JP2006133390A - Development processor and method for controlling temperature of development processing liquid - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To improve the state where ON-OFF frequency in a heater for temperature control to a development processing liquid is made incessant, and to improve the service life of the heater. <P>SOLUTION: In the temperature control method for a development processing liquid in a development processor device provided with: a heater for heating a development processing liquid stored in a processing tank for development processing; and a cooling fan for cooling the development processing liquid, the atmospheric temperature in the device body is detected by a first temperature sensor, further, the atmospheric temperature in the outside of the device body is detected by a second temperature sensor, and, if the difference in the atmospheric temperatures between the inside and the outside is a prescribed value or higher, the cooling fan is operated in a state its revolving speed is reduced. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention includes a heater that heats a development processing solution stored in a processing tank for development processing, and a cooling fan such as a cooling fan that cools the development processing solution, a Peltier element, and the like. The present invention relates to a development processing apparatus that enables so-called temperature control and a temperature adjustment method for a development processing solution.

A development processing apparatus for developing a photosensitive material such as a film or photographic paper is provided with a plurality of processing tanks for various processing such as development, fixing, and stability. Developer tank ”) contains developer, fixing tank for fixing (hereinafter“ fixing tank ”), fixing liquid, processing tank for stabilization (hereinafter“ stabilizing tank ”) contains stabilizer. For the purpose of adjusting the temperature of the development processing solution, a configuration including a heater for forcibly increasing the temperature of the development processing solution and a cooling fan for forcibly lowering the temperature of the development processing solution is generally used ( Patent Document 1).
JP 7-36167 A

  Normally, the temperature control is performed when the temperature of the developing solution rises when the heater is turned on, and if this exceeds the upper limit for the control temperature, the heater is turned off and the cooling fan is turned on, while the developing solution is turned on when the cooling fan is turned on. When this temperature falls and falls below the lower limit for the control temperature, the cooling fan is turned off and the heater is turned on.

  According to this method, the temperature increase rate of the developing solution in the temperature control is determined by the heat generation capacity of the heater and is almost constant in any case. However, the temperature decrease rate is obtained by the cooling fan taking in outside air and supplying air. Because of the nature of cooling, it depends on the ambient temperature outside the machine. That is, compared with the case where the temperature is controlled in an environment where the ambient temperature outside the machine is high, such as in summer, the cooling fan has a higher cooling effect when the temperature is controlled in an environment where the ambient temperature outside the machine is low, such as in winter. When the fan is turned on, the temperature of the developing solution quickly reaches the lower limit with respect to the control temperature, and the timing at which the heater is turned on is advanced. As a result, the temperature change cycle of the developing solution is shortened.

  A short temperature change cycle of the developing solution means that the heater is frequently turned on and off. If the heater is turned on and off frequently, the life of the heater is shortened accordingly. An object of the present invention is to improve this state and to improve the life of the heater.

  In order to achieve the above object, a development processing apparatus according to the present invention includes a heater for heating a development processing solution stored in a processing tank for development processing, and a cooling unit for cooling the development processing solution, In a development processing apparatus that adjusts the temperature of a processing liquid, a first temperature sensor that detects an atmospheric temperature inside the apparatus main body, a second temperature sensor that detects an atmospheric temperature outside the apparatus main body, and the first and second And a temperature control unit that changes the operating conditions of the cooling means stepwise in accordance with the atmospheric temperature difference between the inside and outside of the apparatus body determined from the temperature sensor.

  Further, in the development processing apparatus according to the present invention, as an example, the cooling unit is a cooling fan, and the temperature control unit includes a case where the atmospheric temperature difference between the inside and outside of the apparatus body is a predetermined value or more and a case where the difference is smaller than that. It is possible to adopt a configuration in which the number of rotations of the cooling fan is changed in two stages.

  In this case, the method for adjusting the temperature of the developing solution according to the present invention includes a heater for heating the developing solution stored in the processing tank for the developing process, and a cooling fan for cooling the developing solution. In the method for adjusting the temperature of the developing processing liquid in the apparatus, the first temperature sensor detects the atmospheric temperature inside the apparatus main body, and the second temperature sensor detects the atmospheric temperature outside the apparatus main body, When the temperature difference is equal to or greater than a predetermined value, the cooling fan is operated at a reduced speed.

  According to these configurations, when the cooling effect of the cooling unit is high due to a large atmospheric temperature difference between the inside and outside of the apparatus main body, the operating condition of the cooling unit is changed in a direction in which the cooling effect is reduced, thereby The slope of the temperature decrease becomes gentle, and the temperature change cycle of the developing solution is extended and lengthened. As a result, the timing at which the heater is turned on is delayed, and the frequency of turning on and off the heater is reduced.

  In the development processing apparatus according to the present invention, the processing tank includes at least a development tank, a fixing tank, and a stabilization tank. Each processing tank includes a heater, and these processing tanks share one cooling unit. A configuration can be employed.

  The developing solution as the main agent must be strictly controlled in temperature as compared with the fixing solution and the stabilizing solution as auxiliary agents. Therefore, normally, proportional control is performed on the developer by turning the heater on and off. On the other hand, since the three kinds of liquids are shared by the cooling means, the cooling means may be turned on depending on the temperature condition of the liquid different from the developer. According to the above configuration, there may be a case where the ON / OFF control of the heater for the developer is performed under the condition that the cooling means is ON. However, the effect of this configuration can be achieved for each processing tank. This is the same as the case where the heater and the cooling means are provided. Further, the cost can be reduced and the space can be saved as the number of the cooling means is reduced.

  As a specific example of the temperature management of the developer, the first and second temperature ranges are set as proportional bands, and when the upper limit of the proportional band is exceeded, the heater of the developing tank is turned off, while when the lower limit of the proportional band is exceeded, Proportional control is performed to turn on the heater, and the cooling means is turned on if the temperature of any one of the developer, the fixing solution, and the stabilizer exceeds a third temperature higher than the upper limit of the proportional band, while the proportional band If the temperature falls below a fourth temperature lower than the lower limit, a configuration in which the temperature is turned off can be adopted.

  As described above, according to the present invention, when the cooling effect of the cooling unit is high due to a large atmospheric temperature difference between the inside and outside of the apparatus main body, the developing condition is changed by changing the operating condition of the cooling unit in a direction in which the cooling effect decreases. The temperature change cycle of the processing liquid is extended and lengthened, and the frequency of heater ON-OFF decreases, so the heater can be released from frequent ON-OFF abuse, thereby improving the life of the heater Can be achieved.

  On the other hand, when the atmospheric temperature difference between the inside and outside of the apparatus main body is small, the operating condition of the cooling means is changed in the direction of increasing the cooling effect against the deterioration of the cooling effect of the cooling means due to the small atmospheric temperature difference inside and outside the apparatus main body. As a result, the temperature change width of the developing solution can be suppressed and suitable temperature adjustment can be performed.

  Hereinafter, a photographic processing apparatus which is an embodiment of a development processing apparatus according to the present invention will be described with reference to the drawings.

  FIG. 1 shows a photographic processing apparatus in which a magazine 2 for storing photographic paper P in roll form, an exposure unit 3 for performing exposure processing on the photographic paper P, and a development processing unit 20 for performing development processing on the photographic paper P are incorporated in the apparatus body 1. FIG.

  The long photographic paper P drawn from the magazine 2 is first conveyed to the exposure unit 3. The exposure unit 3 is provided with a film carrier 6 having a gate 4 that is opened in a substantially square shape, and a roller pair 5 that feeds the film F and positions each frame of the film F on the gate 4.

  A scanner unit 8 capable of reading an image of the film F of the gate 4 is provided in one direction perpendicular to the film F of the gate 4, and the read data of the scanner unit 8 is stored in the image processing unit 9. Sent to. Then, the image processing unit 9 forms digital image data for digital exposure based on the read data.

  Further, in a position direction perpendicular to the conveyed photographic paper P, a laser exposure unit 10 as a digital exposure unit that emits irradiation light to the photographic paper P according to the digital image data formed by the image processing unit 9. The photographic paper P located at the exposure point 11 is digitally exposed with irradiation light to form an image of the film F on the emulsion surface of the photographic paper P.

  The photographic paper P that has been subjected to the exposure processing of a plurality of frames in the exposure unit 3 is conveyed to the downstream development processing unit 20. In the development processing unit 20, various processing tanks such as a development tank 21, a fixing tank 22, and a stabilization tank 23 are sequentially arranged side by side. Therefore, the photographic paper P is conveyed while being sequentially immersed in the developing solution Q in these processing tanks, and the photographic paper P is developed.

  The photographic paper P that has been subjected to the development processing is dried by the drying unit 25, and further cut for each frame image by the cutter 28 downstream of the drying unit 25, and then by a sorting unit (not shown). Accumulated for each order.

  In the photographic processing apparatus, the source of digital image data for digital exposure is not limited to film, and image data recorded on a recording medium such as a CD-ROM can be processed. There is also a photographic processing apparatus in which an exposure process and a development process are applied to the photographic paper P that has been cut in advance, instead of finally cutting the photographic paper P.

  FIG. 2 is a longitudinal sectional view of the apparatus main body 1 in the developing tank 21. A sub tank 30 is provided on the side of the upper region of the developing tank 21. Inside the sub tank 30, a liquid temperature sensor (heat sensitive bar) 31 for detecting the temperature of the developing solution and a chemical heater 32 for heating the developing solution are provided. Is provided.

  A part of the upper region of the developing tank 21 and the upper region of the sub tank 30 are in communication with each other and can be circulated. Further, the bottom of the developing tank 21 and the bottom of the sub tank 30 are connected by a circulation channel 33, and the circulation channel 33 is provided with a circulation pump 34. That is, a circulation line is formed from the top of the developing tank 21 to the bottom of the developing tank 21 through the sub-tank 30 and the circulation channel 33, and a developing processing solution (here, developing solution) is formed in the developing tank 21 by the circulation pump 34. The circulation is performed.

  The circulation channel 33 is provided with a radiator 35. A cooling fan 36 is disposed in the vicinity of the radiator 35. Therefore, when the chemical heater 32 is turned on, the developer in the sub tank 30 is first heated and circulated, whereby the developer in the developer tank 21 is heated, while the cooling fan 36 is turned on. The developer in the radiator 35 in the circulation flow path 33 is first cooled, and this is circulated, whereby the developer in the developer tank 21 is cooled.

  The configuration of the sub-tank 30, the circulation line 33, and the like is the same in the other processing liquid tanks (the fixing tank 22, the stability tank 23, etc.), and the description thereof is omitted. However, the cooling fan 36 is shared by the developing tank 21, the fixing tank 22 and the stabilization tank 23 for the purpose of reducing the number of parts and saving space. For example, as disclosed in Japanese Patent Application Laid-Open No. 2000-122254, the circulation passages 33 of the developing tank 21, the fixing tank 22 and the stabilization tank 23 are collected at one place (at the position of the radiator 35), and the cooling fan When 36 is turned on, the circulation passages 33 of the developing tank 21, the fixing tank 22 and the stabilization tank 23 are cooled (via the radiator 35).

  FIG. 3 is a configuration block diagram of the development processing unit 20. The heater 32 and the cooling fan 36 of the developing tank 21, the fixing tank 22 and the stabilization tank 23 are connected to the controller 40. The liquid temperature sensor 31, the internal temperature sensor 41 (see FIG. 2 for the position) for detecting the atmospheric temperature (internal temperature) in the apparatus main body 1, and the atmospheric temperature (external temperature) outside the apparatus main body 1. The outside air temperature sensor 42 (see FIG. 2 for the position) is also connected to the controller 40. The air temperature sensor 42 is substantially equal to the outside air temperature if the intake air temperature is measured at the intake port of the cooling fan 36. .

  In addition, the controller 40 includes a control temperature setting unit 43, a temperature control unit 44, a heater control unit 45, and a fan control unit 46, which can input a control temperature by a button 43a, for adjusting the temperature of the developing solution. Yes. The temperature control unit 44 is a part that comprehensively controls temperature control based on information from the control temperature setting unit 43, the liquid temperature sensor 31, the internal temperature sensor 41, and the outside air temperature sensor 42, and based on this command, The heater control unit 45 performs ON / OFF control of each heater 32, and the fan control unit 46 performs ON / OFF control of the cooling fan 36.

  Specifically, the temperature control unit 44 performs the following control. First, the control temperature of the developing solution, the fixing solution, and the stabilizing solution is set to 35 ° C. In addition, for the developer, the temperature control allowable range is set to the control temperature ± 0.3 ° C., and in order to realize this, the range of the control temperature ± 0.1 ° C. is set as the proportional band, and the upper limit of the proportional band ( If the temperature exceeds the first temperature), the heater 32 of the developing tank 21 is turned off. On the other hand, if the temperature falls below the lower limit of the proportional band (second temperature), the proportional control that turns on the heater 32 and the control temperature + 0.2 ° C. If the temperature exceeds (third temperature), the cooling fan 36 is turned on. On the other hand, if the temperature falls below the control temperature of −0.2 ° C. (fourth temperature), the two controls of turning the cooling fan 36 off are combined. Do it.

  On the other hand, since it is not necessary to control the temperature of the fixing solution and the stabilizing solution more severely than the developing solution, the temperature control allowable range is set to the control temperature ± 3.0 ° C., and this is realized. If the control temperature exceeds + 3.0 ° C., the heater 32 is turned off, and if the temperature falls below the control temperature −3.0 ° C., the heater 32 is turned on and the control temperature + 0.4 ° C. (third If the temperature exceeds (temperature), the cooling fan 36 is turned on. On the other hand, if the temperature falls below the control temperature of −0.2 ° C. (fourth temperature), two controls of turning the cooling fan 36 off are performed together.

  Since the above-described proportional control is performed on the developer, it is unlikely that the temperature of the developer is outside the range of the control temperature ± 0.2 ° C. Therefore, it may be considered that the cooling fan 36 is unlikely to be turned ON or OFF due to the temperature change of the developer. Therefore, the cooling fan 36 is turned on when the temperature of either the fixing liquid or the stabilizing liquid exceeds the control temperature + 0.4 ° C. The cooling fan 36 is turned off when the temperature of either the fixing solution or the stabilizing solution falls below the control temperature of -0.2 ° C. Therefore, it can be considered that the cooling fan 36 is unlikely to be turned off. Therefore, basically, the cooling fan 36 remains ON during operation.

  Therefore, for the developing solution, the ON / OFF control of the heater 32 is performed under the condition that the cooling fan 36 is always ON. Under this state, the feature of this embodiment is that the operating condition of the cooling fan 36 is variable. Based on the information from the internal temperature sensor 41 and the external air temperature sensor 42, the temperature control unit 44 calculates the difference between the atmospheric temperature (internal temperature) in the apparatus main body 1 and the atmospheric temperature (external temperature) outside the apparatus main body 1. If this difference is equal to or greater than a predetermined value (10 ° C. in the present embodiment), it is determined that the ambient temperature outside the apparatus main body 1 is low and the cooling effect of the cooling fan is high. The fan 36 is switched from the normal operation mode to the low speed operation mode.

  This case will be specifically described with reference to FIG. FIG. 4 is a state diagram from the initial state where the operation is started until each developing solution rises in temperature and the developing solution shifts to the proportional control state. Since the temperature of the developing solution is lowered until the apparatus starts to operate over time, first, all the heaters 32 of the developing tank 21, the fixing tank 22 and the stabilizing tank 23 are turned on, and the developing solution Each temperature of the fixing solution and the stabilizing solution rises.

  In the proportional band, the heater 32 of the developing tank 21 is repeatedly finely turned on and off until the temperature of the developer exceeds the upper limit of the proportional band. When the temperature of the developer exceeds the upper limit of the proportional band, the heater 32 of the developer tank 21 is turned off. However, for the fixer and the stabilizer, the allowable temperature adjustment range is wider than that of the developer, and therefore the fixing tank 22. And each heater 32 of the stabilization tank 23 is still ON, and therefore the temperature of the fixing solution and the stabilization solution continues to rise further.

  When the temperature of the fixing liquid or the stabilizing liquid exceeds the control temperature + 0.4 ° C., the cooling fan 36 is turned on, and cooling of all of the developing tank 21, the fixing tank 22 and the stabilizing tank 23 is started.

  Although the temperature of the developer starts to decrease from that point, the cooling fan 36 rotates in the low speed operation mode (ON2 in the figure) where the fan rotation speed is lower than that in the normal operation mode (ON1 in the figure), so the air volume is reduced. The temperature drop rate (cooling rate) of the developer becomes slow. In other words, the slope of the decrease in the temperature of the developer becomes gentle, and the time during which the temperature of the developer is within the proportional band is kept long.

  When the temperature of the developing solution falls below the lower limit of the proportional band, the heater 32 of the developing tank 21 is turned on, the developing solution is heated, and the temperature rises again. After that, the heater 32 of the developing tank 21 is repeatedly turned on and off, and the developing solution proportional control state is entered.

  According to the above temperature control method, the difference between the ambient temperature (internal temperature) in the apparatus body 1 and the ambient temperature (outside temperature) outside the apparatus body 1 is a predetermined value (10 ° C. in the present embodiment) or more. If there is, the environment temperature outside the apparatus main body 1 is low and the cooling effect of the cooling fan is high. Therefore, the cooling fan 36 is switched to the low speed operation mode, and the temperature change cycle of the developer is extended. To be long. As a result, the timing at which the heater 32 of the developing tank 21 is turned on is delayed, thereby reducing the frequency of ON / OFF of the heater 32 (refer to FIG. 5 according to the conventional method and FIG. 4 according to the present embodiment). Therefore, the life of the heater can be improved. In addition, since the number of rotations of the cooling fan 36 is reduced, noise and vibration are reduced, and the life of the cooling fan 36 is improved.

  However, the difference between the ambient temperature (internal temperature) in the apparatus body 1 and the ambient temperature (outside temperature) outside the apparatus body 1 is small and the difference is less than a predetermined value (10 ° C. in the present embodiment). Since the cooling effect is low in the low-speed operation mode of the cooling fan 36, the temperature of the developer does not decrease immediately even after the heater 32 is turned off, and it swells larger than the upper limit of the proportional band, and the temperature change width is larger than the proportional band. Since it spreads up and down, it is not so preferable. Therefore, in that case, the cooling fan 36 is rotated at a high speed by switching to the normal operation mode, and the cooling effect is enhanced by increasing the air volume.

  In addition, this invention is not limited to the said embodiment, A various change is possible in the range which does not deviate from the summary of this invention.

  For example, in the above-described embodiment, regarding the developer, the temperature at which the heater 32 is turned on and the temperature at which the cooling fan 36 is turned off do not match, and the temperature at which the heater 32 is turned off and the cooling fan 36 are turned on. Although the temperature does not coincide with the temperature, the present invention makes the temperature at which the heater is turned on and the temperature at which the cooling fan is turned off constant, and the heater is turned on and the cooling fan is turned off at the same timing. It can also be applied to the case where the temperature at which the heater is turned off and the temperature at which the cooling fan is turned on are made constant and the heater is turned off and the cooling fan is turned on at the same timing.

  In the above embodiment, the proportional control is applied to the developer, and the temperature control method according to the above embodiment is applied thereto. However, the proportional control is also applied to the fixing solution or the stabilizing solution. The temperature adjustment method according to the above embodiment may be applied to this.

  In the above embodiment, the heater 32 is provided for each processing tank and is independently controlled, while the cooling fan 36 is provided for each of the three types of processing tanks so as to be centrally controlled. However, a cooling fan may be provided for each processing tank so as to be independently controlled.

  In the above embodiment, the digital exposure type photographic processing apparatus has been described. However, the present invention can also be applied to a so-called analog exposure type photographic processing apparatus that exposes a photographic paper by irradiating a film with light.

  In the above embodiment, the photographic processing apparatus capable of performing both the exposure process and the developing process has been described. However, the present invention can also be applied to a developing apparatus capable of processing only the developing process.

1 is a schematic configuration diagram of a photographic processing apparatus according to the present embodiment. The longitudinal cross-sectional view in the developing tank of the photographic processing apparatus concerning the embodiment is shown. FIG. 2 is a block diagram showing a configuration relating to temperature control of the photographic processing apparatus according to the embodiment. The temperature change state figure of the image development processing liquid at the time of implementing the temperature control method concerning the embodiment is shown. The temperature change state figure of the developing solution at the time of implementing the conventional temperature control method is shown.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 20 ... Development processing part, 21 ... Development tank, 22 ... Fixing tank, 23 ... Stabilization tank, 30 ... Sub tank, 31 ... Liquid temperature sensor, 32 ... Chemical heater, 33 ... Circulation flow path, 34 ... Circulation pump, 35 ... Radiator 36 ... Cooling fan (cooling means), 40 ... Controller, 41 ... Inside temperature sensor (first temperature sensor), 42 ... Outside air temperature sensor (second temperature sensor), 43 ... Control temperature setting unit, 44 ... Temperature controller 45 ... Heater controller 46 ... Fan controller

Claims (5)

  In a development processing apparatus that includes a heater that heats a development processing solution stored in a processing tank for development processing and a cooling unit that cools the development processing solution, and adjusts the temperature of the development processing solution, an atmosphere in the apparatus main body A first temperature sensor for detecting the temperature, a second temperature sensor for detecting the ambient temperature outside the apparatus main body, and cooling according to the atmospheric temperature difference between the inside and outside of the apparatus main body determined from the first and second temperature sensors And a temperature control unit that changes the operating conditions of the means stepwise.   The cooling means is a cooling fan, and the temperature control unit changes the number of rotations of the cooling fan in two stages, that is, when the temperature difference between the inside and outside of the apparatus main body is a predetermined value or more and when it is smaller than that. The development processing apparatus according to claim 1, wherein:   3. The processing tank according to claim 1, wherein the processing tank includes at least a developing tank, a fixing tank, and a stabilization tank, and each processing tank includes a heater, and each processing tank shares one cooling unit. The development processing apparatus according to the description.   For the developer, the first and second temperature ranges are proportional bands, and if the upper limit of the proportional band is exceeded, the heater of the development tank is turned off, while if the lower limit of the proportional band is not reached, the proportional control that turns the heater on. The cooling means turns on if the temperature of any of the developer, the fixing solution, or the stabilizer exceeds a third temperature that is higher than the upper limit of the proportional band, while the fourth temperature is lower than the lower limit of the proportional band. The development processing apparatus according to claim 3, wherein the development processing apparatus is turned off when the value is lower than.   A method for adjusting a temperature of a development processing liquid in a development processing apparatus comprising a heater for heating a development processing liquid stored in a processing tank for the development processing and a cooling fan for cooling the development processing liquid, wherein the first temperature The sensor detects the ambient temperature inside the device body, and the second temperature sensor detects the ambient temperature outside the device body. If the ambient temperature difference between the inside and outside of the device body is greater than or equal to the specified value, the rotation speed of the cooling fan is reduced. The method for adjusting the temperature of the developing solution, wherein

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