JP2006119150A - Sample preparation device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a sample preparation device of small occupied area for large diameter wafers, realizing miniaturization of devices, equipped with an introductory means of a TEM holder, to which test pieces of several microns adhere without pressure increase or contamination in vacuum vessels, and having a sample chamber of the required minimum volume enabling quick observation. <P>SOLUTION: The sample preparation device comprises a sample stage mounting samples; a charged particle beam irradiating optical system; a secondary particle detecting means for detecting secondary particles generated through irradiation of a charged particle beam; a sample piece separating means for separating sample pieces from the sample; a cassette for storing the sample; a sample transferring means for transferring the sample concerned from the cassette to the sample stage; a sample holder for fixing the sample pieces; a sample mounting section for fixing the sample holder; a cartridge for holding the sample mounting section and having a detachable constitution with a sample stage body section; a cartridge station for housing the cartridge; and a transfer means for transfer the desired cartridge from the cartridge station to the sample stage. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a sample preparation apparatus that uses a charged particle beam and transfer means to extract only a portion necessary for analysis and observation from a sample substrate and process the sample into a shape suitable for analysis and observation.

As semiconductor devices are highly integrated, transmission electron microscopes (hereinafter referred to as TEM in the present specification) with high observation resolution are promising as means for analyzing, observing, and evaluating electronic elements.
As a sample preparation method for TEM, means utilizing a focused ion beam (hereinafter referred to as FIB in this specification) disclosed in, for example, Japanese Patent Application Laid-Open No. 2774884 has been devised. In this means, under the focused ion beam observation, a side entry type sample stage with a sample piece attached is loaded into the sample stage fine movement means and introduced into the vacuum vessel. The side entry type sample stage can be taken in and out of the vacuum container without exposing the inside of the vacuum container to the atmosphere. After this, the region including the desired observation part of the sample piece is FIB processed to a desired size of several μm to several tens of μm, and then the probe moving mechanism is driven to bring the probe into contact with the corresponding sample piece. Then, after temporarily holding, the side entry type sample stage is pulled out and another side entry type sample stage equipped with a TEM holder is introduced. After exchanging the side entry type sample stage, the sample piece held by the probe of the probe moving mechanism is fixed by forming a deposition film on the TEM holder. After fixing, it is a means for TEM observation by pulling it out from the vacuum vessel and loading it into a TEM device.
Japanese Patent Laid-Open No. 2774884

When the above-described sample preparation apparatus effective as a means for evaluating fine electronic elements is applied to an apparatus for handling a large-diameter semiconductor wafer that has been accelerated in recent years, the following problems to be solved arise.
FIG. 10 shows an example of a conventional sample preparation apparatus.
A side-entry type sample stage equipped with a sample holder, in particular a TEM holder, holds a sample, in this example a micro sample piece taken out from a semiconductor wafer, by a sample piece separation means, and after it is molded, it is loaded into the TEM as it is. It is an indispensable mechanical element for a sample preparation device that enables rapid analysis. When the side entry type sample stage is applied to a sample preparation apparatus corresponding to a large-diameter sample, a configuration is adopted in which the side entry type sample stage is incident on the wafer horizontally. In this case, it is necessary to extend the side entry type sample stage to the vicinity of the center of the optical axis of the charged particle beam, but the side entry type sample stage becomes long and the compatibility with the above-mentioned TEM is impaired. For this reason, the operator is forced to move the TEM holder on which the sample piece of several μm is fixed to the side entry type sample stage for TEM using tweezers or the like. Imposed and impractical. In such a configuration, the mechanical parts of the fine movement mechanism of the side entry type sample stage are arranged in the container, but these mechanical parts must be placed outside the movable range of the stage. For this reason, the vacuum container will follow further enlargement. An increase in the size of the vacuum vessel causes an increase in the area occupied by the apparatus, an increase in weight, an increase in cost, and an increase in the size of the exhaust means of the vacuum vessel.

  As a countermeasure against the above, there may be a plan to include a transport means 75 for transporting the side entry type sample stage 19 itself into the sample chamber 25 as shown in FIG. 10, but a dedicated and long transport device 75 is required. In addition to increasing the size of the device, introducing a side-entry sample stage that is basically handled by a tentacle into the sample chamber 25 causes problems such as increased pressure in the sample chamber 25 and contamination. become. Basically, only one TEM holder 2 (not shown) can be mounted on one side entry type sample stage 19. Therefore, one side entry type sample stage 19 is required for a minute sample piece 1 (not shown) from one wafer 29, and an operator prepares a plurality of side entry type sample stages 19 and the wafer 29 Each time is changed, a complicated operation of taking the side entry type sample stage 19 into and out of the sample chamber 25 is required, which is not realistic.

  An object of the present invention is to provide a TEM holder introducing means that realizes miniaturization of the apparatus and is free from an increase in pressure in the vacuum vessel or contamination, and to which a sample piece of several μm is fixed. It is an object of the present invention to provide a small-sized sample preparation apparatus having a small occupying area and having an operability equivalent to that of the prior art.

The object as described above is achieved by adopting the following configuration.
(1) a container, a sample stage on which a sample stored in the container is placed, a charged particle beam irradiation optical system, and secondary particle detection means for detecting secondary particles generated by irradiation of the charged particle beam; A sample preparation apparatus comprising: a sample piece separating means for separating a sample piece from the sample; a cassette for storing the sample; and a sample transfer means for transferring the sample from the cassette to the sample stage. A sample holder for fixing the piece, a sample mounting portion for fixing the sample holder, a cartridge that holds the sample mounting portion, and is configured to be detachable from the side entry type sample stage main body, and a cartridge for storing the cartridge And a transfer means for transferring the desired cartridge from the cartridge station onto the sample stage from the outside of the container.

By adopting this configuration, the vacuum container can be made the minimum necessary volume that is bound to the sample stage, and since there is no protruding portion, the apparatus can be miniaturized. Further, there is provided a sample preparation apparatus provided with a TEM holder introducing means to which a sample piece of several μm is fixed without an increase in pressure in the vacuum vessel or contamination.
(2) A container, a sample stage on which a sample stored in the container is placed, a first charged particle source, and a part of the sample from the charged particle beam from the first charged particle source are separated. Irradiating the sample piece or the sample with an irradiation optical system for processing and forming the sample piece, the sample piece separation means, a second charged particle source, and a charged particle beam from the second charged particle source A second irradiation optical system, secondary particle detection means for detecting secondary particles generated by irradiation with the first or second charged particle beam, a sample holder for fixing the sample piece, and the sample holder A sample mounting unit for fixing the sample mounting unit, a cartridge configured to be removable from the sample stage main body unit, a cartridge station for storing the cartridge, and a desired cartridge from the cartridge station. Sample stay Above, comprising a transfer means for transferring from the outside of the container.

By adopting this configuration, the vacuum container can be made the minimum necessary volume that is bound to the sample stage, and since there is no protruding portion, the apparatus can be miniaturized. Further, there is provided a sample preparation apparatus provided with a TEM holder introducing means to which a sample piece of several μm is fixed without an increase in pressure in the vacuum vessel or contamination.
(3) The first charged particle source, the first irradiation optical system, the second charged particle source, and the second irradiation optical system are located on the sample mounting surface of the sample stage. And relatively inclined.

By adopting this configuration, the vacuum container can be made the minimum necessary volume that is bound to the sample stage, and since there is no protruding portion, the apparatus can be miniaturized. Further, there is provided a sample preparation apparatus provided with a TEM holder introducing means to which a sample piece of several μm is fixed without an increase in pressure in the vacuum vessel or contamination.
(4) An arc-shaped elastic body is interposed between the cartridge and the side entry type sample stage main body, and the cartridge and the side entry type sample stage are coupled via the elastic body.

By adopting this structure, the operator does not need to operate a very small diameter screw that is forced to be damaged or lost, and the cartridge and the side entry type sample stage can be operated only by simple “insertion” and “extraction” operations. Can be removed.
(5) Since the side entry type sample stage has a degree of freedom of rotation in which the sample holder rotates, a side entry type sample stage having compatibility with a TEM can be provided.

By adopting this configuration, an operator can prepare samples and analyze efficiently without preparing complicated operations by preparing at least one side entry type sample stage and a plurality of cartridges.
(6) Provide a storage stand for holding and storing a TEM holder separately from the cartridge.
By adopting this configuration, reanalysis can be performed at any time without damaging a large amount of valuable TEM samples.
(7) A plurality of cartridges are loaded on the cartridge station, and a discrimination means for each cartridge is provided.

By adopting this configuration, the operator can easily organize and supervise a plurality of sample pieces.
(8) The side entry type sample stage is a focused charged particle beam device, a projection charged particle beam device, a transmission electron microscope, a scanning electron microscope, a scanning probe microscope, an Auger electron spectroscopic analyzer, an electron probe X-ray microanalyzer. At least one of an electron energy deficiency analyzer, a secondary ion mass spectrometer, a neutral particle ionization mass spectrometer, an X-ray photoelectron spectrometer, or an electric measurement device using a probe can be loaded. By adopting this configuration, all analyzes can be performed quickly and reliably without forcing the operator to transfer the TEM holder by tweezers.

  It is equipped with a TEM holder introduction means to which a sample piece of several μm that does not increase in pressure in the vacuum vessel and does not contaminate is fixed, and it can be quickly combined with a side entry type sample stage compatible with TEM. It is possible to realize a sample preparation apparatus for a large-diameter wafer having a minimum required sample chamber volume and a small occupied area that enables easy observation.

FIG. 1 shows a side entry type sample stage according to the present invention, and is a view for explaining a coupling state of a side entry type sample stage main body and a cartridge. In addition, in the code | symbol shown to this specification below, it has shown that the member using the same code | symbol is a member which has an equivalent function. In the side entry type sample stage 17 of the present invention, the TEM holder 2 to which the sample piece 1 is fixed is placed, and the cartridge body 4 holding the tilted sample stage 3 is formed as the side entry type sample stage 17 body. The first feature is that the coupling is made through the elastic body 6 disposed inside the outer frame 5. By adopting this configuration, the cartridge body 4 can be simply “inserted” with the outer frame 5, the long hole 8 arranged in the drive shaft 7 and the phase of the rotation pin 10 provided in the rotation shaft 9 being matched. Detachment is possible only by the very simple operation of “pull out”. Therefore, since it is not necessary to operate the ultra-small diameter screw that was generally required for such detachment operations, a special tool is required without forcing the operator to feel the tension or damage of the ultra-small diameter screw. It is possible to perform the detaching operation safely and surely.
FIG. 2 shows a top view and a longitudinal sectional view showing a side entry type sample stage of the present invention. The side entry type sample stage 19 of the present invention has a second feature in that the inclined sample stage 3 has a degree of freedom of inclination while allowing the cartridge 17 to be attached and detached.

The cartridge 17 is coupled and held to the outer frame 5 via the elastic body 6 as described above. When the cartridge 17 is inserted into the outer frame 5, the rotation shaft 9 of the cartridge 17 is pressed leftward by the drive shaft 7, and the rotation restraining pin 11 fixed to the rotation shaft 9 can be rotated, that is, the cartridge body. Moves to the position of the long hole 20 arranged in the circumferential direction of 4. The tilted sample stage 3 is tilted through the following steps. The rotational motion of the drive shaft 7 coupled to the drive source 12 is transmitted to the rotary shaft 9 via the rotary pin 10. An inclined eccentric shaft 13 is fixed at an eccentric position with respect to the rotation center of the rotating shaft 9, and the other end of the eccentric shaft 13 is in contact with the inclined sample stage 3. The tilted eccentric shaft 13 also rotates and moves according to the rotation angle of the rotating shaft 9, but because of the eccentricity, the tilted sample stage 3 is accompanied by a vertical movement around the tilted shaft 14, resulting in As described above, the tilted sample stage 3 is tilted and moved about the tilt axis 14 as a rotation center. Further, the inclined sample stage 3 is always given a counterclockwise rotational force by a spring (not shown) and is always in contact with the inclined eccentric shaft 13. Therefore, the tilt of the tilted sample stage 3 in the counterclockwise direction can be tilted in the counterclockwise direction of the page as the tilted eccentric shaft 13 moves in the upward direction on the sheet. According to the present invention, for example, during TEM observation, the sample piece 1 can be arbitrarily tilted, so that the observation direction can be easily adjusted, and quick and comfortable observation can be performed.
FIG. 3 is a top view (FIG. 3a) and a longitudinal sectional view (FIG. 3b) of only the cartridge. A third feature of the side entry type sample stage 19 of the present invention is that the posture of the tilted sample stage 3 is maintained even with the cartridge 17 alone. In the state of the cartridge 17 alone, the rotation shaft 9 is pressed to the right in the drawing by the spring 15, and the rotation restricting pin 11 fixed to the rotation shaft 9 is also formed in the V-shaped groove 16 provided in the cartridge body 4. Pressed. At this time, the eccentric shaft 13 fixed to the rotating shaft 9 also moves in parallel on the tilted sample table 3 to the extent that it does not come off the tilted sample table 3 as the rotating shaft 9 moves. Therefore, the tilted sample stage 3 is automatically constrained in its degree of freedom of rotation only by the “pulling” operation from the side entry type sample stage 19 of the cartridge 17.

The side entry type sample stage 19 having the tilt degree of freedom, which has been described above, can be easily detached from the side entry type sample stage 19 only by the cartridge 17 holding the tilted sample stage 3 on which the TEM holder 2 is placed. The entry type sample stage 19 is an important element for a sample preparation apparatus for a large-diameter wafer.
In addition, when removing and installing the cartridge 17, the cartridge can be handled using a dedicated tool for gripping the cartridge as shown in Fig. 4 so that it can be removed more safely and without damaging valuable specimens. Can be done. This jig can hold the cartridge 17 securely and without touching the vicinity of the tilted sample stage 3 by grasping the upper and lower claws 21 and sandwiching the cartridge 17 therebetween. When the cartridge is released, the claw 21 is rotated about the rotation shaft 23 by the reaction force of the leaf spring 22 by adjusting the force for grasping the claw 21, and the claw 21 is separated from the cartridge 17.

FIG. 5 is a top view of the sample preparation apparatus showing the first embodiment of the present invention.
In the sample preparation apparatus of this embodiment, the entire apparatus is covered with a casing 24, and a sample chamber 25, a wafer transfer chamber 26, a cartridge transfer chamber 27, and an atmospheric transfer device 28 are accommodated in the casing 24.
The inside of the sample chamber 25 is kept in a vacuum state, and a sample stage 30 on which a wafer 29 is loaded and driven is stored. A fine sample piece 1 (not shown) is taken out from the wafer 29 in the upper part of the sample chamber 25, and transferred from the probe moving mechanism 31 for transferring to the TEM holder 2 (not shown) and the deposition gas forming deposition gas source 32. Sample piece separating means, mainly an ion beam source for irradiating the wafer with a focused ion beam for cutting out a minute sample piece 1 (not shown) from the wafer 29, an ion beam optical system 33 comprising an ion beam irradiation system, and ion beam irradiation A secondary particle detector 36 for detecting secondary particles generated by the electron beam, an electron source 37 for irradiating the wafer with an electron beam for observing the surface of the wafer 29, an electron beam optical system 39 comprising an electron beam irradiation system 38, A secondary particle detector 40 for detecting secondary particles generated by irradiation is mounted. On the side surface of the sample chamber 25, there is a transfer chamber 26 for storing a wafer transfer mechanism 41 (not shown) for transferring the wafer 29 to the sample stage 30 via a valve a45 (not shown) capable of hermetically shielding. Adjacent. In this embodiment, the semiconductor wafer 29 is transferred onto the sample stage 30 with the wafer cassette 42 being held on the wafer cassette 42. The supply of the wafer 29 from the cassette 43 to the wafer transfer mechanism 41 (not shown) is performed using the atmospheric transfer device 28, and is opposed to the atmospheric transfer device 28 via the valve b46. The wafer transfer chamber 26 is also characterized by the sample preparation apparatus of the present invention in that the cartridge transfer chamber 27 is adjacent to the wafer transfer chamber 26 via a valve c44 (not shown) capable of hermetically shielding.

  In the cartridge transfer chamber 27, a cartridge station 47 for storing a plurality of cartridges 17, a cartridge transfer mechanism for moving the cartridge 17 between the cartridge station 47 and the wafer cassette 42, and transferring the cartridge 17 to the wafer cassette 42 Contains 48. By being adjacent to the wafer transfer chamber 27, the transfer of the cartridge 17 to the wafer cassette 42 can be performed at the same time as the replacement time of the wafer 29. Therefore, the cartridge transfer chamber 27 has an atmospheric specification.

  FIG. 6 shows an embodiment of the automatic chucking means for the cartridge used in the sample preparation apparatus shown in FIG. An air cylinder 49 including a piston 51, a cylinder 52, a seal 53, and a linear guide 54 is disposed on the chuck base 50 at a position sandwiching the cartridge 17 from both sides. The chuck base 50 is coupled to the cartridge transfer mechanism shown in FIG. The cartridge transfer mechanism 48 will be described later. Supply of compressed air or the like to the cylinder 52 is performed from an air passage 55 connected to the two cylinders 52. The cartridge 17 is held in the following process. With the piston 51 in the retracted position, the cartridge transfer mechanism 48 advances the chuck base 50 to a predetermined position on the cartridge 17 side. After the movement is completed, compressed air is supplied to the air passage 55 and the piston 51 is pushed out, whereby the cartridge 17 is sandwiched and held. The cartridge 17 is held by a holder 56 installed in the cartridge station 47 via the elastic body 6 shown in FIG. Therefore, after gripping the cartridge 17, the cartridge base 50 can be taken out from the cartridge station 47 only by moving the chuck base 50 straightly downward by the cartridge transfer mechanism 48. Conversely, when the cartridge 17 is transferred to the holder 56, the following steps are taken. In a state where the cartridge 17 is held, the cartridge 17 is inserted into the holder 56 using the cartridge transfer mechanism 48. After insertion, the internal pressure of the air passage 55 is switched to a negative pressure. The piston 51 is pulled back in the direction away from the cartridge 17 (retracted position), and the cartridge 17 is released from the chuck base 50.

  FIG. 7 shows an embodiment of the cartridge transfer mechanism. The chuck base 50 is fixed to a turntable 57 (not shown) and can be rotated by a drive source 58. The drive source 58 is held on the first rectilinear moving table 59. The linear moving table 59 also holds a nut 61 that engages with the feed screw 60. The rectilinear moving table 59 is monitored by a rotation angle detector 63 that detects the amount of rotation of the feed screw 60 rotated by another drive source 62 (not shown), and moves along the rectilinear path 64 by a predetermined amount. To do. The feed screw 60, the straight track 64, the drive source 62, and the rotation angle detector 63 are held by the first base 65. Similarly, the first base 65 is held on a second rectilinear moving table 66 (not shown). The second linear moving table 66 also holds a nut 61 that engages with the feed screw 60. The second rectilinear moving table 66 is monitored by a rotation angle detector 63 that detects the amount of rotation of the feed screw 60 rotated by the drive source 62, and moves along the rectilinear trajectory 64 by a predetermined amount. The transfer of the cartridge 17 from the cartridge station 47 to the wafer cassette 42 takes the following steps. The chuck base 50 is rotated so as to face the cartridge station 47. Next, the chuck base 50 is driven by the second linearly moving table 66 so as to face the holder 56 holding the desired cartridge 17. After the opposing movement, the first linear movement table 59 is driven to move the chuck base 50 straight to a predetermined position on the cartridge 17 side, and the cartridge 17 is gripped by the above-described means. After gripping, the first rectilinear moving table 59 is returned to its original position and then rotated, the chuck base 50 is opposed to the wafer cassette 42 side, and then the second rectilinear moving table 66 is driven to It is made to oppose the holder 56 installed in the. The holder 56 houses therein an elastic body 6 (not shown). After the opposing movement, the valve c44 is released, the first rectilinear moving table 59 is driven, and the chuck base 50 enters a predetermined amount toward the holder 56 on the wafer cassette 42. After entering, the cartridge 17 is released from the chuck base 50 by the means described above, and the chuck base 50 is driven back to the position before entering by driving the first rectilinearly moving table 59. Next, the valve c44 is closed. With the above operation, the desired cartridge 17 on the cartridge station 47 can be automatically transferred to the holder 56 on the wafer cassette 42.

Thereafter, the inside of the wafer transfer chamber 26 is evacuated, and after reaching a predetermined pressure, the valve a45 (not shown) is released, and a wafer cassette holding the wafer 29 and the cartridge 17 on the sample stage 30 inside the sample chamber 25. Transfer 42. After the transfer, a sample piece 1 (not shown) at a desired position on the wafer 29 is removed from the wafer 29 mainly by using the probe moving mechanism 31 by the method disclosed in Japanese Patent Laid-Open No. 2774884. Transfer to holder 2 and fix.
At this time, since the posture of the tilted sample stage 3 holding the TEM holder 2 is fixed as described above, it can be performed safely and reliably without damaging the valuable sample piece 1. After a series of inspections and analysis, the transfer of the wafer cassette 42 from the sample stage 30 to the wafer transfer chamber 26 and the transfer from the wafer cassette 42 to the cartridge station 47 of the cartridge 17 are the reverse of the above-described steps. After that.

By adopting this configuration, it is possible to eliminate the mechanical parts that protrude outside the housing, and the sample chamber can have the minimum volume required for the sample stage. It is possible to realize a sample preparation apparatus that is minimized.
In addition, by adopting a cartridge transfer mechanism that is synchronized with the wafer transfer process by placing the cartridge transfer mechanism adjacent to the transfer chamber, the cartridge transfer mechanism can be made to be mechanical specifications for the atmosphere. A transfer mechanism with high reliability and excellent maintainability can be provided.

  In addition, by installing the cartridge on the wafer cassette used for the wafer and transporting it to the sample chamber, the transport mechanism to the sample chamber can be unified, and there is no increase in pressure or contamination in the sample chamber, and it is inexpensive. Highly reliable cartridges and wafers can be transferred.

The cartridge station 47 can be safely taken out of the housing 24 by opening the window 67 provided on the side surface of the housing 24 for each cartridge station 47. The cartridge 17 on the cartridge station 47 is coupled to the outer frame 5 of the side entry type sample stage 19 by using the above-described means, and can perform reliable observation in detail and quickly with, for example, a TEM. Further, the tilted sample stage 3 on the cartridge 17 is performed in a state in which the posture thereof is maintained in the transfer process from the cartridge station 47 to the wafer cassette 42 and the sample stage 30. As described above, after TEM observation, for example, the fixed side entry type sample stage 68 of another FIB apparatus as shown in FIG. Become. This means that the operator does not need to transfer the TEM holder 2 with tweezers or the like when the sample piece 1 is additionally processed after TEM observation. After the cartridge 17 is transferred, the side entry type sample stage 68 is loaded into the FIB device 69 (not shown), so that the position of the sample piece 1 can be easily indexed and the desired additional processing can be performed quickly. .
In addition, for example, by managing recognition means such as numbers on the holder 56 on the cartridge 17 or the cartridge station 47, it becomes possible to assist the operator in organizing and supervising a plurality of sample pieces.

In the embodiments described above, the sample preparation apparatus having two optical systems of the electron beam optical system and the ion beam optical system has been described. However, the present invention is not limited to two, and only the ion beam optical system is mounted. The sample preparation apparatus can be applied without any problem, and in this case, the same effects as those described above can be obtained.
FIG. 8 shows an embodiment of a storage table 70 for storing the TEM holder 2 to which the sample piece 1 is fixed. Although it can be stored in the state of the cartridge 17, it is for separately storing a sample piece 1 with a low analysis frequency or a valuable sample piece. Use the following procedure. The operator operates the screw 71 in advance and pushes the screw 71 leftward in the drawing to create a gap between the clamp 72 and the storage base body 73. Although the TEM holder 2 is inserted into this gap, there is no risk of dropping because the TEM holder 2 has a protruding portion on the sample base body 73. After the insertion, the operator operates the screw 71 and retracts the screw 71 in the right direction on the paper surface, whereby the clamp 72 is pressed toward the storage base body 73 by the spring 74, and as a result, the TEM holder 2 is fixed. According to this embodiment, it is possible to safely store a valuable sample piece without damaging it. There is no problem even if the storage table is placed in a clean atmosphere, for example, in a gas atmosphere or a vacuum atmosphere.

It is drawing explaining the coupling | bonding state of a cartridge in the side entry type | mold sample stage of this invention. It is the top view and sectional drawing which show the side entry type | mold sample stage of this invention. It is the top view and sectional drawing explaining the cartridge of this invention. It is drawing explaining the jig | tool which holds the cartridge of this invention. It is a top view explaining the sample preparation apparatus of this invention. It is drawing explaining the cartridge automatic chuck mechanism of this invention. It is drawing explaining the cartridge transfer mechanism of this invention. It is sectional drawing explaining the state which the cartridge of this invention and the fixed type | mold side entry type | mold sample stage couple | bonded. It is a perspective view explaining the storage stand of the TEM holder of this invention. It is a top view explaining the conventional sample preparation apparatus.

Explanation of symbols

1. . . Sample piece, 2. . . 2. TEM holder, . . 3. Inclined sample stage, . . 4. Cartridge body . . Outer frame, 6. . . 6. an elastic body; . . Drive shaft, 8. . . 8. long hole, . . Rotation axis, 10. . . Rotating pin, 11. . . Rotation restraint pin, 12. . . Drive source, 13. . . Tilted eccentric shaft, 14. . . Tilt axis, 15. . . Spring, 16. . . V-groove, 17. . . Cartridge, 18. . . 18. Side entry type sample stage body, . . Side entry type sample stage, 20. . . Slot, 21. . . Nails, 22. . . Leaf spring, 23. . . Rotation axis, 24. . . Housing, 25. . . Sample chamber, 26. . . Wafer transfer chamber, 27. . . Cartridge transfer chamber, 28. . . Atmospheric transfer device, 29. . . Wafer, 30. . . Sample stage, 31. . . Probe moving mechanism, 32. . . Depogas source, 33. . . Ion beam optical system, 34. . . Ion source, 35. . . Ion beam irradiation system, 36. . . Secondary particle detector, 37. . . Electron source, 38. . . Electron beam irradiation system, 39. . . Electron beam optics, 40. . . Secondary particle detector, 41. . . Wafer transfer mechanism, 42. . . Wafer cassette, 43. . . Cassette, 44. . . Valve c, 45. . . Valve a, 46. . . Valve b, 47. . . Cartridge station, 48. . . Cartridge transfer mechanism, 49. . . Air cylinder, 50. . . Chuck base, 51. . . Piston, 52. . . Cylinder, 53. . . Seal, 54. . . Straight guidance, 55. . . Airway, 56. . . Holder, 57. . . Turntable, 58. . . Drive source, 59. . . First straight moving platform, 60. . . Feed screw, 61. . . Nut, 62. . . Drive source, 63. . . Rotation angle detector, 64. . . Straight track, 65. . . First base, 66. . . Second straight moving platform, 67. . . Window, 68. . . 69. Fixed side entry type sample stage . . FIB apparatus, 70. . . Storage stand, 71. . . Screw, 72. . . Clamp, 73. . . Holding base body, 74. . . Spring, 75. . . Conveying means.

Claims (5)

  A container, a sample stage on which a sample housed in the container is placed, a charged particle beam irradiation optical system, secondary particle detection means for detecting secondary particles generated by irradiation of the charged particle beam, and the sample In a sample preparation apparatus comprising a sample piece separating means for separating a sample piece from a sample, a cassette for storing the sample, and a sample transfer means for transferring the sample from the cassette to the sample stage, the sample piece is fixed A sample holder that holds the sample holder for fixing the sample holder and is detachable from the side entry type sample stage main body, a cartridge station that stores the cartridge, and a desired cartridge from the cartridge station. A sample preparation apparatus comprising transfer means for transferring a cartridge onto the sample stage.   Separating a part of the sample from a container, a sample stage on which a sample stored in the container is placed, a first charged particle source, and a charged particle beam from the first charged particle source; Irradiation optical system for forming the sample piece, the sample piece separation means, a second charged particle source, and a second charged particle beam from the second charged particle source are applied to the sample piece or the sample. An irradiation optical system, secondary particle detection means for detecting secondary particles generated by irradiation of the first or second charged particle beam, a sample holder for fixing the sample piece, and fixing the sample holder A cartridge that holds the sample placement unit and is detachable from the side entry type sample stage main body, a cartridge station that houses the cartridge, and a desired cartridge from the cartridge station onto the sample stage. Specimen preparation apparatus characterized by comprising a transfer means for.   3. The side entry type sample stage according to claim 1, wherein the cartridge and the side entry type sample stage main body are coupled via an arc-shaped elastic body.   3. The side entry type sample stage according to claim 1, wherein the sample mounting portion has a degree of freedom of rotation. 3. The cartridge station according to claim 1, wherein the cartridge station is a cartridge station capable of stacking a plurality of cartridges, and is provided with a discriminating means for discriminating the plurality of cartridges. Sample preparation device.

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