JP2006144029A - Resin board having hydrophilic or water-repellent film - Google Patents

Resin board having hydrophilic or water-repellent film Download PDF

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JP2006144029A
JP2006144029A JP2006057073A JP2006057073A JP2006144029A JP 2006144029 A JP2006144029 A JP 2006144029A JP 2006057073 A JP2006057073 A JP 2006057073A JP 2006057073 A JP2006057073 A JP 2006057073A JP 2006144029 A JP2006144029 A JP 2006144029A
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hydrophilic
film
hydrophilic film
water
weight
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Hiroshi Sasaki
洋 佐々木
Tomoji Oishi
知司 大石
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Hitachi Ltd
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<P>PROBLEM TO BE SOLVED: To provide a resin board having hydrophilic or water-repellent film that can be formed with high hardness even on the surface of a resin having low heat resistance. <P>SOLUTION: The hydrophilic film is formed on a resin and is formed of an inorganic oxide. The hydrophilic film has voids with a size in the range of 20-200 nm. The hydrophilic film with high hardness and increased abrasion resistance compared with hydrophilic films without voids can be obtained. Too large rate of voids must be avoided since it decreases the strength of the film. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は樹脂上に形成される親水膜,撥水膜に関する。   The present invention relates to a hydrophilic film and a water-repellent film formed on a resin.

汚れの容易な除去,防曇,塗料の濡れ性改善,接着性,密着性の改善のため樹脂表面を親水化する試みが行われている。   Attempts have been made to make the resin surface hydrophilic for easy removal of dirt, anti-fogging, improvement of paint wettability, adhesion and adhesion.

従来の技術として、酸化チタン粒子を含んだ塗膜を形成する方法(例えば特許文献1参照)や、コロイダルシリカ等の親水材料を含んだ塗膜を形成する方法(例えば特許文献2参照)が開示されている。   As conventional techniques, a method of forming a coating film containing titanium oxide particles (see, for example, Patent Document 1) and a method of forming a coating film including a hydrophilic material such as colloidal silica (see, for example, Patent Document 2) are disclosed. Has been.

なおこれら塗膜の硬化には熱硬化が一般的に用いられている。これはシリカゾルやアクリルアミドといったバインダーとしての材料を加熱により重合しバインダーとしての機能を発揮させるためである。   In general, thermal curing is used for curing these coating films. This is because a material as a binder such as silica sol or acrylamide is polymerized by heating to exhibit a function as a binder.

国際公開第96/29375号パンフレットInternational Publication No. 96/29375 Pamphlet 特開平8−80474号公報JP-A-8-80474

上述のシリカゾルの場合、加熱温度として300℃〜500℃が理想的ではあるが160℃位でも鉛筆硬度で2H程度の塗膜が形成できる。   In the case of the above-mentioned silica sol, the heating temperature is ideally 300 to 500 ° C., but a coating film having a pencil hardness of about 2H can be formed even at about 160 ° C.

しかしながら、熱可塑性のアクリルやポリカーボネートといった樹脂の場合は加熱温度がそれぞれ100℃以上或いは120℃以上になると形状が変形してしまう。従って熱効果温度を低くする必要があるが、低すぎると硬度が極めて低い塗膜しか形成できない。   However, in the case of a resin such as thermoplastic acrylic or polycarbonate, the shape is deformed when the heating temperature is 100 ° C. or higher or 120 ° C. or higher, respectively. Therefore, it is necessary to lower the heat effect temperature, but if it is too low, only a coating film with extremely low hardness can be formed.

また一方で、汚れ付着防止,水滴付着防止等のため樹脂表面を撥水化するため含フッ素化合物で樹脂表面を被覆する方法が検討されており、撥水化したい部分のみ処理できる点で末端にアルコキシシラン残基を有する含フッ素化合物が有効である。   On the other hand, a method of coating the resin surface with a fluorine-containing compound to make the resin surface water-repellent to prevent dirt adhesion, water droplet adhesion, etc. has been studied. A fluorine-containing compound having an alkoxysilane residue is effective.

しかしながら、アルコキシシラン残基は表面の水酸基と反応し化学結合を形成するので、樹脂表面に水酸基がないアクリルやポリカーボネートといった樹脂の場合は、シリカゾルを原料とする酸化ケイ素被膜を形成し、その上へ末端にアルコキシシラン残基を有する含フッ素化合物を塗布後加熱して酸化ケイ素表面にある水酸基と化学結合を形成させる方法が有効である。この場合も、酸化ケイ素被膜を形成する際の熱硬化温度が低いため硬度の低い撥水膜しか形成できない。   However, since the alkoxysilane residue reacts with the hydroxyl group on the surface to form a chemical bond, in the case of a resin such as acrylic or polycarbonate that does not have a hydroxyl group on the resin surface, a silicon oxide film using silica sol as a raw material is formed on the resin. A method is effective in which a fluorine-containing compound having an alkoxysilane residue at the terminal is applied and then heated to form a chemical bond with a hydroxyl group on the silicon oxide surface. Also in this case, only the water-repellent film having low hardness can be formed because the thermosetting temperature when forming the silicon oxide film is low.

以上、本発明の目的は、耐熱温度が低い樹脂に対しても表面に高硬度の親水膜或いは撥水膜を形成することにある。   As described above, an object of the present invention is to form a high-hardness hydrophilic film or water-repellent film on the surface of a resin having a low heat-resistant temperature.

上記目的を達成するための一手段として、本発明では、親水膜を有する樹脂板であって、前記親水膜は前記樹脂板上に形成され、前記親水膜上には撥水膜が形成され、前記親水膜は20nm以上200nm以下の大きさの空隙を有し、前記撥水膜は下記構造の材料を含んで形成されることを特徴とする樹脂板の構成をとる。   As a means for achieving the above object, in the present invention, a resin plate having a hydrophilic film, the hydrophilic film is formed on the resin plate, and a water repellent film is formed on the hydrophilic film, The hydrophilic film has a void having a size of 20 nm or more and 200 nm or less, and the water-repellent film is formed by including a material having the following structure.

Figure 2006144029
Figure 2006144029

また、親水膜を有する樹脂板であって、前記親水膜は前記樹脂板上に形成され、前記親水膜上には撥水膜が形成され、前記親水膜は20nm以上200nm以下の大きさの空隙を有し、前記撥水膜は下記構造の材料を含んで形成されることを特徴とする樹脂板の構成をとる。   Also, a resin plate having a hydrophilic film, wherein the hydrophilic film is formed on the resin plate, a water-repellent film is formed on the hydrophilic film, and the hydrophilic film has a gap of 20 nm to 200 nm in size. And the water-repellent film is formed by including a material having the following structure.

Figure 2006144029
Figure 2006144029

また、前記親水膜は酸化ケイ素で形成されることを特徴とする樹脂板の構成、前記空隙の体積の割合は前記親水膜の体積全体の2%以上14%以下であることを特徴とする樹脂板の構成をとる。   Further, the resin film is characterized in that the hydrophilic film is formed of silicon oxide, and the volume ratio of the voids is 2% or more and 14% or less of the entire volume of the hydrophilic film. Take the board configuration.

更に、前記親水膜は少なくともシリカゾルとコロイダルシリカとを混合した液体を塗布することで、前記樹脂板上に形成されることを特徴とする樹脂板の構成をとる。   Further, the hydrophilic film is formed on the resin plate by applying a liquid in which at least silica sol and colloidal silica are mixed.

以上により耐熱温度が低い樹脂に対しても表面に高硬度の親水膜或いは撥水膜を形成することができる。   As described above, a highly rigid hydrophilic film or water-repellent film can be formed on the surface of a resin having a low heat-resistant temperature.

まず本発明の概要を説明する。但し、発明の主旨を超えない限り、本発明は具体例に限定されるものではない。   First, the outline of the present invention will be described. However, the present invention is not limited to specific examples as long as the gist of the invention is not exceeded.

図1は本発明に係る樹脂の断面写真であり、樹脂上に親水膜が施されている。図1に記載される樹脂はアクリル樹脂板であり、樹脂上には親水膜が、更にその親水膜上にはカーボンが形成されている。なおここでカーボンは測定における断面のサンプルを作成するためにのみ形成したものであり、存在していなくても本発明の効果を奏する。   FIG. 1 is a cross-sectional photograph of a resin according to the present invention, in which a hydrophilic film is provided on the resin. The resin described in FIG. 1 is an acrylic resin plate, and a hydrophilic film is formed on the resin, and carbon is further formed on the hydrophilic film. Here, carbon is formed only for preparing a sample of a cross section in the measurement, and even if it does not exist, the effect of the present invention is exhibited.

また、親水膜厚さは約200nmであり、親水膜表面に近いところに島状の領域があることが分かる。そこでこの島状の領域、島状の領域以外の領域のそれぞれにおける元素の存在強度について測定した。この結果を図2に示す。   Further, the hydrophilic film thickness is about 200 nm, and it can be seen that there is an island-like region near the hydrophilic film surface. Therefore, the existence strength of the element in each of the island-like region and the region other than the island-like region was measured. The result is shown in FIG.

図2の結果、島状の領域の炭素,酸素,ケイ素等の存在強度が島状の領域以外の領域に比べて明らかに小さいことがわかる。即ち、島状の領域は空隙であり、島状の領域以外の領域は親水膜である、ということが判断できる。このような空隙を有する親水膜は、空隙の無い親水膜に比べて高硬度であり、耐擦性を向上する役割を果たしていると考えられる。但し、空隙の割合も大きすぎると膜の強度を低下させてしまうことに注意する必要がある。   As a result of FIG. 2, it can be seen that the existence intensity of carbon, oxygen, silicon, and the like in the island-shaped region is clearly smaller than the regions other than the island-shaped region. That is, it can be determined that the island-shaped region is a void and the region other than the island-shaped region is a hydrophilic film. A hydrophilic film having such voids has a higher hardness than a hydrophilic film without voids, and is considered to play a role of improving abrasion resistance. However, it should be noted that if the void ratio is too large, the strength of the film is reduced.

この空隙を含む親水膜を有する樹脂は、樹脂板に親水膜を形成するための塗料(親水塗料)を塗布し、速やかに樹脂板及び塗膜を加熱することで形成することができる。これは加熱により塗膜の表面近傍が速やかに硬化する一方、その後塗膜内部の塗料由来の溶媒が揮発する際、表面近傍の硬化した塗膜を透過できず、空隙を形成したものと考えられる。よって塗料を塗布前の処理,塗布後の硬化条件を適切に行うことで所望の親水膜を形成できる。   The resin having a hydrophilic film including voids can be formed by applying a paint (hydrophilic paint) for forming a hydrophilic film on the resin plate and quickly heating the resin plate and the coating film. This is thought to be due to the fact that the surface near the surface of the coating was rapidly cured by heating, but when the solvent derived from the paint inside the coating was subsequently volatilized, the cured coating near the surface could not be transmitted and voids were formed. . Therefore, a desired hydrophilic film can be formed by appropriately performing the treatment before coating the coating and the curing conditions after coating.

なお本発明に係る撥水膜は上記の親水膜の上に含フッ素化合物からなる単分子層を形成することで作製可能である。含フッ素化合物は単分子層であるため、膜の強度は下地となる親水膜によって決まってくる。また撥水膜自身に潤滑性があるので耐擦性が向上し、親水膜より鉛筆硬度が向上する傾向にある。   The water-repellent film according to the present invention can be produced by forming a monomolecular layer made of a fluorine-containing compound on the hydrophilic film. Since the fluorine-containing compound is a monomolecular layer, the strength of the film is determined by the underlying hydrophilic film. Further, since the water-repellent film itself has lubricity, the abrasion resistance is improved, and the pencil hardness tends to be improved as compared with the hydrophilic film.

以下に本発明の実施の形態について説明する。   Embodiments of the present invention will be described below.

[1]親水膜
(1)親水膜の形成方法
本発明に係る親水膜は、樹脂に親水膜を形成するための塗料(親水塗料)を塗布し、この親水塗膜を加熱し熱硬化させることで形成できる。以下詳細を説明する。
[1] Hydrophilic film (1) Method for forming hydrophilic film The hydrophilic film according to the present invention is obtained by applying a paint (hydrophilic paint) for forming a hydrophilic film on a resin, and heating and heating the hydrophilic coating film. Can be formed. Details will be described below.

まず樹脂に紫外光照射、或いは酸素プラズマ照射,酸素プラズマ雰囲気に放置,オゾン雰囲気に放置等することで樹脂表面の濡れ性を向上させる。紫外光照射は高圧水銀ランプや超高圧水銀ランプでも可能であるが、DeepUVランプ,低圧水銀ランプ等のように、254nmや185nmといったオゾンを生成しやすい紫外光を照射するランプが効果的である。また、樹脂が平板の場合は紫外光照射或いは酸素プラズマ照射が、凹凸構造が多い場合は酸素プラズマ雰囲気或いはオゾン雰囲気下に放置することが有効である。なおこの処理において、樹脂がアクリル樹脂の場合、処理前95°前後である水との接触角が処理後
50°以下となるよう条件を設定する。ポリカーボネート,PMMA等の場合も処理後
50°以下にするよう条件を設定する。またポリエチレン,ポリプロピレン等のハイドロカーボン系樹脂の場合、アクリル等に比べて条件をきつくする必要があるが、処理前80〜90°前後である水との接触角を処理後70度以下にするよう条件を設定する。
First, the wettability of the resin surface is improved by irradiating the resin with ultraviolet light, oxygen plasma irradiation, leaving it in an oxygen plasma atmosphere, or leaving it in an ozone atmosphere. Ultraviolet light irradiation can be performed with a high-pressure mercury lamp or an ultra-high pressure mercury lamp, but a lamp that irradiates ultraviolet light, such as DeepUV lamp and low-pressure mercury lamp, which easily generates ozone such as 254 nm is effective. In addition, when the resin is a flat plate, it is effective to perform irradiation with ultraviolet light or oxygen plasma, and when there are many uneven structures, it is effective to leave the resin in an oxygen plasma atmosphere or an ozone atmosphere. In this process, when the resin is an acrylic resin, conditions are set so that the contact angle with water, which is around 95 ° before the process, is 50 ° or less after the process. In the case of polycarbonate, PMMA, etc., conditions are set so as to be 50 ° or less after the treatment. In the case of hydrocarbon resins such as polyethylene and polypropylene, conditions need to be tighter than acrylic, but the contact angle with water that is around 80 to 90 ° before treatment should be 70 degrees or less after treatment. Set conditions.

紫外光照射の際、樹脂板の加熱を併用することで親水塗料塗布・熱硬化後で形成される親水膜の硬度を飛躍的に向上させることが可能である。加熱の温度は樹脂の熱変形温度の近傍(具体的には熱変形温度±20℃)に設定するとよい。例えば熱変形温度100℃の樹脂の場合は80℃〜120℃、熱変形温度が110℃の樹脂の場合は90℃〜130℃というように設定する。これにより、操作を行わなかった場合は鉛筆硬度2B以下の親水膜しか形成できなかったものが、この操作を行うことにより数Hの硬度の親水膜を形成することが可能となる。なお本明細書で記述する熱変形温度とは所定の大きさに成形した板(縦×横×厚さ=100mm×100mm×5mm)が加熱によりそりを発生する温度と定義する。なおその際の加熱時間は30分である。つまり、たとえ熱変形温度より加熱温度が高い場合でも、加熱時間を短くすることで変形を生じさせずに処理が可能となる。   When ultraviolet rays are irradiated, it is possible to drastically improve the hardness of the hydrophilic film formed after the application of the hydrophilic paint and thermal curing by using heating of the resin plate in combination. The heating temperature may be set in the vicinity of the heat deformation temperature of the resin (specifically, the heat deformation temperature ± 20 ° C.). For example, in the case of a resin having a heat deformation temperature of 100 ° C., the temperature is set to 80 ° C. to 120 ° C., and in the case of a resin having a heat deformation temperature of 110 ° C., 90 ° C. to 130 ° C. As a result, when the operation is not performed, only a hydrophilic film having a pencil hardness of 2B or less can be formed. By performing this operation, a hydrophilic film having a hardness of several H can be formed. The thermal deformation temperature described in this specification is defined as a temperature at which a plate (length × width × thickness = 100 mm × 100 mm × 5 mm) formed into a predetermined size generates warpage upon heating. In addition, the heating time in that case is 30 minutes. That is, even when the heating temperature is higher than the thermal deformation temperature, the processing can be performed without causing deformation by shortening the heating time.

次に親水塗料を塗布する。塗布の方法としてはディップコート,スピンコート,スプレーコート,バーコーターでの塗布等通常の塗布方法を用いることができる。   Next, a hydrophilic paint is applied. As a coating method, a normal coating method such as dip coating, spin coating, spray coating, or coating with a bar coater can be used.

最後に加熱する。この温度は樹脂の熱変形温度未満にすることが必要である。また硬化の際、塗膜表面を速やかに硬化温度で加熱する。これにより親水膜中に空隙が形成しやすくなる。   Finally heat. This temperature needs to be lower than the heat distortion temperature of the resin. In curing, the surface of the coating film is rapidly heated at the curing temperature. This facilitates the formation of voids in the hydrophilic film.

(2)親水塗料
親水塗料は親水材料,親水材料を保持するための保持体材料、及び溶媒から構成される。
(2) Hydrophilic paint The hydrophilic paint comprises a hydrophilic material, a holding material for holding the hydrophilic material, and a solvent.

(a)親水材料
親水材料としてはポリエチレングリコールやポリビニルアルコール等の有機高分子材料や親水性アルミナ粒子や親水性シリカ粒子といった無機の材料が挙げられる。この中で長期間水に浸漬しても溶け出さないものが親水性を長く保てるという点で親水性アルミナ粒子や親水性シリカ粒子といった無機の材料が優れている(これら無機の材料は無機酸化物となる)。またこれら無機の微粒子は水に分散されている場合が多く、その場合塗料として水の含有率が増えるため基材表面に塗布した後乾燥する際に水の含有率が増え、結果として基材表面で弾かれる可能性が出てくる。これは水の表面張力が72mN/mと汎用の有機溶媒に比べて大きいためである。そのため分散する溶媒は水よりもアルコール,エチルメチルケトン等の表面張力が20〜30mN/mと言った小さなものを使った方が製膜性に優れる。本発明で用いる親水材料としてはアルコールエチルメチルケトン等の有機溶媒に分散できる点で親水性シリカ粒子が特に好ましい。具体的には日産化学製コロイダルシリカIPA−ST,MEK−ST等が挙げられる。
(A) Hydrophilic material Examples of the hydrophilic material include organic polymer materials such as polyethylene glycol and polyvinyl alcohol, and inorganic materials such as hydrophilic alumina particles and hydrophilic silica particles. Among these, inorganic materials such as hydrophilic alumina particles and hydrophilic silica particles are superior in that those that do not dissolve even when immersed in water for a long period of time can maintain a long hydrophilicity (these inorganic materials are inorganic oxides). Become). In addition, these inorganic fine particles are often dispersed in water. In this case, the water content increases as a paint, so the water content increases when it is applied to the substrate surface and then dried, resulting in the substrate surface There is a possibility of being played. This is because the surface tension of water is 72 mN / m, which is larger than that of general-purpose organic solvents. For this reason, it is better to use a solvent having a small surface tension of 20 to 30 mN / m, such as alcohol and ethyl methyl ketone, than water. As the hydrophilic material used in the present invention, hydrophilic silica particles are particularly preferable in that they can be dispersed in an organic solvent such as alcohol ethyl methyl ketone. Specific examples include colloidal silica IPA-ST and MEK-ST manufactured by Nissan Chemical.

(b)保持体材料
保持体材料としてはポリエチレングリコールやポリビニルアルコール等の有機高分子材料やアクリルアミドのように加熱により重合し保持体となる有機材料,シリカゾルのように加熱により無機の保持体となる材料等が挙げられる。この中で長期間水に浸漬しても溶け出さないものが親水性を長く保てるという点でアクリルアミド,シリカゾル等の材料が優れている。また上記親水材料を保持する際の相性もあり、無機の親水材料にはシリカゾルが特に好適である。
(B) Retainer material The retainer material is an organic polymer material such as polyethylene glycol or polyvinyl alcohol, an organic material that is polymerized by heating, such as acrylamide, or an inorganic retainer, by heating, such as silica sol. Materials and the like. Among these, materials such as acrylamide and silica sol are superior in that those that do not dissolve even when immersed in water for a long period of time can maintain a long hydrophilicity. In addition, there is compatibility when holding the hydrophilic material, and silica sol is particularly suitable for the inorganic hydrophilic material.

シリカゾルはアルコキシシランを希塩酸,希硝酸、或いは希リン酸で酸性となった水中、或いは水−アルコール混合液中で加熱することにより自己重合し分子量数千になったもののことである。アルコキシシランとしてはメチルトリメトキシシラン,エチルトリメトキシシラン,ブチルトリメトキシシラン,テトラメトキシシラン,テトラエトキシシラン等が挙げられる。なお液性や溶媒が合えばアルコキシシランの代わりにアルコキシチタンを用いても良い。アルコキシチタンとしてはテトラ−i−プロピルチタネート,テトラ−n−ブチルチタネート,テトラステアリルチタネート,トリエタノールアミンチタネート,チタニウムアセチルアセトネート,チタニウムエチルアセトアセテート,チタニウムラクテート,テトラオクチレングリコールチタネート等が挙げられる。またこれらの化合物が数分子重合したものも用いることが可能である。   Silica sol is a product of self-polymerization of molecular weight of several thousand by heating alkoxysilane in water acidified with dilute hydrochloric acid, dilute nitric acid, or dilute phosphoric acid, or in a water-alcohol mixture. Examples of the alkoxysilane include methyltrimethoxysilane, ethyltrimethoxysilane, butyltrimethoxysilane, tetramethoxysilane, and tetraethoxysilane. Note that alkoxy titanium may be used instead of alkoxy silane as long as the liquidity and the solvent match. Examples of the alkoxytitanium include tetra-i-propyl titanate, tetra-n-butyl titanate, tetrastearyl titanate, triethanolamine titanate, titanium acetylacetonate, titanium ethyl acetoacetate, titanium lactate, and tetraoctylene glycol titanate. Further, those obtained by polymerizing several compounds of these compounds can also be used.

ところで、シリカゾルの代わりにアミノ基を有するアルコキシシランを用いても上記シリカゾルと同様の保持性能を発揮することができる。しかも酸性のガスの雰囲気に晒すことでアミノ基がアンモニウム塩構造に変化し、結果として膜の親水性を更に向上させることも可能である。このような材料としてはN−(2−アミノエチル)−3−アミノプロピルメチルジメトキシシラン(商品名としては例えばチッソ(株)製サイラエースS310),3−アミノプロピルトリエトキシシラン(商品名としては例えばチッソ(株)製サイラエースS330),3−アミノプロピルトリメトキシシラン(商品名としては例えばチッソ(株)製サイラエースS360)等が挙げられる。またS320やS330等の数分子重合した化合物であるチッソ(株)製サイラエースオリゴマーMS3201やMS3301等も挙げられる。   By the way, even if an alkoxysilane having an amino group is used instead of the silica sol, the same holding performance as that of the silica sol can be exhibited. In addition, when exposed to an acidic gas atmosphere, the amino group changes to an ammonium salt structure, and as a result, the hydrophilicity of the film can be further improved. As such a material, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane (trade name is, for example, Silaace S310 manufactured by Chisso Corporation), 3-aminopropyltriethoxysilane (trade name is, for example, CHISSO Co., Ltd. Silaace S330), 3-aminopropyltrimethoxysilane (trade names include, for example, Chisso Corporation Silaace S360), and the like. Further, examples include Silaace oligomer MS3201 and MS3301 manufactured by Chisso Corporation, which are compounds obtained by polymerizing several molecules such as S320 and S330.

(c)溶媒
溶媒は親水材料や保持体材料との相性(分散性,相溶性)の良いものであり、熱硬化の際、容易に揮発するものが望ましい。特に親水膜中に空隙を形成するためには溶媒の沸点は熱硬化温度よりも低いものが望まれる。上記親水材料のうち、耐久性が高く好ましい材料である親水性アルミナ粒子や親水性シリカ粒子をよく分散するという点ではアルコール系の溶媒が好適である。保持体材料として好適なシリカゾルとの相溶性が高いという点でもアルコール系の溶媒が好適である。また樹脂の耐熱性を考えると、アクリルは100℃以下、ポリカーボネートは120℃以下が熱硬化温度となる。アルコール系で沸点が100℃以下のものとしてはメタノール,エタノール,n−プロパノール,イソプロパノールが挙げられる。なおn−プロパノールに比べて高沸点のn−ブタノール等の溶媒を用いると、空隙率が大きくなりすぎ、硬度が低下する傾向がある。親水膜の鉛筆硬度を2H以上とするには空隙率を親水膜に対する体積割合で2〜14%が望ましい。
(C) Solvent The solvent has good compatibility (dispersibility and compatibility) with the hydrophilic material and the support material, and it is desirable that the solvent volatilizes easily during thermosetting. In particular, in order to form voids in the hydrophilic film, it is desirable that the boiling point of the solvent is lower than the thermosetting temperature. Among the hydrophilic materials, alcohol-based solvents are preferable in that hydrophilic alumina particles and hydrophilic silica particles, which are highly durable and preferable materials, are well dispersed. Alcohol solvents are also preferred because they are highly compatible with silica sols that are suitable as support materials. Considering the heat resistance of the resin, the thermosetting temperature is 100 ° C. or lower for acrylic and 120 ° C. or lower for polycarbonate. Examples of alcohols having a boiling point of 100 ° C. or lower include methanol, ethanol, n-propanol, and isopropanol. When a solvent such as n-butanol having a higher boiling point than n-propanol is used, the porosity tends to be too large and the hardness tends to decrease. In order to make the pencil hardness of the hydrophilic film 2H or more, the porosity is desirably 2 to 14% in terms of volume ratio with respect to the hydrophilic film.

(d)潤滑材
表面の潤滑性を向上し、結果的に耐擦性を向上させる方法もある。シリコーン系の潤滑材を固形分の0.01〜0.5重量%程度含有させることで潤滑性が向上し、結果として耐擦性も向上する。ただし固形分の2%以上添加すると表面の親水性が低下する傾向がある。シリコーン系の潤滑材は親水膜を作製する際用いる塗料の溶媒に溶解することが望ましいが、溶解しなくても攪拌すればある程度の時間ほぼ均一に分散しているものも用いることができる。それらの具体例としてはBYK−Chemie社製のBYK−370,BYK−
310等が挙げられる。
(D) Lubricant There is also a method of improving the lubricity of the surface and consequently improving the abrasion resistance. Lubricating property is improved by adding about 0.01 to 0.5% by weight of a solid lubricant, and as a result, abrasion resistance is also improved. However, if 2% or more of the solid content is added, the hydrophilicity of the surface tends to decrease. The silicone-based lubricant is desirably dissolved in the solvent of the coating material used for producing the hydrophilic film, but it is also possible to use a silicone lubricant that is substantially uniformly dispersed for a certain period of time if it is not dissolved. Specific examples thereof include BYK-370 and BYK- manufactured by BYK-Chemie.
310 etc. are mentioned.

[2]撥水膜
本発明に係る撥水膜は下記含フッ素化合物によって形成される。
[2] Water-repellent film The water-repellent film according to the present invention is formed of the following fluorine-containing compound.

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これら化合物は末端がアルコキシシラン残基になっているので処理可能な表面はガラスや金属、或いは水酸基を有する樹脂の表面である。そのため樹脂表面に形成する際はあらかじめ樹脂表面に金属を蒸着したり、シリカゾル等でSiO2 の皮膜を形成しておく必要がある。本発明の親水膜の表面は親水性を発揮させるための水酸基が通常のガラスや金属に比べて多いので上記含フッ素化合物の衆力率が向上し撥水性が高まるので好ましい。そこで本発明の撥水膜形成方法を本発明の親水膜の上に形成する方法で説明する。 Since these compounds have alkoxysilane residues at their ends, the surface that can be treated is glass, metal, or the surface of a resin having a hydroxyl group. Therefore, when forming on the resin surface, it is necessary to deposit a metal on the resin surface in advance or form a SiO 2 film with silica sol or the like. Since the surface of the hydrophilic film of the present invention has more hydroxyl groups for exerting hydrophilicity than ordinary glass or metal, it is preferable because the power factor of the fluorine-containing compound is improved and the water repellency is increased. Therefore, the method for forming the water-repellent film of the present invention will be described as a method of forming on the hydrophilic film of the present invention.

(1)撥水膜形成方法
本発明の撥水膜形成は上記含フッ素化合物を含有する塗料(以後撥水塗料と記述)を塗布後加熱することにより形成する。加熱はアルコキシシラン残基が表面とSi−Oの結合を形成するのに必要な条件であり、通常120℃では10分間、100℃では30分間、90℃では1時間程度である。常温でも進行するがかなりの時間を要する。
(1) Method for forming water-repellent film The water-repellent film of the present invention is formed by applying a paint containing the above-mentioned fluorine-containing compound (hereinafter referred to as a water-repellent paint) and then heating it. Heating is a condition necessary for the alkoxysilane residue to form a Si—O bond with the surface, and is usually about 10 minutes at 120 ° C., 30 minutes at 100 ° C., and about 1 hour at 90 ° C. Although it proceeds at room temperature, it takes a considerable amount of time.

(2)撥水塗料
本発明の撥水膜を形成するために用いる塗料は上記含フッ素化合物をフッ素系の溶媒に0.01〜0.5重量%溶解したものである。濃度は平均分子量の大きい含フッ素化合物ほど高濃度に設定する。平均分子量が3000前後では濃度は0.03〜0.3重量%程度が好ましい。
(2) Water-repellent paint The paint used to form the water-repellent film of the present invention is obtained by dissolving 0.01 to 0.5% by weight of the fluorine-containing compound in a fluorine-based solvent. The concentration is set higher for the fluorine-containing compound having a larger average molecular weight. When the average molecular weight is around 3000, the concentration is preferably about 0.03 to 0.3% by weight.

撥水塗料の塗布はハケ塗り,ディップコート法,スピンコート法等を用いる。   The water-repellent paint is applied by brush coating, dip coating, spin coating or the like.

(a)含フッ素化合物
上記含フッ素化合物としては具体的には以下の化合物1〜12があげられる。
(A) Fluorine-containing compound Specific examples of the fluorine-containing compound include the following compounds 1 to 12.

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このうち化合物1〜8は以下に示す合成方法を実行することで得られる。化合物9〜
12は化合物名がそれぞれ1H,1H,2H,2H−パーフルオロオクチルトリメトキシシラン、1H,1H,2H,2H−パーフルオロオクチルトリエトキシシラン、1H,
1H,2H,2H−パーフルオロデシルトリメトキシシラン、1H,1H,2H,2H−パーフルオロデシルトリエトキシシランとしてヒドラス化学社より上市されている。またその他の市販材料としてはダイキン工業社製オプツールDSXが挙げられる。また化合物1〜4はフッ素鎖がパーフルオロポリエーテルと呼ばれるものであり、このフッ素鎖を有する化合物から形成される撥水膜は水以外にエンジンオイルやガソリン等に長期(1000時間)にわたって浸漬しても撥水性が殆ど低下しない(低下量は5°以下)という特徴がある。これら化合物を一般式で表すと以下のようになる。
Among these, the compounds 1-8 are obtained by performing the synthesis method shown below. Compound 9 ~
12 are compound names 1H, 1H, 2H, 2H-perfluorooctyltrimethoxysilane, 1H, 1H, 2H, 2H-perfluorooctyltriethoxysilane, 1H,
1H, 2H, 2H-perfluorodecyltrimethoxysilane and 1H, 1H, 2H, 2H-perfluorodecyltriethoxysilane are marketed by Hydras Chemical. Another commercially available material is Daikin Industries, Ltd. OPTOOL DSX. Compounds 1-4 are those whose fluorine chains are called perfluoropolyether, and the water-repellent film formed from this compound having fluorine chains is immersed in engine oil, gasoline, etc. for a long time (1000 hours) in addition to water. However, the water repellency hardly decreases (the amount of decrease is 5 ° or less). These compounds are represented by the following general formula.

Figure 2006144029
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化合物5〜12はエンジンオイルやガソリンに長期(1000時間)にわたって浸漬すると、水との接触角が浸漬前(約110℃)から基材の接触角とほぼ同じレベルまで低下する。   When the compounds 5 to 12 are immersed in engine oil or gasoline for a long period (1000 hours), the contact angle with water decreases from before the immersion (about 110 ° C.) to almost the same level as the contact angle of the substrate.

(化合物1の合成)
デュポン社製クライトックス157FS−L(平均分子量2500)(25重量部)を3M社製PF−5080(100重量部)に溶解し、これに塩化チオニル(20重量部)を加え、攪拌しながら48時間還流する。塩化チオニルとPF−5080をエバポレーターで揮発させクライトックス157FS−Lの酸クロライド(25重量部)を得る。これにPF−5080(100重量部),チッソ(株)製サイラエースS330(3重量部),トリエチルアミン(3重量部)を加え、室温で20時間攪拌する。反応液を昭和化学工業製ラジオライト ファインフローAでろ過し、ろ液中のPF−5080をエバポレーターで揮発させ、化合物1(20重量部)を得た。
(Synthesis of Compound 1)
DuPont Krytox 157FS-L (average molecular weight 2500) (25 parts by weight) was dissolved in 3M PF-5080 (100 parts by weight), thionyl chloride (20 parts by weight) was added thereto, and the mixture was stirred for 48. Reflux for hours. Thionyl chloride and PF-5080 are volatilized with an evaporator to obtain acid chloride (25 parts by weight) of Krytox 157FS-L. PF-5080 (100 parts by weight), Silaace S330 (3 parts by weight) manufactured by Chisso Corporation, and triethylamine (3 parts by weight) are added to this and stirred at room temperature for 20 hours. The reaction solution was filtered with Radiolight Fine Flow A manufactured by Showa Chemical Industry, and PF-5080 in the filtrate was volatilized with an evaporator to obtain Compound 1 (20 parts by weight).

(化合物2の合成)
チッソ(株)製サイラエースS330(3重量部)の代わりにチッソ(株)製サイラエースS360(3重量部)を用いる以外は化合物1の合成と同様にして化合物2(20重量部)を得た。
(Synthesis of Compound 2)
Compound 2 (20 parts by weight) was obtained in the same manner as in the synthesis of Compound 1 except that Chisso Co., Ltd. Silaace S330 (3 parts by weight) was used instead of Chisso Co., Ltd. Silaace S360 (3 parts by weight).

(化合物3の合成)
デュポン社製クライトックス157FS−L(平均分子量2500)(25重量部)の代わりにダイキン工業社製デムナムSH(平均分子量3500)(35重量部)を用いる以外は化合物1の合成と同様にして化合物3(30重量部)を得た。
(Synthesis of Compound 3)
Compound similar to the synthesis of Compound 1 except that Daikin Industries' demnum SH (average molecular weight 3500) (35 parts by weight) is used instead of DuPont Krytox 157FS-L (average molecular weight 2500) (25 parts by weight) 3 (30 parts by weight) was obtained.

(化合物4の合成)
チッソ(株)製サイラエースS330(3重量部)の代わりにチッソ(株)製サイラエースS360を用い、デュポン社製クライトックス157FS−L(平均分子量2500)(25重量部)の代わりにダイキン工業社製デムナムSH(平均分子量3500)(35重量部)を用いる以外は化合物1の合成と同様にして化合物4(30重量部)を得た。
(Synthesis of Compound 4)
Instead of Chisso Corporation Silaace S330 (3 parts by weight), Chisso Corporation Silaace S360 was used, and DuPont's Krytox 157FS-L (average molecular weight 2500) (25 parts by weight) was made by Daikin Industries, Ltd. Compound 4 (30 parts by weight) was obtained in the same manner as in the synthesis of Compound 1, except that demnam SH (average molecular weight 3500) (35 parts by weight) was used.

(化合物5の合成)
デュポン社製クライトックス157FS−L(平均分子量2500)(25重量部)の代わりにダイキン工業社製7H−ドデカフルオロヘプタン酸(分子量346.06) (3.5重量部) を用いる以外は化合物1の合成と同様にして化合物5(3.5重量部)を得た。
(Synthesis of Compound 5)
Compound 1 except that 7H-dodecafluoroheptanoic acid (molecular weight 346.06) (3.5 parts by weight) manufactured by Daikin Industries, Ltd. was used instead of DuPont's Krytox 157FS-L (average molecular weight 2500) (25 parts by weight) In the same manner as in the synthesis of Compound 5 (3.5 parts by weight) was obtained.

(化合物6の合成)
デュポン社製クライトックス157FS−L(平均分子量2500)(25重量部)の代わりにダイキン工業社製7H−ドデカフルオロヘプタン酸(分子量346.06) (3.5重量部) を用い、チッソ(株)製サイラエースS310(2重量部)の代わりにチッソ
(株)製サイラエースS320(2重量部)を用いる以外は化合物1の合成と同様にして化合物6(3.5重量部)を得た。
(Synthesis of Compound 6)
Chisso Co., Ltd. was used instead of DuPont's Krytox 157FS-L (average molecular weight 2500) (25 parts by weight) 7K-dodecafluoroheptanoic acid (molecular weight 346.006) (3.5 parts by weight) manufactured by Daikin Industries, Ltd. ) Compound 6 (3.5 parts by weight) was obtained in the same manner as in the synthesis of Compound 1, except that Chisso Corporation Silaace S320 (2 parts by weight) was used instead of Silaace S310 (2 parts by weight).

(化合物7の合成)
デュポン社製クライトックス157FS−L(平均分子量2500)(25重量部)の代わりにダイキン工業社製9H−ヘキサデカフルオロノナン酸(分子量446.07)
(4.5重量部)を用いる以外は化合物1の合成と同様にして化合物7(4.5重量部)を得た。
(Synthesis of Compound 7)
Daikin Industries, Ltd. 9H-hexadecafluorononanoic acid (molecular weight 446.07) instead of DuPont's Krytox 157FS-L (average molecular weight 2500) (25 parts by weight)
Compound 7 (4.5 parts by weight) was obtained in the same manner as in the synthesis of Compound 1 except that (4.5 parts by weight) was used.

(化合物8の合成)
デュポン社製クライトックス157FS−L(平均分子量200)(25重量部)の代わりにダイキン工業社製9H−ヘキサデカフルオロノナンサン(分子量446.07)
(4.5重量部)を用い、チッソ(株)製サイラエースS310(2重量部)の代わりにチッソ(株)製サイラエースS320(2重量部)を用いる以外は化合物1の合成と同様にして化合物8(4.5重量部)を得た。
(Synthesis of Compound 8)
Daikin Industries, Ltd. 9H-hexadecafluorononansan (molecular weight 446.07) instead of DuPont Krytox 157FS-L (average molecular weight 200) (25 parts by weight)
(4.5 parts by weight) and the same method as in the synthesis of Compound 1 except that Chisso Corp. Silaace S310 (2 parts by weight) is used instead of Chisso Corp. Silaace S310 (2 parts by weight). 8 (4.5 parts by weight) was obtained.

(b)溶媒
上記含フッ素化合物を溶解するフッ素系の溶媒として具体的には3M社のFC−72,FC−77,PF−5060,PF−5080,HFE7100,HFE7200,デュポン社製バートレルXFが挙げられる。
(B) Solvent Specific examples of the fluorine-based solvent for dissolving the above-mentioned fluorine-containing compound include 3M FC-72, FC-77, PF-5060, PF-5080, HFE7100, HFE7200, and DuPont Vertrel XF. It is done.

[3]用途
本発明の親水膜,撥水膜を形成した樹脂の用途としては、自動車・トラック等の車両用窓、或いは家屋,ビル等の窓等が考えられる。従来のガラスに比べて軽く、しかも形状の自由度が高いため、ガラスでは困難であったデザインの窓を装着できる。しかも割れにくいため、安全面でも有効である。
[3] Applications As applications of the resin having the hydrophilic film and the water-repellent film of the present invention, there can be considered vehicle windows for automobiles and trucks, windows for houses and buildings, and the like. Because it is lighter than conventional glass and has a high degree of freedom in shape, it can be fitted with windows that are difficult to design with glass. Moreover, since it is hard to break, it is also effective in terms of safety.

以下、実施例により本発明を更に具体的に説明するが、本発明の範囲はこれらの実施例に限定されるものではない。   EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples. However, the scope of the present invention is not limited to these examples.

初めにアクリル板への親水膜作成方法を示す。   First, a method for creating a hydrophilic film on an acrylic plate will be described.

(1)親水塗料塗布の前処理
縦100mm,横100mm,厚さ5mmの透明なアクリル板(アズワン社製)を90℃に加熱したホットプレート上においた後、速やかに低圧水銀ランプで紫外光を照射した。照射光量は10mW、照射時間は5分間である(90℃に加熱する時間も5分間ということになる)。これにより紫外光照射を受けたアクリル板表面の水との接触角が30°以下となった。なお紫外光照射前のアクリル板表面の水との接触角は90〜95°であった。また用いたアクリル板の熱変形温度は100℃であった。
(1) Pretreatment of applying hydrophilic paint After placing a transparent acrylic plate (manufactured by AS ONE) 100mm long, 100mm wide and 5mm thick on a hot plate heated to 90 ° C, quickly irradiate ultraviolet light with a low-pressure mercury lamp. Irradiated. The amount of irradiation light is 10 mW, and the irradiation time is 5 minutes (the time for heating to 90 ° C. is also 5 minutes). Thereby, the contact angle with the water of the acrylic board surface which received ultraviolet light irradiation became 30 degrees or less. In addition, the contact angle with the water of the acrylic board surface before ultraviolet light irradiation was 90-95 degrees. Moreover, the heat deformation temperature of the used acrylic board was 100 degreeC.

(2)親水処理
シリカゾル溶液(リン酸酸性,溶媒は水:エタノール=2:8、固定文は6重量%)
(1重量部),酸化ケイ素からなるコロイダルシリカ(日産化学性IPA−ST,固形分は30重量%)(2重量部),エタノール(15重量部)を混合することで親水塗料が調整される。
(2) Hydrophilic treatment Silica sol solution (acidic phosphate, solvent is water: ethanol = 2: 8, fixed sentence is 6% by weight)
(1 part by weight), colloidal silica composed of silicon oxide (Nissan Chemical IPA-ST, solid content is 30% by weight) (2 parts by weight), and ethanol (15 parts by weight) are mixed to adjust the hydrophilic coating. .

この塗料を紫外光照射を受けた上記アクリル板にスピンコートで塗布する。なおスピンコート条件は回転数1200rpm ,回転時間25秒間である。塗布された塗料は目視ではアクリル板状にほぼ均一に広がった。   This paint is applied by spin coating to the acrylic plate which has been irradiated with ultraviolet light. The spin coating conditions are a rotation speed of 1200 rpm and a rotation time of 25 seconds. The applied paint spread almost uniformly in an acrylic plate shape by visual observation.

(3)熱硬化
スピンコート後、速やかにアクリル板を100℃に制御した恒温槽中にいれ、10分間加熱する。これによりシリカゾルがSiO2(無機酸化物)に変化し、熱硬化が完了する。こうして表面に親水膜の形成されたアクリル板が完成する。
(3) Thermosetting After spin coating, the acrylic plate is immediately placed in a thermostat controlled at 100 ° C. and heated for 10 minutes. Thereby, the silica sol is changed to SiO 2 (inorganic oxide), and the thermosetting is completed. Thus, an acrylic plate having a hydrophilic film formed on the surface is completed.

(4)評価実験
親水膜の水との接触角を測定したところ15〜28°であった。また親水膜の鉛筆硬度は2Hであった。
(4) Evaluation experiment When the contact angle of the hydrophilic film with water was measured, it was 15 to 28 °. The pencil hardness of the hydrophilic film was 2H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積の9〜11%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. From the cross-sectional photograph, the void was 9 to 11% of the volume of the hydrophilic film.

親水膜塗量調整時、エタノール(15重量部)の代わりにメタノール(15重量部)を用いる以外は実施例1と同様にしてアクリル板の上に親水膜を形成した。   A hydrophilic film was formed on the acrylic plate in the same manner as in Example 1 except that methanol (15 parts by weight) was used instead of ethanol (15 parts by weight) when adjusting the hydrophilic film coating amount.

この膜の水との接触角を測定したところ15〜28°であった。また親水膜の鉛筆硬度は3Hであった。   When the contact angle of this membrane with water was measured, it was 15 to 28 °. The pencil hardness of the hydrophilic film was 3H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の3〜5%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. The space | gap was 3 to 5% of the whole volume of the hydrophilic film | membrane from the cross-sectional photograph.

親水塗料調整時、エタノール(15重量部)の代わりにn−プロパノール(15重量部)を用いる以外は実施例1と同様にしてアクリル板の上に親水膜を形成した。   A hydrophilic film was formed on the acrylic plate in the same manner as in Example 1 except that n-propanol (15 parts by weight) was used instead of ethanol (15 parts by weight) when preparing the hydrophilic paint.

この膜の水との接触角を測定したところ15〜28°であった。また親水膜の鉛筆硬度は2Hであった。   When the contact angle of this membrane with water was measured, it was 15 to 28 °. The pencil hardness of the hydrophilic film was 2H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の12〜14%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. From the cross-sectional photograph, the gap was 12 to 14% of the entire volume of the hydrophilic film.

親水塗料調整時、エタノール(15重量部)の代わりにn−ブタノール(15重量部)を用いる以外は実施例1と同様にしてアクリル板の上に親水膜を形成した。   A hydrophilic film was formed on the acrylic plate in the same manner as in Example 1 except that n-butanol (15 parts by weight) was used in place of ethanol (15 parts by weight) at the time of preparing the hydrophilic paint.

この膜の水との接触角を測定したところ15〜28°であった。また親水膜の鉛筆硬度はHであった。   When the contact angle of this membrane with water was measured, it was 15 to 28 °. The pencil hardness of the hydrophilic film was H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の15〜18%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. From the cross-sectional photograph, the gap was 15 to 18% of the entire volume of the hydrophilic film.

実施例1〜4より空隙率は14%以下の場合に親水膜の硬度が2H以上になることが示された。   From Examples 1 to 4, it was shown that when the porosity is 14% or less, the hardness of the hydrophilic film is 2H or more.

アクリル板の代わりに同じ大きさ・厚さのポリカーボネート板(藤本科学製)を用いる以外は実施例1と同様にして親水膜を形成した。なお用いたポリカーボネート板の熱変形温度は110℃であった。   A hydrophilic film was formed in the same manner as in Example 1 except that a polycarbonate plate (manufactured by Kagaku Fujimoto) having the same size and thickness was used instead of the acrylic plate. The heat distortion temperature of the polycarbonate plate used was 110 ° C.

この膜の水との接触角を測定したところ15〜28°であった。また親水膜の鉛筆硬度は2Hであった。   When the contact angle of this membrane with water was measured, it was 15 to 28 °. The pencil hardness of the hydrophilic film was 2H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の9〜11%であった。このことから樹脂がアクリルからポリカーボネートに変わっても同様の特性の親水膜を形成できることが示された。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. From the cross-sectional photograph, the gap was 9 to 11% of the entire volume of the hydrophilic film. This indicates that a hydrophilic film having similar characteristics can be formed even when the resin is changed from acrylic to polycarbonate.

熱硬化の際、100℃に制御した恒温槽中に入れる前に80℃のホットプレート上に5分間放置する操作を追加する以外は実施例1と同様にして親水膜を形成した。   A hydrophilic film was formed in the same manner as in Example 1 except that an operation of leaving on a hot plate at 80 ° C. for 5 minutes was added before thermosetting at 100 ° C.

この膜の水との接触角を測定したところ15〜27°であった。また親水膜の鉛筆硬度は2Hであった。親水膜の断面を調べたところ、大きさが20〜100nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の2〜3%であった。   When the contact angle of this membrane with water was measured, it was 15 to 27 °. The pencil hardness of the hydrophilic film was 2H. When the cross section of the hydrophilic film was examined, voids having a size of 20 to 100 nm were confirmed. From the cross-sectional photograph, the gap was 2 to 3% of the entire volume of the hydrophilic film.

親水塗料調整時、エタノール(15重量部)の代わりにメタノール(15重量部)を用い、熱硬化の際、100℃に制御した恒温槽中に入れる前に80℃のホットプレート上に5分放置する操作を追加する以外は実施例1と同様にして親水膜を形成した。   When preparing the hydrophilic paint, methanol (15 parts by weight) is used instead of ethanol (15 parts by weight), and at the time of thermosetting, it is left on a hot plate at 80 ° C. for 5 minutes before being placed in a thermostat controlled at 100 ° C. A hydrophilic film was formed in the same manner as in Example 1 except for adding the operation.

この膜の水との接触角を測定したところ15〜27°であった。また親水膜の鉛筆硬度はHであった。   When the contact angle of this membrane with water was measured, it was 15 to 27 °. The pencil hardness of the hydrophilic film was H.

親水膜の断面を調べたところ、大きさが20〜50nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の0.6〜0.8%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 50 nm were confirmed. From the cross-sectional photograph, the voids were 0.6 to 0.8% of the entire volume of the hydrophilic film.

実施例5〜7より空隙率は2%以上の場合に親水膜の硬度が2H以上になることが示された。また実施例1〜7より空隙率は2%以上で、且つ、14%以下の場合に親水膜の硬度が2H以上になることが示された。   From Examples 5 to 7, it was shown that when the porosity is 2% or more, the hardness of the hydrophilic film is 2H or more. Further, Examples 1 to 7 show that the hardness of the hydrophilic film is 2H or more when the porosity is 2% or more and 14% or less.

親水塗料調整時、シリコーン系添加剤(BYK−Chemie社製 BYK−370)
(0.006重量部)を追加する以外は実施例1と同様にして親水膜を形成した。
At the time of hydrophilic paint adjustment, silicone-based additive (BYK-Chemie BYK-370)
A hydrophilic film was formed in the same manner as in Example 1 except that (0.006 parts by weight) was added.

この膜の水との接触角を測定したところ20〜26°であった。また親水膜の鉛筆硬度は3Hであった。   When the contact angle of this membrane with water was measured, it was 20 to 26 °. The pencil hardness of the hydrophilic film was 3H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の9〜11%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. From the cross-sectional photograph, the gap was 9 to 11% of the entire volume of the hydrophilic film.

親水塗料調整時、シリコーン系添加剤(BYK−Chemie社製 BYK−310)
(0.006重量部)を追加する以外は実施例1と同様にして親水膜を形成した。
At the time of hydrophilic paint adjustment, silicone-based additive (BYK-Chemie, BYK-310)
A hydrophilic film was formed in the same manner as in Example 1 except that (0.006 parts by weight) was added.

この膜の水との接触角を測定したところ20〜27°であった。また親水膜の鉛筆硬度は3Hであった。   When the contact angle of this membrane with water was measured, it was 20 to 27 °. The pencil hardness of the hydrophilic film was 3H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の9〜11%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. From the cross-sectional photograph, the gap was 9 to 11% of the entire volume of the hydrophilic film.

次に親水膜の耐擦性を調べるためトラバース試験を行った。試験は#40のビロード布を被らせた摺動子に荷重100gをかけながら1000回(往復)ずつ表面を目視でチェックしながら最大5000回往復させる条件で行った。調べた親水膜は実施例1,8,9で作製したものである。その結果、実施例1で作製した親水膜は1000回摺動後、表面に膜のはく離に伴う傷が確認された。しかし実施例8,9で作製した親水膜は5000回摺動後、水との接触角が25〜29°であった。実施例1で作製した親水膜は傷の影響があるため接触角は再現性のある値が得られなかった。   Next, a traverse test was performed in order to examine the abrasion resistance of the hydrophilic film. The test was performed under the condition of reciprocating up to 5000 times while visually checking the surface 1000 times (reciprocating) while applying a load of 100 g to a slider covered with a # 40 velvet cloth. The examined hydrophilic membranes are those produced in Examples 1, 8, and 9. As a result, the hydrophilic film produced in Example 1 was confirmed to be scratched due to film peeling on the surface after sliding 1000 times. However, the hydrophilic films prepared in Examples 8 and 9 had a contact angle with water of 25 to 29 ° after sliding 5000 times. Since the hydrophilic film produced in Example 1 was affected by scratches, a reproducible value of the contact angle was not obtained.

実施例8,9よりシリコーン系添加物を加えることで親水塗膜は耐擦性が大幅に向上することが示された。   From Examples 8 and 9, it was shown that the abrasion resistance of the hydrophilic coating film was greatly improved by adding a silicone additive.

親水塗料調整時、コロイダルシリカ(日産化学製IPA−ST)(2重量部)の代わりに親水性アルミナ(日産化学製No.520)(2重量部)を用いる以外は実施例1と同様にして親水膜を形成した。   Except for using colloidal silica (Nissan Chemical IPA-ST) (2 parts by weight), hydrophilic alumina (Nissan Chemical No. 520) (2 parts by weight) instead of colloidal silica (2 parts by weight), the same procedure as in Example 1 was performed. A hydrophilic film was formed.

この膜の水との接触角を測定したところ18〜26°であった。また親水膜の鉛筆硬度は2Hであった。   When the contact angle of this membrane with water was measured, it was 18 to 26 °. The pencil hardness of the hydrophilic film was 2H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の11〜13%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. From the cross-sectional photograph, the gap was 11 to 13% of the entire volume of the hydrophilic film.

しかし形成された親水膜は不透明であった。実施例1〜8で作製された親水膜の400nm,500nm,600nm,700nmの光の透過率は何れも90%以上であった
(可視領域の波長は400〜700nmであるからこの4つの波長での光の透過率は膜の透明性を調べる指標になる)。
However, the formed hydrophilic film was opaque. The light transmittances of 400 nm, 500 nm, 600 nm, and 700 nm of the hydrophilic films prepared in Examples 1 to 8 were all 90% or more (the wavelength in the visible region is 400 to 700 nm. The light transmittance is an index for examining the transparency of the film).

しかし本実施例で作製された親水膜はいずれの波長でも透過率は70%以下であった。実施例1〜8で作製された親水膜は親水材料として酸化ケイ素からなるコロイダルシリカであったが、本実施例では親水性アルミナを用いている。よって以上より樹脂板の光透過性に影響を与えないという点では親水膜作製には酸化ケイ素からなるコロイダルシリカが好ましいことが示された。   However, the hydrophilic film produced in this example had a transmittance of 70% or less at any wavelength. The hydrophilic films prepared in Examples 1 to 8 were colloidal silica made of silicon oxide as a hydrophilic material, but hydrophilic alumina is used in this example. Therefore, from the above, it was shown that colloidal silica made of silicon oxide is preferable for producing a hydrophilic film in that it does not affect the light transmittance of the resin plate.

〔比較例1〕
親水塗料塗布の前処理時にアクリル板を置くホットプレートを加熱しておかない以外は実施例1と同様の方法でアクリル板上に親水膜を形成した。すなわち親水塗料塗布の前処理時には紫外光照射のみを行った。こうして形成された親水膜の水との接触角を測定したところ15〜28°であった。
[Comparative Example 1]
A hydrophilic film was formed on the acrylic plate in the same manner as in Example 1 except that the hot plate on which the acrylic plate was placed was not heated during the pretreatment of the hydrophilic paint application. That is, only ultraviolet light irradiation was performed at the time of the pretreatment for applying the hydrophilic paint. When the contact angle of the hydrophilic film thus formed with water was measured, it was 15 to 28 °.

しかし親水膜の鉛筆硬度は2Bであった。また断面写真よりその空隙は親水膜の体積全体の17〜20%であった。   However, the pencil hardness of the hydrophilic film was 2B. Moreover, the space | gap was 17 to 20% of the whole volume of the hydrophilic film from the cross-sectional photograph.

実施例1、及び本比較例により、親水塗料塗布の前処理時には紫外光照射と、過熱の処理を併用することで親水膜の硬度が向上することが示された。   According to Example 1 and this comparative example, it was shown that the hardness of the hydrophilic film is improved by using ultraviolet light irradiation and superheating treatment at the time of pretreatment of applying the hydrophilic paint.

本実施例における撥水膜の作成方法、及び評価結果について記述する。   A method for producing a water-repellent film and evaluation results in this example will be described.

まず、実施例1と同様にしてアクリル板上に親水膜を形成する。この板を化合物1の
0.1 重量%のPF−5080溶液に1時間浸漬する。なおPF−5080は3M社製のフッ素系溶媒である。またこの溶液の比重は約1.7 と大きいため単にアクリル板(比重1)は浸漬しようとしても浮かんでしまう。そこで沈める際はあらかじめ両面テープで浸漬槽の底面にアクリル板の角の部分を接着した後、化合物1の0.1 重量%のPF−5080溶液を浸漬槽に注ぐことでアクリル板の浮き上がりを防ぐことができる。
First, a hydrophilic film is formed on an acrylic plate in the same manner as in Example 1. The plate is immersed in a 0.1 wt% PF-5080 solution of Compound 1 for 1 hour. PF-5080 is a fluorine-based solvent manufactured by 3M. Moreover, since the specific gravity of this solution is as large as about 1.7, the acrylic plate (specific gravity 1) simply floats when it is dipped. When sinking, the corner of the acrylic plate is bonded to the bottom of the immersion bath in advance with a double-sided tape, and then a 0.1 wt% PF-5080 solution of Compound 1 is poured into the immersion bath to prevent the acrylic plate from being lifted. be able to.

浸漬後、アクリル板を95℃の恒温槽に1時間放置する。こうすることで化合物1がアクリル板上の親水膜表面の水酸基と化学結合を形成する。   After immersion, the acrylic plate is left in a thermostatic bath at 95 ° C. for 1 hour. In this way, Compound 1 forms a chemical bond with the hydroxyl group on the hydrophilic film surface on the acrylic plate.

1時間加熱した後のアクリル板を恒温槽から取り出し、PF−5080でリンスする。これによりアクリル板上の親水膜と化学結合していない化合物1が除去される。こうしてアクリル板上に撥水膜を形成した。   The acrylic plate after heating for 1 hour is taken out of the thermostat and rinsed with PF-5080. Thereby, the compound 1 which is not chemically bonded to the hydrophilic film on the acrylic plate is removed. Thus, a water repellent film was formed on the acrylic plate.

次に撥水膜の水との接触角を測定したところ113°であった。また撥水膜の鉛筆硬度は3Hであった。   Next, the contact angle of the water repellent film with water was measured to be 113 °. The pencil hardness of the water repellent film was 3H.

化合物1の0.1重量%のPF−5080溶液の代わりに化合物2の0.1重量%のPF−5080溶液を用いる以外は実施例11と同様にしてアクリル板上に撥水膜を形成した。   A water repellent film was formed on an acrylic plate in the same manner as in Example 11 except that a 0.1 wt% PF-5080 solution of compound 2 was used instead of a 0.1 wt% PF-5080 solution of compound 1. .

撥水膜の水との接触角を測定したところ113°であった。また撥水膜の鉛筆硬度は
3Hであった。
The contact angle of the water repellent film with water was measured to be 113 °. The pencil hardness of the water repellent film was 3H.

化合物1の0.1重量%のPF−5080溶液の代わりに化合物3の0.1重量%のPF−5080溶液を用いる以外は実施例11と同様にしてアクリル板上に撥水膜を形成した。   A water repellent film was formed on an acrylic plate in the same manner as in Example 11 except that a 0.1 wt% PF-5080 solution of Compound 3 was used instead of the 0.1 wt% PF-5080 solution of Compound 1 .

撥水膜の水との接触角を測定したところ113°であった。また撥水膜の鉛筆硬度は
3Hであった。
The contact angle of the water repellent film with water was measured to be 113 °. The pencil hardness of the water repellent film was 3H.

化合物1の0.1重量%のPF−5080溶液の代わりに化合物4の0.1重量%のPF−5080溶液を用いる以外は実施例11と同様にしてアクリル板上に撥水膜を形成した。   A water repellent film was formed on an acrylic plate in the same manner as in Example 11 except that a 0.1 wt% PF-5080 solution of Compound 1 was used instead of a 0.1 wt% PF-5080 solution of Compound 1 .

撥水膜の水との接触角を測定したところ113°であった。また撥水膜の鉛筆硬度は
3Hであった。
The contact angle of the water repellent film with water was measured to be 113 °. The pencil hardness of the water repellent film was 3H.

化合物1の0.1重量%のPF−5080溶液の代わりに化合物5の0.05重量%の
PF−5080溶液を用いる以外は実施例11と同様にしてアクリル板上に撥水膜を形成した。
A water repellent film was formed on an acrylic plate in the same manner as in Example 11 except that a 0.05 wt% PF-5080 solution of compound 5 was used instead of a 0.1 wt% PF-5080 solution of compound 1. .

撥水膜の水との接触角を測定したところ105°であった。また撥水膜の鉛筆硬度は
2Hであった。
The contact angle of the water repellent film with water was measured to be 105 °. The pencil hardness of the water repellent film was 2H.

化合物1の0.1重量%のPF−5080溶液の代わりに化合物6の0.05重量%の
PF−5080溶液を用いる以外は実施例11と同様にしてアクリル板上に撥水膜を形成した。
A water repellent film was formed on the acrylic plate in the same manner as in Example 11 except that a 0.05 wt% PF-5080 solution of compound 6 was used instead of a 0.1 wt% PF-5080 solution of compound 1. .

撥水膜の水との接触角を測定したところ105°であった。また撥水膜の鉛筆硬度は
2Hであった。
The contact angle of the water repellent film with water was measured to be 105 °. The pencil hardness of the water repellent film was 2H.

化合物1の0.1重量%のPF−5080溶液の代わりに化合物7の0.05重量%の
PF−5080溶液を用いる以外は実施例11と同様にしてアクリル板上に撥水膜を形成した。
A water repellent film was formed on an acrylic plate in the same manner as in Example 11 except that a 0.05 wt% PF-5080 solution of compound 7 was used instead of a 0.1 wt% PF-5080 solution of compound 1. .

撥水膜の水との接触角を測定したところ107°であった。また撥水膜の鉛筆硬度は
2Hであった。
The contact angle of the water repellent film with water was measured and found to be 107 °. The pencil hardness of the water repellent film was 2H.

化合物1の0.1重量%のPF−5080溶液の代わりに化合物8の0.05重量%の
PF−5080溶液を用いる以外は実施例11と同様にしてアクリル板上に撥水膜を形成した。
A water repellent film was formed on an acrylic plate in the same manner as in Example 11 except that a 0.05 wt% PF-5080 solution of compound 8 was used instead of a 0.1 wt% PF-5080 solution of compound 1. .

撥水膜の水との接触角を測定したところ107°であった。また撥水膜の鉛筆硬度は
2Hであった。
The contact angle of the water repellent film with water was measured and found to be 107 °. The pencil hardness of the water repellent film was 2H.

化合物1の0.1重量%のPF−5080溶液の代わりに化合物9の0.05重量%の
PF−5080溶液を用いる以外は実施例11と同様にしてアクリル板上に撥水膜を形成した。
A water repellent film was formed on an acrylic plate in the same manner as in Example 11 except that a 0.05 wt% PF-5080 solution of compound 9 was used instead of a 0.1 wt% PF-5080 solution of compound 1. .

撥水膜の水との接触角を測定したところ111°であった。また撥水膜の鉛筆硬度は
3Hであった。
The contact angle of the water repellent film with water was measured to be 111 °. The pencil hardness of the water repellent film was 3H.

化合物1の0.1重量%のPF−5080溶液の代わりに化合物10の0.05重量%のPF−5080溶液を用いる以外は実施例11と同様にしてアクリル板上に撥水膜を形成した。   A water repellent film was formed on an acrylic plate in the same manner as in Example 11 except that a 0.05 wt% PF-5080 solution of compound 10 was used instead of a 0.1 wt% PF-5080 solution of compound 1. .

撥水膜の水との接触角を測定したところ112°であった。また撥水膜の鉛筆硬度は
3Hであった。
The contact angle of the water repellent film with water was measured to be 112 °. The pencil hardness of the water repellent film was 3H.

化合物1の0.1重量%のPF−5080溶液の代わりに化合物11の0.05重量%のPF−5080溶液を用いる以外は実施例11と同様にしてアクリル板上に撥水膜を形成した。   A water repellent film was formed on an acrylic plate in the same manner as in Example 11 except that a 0.05 wt% PF-5080 solution of Compound 11 was used instead of a 0.1 wt% PF-5080 solution of Compound 1. .

撥水膜の水との接触角を測定したところ111°であった。また撥水膜の鉛筆硬度は
3Hであった。
The contact angle of the water repellent film with water was measured to be 111 °. The pencil hardness of the water repellent film was 3H.

化合物1の0.1重量%のPF−5080溶液の代わりに化合物12の0.05重量%のPF−5080溶液を用いる以外は実施例11と同様にしてアクリル板上に撥水膜を形成した。   A water repellent film was formed on an acrylic plate in the same manner as in Example 11 except that a 0.05 wt% PF-5080 solution of Compound 12 was used instead of a 0.1 wt% PF-5080 solution of Compound 1. .

撥水膜の水との接触角を測定したところ112°であった。また撥水膜の鉛筆硬度は
3Hであった。
The contact angle of the water repellent film with water was measured to be 112 °. The pencil hardness of the water repellent film was 3H.

実施例1で作製した親水膜の代わりに実施例10で作製した親水膜の上に撥水膜を形成した。即ち親水塗料調整時において、コロイダルシリカ(日産化学製IPA−ST)(2重量部)の代わりに親水性アルミナ(日産化学製No.520)(2重量部)を用いる以外は実施例1と同様にして形成した親水膜を用いた。また撥水膜は実施例11と同様に化合物1の0.1 重量%のPF−5080溶液を用いて、実施例11と同様の方法で作製した。   A water repellent film was formed on the hydrophilic film prepared in Example 10 instead of the hydrophilic film prepared in Example 1. That is, the same as Example 1 except that hydrophilic alumina (Nissan Chemical No. 520) (2 parts by weight) is used instead of colloidal silica (IPA-ST, Nissan Chemical Co., Ltd.) (2 parts by weight) at the time of preparing the hydrophilic paint. The hydrophilic film formed as described above was used. The water-repellent film was prepared in the same manner as in Example 11 using a 0.1 wt% PF-5080 solution of Compound 1 as in Example 11.

作製した撥水膜の水との接触角を測定したところ113°であった。また撥水膜の鉛筆硬度は3Hであった。   The contact angle of the produced water repellent film with water was measured to be 113 °. The pencil hardness of the water repellent film was 3H.

なお形成された撥水膜は不透明であった。これは下地の親水膜が不透明であることによる。   The formed water repellent film was opaque. This is because the underlying hydrophilic film is opaque.

実施例11で作製された撥水膜の400nm,500nm,600nm,700nmの光の透過率は何れも90%以上であったが、本実施例で作製された撥水膜はいずれの波長でも透過率が70%以下であった。実施例11で作製された親水膜は親水材料として酸化ケイ素からなるコロイダルシリカを用いているのに対し、本実施例では親水性を用いているためである。よって以上より樹脂板の光透過性に影響を与えないという点では撥水膜作製には酸化ケイ素からなるコロイダルシリカが好ましいことが示された。   The 400 nm, 500 nm, 600 nm, and 700 nm light transmittances of the water repellent film produced in Example 11 were all 90% or more, but the water repellent film produced in this example was transmissive at any wavelength. The rate was 70% or less. This is because the hydrophilic film produced in Example 11 uses colloidal silica made of silicon oxide as a hydrophilic material, whereas this example uses hydrophilicity. Therefore, from the above, it was shown that colloidal silica made of silicon oxide is preferable for producing a water-repellent film in that it does not affect the light transmittance of the resin plate.

実施例11〜22で作製された撥水膜を形成したアクリル板をオクタン価95のガソリンに100時間浸漬した後に引き上げたところ、実施例11〜14で作製した撥水膜はエタノールを弾いたが、実施例15〜22で作製した撥水膜はエタノールを弾かず濡れてしまった。   When the acrylic plate formed with the water repellent film produced in Examples 11 to 22 was pulled up after being immersed in gasoline having an octane number of 95 for 100 hours, the water repellent film produced in Examples 11 to 14 repelled ethanol. The water-repellent films produced in Examples 15 to 22 were wet without repelling ethanol.

実施例11〜14で用いた含フッ素化合物(化合物1〜4)はパーフルオロポリエーテル鎖を有しているが、実施例15〜22で用いたガンフッ素化合物(化合物5〜12)はパーフルオロポリエーテル鎖を有していない。   The fluorine-containing compounds (Compounds 1 to 4) used in Examples 11 to 14 have perfluoropolyether chains, but the cancer fluorine compounds (Compounds 5 to 12) used in Examples 15 to 22 are perfluoro. Does not have a polyether chain.

Figure 2006144029
Figure 2006144029

以上より含フッ素化合物としてはパーフルオロポリエーテル鎖を有している化合物を用いた撥水膜の方が有機溶媒に対しても弾きやすい膜を形成できることが示された。   From the above, it was shown that a water-repellent film using a compound having a perfluoropolyether chain as a fluorine-containing compound can form a film that can be easily repelled against an organic solvent.

実施例23で作製された撥水膜を形成したアクリル板をオクタン価95のガソリンに
100時間浸漬した後に引き上げたところ、この撥水膜はガソリンを弾いた。ガソリンの代わりにエタノールに100時間浸漬し、引き上げたところ、ガソリンの場合と同様エタノールも弾いた。よって含フッ素化合物としてパーフルオロポリエーテル鎖を有している化合物を用いた撥水膜は下地の親水膜が酸化ケイ素以外の無機の酸化物を含有していても、有機溶媒に対しても弾きやすい膜を形成できることが示された。
When the acrylic plate formed with the water repellent film produced in Example 23 was immersed in gasoline having an octane number of 95 for 100 hours and then pulled up, the water repellent film repelled gasoline. I dipped it in ethanol for 100 hours instead of gasoline and pulled it up. Therefore, a water-repellent film using a compound having a perfluoropolyether chain as a fluorine-containing compound can play against organic solvents even if the underlying hydrophilic film contains an inorganic oxide other than silicon oxide. It was shown that an easy film can be formed.

親水塗料塗布の前処理において、照射光量を55mW、照射時間を1分間、その際のホットプレートの温度を120℃とする以外は実施例1と同様にしてアクリル板の上に親水膜を形成した。   In the pretreatment for applying the hydrophilic paint, a hydrophilic film was formed on the acrylic plate in the same manner as in Example 1 except that the irradiation light amount was 55 mW, the irradiation time was 1 minute, and the temperature of the hot plate was 120 ° C. .

この膜の水との接触角を測定したところ15〜28°であった。また親水膜の鉛筆硬度は2Hであった。   When the contact angle of this membrane with water was measured, it was 15 to 28 °. The pencil hardness of the hydrophilic film was 2H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の3〜5%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. The space | gap was 3 to 5% of the whole volume of the hydrophilic film | membrane from the cross-sectional photograph.

また親水塗料の前処理において、ホットプレートの温度を80℃とする以外は実施例1と同様にしてアクリル板の上に親水膜を形成した。   Further, a hydrophilic film was formed on the acrylic plate in the same manner as in Example 1 except that the temperature of the hot plate was set to 80 ° C. in the pretreatment of the hydrophilic paint.

この膜の水との接触角を測定したところ15〜28°であった。また親水膜の鉛筆硬度は2Hであった。   When the contact angle of this membrane with water was measured, it was 15 to 28 °. The pencil hardness of the hydrophilic film was 2H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の3〜5%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. The space | gap was 3 to 5% of the whole volume of the hydrophilic film | membrane from the cross-sectional photograph.

〔比較例2〕
親水塗料塗布の前処理において、照射光量を55mW、照射時間を1分間、その際のホットプレートの温度を125℃とする以外は実施例1と同様にしてアクリル板の上に親水膜を形成した。
[Comparative Example 2]
In the pretreatment for applying the hydrophilic paint, a hydrophilic film was formed on the acrylic plate in the same manner as in Example 1 except that the irradiation light amount was 55 mW, the irradiation time was 1 minute, and the temperature of the hot plate was 125 ° C. .

この膜の水との接触角を測定したところ15〜28°であった。また親水膜の鉛筆硬度は2Hであった。   When the contact angle of this membrane with water was measured, it was 15 to 28 °. The pencil hardness of the hydrophilic film was 2H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の3〜5%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. The space | gap was 3 to 5% of the whole volume of the hydrophilic film | membrane from the cross-sectional photograph.

しかしアクリル板は親水塗料塗布の前処理に熱変形を起こした。そこで光照射時間を
45秒間にして同様の処理を行ったところアクリル板表面が親水塗料を弾き、均一な塗料塗布ができなかった。そのため形成された親水膜は目視でも塗り斑が確認された。
However, the acrylic plate was thermally deformed during the pretreatment of applying the hydrophilic paint. Therefore, when the same treatment was performed with the light irradiation time being 45 seconds, the surface of the acrylic plate repels the hydrophilic paint, and uniform paint application could not be performed. Therefore, the formed hydrophilic film was visually confirmed to be smeared.

また親水塗料の前処理において、ホットプレートの温度を75℃とする以外は実施例1と同様にしてアクリル板の上に親水膜を形成した。   Further, a hydrophilic film was formed on the acrylic plate in the same manner as in Example 1 except that the temperature of the hot plate was 75 ° C. in the pretreatment of the hydrophilic paint.

この膜の水との接触角を測定したところ15〜28°であった。また親水膜の鉛筆硬度はHBであった。用いたアクリル板の熱変形温度は100℃である。   When the contact angle of this membrane with water was measured, it was 15 to 28 °. The pencil hardness of the hydrophilic film was HB. The heat distortion temperature of the used acrylic board is 100 degreeC.

本比較例と実施例26より、親水塗料塗布の前処理において、樹脂がアクリル板の場合、紫外光照射の際の加熱温度は熱変形温度±20℃とすることが好適であることが示された。   From this comparative example and Example 26, it is shown that when the resin is an acrylic plate in the pretreatment of applying the hydrophilic paint, it is preferable that the heating temperature at the time of ultraviolet light irradiation is the heat distortion temperature ± 20 ° C. It was.

親水塗料塗布の前処理において、照射光量を55mW、照射時間を1分間、その際のホットプレートの温度を130℃とする以外は実施例5と同様にしてポリカーボネート板の上に親水膜を形成した。   In the pretreatment for applying the hydrophilic paint, a hydrophilic film was formed on the polycarbonate plate in the same manner as in Example 5 except that the irradiation light amount was 55 mW, the irradiation time was 1 minute, and the temperature of the hot plate was 130 ° C. .

この膜の水との接触角を測定したところ15〜28°であった。また親水膜の鉛筆硬度は2Hであった。   When the contact angle of this membrane with water was measured, it was 15 to 28 °. The pencil hardness of the hydrophilic film was 2H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の9〜11%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. From the cross-sectional photograph, the gap was 9 to 11% of the entire volume of the hydrophilic film.

〔比較例3〕
親水塗料塗布の前処理において、照射光量を55mW、照射時間を1分間、その際のホットプレートの温度を135℃とする以外は実施例5と同様にしてポリカーボネート板の上に親水膜を形成した。
[Comparative Example 3]
In the pretreatment for applying the hydrophilic paint, a hydrophilic film was formed on the polycarbonate plate in the same manner as in Example 5 except that the irradiation light amount was 55 mW, the irradiation time was 1 minute, and the temperature of the hot plate was 135 ° C. .

この膜の水との接触角を測定したところ15〜28°であった。また親水膜の鉛筆硬度は2Hであった。   When the contact angle of this membrane with water was measured, it was 15 to 28 °. The pencil hardness of the hydrophilic film was 2H.

しかし、ポリカーボネート板は親水塗料塗布の前処理に熱変形を起こした。そこで光照射時間を45秒にして同様の処理を行ったところポリカーボネート板表面が親水塗料を弾き、均一な塗料塗布ができなかった、そのため形成された親水膜は目視でも塗り斑が確認された。   However, the polycarbonate plate was thermally deformed in the pretreatment for applying the hydrophilic paint. Then, when the same treatment was carried out with the light irradiation time being 45 seconds, the surface of the polycarbonate plate repels the hydrophilic paint and the uniform paint could not be applied. Therefore, the formed hydrophilic film was visually confirmed to be smeared.

また親水塗料の前処理において、ホットプレートの温度を85℃とする以外は実施例5と同様にしてポリカーボネート板の上に親水膜を形成した。   Further, a hydrophilic film was formed on the polycarbonate plate in the same manner as in Example 5 except that the temperature of the hot plate was 85 ° C. in the pretreatment of the hydrophilic paint.

この膜の水との接触角を測定したところ15〜28°であった。しかし親水膜の鉛筆硬度はHBであった。用いたポリカーボネート板の熱変形温度は110℃である。   When the contact angle of this membrane with water was measured, it was 15 to 28 °. However, the pencil hardness of the hydrophilic film was HB. The heat distortion temperature of the used polycarbonate plate is 110 ° C.

本比較例と実施例27より、親水塗料塗布の前処理においては紫外光照射の際の加熱温度は熱変形温度±20℃とすることが好適であることが示された。   From this comparative example and Example 27, it was shown that in the pretreatment for applying the hydrophilic paint, it is preferable that the heating temperature at the time of ultraviolet light irradiation is the heat distortion temperature ± 20 ° C.

親水膜塗料調整時、シリカゾル(1重量部)の代わりにアミノ基を有するアルコキシシランの一種であるチッソ社製サイラエースS310(0.1重量部) を用いる以外は実施例1と同様にしてアクリル板の上に親水膜を形成した。なお製膜の際の加熱でサイラエースS310は重合し、アミノ基を有するアルコキシシランの重合体となる。   Acrylic board in the same manner as in Example 1 except that, when preparing the hydrophilic film paint, Silaace S310 (0.1 part by weight) manufactured by Chisso Corporation, which is a kind of alkoxysilane having an amino group, is used instead of silica sol (1 part by weight). A hydrophilic film was formed on the substrate. In addition, Silaace S310 is polymerized by heating during film formation, and becomes a polymer of alkoxysilane having an amino group.

この膜の水との接触角を調べたところ15〜28°であった。また親水膜の鉛筆硬度は2Hであった。   When the contact angle of this membrane with water was examined, it was 15 to 28 °. The pencil hardness of the hydrophilic film was 2H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の3〜5%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. The space | gap was 3 to 5% of the whole volume of the hydrophilic film | membrane from the cross-sectional photograph.

このアクリル板を、底に10重量%の塩酸を100ミリリットル入れた容量10リットルのガラス製デシケーター中に1日放置した。これはこのアクリル板を酸性の雰囲気に放置するのが目的である。デシケーターから取り出したアクリル板を水洗いし、乾燥後、親水膜の水との接触角を測定したところ10〜14°まで低下した。即ち親水膜の親水性が向上した。   This acrylic plate was left in a glass desiccator having a capacity of 10 liters with 100 ml of 10% by weight hydrochloric acid at the bottom for one day. The purpose of this is to leave the acrylic plate in an acidic atmosphere. The acrylic plate taken out from the desiccator was washed with water, dried, and the contact angle of the hydrophilic film with water was measured. That is, the hydrophilicity of the hydrophilic film was improved.

親水膜塗料調整時、シリカゾル(1重量部)の代わりにアミノ基を有するアルコキシシランの一種であるチッソ社製サイラエースS320(0.1重量部)を用いる以外は実施例1と同様にしてアクリル板の上に親水膜を形成した。なお製膜の際の加熱でサイラエースS320は重合し、アミノ基を有するアルコキシシランの重合体となる。   Acrylic plate in the same manner as in Example 1 except that when preparing the hydrophilic film paint, Silaace S320 (0.1 part by weight) manufactured by Chisso Corporation, which is a kind of alkoxysilane having an amino group, is used instead of silica sol (1 part by weight). A hydrophilic film was formed on the substrate. In addition, Silaace S320 is polymerized by heating during film formation, and becomes an alkoxysilane polymer having an amino group.

この膜の水との接触角を調べたところ14〜26°であった。また親水膜の鉛筆硬度は2Hであった。   When the contact angle of this membrane with water was examined, it was 14 to 26 °. The pencil hardness of the hydrophilic film was 2H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の3〜5%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. The space | gap was 3 to 5% of the whole volume of the hydrophilic film | membrane from the cross-sectional photograph.

このアクリル板を、底に10重量%の塩酸を100ミリリットル入れた容量10リットルのガラス製デシケーター中に1日放置した。これはこのアクリル板を酸性の雰囲気に放置するのが目的である。デシケーターから取り出したアクリル板を水洗いし、乾燥後、親水膜の水との接触角を測定したところ10〜14°まで低下した。即ち親水膜の親水性が向上した。   This acrylic plate was left in a glass desiccator having a capacity of 10 liters with 100 ml of 10% by weight hydrochloric acid at the bottom for one day. The purpose of this is to leave the acrylic plate in an acidic atmosphere. The acrylic plate taken out from the desiccator was washed with water, dried, and the contact angle of the hydrophilic film with water was measured. That is, the hydrophilicity of the hydrophilic film was improved.

親水膜塗料調整時、シリカゾル(1重量部)の代わりにアミノ基を有するアルコキシシランの一種であるチッソ社製サイラエースS330(0.1重量部)を用いる以外は実施例1と同様にしてアクリル板の上に親水膜を形成した。なお製膜の際の加熱でサイラエースS330は重合し、アミノ基を有するアルコキシシランの重合体となる。   Acrylic board in the same manner as in Example 1 except that when preparing the hydrophilic film paint, Silaace S330 (0.1 part by weight) manufactured by Chisso Corporation, which is a kind of alkoxysilane having an amino group, is used instead of silica sol (1 part by weight). A hydrophilic film was formed on the substrate. Note that Silaace S330 is polymerized by heating during film formation, and becomes an alkoxysilane polymer having an amino group.

この膜の水との接触角を調べたところ15〜26°であった。また親水膜の鉛筆硬度は2Hであった。   When the contact angle of this membrane with water was examined, it was 15 to 26 °. The pencil hardness of the hydrophilic film was 2H.

親水膜の断面を調べたところ、大きさが20〜200nmの空隙が確認された。断面写真よりその空隙は親水膜の体積全体の3〜5%であった。   When the cross section of the hydrophilic film was examined, voids having a size of 20 to 200 nm were confirmed. The space | gap was 3 to 5% of the whole volume of the hydrophilic film | membrane from the cross-sectional photograph.

このアクリル板を、底に10重量%の塩酸を100ミリリットル入れた容量10リットルのガラス製デシケーター中に1日放置した。これはこのアクリル板を酸性の雰囲気に放置するのが目的である。デシケーターから取り出したアクリル板を水洗いし、乾燥後、親水膜の水との接触角を測定したところ10〜15°まで低下した。即ち親水膜の親水性が向上した。   This acrylic plate was left in a glass desiccator having a capacity of 10 liters with 100 ml of 10% by weight hydrochloric acid at the bottom for one day. The purpose of this is to leave the acrylic plate in an acidic atmosphere. The acrylic plate taken out from the desiccator was washed with water and dried, and when the contact angle of the hydrophilic film with water was measured, it decreased to 10 to 15 °. That is, the hydrophilicity of the hydrophilic film was improved.

実施例28〜30により、膜中にアミノ基を有するアルコキシシラン重合体を有する場合は、酸性雰囲気下に放置することで親水性を向上できることが示された。   Examples 28-30 showed that when the film has an alkoxysilane polymer having an amino group, the hydrophilicity can be improved by leaving it in an acidic atmosphere.

樹脂上に形成される親水膜の断面写真。A cross-sectional photograph of a hydrophilic film formed on a resin. (A)親水膜の島状の領域における元素の存在強度、(B)親水膜の島状の領域以外における元素の存在強度。(A) Intensity of elements in the island-shaped region of the hydrophilic film, (B) Intensity of elements in other than the island-shaped region of the hydrophilic film.

Claims (5)

親水膜を有する樹脂板であって、
前記親水膜は前記樹脂板上に形成され、
前記親水膜上には撥水膜が形成され、
前記親水膜は20nm以上200nm以下の大きさの空隙を有し、
前記撥水膜は下記構造の材料を含んで形成されることを特徴とする樹脂板。
Figure 2006144029
A resin plate having a hydrophilic film,
The hydrophilic film is formed on the resin plate,
A water repellent film is formed on the hydrophilic film,
The hydrophilic film has a void having a size of 20 nm to 200 nm,
The water repellent film is formed by including a material having the following structure.
Figure 2006144029
親水膜を有する樹脂板であって、
前記親水膜は前記樹脂板上に形成され、
前記親水膜上には撥水膜が形成され、
前記親水膜は20nm以上200nm以下の大きさの空隙を有し、
前記撥水膜は下記構造の材料を含んで形成されることを特徴とする樹脂板。
Figure 2006144029
A resin plate having a hydrophilic film,
The hydrophilic film is formed on the resin plate,
A water repellent film is formed on the hydrophilic film,
The hydrophilic film has a void having a size of 20 nm to 200 nm,
The water repellent film is formed by including a material having the following structure.
Figure 2006144029
前記親水膜は酸化ケイ素で形成されることを特徴とする請求項1又は請求項2に記載の樹脂板。   The resin plate according to claim 1, wherein the hydrophilic film is formed of silicon oxide. 前記空隙の体積の割合は前記親水膜の体積全体の2%以上14%以下であることを特徴とする請求項1から請求項3に記載の樹脂板。   The resin plate according to any one of claims 1 to 3, wherein the volume ratio of the voids is 2% or more and 14% or less of the entire volume of the hydrophilic film. 前記親水膜は少なくともシリカゾルとコロイダルシリカとを混合した液体を塗布することで、前記樹脂板上に形成されることを特徴とする請求項1から請求項4に記載の樹脂板。
5. The resin plate according to claim 1, wherein the hydrophilic film is formed on the resin plate by applying a liquid in which at least silica sol and colloidal silica are mixed.
JP2006057073A 2006-03-03 2006-03-03 Resin board having hydrophilic or water-repellent film Ceased JP2006144029A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010515312A (en) * 2007-01-03 2010-05-06 ヴェーデクス・アクティーセルスカプ Hearing aid component and method of making a hearing aid component
US8295522B2 (en) 2006-08-31 2012-10-23 Widex A/S Filter for a hearing aid and a hearing aid

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8295522B2 (en) 2006-08-31 2012-10-23 Widex A/S Filter for a hearing aid and a hearing aid
JP2010515312A (en) * 2007-01-03 2010-05-06 ヴェーデクス・アクティーセルスカプ Hearing aid component and method of making a hearing aid component
US8763238B2 (en) 2007-01-03 2014-07-01 Widex A/S Method of manufacturing a component for a hearing aid

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