrode, 30 ... circuit pattern, 31 ... circuit pattern, 32 ... via pattern, 40 ... top surface, 41 ... side surface, 200A ... concave side surface, 200 ... GaN-based semiconductor layer, 202A ... convex part, 202 ... curved surface part, 203 ... polygonal part, 204 ... unprocessed part

Claims (9)

発光する層を含む半導体層の側面に傾きの変化した傾斜面と、前記傾斜面の先端に設けられる尖状凸部とからなる複数の凹状光取出し部を有することを特徴とする発光素子。   A light emitting device comprising: a plurality of concave light extraction portions each including an inclined surface whose inclination is changed on a side surface of a semiconductor layer including a light emitting layer and a pointed convex portion provided at a tip of the inclined surface. 発光する層を含む半導体層の側面に曲面からなる傾斜面と、前記傾斜面の先端に設けられる尖状凸部とからなる複数の凹状光取出し部を有することを特徴とする発光素子。   A light-emitting element comprising a plurality of concave light extraction portions each including an inclined surface formed of a curved surface on a side surface of a semiconductor layer including a light emitting layer and a pointed convex portion provided at a tip of the inclined surface. 前記傾斜面は、略放物線状の曲線で形成される請求項1または2に記載の発光素子。   The light emitting device according to claim 1, wherein the inclined surface is formed by a substantially parabolic curve. 前記傾斜面は、一部が曲面で形成される請求項1または2に記載の発光素子。   The light emitting device according to claim 1, wherein a part of the inclined surface is a curved surface. 発光する層を含む半導体層の側面に略放物線状の直線で形成される傾斜面と、前記傾斜面の先端に設けられる尖状凸部とからなる複数の凹状光取出し部を有することを特徴とする発光素子。   It has a plurality of concave light extraction parts composed of an inclined surface formed by a substantially parabolic straight line on a side surface of a semiconductor layer including a light emitting layer and a pointed convex part provided at the tip of the inclined surface. Light emitting element. 前記凹状光取出し部は、前記尖状凸部の先端と底部にかけての高さと、隣接する前記尖状凸部との幅との比が0.125から2の範囲で形成される請求項1から5のいずれか1項に記載の発光素子。   The concave light extraction portion is formed such that a ratio of a height between a tip and a bottom of the pointed convex portion and a width of the adjacent pointed convex portion is in a range of 0.125 to 2. 6. The light emitting device according to any one of 5 above. 発光する層を含む半導体層の側面に傾きの変化した傾斜面と、前記傾斜面の先端に設けられる尖状凸部とからなる複数の凹状光取出し部を有する発光素子と、
前記発光素子を搭載する基板と、
前記発光素子を封止する封止部とを有することを特徴とする発光装置。
A light-emitting element having a plurality of concave light extraction portions, each of which includes an inclined surface whose inclination is changed on a side surface of a semiconductor layer including a light-emitting layer, and a pointed convex portion provided at a tip of the inclined surface;
A substrate on which the light emitting element is mounted;
A light emitting device comprising: a sealing portion for sealing the light emitting element.
前記発光素子は、前記基板にフリップ実装される請求項7に記載の発光装置。   The light emitting device according to claim 7, wherein the light emitting element is flip-mounted on the substrate. 前記封止部は、ガラスからなる封止材料によって構成される請求項7に記載の発光装置。
The light emitting device according to claim 7, wherein the sealing portion is made of a sealing material made of glass.
JP2005106063A 2005-04-01 2005-04-01 Light emitting element and light emitting device employing it Pending JP2006287026A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011021774A2 (en) * 2009-08-20 2011-02-24 Youn Kang-Sik Optical semiconductor device and method for manufacturing same
JP2013125968A (en) * 2011-12-13 2013-06-24 Lg Innotek Co Ltd Ultraviolet light emitting device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011021774A2 (en) * 2009-08-20 2011-02-24 Youn Kang-Sik Optical semiconductor device and method for manufacturing same
WO2011021774A3 (en) * 2009-08-20 2011-04-14 Youn Kang-Sik Optical semiconductor device and method for manufacturing same
JP2013125968A (en) * 2011-12-13 2013-06-24 Lg Innotek Co Ltd Ultraviolet light emitting device
US9786814B2 (en) 2011-12-13 2017-10-10 Lg Innotek Co., Ltd. Ultraviolet light emitting device

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