JP2006135105A - Supercritical fluid cleaner/dryer - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To facilitate fitting of a container body and a lid constituting a cleaning/drying chamber so that it is suitable for automation. <P>SOLUTION: The supercritical fluid cleaner/dryer comprises a cleaning/drying chamber, a means for supplying cleaning fluid into the cleaning/drying chamber, and a fluid discharge means for discharging unnecessary matters in the cleaning/drying chamber, and performs cleaning and drying of a matter to be cleaned in the cleaning/drying chamber by sustaining supercritical state in the cleaning/drying chamber. The cleaning/drying chamber consists of a container body into which the matter to be cleaned is placed, and a lid being fitted to the opening of the container body wherein a resin alignment ring for aligning the fitting position of the container body and the lid, and a member for sealing the gap are provided at the fitting portion of the container body and the lid. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a supercritical fluid cleaning / drying apparatus.

  In the semiconductor manufacturing field such as the recent IC chip manufacturing process, circuit patterns have become extremely fine, and the influence of contamination by impurities such as trace amounts of metals and organic substances has become a problem. As a solution, a cleaning / drying technique using a supercritical fluid is about to be put into practical use.

  Such a supercritical fluid cleaning / drying apparatus includes a predetermined cleaning / drying processing chamber, and after a fine structure such as a semiconductor wafer is placed in the cleaning / drying processing space of the cleaning / drying processing chamber, The cleaning fluid is supplied from a cleaning fluid cylinder such as a carbon dioxide cylinder containing carbon dioxide in a liquefied state via a pressurizing means such as a pressurizing pump, and the temperature and pressure are adjusted to predetermined values, respectively. Realize a critical state.

  Then, by replacing the liquid solvent or the like adhering to the fine structure in the supercritical state with a cleaning fluid, and then discharging the cleaning fluid to the outside multiple times, the solvent is removed and reliably removed. (See Patent Document 1).

  According to such a configuration, problems such as conventional RCA cleaning, cleaning by various high-frequency and ultrasonic waves, other cleaning methods, and drying methods by spin dryer, laser irradiation, heating, etc., destroy the fine structure. Can be solved.

Japanese Unexamined Patent Publication No. 2003-173997 (Specifications, pages 1 to 5, FIGS. 1 to 3)

However, in the supercritical fluid cleaning / drying apparatus as described above, unlike the liquid phase or gas phase state under normal temperature and normal pressure, in order to bring carbon dioxide (CO ₂ ) into a supercritical state, the temperature is 34 ° C. or higher. Therefore, a high pressure container capable of withstanding this high pressure is required. Moreover, when the apparatus is automated, it is necessary to automatically open and close such a high-pressure vessel, and to store or take out objects to be cleaned / dried, such as semiconductor wafers, A high-pressure vessel with a structure suitable for such automatic opening and closing and an automatic opening and closing mechanism suitable for the same structure are required. It is necessary to solve the problem of particles, metal powders and other fine powders, dusts, etc. generated by direct contact with the surface of the container, and adhering or affecting the object to be cleaned / dried inside the container.

  The present invention has been made based on such circumstances, and the cleaning / drying processing chamber is composed of a container main body into which an object to be cleaned is placed and a lid fitted to the opening of the container main body. By providing a synthetic resin alignment ring that matches the fitting position between the container body and the lid at the fitting part between the main body and the lid, smooth fitting is possible by avoiding contact between metals during opening and closing. It is an object of the present invention to provide a supercritical fluid cleaning / drying apparatus.

  In order to achieve the above object, the present invention is configured with the following problem solving means.

(1) First Problem Solving Means The first problem solving means of the present invention includes a cleaning / drying processing chamber, a cleaning fluid supply means for supplying a cleaning fluid into the cleaning / drying processing chamber, and the cleaning / drying described above. Fluid discharge means for discharging unnecessary substances in the processing chamber, and maintaining the inside of the cleaning / drying processing chamber in a supercritical state, thereby cleaning and drying the object to be cleaned in the cleaning / drying processing chamber. A supercritical fluid cleaning / drying apparatus configured to perform, wherein the cleaning / drying processing chamber includes a container body into which an object to be cleaned is placed, and a lid fitted to an opening of the container body, The fitting portion between the container main body and the lid is provided with a synthetic resin alignment ring that matches the fitting position between the container main body and the lid and a seal member that seals the gap between the fitting portions. With features To have.

  According to such a configuration, when the lid is fitted to the container body opening, the fitting portions are accurately and smoothly guided and aligned by the synthetic resin alignment ring, so that the mutual metal portions are aligned. It can be smoothly fitted to the final fitting position without contacting each other.

(2) Second Problem Solving Means According to the second problem solving means of the present invention, in the configuration of the first problem solving means, the opening peripheral edge of the container body has a predetermined height from the opening surface of the opening. A cylindrical portion that is provided with a raised ridge portion and is provided with an alignment ring on the outer peripheral surface side of the ridge portion, and fitted on the outer periphery side of the alignment ring on the outer periphery of the lid body It is characterized by being provided.

  As described above, the ridge portion formed at a predetermined height higher than the opening surface of the opening portion is provided on the periphery of the opening portion of the container body, and the alignment ring is provided on the outer peripheral surface side of the ridge portion. On the other hand, when a cylindrical portion that is fitted to the outer peripheral side of the alignment ring is provided on the outer periphery of the lid body, when the lid body is fitted to the opening of the container body, the metal of the outer peripheral portion of the lid body The cylindrical portion made of the resin is guided accurately and smoothly by the alignment ring made of the container main body side synthetic resin, and is securely fitted without causing interference between the metal portions.

  Moreover, since an alignment ring can be easily installed by fitting to the outer peripheral surface side of the protruding item | line part provided in the container main body side opening peripheral part, manufacture and a process are also easy.

(3) Third Problem Solving Means According to a third problem solving means of the present invention, in the configuration of the second problem solving means, the seal member is composed of an internal pressure type O-ring having a C-shaped cross section. It is characterized by being fitted to the inner peripheral surface side.

  According to such a configuration, the sealing member can be easily installed as in the case of the alignment ring, while the sealing member exhibits a reliable sealing function in response to an increase in internal pressure in the cleaning / drying processing chamber. As a result, even when a gap is left between the container body and the lid for some reason, reliable sealing is possible, and the reliability of the product is greatly improved.

  As a result, according to the present invention, it is possible to realize a high-quality cleaning / drying processing chamber in which the lid body and the container body can be easily fitted and the high-pressure sealability is high.

  As a result, it is suitable for automating the opening and closing of the lid.

FIGS. 1 to 13 show a supercritical fluid according to the best mode of the present invention in which carbon dioxide (CO ₂ ) is used as a cleaning fluid, for example, and cleaning is performed in combination with a predetermined liquid solvent such as alcohol. The overall system of the cleaning / drying apparatus and the configuration of the main part are shown.

(Features of the device)
The supercritical fluid cleaning / drying apparatus according to the best embodiment is configured so that carbon dioxide (CO ₂ ), which is a cleaning fluid, does not pass through a liquid phase at all in a predetermined cleaning / drying processing chamber. A predetermined object to be cleaned (such as a micromachine) such as a silicon wafer can be cleaned and dried with a phase change from fluid to gas. From the opening and closing of the cleaning / drying chamber to the pressurization / decompression and filling of the replacement solvent into the cleaning / drying chamber, automatic operation is possible without human intervention, and cleaning / drying with supercritical carbon dioxide fluid is possible. The system can be introduced into the mass production process, and it is characterized in that the degree of freedom of structure and pattern design, which was impossible to cause sticking by the conventional drying method, can be improved.

(Overall system configuration)
First, in FIG. 1 showing the overall system configuration of the apparatus, reference numeral 10 denotes a cleaning / drying processing chamber which is the center of the present invention. A bottomed cylindrical pressure-resistant container body 10a and a lid body 10b having the same shape that covers the upper portion of the container body 10a and is equipped with an electric heater for heating and keeping warm. The container body 10a and the lid It is formed by fitting and integrating the body 10b. When the cleaning / drying processing chamber 10 is formed integrally with the outer periphery of the container main body 10a and the lid 10b forming the cleaning / drying processing chamber 10, the cleaning / drying processing chamber 10 is cleaned. The flange portions 11 and 12 having a sealing structure for sealing the inside of the drying treatment space are provided, and both are integrally fitted and fixed through the flange portions 11 and 12 as described above. Yes.

  Then, when an object to be cleaned (micromachine or the like) such as a silicon wafer provided with a sensor wire having a nano-level thickness is delivered into the cleaning / drying processing chamber 10, the lid 10b is closed, and then As shown in FIG. 2, it is clamped and fixed by the clamping members 13 and 13 so as to be sealed with high accuracy (details will be described later).

On the other hand, reference numeral 1 is a carbon dioxide cylinder storing a desired amount of liquefied carbon dioxide (CO ₂ ) as a cleaning fluid, and 2 is a switch for opening and closing the supply state of carbon dioxide (CO ₂ ) from the carbon dioxide cylinder 1. The fluid on-off valve 3 is a pressurizing pump (pressurizing means) that pressurizes the carbon dioxide (CO ₂ ) fluid supplied in the open state of the fluid on-off valve 2 to a predetermined pressure. A fluid temperature adjusting means comprising an electric heater for adjusting the temperature of the pressurized carbon dioxide (CO ₂ ) fluid to a predetermined temperature sufficient to change from a liquid phase state to a gas phase state; The pressurizing pump 3 and the fluid temperature adjusting means 4 are provided on the cleaning fluid supply pipe L ₁ from the carbon dioxide cylinder 1 to the cleaning / drying processing space in the cleaning / drying processing chamber 10. Then, the carbon dioxide cylinder 1, the fluid on-off valve 2, the pressure pump 3, the fluid temperature adjusting means 4, the cleaning fluid supply line L _1, the cleaning fluid supply means is formed.

Reference numeral 5 denotes an inert gas tank that stores a desired amount of an inert gas such as nitrogen N ₂ , and 6 denotes an inert gas opening / closing valve that controls opening and closing of the supply state of the inert gas. The on-off valve 6 is provided on the inert gas supply pipe L ₂ from the inert gas tank 5 to the inlet side of the fluid temperature adjusting means 4 of the cleaning fluid supply pipe L ₁ .

And those inert gas tank 5, the inert gas on-off valve 6, the inert gas supply pipe L _2, the inert gas supply means is formed.

Reference numeral 7 denotes a liquid solvent such as alcohol having a high affinity with the carbon dioxide (CO ₂ ) fluid and a liquid density corresponding to an adjustable density range of the carbon dioxide (CO ₂ ) fluid. A solvent tank for storing a desired amount, 8 is a solvent opening / closing valve for opening / closing the supply state of the liquid solvent, and the solvent opening / closing valve 8 is a fluid temperature adjusting means for the cleaning fluid supply pipe L ₁ from the solvent tank 7. It is provided on the solvent supply pipe L ₃ up to 4 outlets. The solvent tank 7, the solvent opening / closing valve 8, and the solvent supply pipe L ₃ form solvent supply means. The solvent supplied by the solvent supply means is mixed into the carbon dioxide (CO ₂ ) fluid at the outlet side of the fluid temperature adjusting means 4 on the cleaning fluid supply pipe L ₁ , and the cleaning / A predetermined amount is stored at the bottom of the cleaning / drying processing space in the drying processing chamber 10, and the object to be cleaned is held in an immersed state.

Further, symbol L ₄ is a drain pipe for discharging the solvent and other waste liquid taken out by cleaning in the cleaning / drying processing space in the cleaning / drying processing chamber 10, and 17 is a cleaning / drying chamber 10 in A pressure sensor 18 for detecting the pressure in the drying processing space, 18 is a pressure control valve for adjusting the pressure in the cleaning / drying processing space by varying the flow rate of the discharged fluid, 19 is a safety valve, On the drain pipe L ₄ , the pressure sensor 17 and the safety valve 19 are provided on a bypass pipe L _{5 in} parallel with the drain pipe L ₄ . The drain pipe L ₄ , the bypass pipe L ₅ , the pressure control valve 18, the pressure sensor 17, and the safety valve 19 form a fluid discharge means.

  The pressure detection value of the pressure sensor 17 is input to the controller 20, and the controller 20 adjusts the opening of the pressure control valve 18 based on the input value, so that the inside of the cleaning / drying processing chamber 10 is adjusted. Adjust the pressure to the desired pressure.

(Washing / drying method)
In the above configuration, the object to be cleaned is cleaned and dried as follows, for example.

  (1) First, the inert gas opening / closing valve 6 and the solvent opening / closing valve 8 are opened to remove the inert gas in the inert gas tank 5 and the solvent in the solvent tank 7 in the cleaning / drying processing space of the cleaning / drying processing chamber 10. A predetermined amount is stored at the bottom. When a predetermined amount of the inert gas and the solvent enters, the inert gas on-off valve 6 and the solvent on-off valve 8 are closed.

  (2) Next, the object to be cleaned is placed in the bottom of the cleaning / drying processing chamber 10 and immersed in the stored solvent, and the lid 10b is closed.

(3) Next, the temperature of the carbon dioxide fluid (CO ₂ fluid) supplied into the cleaning / drying processing chamber 10 and the cleaning / drying processing chamber 10 are adjusted by adjusting the fluid temperature adjusting means 4 and the chamber temperature adjusting means. The temperature in the cleaning / drying processing space is adjusted and set to a predetermined temperature suitable for forming a supercritical state.

  At the same time, the pressure detection value of the pressure sensor 17 is inputted into the controller 20 for electrically adjusting and controlling the opening degree of the pressure control valve 18, and the detection value is suitable for forming a supercritical state. The opening degree of the pressure control valve 18 is appropriately adjusted and controlled so that the desired pressure value is obtained.

(4) Next, the cleaning fluid opening / closing valve 2 on the carbon dioxide cylinder 1 side is opened, and the cleaning / drying processing chamber 10 is cleaned / cleaned with the carbon dioxide fluid as the cleaning fluid via the cleaning fluid supply pipe L _1. Supply into the drying space.

In this case, the fluid temperature adjusting means 4 is provided between the pressurizing pump 3 and the cleaning fluid inlet of the cleaning / drying processing chamber 10 in the downstream region of the cleaning fluid supply pipe L ₁ as described above. Therefore, in the stage before entering the pre-cleaning / drying processing chamber 10, the liquid phase carbon dioxide fluid is heated and pressurized to a temperature suitable for becoming a gas or a supercritical state. It becomes a supercritical state, and is then introduced into the cleaning / drying processing space of the cleaning / drying processing chamber 10.

  (5) As a result, the object to be cleaned is cleaned with a phase change of gas → supercritical fluid → gas without the carbon dioxide fluid as the cleaning fluid passing through the liquid phase at all.

  That is, in the case of this configuration, the carbon dioxide fluid that is the cleaning fluid supplied into the cleaning / drying processing space of the cleaning / drying processing chamber 10 is gas from the beginning by the pressure adjusting valve 18 and the fluid temperature adjusting means 4. Alternatively, since it is introduced in a supercritical state, the inside of the cleaning / drying processing space of the cleaning / drying processing chamber 10 can be quickly brought into a supercritical state and cleaned by the same gas or a supercritical high-pressure cleaning fluid. Air is reliably discharged in the initial stage.

  As a result, the problem of the object to be cleaned due to the action of the cleaning fluid in the liquid phase is also solved. Therefore, even the micromachine as described above can be cleaned and dried with a sense of security.

(6) The carbon dioxide fluid containing unnecessary substances such as dirt and solvent from the object to be cleaned after being cleaned as described above is separated from the pressure regulating valve 18 and the safety valve 19 by a CO ₂ separation (not shown). The liquid is supplied to a waste liquid recovery apparatus having a recovery function, and the carbon dioxide fluid, the solvent, and unnecessary substances are separated from each other and recovered individually.

(Configuration of cleaning / drying chamber)
Next, FIG. 2 and FIG. 3 show a specific configuration of the cleaning / drying processing chamber 10.

  For example, as shown in detail in FIG. 3, the cleaning / drying processing chamber 10 covers the upper part of the container body 10 a with a bottomed cylindrical high-pressure-resistant container body 10 a having a high opening pressure. For example, the container body 10a and the lid body 10b are each formed of a disc-shaped and thick pressure-resistant lid body 10b provided with an electric heater (not shown) for heating and heat insulation. And is fixed by a predetermined fixing means (described later) as shown in FIG.

  That is, the outer periphery of the container body 10a and the lid body 10b forming the cleaning / drying processing chamber 10 are integrally fitted and fixed to each other as shown in FIG. 2, for example, and the inside of the container body 10a is sealed. When the drying process chamber 10 is formed, the thick flange portions 11 and 12 having a sealing mechanism (details will be described later) for reliably sealing the cleaning / drying process space in the cleaning / drying process chamber 10 are mutually connected. The flange portions 11 and 12 are opposed to each other so that they are securely fixed by fixing means described later.

  That is, at the center of the flange surface on the flange portion 11 side, a protruding strip portion 21a having a predetermined height higher than the opening surface (flange surface) of the container body 10a is provided over the entire circumference. An alignment ring (guide ring) 15 having a predetermined width made of, for example, a high-strength synthetic resin material is provided on the outer peripheral surface side, and a synthetic material having a large rebound resilience is provided on the inner peripheral surface side of the convex portion 21a. Internal pressure type O-rings 16 having a C-shaped cross section made of rubber are respectively fitted. An upper end portion (shoulder portion) on the outer peripheral surface side of the alignment ring 15 is formed as a rounded surface having a predetermined curvature from the upper surface side to the side surface side, and an inner peripheral surface portion of the outer peripheral wall 21d of the lid body 10b side flange portion 12 described below. However, it is guided by the rounded surface and is smoothly fitted. Further, the upper portion of the O-ring 16 in a non-fitted state with the lid body 10b is more predetermined than the upper end surface of the ridge portion 21a that is an abutting surface with the flange portion 12 on the lid body 10b side as shown in FIG. However, at the time of fitting, it is engaged with the inner peripheral surface side step portion 21c of the groove portion 21b as shown in FIG.

  On the other hand, a groove portion 21b having a small depth is formed on the flange surface on the flange portion 12 side, and a cylindrical shape located at the outer peripheral end portion and having the same height as the protruding strip portion 21a on the flange portion 11 side. A portion (fitting wall) 21d is formed over the entire circumference.

  Then, an object to be cleaned (micromachine) such as a silicon wafer provided with a sensor wire having a nano-level thickness, for example, is delivered into the container body 10a, and the lid body 10b is moved from the state of FIG. 3 as shown in FIG. When fitted into the opening of the container body 10a, as shown in FIG. 4, the ridges 21a and the cylindrical portion 21b abut against the mutually opposing flange surfaces, and the internal pressure type A good sealing function through the O-ring 16 is realized, and the cleaning / drying processing chamber in the cleaning / drying processing chamber 10 is surely sealed. In particular, in the case of this embodiment, since the internal pressure type O-ring 16 having a C-shaped cross section is employed as the seal member, the higher the internal pressure in the processing chamber, the higher the sealing function. Improves.

An inlet 31 and an outlet 32 for the cleaning fluid (CO ₂ ) are provided on the bottom wall of the container body 10a.

(Configuration of lid opening / closing mechanism)
As described above, the lid body 10a is fitted to the container body 10a in a corresponding manner, and the lid body opening / closing mechanism that opens the cleaning / drying processing chamber in the container body 10a by removing the lid body 10b from the container body 10a. Is configured as an automated apparatus as shown in FIGS.

  That is, as shown in FIG. 5 to FIG. 8, the lid opening / closing mechanism stands on the center side of the base 40 and rises up to a predetermined height via the legs 29 a and 29 a, The container main body 10a is supported on and fixed to the upper portion of the container main body 10a with the container body 10a facing upward, and the container main body 10a is disposed on the outer peripheral side of the base 40 via a slide mechanism and a lifting mechanism described later. A gate-type column 57 standing up above a predetermined height above the portion, and supporting and fixing the lid 10b downward on the lower surface side of the upper side portion via a connection support member 57a, and the slide mechanism is slid It comprises first driving means for operating, and second driving means for raising and lowering the lifting mechanism.

  The slide mechanism is located on both front and rear sides of the base 40, and extends on the fixed side rail members 40a and 40a extending in parallel in the left and right directions, and the movable side slidably engaged with the upper portions of the rail members 40a and 40a. The sliders 40b and 40b and a pair of left and right support plates 41a and 41a having a predetermined width and fixed to the upper portions of the sliders 40b and 40b and supporting the lifting mechanism at a predetermined height. Yes.

  The elevating mechanism includes worm gear bearings 41b and 41b that are horizontally supported and fixed on the inner side of the upper ends of the pair of support plates 41a and 41a, and the upper and lower ends 42a and 42a on the worm gear bearings 41b and 41b. Pole-type worm gears 42 and 42 rotatably supported by shafts, and gate-type column support members 57b and 57b screwed up and down to worm gear portions on the upper ends 42b and 42b of the worm gears 42 and 42, respectively. Yes. The gate-type column support members 57 b and 57 b are fixed to the outer sides of the lower ends of the pair of left and right side plates 57 a and 57 a of the gate-type column 57.

  The first driving means includes a motor 50 and a motor pulley (sprocket-type pulley) 51 provided on one side of the front end side of the base 40, and a follower provided on one side of the rear end side of the base 40. A pulley (sprocket type pulley) 59 and a pulley base 58, a belt (chain belt) 52 stretched between the motor pulley 51 and the driven pulley 59, and provided in the middle of the belt 52. It is comprised from the engaging member 54 engaged with the mechanism support plate 41a.

  Therefore, when the motor 50 is driven, the motor pulley 51 is arbitrarily rotated in either the clockwise or counterclockwise rotation direction to rotate the belt 52. As a result, the elevating mechanism support plates 41a and 41a are moved in the direction of arrow (A) or (B) in FIG. 6 or FIG. 8 via the engagement member 54, and the portal column 57, that is, the lid 10b is moved. Similarly, it is moved in the direction (a) or (b). In this case, the case of moving in the direction (A) is a state before fitting the lid body 10b on the container body 10a, and the case of moving in the direction (B) is that the lid body 10b is moved to the container body 10a. The open state which escaped from the upper part to the front is shown.

  Further, the second driving means for operating the lifting mechanism is a motor 46 supported via a support member 47 extending in the horizontal direction inside one of the lifting mechanism support plates 41a, 41a. And motor pulley (sprocket type pulley) 45, driven pulleys (sprocket type pulleys) 43, 43 fixedly provided at the lower ends 42a, 42a of the pole type worm gears 42, 42, and driven pulleys 43, 43 A belt (chain belt) 44 is provided between the motor pulleys 45 in a triangle shape.

  Accordingly, when the motor 46 is driven and the motor pulley 45 is rotated in either the clockwise direction or the counterclockwise direction, the worm gears 42 and 42 are rotated in the clockwise direction or the counterclockwise direction, so that the gate-type support column is rotated. 57, that is, the lid 10b is moved up and down in the (c) direction or (d) direction of FIGS.

  And thereby, the cover body 10b can be removed from the upper part of the said container main body 10a, and can be fitted to the container main body 10a conversely.

  Of course, these lifting and lowering operations are appropriately combined with (b) or (b) horizontal movement by the slide mechanism using a predetermined automation control unit, and once a semiconductor wafer is cleaned and dried. When the process is completed, the lid 10b is raised in the (c) direction and then released in the (b) direction to take out the semiconductor wafer and store a new semiconductor wafer.

  Then, after the lid body 10b is moved in the direction (a) to correspond to the container body 10a, the lid body 10b is further lowered in the direction (d) to be integrally fitted to the container body 10a. Thereafter, the expansion rods 14a and 14a of the hydraulic cylinders 14 and 14 constituting the driving unit of the fixing means described above are extended from the states of FIGS. 9 and 10 to the states of FIGS. The flange portions 11 and 12 of the container main body 10a and the lid body 10b are clamped and fixed in the up and down directions with the pressing pieces 13a, 13b, 13a and 13b of the pressing members 13 and 13.

  When the clamping pressure fixed state by the clamping members 13 and 13 is realized in this manner, in this state, the container support base 29b is supported from the lower side via the coupling members 28a and 28a and the support member 28b. Thus, the distal end side lock pin 26b portion of the telescopic rod 26a of the hydraulic cylinder 26 constituting the lock mechanism is formed on the ear portions 22, 23, 22, 23 on both sides of the pinching pieces 13a, 13b, 13a, 13b. Are inserted into the lock pin fitting holes 24, 24, 24, 24, 24, 24, and are securely fixed.

  Then, the semiconductor wafer is cleaned and dried by the above-described supercritical fluid in such a secure fitting state of the lid 10b.

  When the cleaning / drying process is completed, the telescopic rods 14a and 14a of the hydraulic cylinders 14 and 14 constituting the driving unit of the fixing means are expanded and contracted as described above, and the state shown in FIGS. 9 and FIG. 10, the clamping state by the clamping members 13 and 13 is released, and the lid body 10b is again released from the upper side to the front in the horizontal direction as described above, and the cleaning is completed. The removed semiconductor wafer can be taken out and a new semiconductor wafer can be stored.

  By the way, the pinching pieces 13a, 13b, 13a, 13b constituting the pinching members 13, 13 have two U-shaped ears 22, 23, 22, 23 on both ends. The plate structure, the other side 22, 22 is a single plate structure that is fitted between them and stacked in three pieces, and each of the lock pin fitting holes 24, 24 ... are concentric. In a state of being securely overlapped so as to overlap (FIGS. 10 and 12), it is locked by a lock pin 26b at the tip of the telescopic rod 26a of the hydraulic cylinder 26 as shown in FIG.

  Reference numeral 13c denotes a U-shaped fitting groove formed between the pressing pieces 13a and 13b.

  As described above, in the present embodiment, the cleaning / drying processing chamber, the cleaning fluid supply means for supplying the cleaning fluid into the cleaning / drying processing chamber, and the unnecessary matter in the cleaning / drying processing chamber are discharged. Supercritical fluid cleaning comprising a fluid discharge means, and maintaining the cleaning / drying processing chamber in a supercritical state so as to perform cleaning / drying processing of an object to be cleaned in the cleaning / drying processing chamber -A drying device, wherein the cleaning / drying processing chamber comprises a container body into which an object to be cleaned is placed and a lid fitted to the opening of the container body, and the container body and the lid are fitted together. The part is provided with a synthetic resin alignment ring that matches the fitting position of the container body and the lid, and a seal member that seals the gap between the fitting parts.

  According to such a configuration, when the lid is fitted to the container body opening, the fitting portions are accurately and smoothly guided and aligned by the synthetic resin alignment ring, so that the mutual metal portions are aligned. It can be smoothly fitted to the final fitting position without contacting each other.

  Further, in the same configuration, a ridge formed at a predetermined height higher than the opening surface of the opening is provided on the periphery of the opening of the container body, and an alignment ring is provided on the outer peripheral surface side of the ridge. On the other hand, a cylindrical portion that is fitted to the outer peripheral side of the alignment ring is provided on the outer periphery of the lid.

  As described above, the ridge portion formed at a predetermined height higher than the opening surface of the opening portion is provided on the periphery of the opening portion of the container body, and the alignment ring is provided on the outer peripheral surface side of the ridge portion. On the other hand, when a cylindrical portion that is fitted to the outer peripheral side of the alignment ring is provided on the outer periphery of the lid body, when the lid body is fitted to the opening of the container body, the metal of the outer peripheral portion of the lid body The cylindrical portion made of the resin is accurately and smoothly guided by the alignment ring made of the synthetic resin on the container body side, and is securely fitted without causing interference between the metal portions.

  Moreover, since an alignment ring can be easily installed by fitting to the outer peripheral surface side of the protruding item | line part provided in the container main body side opening peripheral part, manufacture and a process are also easy.

  Furthermore, in the same structure, the said sealing member consists of an internal-pressure-type O-ring with a C-shaped cross section, and is fitted to the inner peripheral surface side of the protruding portion.

  According to such a configuration, the sealing member can be easily installed as in the case of the alignment ring, while the sealing member exhibits a reliable sealing function in response to an increase in internal pressure in the cleaning / drying processing chamber. As a result, even when a gap is left between the container body and the lid for some reason, reliable sealing is possible, and the reliability of the product is greatly improved.

  As a result, according to the present embodiment, it is possible to realize a high-quality cleaning / drying processing chamber in which the lid body and the container body can be easily fitted and the high-pressure sealability is high.

  As a result, it is suitable for automating the opening and closing of the lid.

(Modification)
In the above configuration, an internal pressure type O-ring having a C-shaped cross section is adopted as the seal member 15 for sealing between the container body 10a and the lid body 10b. Of course, various seal members 15 are used. Needless to say, for example, a normal O-ring having a circular cross section as shown in FIG. 14 (when not pressed) and FIG. 15 (when pressed) may be used.

It is a figure which shows the whole structure of the supercritical fluid washing | cleaning / drying apparatus which concerns on best embodiment of this invention. It is sectional drawing which shows the structure of the washing | cleaning / drying processing chamber part in the same apparatus. It is sectional drawing which shows the structure at the time of the non-fitting of the container main body and lid part of the same washing | cleaning / drying processing chamber. It is sectional drawing which shows the structure at the time of the fitting of the container main body and lid part of the same washing | cleaning / drying processing chamber. It is a front view which shows the structure at the time of lid | cover opening of the lid | cover opening / closing mechanism of the washing | cleaning / drying processing chamber of the supercritical fluid washing | cleaning / drying apparatus which concerns on best embodiment of this invention. It is a side view which shows the structure at the time of the lid | cover opening of the lid | cover opening / closing mechanism. It is a front view which shows the structure at the time of lid closing of the lid opening / closing mechanism. It is a side view which shows the structure at the time of lid closing of the lid opening / closing mechanism. It is a top view which shows the structure at the time of lid non-fixation of the lid fixing means of the lid opening / closing mechanism. It is a side view which shows the structure at the time of the lid | cover non-fixing of the lid fixing means of the lid opening / closing mechanism. It is a top view which shows the structure at the time of lid fixing of the lid fixing means of the lid opening / closing mechanism. It is a side view which shows the structure at the time of lid fixing of the lid fixing means of the lid opening / closing mechanism. It is a side view which shows the structure of the lock pin action | operation mechanism (lock mechanism) in the lid fixing means of the lid opening / closing mechanism. It is a figure which shows the structure at the time of the non-pressing of the chamber part sealing member of the supercritical fluid washing | cleaning / drying apparatus which concerns on the modification of best embodiment of this invention. It is sectional drawing which shows the structure at the time of the press of the seal member.

Explanation of symbols

  1 is a carbon dioxide cylinder, 2 is a fluid opening / closing valve, 3 is a pressure pump, 5 is an inert gas tank, 7 is a solvent tank, 10 is a cleaning / drying processing chamber, 10a is a container body, 10b is a lid, and 11 is a flange , 12 is a flange portion, 40 is a base, 40a is a fixed rail, 40b is a slider, 42 is a worm gear, 57 is a portal column, and 46 and 50 are motors.

Claims (3)

  A cleaning / drying processing chamber, a cleaning fluid supply means for supplying a cleaning fluid into the cleaning / drying processing chamber, and a fluid discharge means for discharging unnecessary substances in the cleaning / drying processing chamber. A supercritical fluid cleaning / drying apparatus configured to perform cleaning / drying processing of an object to be cleaned in the cleaning / drying processing chamber by maintaining the inside of the processing chamber in a supercritical state. The processing chamber includes a container main body in which an object to be cleaned is placed, and a lid body fitted into the opening of the container main body. The fitting portion between the container main body and the lid body includes a container main body and a lid body. A supercritical fluid cleaning / drying apparatus, comprising: an alignment ring made of a synthetic resin for matching a fitting position; and a seal member for sealing a gap between the fitting portions.   On the peripheral edge of the opening of the container body, a convex strip formed at a predetermined height higher than the opening surface of the opening is provided, and an alignment ring is provided on the outer peripheral surface of the convex strip, while the lid 2. The supercritical fluid cleaning / drying device according to claim 1, wherein a cylindrical portion fitted to the outer peripheral side of the alignment ring is provided on the outer periphery of the body. 3. The supercritical fluid cleaning / drying apparatus according to claim 2, wherein the sealing member is formed of an internal pressure type O-ring having a C-shaped cross section, and is fitted to the inner peripheral surface side of the protruding portion.

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