JP2006219755A - Vapor deposition system - Google Patents

Vapor deposition system Download PDF

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Publication number
JP2006219755A
JP2006219755A JP2005036981A JP2005036981A JP2006219755A JP 2006219755 A JP2006219755 A JP 2006219755A JP 2005036981 A JP2005036981 A JP 2005036981A JP 2005036981 A JP2005036981 A JP 2005036981A JP 2006219755 A JP2006219755 A JP 2006219755A
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vapor deposition
deposition apparatus
crucible
organic material
organic
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Tetsuo Ishida
哲夫 石田
Kazuki Kitamura
一樹 北村
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Japan Display Central Inc
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Toshiba Matsushita Display Technology Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a vapor deposition system with a structure where, even when a liquefied organic material is condensed to the lower side of a cover body, the organic material does not leak to the outside of a crucible. <P>SOLUTION: The vapor deposition system is provided with a crucible 22 arranged at the lower part of a substrate used for an organic EL device and vacuum-depositing an organic material. The crucible 22 comprises: a storage part 24; a cover body 26; and a heater. Further, in the cover body 26, a blow-off port 28 from which the organic material is blown off is opened, and, at the lower side in the vicinity of the outer circumferential part in the cover body 26, an eave part 30 fitted to the inside of the opening part in the storage part 24 is projected to the lower part. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、蒸着装置に関するものである。   The present invention relates to a vapor deposition apparatus.

近年、薄型表示装置として複数の有機EL(エレクトロルミネセンス)素子をマトリクス状に配置した有機EL表示装置が注目を集めている。有機EL素子は、陰極及び陽極間に有機材料でなる発光層を挟持して構成される。有機EL素子における発光層は耐水性が低く、発光層を形成する際には真空薄膜成膜技術の一つである真空蒸着技術によって成膜するのが一般的である。   In recent years, an organic EL display device in which a plurality of organic EL (electroluminescence) elements are arranged in a matrix as a thin display device has attracted attention. An organic EL element is configured by sandwiching a light emitting layer made of an organic material between a cathode and an anode. The light emitting layer in the organic EL element has low water resistance, and when the light emitting layer is formed, it is generally formed by a vacuum vapor deposition technique which is one of vacuum thin film forming techniques.

このような発光層の成膜を行う技術として、成膜対象となる基板とライン型蒸着源とを相対移動させる技術が知られている(例えば、特許文献1参照)。   As a technique for forming such a light emitting layer, a technique for relatively moving a substrate to be formed and a line-type evaporation source is known (see, for example, Patent Document 1).

この有機材料を基板に真空蒸着する場合には、真空雰囲気中で、基板をマスクを介してライン型蒸着源に対向して基板を配置した状態で、蒸着源を加熱させつつ、蒸着源の長手方向と直交する方向に相対移動させることにより、基板の対向面に有機材料を成膜している。   When this organic material is vacuum-deposited on a substrate, in the vacuum atmosphere, the substrate is placed facing the line-type deposition source through a mask, while the deposition source is heated, the length of the deposition source is increased. An organic material is formed on the opposite surface of the substrate by relative movement in a direction perpendicular to the direction.

蒸着源は、基板の移動方向と直交する方向の長さを充分カバーする蒸着幅を有している。
特開2003−157973号公報
The deposition source has a deposition width that sufficiently covers the length in the direction orthogonal to the moving direction of the substrate.
JP 2003-157773 A

ところで、蒸着源からの出射量を制御するために、図4に示すような蒸着源として貯留部102に蓋体104を被せ配置した構造の坩堝100を考えると、蓋体104の内面にトラップされた蒸着材料が液化し、蓋体104を伝って、坩堝100の外部に漏れ出す可能性があることがわかった。   By the way, in order to control the amount of light emitted from the vapor deposition source, a crucible 100 having a structure in which the storage unit 102 is covered with the lid 104 as shown in FIG. 4 is trapped on the inner surface of the lid 104. It has been found that the deposited material may be liquefied and leak out of the crucible 100 through the lid 104.

そこで、本発明は上記問題点に鑑み、蓋体にて蒸着材料が液化したとしても、この蒸着材料が坩堝の外部に漏れ出さない構造の蒸着装置を提供する。   Therefore, in view of the above problems, the present invention provides a vapor deposition apparatus having a structure in which even if a vapor deposition material is liquefied by a lid, the vapor deposition material does not leak out of the crucible.

本発明は、筐体と、前記筐体内に配置され、蒸着材料を貯留するための貯留部と、前記貯留部の上面に配置され、前記蒸着材料を出射する吹出口を備えた蓋体と、を有する坩堝と、前記坩堝を加熱する加熱手段とを有し、前記蓋体は前記貯留部の開口部内壁に嵌合するひさし部を備えたことを特徴とする蒸着装置である。   The present invention is a housing, a storage portion that is disposed in the housing and stores the vapor deposition material, a lid body that is disposed on the upper surface of the storage portion and includes a blowout port that emits the vapor deposition material, And a heating means for heating the crucible, and the lid body has an eaves portion fitted to the inner wall of the opening of the storage portion.

本発明によれば、蒸着材料が不所望に外部に漏れ出すことを防止し、蒸着レイトを安定させ、また蒸着被膜の膜厚を安定化させることができる。   ADVANTAGE OF THE INVENTION According to this invention, it can prevent that a vapor deposition material leaks outside undesirably, a vapor deposition rate can be stabilized, and the film thickness of a vapor deposition film can be stabilized.

本発明の一実施形態について、図1〜図3に基づいて説明する。   An embodiment of the present invention will be described with reference to FIGS.

本実施形態は、有機EL装置に用いられる基板10に正孔注入層、正孔輸送層、発光層、電子輸送層等よりなる有機層を積層するための真空蒸着装置に関し、真空状態を実現すチャンバー(筐体)内部に基板10を配し、真空蒸着を行なう。   This embodiment relates to a vacuum deposition apparatus for stacking an organic layer composed of a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and the like on a substrate 10 used in an organic EL device, and realizes a vacuum state. The substrate 10 is disposed inside the chamber (housing) and vacuum deposition is performed.

(1)真空蒸着の方法
以下、図2及び図3に基づいて、基板10に有機材料を真空蒸着する方法について説明する。
(1) Method of vacuum deposition Hereinafter, a method of vacuum depositing an organic material on the substrate 10 will be described with reference to FIGS.

基板10は、チャンバー内部の真空雰囲気中においてマグネット20によって吸引して被蒸着面が蒸着源に対向して配置されるよう、被蒸着面を下向きにした状態で保持機構により保持している。すなわち、図3に示すように、基板10の被蒸着面には、ステンレス製のマスク支持部12が配され、基板10の被蒸着面の反対側の面には、アルミニウム製、または、カッパー製の押え板18が配され、マグネット20がマスク支持部12を吸引することにより、基板10を保持している。マスク支持部12には、額縁状の枠部14内部に鉄−クロム合金製のマスクが設けられている。   The substrate 10 is held by the holding mechanism with the deposition surface facing downward so that the deposition surface is disposed facing the deposition source by being attracted by the magnet 20 in a vacuum atmosphere inside the chamber. That is, as shown in FIG. 3, a stainless steel mask support 12 is disposed on the deposition surface of the substrate 10, and the surface opposite to the deposition surface of the substrate 10 is made of aluminum or copper. The holding plate 18 is disposed, and the magnet 20 attracts the mask support portion 12 to hold the substrate 10. The mask support 12 is provided with a mask made of iron-chromium alloy inside the frame-shaped frame portion 14.

上記のようにして保持された基板10の下方には、所定間隔(例えば、150mmである)を開けて坩堝22が配されている。坩堝22は、直方体の箱形であって、坩堝22を移動可能とする移動手段により、坩堝22の長手方向と直交する方向に一定速度(例えば、10〜20mm/秒である)で走査される。坩堝22の長手方向の長さは、蒸着幅が相対移動方向と直交する方向の基板の長さをカバーできる程度に設定される。   Below the substrate 10 held as described above, a crucible 22 is arranged with a predetermined interval (for example, 150 mm). The crucible 22 has a rectangular parallelepiped box shape, and is scanned at a constant speed (for example, 10 to 20 mm / second) in a direction orthogonal to the longitudinal direction of the crucible 22 by a moving means that allows the crucible 22 to move. . The length in the longitudinal direction of the crucible 22 is set to such an extent that the deposition width can cover the length of the substrate in the direction orthogonal to the relative movement direction.

坩堝22は、貯留部24と蓋体26とより構成され、貯留部24内部に有機材料が貯留されている。この詳しい構成については後から説明する。蓋体26の上面には、昇華した有機材料が出射するための吹出口28が坩堝長手方向に沿って複数開口している。また、坩堝22の両側壁には、ヒータ25が内蔵され、貯留されている有機材料を加熱する。   The crucible 22 includes a storage unit 24 and a lid body 26, and an organic material is stored in the storage unit 24. This detailed configuration will be described later. On the upper surface of the lid 26, a plurality of air outlets 28 through which the sublimated organic material is emitted are opened along the crucible longitudinal direction. Further, heaters 25 are built in both side walls of the crucible 22 to heat the stored organic material.

そして、上記にように、所定速度で坩堝22を基板10の縦方向に移動させると、加熱により昇華した有機材料が基板10の被蒸着面におけるマスク16によって覆われていない部分に、選択的に有機材料が蒸着される。尚、吹出口は、坩堝長手方向に沿った長方形形状であってもよい。   As described above, when the crucible 22 is moved in the longitudinal direction of the substrate 10 at a predetermined speed, the organic material sublimated by heating is selectively applied to a portion of the deposition surface of the substrate 10 that is not covered by the mask 16. An organic material is deposited. In addition, the rectangular shape along the crucible longitudinal direction may be sufficient as a blower outlet.

(2)坩堝22の構造
上記真空蒸着で用いられる坩堝22の構造について図1及び図2に基づいて説明する。
(2) Structure of the crucible 22 The structure of the crucible 22 used in the vacuum deposition will be described with reference to FIGS.

坩堝22は、直方体の箱形であって貯留部24と蓋体26とより構成されている。貯留部24は、二層構造であって外側がカーボン、または、グラファイトより構成され、有機材料が接触する内側は石英ガラスより構成されている。   The crucible 22 has a rectangular parallelepiped box shape and includes a storage section 24 and a lid body 26. The reservoir 24 has a two-layer structure, the outer side is made of carbon or graphite, and the inner side in contact with the organic material is made of quartz glass.

蓋体26は、貯留部24の上面の開口部及び貯留部24の側壁を覆う形状となっており、蓋体26の上面には吹出口28が所定間隔毎に複数開口している。さらに、蓋体26の下面には、ひさし部30が下方に突出している。このひさし部30は、図1及び図2に示すように、貯留部24の壁の内側に嵌合するように、蓋体26の下面の四周部に沿って突出している。   The lid body 26 has a shape that covers the opening on the upper surface of the storage portion 24 and the side wall of the storage portion 24, and a plurality of air outlets 28 are opened at predetermined intervals on the upper surface of the lid body 26. Further, an eaves portion 30 protrudes downward from the lower surface of the lid body 26. As shown in FIGS. 1 and 2, the eaves portion 30 protrudes along the four peripheral portions of the lower surface of the lid body 26 so as to fit inside the wall of the storage portion 24.

貯留部24の開口部内壁と、この内壁に嵌合するひさし部30との距離(隙間)は、0.5mm以下とすることが望ましい。こうすることで、ひさし部と貯留部の間での蓋体の天井面で、蒸着材料が液化することを防止することができる。   The distance (gap) between the inner wall of the opening of the reservoir 24 and the eaves 30 fitted to the inner wall is preferably 0.5 mm or less. By carrying out like this, it can prevent that a vapor deposition material liquefies on the ceiling surface of the cover body between an eaves part and a storage part.

尚、蒸着材料の融解温度と昇華温度(蒸着温度)との差が大きい場合に、本実施形態は特に効果を奏する。融解温度と昇華温度との差が150℃以上ある場合には、本実施形態は必須となる。例えば蒸着材料の融点は200℃より小さく、蒸着温度は350℃を超える。   The present embodiment is particularly effective when the difference between the melting temperature of the vapor deposition material and the sublimation temperature (vapor deposition temperature) is large. This embodiment is essential when the difference between the melting temperature and the sublimation temperature is 150 ° C. or more. For example, the melting point of the vapor deposition material is smaller than 200 ° C., and the vapor deposition temperature exceeds 350 ° C.

蓋体26の内側は、コーティング材によってコーティングされ、有機材料が染み込まない構造となっている。このコーティング材としては、例えばBN(ボーンナイトライド)やSiC(シリコンカーバイド)が好適である。   The inside of the lid body 26 is coated with a coating material and has a structure that does not soak organic materials. As this coating material, for example, BN (bone nitride) or SiC (silicon carbide) is suitable.

なお、貯留部24の内側も石英ガラスで構成するのでなく、このコーティング材をコーティングしても良い。   In addition, the inside of the storage part 24 may not be comprised with quartz glass, but you may coat this coating material.

この坩堝22であると、ヒータ25により有機材料が加熱され、昇華して気体となると吹出口28から吹出す。この場合に、蓋体26の下面、すなわち、天井面に一部の有機材料がトラップし結露して液化した場合に、図1及び図2に示すように、液化した有機材料が蓋体26の天井面、ひさし部30を伝わって貯留部24の内壁に至り液体状の有機材料に戻る。   In the case of the crucible 22, the organic material is heated by the heater 25 and sublimates into a gas to be blown out from the outlet 28. In this case, when a part of the organic material is trapped and condensed on the lower surface of the lid 26, that is, the ceiling surface, the liquefied organic material is removed from the lid 26 as shown in FIGS. It travels through the ceiling surface and the eaves part 30 to reach the inner wall of the storage part 24 and returns to the liquid organic material.

そのため、従来のように貯留部24と蓋体26との間に流れ込むことがなく坩堝22の外側に有機材料が漏れ出すことがない。   Therefore, the organic material does not leak out of the crucible 22 without flowing between the storage portion 24 and the lid body 26 as in the prior art.

(第2の実施形態)
上記実施形態では、基板10を固定し、坩堝22を移動させたが、これに代えて坩堝22を固定し、基板10を移動させてもよい。
(Second Embodiment)
In the above embodiment, the substrate 10 is fixed and the crucible 22 is moved. Alternatively, the crucible 22 may be fixed and the substrate 10 may be moved.

この場合には、基板10を直線移動させるだけでなく、基板10の下面中央部に坩堝22を配し、基板10をその中心で回転させて、真空蒸着を行なってもよい。   In this case, not only the substrate 10 may be moved linearly, but also the crucible 22 may be arranged at the center of the lower surface of the substrate 10 and the substrate 10 may be rotated at the center to perform vacuum deposition.

本発明の第1の実施形態の側方から見た縦断面図である。It is the longitudinal cross-sectional view seen from the side of the 1st Embodiment of this invention. 同じく正面から見た坩堝の縦断面図である。It is the longitudinal cross-sectional view of the crucible similarly seen from the front. 真空蒸着装置の斜視図である。It is a perspective view of a vacuum evaporation system. 従来の坩堝の縦断面図である。It is a longitudinal cross-sectional view of the conventional crucible.

符号の説明Explanation of symbols

10 坩堝
12 貯留部
14 蓋体
28 吹出口
30 ひさし部
10 crucible 12 storage part 14 lid 28 outlet 30 eaves part

Claims (14)

筐体と、
前記筐体内に配置され、蒸着材料を貯留するための貯留部と、前記貯留部の上面に配置され、前記蒸着材料を出射する吹出口を備えた蓋体と、を有する坩堝と、
前記坩堝を加熱する加熱手段とを有し、
前記蓋体は前記貯留部の開口部内壁に嵌合するひさし部を備えた
ことを特徴とする蒸着装置。
A housing,
A crucible having a storage part for storing a vapor deposition material, and a lid provided on the upper surface of the storage part and provided with an outlet for emitting the vapor deposition material;
Heating means for heating the crucible,
The said cover was provided with the eaves part fitted to the opening inner wall of the said storage part. The vapor deposition apparatus characterized by the above-mentioned.
前記蒸着装置は、被蒸着部材を保持する保持機構を備えた
ことを特徴とする請求項1記載の蒸着装置。
The vapor deposition apparatus according to claim 1, wherein the vapor deposition apparatus includes a holding mechanism that holds a member to be vapor-deposited.
前記蒸着装置は、前記被蒸着部材に対し相対移動可能な移動手段を有している
ことを特徴とする請求項2記載の蒸着装置。
The vapor deposition apparatus according to claim 2, wherein the vapor deposition apparatus includes moving means that can move relative to the vapor deposition target member.
前記坩堝は、前記被蒸着部材の移動方向に直交する方向を長手方向とする直方体の箱形である
ことを特徴とする請求項3記載の蒸着装置。
The vapor deposition apparatus according to claim 3, wherein the crucible has a rectangular parallelepiped box shape whose longitudinal direction is a direction orthogonal to a moving direction of the vapor deposition target member.
前記吹出口は、前記長手方向に開口した長方形形状である
ことを特徴とする請求項4記載の蒸着装置。
The said blower outlet is a rectangular shape opened in the said longitudinal direction. The vapor deposition apparatus of Claim 4 characterized by the above-mentioned.
前記吹出口は、前記長手方向に配列した複数の開口を有する
ことを特徴とする請求項4記載の蒸着装置。
The vapor deposition apparatus according to claim 4, wherein the air outlet has a plurality of openings arranged in the longitudinal direction.
前記開口部内壁と、前記開口部内壁に嵌合する前記ひさし部との距離は0.5mm以下である
ことを特徴とする請求項1記載の蒸着装置。
The vapor deposition apparatus according to claim 1, wherein a distance between the inner wall of the opening and the eaves part fitted to the inner wall of the opening is 0.5 mm or less.
前記蒸着材料は、前記加熱手段により融解した後、昇華して出射する
ことを特徴とする請求項1記載の蒸着装置。
The vapor deposition apparatus according to claim 1, wherein the vapor deposition material is melted by the heating unit and then sublimated and emitted.
前記蒸着材料の融解温度と昇華温度との差は150℃以上である
ことを特徴とする請求項8記載の蒸着装置。
The vapor deposition apparatus according to claim 8, wherein a difference between a melting temperature and a sublimation temperature of the vapor deposition material is 150 ° C. or more.
前記蒸着材料は有機材料であることを特徴とする請求項1記載の蒸着装置。   The vapor deposition apparatus according to claim 1, wherein the vapor deposition material is an organic material. 前記被蒸着部材は、有機EL装置に用いる基板であることを特徴とする請求項2記載の蒸着装置。   The vapor deposition apparatus according to claim 2, wherein the vapor deposition member is a substrate used in an organic EL device. 前記坩堝が、カーボン、または、グラファイトにより形成され、前記有機材料が接触する内側は石英ガラスより形成されている
ことを特徴とする請求項1記載の蒸着装置。
The vapor deposition apparatus according to claim 1, wherein the crucible is formed of carbon or graphite, and an inner side where the organic material is in contact is formed of quartz glass.
前記坩堝が、カーボン、または、グラファイトにより形成され、前記有機材料が接触する内側は、BN(ボーンナイトライド)、または、SiC(シリコンカーバイド)によってコーティングされていることを特徴とする請求項1記載の蒸着装置。   2. The crucible is formed of carbon or graphite, and an inner side with which the organic material is in contact is coated with BN (bone nitride) or SiC (silicon carbide). Vapor deposition equipment. 前記坩堝が、金属により形成されていることを特徴とする請求項1記載の蒸着装置。
The vapor deposition apparatus according to claim 1, wherein the crucible is made of metal.
JP2005036981A 2005-02-14 2005-02-14 Vapor deposition system Pending JP2006219755A (en)

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Cited By (1)

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Publication number Priority date Publication date Assignee Title
CN103643206A (en) * 2012-11-29 2014-03-19 光驰科技(上海)有限公司 Vacuum plating source and vacuum evaporation method using the same

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JPS63293157A (en) * 1987-05-25 1988-11-30 Fuji Photo Film Co Ltd Boat for vapor deposition
JPH02270959A (en) * 1989-04-13 1990-11-06 Matsushita Electric Ind Co Ltd Crucible for vaporizing source
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103643206A (en) * 2012-11-29 2014-03-19 光驰科技(上海)有限公司 Vacuum plating source and vacuum evaporation method using the same
CN103643206B (en) * 2012-11-29 2016-08-31 光驰科技(上海)有限公司 Vacuum evaporation source and use the vacuum deposition method in this vacuum evaporation source

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