JP2006156420A5 - - Google Patents

Claims (13)

A method for producing an electroluminescent element formed by patterning at least a buffer layer and a light emitting layer among organic electroluminescent layers constituting an electroluminescent element using a photolithography method,
  By patterning a buffer layer that is insoluble in a solvent used for forming a photoresist layer, a photoresist stripping solution, and a light emitting layer with a photoresist that is insoluble in the solvent used for forming the buffer layer, a patterned buffer layer is obtained. Forming, and
  A light emitting layer that is insoluble in a photoresist solvent, a photoresist developer, and a photoresist stripper is patterned using a photoresist that is insoluble in the solvent used for forming the light emitting layer, thereby forming a pattern on the patterned buffer layer. And a step of forming a patterned light-emitting layer. 2. The electroluminescent device according to claim 1, wherein the step of forming the patterned buffer layer includes a step of patterning the buffer layer using a photoresist and then peeling the photoresist. 3. Device manufacturing method. The method for producing an electroluminescent device according to claim 1, wherein the solvent used for forming the light emitting layer is a poor solvent for the buffer layer already formed. 4. The electro of claim 3, wherein the solvent used for forming the light emitting layer has a solubility in an already formed buffer layer of 0.001 (g / g solvent) or less at 25 ° C. and 1 atm. 5. Manufacturing method of luminescent element. The electroluminescent layer according to any one of claims 1 to 4, wherein the light emitting layer is a light emitting layer formed by forming different types of light emitting layers by a photolithography method multiple times. A method for manufacturing a nescent element. 6. The method of manufacturing an electroluminescent element according to claim 5, wherein the light emitting layers are three types of light emitting layers that emit red, green, and blue light. A method for producing an electroluminescent element formed by patterning at least a buffer layer and a light emitting layer among organic electroluminescent layers constituting an electroluminescent element using a photolithography method,
  Form a buffer layer that is insoluble in the photoresist solvent, the photoresist stripping solution, and the solvent used for forming the light emitting layer, and then insoluble in the photoresist solvent, the photoresist developer, and the photoresist stripping solution on the buffer layer A method for producing an electroluminescent device, comprising: forming a light emitting layer and simultaneously patterning the buffer layer and the light emitting layer using a photoresist that is insoluble in a solvent used for forming the buffer layer. In the patterning using the photolithography method, a photoresist is coated on the buffer layer and / or the light emitting layer to be patterned, exposed, and developed to pattern the photoresist, and then the dry etching is used to form the photoresist. 8. The method of manufacturing an electroluminescent element according to claim 1, wherein the patterning is performed by removing the removed buffer layer and / or light emitting layer. . The method for manufacturing an electroluminescent element according to claim 8, wherein the dry etching is reactive ion etching. 9. The method of manufacturing an electroluminescent element according to claim 8, wherein oxygen or a gas containing oxygen is used for the dry etching. The method for manufacturing an electroluminescent device according to claim 8, wherein atmospheric pressure plasma is used for the dry etching. In the patterning using the photolithography method, a photoresist is coated on the buffer layer and / or the light emitting layer to be patterned, exposed, and developed to pattern the photoresist. 11. The method of manufacturing an electroluminescent device according to claim 1, wherein the patterning is performed by removing the removed buffer layer and / or light emitting layer . The electroluminescent device according to any one of claims 1 to 12, wherein the second electrode layer is formed after patterning the light emitting layer or the buffer layer and the light emitting layer. Manufacturing method.