JP2006072183A - Planographic printing plate material - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a planographic printing plate material having excellent sensitivity, storage stability and development latitude and excellent adhesion property of a protective layer. <P>SOLUTION: The planographic printing plate material has a photopolymerizable photosensitive layer containing a polymerizable ethylenically unsaturated bond-containing compound, a photopolymerization initiator and a polymer binder, and a protective layer on a supporting body, wherein the photopolymerizable photosensitive layer contains a polymerizable ethylenically unsaturated bond-containing compound having an amide bond and a tertiary amine group in the molecule as the polymerizable ethylenically unsaturated bond-containing compound. The protective layer contains (A) polyvinyl alcohol having 90% to 100% saponification degree and (B) a vinylpyrrolidone copolymer derivative containing ≥40 mol% vinyl pyrrolidone units and having 10,000 to 500,000 weight average molecular weight, wherein the proportion of the component (B) is 1 to 30 mass% based on the total amount of the components (A) and (B). <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a photopolymerization type photosensitive lithographic printing plate material used in a computer-to-plate system (hereinafter referred to as CTP).

  In recent years, CTP recording digital image data directly on a photosensitive printing plate with a laser light source has been developed and is being put to practical use in the technology for producing printing plates for offset printing.

  Among printing plate materials used for CTP, in the field of printing that requires a relatively high printing durability, a negative photosensitive lithographic printing plate material having a polymerizable photosensitive layer containing a polymerizable compound is used. It is known (for example, Patent Document 1).

  These lithographic printing plate materials having a polymerization type photosensitive layer have insufficient storage stability, for example, by simply providing a photosensitive layer, the photosensitive layer is affected by oxygen in the air and the sensitivity is lowered. It was.

  As a method for reducing the influence of oxygen, a method of providing an oxygen blocking layer (protective layer) on a photosensitive layer is known.

  As these methods, for example, a method of providing a protective layer containing polyvinyl alcohol and a vinylpyrrolidone copolymer containing 40 mol% or more of vinylpyrrolidone and having a weight average molecular weight of 10,000 to 500,000 (Patent Document 2). A method of providing an oxygen barrier layer containing a combination of a polyvinyl acetate resin having an average saponification degree of 70 to less than 85% and a polyvinyl acetate resin having an average saponification degree of 85 to 100% (see Patent Document 3), water-soluble A method of providing a protective layer containing a vinyl polymer and a polymer that is incompatible with polyvinyl alcohol and itself water-soluble (see Patent Document 4), a specific compound containing polyvinyl acetate as a copolymerization component with polyvinyl alcohol A method of providing a protective layer containing a polymer is known (see Patent Document 5).

However, in these methods, the sensitivity is insufficient, the sensitivity may change due to storage, and the stain may be easily generated, so that the storage stability is insufficient and the printing durability is improved. When preheating is performed before development, there are problems such as low tolerance of temperature, insufficient development latitude, insufficient adhesion of protective layer, sensitivity, applicability / productivity, developability, It was difficult to satisfy the preservability at the same time.
Japanese Patent Laid-Open No. 10-104835 JP 2002-169272 A JP-A-9-204049 JP-A-11-119438 JP 11-311862 A

  An object of the present invention is to provide a lithographic printing plate material which is excellent in sensitivity, storage stability, development latitude, and has a protective layer excellent in adhesiveness.

  The above object of the present invention is achieved by the following configurations.

(Claim 1)
A lithographic printing plate having (1) a polymerizable ethylenically unsaturated bond-containing compound, (2) a photopolymerization initiator, (3) a photopolymerizable photosensitive layer containing a polymer binder and a protective layer on a support. In the material, the photopolymerizable photosensitive layer includes (1) a polymerizable ethylenically unsaturated bond-containing compound having an amide bond and a tertiary amino group in the molecule as the polymerizable ethylenically unsaturated bond-containing compound. The protective layer is (A) polyvinyl alcohol having a saponification degree of 90% to 100% and (B) a vinylpyrrolidone copolymer containing 40 mol% or more of vinylpyrrolidone units and having a weight average molecular weight of 10,000 to 500,000. A lithographic printing plate material comprising a derivative, wherein the ratio of (B) to the total amount of (A) and (B) is 1 to 30% by mass.

  According to the above configuration of the present invention, it is possible to provide a lithographic printing plate material having high sensitivity, little change in sensitivity after storage and antifouling property, excellent protective layer adhesion, and excellent development latitude.

  The present invention is described in detail below.

  The present invention comprises a photopolymerizable photosensitive layer and a protective layer containing (1) a polymerizable ethylenically unsaturated bond-containing compound, (2) a photopolymerization initiator, and (3) a polymer binder on a support. In the lithographic printing plate material, the photopolymerizable photosensitive layer has (1) a polymerizable ethylenically unsaturated bond having an amide bond and a tertiary amino group in the molecule as the polymerizable ethylenically unsaturated bond-containing compound. A vinyl having a weight average molecular weight of 10,000 to 500,000, comprising (A) a polyvinyl alcohol having a saponification degree of 90% to 100% and (B) a vinylpyrrolidone unit of 40 mol% or more. A pyrrolidone copolymer derivative is contained, and the ratio of (B) to the total amount of (A) and (B) is 1 to 30% by mass.

(Photopolymerizable photosensitive layer)
The photopolymerizable photosensitive layer according to the present invention is a layer that can be cured by polymerization by image exposure to form an image, (1) a polymerizable ethylenically unsaturated bond-containing compound, (2) a photopolymerization initiator, (3) It contains a polymer binder, and (1) contains a polymerizable ethylenically unsaturated bond-containing compound having an amide bond and a tertiary amino group in the molecule.

((1) Polymerizable, ethylenically unsaturated bond-containing compound)
The polymerizable ethylenically unsaturated bond-containing compound having an amide bond and a tertiary amino group in the molecule according to the present invention has an amide bond and a tertiary amino group in one molecule and is addition-polymerizable. Has a double bond.

  A polymerizable ethylenically unsaturated bond-containing compound having an amide bond and a tertiary amino group in the molecule includes a polyhydric alcohol containing a tertiary amino group in the molecule, a compound having a plurality of isocyanate groups, Can be obtained by reacting a hydroxyl group with a compound containing an ethylenic double bond capable of addition polymerization.

  Examples of the polyhydric alcohol containing a tertiary amino group in the molecule include triethanolamine, N-methyldiethanolamine, N-ethyldiethanolamine, Nn-butyldiethanolamine, N-tert. -Butyldiethanolamine, N, N-di (hydroxyethyl) aniline, N, N, N ', N'-tetra-2-hydroxypropylethylenediamine, p-tolyldiethanolamine, N, N, N', N'-tetra- 2-hydroxyethylethylenediamine, N, N-bis (2-hydroxypropyl) aniline, allyldiethanolamine, 3- (dimethylamino) -1,2-propanediol, 3-diethylamino-1,2-propanediol, N, N -Di (n-propyl) amino-2,3-propanediol, N, N-di (iso-propyl) amino-2,3-propanediol, 3- (N-methyl-N-benzylamino) -1, Although 2-propanediol etc. are mentioned, it is not limited to this.

  Examples of the compound having a plurality of isocyanates include butane-1,4-diisocyanate, hexane-1,6-diisocyanate, 2-methylpentane-1,5-diisocyanate, octane-1,8-diisocyanate, and 1,3-diisocyanate. Methyl-cyclohexanone, 2,2,4-trimethylhexane-1,6-diisocyanate, isophorone diisocyanate, 1,2-phenylene diisocyanate, 1,3-phenylene diisocyanate, 1,4-phenylene diisocyanate, tolylene-2,4-diisocyanate , Tolylene-2,5-diisocyanate, tolylene-2,6-diisocyanate, 1,3-di (isocyanatomethyl) benzene, 1,3-bis (1-isocyanato-1-methylethyl) benzene, and the like. But But it is not limited to these.

  Examples of the compound containing an ethylenic double bond capable of addition polymerization with a hydroxyl group in the molecule include 2-hydroxyethyl methacrylate, 2-hydroxyethyl acrylate, 4-hydroxybutyl acrylate, 2-hydroxypropylene-1,3- Examples include dimethacrylate and 2-hydroxypropylene-1-methacrylate-3-acrylate.

  These three reactions can be carried out in the same manner as a method of synthesizing urethane acrylate by a reaction of a normal diol compound, diisocyanate compound, and hydroxyl group-containing acrylate compound.

Specific examples of these reaction products of polyhydric alcohols containing tertiary amino groups in the molecule, diisocyanate compounds, and compounds containing ethylenic double bonds capable of addition polymerization with hydroxyl groups in the molecule are shown below. .
M-1: reaction product of triethanolamine (1 mol), hexane-1,6-diisocyanate (3 mol), 2-hydroxyethyl methacrylate (3 mol) M-2: triethanolamine (1 mol), isophorone Reaction product of diisocyanate (3 mol) and 2-hydroxyethyl acrylate (3 mol) M-3: Nn-butyldiethanolamine (1 mol), 1,3-bis (1-isocyanate-1-methylethyl) Reaction product of benzene (2 mol), 2-hydroxypropylene-1-methacrylate-3-acrylate (2 mol) M-4: Nn-butyldiethanolamine (1 mol), 1,3-di (isocyanatomethyl) ) Reaction of benzene (2 mol), 2-hydroxypropylene-1-methacrylate-3-acrylate (2 mol) Product M-5: Reaction product M-6 of N-methyldiethanolamine (1 mol), tolylene-2,4-diisocyanate (2 mol), 2-hydroxypropylene-1,3-dimethacrylate (2 mol): Reaction product M-7 of triethanolamine (1 mol), 1,3-bis (1-isocyanato-1-methylethyl) benzene (3 mol), 2-hydroxyethyl methacrylate (3 mol): ethylenediaminetetraethanol (1 mol), 1,3-bis (1-isocyanate-1-methylethyl) benzene (4 mol), reaction product of 2-hydroxyethyl methacrylate (4 mol) The photopolymerizable photosensitive layer according to the present invention comprises: In addition to the above, general radical polymerizable monomers, ethylenic double polymerizable in the molecule generally used for UV curable resins Polyfunctional monomers having a plurality of engagement or can be used a polymerizable ethylenically unsaturated bond-containing compound such as a polyfunctional oligomers.

  These polymerizable ethylenically unsaturated bond-containing compounds are not particularly limited. For example, 2-ethylhexyl acrylate, 2-hydroxypropyl acrylate, glycerol acrylate, tetrahydrofurfuryl acrylate, phenoxyethyl acrylate, nonylphenoxyethyl acrylate, tetrahydro Monofunctional acrylic acid esters such as furfuryloxyethyl acrylate, tetrahydrofurfuryloxyhexanolide acrylate, ε-caprolactone adduct of 1,3-dioxane alcohol, 1,3-dioxolane acrylate, or these acrylates. Methacrylic acid, itaconic acid, crotonic acid, maleic acid ester instead of methacrylate, itaconate, crotonate, maleate Diglycol diene, triethylene glycol diacrylate, pentaerythritol diacrylate, hydroquinone diacrylate, resorcin diacrylate, hexanediol diacrylate, neopentyl glycol diacrylate, tripropylene glycol diacrylate, neopentyl glycol hydroxypivalate Acrylate, dipentyl neopentyl glycol adipate, diacrylate of ε-caprolactone adduct of neopentyl glycol hydroxypivalate, 2- (2-hydroxy-1,1-dimethylethyl) -5-hydroxymethyl-5-ethyl- 1,3-dioxane diacrylate, tricyclodecane dimethylol acrylate, tricyclodecane dimethylol acrylate -Bifunctional acrylates such as caprolactone adduct, diglycidyl ether diacrylate of 1,6-hexanediol, or methacrylic acid, itaconic acid, crotonic acid in which these acrylates are replaced with methacrylate, itaconate, crotonate, maleate Maleic esters such as trimethylolpropane triacrylate, ditrimethylolpropane tetraacrylate, trimethylolethane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexa Acrylate, ε-caprolactone adduct of dipentaerythritol hexaacrylate, Multifunctional acrylic acid ester acid such as rogalol triacrylate, propionic acid / dipentaerythritol triacrylate, propionic acid / dipentaerythritol tetraacrylate, hydroxypivalylaldehyde-modified dimethylolpropane triacrylate, or acrylate of these acrylates, itaconate , Methacrylic acid, itaconic acid, crotonic acid, maleic acid ester, etc., instead of crotonate and maleate.

  Prepolymers can also be used as described above. Examples of the prepolymer include compounds as described below, and a prepolymer obtained by introducing acrylic acid or methacrylic acid into an oligomer having an appropriate molecular weight and imparting photopolymerizability can be preferably used. These prepolymers may be used alone or in combination of two or more, and may be used by mixing with the above-mentioned monomers and / or oligomers.

  Examples of prepolymers include adipic acid, trimellitic acid, maleic acid, phthalic acid, terephthalic acid, hymic acid, malonic acid, succinic acid, glutaric acid, itaconic acid, pyromellitic acid, fumaric acid, glutaric acid, pimelic acid, Polybasic acids such as sebacic acid, dodecanoic acid, tetrahydrophthalic acid, and ethylene glycol, propylene glycol, diethylene glycol, propylene oxide, 1,4-butanediol, triethylene glycol, tetraethylene glycol, polyethylene glycol, glycerin, trimethylol Polyester obtained by introducing (meth) acrylic acid into a polyester obtained by combining polyhydric alcohols such as propane, pentaerythritol, sorbitol, 1,6-hexanediol, 1,2,6-hexanetriol Acrylates; for example, epoxy acrylates in which (meth) acrylic acid is introduced into an epoxy resin such as bisphenol A, epichlorohydrin, (meth) acrylic acid, phenol novolac, epichlorohydrin, (meth) acrylic acid; Acid / tolylene diisocyanate / 2-hydroxyethyl acrylate, polyethylene glycol / tolylene diisocyanate / 2-hydroxyethyl acrylate, hydroxyethylphthalyl methacrylate / xylene diisocyanate, 1,2-polybutadiene glycol / tolylene diisocyanate / 2-hydroxyethyl acrylate , Trimethylolpropane, propylene glycol, tolylene diisocyanate, 2-hydroxyethyl acrylate In addition, urethane acrylates in which (meth) acrylic acid is introduced into urethane resins; for example, silicone resin acrylates such as polysiloxane acrylate, polysiloxane diisocyanate, 2-hydroxyethyl acrylate, etc .; and (meth) acryloyl in oil-modified alkyd resins Examples include prepolymers such as alkyd-modified acrylates and spirane resin acrylates having a group introduced therein.

  As ethylenically unsaturated bond-containing compounds, phosphazene monomers, triethylene glycol, isocyanuric acid EO (ethylene oxide) modified diacrylate, isocyanuric acid EO modified triacrylate, dimethylol tricyclodecane diacrylate, trimethylolpropane benzoic acid benzoic acid Mention may be made of monomers such as esters, alkylene glycol-type acrylic acid-modified / urethane-modified acrylates, and addition-polymerizable oligomers and prepolymers having structural units formed from the monomers.

  Further, examples of the ethylenically unsaturated bond-containing compound include a phosphate ester compound containing at least one (meth) acryloyl group. The compound is not particularly limited as long as it is a compound in which at least part of the hydroxyl group of phosphoric acid is esterified and has a (meth) acryloyl group.

  In addition, JP-A-58-212994, 61-6649, 62-46688, 62-48589, 62-173295, 62-187092, 63- No. 67189, JP-A-1-244891, and the like. Furthermore, “11290 Chemical Products”, Chemical Industry Daily, p. 286-p. 294, “UV / EB Curing Handbook (raw material)”, Kobunshi Shuppankai, p. The compounds described in 11 to 65 can also be suitably used in the present invention. Of these, compounds having two or more acrylic groups or methacryl groups in the molecule are preferred in the present invention, and those having a molecular weight of 10,000 or less, more preferably 5,000 or less are preferred.

  In the lithographic printing plate material of the present invention, the polymerizable, ethylenically unsaturated bond-containing compound is preferably contained in the range of 1.0 to 80.0% by mass of the photopolymerizable photosensitive layer, more preferably. It is in the range of 3.0 to 70.0% by mass.

  In the photopolymerizable photosensitive layer according to the present invention, it is preferable to use a plurality of the above-mentioned ethylenically unsaturated bond-containing compounds.

((2) Photopolymerization initiator)
The photopolymerization initiator that can be used in the present invention is a compound capable of initiating polymerization of an ethylenically unsaturated bond-containing compound that can be polymerized by image exposure (1). Examples thereof include metal arene compounds such as metallocene compounds and iron arene complex compounds, and biimidazole compounds such as hexaarylbisimidazole, and it is preferable to use a halogen compound, a thio compound, and an oxime ether compound together as a copolymerization initiator.

  Among these, the photopolymerizable photosensitive layer according to the present invention preferably contains an iron arene complex compound and a halogen compound.

  Examples of titanocene compounds include compounds described in JP-A-63-41483 and JP-A-2-291. More preferred specific examples include bis (cyclopentadienyl) -Ti-di-chloride, bis (Cyclopentadienyl) -Ti-bis-phenyl, bis (cyclopentadienyl) -Ti-bis-2,3,4,5,6-pentafluorophenyl, bis (cyclopentadienyl) -Ti-bis -2,3,5,6-tetrafluorophenyl, bis (cyclopentadienyl) -Ti-bis-2,4,6-trifluorophenyl, bis (cyclopentadienyl) -Ti-bis-2,6 -Difluorophenyl, bis (cyclopentadienyl) -Ti-bis-2,4-difluorophenyl, bis (methylcyclopentadienyl) -Ti-bis- , 3,4,5,6-pentafluorophenyl, bis (methylcyclopentadienyl) -Ti-bis-2,3,5,6-tetrafluorophenyl, bis (methylcyclopentadienyl) -Ti-bis -2,6-difluorophenyl (IRUGACURE 727L: manufactured by Ciba Specialty Chemicals), bis (cyclopentadienyl) -bis (2,6-difluoro-3- (py-1-yl) phenyl) titanium (IRUGACURE 784: Ciba Specialty Chemicals), bis (cyclopentadienyl) -bis (2,4,6-trifluoro-3- (pyridin-1-yl) phenyl) titanium bis (cyclopentadienyl) -bis (2, 4,6-trifluoro-3- (2-5-dimethylpy-1-yl) phenyl) titanium and the like It is below.

  Examples of the monoalkyl triaryl borate compound include compounds described in JP-A-62-150242 and JP-A-62-143044, and more preferable specific examples include tetra-n-butylammonium n-butyl-tri. Naphthalen-1-yl-borate, tetra-n-butylammonium n-butyl-triphenyl-borate, tetra-n-butylammonium n-butyl-tri- (4-tert-butylphenyl) -borate, tetra-n- Examples include butylammonium n-hexyl-tri- (3-chloro-4-methylphenyl) -borate and tetra-n-butylammonium n-hexyl-tri- (3-fluorophenyl) -borate.

  The structure of the iron arene complex compound that can be used in the present invention is preferably a compound represented by the following general formula (a). In the plate making method of the present invention, an embodiment in which the photopolymerization initiator is an iron arene complex compound is a particularly preferred embodiment.

Formula (a) [A-Fe-B] ⁺ X ⁻
In the formula, A represents a cyclopentadienyl group or an alkyl-substituted cyclopentadienyl group. In the formula, B represents an aromatic ring. In the formula, X ⁻ represents an anion.

Examples of the aromatic ring include benzene, toluene, xylene, cumene, naphthalene, 1-methylnaphthalene, 2-methylnaphthalene, biphenyl, fluorene, and the like. Examples of X ⁻ include PF ₆ ⁻ , BF ₄ ⁻ , SbF ₆ ⁻ , AlF ₄ ⁻ , CF ₃ SO ₃ ^{− and the} like.

  It is preferable to contain an iron arene complex compound in the ratio of 0.1-20 mass% with respect to the compound which has a group which can superpose | polymerize, More preferably, it is 0.1-10 mass%.

  The polyhalogen compound is a compound having a trihalogenmethyl group, a dihalogenmethyl group or a dihalomethylene group, and particularly preferably a halogen compound represented by the following general formula (1) and a compound in which the above group is substituted with an oxadiazole ring. Used. Among these, a halogen compound represented by the following general formula (2) is particularly preferably used.

Formula (1) R ¹ —CY ₂ — (C═O) —R ²
In the formula, R ¹ represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an acyl group, an alkylsulfonyl group, an arylsulfonyl group, an iminosulfonyl group, or a cyano group. R ² represents a monovalent substituent. R ¹ and R ² may be bonded to form a ring. Y represents a halogen atom.

Formula (2) CY ₃ — (C═O) —X—R ³
In the formula, R ³ represents a monovalent substituent. X represents —O— or —NR ⁴ —. R ⁴ represents a hydrogen atom or an alkyl group. R ³ and R ⁴ may be bonded to form a ring. Y represents a halogen atom. Among these, those having a polyhalogenacetylamide group are particularly preferably used.

  Specific examples of the structure represented by the general formula (1) include the following compounds BR1 to BR70. In addition, a compound in which a polyhalogenmethyl group is substituted with an oxadiazole ring is also preferably used, and examples thereof are listed in H-1 to H-14. Furthermore, oxadiazole compounds described in JP-A-5-34904, Do-45875, and 8-240909 are also preferably used.

  In addition, the compound which substituted the halogen atom from bromine to chlorine can also be used suitably for these compounds in this invention. Specific examples of polyhalogen compounds preferably used in the present invention are listed below.

(Biimidazole compound)
The biimidazole compound is a derivative of biimidazole, and examples thereof include compounds described in JP-A No. 2003-295426.

  As the biimidazole compound, a hexaarylbiimidazole (HABI, triaryl-imidazole dimer) compound is preferably used.

  Processes for the production of HABIs are described in DE 1,470,154 and their use in photopolymerizable compositions is described in EP 24,629, EP 107,792, US 4,410,621, EP 215,453 and DE 3, 211 and 312.

  Preferred derivatives are, for example, 2,4,5,2 ′, 4 ′, 5′-hexaphenylbiimidazole, 2,2′-bis (2-chlorophenyl) -4,5,4 ′, 5′-tetraphenylbiimidazole. Imidazole, 2,2'-bis (2-bromophenyl) -4,5,4 ', 5'-tetraphenylbiimidazole, 2,2'-bis (2,4-dichlorophenyl) -4,5,4' , 5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,5,4 ', 5'-tetrakis (3-methoxyphenyl) biimidazole, 2,2'-bis (2- Chlorophenyl) -4,5,4 ', 5'-tetrakis (3,4,5-trimethoxyphenyl) -biimidazole, 2,5,2', 5'-tetrakis (2-chlorophenyl) -4,4 ' -Bis (3,4-dimethyl) Xylphenyl) biimidazole, 2,2'-bis (2,6-dichlorophenyl) -4,5,4 ', 5'-tetraphenylbiimidazole, 2,2'-bis (2-nitrophenyl) -4,5 , 4 ', 5'-tetraphenylbiimidazole, 2,2'-di-o-tolyl-4,5,4', 5'-tetraphenylbiimidazole, 2,2'-bis (2-ethoxyphenyl) -4,5,4 ', 5'-tetraphenylbiimidazole and 2,2'-bis (2,6-difluorophenyl) -4,5,4', 5'-tetraphenylbiimidazole.

  The amount of HABI photoinitiator is typically in the range of 0.01-30% by weight, preferably 0.5-20% by weight, based on the total weight of the non-volatile components of the photosensitive composition.

  In the photopolymerizable photosensitive layer according to the present invention, any other photopolymerization initiator can be used in combination.

  For example, J. et al. Carbonyl compounds, organic sulfur compounds, persulfides, redox compounds, azo, diazo compounds, halogen compounds, and photoreductive dyes as described in Chapter 5 of “Light Sensitive Systems” by J. Kosar Etc. More specific compounds are disclosed in British Patent 1,459,563.

  That is, the following can be used as a photopolymerization initiator that can be used in combination.

  Benzoin derivatives such as benzoin methyl ether, benzoin-i-propyl ether, α, α-dimethoxy-α-phenylacetophenone; benzophenone, 2,4-dichlorobenzophenone, methyl o-benzoylbenzoate, 4,4′-bis (dimethyl) Benzophenone derivatives such as amino) benzophenone; thioxanthone derivatives such as 2-chlorothioxanthone and 2-i-propylthioxanthone; anthraquinone derivatives such as 2-chloroanthraquinone and 2-methylanthraquinone; N-methylacridone, N-butylacridone and the like In addition to α, α-diethoxyacetophenone, benzyl, fluorenone, xanthone and uranyl compounds, JP-B-59-1281, 61-9621 and JP-A-60-60104 Triazine derivatives; organic peroxides described in JP-A-59-1504 and JP-A-61-243807; JP-B-43-23684, JP-A-44-6413, JP-A-44-6413, JP-A-47-1604, and US patents Diazonium compounds described in US Pat. No. 3,567,453; organic azide compounds described in US Pat. Nos. 2,848,328 and 2,852,379 and 2,940,853; O-quinonediazides described in JP-A Nos. 13109, 38-18015 and 45-9610; JP-B-55-39162, JP-A-59-14023 and “Macromolecules”, Vol. 10, 1307 Various onium compounds described on page 1977; azo compounds described in JP-A-59-142205 Compound: JP-A-1-54440, European Patents 109,851, 126,712 and “Journal of Imaging Science (J. Imag. Sci.)”, Vol. 30, 174 (1986) (Oxo) sulfonium organoboron complexes described in Japanese Patent Application Nos. 4-56831 and 4-89535; “Coordination Chemistry Review”, 84, 85-277 (1988) and Transition metal complexes containing a transition metal such as ruthenium described in JP-A-2-182701; 2,4,5-triarylimidazole dimer described in JP-A-3-209477; carbon tetrabromide, JP-A-59 Organohalogen compounds described in No. -107344, and the like.

((3) polymer binder)
Examples of the polymer binder include acrylic polymer, polyvinyl butyral resin, polyurethane resin, polyamide resin, polyester resin, epoxy resin, phenol resin, polycarbonate resin, polyvinyl butyral resin, polyvinyl formal resin, shellac, and other natural resins. Can be used.

  Two or more of these may be used in combination.

  A vinyl copolymer obtained by copolymerization of acrylic monomers is preferred. Furthermore, the copolymer composition of the polymer binder is preferably a copolymer of (a) a carboxyl group-containing monomer, (b) a methacrylic acid alkyl ester, or an acrylic acid alkyl ester.

  Specific examples of the carboxyl group-containing monomer include α, β-unsaturated carboxylic acids such as acrylic acid, methacrylic acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride and the like. In addition, carboxylic acids such as phthalic acid and 2-hydroxymethacrylate half ester are also preferred.

  Specific examples of alkyl methacrylates and alkyl esters include methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, heptyl methacrylate, octyl methacrylate, nonyl methacrylate. , Decyl methacrylate, undecyl methacrylate, dodecyl methacrylate, methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, heptyl acrylate, octyl acrylate, nonyl acrylate, acrylic In addition to unsubstituted alkyl esters such as decyl acid, undecyl acrylate and dodecyl acrylate, cyclic alkyl esters such as cyclohexyl methacrylate and cyclohexyl acrylate Substituted alkyl esters such as benzyl methacrylate, 2-chloroethyl methacrylate, N, N-dimethylaminoethyl methacrylate, glycidyl methacrylate, benzyl acrylate, 2-chloroethyl acrylate, N, N-dimethylaminoethyl acrylate, and glycidyl acrylate Also mentioned.

  Furthermore, the polymer binder according to the present invention can use monomers described in the following (1) to (14) as other copolymerization monomers.

  1) Monomers having an aromatic hydroxyl group, such as o- (or p-, m-) hydroxystyrene, o- (or p-, m-) hydroxyphenyl acrylate and the like.

  2) Monomers having an aliphatic hydroxyl group, such as 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, N-methylol acrylamide, N-methylol methacrylamide, 4-hydroxybutyl methacrylate, 5-hydroxypentyl acrylate, 5-hydroxypentyl methacrylate , 6-hydroxyhexyl acrylate, 6-hydroxyhexyl methacrylate, N- (2-hydroxyethyl) acrylamide, N- (2-hydroxyethyl) methacrylamide, hydroxyethyl vinyl ether and the like.

  3) A monomer having an aminosulfonyl group, such as m- (or p-) aminosulfonylphenyl methacrylate, m- (or p-) aminosulfonylphenyl acrylate, N- (p-aminosulfonylphenyl) methacrylamide, N- (p -Aminosulfonylphenyl) acrylamide and the like.

  4) Monomers having a sulfonamide group, such as N- (p-toluenesulfonyl) acrylamide, N- (p-toluenesulfonyl) methacrylamide and the like.

  5) Acrylamide or methacrylamides such as acrylamide, methacrylamide, N-ethylacrylamide, N-hexylacrylamide, N-cyclohexylacrylamide, N-phenylacrylamide, N- (4-nitrophenyl) acrylamide, N-ethyl-N- Phenylacrylamide, N- (4-hydroxyphenyl) acrylamide, N- (4-hydroxyphenyl) methacrylamide and the like.

  6) Monomers containing fluorinated alkyl groups such as trifluoroethyl acrylate, trifluoroethyl methacrylate, tetrafluoropropyl methacrylate, hexafluoropropyl methacrylate, octafluoropentyl acrylate, octafluoropentyl methacrylate, heptadecafluorodecyl methacrylate, N- Butyl-N- (2-acryloxyethyl) heptadecafluorooctylsulfonamide and the like.

  7) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, phenyl vinyl ether and the like.

  8) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate, vinyl benzoate and the like.

  9) Styrenes such as styrene, methyl styrene, chloromethyl styrene and the like.

  10) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone.

  11) Olefins such as ethylene, propylene, i-butylene, butadiene, isoprene and the like.

  12) N-vinylpyrrolidone, N-vinylcarbazole, 4-vinylpyridine and the like.

  13) Monomers having a cyano group, such as acrylonitrile, methacrylonitrile, 2-pentenenitrile, 2-methyl-3-butenenitrile, 2-cyanoethyl acrylate, o- (or m-, p-) cyanostyrene.

  14) A monomer having an amino group, such as N, N-diethylaminoethyl methacrylate, N, N-dimethylaminoethyl acrylate, N, N-dimethylaminoethyl methacrylate, polybutadiene urethane acrylate, N, N-dimethylaminopropyl acrylamide, N, N-dimethylacrylamide, acryloylmorpholine, Ni-propylacrylamide, N, N-diethylacrylamide and the like.

  Further, other monomers that can be copolymerized with these monomers may be copolymerized.

  The vinyl polymer can be produced by ordinary solution polymerization. It can also be produced by bulk polymerization or suspension polymerization. The polymerization initiator is not particularly limited, and examples thereof include azobis-based radical generators such as 2,2′-azobisisobutyronitrile (AIBN), 2,2′-azobis (2-methylbutyro). Nitrile) and the like. Moreover, the usage-amount of these polymerization initiators is 0.05-10.0 mass parts normally with respect to 100 mass parts of whole monomers used for forming a copolymer (preferably 0.1-5 mass). Part). Examples of the solvent used for the solution polymerization include ketone-based, ester-based, and aromatic-based organic solvents, among which toluene, ethyl acetate, benzene, methyl cellosolve, ethyl cellosolve, acetone, methyl ethyl ketone, and the like. In general, a good solvent for an acrylic polymer is used, and a solvent having a boiling point of 60 to 120 ° C. is particularly preferable. In the case of solution polymerization, the above solvent is used, and the reaction temperature is usually 40 to 120 ° C. (preferably 60 to 110 ° C.) and the reaction time is usually 3 to 10 hours (preferably 5 to 8 hours). it can. After completion of the reaction, the solvent is removed to obtain a copolymer. Further, the double bond introduction reaction described later can be carried out without removing the solvent.

  The molecular weight of the resulting copolymer can be adjusted by adjusting the solvent used and the reaction temperature. The solvent, reaction temperature, and the like used to obtain the desired molecular weight copolymer can be appropriately determined depending on the monomer used. Moreover, the molecular weight of the copolymer obtained can also be adjusted by mixing a specific solvent with the said solvent. Examples of such solvents include mercaptans (eg, n-octyl mercaptan, n-dodecyl mercaptan, t-dodecyl mercaptan, mercaptoethanol, etc.), carbon tetrachloride (eg, carbon tetrachloride, butyl chloride, propylene chloride). Etc.). The ratio of mixing these solvents with the solvent used in the above reaction can be appropriately determined depending on the monomer, solvent, reaction conditions, etc. used in the reaction.

  Furthermore, the polymer binder is preferably a vinyl polymer having a carboxyl group and a polymerizable double bond in the side chain. For example, an unsaturated bond-containing vinyl copolymer obtained by addition-reacting a compound having a (meth) acryloyl group and an epoxy group in the molecule to a carboxyl group present in the molecule of the vinyl copolymer. Is also preferred as a polymer binder.

  Specific examples of the compound containing both an unsaturated bond and an epoxy group in the molecule include glycidyl acrylate, glycidyl methacrylate, and an epoxy group-containing unsaturated compound described in JP-A No. 11-271969. In addition, an unsaturated bond-containing vinyl copolymer obtained by adding a compound having a (meth) acryloyl group and an isocyanate group in the molecule to a hydroxyl group present in the molecule of the vinyl polymer is also high. Preferred as a molecular binder. Compounds having both an unsaturated bond and an isocyanate group in the molecule include vinyl isocyanate, (meth) acrylic isocyanate, 2- (meth) acryloyloxyethyl isocyanate, m- or p-isopropenyl-α, α'-dimethylbenzyl. Isocyanates are preferred, and (meth) acrylic isocyanate, 2- (meth) acryloyloxyethyl isocyanate and the like can be mentioned.

  The vinyl polymer having a carboxyl group and a polymerizable double bond in the side chain that can be used in the present invention is preferably 50 to 100% by mass, and 100% by mass in the total polymer binder. It is more preferable.

  The content of the polymer binder in the photopolymerizable photosensitive layer is preferably in the range of 10 to 90% by mass, more preferably in the range of 15 to 70% by mass, and the content in the range of 20 to 50% by mass. This is particularly preferable from the viewpoint of sensitivity.

  The photopolymerizable photosensitive layer according to the present invention preferably further contains a compound of the following general formula (I) or a condensate thereof from the viewpoint of the preheated latitude before development.

(In the formula, n represents an integer of 1 to 10, and R _{1 to} R ₅ are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a formyl group, a carboxyl group, a cyano group, a nitro group, a sulfo group, or Alkyl group, aryl group, aromatic heterocyclic group, alkoxy group, acyl group, alkoxycarbonyl group, alkenyl group, aryloxy group, acryloyloxy group, alkylcarbonyloxy group, alkylthio group each optionally having a substituent Represents an alkylsulfonyl group, a phenylsulfonyl group, an amino group, or an amide group.

R ₆ and R ₇ each independently represents a hydrogen atom, or an alkyl group, aryl group, aromatic heterocyclic group, alkenyl group, or acryloyl group, each of which may have a substituent. )
Specific examples of the compound of the general formula (I) or the condensate thereof are shown below.

(Protective layer, coating solution for protective layer)
The protective layer according to the present invention is provided mainly for the purpose of preventing the photopolymerizable photosensitive layer from undergoing a polymerization inhibiting action due to oxygen, and includes the following polyvinyl alcohol derivative: Is applied on the photopolymerizable photosensitive layer and dried.

((A) Polyvinyl alcohol having a saponification degree of 90% to 100% (hereinafter sometimes abbreviated as (A)))
The polyvinyl alcohol having a saponification degree of 90% to 100% according to the present invention includes polyvinyl alcohol and its partial esters, ethers, and acetals.

  The content of (A) is preferably 40% by mass to 70% by mass, particularly 50% by mass to 80% by mass with respect to the protective layer in terms of sensitivity, applicability, storage stability, and the like. Particularly preferred.

  Specifically, Gohsenol AL-06, NL-05, manufactured by Nippon Synthetic Chemical Co., Ltd., Kuraray Poval PVA706, PVACST, PVA105, manufactured by Kuraray Co., Ltd. Above, Clariant, Ercol 30/92, Ercol 25/100, Ercol 28/70, Ercol 4/98, Erkol 5/99 The above-mentioned is made by Celanese.

  Among these, a saponification degree of 90-98% is preferable, and a saponification degree of 90-96% is particularly preferable.

((B) A vinylpyrrolidone copolymer containing 40 mol% or more of vinylpyrrolidone units and having a weight average molecular weight of 10,000 to 500,000 (hereinafter sometimes simply referred to as (B)))
The photopolymerizable photosensitive layer according to the present invention contains 1 to 30% by mass of (B) with respect to the above (A), and 2 to 20% by mass is particularly preferable.

  The weight average molecular weight of the vinylpyrrolidone-based copolymer pair (B) according to the present invention needs to be in the range of 10,000 to 500,000 from the viewpoints of coatability, productivity and sensitivity, and preferably 30. , 250,000 to 250,000.

  The vinyl pyrrolidone-based copolymer can be produced by copolymerization using a normal radical polymerization method using N-vinyl-2-pyrrolidone.

  As the copolymer component, various compounds listed as the polymerizable ethylenically unsaturated bond-containing compound (1) can be used, and vinyl acetate is particularly preferable.

The ratio of the vinylpyrrolidone unit in the copolymer is 40 mol% or more, and 40 to 80 mol% is particularly preferably used.
.

  Further, the vinyl pyrrolidone copolymers can be used alone or in combination.

  Specific examples of (B) according to the present invention include, for example, Rubiscol VA37E, 371, 551, 64P, 64W, 73E, 73W (manufactured by BSF Japan).

(Other materials)
The protective layer according to the present invention can further contain a hydrophilic material, a surfactant, a matting agent, and the like as necessary.

  Examples of hydrophilic materials include polysaccharides, polyvinyl pyrrolidone, polyethylene glycol, gelatin, glue, casein, hydroxyethyl cellulose, carboxymethyl cellulose, methyl cellulose, hydroxyethyl starch, gum arabic, sucrose octaacetate, ammonium alginate, sodium alginate, polyvinylamine, Examples include polyethylene oxide, polystyrene sulfonic acid, polyacrylic acid, and water-soluble polyamide.

  As the surfactant, any of an anionic surfactant, a nonionic surfactant, a cationic surfactant and an amphoteric surfactant can be used, and an acetylene surfactant is particularly preferably used.

  As the matting agent, inorganic and organic particles having a diameter of about 0.05 to 10 μm can be used.

  In order to prepare a protective layer coating solution, the above-mentioned material can be dissolved in a suitable solvent to form a coating solution, which is coated on the photopolymerizable photosensitive layer according to the present invention and dried. A protective layer can be formed. The thickness of the protective layer is preferably from 0.1 to 5.0 μm, particularly preferably from 0.5 to 3.0 μm.

(Coating liquid for protective layer)
In order to prepare the coating solution for the protective layer, the above material can be dissolved in a solvent mainly composed of water to obtain a coating solution for the protective layer.

  Examples of the solvent other than water include alcohols and polyhydric alcohols.

  “Mainly water” means that 50% by mass or more of the solvent is water, preferably 75% by mass or more, and particularly preferably 95% by mass or more.

  This protective layer coating solution is applied onto the photopolymerizable photosensitive layer according to the present invention and dried to form a protective layer.

  The drying temperature when applying and drying the protective layer coating solution is preferably lower than the glass transition temperature (Tg) of the binder contained in the photopolymerizable photosensitive layer.

  The difference between the drying temperature and the glass transition temperature (Tg) of the binder contained in the photopolymerizable photosensitive layer is preferably 20 ° C. or more, more preferably 40 ° C. or more, and the upper limit is about 60 ° C. .

  The coating liquid for protective layer can further contain a surfactant or the like as necessary.

  As the coating method of the coating liquid for the protective layer, the air doctor coater method, blade coater method, wire bar method, knife coater method, dip coater method, reverse roll coater method, gravure coater method, cast coating method, curtain coater method and extrusion coater method A known coating method such as, for example, can be used.

(Support)
The support according to the present invention is a plate or film capable of supporting a photopolymerizable photosensitive layer, and preferably has a hydrophilic surface on the side where the photosensitive layer is provided.

  Examples of the support according to the present invention include a metal plate such as aluminum, stainless steel, chromium and nickel, or a laminate obtained by laminating or vapor-depositing the above metal thin film on a plastic film such as a polyester film, a polyethylene film and a polypropylene film. .

  In addition, a surface of a polyester film, a vinyl chloride film, a nylon film, or the like that has been subjected to a hydrophilic treatment or a surface provided with a hydrophilic layer can be used, but an aluminum support is preferably used. In the case of an aluminum support, pure aluminum or an aluminum alloy is used.

  Various aluminum alloys can be used as the support, and for example, alloys of metals such as silicon, copper, manganese, magnesium, chromium, zinc, lead, bismuth, nickel, titanium, sodium, iron, and aluminum are used. .

  Further, the aluminum support having a roughened surface is used for water retention.

  Prior to roughening (graining treatment), it is preferable to perform a degreasing treatment in order to remove the rolling oil on the surface. As the degreasing treatment, a degreasing treatment using a solvent such as trichlene or thinner, an emulsion degreasing treatment using an emulsion such as kesilon or triethanol, or the like is used. In addition, an alkaline aqueous solution such as caustic soda can be used for the degreasing treatment. When an alkaline aqueous solution such as caustic soda is used for the degreasing treatment, dirt and oxide film that cannot be removed only by the degreasing treatment can be removed. When an alkaline aqueous solution such as caustic soda is used for the degreasing treatment, smut is generated on the surface of the support. It is preferable to perform the treatment. Examples of the roughening method include a mechanical method and a method of etching by electrolysis.

  The mechanical roughening method used is not particularly limited, but a brush polishing method and a honing polishing method are preferable.

  The electrochemical surface roughening method is not particularly limited, but a method of electrochemical surface roughening in an acidic electrolyte is preferable.

After the surface is roughened by the electrochemical surface roughening method, it is preferably immersed in an acid or alkali aqueous solution in order to remove aluminum scraps on the surface. Examples of the acid include sulfuric acid, persulfuric acid, hydrofluoric acid, phosphoric acid, nitric acid, hydrochloric acid, and the like. Examples of the base include sodium hydroxide and potassium hydroxide. Among these, it is preferable to use an alkaline aqueous solution. The dissolution amount of aluminum in the support surface, 0.5 to 5 g / m ² is preferred. In addition, it is preferable that after the immersion treatment with an alkaline aqueous solution, neutralization treatment is performed by immersion in an acid such as phosphoric acid, nitric acid, sulfuric acid, chromic acid or a mixed acid thereof.

  The mechanical surface roughening method and the electrochemical surface roughening method may each be used alone for roughing, or the mechanical surface roughening method followed by the electrochemical surface roughening method. You may roughen.

  Following the roughening treatment, an anodic oxidation treatment can be performed. There is no restriction | limiting in particular in the method of the anodizing process which can be used in this invention, A well-known method can be used. By performing the anodizing treatment, an oxide film is formed on the support.

  The anodized support may be sealed as necessary. These sealing treatments can be performed using known methods such as hot water treatment, boiling water treatment, water vapor treatment, sodium silicate treatment, dichromate aqueous solution treatment, nitrite treatment, and ammonium acetate treatment.

  Furthermore, after performing these treatments, water-soluble resins such as polyvinylphosphonic acid, polymers and copolymers having a sulfonic acid group in the side chain, polyacrylic acid, water-soluble metal salts (for example, zinc borate) or Also suitable are those coated with a yellow dye, amine salt or the like. Further, a sol-gel treated substrate in which a functional group capable of causing an addition reaction by a radical as disclosed in JP-A No. 5-304358 is covalently used.

  In the present invention, the photopolymerizable photosensitive layer is obtained by preparing a coating solution for a photosensitive layer, applying the photosensitive layer coating solution on a support by a conventionally known method, and drying.

  Examples of coating liquid coating methods include air doctor coater method, blade coater method, wire bar method, knife coater method, dip coater method, reverse roll coater method, gravure coater method, cast coating method, curtain coater method and extrusion coater method. Can be mentioned.

  The drying temperature in the coating of the photosensitive layer is preferably in the range of 60 to 160 ° C, more preferably in the range of 80 to 140 ° C, and particularly preferably in the range of 90 to 120 ° C, from the viewpoint of fogging of the non-image area. is there.

  EXAMPLES Hereinafter, although an Example is given and this invention is demonstrated in detail, the aspect of this invention is not limited to this. In the examples, “parts” represents “parts by mass” unless otherwise specified.

Example 1
In a three-necked flask under a nitrogen stream, 58.0 parts (0.58 mol) of methyl methacrylate, 35.0 parts (0.41 mol) of methacrylic acid, 6.0 parts (0.05 mol) of ethyl methacrylate, ethanol 100 parts and 1.23 parts of α, α′-azobisisobutyronitrile were added and reacted in an oil bath at 80 ° C. in a nitrogen stream for 6 hours to obtain a polymer.

  Thereafter, 1 part of triethylbenzylammonium chloride and 28.0 parts (0.2 mol) of glycidyl methacrylate were added to the polymer and reacted at a temperature of 25 ° C. for 3 hours to obtain a polymer binder A. The mass average molecular weight measured using GPC was about 70,000 and the acid value was 95.

(Production of support)
An aluminum plate (material 1050, tempered H16) having a thickness of 0.3 mm was immersed in a 5% aqueous sodium hydroxide solution maintained at 65 ° C., degreased for 1 minute, and then washed with water.

This degreased aluminum plate was neutralized by immersing it in a 10% sulfuric acid aqueous solution maintained at 25 ° C. for 1 minute, and then washed with water. Next, this aluminum plate was subjected to an electrolytic surface roughening treatment for 20 seconds in an alternating current having a hydrochloric acid concentration of 11 g / L, a temperature of 25 ° C., a frequency of 50 Hz, and 50 A / dm ² .

After electrolytic surface roughening, it was washed with water, desmutted for 10 seconds in a 1% aqueous sodium hydroxide solution maintained at 50 ° C., washed with water, and then washed in 30% sulfuric acid maintained at 50 ° C. for 30 seconds. Neutralization treatment was performed and washed with water. Subsequently, anodizing treatment was performed for 40 seconds in a 20% sulfuric acid solution under conditions of 25 ° C., a current density of 5 A / dm ² , and a voltage of 15 V, followed by washing with water.

  Further, a 0.44% polyvinyl phosphonic acid aqueous solution was subjected to dipping treatment at 75 ° C. for 30 seconds, then washed with distilled water and dried with cold air at 25 ° C. to obtain a photopolymerizable photosensitive lithographic printing plate support. Obtained. At this time, the center line average roughness (Ra) of the surface was 0.65 μm.

(Preparation of lithographic printing plate materials)
On the surface-treated support, a photopolymerizable photosensitive layer coating solution having the following composition was applied with a wire bar so as to be 1.9 g / m ² when dried, and dried at 110 ° C. for 1.5 minutes.

Thereafter, a protective layer coating solution having the following composition is further applied onto the photosensitive layer with an applicator so as to be 1.5 g / m ² when dried, and dried at 75 ° C. for 1.5 minutes. Lithographic printing plate materials 101 to 123 having a protective layer were produced.

<Photopolymerizable photosensitive layer coating solution>
Polymer binder A 45.0 parts Sensitizing dye A 4.0 parts Iron arene compound: Irgacure 261 [manufactured by Ciba Specialty Chemicals]
3.2 parts Triazine compound: TAZ-107 [manufactured by Midori Chemical Co., Ltd.] 2.5 parts addition-polymerizable ethylenically unsaturated double bond-containing monomer (compound A) (for lithographic printing plate materials 114-117, penta 30.0 parts Polyethylene glycol # 200 dimethacrylate (NK ester 4G: manufactured by Shin-Nakamura Chemical Co., Ltd.) 15.0 parts phthalocyanine pigment (MHI454: 30% MEK dispersion manufactured by Mikuni Dye Co., Ltd.)
3.0 parts ANCAMIN K-54: manufactured by Air Products (used only for lithographic printing plate materials 118 to 123) 1.45 parts hindered amine light stabilizer (LS770: manufactured by Sankyo Lifetech Co., Ltd.) 0.5 parts Fluorine series Surfactant (F178K: manufactured by Dainippon Ink & Chemicals, Inc.) 0.5 part Cyclohexanone (boiling point = 155 ° C.) 820 parts << Protective layer coating liquid >>
Polyvinyl alcohol (PVA) (type and amount are shown in Table 1)
Vinylpyrrolidone copolymer derivative (type and amount are shown in Table 1)
Surfactant (Surfinol 465: Nisshin Chemical Co., Ltd.) 0.5 part Water 900 part

(Image formation)
About the photopolymerization type lithographic printing plate material produced in this way, 2400 dpi (1 dpi is 1 inch) using a plate setter (Tiger Cat: a modified product manufactured by ECRM) equipped with a light source having a laser of 408 nm and 30 mW output. That is, image exposure was performed with a resolution of (representing the number of dots per 2.54 cm).

  Next, a heating unit before development, a pre-washing part for removing the protective layer, a developing part filled with the following developer composition 1, a washing part for removing the developer adhering to the plate surface, and a gum solution for protecting the image area ( Developed with a CTP automatic developing machine (PHW32-V: manufactured by Technigraph) equipped with GW-3: manufactured by Mitsubishi Chemical Co., Ltd. twice to obtain a lithographic printing plate.

  The heating part conditions were a plate surface temperature of 110 ° C. ± 5 ° C. and a heat treatment time of 15 seconds.

  The plate surface temperature was measured when the thermolabel [manufactured by NOF Engineering Co., Ltd.] was applied to the roughened surface of the support.

<< Developer Composition 1 >>
A Potassium silicate 8.0 parts New Coal B-13SN (manufactured by Nippon Emulsifier Co., Ltd.) 3.0 parts Ethylenediaminetetraacetic acid disodium dihydrate 0.1 part Caustic potash pH = 12.1 (adjusted for lithographic printing plate) Evaluation)
The lithographic printing plate obtained as described above was evaluated as follows. The evaluation results are shown in Table 1.

"sensitivity"
The solid image was exposed by changing the exposure energy of the laser, and the exposure energy of the solid image portion showing a reflection density of -10% relative to the reflection density of the solid image portion showing the highest reflection density was used as an index of sensitivity. .

<Storage stability>
In order to forcibly deteriorate the lithographic printing plate material, it is stored in a constant temperature bath at 55 ° C and 20% relative humidity for 3 days (DT storage). Compared with the sample before storage, the above sensitivity evaluation is performed and the sensitivity changes Was used as an index of storage stability.

  Further, the lithographic printing plate material after storage was evaluated for the following stain resistance and used as one of storage stability indices.

Antifouling:
Development ink: PI-2 [manufactured by Fuji Photo Film Co., Ltd.] and PS sponge [manufactured by Fuji Photo Film Co., Ltd.] and PS ink [manufactured by Fuji Photo Film Co., Ltd.] were used for evaluation of the anti-staining property of the non-image-sensitive portion after the storage. The non-image area that had been sufficiently washed with water and dried was observed with a magnifying glass, and rank evaluation was made in three stages of AC, which was used as an index for preventing soiling.
A ... Without dirt B ... With weak dirt C ... With strong dirt << Protective layer adhesion >>
As a protective layer adhesion evaluation, a scratch test was conducted. Measured after leaving the produced photosensitive material for 2 hours under a fluorescent lamp in an environment of 25 ° C. and 50% humidity. For the measurement, scratch test machine Heidon-18: manufactured by Heidon was used, and an average value of 0.1 mmφ sapphire needle, 0-100 g continuous load, speed 1000 mm / min, n = 5 was evaluated. The evaluation was performed by visually evaluating the load at which the protective layer was peeled off from the photosensitive layer.

《Preheat latitude evaluation》
For the lithographic printing plate material after exposure, after changing the heat treatment temperature and performing the development process under the same conditions for the others, after processing using the same developing ink and sponge as used for the evaluation of stain resistance, printing is performed. The upper limit of the temperature at which no stain or ink entanglement occurred in the non-image area was determined.

  For printing, a lithographic printing plate produced by exposing and developing a 175-line image containing 3-97% halftone dots, using a printing machine (DAIYA1F-1 manufactured by Mitsubishi Heavy Industries, Ltd.) Printing is performed using coated paper, printing ink (Toyo King High Echo M Red, manufactured by Toyo Ink Co., Ltd.), and dampening water (H liquid SG-51 concentration, 1.5% manufactured by Tokyo Ink Co., Ltd.). The upper limit of the preheating temperature at which no smearing of the part or ink entanglement of the shadow part occurs was determined.

  At the time of this evaluation, the heating device portion of the developing processor is turned off, and the heat treatment is set to a desired plate surface temperature using another heating device placed in a safe light environment after exposure. Then, heat treatment was performed for 30 seconds.

  The results are shown in Table 1.

  From Table 1, it can be seen that the lithographic printing plate material of the present invention is excellent in adhesiveness of the protective layer, is highly sensitive and excellent in storage stability, and is excellent in preheat latitude during development.

Claims (1)

A lithographic printing plate having (1) a polymerizable ethylenically unsaturated bond-containing compound, (2) a photopolymerization initiator, (3) a photopolymerizable photosensitive layer containing a polymer binder and a protective layer on a support. In the material, the photopolymerizable photosensitive layer includes (1) a polymerizable ethylenically unsaturated bond-containing compound having an amide bond and a tertiary amino group in the molecule as the polymerizable ethylenically unsaturated bond-containing compound. The protective layer is (A) polyvinyl alcohol having a saponification degree of 90% to 100% and (B) a vinylpyrrolidone copolymer containing 40 mol% or more of vinylpyrrolidone units and having a weight average molecular weight of 10,000 to 500,000. A lithographic printing plate material comprising a derivative, wherein the ratio of (B) to the total amount of (A) and (B) is 1 to 30% by mass.