JP2006092659A - Manufacturing method of magnetic recording medium, and magnetic recording medium - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a magnetic recording medium in which a recording layer is formed with a irregular pattern, a surface is sufficiently flat, and a good recording/reproducing property can be obtained surely, and a manufacturing method of the magnetic recording medium by which such the magnetic recording medium can be manufactured efficiently. <P>SOLUTION: A continuous recording layer of a processed body in which a conduction layer 38, a continuous recording layer, and an insulation layer are formed in this order on a substrate 22 are processed to an irregular pattern, after a recording essential element 24A is formed so that the insulation layer is left at a convex part of the irregular pattern and the conduction layer 38 is exposed at a bottom part of a concave part 26 of the irregular pattern, a non magnetic material 28 is filled in the concave part 26 using a CVD method in which the nonmagnetic material 28 of which the main component is either of tungsten or aluminum is selectively piled upon the conduction layer 38 exposed at the bottom part of the concave part 26. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a method of manufacturing a magnetic recording medium in which a recording layer is formed in a predetermined concavo-convex pattern and a recording element is formed as a convex portion of the concavo-convex pattern, and the magnetic recording medium.

  Conventionally, a magnetic recording medium such as a hard disk has been remarkably improved in surface recording density by improving the fineness of magnetic particles constituting the recording layer, changing the material, miniaturizing the head processing, and the like. Improvements in surface recording density are expected, but problems such as the processing limit of the magnetic head, recording on adjacent tracks due to the expansion of the recording magnetic field of the magnetic head, and crosstalk at the time of reproduction become obvious, and the conventional improved method The improvement of the surface recording density due to is approaching the limit.

  On the other hand, as a candidate for a magnetic recording medium that can realize a further improvement in surface recording density, a discrete track medium in which a recording layer is formed in a concavo-convex pattern and a recording element is formed as a convex part of a concavo-convex pattern, or a pattern A media has been proposed (see, for example, Patent Document 1). For magnetic recording media such as hard disks, the flatness of the surface is important in order to stabilize the flying height of the head. Therefore, the concave portions between the recording elements are filled with a nonmagnetic material to flatten the surface of the recording layer. It is preferable to do.

  As a method for processing the recording layer into the concavo-convex pattern, a processing method such as dry etching can be used. Further, as a method for filling the concave portion with a nonmagnetic material and flattening the surface, a nonmagnetic material is formed so as to fill the concave portion on the recording layer of the concave / convex pattern by sputtering method, IBD (Ion Beam Deposition) method or the like. After film formation, a method of removing the surplus nonmagnetic material by CMP (Chemical Mechanical Polishing) or dry etching and planarizing the surface can be used (for example, refer to Patent Document 2).

JP-A-9-97419 Japanese Patent Laid-Open No. 12-195042

  However, in the CMP method, it is difficult to control the processing amount on the order of nm, and a part of the upper surface of the recording element is removed, or a nonmagnetic material remains on the recording element. May get worse. Further, the CMP method has a problem that it takes a lot of time and cost for cleaning and the like for removing the slurry. Furthermore, since the CMP method is a wet process, when combined with a dry process such as a process for processing the recording layer into a concavo-convex pattern, there is a problem that the conveyance of the workpiece becomes complicated and the efficiency of the entire manufacturing process is reduced. is there.

  On the other hand, in dry etching, the amount of processing can be controlled on the order of nm by performing composition analysis by SIMS (Secondary-Ion Mass Spectrometry). In addition, since dry etching is a dry process, there is no problem such as removal of slurry, and further, production efficiency can be improved by combining with a dry process such as a process of processing the recording layer into a concavo-convex pattern. When flattening by dry etching a nonmagnetic material that is formed in a concavo-convex pattern following the concavo-convex pattern recording layer, for example, between areas with different recording element widths and concavo-convex patterns, such as data areas and servo areas Differences in etching rates are likely to occur, and the surface may not be sufficiently planarized to a desired level.

  Even if the surface is sufficiently flattened to a desired level by using the CMP method or dry etching, the surface of the magnetic recording medium is charged with static electricity and adsorbs foreign matter, which reduces the recording / reproducing accuracy. There was a case.

  The present invention has been made in view of the above problems, and a magnetic recording medium in which the recording layer is formed in a concavo-convex pattern, the surface is sufficiently flat, and good recording / reproducing characteristics can be reliably obtained, and such An object of the present invention is to provide a method of manufacturing a magnetic recording medium that can efficiently manufacture a magnetic recording medium.

  In the present invention, a continuous recording layer of a workpiece having a continuous recording layer formed on a substrate is processed into a concavo-convex pattern, the insulating material is exposed on at least the upper surface of the convex portion of the concavo-convex pattern, and the bottom portion of the concave and convex pattern recess After forming the recording element by processing the continuous recording layer so that the conductive material is exposed to the surface, select a non-magnetic material mainly composed of either tungsten or aluminum on the conductive material exposed at the bottom of the recess The above object is achieved by filling the recess with a non-magnetic material by using a CVD method of depositing automatically.

  That is, in order to fill the recess with the nonmagnetic material, the nonmagnetic material is not uniformly deposited on the recording layer of the concavo-convex pattern as in the prior art, but the nonmagnetic material is selectively filled into the recess. Therefore, the concave / convex pattern of the recording layer hardly remains on the surface of the workpiece filled with the nonmagnetic material in the concave portion, and even if the concave / convex pattern is formed, the step is suppressed to be significantly smaller than the conventional one. The Therefore, the surface can be surely and easily flattened to a desired level by subsequent dry etching or the like.

  The present invention also achieves the above object by using a magnetic recording medium in which the concave portions between the recording elements are filled with a nonmagnetic material containing either tungsten or aluminum as a main component.

  In this way, by filling the recesses between the recording elements with conductive tungsten or aluminum, electrostatic charging is suppressed compared to a magnetic recording medium in which an insulating material is filled in the recesses of the recording elements. The Accordingly, it is possible to suppress a decrease in recording / reproducing accuracy due to the adsorption of foreign matter or the like.

  That is, the above-described object can be achieved by the following present invention.

  (1) Processing the continuous recording layer of a workpiece in which a conductive layer, a continuous recording layer, and an insulating layer are formed in this order on a substrate into a concavo-convex pattern, and the insulating layer remains on the convex portion of the concavo-convex pattern And a recording layer processing step of forming a recording element as a convex portion of the concave-convex pattern so that the conductive layer is exposed at the bottom of the concave portion of the concave-convex pattern, and either CVD or tungsten is mainly used. A non-magnetic material filling step of selectively depositing a non-magnetic material as a component on the conductive layer exposed at the bottom of the concave portion and filling the concave portion with the non-magnetic material. A method of manufacturing a magnetic recording medium.

  (2) In (1), the workpiece is a structure in which a stop film having a processing speed in the recording layer processing step slower than that of the recording layer is formed as the conductive layer. In the recording layer processing step, A method of manufacturing a magnetic recording medium, wherein the workpiece is processed up to the stop film so that the stop film remains in a recess of the concavo-convex pattern.

  (3) Processing the continuous recording layer of the workpiece having the conductive continuous recording layer and the insulating layer formed in this order on the substrate into a concavo-convex pattern, and the insulating layer remains on the convex portion of the concavo-convex pattern And a recording layer processing step of forming a recording element as a convex portion of the concave-convex pattern so that the continuous recording layer is exposed at the bottom of the concave portion of the concave-convex pattern, and any one of tungsten and aluminum by a CVD method. A non-magnetic material filling step of selectively depositing a non-magnetic material mainly composed of the non-magnetic material on the continuous recording layer exposed at the bottom of the concave portion and filling the concave portion with the non-magnetic material. A method of manufacturing a magnetic recording medium.

  (4) In any one of (1) to (3), a flattening step for removing the insulating layer remaining on the recording element and flattening the surface is provided after the nonmagnetic material filling step. A method of manufacturing a magnetic recording medium.

  (5) In any one of (1) to (4), an insulating film forming film is formed on the workpiece between the recording layer processing step and the nonmagnetic material filling step. The insulating step so that the insulating film remains on the side surface of the recording element, the insulating layer remains on the recording element, and the conductive layer is exposed at the bottom of the concave / convex pattern recess. And a method of manufacturing a magnetic recording medium, comprising: an insulating film processing step of partially removing the film.

  (6) Processing the continuous recording layer of the workpiece in which the conductive layer and the insulating continuous recording layer are formed in this order on the substrate into a concavo-convex pattern, and forming a recording element as a convex portion of the concavo-convex pattern A recording layer processing step for exposing the recording element and exposing the conductive layer at the bottom of the concave portion of the concavo-convex pattern, and a non-magnetic material mainly composed of tungsten or aluminum by a CVD method, And a nonmagnetic material filling step of selectively depositing on the conductive layer exposed at the bottom of the recess and filling the recess with the nonmagnetic material.

  (7) In (6), the workpiece is a structure in which a stop film having a processing speed in the recording layer processing step slower than that of the recording layer is formed as the conductive layer. In the recording layer processing step, A method of manufacturing a magnetic recording medium, wherein the workpiece is processed up to the stop film so that the stop film remains in a recess of the concavo-convex pattern.

  (8) The method of manufacturing a magnetic recording medium according to any one of (1) to (7), wherein, in the recording layer processing step, the continuous recording layer is processed into a concavo-convex pattern using ion beam etching.

  (9) A recording layer in which a recording element is formed as a convex part of the concave / convex pattern formed on a substrate with a predetermined concave / convex pattern, and either tungsten or aluminum filled in a concave part between the recording elements. A magnetic recording medium comprising a nonmagnetic material as a main component.

  (10) A magnetic recording / reproducing apparatus comprising: the magnetic recording medium according to (9); and a magnetic head for recording / reproducing data on the magnetic recording medium.

  In the present application, the “recording layer formed with a concavo-convex pattern and the recording elements formed as convex portions of the concavo-convex pattern” means a recording layer in which a continuous recording layer is divided into a large number of recording elements in a predetermined pattern. In addition, the continuous recording layer is formed by partially dividing the recording layer into a predetermined pattern, and a part of the recording layer composed of continuous recording elements, or a spiral spiral recording layer, for example, on the substrate. It is used in the meaning including a recording layer continuously formed on a part of the recording layer and a continuous recording layer in which both convex portions and concave portions are formed.

  In the present application, the term “nonmagnetic material containing tungsten as a main component” is used to mean a nonmagnetic material in which the ratio of the number of tungsten atoms to all constituent atoms is 90% or more. The same applies to “a nonmagnetic material mainly composed of aluminum”.

  In addition, the term “magnetic recording medium” in the present application is not limited to a hard disk, a floppy (registered trademark) disk, a magnetic tape, or the like that uses only magnetism for recording and reading information, and MO (Magneto) using both magnetism and light. It is used in the meaning including a magneto-optical recording medium such as Optical) and a heat-assisted recording medium using both magnetism and heat.

  In the present application, the term “machining speed” is used to mean the machining amount per unit time.

  According to the present invention, it is possible to efficiently manufacture a magnetic recording medium in which a recording layer is formed in a concavo-convex pattern, a surface is sufficiently flat, and good recording / reproducing characteristics can be reliably obtained.

  Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings.

  As shown in FIG. 1, a magnetic recording / reproducing apparatus 10 according to a first embodiment of the present invention includes a magnetic recording medium 12, and a magnetic head 14 for recording / reproducing data on / from the magnetic recording medium 12. It is equipped with. The magnetic recording medium 12 is fixed to the chuck 16 and is rotatable with the chuck 16. The magnetic head 14 is mounted in the vicinity of the tip of the arm 18, and the arm 18 is rotatably attached to the base 20. As a result, the magnetic head 14 is movable in the vicinity of the surface of the magnetic recording medium 12 along an arc orbit along the radial direction of the magnetic recording medium 12. The magnetic recording / reproducing apparatus 10 has a feature in the configuration of the magnetic recording medium 12, and other configurations are not particularly necessary for understanding the present invention. To do.

  The magnetic recording medium 12 is a disc-like perpendicular recording type discrete track medium, and as shown in FIG. 2, the recording element 24A is formed as a convex portion of the concave / convex pattern formed on the substrate 22 with a predetermined concave / convex pattern. The recording layer 24 is formed, and the nonmagnetic material 28 mainly composed of W (tungsten) is filled in the concave portions 26 between the recording elements 24A. The recording element 24A is formed in a concentric track shape with a fine interval in the radial direction in the data area, and FIG. 2 is a side sectional view along the radial direction showing this. The recording element 24A is formed in a predetermined servo information pattern in the servo area (not shown).

The surface of the substrate 22 on the recording layer 24 side is mirror-polished. As a material of the substrate 22, a nonmagnetic material such as glass, NiP-coated Al alloy, Si, Al ₂ O ₃ or the like can be used.

The recording layer 24 has a thickness of 5 to 30 nm. As a material for the recording layer 24, a CoCr alloy such as a CoCrPt alloy, a FePt alloy, a laminate thereof, a material in which ferromagnetic particles such as CoPt are included in a matrix in an oxide material such as SiO _2. A material having a high coercive force, such as, can be used. The recording layer 24 has conductivity. As a method for processing the recording layer 24 into a concavo-convex pattern, a dry etching method such as ion beam etching can be used.

  As described above, the non-magnetic material 28 is mainly composed of tungsten, and has the same conductivity as the recording layer 24.

On the recording element 24A and the nonmagnetic material 28, a protective layer 30 and a lubricating layer 32 are formed in this order. The protective layer 30 has a thickness of 1 to 5 nm. As a material of the protective layer 30, for example, a hard carbon film called diamond-like carbon can be used. In the present application, the term “diamond-like carbon (hereinafter referred to as“ DLC ”)” is mainly composed of carbon, has an amorphous structure, and has a Vickers hardness measurement of about 2 × 10 ⁹ to 8 × 10 ¹⁰ Pa. It is used in the meaning of a material that exhibits hardness. The lubricating layer 32 has a thickness of 1 to 2 nm. As a material of the lubricating layer 32, PFPE (perfluoropolyether), fomblin lubricant, or the like can be used.

  A base layer 34, a soft magnetic layer 36, and an orientation layer (conductive layer) 38 are formed in this order from the substrate 22 side between the substrate 22 and the recording layer 24. The underlayer 34 has a thickness of 2 to 40 nm. As the material of the underlayer 34, Ta or the like can be used.

  The soft magnetic layer 36 has a thickness of 50 to 300 nm. As a material of the soft magnetic layer 36, Fe (iron) alloy, Co (cobalt) amorphous alloy, ferrite, or the like can be used.

  The alignment layer 38 has a thickness of 2 to 40 nm. As the material of the alignment layer 38, a nonmagnetic and conductive CoCr alloy, Cr alloy, Ti, Ru, a laminate of Ru and Ta, or the like can be used. Further, as the material of the alignment layer 38, a material whose processing speed for dry etching such as ion beam etching for processing the recording layer 24 into a concavo-convex pattern is slower than that of the recording layer 24 is used. It is preferable to have a configuration that also serves as a stop film in processing. As will be described later, in the first embodiment, the alignment layer 38 also serves as a conductive layer on which the nonmagnetic material 28 is selectively deposited in the filling process of the nonmagnetic material 28 described later. Layer 36 may be used as a conductive layer. The conductive layer may be provided separately from the alignment layer 38 and the soft magnetic layer 36.

  The magnetic head 14 includes a recording head and a reproducing head (not shown).

  Next, the operation of the magnetic recording / reproducing apparatus 10 will be described.

  In the magnetic recording / reproducing apparatus 10, since the magnetic recording medium 12 is filled with the nonmagnetic material 28 mainly composed of conductive W (tungsten) in the concave portions 26 between the recording elements 24A, the magnetic recording medium 12 is insulated from the concave portions. Static electricity is less likely to be charged than a magnetic recording medium filled with a conductive material. Therefore, good recording / reproducing characteristics can be reliably obtained that are difficult to adsorb foreign matter and the like.

  Further, W is excellent in corrosion resistance and is less likely to be deformed or peeled off over time, so that good recording / reproducing characteristics can be reliably obtained in this respect.

  Further, W is not formed uniformly on the recording layer 24 having a concavo-convex pattern in order to fill the concave portion 26, but is selectively formed in the concave portion 26 by a CVD method as will be described later. Since the magnetic recording medium 12 can be filled, the surface of the magnetic recording medium 12 can be flattened sufficiently and surely to a desired level, and the productivity is good.

  That is, since W can be selectively filled into the concave portion 26 by the CVD method, the use of the nonmagnetic material in the manufacturing process is different from the conventional case where the nonmagnetic material is uniformly formed on the recording layer of the concave / convex pattern. A small amount is sufficient, and less non-magnetic material is removed in the flattening step than in the prior art, so productivity is good.

  Further, since the recording element 24A is formed in a track shape in the data area of the magnetic recording medium 12, even when the surface recording density is high, recording on a track adjacent to the recording target track, crosstalk during reproduction, etc. Problems are less likely to occur.

  Further, in the magnetic recording medium 12, the recording elements 24A are divided, and the recording layer 24 does not exist in the recesses 36 between the recording elements 24A, so that no noise is generated from the recesses 36. Reproduction characteristics can be obtained.

  Next, a method for manufacturing the magnetic recording medium 12 will be described with reference to the flowchart of FIG.

  First, a starting body of the workpiece 40 as shown in FIG. 4 is prepared (S102). Specifically, the processing starting body of the workpiece 40 is the base layer 34, the soft magnetic layer 36, the orientation layer 38, the continuous recording layer 42, the insulating layer 44, the main mask layer 46, and the submask on the substrate 22. The layer 48 is formed by the sputtering method in this order, and the resist layer 50 is further applied by the spin coating method. Note that the resist layer 50 may be applied by dipping.

The insulating layer 44 has a thickness of 1 to 10 nm. As a material of the insulating layer 44, for example, SiO ₂ or the like can be used.

  The main mask layer 46 has a thickness of 3 to 50 nm. As a material of the main mask layer 46, C (carbon), DLC, or the like can be used. The sub mask layer 48 has a thickness of 3 to 30 nm. Ni or the like can be used as the material of the main mask layer 46. The resist layer 50 has a thickness of 30 to 300 nm. The material of the resist layer 50 may be a negative resist or a positive resist.

Next, the concavo-convex pattern corresponding to the shape of the recording element 24A is transferred to the resist layer 50 by the nano-imprint method, and the bottom of the concavo-convex pattern is formed by reactive ion beam etching using O ₂ gas as a reactive gas. The resist layer 50 is removed (S104). The resist layer 50 may be exposed and developed to process the resist layer 50 into a concavo-convex pattern.

  Next, the sub mask layer 48 at the bottom of the recess is removed by ion beam etching using Ar gas as a processing gas (S106).

Next, the main mask layer 46 at the bottom of the recess is removed by reactive ion etching using O ₂ gas as a reaction gas (S108). Thereby, the insulating layer 44 is exposed at the bottom of the recess.

Next, the insulating layer 44 and the continuous recording layer 42 at the bottom of the recess are removed by ion beam etching using Ar gas as a processing gas to form the recording element 24A (S110). At this time, the continuous recording layer 42 at the bottom of the recess is completely removed so that the alignment layer 38 is exposed at the bottom of the recess 26 between the recording elements 24A. Thereby, as shown in FIG. 5, the continuous recording layer 42 is divided into a large number of recording elements 24A, and the recording layer 16 is formed. The main mask layer 46 remaining on the upper surface of the recording element 24A is completely removed by reactive ion etching using O ₂ gas as a reaction gas.

  In the ion beam etching, since the processing speed of the bottom of the recess 26 hardly depends on the width of the recess 26, the recess 26 is uniformly formed on the entire surface of the workpiece 40. As the material of the alignment layer 38, a material whose processing speed for ion beam etching for processing the recording layer 24 into a concavo-convex pattern is slower than that of the recording layer 24, and the alignment layer 38 serves as a stop film for processing the recording layer 24. It is preferable that the configuration also serves as the depth of the concave portion 26 is more uniformly formed on the entire surface of the workpiece 40 more reliably. The processing may be stopped when the upper surface of the alignment layer 38 serving as a stop film is exposed, or the alignment layer 38 may be partially removed in the thickness direction.

  Next, as shown in FIG. 6, W (nonmagnetic material 28) is selectively deposited on the alignment layer (conductive layer) 38 exposed at the bottom of the recess 26 by a CVD (Chemical Vapor Deposition) method. 7, the recess 26 is filled with a nonmagnetic material 28 (S 112). The nonmagnetic material 28 is deposited in the recess 26 so that its upper surface is, for example, about 1 nm higher than the upper surface of the recording element 24A, and the recess 26 is completely filled.

Specifically, the workpiece 40 is held in a chamber (not shown) set to a temperature of 200 to 300 ° C. and a pressure of about 0.1 Pa, and WF ₆ (tungsten hexafluoride) and SiH ₄ (hydrogen). When a mixed gas of silicon hydride) is supplied, the following chemical reaction occurs, and W is selectively deposited on the alignment layer (conductive layer) 38.

WF ₆ (g) + (6 / n) M (s) → W (s) + (6 / n) MF _n (g) ... (I)
2WF ₆ (g) + 3SiH ₄ (g) → 2W (s) + 3SiF ₄ (g) + 6H ₂ (g)… (II)

  In the formulas (I) and (II), M represents a constituent element of the alignment layer 38, and n represents the valence of M. G is a gas and s is a solid. In the chamber, the chemical reactions represented by the formulas (I) and (II) proceed simultaneously. In either chemical reaction, W is selectively deposited on the conductive alignment layer 38 and the insulating layer 44. Does not deposit on top.

  Since the depth of the concave portion 26 is uniform and the deposition of the nonmagnetic material 28 proceeds at the same speed in the thickness direction, the upper surface of the nonmagnetic material 28 has a uniform height in all the concave portions 26 of the workpiece 40. Become.

  In order to fill the recesses 26 with the nonmagnetic material 28 in this way, the nonmagnetic material 28 is not uniformly deposited on the recording layer 24 having a concavo-convex pattern as in the prior art. 26 can be selectively filled, so that a concave / convex pattern following the concave / convex pattern of the recording layer 24 is hardly formed on the surface of the workpiece 40 in which the concave portions 26 are filled with the nonmagnetic material 28, and Even if the concavo-convex pattern is formed, the level difference is suppressed to be significantly smaller than the conventional one.

  Next, an Ar ion beam is irradiated from a direction inclined with respect to the normal of the surface of the workpiece 40 by ion beam etching using Ar gas as a processing gas, and the insulating layer 44 on the recording element 24A. At the same time, the excess nonmagnetic material 28 is removed, and the surfaces of the recording element 24A and the nonmagnetic material 28 are flattened (S114). Here, the “excess nonmagnetic material 28” is used in the meaning of the nonmagnetic material 28 existing above the plane including the upper surface of the recording element 24A (the side opposite to the substrate 22). In the non-magnetic material filling step (S112), the uneven step on the surface of the workpiece 40 is suppressed to be significantly smaller than before, so that the uneven pattern of the recording layer 24 is, for example, a servo region and a data region. Even if there are different regions, the surface of the workpiece 40 can be efficiently and reliably flattened to a desired level using ion beam etching.

  Next, the protective layer 30 is uniformly formed on the upper surfaces of the recording elements 24A and the nonmagnetic material 28 by the CVD method (S116), and the lubricating layer 32 is applied on the protective layer 30 by the dipping method (S118). Thereby, the magnetic recording medium 12 shown in FIG. 1 is completed.

  Next, a second embodiment of the present invention will be described.

  In the second embodiment, as shown in the flowchart of FIG. 8, the workpiece is processed between the recording layer processing step (S110) and the non-magnetic material filling step (S112) as compared with the first embodiment. An insulating film forming step (S202) for forming the insulating film 52 on the body 40, the insulating film 52 remains on the side surface of the recording element 24A, the insulating layer 44 remains on the recording element 24A, and An insulating film processing step (S204) for partially removing the insulating film 52 is provided so that the alignment layer 38 is exposed at the bottom of the concave / convex pattern concave portion. Others are the same as those in the first embodiment, and a description thereof will be omitted.

Specifically, after the recording layer processing step (S110), as shown in FIG. 9, an insulating film 52 is formed to a thickness of 2 to 10 nm on the surface of the workpiece 40 by sputtering (S202). . As the material of the insulating film 52, Al ₂ O ₃ (alumina) or the like can be used. The insulating film 52 is uniformly formed on the insulating layer 44 (on the recording element 24A), on the side surface of the recording element 24A, and on the bottom of the recess 26.

  Next, Ar gas is irradiated from a direction perpendicular to the surface of the workpiece 40 by ion beam etching using Ar gas as a processing gas, as indicated by arrows in FIG. Partial removal is performed (S204). In the ion beam etching, since the processing speed is higher in the portion where the surface is perpendicular to the portion parallel to the irradiation direction of the processing gas, the concave portion is formed so that the insulating film 52 remains on the side surface of the recording element 24A. The insulating film 52 on the bottom of the 26 can be removed. The insulating film 52 on the insulating layer 44 (on the recording element 24A) may be completely removed or may remain on the insulating layer 44.

  Next, as in the first embodiment, by CVD, the W (nonmagnetic material 28) is selectively formed on the alignment layer (conductive layer) 38 exposed at the bottom of the recess 26 as shown in FIG. As shown in FIG. 12, the recess 26 is filled with a nonmagnetic material 28 (S112).

  Since the side surface of the recording element 24A having conductivity is covered with the insulating film 52, the deposition of W does not proceed from the side surface of the recording element 24A, and the thickness of the workpiece 40 is increased from the bottom surface of the recess 26. Proceed with certainty. Therefore, the top surface of the nonmagnetic material 28 is formed in the same flat shape as the bottom surface of the recess 26.

  Next, a third embodiment of the present invention will be described.

The third embodiment is a mixture of WF ₆ and H ₂ instead of the mixed gas of WF ₆ and SiH ₄ as the gas used in the nonmagnetic material filling step (S112), compared to the first and second embodiments. Gas is used. Others are the same as those in the first and second embodiments, and a description thereof is omitted.

  In the third embodiment, the following chemical reaction occurs in the chamber in the non-magnetic material filling step (S112).

WF ₆ (g) + 3H ₂ (g) → W (s) + 6HF (g) ... (III)

  Again, W is selectively deposited on the conductive alignment layer 38 and not on the insulating layer 44. Therefore, also in the third embodiment, similarly to the first and second embodiments, the surface of the workpiece 40 can be efficiently and reliably flattened to a desired level.

  Next, a fourth embodiment of the present invention will be described.

  The fourth embodiment is characterized in that the nonmagnetic material 28 is a material containing Al (aluminum) as a main component as compared with the first and second embodiments. Others are the same as those in the first and second embodiments, and a description thereof will be omitted.

  Since Al has higher conductivity than W, it has a higher effect of suppressing electrostatic charge than the first and second embodiments, and can more reliably prevent adsorption of foreign substances and the like.

  Also, Al, like W, has excellent corrosion resistance, hardly undergoes deformation and peeling over time, and good recording / reproducing characteristics can be reliably obtained.

  Further, Al, like W, is not formed uniformly on the recording layer 24 having a concavo-convex pattern to fill the concave portion 26 as in the prior art. Instead, the concave portion is formed by the CVD method as shown below. 26 can be selectively filled, the surface can be sufficiently and surely flattened to a desired level, and the productivity is good.

In the fourth embodiment, Al (C ₄ H ₉ ) is used in place of the mixed gas of WF ₆ and SiH ₄ in the first and second embodiments as a gas used in the nonmagnetic material filling step (S112). ₃ (Triisobutylaluminum) gas is used. Specifically, the workpiece 40 is held in a chamber (not shown) set to a temperature of 200 to 300 ° C. and a pressure of about 0.1 Pa, and Al (C ₄ H ₉ ) ₃ gas is introduced into the chamber. When supplied, the following chemical reaction occurs, and Al is selectively deposited on the alignment layer (conductive layer) 38 exposed at the bottom of the recess 26.

2Al (C ₄ H ₉ ) ₃ (g) → 2Al (s) + 3H ₂ (g) + 6C ₄ H ₈ (g)… (IV)

  Next, a fifth embodiment of the present invention will be described.

  In the fifth embodiment, as shown in FIG. 13, the magnetic recording medium 60 has a continuous concave-convex pattern in which both recording elements 62A and concave portions 26, which are convex portions, are formed. A recording layer 62 is provided. The nonmagnetic material 28 may be a material mainly containing W, and may be a material mainly containing Al as in the fourth embodiment. The alignment layer 38 may be conductive or insulating. Since other configurations are the same as those in the first embodiment, description thereof is omitted.

  Similarly to the magnetic recording medium 12, the magnetic recording medium 60 is also filled with the nonmagnetic material 28 mainly composed of W or Al having conductivity in the recesses 26 between the recording elements 62A having conductivity. Static electricity is less likely to be charged than a magnetic recording medium in which a concave portion is filled with an insulating material. Therefore, good recording / reproducing characteristics can be reliably obtained that are difficult to adsorb foreign matter and the like. Further, W and Al are excellent in corrosion resistance and are less likely to be deformed or peeled off over time, and in this respect, good recording / reproducing characteristics can be reliably obtained.

  Similarly to the magnetic recording medium 12, the magnetic recording medium 60 is also formed by uniformly applying a material mainly composed of W or Al on the concave-convex pattern recording layer 62 in order to fill the concave portions 26. Productivity is good because the recesses 26 can be selectively filled by CVD instead of forming a film.

  Here, a method for manufacturing the magnetic recording medium 60 will be briefly described along the flowchart of FIG. 3 according to the first embodiment. Note that description of the same steps as those in the first to fourth embodiments is omitted as appropriate.

  First, as in the first embodiment, a starting body manufacturing process (S102), a resist layer processing process (S104), a sub mask layer processing process (S106), and a main mask layer processing process (S108) are executed. As a result, the insulating layer 44 is exposed at the bottom of the recess.

Next, the insulating layer 44 at the bottom of the recess is removed by ion beam etching using Ar gas as a processing gas, and the continuous recording layer 42 is partially removed in the thickness direction to form the recording element 62A (S110). ). That is, the continuous recording layer 42 is processed so that the continuous recording layer 42 remains at the bottom of the recess 26 between the recording elements 62A. As a result, as shown in FIG. 14, the continuous recording layer 42 is formed in which the continuous recording layer 42 is processed into a concavo-convex pattern and a large number of recording elements 62A are formed as convex portions of the concavo-convex pattern. The main mask layer 46 remaining on the upper surface of the recording element 62A is completely removed by reactive ion etching using O ₂ gas as a reaction gas.

  Next, as shown in FIG. 15 by the CVD method in the same manner as in the first to fourth embodiments, a recording layer in which a material mainly composed of W or Al (nonmagnetic material 28) is exposed at the bottom of the recess 26 is used. As shown in FIG. 16, the recess 26 is filled with a nonmagnetic material 28 (S112).

  As in the second embodiment, after the recording layer processing step (S110), the insulating film forming step (S202) and the insulating film processing step (S204) are executed, and then the nonmagnetic material filling step (S112). May be executed.

  Next, similarly to the first embodiment, the flattening step (S114), the protective layer forming step (S116), and the lubricating layer forming step (S118) are executed, thereby the magnetic recording medium 60 shown in FIG. Is completed.

  In the first to fifth embodiments, the insulating layer 44 on the recording elements 24 and 62 and the surplus nonmagnetic material 28 on the recess 26 are completely removed in the planarization step (S114). If these magnetic properties are obtained, a part of them may be left.

  Moreover, in the said 1st-5th embodiment, although the planarization process (S114) is provided after the nonmagnetic material filling process (S112), the to-be-processed object 40 is carried out by the nonmagnetic material filling process (S112). If the surface is sufficiently flattened to a desired level, the flattening step (S114) may be omitted.

In the first to fifth embodiments, ion beam etching using Ar gas is exemplified as dry etching for processing the recording layers 24 and 62 into a concavo-convex pattern. For example, Kr (krypton), Xe The recording layer 24 is formed into a concavo-convex pattern by ion beam etching using another rare gas such as (xenon) or reactive ion etching using a mixed gas of CO (carbon monoxide) and NH ₃ (ammonia) as a reactive gas. It may be processed.

In the first to fourth embodiments, even when the recording layer 24 is processed using such reactive ion etching, as the material of the alignment layer 38, a material whose processing speed is slower than the processing speed of the recording layer 24. With the configuration in which the alignment layer 38 also serves as a stop film, the effect of making the depth of the recess 26 uniform over the entire surface of the workpiece 40 can be obtained. In the case of using reactive ion etching using a mixed gas of CO and NH ₃ as a reaction gas, as a specific material of the alignment layer 38 also serving as a stop film, a laminated body of Cr alloy, Ti, Ru, Ru and Ta, etc. Can be used.

  Further, in the first embodiment, as the material of the alignment layer 38, a material whose processing speed for dry etching such as ion beam etching for processing the recording layer 24 into a concavo-convex pattern is slower than that of the recording layer 24 is used. In the first to fourth embodiments, the alignment layer 38 is disposed between the alignment layer 38 and the soft magnetic layer 36. In the first to fourth embodiments, the alignment layer 38 is used as a stop film for processing the recording layer 24. 38, a stop film that also serves as a conductive layer, which is separate from the recording layer 24, has conductivity, and has a slower processing speed for dry etching such as ion beam etching for processing the recording layer 24 into a concavo-convex pattern than the recording layer 24. It may be formed.

  On the other hand, if the depth of the concave portion 26 can be processed sufficiently even without a stop film, the processing speed for dry etching such as ion beam etching for processing the recording layer 24 into a concavo-convex pattern can be recorded as the material of the alignment layer 38. A material equivalent to the layer 24 or faster than the recording layer 24 may be used.

In the first to fifth embodiments, SiO ₂ is exemplified as the material of the insulating layer 44, and Al ₂ O ₃ is exemplified as the material of the insulating film 52. For example, the material of the insulating layer 44 is exemplified. Al ₂ O ₃ may be used, and SiO ₂ may be used as the material of the insulating film 52, and other insulating materials may be used as the material of the insulating layer 44 and the insulating film 52.

  In the first to fourth embodiments, a conductive material is used as the material for the alignment layer 38, and the nonmagnetic material 28 is selectively deposited on the alignment layer 38 exposed at the bottom of the recess 26. However, an insulating material may be used as the material of the alignment layer 38, and the conductive layer may be formed separately from the alignment layer 38 between the alignment layer 38 and the soft magnetic layer 36. In this case, in the recording layer processing step (S110), the concave alignment layer 38 may be completely removed and the conductive layer separate from the alignment layer 38 may be exposed from the bottom surface of the concave 26.

  In the first to fifth embodiments, an insulating layer 44, a main mask layer 46, a sub mask layer 48, and a resist layer 50 are formed on the continuous recording layer 42 on the continuous recording layer 42, and three-stage dry etching is performed. However, as long as the continuous recording layer 42 can be divided with high accuracy, the material of the resist layer and the mask layer, the number of stacked layers, the thickness, the type of dry etching, and the like are not particularly limited. For example, the insulating layer 44 may also serve as the main mask layer.

  In the first to fifth embodiments, the material of the recording layers 24 and 62 (continuous recording layer 44) is a CoCrPt alloy or an FePt alloy. As the material of the recording layers 24 and 62, for example, an iron group element ( Other materials such as other alloys including Co, Fe (iron), and Ni), and laminates thereof may be used.

  Further, as in the sixth embodiment of the present invention described below, an insulating magnetic material such as oxide or nitride may be used as the material of the recording layer 24. Hereinafter, the manufacturing method of the magnetic recording medium 12 according to the sixth embodiment will be briefly described. The steps other than the recording layer processing step (S110) and the nonmagnetic material filling step (S112) are the same as those in the first embodiment. Since it is the same, description will be omitted as appropriate. In the sixth embodiment, since the magnetic recording medium recording layer 24 is insulative and the insulating layer 44 is not necessary in the manufacturing process of the magnetic recording medium 12, the workpiece 40 according to the first embodiment is used. On the other hand, a workpiece 70 in which the insulating layer 44 is omitted is used as shown in FIG.

  First, the continuous recording layer 42 of the workpiece 70 is processed into a concavo-convex pattern as shown in FIG. 18 in the same manner as in the first embodiment, and a recording element 24A is formed as a convex portion of the concavo-convex pattern to perform the recording. The element 24A is exposed, and the alignment layer (conductive layer) 38 is exposed at the bottom of the recess 26 of the uneven pattern (S110).

  Next, in the same manner as in the first, third, or fourth embodiment, an alignment layer in which W or Al (nonmagnetic material 28) is exposed at the bottom of the recess 26 as shown in FIG. As shown in FIG. 20, the recess 26 is filled with the nonmagnetic material 28 (S112).

  At this time, since the recording element 24A is insulative, deposition of W or Al does not proceed from the side surface of the recording element 24A, but proceeds reliably from the bottom surface of the recess 26 in the thickness direction of the workpiece 70. Therefore, the top surface of the nonmagnetic material 28 is formed in the same flat shape as the bottom surface of the recess 26. Incidentally, since the insulating layer is not formed on the recording element 24A, the step of removing the insulating layer is not necessary. However, the surface of the recording element 24A and the nonmagnetic material 28 is removed by dry etching or the like as necessary. You may planarize. Furthermore, as in the first embodiment, the magnetic recording medium 12 can be obtained by forming the protective layer 30 and the lubricating layer 32.

  In the first to sixth embodiments, the underlayer 34, the soft magnetic layer 36, and the orientation layer 38 are formed between the substrate 22 and the recording layers 24, 62. The layer configuration may be changed as appropriate according to the type of the magnetic recording medium. For example, one or two of the underlayer 34, the soft magnetic layer 36, and the orientation layer 38 may be omitted.

  In the first to sixth embodiments, the magnetic recording media 12 and 60 are perpendicular recording type magnetic disks in which the recording elements 24A and 62A are formed at fine intervals in the radial direction of the track in the data area. Magnetic disk with recording layers formed at fine intervals in the track circumferential direction (sector direction), magnetic disk formed with fine intervals in both the radial and circumferential directions of the track, and the recording layer having a spiral shape The present invention is naturally applicable to the manufacture of magnetic disks. The present invention is also applicable to the manufacture of magneto-optical disks such as MO, heat-assisted magnetic disks that use both magnetism and heat, and magnetic recording media having a recording layer with other concavo-convex patterns other than the disk shape, such as magnetic tapes. The invention can be applied. The present invention can also be applied to a longitudinal recording type magnetic recording medium.

  As in the second embodiment, three types of magnetic recording media 12 having a diameter of about 65 mm and different division patterns of the recording layer 24 were produced. The specific division pattern of each sample is shown in Table 1. The depth of the recesses in Table 1 is the thickness direction between the top surface of the insulating layer 44 and the bottom surface of the recesses 26 after the recording layer processing step (S110) and before the insulating film formation step (S202). Is the length of

The thickness of the recording layer 24 was about 20 nm, and the material of the recording layer 24 was a CoCr alloy. The thickness of the insulating layer 44 was about 3 nm, and the material of the insulating layer 44 was SiO ₂ . The thickness of the insulating film 52 was about 2 nm, and the material of the insulating film 52 was Al ₂ O ₃ .

The CVD conditions in the nonmagnetic material filling step (S112) were set such that the pressure in the chamber was about 0.1 Pa and the temperature of the workpiece 40 was about 200 ° C. The WF ₆ gas and SiH ₄ gas were supplied into the chamber so that the flow rate ratio was 1: 1. The nonmagnetic material 28 was deposited to a thickness of about 21 nm so that the upper surface thereof was 1 nm higher than the upper surface of the recording element 24A.

  Further, the ion beam irradiation angle in the flattening step (S114) is set to about 2 ° with respect to the surface of the workpiece 40 to remove the excess nonmagnetic material 28A, and the upper surface of the recording element 24A is exposed. Until flattened.

  After the flattening step (S114), the step between the upper surface of the recording element 24A and the upper surface of the nonmagnetic material 28 was measured by AFM (Atomic Force Microscope). Table 1 shows the measurement results of the level difference between the upper surface of the recording element 24A and the upper surface of the nonmagnetic material 28 of each sample.

  As shown in Table 1, the step between the upper surface of the recording element 24A and the upper surface of the nonmagnetic material 28 after the flattening step (S114) is substantially constant regardless of the division pattern of the recording layer 24, and the surface has a desired surface. It was confirmed that the surface was sufficiently flattened to the level.

  The present invention can be used, for example, in a magnetic recording medium in which a recording layer such as a discrete track type hard disk is formed in a concavo-convex pattern.

1 is a perspective view schematically showing the structure of a magnetic recording / reproducing apparatus according to a first embodiment of the invention. Side sectional view schematically showing a structure of a magnetic recording medium of the magnetic recording / reproducing apparatus. Flow chart showing an outline of the manufacturing process of the magnetic recording medium Side sectional view schematically showing the structure of the starting body of the workpiece in the manufacturing process of the magnetic recording medium Side sectional view schematically showing the shape of the workpiece with the continuous recording layer divided Side sectional view schematically showing the shape of the workpiece with a nonmagnetic material deposited on the bottom of the recess Side sectional view schematically showing the shape of the workpiece in which the recess is filled with the non-magnetic material The flowchart which shows the outline | summary of the manufacturing process of the magnetic-recording medium based on 2nd Embodiment of this invention. Side sectional view schematically showing a workpiece having an insulating film formed on the surface in the manufacturing process of the magnetic recording medium Side sectional view schematically showing the shape of the workpiece with the insulating film partially removed Side sectional view schematically showing the shape of the workpiece with a nonmagnetic material deposited on the bottom of the recess Side sectional view schematically showing the shape of the workpiece in which the recess is filled with the non-magnetic material Sectional drawing which shows typically the structure of the magnetic-recording medium based on 5th Embodiment of this invention Side sectional view schematically showing the shape of a workpiece on which a continuous recording layer is processed in the manufacturing process of the magnetic recording medium Side sectional view schematically showing the shape of the workpiece with a nonmagnetic material deposited on the bottom of the recess Side sectional view schematically showing the shape of the workpiece in which the recess is filled with the non-magnetic material Sectional drawing which shows typically the structure of the starting body of the to-be-processed object in the manufacturing process of the magnetic-recording medium based on 6th Embodiment of this invention Side sectional view schematically showing the shape of the workpiece with the continuous recording layer divided Side sectional view schematically showing the shape of the workpiece with a nonmagnetic material deposited on the bottom of the recess Side sectional view schematically showing the shape of the workpiece in which the recess is filled with the non-magnetic material

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 ... Magnetic recording / reproducing apparatus 12, 60 ... Magnetic recording medium 14 ... Magnetic head 16 ... Chuck 18 ... Arm 20 ... Base 22 ... Substrate 24, 62 ... Recording layer 24A, 62A ... Recording element 26 ... Concave 28 ... Nonmagnetic material 30 ... Protective layer 32 ... Lubrication layer 34 ... Underlayer 36 ... Soft magnetic layer 38 ... Orientation layer (conductive layer)
40, 70: Workpiece 42: Continuous recording layer 44 ... Insulating layer 46 ... Main mask layer 48 ... Sub mask layer 50 ... Resist layer 52 ... Insulating film S102: Starting body manufacturing process of work piece S104: Resist layer processing process S106: Sub mask layer processing step S108: Main mask layer processing step S110 ... Recording layer processing step S112 ... Nonmagnetic material filling step S114 ... Planarization step S116 ... Protective layer forming step S118 ... Lubricating layer forming step S202 ... Insulating film forming Step S204 ... Insulating film processing step

Claims (10)

  Processing the continuous recording layer of the workpiece in which the conductive layer, the continuous recording layer, and the insulating layer are formed in this order on the substrate into a concavo-convex pattern, and the insulating layer remains on the convex portion of the concavo-convex pattern; and A recording layer processing step of forming a recording element as a convex portion of the concave-convex pattern so that the conductive layer is exposed at the bottom of the concave portion of the concave-convex pattern, and a CVD method, with tungsten or aluminum as a main component. A magnetic recording medium comprising: a nonmagnetic material filling step of selectively depositing a nonmagnetic material on the conductive layer exposed at a bottom of the concave portion and filling the concave portion with the nonmagnetic material. Manufacturing method. In claim 1,
The workpiece has a structure in which a stop film having a processing speed in the recording layer processing step slower than that of the recording layer is formed as the conductive layer. In the recording layer processing step, the stop is provided in the concave portion of the concavo-convex pattern. A method of manufacturing a magnetic recording medium, wherein the workpiece is processed up to the stop film so that the film remains.   Processing the continuous recording layer of the workpiece in which the conductive continuous recording layer and the insulating layer are formed in this order on the substrate into a concavo-convex pattern, and the insulating layer remains on the convex portion of the concavo-convex pattern; and A recording layer processing step for forming a recording element as a convex portion of the concave-convex pattern so that the continuous recording layer is exposed at the bottom of the concave portion of the concave-convex pattern, and a main component of either tungsten or aluminum by a CVD method A non-magnetic material filling step of selectively depositing the non-magnetic material on the continuous recording layer exposed at the bottom of the concave portion and filling the concave portion with the non-magnetic material. A method of manufacturing a magnetic recording medium. In any one of Claims 1 thru | or 3,
A method of manufacturing a magnetic recording medium, comprising a step of flattening a surface by removing the insulating layer remaining on the recording element after the nonmagnetic material filling step. In any one of Claims 1 thru | or 4,
Between the recording layer processing step and the non-magnetic material filling step, an insulating film forming step for forming an insulating film on the workpiece, and the insulating film remains on the side surface of the recording element And an insulating film processing step of partially removing the insulating film so that the insulating layer remains on the recording element and the conductive layer is exposed at the bottom of the concave and convex pattern recesses. A method for producing a magnetic recording medium, characterized in that:   The recording element having a conductive layer and an insulating continuous recording layer formed in this order on a substrate is processed into a concavo-convex pattern, and a recording element is formed as a convex portion of the concavo-convex pattern. And a recording layer processing step for exposing the conductive layer to the bottom of the concave portion of the concave / convex pattern, and a nonmagnetic material containing either tungsten or aluminum as a main component by a CVD method. And a nonmagnetic material filling step of selectively depositing on the conductive layer exposed to the surface and filling the recess with the nonmagnetic material. In claim 6,
The workpiece has a structure in which a stop film having a processing speed in the recording layer processing step slower than that of the recording layer is formed as the conductive layer. In the recording layer processing step, the stop is provided in the concave portion of the concavo-convex pattern. A method of manufacturing a magnetic recording medium, wherein the workpiece is processed up to the stop film so that the film remains. In any one of Claims 1 thru | or 7,
In the recording layer processing step, the continuous recording layer is processed into a concavo-convex pattern by using ion beam etching.   A recording layer in which a recording element is formed in a predetermined concavo-convex pattern on the substrate and the recording element is formed as a convex part of the concavo-convex pattern, and one of tungsten and aluminum filled in the concave part between the recording elements as a main component And a non-magnetic material.   10. A magnetic recording / reproducing apparatus comprising: the magnetic recording medium according to claim 9; and a magnetic head for recording / reproducing data on / from the magnetic recording medium.

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