JP2006041423A - Transport device for precision thin-sheet material - Google Patents

Transport device for precision thin-sheet material Download PDF

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Publication number
JP2006041423A
JP2006041423A JP2004223020A JP2004223020A JP2006041423A JP 2006041423 A JP2006041423 A JP 2006041423A JP 2004223020 A JP2004223020 A JP 2004223020A JP 2004223020 A JP2004223020 A JP 2004223020A JP 2006041423 A JP2006041423 A JP 2006041423A
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gripping
wafer
precision thin
plate material
thin plate
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Yasuhide Matsumura
泰秀 松村
Tomokazu Kobayashi
友和 小林
Takayuki Otsuki
孝行 大槻
Toshishige Kurosaki
利榮 黒▲崎▼
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Hitachi High Tech Control Systems Corp
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Hitachi Naka Electronics Co Ltd
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Priority to JP2004223020A priority Critical patent/JP2006041423A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a transport device for a precision thin-sheet material that can minimize impacts, when a gripping member grips an edge part of the precision thin-sheet material. <P>SOLUTION: A speed reduction means 7 is installed that slows down the movement speed of multiple gripping members (10A, 10B, 11A, 11B, 32A, 32B, and 33) gripping an edge of a precision thin-sheet material (15), immediately prior to touching the edge of the precision thin sheet material (15). By adopting such a structure, the movement speed can be slowed down, immediately before the touching of the precision thin sheet material by the gripping members; and so, the impact of the gripping members to the precision thin sheet material lessens, and as a result, occurrence of particles damaged due to the impact can be minimized. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は精密薄板材の搬送装置に係り、特に、塵埃の付着を嫌う半導体装置のウェハやフラットパネルディスプレイ装置のガラス基板等の精密薄板材の製造装置や検査装置に用いられる精密薄板材の搬送装置に関する。   BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a precision thin plate material transport device, and in particular, a precision thin plate material transport device used in a manufacturing device or an inspection device of a precision thin plate material such as a wafer of a semiconductor device that does not like adhesion of dust or a glass substrate of a flat panel display device. Relates to the device.

精密薄板材に塵埃等が付着すると、精密薄板材上に加工される配線パターンが付着した塵埃によって途切れたり、短絡したりして不良品となる問題がある。そこで、塵埃の付着を嫌う精密薄板材の搬送装置として、例えば特許文献1に開示されているように、精密薄板材の板面に把持部材を接触させずに、精密薄板材のエッジを複数の把持部材で把持する搬送装置が、既に提案されている。   When dust or the like adheres to the precision thin plate material, there is a problem that the wiring pattern processed on the precision thin plate material is interrupted or short-circuited by the dust attached thereto, resulting in a defective product. Therefore, as a precision thin plate material conveying device that dislikes the adhesion of dust, for example, as disclosed in Patent Document 1, a plurality of edges of a precision thin plate material are formed without bringing a gripping member into contact with the plate surface of the precision thin plate material. A transport device that grips with a gripping member has already been proposed.

特開2002−134586号公報JP 2002-134586 A

特許文献1に開示されているように、複数の把持部材で精密薄板材のエッジを把持する搬送装置は、精密薄板材の板面に把持部材を接触させていないことから、把持部材の精密薄板材の板面への接触による塵埃の付着を防止することができる。しかし、把持部材が精密薄板材のエッジに接触する際の衝突力によって、精密薄板材のエッジが僅かながら損傷し、精密薄板材のエッジから損傷粒子が飛散して精密薄板材の板面に付着する問題がある。   As disclosed in Patent Document 1, a conveying device that grips the edge of a precision thin plate material with a plurality of gripping members does not contact the gripping member with the plate surface of the precision thin plate material. It is possible to prevent adhesion of dust due to contact of the plate material with the plate surface. However, due to the collision force when the gripping member contacts the edge of the precision thin plate material, the edge of the precision thin plate material is slightly damaged, and damaged particles scatter from the edge of the precision thin plate material and adhere to the plate surface of the precision thin plate material. There is a problem to do.

本発明の目的は、把持部材が精密薄板材のエッジ部を把持する際の衝突力を小さくし得る精密薄板材の搬送装置を提供することにある。   An object of the present invention is to provide an apparatus for transporting a precision thin plate material that can reduce a collision force when the gripping member grips an edge portion of the precision thin plate material.

本発明は上記目的を達成するために、精密薄板材のエッジを把持する複数の把持部材の移動速度を、前記精密薄板材のエッジに接触する直前に減速させる減速手段を設けたのである。   In order to achieve the above object, the present invention is provided with a decelerating means for decelerating the moving speed of a plurality of gripping members that grip the edge of the precision thin plate material immediately before contacting the edge of the precision thin plate material.

上記構成とすることで、把持部材の精密薄板材への接触直前の移動速度が遅くなるので、把持部材の精密薄板材に対する衝突力は小さくなり、その結果、衝突による精密薄板材からの損傷粒子の発生を少なくすることができる。   With the above configuration, since the moving speed of the gripping member immediately before contact with the precision thin plate material becomes slow, the collision force of the gripping member with respect to the precision thin plate material becomes small, and as a result, damaged particles from the precision thin plate material due to the collision. Can be reduced.

以上説明したように本発明によれば、把持部材が精密薄板材のエッジ部を把持する際の衝突力を小さくし得る精密薄板材の搬送装置を得ることができる。   As described above, according to the present invention, it is possible to obtain a precision thin plate material transport device that can reduce the collision force when the gripping member grips the edge portion of the precision thin plate material.

以下本発明による第1の実施の形態を、図1〜図4に基づいて説明する。ここで説明する精密薄板材は、半導体装置のウェハであり、精密薄板材の搬送装置は、ウェハを検査装置に搬送するためのウェハの搬送装置である。   A first embodiment of the present invention will be described below with reference to FIGS. The precision thin plate material described here is a wafer of a semiconductor device, and the precision thin plate material transfer device is a wafer transfer device for transferring the wafer to an inspection device.

本発明によるウェハの搬送装置1は、大きくは、搬送機器(図示せず)に固定されるベース2と、このベース2に固定された、例えばエアシリンダや真空シリンダ等からなるアクチュエータ3と、前記ベース2に固定され前記アクチュエータ3の駆動力を2方向に分けて伝達する動力変換機構4と、この動力変換機構4に連結された第1ハンドフレーム5及び第2ハンドフレーム6と、前記ベース2に固定され前記アクチュエータ3の駆動力を減速する減速手段7とから構成されている。   A wafer transfer apparatus 1 according to the present invention generally includes a base 2 fixed to a transfer device (not shown), an actuator 3 fixed to the base 2, for example, an air cylinder or a vacuum cylinder, A power conversion mechanism 4 fixed to the base 2 and transmitting the driving force of the actuator 3 in two directions, a first hand frame 5 and a second hand frame 6 connected to the power conversion mechanism 4, and the base 2 And a decelerating means 7 for decelerating the driving force of the actuator 3.

前記アクチュエータ3は、駆動軸8を一方向に進退するように突出しており、この駆動軸8には連結具9が設けられ、この連結具9を介して前記駆動軸8の進退動作を前記動力変換機構4に伝達している。前記動力変換機構4は、前記駆動軸8の一方向の進退動作を2つの逆方向の進退動作に変換するものであり、これら2つの逆方向の進退動作を前記第1ハンドフレーム5及び前記第2ハンドフレーム6に伝達することで、前記第1ハンドフレーム5及び前記第2ハンドフレーム6を、後述するウェハ15の板面に沿ってかつ互いに逆向きに進退駆動している。   The actuator 3 protrudes so that the drive shaft 8 advances and retreats in one direction, and the drive shaft 8 is provided with a connecting tool 9 through which the drive shaft 8 moves forward and backward. It is transmitted to the conversion mechanism 4. The power conversion mechanism 4 converts the one-way advance / retreat operation of the drive shaft 8 into two reverse advance / retreat operations, and the two reverse advance / retreat operations are converted into the first hand frame 5 and the first By transmitting to the two-hand frame 6, the first hand frame 5 and the second hand frame 6 are driven back and forth along the plate surface of the wafer 15 to be described later and in opposite directions.

前記第1ハンドフレーム5は、U字状に形成されており、そのU字状の先端部に夫々円柱の中間部が括れた鼓状の把持爪10A,10Bを固定している。また、前記第2ハンドフレーム6は、前記第1ハンドフレーム5よりも短いC字状に形成されており、前記第1ハンドフレーム5の上方に僅かな隙間をもって前記第1ハンドフレーム5と平行に配置されている。そして、前記第2ハンドフレーム6も、C字状の先端部に夫々円柱の中間部が括れた鼓状の把持爪11A,11Bを固定している。尚、把持爪10A,10B,11A,11Bが本発明による把持部材となる。   The first hand frame 5 is formed in a U-shape, and drum-shaped gripping claws 10 </ b> A and 10 </ b> B each having a middle portion of a cylinder confined to the U-shaped tip are fixed. Further, the second hand frame 6 is formed in a C-shape shorter than the first hand frame 5, and is parallel to the first hand frame 5 with a slight gap above the first hand frame 5. Has been placed. The second hand frame 6 also has drum-shaped gripping claws 11A and 11B each having a cylindrical middle portion confined to a C-shaped tip. The gripping claws 10A, 10B, 11A, and 11B are gripping members according to the present invention.

前記減速手段7は、図3に示すように、前記駆動軸8の延長端に支持された第1磁石12と、この第1磁石12と対向する位置に配置された第2磁石13と、この第2磁石13を前記ベース2に固定する調整ベース14とを備えている。前記第1磁石12及び第2磁石13は、例えば永久磁石からなり、ウェハ15を把持爪10A,10B,11A,11Bで把持する前は互いに離れた位置にあり(図3)、ウェハ15を把持するときには互いが接近する(図4)ような位置関係にある。そして、第1磁石12と第2磁石13とは、磁気反発力が作用するように同極が対向するように、例えばN極同士(又はS極同士)が離れたり接近したりするように配置している。さらに、前記調整ベース14は、第2磁石13の固定位置を前記ベース2に対して前記駆動軸8の進退方向に調整することで、第1磁石12との対向間隔を調整できるように構成されている。   As shown in FIG. 3, the speed reduction means 7 includes a first magnet 12 supported on the extended end of the drive shaft 8, a second magnet 13 disposed at a position facing the first magnet 12, And an adjustment base 14 for fixing the second magnet 13 to the base 2. The first magnet 12 and the second magnet 13 are made of, for example, permanent magnets and are in positions apart from each other before the wafer 15 is gripped by the gripping claws 10A, 10B, 11A, and 11B (FIG. 3). When they do, they are in a positional relationship such that they approach each other (FIG. 4). The first magnet 12 and the second magnet 13 are arranged such that, for example, the N poles (or S poles) are separated or approached so that the same poles face each other so that a magnetic repulsive force acts. is doing. Further, the adjustment base 14 is configured so that the facing distance from the first magnet 12 can be adjusted by adjusting the fixed position of the second magnet 13 in the advancing / retreating direction of the drive shaft 8 with respect to the base 2. ing.

上記構成のウェハの搬送装置1において、検査装置に搬送するためにウェハ15の把持指令が発せられると、アクチュエータ3が作動し、駆動軸8を矢印A方向に駆動する。この駆動軸8の動きは、動力変換機構4を介して前記第1ハンドフレーム5を矢印B方向に、前記第2ハンドフレーム6を矢印C方向に、互いに向き合う方向に移動させる。これら第1ハンドフレーム5と第2ハンドフレーム6との矢印B方向及び矢印C方向の移動により、把持爪10A,10B及び把持爪11A,11Bは間隔を狭め、ウェハ15のエッジを把持する。反対に、ウェハ15の把持を解除する場合には、駆動軸8を矢印A方向とは逆方向に駆動することにより、各部品は逆方向に移動し、ウェハ15の把持を開放する。   In the wafer transfer apparatus 1 having the above-described configuration, when a gripping command for the wafer 15 is issued for transfer to the inspection apparatus, the actuator 3 operates to drive the drive shaft 8 in the arrow A direction. This movement of the drive shaft 8 moves the first hand frame 5 in the direction of arrow B and the second hand frame 6 in the direction of arrow C via the power conversion mechanism 4 in directions facing each other. By the movement of the first hand frame 5 and the second hand frame 6 in the arrow B direction and the arrow C direction, the gripping claws 10A and 10B and the gripping claws 11A and 11B narrow the interval and grip the edge of the wafer 15. On the contrary, when the gripping of the wafer 15 is released, by driving the drive shaft 8 in the direction opposite to the direction of the arrow A, each component moves in the reverse direction and the gripping of the wafer 15 is released.

次に、以上のように構成されたウェハの搬送装置1によるウェハ15の一連の把持動作を図5に基づいて説明する。   Next, a series of gripping operations of the wafer 15 by the wafer transfer apparatus 1 configured as described above will be described with reference to FIG.

まず、図1及び図2の状態にあるウェハの搬送装置1は、把持爪10A,10Bと把持爪11A,11Bとの間隔がウェハ15の直径よりも大きくなるように広げて待機しており、別な運搬機器(図示せず)で搬送されてきたウェハ15を、図5(a)に示すように、把持爪10A,10Bと把持爪11A,11Bとの間に位置させる。この状態で、把持指令を出してアクチュエータ3を駆動すると、把持爪10A,10Bと把持爪11A,11Bとは間隔を狭める方向に駆動されて行き、図5(b)に示すように、ウェハ15のエッジに把持爪10A,10Bと把持爪11A,11Bとが接する。   First, the wafer transfer apparatus 1 in the state of FIG. 1 and FIG. 2 is on standby with the gap between the gripping claws 10A, 10B and the gripping claws 11A, 11B larger than the diameter of the wafer 15, As shown in FIG. 5A, the wafer 15 transported by another transporting device (not shown) is positioned between the gripping claws 10A and 10B and the gripping claws 11A and 11B. In this state, when a gripping command is issued and the actuator 3 is driven, the gripping claws 10A and 10B and the gripping claws 11A and 11B are driven in the direction of narrowing the interval, and as shown in FIG. The gripping claws 10A, 10B and the gripping claws 11A, 11B are in contact with the edges.

このとき、駆動軸8の動きを見ると、図3〜図4に示すように駆動される。即ち、図3の状態にある駆動軸8が駆動されると、駆動軸8の先端の第1磁石12は第2磁石13側に接近して行く。さらに、駆動軸8をそのまま駆動して行くと、第1磁石12は第2磁石13の磁界領域に接近し、第1磁石12と第2磁石13間に磁気反発力が生じる。継続して駆動軸8を駆動して第1磁石12と第2磁石13を接近させてゆくと、前記磁気反発力は次第に大きくなり、この磁気反発力が駆動軸8の移動、云い代えれば把持爪10A,10Bと把持爪11A,11Bの移動速度を減速させる力となる。その結果、把持爪10A,10Bと把持爪11A,11Bの移動速度は、アクチュエータ3の駆動から把持爪10A,10B,11A,11Bがウェハ15との接触位置に向かって当初は速いが、把持爪10A,10B,11A,11Bがウェハ15との接触位置に近づくにつれて減速される。したがって、把持爪10A,10B,11A,11Bはウェハ15に静かに接触して把持できるので、把持爪10A,10B,11A,11Bが大きな力でウェハ15に衝突することを回避することができる。   At this time, when the movement of the drive shaft 8 is seen, it is driven as shown in FIGS. That is, when the drive shaft 8 in the state of FIG. 3 is driven, the first magnet 12 at the tip of the drive shaft 8 approaches the second magnet 13 side. Further, when the drive shaft 8 is driven as it is, the first magnet 12 approaches the magnetic field region of the second magnet 13, and a magnetic repulsive force is generated between the first magnet 12 and the second magnet 13. When the drive shaft 8 is continuously driven to bring the first magnet 12 and the second magnet 13 closer to each other, the magnetic repulsive force gradually increases, and this magnetic repulsive force is moved, in other words, gripped. This is a force that decelerates the moving speed of the claws 10A and 10B and the gripping claws 11A and 11B. As a result, the moving speed of the gripping claws 10A, 10B and the gripping claws 11A, 11B is initially fast from the driving of the actuator 3 toward the contact position of the gripping claws 10A, 10B, 11A, 11B with the wafer 15. As 10A, 10B, 11A, 11B approaches the contact position with the wafer 15, the speed is reduced. Therefore, since the gripping claws 10A, 10B, 11A, and 11B can gently touch and grip the wafer 15, it is possible to avoid the gripping claws 10A, 10B, 11A, and 11B from colliding with the wafer 15 with a large force.

上記把持爪10A,10B,11A,11Bの動作とアクチュエータ3の動作を示したのが図6である。即ち、図6において「爪開位置」は図5(a)に相当し、アクチュエータ3を駆動すると、アクチュエータ3の駆動力が2点差線で示すように増加し、その後はほぼ一定の駆動力で駆動される。同時に、把持爪10A,10B,11A,11Bの移動速度も実線で示すように上昇して行く。その後、把持爪10A,10B,11A,11Bの移動速度は減速手段7によって減速されて低速度になり、ウェハ15に静かに接触し、図6の「爪とウェハの接触位置」に至る。この位置が図5(b)に相当する。そして、そのままアクチュエータ3を駆動しつづけると、第1磁石12と第2磁石13間に生じている磁気反発力が或る領域内に入ると弱まるので、アクチュエータ3による駆動力が磁気反発力の弱まった分各把持爪に作用する。その結果、図6の破線で示すように、把持爪10A,10B,11A,11Bにウェハ15を把持する把持力が発生するので、ウェハ15は脱落や把持位置が変位することなく把持される。   FIG. 6 shows the operation of the gripping claws 10A, 10B, 11A, and 11B and the operation of the actuator 3. That is, the “nail opening position” in FIG. 6 corresponds to FIG. 5A, and when the actuator 3 is driven, the driving force of the actuator 3 increases as shown by a two-dotted line, and thereafter, with a substantially constant driving force. Driven. At the same time, the moving speed of the gripping claws 10A, 10B, 11A, 11B also increases as shown by the solid line. Thereafter, the moving speeds of the gripping claws 10A, 10B, 11A, and 11B are reduced by the speed reduction means 7 to a low speed, gently come into contact with the wafer 15, and reach the “contact position between the claw and the wafer” in FIG. This position corresponds to FIG. If the actuator 3 is continuously driven as it is, the magnetic repulsive force generated between the first magnet 12 and the second magnet 13 becomes weaker when entering a certain region, so that the driving force by the actuator 3 becomes weaker than the magnetic repulsive force. Acts on each gripping nail. As a result, as shown by the broken line in FIG. 6, since gripping force for gripping the wafer 15 is generated on the gripping claws 10A, 10B, 11A, and 11B, the wafer 15 is gripped without dropping or the gripping position being displaced.

尚、図6の「爪閉位置(ウェハ無しの場合)」は、図5(c)に相当し、ウェハ15を把持しない状態でアクチュエータ3を矢印A方向に駆動し続けた場合のストロークエンドを示す。図6の「爪とウェハの接触位置」から「爪閉位置(ウェハ無しの場合)」間では、減速手段7の機能は、各把持爪が速度制御から開放された状態にある。   6 corresponds to FIG. 5C, and the stroke end when the actuator 3 is continuously driven in the direction of arrow A without gripping the wafer 15 is shown in FIG. Show. Between the “contact position between the claw and the wafer” in FIG. 6 and the “claw closed position (in the case where there is no wafer)”, the function of the decelerating means 7 is in a state where each gripping claw is released from the speed control.

以上により本実施の形態においては、把持部材である把持爪10A,10B,11A,11Bをウェハ15のエッジに静かに接触させて把持できるので、把持爪10A,10B,11A,11Bとウェハ15のエッジとの衝突に起因するウェハ15からの損傷粒子の発生を少なくすることができる。   As described above, in the present embodiment, the gripping claws 10A, 10B, 11A, and 11B that are gripping members can be gripped by gently contacting the edges of the wafer 15, so that the gripping claws 10A, 10B, 11A, and 11B and the wafer 15 Generation of damaged particles from the wafer 15 due to the collision with the edge can be reduced.

また、ウェハ15は、通常、ウェハの搬送装置1に対して、別な運搬機器で搬送されてくるときに、例えば周方向の位置を決められた状態で搬送されてくる。しかし、ウェハの搬送装置1に別な運搬機器からウェハ15を受け渡す際に、決められた位置が多少ずれることがある。このずれが規定された範囲内のずれの場合には、次の工程でウェハ15の周方向の位置を再度調整することができる。しかしながら、ウェハ15を複数の把持爪10A,10B,11A,11Bで把持することから、各把持爪が同時にウェハ15のエッジ部に当接することが少なく、時間差を持って接触する。そのため、ウェハ15の周方向の位置がずれてウェハの搬送装置1に搬送された場合で、各把持爪の移動速度が大きく、各把持爪のウェハ15への衝突力が大きいと、早く衝突した爪の衝突力によってウェハ15の微少なずれを大きくしてウェハ15を回転させてしまうことがある。ウェハ15の回転によって周方向の位置が規定された範囲外にずれた場合には、次の工程での周方向の再度の調整が行えなくなり、その結果、大きく周方向の位置がずれたウェハ15は、検査装置のラインから撤去されることになる。   Further, the wafer 15 is normally transferred to the wafer transfer apparatus 1 in a state where the position in the circumferential direction is determined, for example, when the wafer 15 is transferred by another transfer device. However, when the wafer 15 is transferred from another transport device to the wafer transport apparatus 1, the determined position may be slightly shifted. If the deviation is within a prescribed range, the circumferential position of the wafer 15 can be adjusted again in the next step. However, since the wafer 15 is gripped by the plurality of gripping claws 10A, 10B, 11A, and 11B, the gripping claws are less likely to contact the edge portion of the wafer 15 at the same time and contact with a time difference. Therefore, when the circumferential position of the wafer 15 is deviated and transferred to the wafer transfer device 1, the movement speed of each gripping claw is large, and the collision force of each gripping claw to the wafer 15 is large, the collision occurs quickly. The wafer 15 may be rotated by increasing the slight displacement of the wafer 15 by the impact force of the claws. When the circumferential position is shifted outside the specified range due to the rotation of the wafer 15, the circumferential adjustment in the next step cannot be performed again. Will be removed from the line of inspection equipment.

しかし、本実施の形態においては、把持爪10A,10B,11A,11Bがウェハ15に対して、移動速度を減速して静かに接触するので、衝突力も小さくでき、その結果、各把持爪が時間差を持ってウェハ15に接触しても、再調整ができない程度までウェハ15を回転させてしまうことを回避できる。   However, in the present embodiment, the gripping claws 10A, 10B, 11A, and 11B are brought into contact with the wafer 15 at a reduced speed, so that the collision force can be reduced. Even if the wafer 15 is brought into contact with the wafer 15, it is possible to avoid rotating the wafer 15 to such an extent that readjustment cannot be performed.

尚、ウェハ15に対して把持爪10A,10B,11A,11Bを静かに接触させるために、各把持爪の当初からの移動速度をウェハ15への接触時の移動速度に合わせることも一考である。しかし、各把持爪の全ての移動速度をウェハ15への接触時の移動速度に合わせた場合、ウェハ15の把持指令からウェハ15を把持し、さらにウェハ15を開放させるまでの時間が長くなり、ウェハの搬送時間を長引かせることになり、搬送作業効率を大きく低下させる問題がある。したがって、本実施の形態のように、各把持爪の移動速度をウェハ15に接触する直前に減速させることが望ましい。   Incidentally, in order to bring the gripping claws 10A, 10B, 11A, and 11B into gentle contact with the wafer 15, it is also possible to match the movement speed of each gripping claw from the beginning with the movement speed at the time of contact with the wafer 15. is there. However, when all the moving speeds of the gripping claws are matched with the moving speed at the time of contact with the wafer 15, it takes a long time to grip the wafer 15 from the gripping command of the wafer 15 and further open the wafer 15, There is a problem that the wafer transfer time is prolonged and the transfer work efficiency is greatly reduced. Therefore, it is desirable to decelerate the moving speed of each gripping claw immediately before contacting the wafer 15 as in the present embodiment.

この外、アクチュエータ3として例えばサーボモータとスクリューとの組合せを利用して複数の把持爪を駆動することも考えられるが、装置が大掛かりになると共にサーボモータの回転数や回転方向を制御する制御装置が必要となり、ウェハの搬送装置1の製造価格を増大させるので、本実施の形態のように僅かな費用で簡単に付加できる減速手段7を用いることが望ましい。   In addition, it is conceivable to drive a plurality of gripping claws using, for example, a combination of a servo motor and a screw as the actuator 3. However, the apparatus becomes large and the control device controls the rotation speed and rotation direction of the servo motor. Therefore, it is desirable to use the speed reduction means 7 that can be easily added at a low cost as in the present embodiment.

本実施の形態においては、第1磁石12と第2磁石13とを同極同士を対向させたものであるが、例えば図3及び図4の2点差線で示すように、第1磁石12を第2磁石13のN極に対して(S)極として磁気吸引力を発生させることで、各把持爪の移動速度を把持直前に減速させるようにしてもよい。即ち、駆動軸8の駆動当初は、図3に示すように、移動方向に磁気吸引力で引き付けられるようにし、各把持爪がウェハを把持する直前には、図4に示すように、移動方向とは反対向きに磁気吸引力が作用するようにすることで、各把持爪の移動速度は、当初は早く、把持直前に減速させることができる。   In the present embodiment, the first magnet 12 and the second magnet 13 have the same poles facing each other. For example, as shown by a two-dot chain line in FIGS. The moving speed of each gripping claw may be reduced immediately before gripping by generating a magnetic attractive force as the (S) pole with respect to the N pole of the second magnet 13. That is, at the beginning of driving of the drive shaft 8, as shown in FIG. 3, it is attracted by the magnetic attraction force in the moving direction, and immediately before each gripping claw grips the wafer, as shown in FIG. By making the magnetic attraction force act in the opposite direction, the moving speed of each gripping claw is initially high and can be decelerated immediately before gripping.

本実施の形態において、減速手段7を構成する第1磁石12と第2磁石13とが、本発明の把持部材の移動を抑制する抵抗部材、把持部材の把持方向の移動に伴って磁気力を増大させる手段となる。   In the present embodiment, the first magnet 12 and the second magnet 13 constituting the speed reducing means 7 are a resistance member that suppresses the movement of the gripping member of the present invention, and generates a magnetic force along with the movement of the gripping member in the gripping direction. It becomes a means to increase.

次に、本発明による第2の実施の形態を図7及び図8に基づいて説明する。本実施の形態において第1の実施の形態と異なる構成は、減速手段7の構成であり、ウェハの搬送装置の基本構成は図1及び図2と同じである。したがって、図1〜図5と同一符号は同一部品を示すので、再度の詳細な説明は省略する。   Next, a second embodiment according to the present invention will be described with reference to FIGS. In the present embodiment, the configuration different from the first embodiment is the configuration of the speed reduction means 7, and the basic configuration of the wafer transfer device is the same as in FIGS. 1 and 2. Therefore, the same reference numerals as those in FIGS. 1 to 5 indicate the same components, and detailed description thereof will not be repeated.

本実施の形態による減速手段7は、駆動軸8の先端部に設けた球状突起16と、前記駆動軸8の進退によって前記球状突起16と接触するプランジャノーズ17と、このプランジャノーズ17を前記球状突起16側に押圧する圧縮ばね18と、この圧縮ばね18と前記プランジャノーズ17を収納し前記プランジャノーズ18を前記球状突起16側に案内するプランジャ本体19とを備えている。そして、プランジャ本体19を前記ベース2(図1及び図2参照)に調整可能に取り付けることで、前記球状突起16と前記プランジャノーズ18との位置関係を調整している。   The speed reduction means 7 according to the present embodiment includes a spherical protrusion 16 provided at the tip of the drive shaft 8, a plunger nose 17 that contacts the spherical protrusion 16 by the advancement and retraction of the drive shaft 8, and the plunger nose 17 as the spherical nose. A compression spring 18 that presses toward the protrusion 16 side, and a plunger main body 19 that houses the compression spring 18 and the plunger nose 17 and guides the plunger nose 18 toward the spherical protrusion 16 are provided. And the positional relationship of the said spherical protrusion 16 and the said plunger nose 18 is adjusted by attaching the plunger main body 19 to the said base 2 (refer FIG.1 and FIG.2) so that adjustment is possible.

本実施の形態において、各把持爪がウェハを把持する前は、図7の状態にあり、この状態でアクチュエータ3が動作して駆動軸8が矢印A方向に駆動されると、その先端の球状突起16がプランジャノーズ17に接近し、ついには球状突起16がプランジャノーズ17に接触する。さらに、駆動軸8の駆動を続けると、図8に示すように、駆動軸8の先端の球状突起16はプランジャノーズ17を圧縮ばね18に逆らってプランジャ本体19内に押し込む。この動作、即ち、球状突起16が圧縮ばね18に逆らってプランジャ本体19内にプランジャノーズ17を押し込むことにより、駆動軸8の移動速度、云い代えれば各把持爪の移動速度を減速させ、把持爪のウェハへの接触を低速度で行うことができる。尚、球状突起16がプランジャ本体19を最大量押し込む時点、云い代えれば圧縮ばね18の弾性力が最も低下して反発力が最大となり変形量が最小となるときを、各把持爪がウェハに接触するときに一致させることで、ウェハに接触する時点での把持爪の移動速度を最も遅くすることができる。そして、球状突起16がプランジャノーズ17を乗り越えることで、アクチュエータ3の駆動力が把持爪に伝達されてウェハを把持するので、ウェハを十分に把持することができる。   In the present embodiment, before each gripping claw grips the wafer, it is in the state shown in FIG. 7. In this state, when the actuator 3 operates and the drive shaft 8 is driven in the direction of arrow A, the tip of the ball is spherical. The protrusion 16 approaches the plunger nose 17 and finally the spherical protrusion 16 contacts the plunger nose 17. When the drive shaft 8 continues to be driven, the spherical protrusion 16 at the tip of the drive shaft 8 pushes the plunger nose 17 into the plunger body 19 against the compression spring 18 as shown in FIG. In this operation, that is, when the spherical protrusion 16 pushes the plunger nose 17 into the plunger main body 19 against the compression spring 18, the moving speed of the drive shaft 8, in other words, the moving speed of each gripping claw is reduced. Can be contacted at a low speed. Each gripping claw contacts the wafer when the spherical protrusion 16 pushes the plunger body 19 by the maximum amount, in other words, when the elastic force of the compression spring 18 is the lowest and the repulsion force is maximum and the deformation amount is minimum. By making them coincide with each other, the moving speed of the gripping claws when contacting the wafer can be made the slowest. Since the spherical protrusion 16 gets over the plunger nose 17, the driving force of the actuator 3 is transmitted to the gripping claws to grip the wafer, so that the wafer can be gripped sufficiently.

本実施の形態において、前記球状突起16とプランジャノーズ17とは、夫々固定された物体であり、そのために両者の接触抵抗が大きくなる。このような両者の接触抵抗を軽減するために、球状突起16とプランジャノーズ17のいずれか一方あるいは両方を回転体に代えることも可能である。また、圧縮ばね18と前記プランジャ本体19を含む前記プランジャノーズ17を駆動軸8側に取り付け、球状突起16をベース2に取り付けるようにしてもよい。   In the present embodiment, the spherical protrusion 16 and the plunger nose 17 are fixed objects, respectively, and the contact resistance between them is increased. In order to reduce the contact resistance between the two, either one or both of the spherical protrusion 16 and the plunger nose 17 can be replaced with a rotating body. The plunger nose 17 including the compression spring 18 and the plunger main body 19 may be attached to the drive shaft 8 side, and the spherical protrusion 16 may be attached to the base 2.

以上説明したように、本実施の形態においても、各把持爪の移動速度をウェハに接触直前に、減速することができるので、第1の実施の形態と同等の効果を奏することができる。   As described above, also in the present embodiment, since the moving speed of each gripping claw can be decelerated immediately before contacting the wafer, the same effect as that of the first embodiment can be obtained.

本実施の形態において、球状突起16、プランジャノーズ17、圧縮ばね18、プランジャ本体19が、本発明による把持部材の移動を抑制する抵抗部材、把持部材の移動に伴って弾性力を低下させる手段、弾性体の反発力を増大させる手段、弾性体の変軽量を小さくさせる手段となる。   In the present embodiment, the spherical protrusion 16, the plunger nose 17, the compression spring 18, and the plunger main body 19 are resistance members for suppressing the movement of the gripping member according to the present invention, means for reducing the elastic force with the movement of the gripping member, It becomes a means for increasing the repulsive force of the elastic body and a means for reducing the variable weight of the elastic body.

次に、本発明による第3の実施の形態を図9及び図10に基づいて説明する。本実施の形態において前記各実施の形態と異なる構成は、減速手段7の構成であり、ウェハの搬送装置の基本構成は図1及び図2と同じである。したがって、図1〜図5と同一符号は同一部品を示すので、再度の詳細な説明は省略する。   Next, a third embodiment according to the present invention will be described with reference to FIGS. In the present embodiment, the configuration different from each of the above embodiments is the configuration of the speed reduction means 7, and the basic configuration of the wafer transfer apparatus is the same as in FIGS. 1 and 2. Therefore, the same reference numerals as those in FIGS. 1 to 5 indicate the same components, and detailed description thereof will not be repeated.

本実施の形態における減速手段7は、駆動軸8の先端部にゴム等の弾性体20を設けた点と、弾性体20と対向する位置に球状突起21を設けた点である。そして球状突起21を前記ベース2(図1及び図2参照)に調整可能に取り付けることで、弾性体20と球状突起21との位置関係を調整している。   The speed reduction means 7 in the present embodiment is that an elastic body 20 such as rubber is provided at the tip of the drive shaft 8 and a spherical protrusion 21 is provided at a position facing the elastic body 20. And the positional relationship of the elastic body 20 and the spherical protrusion 21 is adjusted by attaching the spherical protrusion 21 to the said base 2 (refer FIG.1 and FIG.2) so that adjustment is possible.

本実施の形態において、各把持爪がウェハを把持する前は図9の状態にあり、この状態でアクチュエータ3により駆動軸8が矢印A方向に駆動されると、その先端の弾性体20が球状突起21に接近し、ついには弾性体20が球状突起21に接触する。さらに、駆動軸8の駆動を続けると、図10に示すように、弾性体20は球状突起21に押付けられ、弾性変形する。この動作、即ち、球状突起21によって弾性体20が弾性変形させる動作により、駆動軸8の移動速度、云い代えれば各把持爪の移動速度を減速させ、把持爪のウェハへの接触を低速度で行うことができる。尚、弾性体20が最大量弾性変形する時点を、各把持爪がウェハに接触する時点に一致させることで、ウェハに接触する時点での把持爪の移動速度を最も遅くすることができる。そして、弾性体20が球状突起21を乗り越えることで、把持爪の減速は解除され、ウェハの把持力を発生するので、ウェハを十分に把持することができる。   In the present embodiment, each gripping claw is in the state shown in FIG. 9 before gripping the wafer, and when the drive shaft 8 is driven in the direction of arrow A by the actuator 3 in this state, the elastic body 20 at the tip is spherical. The elastic body 20 comes into contact with the spherical protrusion 21 until the protrusion 21 is approached. Further, when the drive shaft 8 continues to be driven, the elastic body 20 is pressed against the spherical protrusion 21 and elastically deformed as shown in FIG. By this operation, that is, the elastic body 20 is elastically deformed by the spherical protrusion 21, the moving speed of the drive shaft 8, in other words, the moving speed of each gripping claw is decelerated, and the gripping claw contacts the wafer at a low speed. It can be carried out. By matching the time point when the elastic body 20 is elastically deformed by the maximum amount with the time point when each gripping claw contacts the wafer, the moving speed of the gripping claw when contacting the wafer can be slowed down. Since the elastic body 20 gets over the spherical protrusion 21, the deceleration of the gripping claw is released and the wafer gripping force is generated, so that the wafer can be gripped sufficiently.

本実施の形態において、ゴム等から構成された弾性体20は、球状突起21との間の摩擦力が大きくなる。大きな摩擦力を嫌う場合には、弾性体20と接触する球状突起21を回転体に代えることも可能である。また、球状突起21を駆動軸8側に取り付け、弾性体20をベース2に取り付けるようにしてもよい。   In the present embodiment, the elastic body 20 made of rubber or the like has a large frictional force with the spherical protrusion 21. When a large frictional force is disliked, the spherical protrusion 21 that contacts the elastic body 20 can be replaced with a rotating body. Further, the spherical protrusion 21 may be attached to the drive shaft 8 side, and the elastic body 20 may be attached to the base 2.

本実施の形態によっても、把持爪の移動速度を、ウェハを把持する直前に減速できることから、第1及び第2の実施の形態と同等の効果を奏することができる。   Also according to the present embodiment, since the moving speed of the gripping claws can be reduced immediately before gripping the wafer, the same effects as those of the first and second embodiments can be achieved.

本実施の形態において、弾性体20と球状突起21が、本発明による把持部材の移動を抑制する抵抗部材、把持部材の移動に伴って弾性力を低下させる手段、弾性体の反発力を増大させる手段、弾性体の変軽量を小さくさせる手段となる。   In the present embodiment, the elastic body 20 and the spherical protrusion 21 are a resistance member for suppressing the movement of the gripping member according to the present invention, a means for reducing the elastic force with the movement of the gripping member, and increasing the repulsive force of the elastic body. Means and means for reducing the change in weight of the elastic body.

図11及び図12は、図7及び図8の変形例を示す本発明による第4の実施の形態であり、図7及び図8と同一符号は同一部品を示すので、再度の詳細な説明は省略する。   11 and 12 show a fourth embodiment according to the present invention showing a modification of FIGS. 7 and 8. The same reference numerals as those in FIGS. Omitted.

本実施の形態による減速手段7は、駆動軸8の先端部に設けた球状突起16と、前記駆動軸8の進退によって前記球状突起16と接触するローラ22と、このローラ22を一端に回転自在に支持し他端をベース2(図1参照)に支持した支軸23に回転自在に連結したレバー24と、このレバー24と前記ベース2間に設置した圧縮ばね25とを備えている。そして、支軸23を前記ベース2に調整可能に取り付けることで、前記球状突起16と前記ローラ22との位置関係を調整している。   The speed reduction means 7 according to the present embodiment includes a spherical protrusion 16 provided at the tip of the drive shaft 8, a roller 22 that contacts the spherical protrusion 16 as the drive shaft 8 advances and retreats, and the roller 22 is rotatable at one end. And a lever 24 rotatably connected to a support shaft 23 whose other end is supported by the base 2 (see FIG. 1), and a compression spring 25 installed between the lever 24 and the base 2. And the positional relationship between the spherical protrusion 16 and the roller 22 is adjusted by attaching the support shaft 23 to the base 2 in an adjustable manner.

本実施の形態において、各把持爪がウェハを把持する前は、図11の状態にあり、この状態で駆動軸8が矢印A方向に駆動されると、その先端の球状突起16がローラ22に接近し、ついには球状突起16がローラ22に接触する。さらに、駆動軸8の駆動を続けると、図12に示すように、駆動軸8の先端の球状突起16は圧縮ばね25を圧縮してローラ22を下方に変位させる。この動作、即ち、球状突起16が圧縮ばね25に逆らってローラ22を変位させることにより、駆動軸8の移動速度、云い代えれば各把持爪の移動速度を減速させ、把持爪のウェハへの接触を低速度で行うことができる。尚、球状突起16がローラ22を最大量変位させる点を、各把持爪がウェハに接触するときに一致させることで、ウェハに接触する時点での把持爪の移動速度を最も遅くすることができる。そして、球状突起16がローラ22を乗り越えることで、アクチュエータ3の駆動力が把持爪に伝達されてウェハを把持するので、ウェハを十分に把持することができる。   In the present embodiment, before each gripping claw grips the wafer, it is in the state shown in FIG. 11. When the drive shaft 8 is driven in the direction of arrow A in this state, the spherical protrusion 16 at the tip of the driving shaft 8 is applied to the roller 22. The spherical protrusion 16 comes into contact with the roller 22 at last. When the drive shaft 8 continues to be driven, as shown in FIG. 12, the spherical protrusion 16 at the tip of the drive shaft 8 compresses the compression spring 25 and displaces the roller 22 downward. This operation, that is, the spherical protrusion 16 displaces the roller 22 against the compression spring 25, thereby decelerating the moving speed of the drive shaft 8, in other words, the moving speed of each gripping claw, so that the gripping claw contacts the wafer. Can be performed at a low speed. The point at which the spherical protrusion 16 displaces the roller 22 by the maximum amount is matched when each gripping claw comes into contact with the wafer, so that the moving speed of the gripping claw at the time of contact with the wafer can be slowed down. . Since the spherical protrusion 16 gets over the roller 22, the driving force of the actuator 3 is transmitted to the gripping claws and grips the wafer, so that the wafer can be gripped sufficiently.

本実施の形態において、前記球状突起16が駆動軸8に設けられ、ローラ22がレバー24に設けられているが、球状突起16をレバー24に設け、ローラ22を駆動軸8に設けてもよく、さらに、球状突起16を回転体に代えることも可能である。   In the present embodiment, the spherical protrusion 16 is provided on the drive shaft 8 and the roller 22 is provided on the lever 24. However, the spherical protrusion 16 may be provided on the lever 24 and the roller 22 may be provided on the drive shaft 8. Furthermore, it is possible to replace the spherical protrusion 16 with a rotating body.

以上説明したように、本実施の形態においても、各把持爪の移動速度をウェハに接触直前に、減速することができるので、第4の実施の形態と同等の効果を奏することができる。   As described above, also in the present embodiment, since the moving speed of each gripping claw can be decelerated immediately before contacting the wafer, the same effects as in the fourth embodiment can be achieved.

本実施の形態において、球状突起16、ローラ22、支軸23、レバー24、圧縮ばね25が、本発明による把持部材の移動を抑制する抵抗部材、把持部材の移動に伴って弾性力を低下させる手段、弾性体の反発力を増大させる手段、弾性体の変軽量を小さくさせる手段となる。   In the present embodiment, the spherical protrusion 16, the roller 22, the support shaft 23, the lever 24, and the compression spring 25 reduce the elastic force with the movement of the resistance member that suppresses the movement of the gripping member according to the present invention and the gripping member. This means, means for increasing the repulsive force of the elastic body, and means for reducing the change in weight of the elastic body.

次に、本発明による第5の実施の形態を図13及び図14に基づいて説明する。尚、図1〜図5,図7〜図14と同一符号は同一部品を示すので、再度の詳細な説明は省略する。   Next, a fifth embodiment according to the present invention will be described with reference to FIGS. 1 to 5 and FIGS. 7 to 14 indicate the same parts, and detailed description thereof is omitted.

本実施の形態における減速手段7は、駆動軸8の先端部に設けた押圧体26と、前記駆動軸8の進退によって前記押圧体26と接触する弾性体27と、この弾性体27をベース2(図1参照)の定位置に保持する保持部材(図示せず)とを備えている。そして、弾性体27を前記ベース2に調整可能に取り付けることで、前記押圧体6と前記弾性体27との位置関係を調整している。   The speed reduction means 7 in the present embodiment includes a pressing body 26 provided at the tip of the drive shaft 8, an elastic body 27 that contacts the pressing body 26 by the advancement and retraction of the driving shaft 8, and the elastic body 27 as a base 2. And a holding member (not shown) for holding in a fixed position (see FIG. 1). The positional relationship between the pressing body 6 and the elastic body 27 is adjusted by attaching the elastic body 27 to the base 2 in an adjustable manner.

本実施の形態において、各把持爪がウェハを把持する前は、図13の状態にあり、この状態で駆動軸8が矢印A方向に駆動されると、その先端の押圧体26が弾性体27に接近し、ついには押圧体26が弾性体27に接触する。さらに、駆動軸8の駆動を続けると、図14に示すように、押圧体26は弾性体27を圧縮して変形させる。この動作、即ち、押圧体26が弾性体27を変形させることにより、駆動軸8の移動速度、云い代えれば各把持爪の移動速度を減速させ、把持爪のウェハへの接触を低速度で行うことができる。尚、押圧体26が弾性体27を最大量変位させる点を、各把持爪がウェハに接触するときに一致させることで、ウェハに接触する時点での把持爪の移動速度を最も遅くすることができる。   In the present embodiment, before each gripping claw grips the wafer, it is in the state shown in FIG. 13. When the drive shaft 8 is driven in the direction of arrow A in this state, the pressing body 26 at the tip of the driving shaft 8 is the elastic body 27. Finally, the pressing body 26 comes into contact with the elastic body 27. Further, when the drive shaft 8 continues to be driven, the pressing body 26 compresses and deforms the elastic body 27 as shown in FIG. In this operation, that is, the pressing body 26 deforms the elastic body 27, the moving speed of the drive shaft 8, in other words, the moving speed of each gripping claw is decelerated, and the gripping claw contacts the wafer at a low speed. be able to. The point at which the pressing body 26 displaces the elastic body 27 by the maximum amount is matched when each gripping claw comes into contact with the wafer, so that the moving speed of the gripping claw at the time of contact with the wafer can be slowed down. it can.

尚、前記弾性体27は、ゴム製の中実ボールでも、環状のばねでもよく、さらに、ゴム製の中空ボールに圧縮空気を封入したものでもよい。   The elastic body 27 may be a rubber solid ball or an annular spring, and may be a rubber hollow ball filled with compressed air.

以上説明したように、本実施の形態においても、各把持爪の移動速度をウェハに接触直前に、減速することができるので、第4の実施の形態と同等の効果を奏することができる。   As described above, also in the present embodiment, since the moving speed of each gripping claw can be decelerated immediately before contacting the wafer, the same effects as in the fourth embodiment can be achieved.

本実施の形態において、押圧体26と弾性体27が、本発明による把持部材の移動を抑制する抵抗部材、把持部材の移動に伴って弾性力を低下させる手段、弾性体の反発力を増大させる手段、弾性体の変軽量を小さくさせる手段となる。   In the present embodiment, the pressing body 26 and the elastic body 27 are a resistance member for suppressing the movement of the gripping member according to the present invention, a means for reducing the elastic force along with the movement of the gripping member, and increasing the repulsive force of the elastic body. Means and means for reducing the change in weight of the elastic body.

この外、図示はしないが、例えば油やゲル状、あるいはゼリー状の流動物質を、前記駆動軸8の移動に伴って駆動軸8の先端部で流動させ、その流動物質を流路の中間に設けた小断面流路を通過させることで、駆動軸8の移動速度、云い代えれば把持部材の移動速度を減速させるようにしてもよい。   In addition to this, although not shown, for example, an oil, gel, or jelly-like fluid substance flows at the tip of the drive shaft 8 as the drive shaft 8 moves, and the fluid substance is placed in the middle of the flow path. The moving speed of the drive shaft 8, in other words, the moving speed of the gripping member may be reduced by passing through the provided small cross-sectional flow path.

この実施の形態の場合、流動物質と、小断面流路を有する流動物質の流路とが、本発明による減速手段、把持部材の移動を抑制する抵抗部材となる。   In the case of this embodiment, the flow material and the flow channel of the flow material having a small cross-sectional flow path are resistance members that suppress the movement of the speed reduction means and the gripping member according to the present invention.

次に、各形態における把持爪の移動時間を図15に基づいて説明する。図15に示した実線Aは本実施形態によるもの、破線Bは従来によるもの、点線Cは従来において移動速度を遅くしたもの、2点差線Dは本実施の形態で移動速度を早くしたものを示す。   Next, the movement time of the gripping claws in each embodiment will be described with reference to FIG. The solid line A shown in FIG. 15 is the one according to the present embodiment, the broken line B is the conventional one, the dotted line C is the one that has slowed the moving speed in the prior art, and the two-dot difference line D is the one that has increased the moving speed in the present embodiment. Show.

図15に示すように、本実施の形態による搬送装置(実線A)によれば、ウェハの把持指令から把持までに要する把持爪の移動時間T0は、従来の搬送装置(破線B)と同じである。しかし、前述のようにウェハ把持までの把持爪の移動速度を早くし、把持直前で減速することで、把持爪のウェハへの衝突力を小さくできるので、ウェハからの損傷粒子の飛散を少なくすることができる。   As shown in FIG. 15, according to the transfer apparatus (solid line A) according to the present embodiment, the gripping claw movement time T0 required from the wafer holding command to the holding is the same as that of the conventional transfer apparatus (broken line B). is there. However, as described above, by increasing the moving speed of the gripping claws until wafer gripping and decelerating just before gripping, the impact force of the gripping claws to the wafer can be reduced, so that the scattering of damaged particles from the wafer is reduced. be able to.

また、従来において、移動速度を遅くすると点線Cに示すように、ウェハ把持までの把持爪の移動速度T2が長くなり、搬送効率を低下させることになる。しかし、本実施の形態において、ウェハ把持までの把持爪の移動速度をさらに早くすることで、2点鎖線Dで示すように、移動時間T2は短縮されて搬送効率を高めることができる。   Conventionally, if the moving speed is slowed down, as indicated by the dotted line C, the moving speed T2 of the gripping claws until the wafer is gripped becomes longer and the transport efficiency is lowered. However, in the present embodiment, by further increasing the movement speed of the gripping claws until the wafer is gripped, as indicated by a two-dot chain line D, the movement time T2 can be shortened and the conveyance efficiency can be increased.

以上説明したように本発明によれば、把持爪によるウェハの把持時に、把持爪の移動速度を減速することで、ウェハへの把持爪の衝突力を低減できるので、把持爪の衝突力二よりウェハから飛散する損傷粒子の発生を少なくすることができる。   As described above, according to the present invention, when the wafer is gripped by the gripping claw, the gripping claw collision force on the wafer can be reduced by reducing the moving speed of the gripping claw. The generation of damaged particles scattered from the wafer can be reduced.

ところで上述のウェハの搬送装置1は、互いに逆方向に駆動される第1ハンドフレーム5及び第2ハンドフレーム6と、これらに設けられた中間部が括れた鼓状の把持爪10A,10B,11A,11Bとでウェハを把持しているが、図16及び図17に示すウェハの搬送装置30にも本発明を適用することができる。   By the way, the wafer transfer apparatus 1 described above includes a first hand frame 5 and a second hand frame 6 that are driven in opposite directions, and drum-shaped gripping claws 10A, 10B, and 11A in which intermediate portions provided on these are constricted. 11B, the wafer is held, but the present invention can also be applied to the wafer transfer apparatus 30 shown in FIGS.

即ち、図16及び図17に示すウェハの搬送装置30は、搬送機器(図示せず)に固定されるベース2と、このベース2に固定された、例えばエアシリンダや真空シリンダ等からなるアクチュエータ3と、このアクチュエータ3から突出し一方向に進退する駆動軸8と、前記ベース2に固定されU字状に形成された固定ハンドフレーム31と、この固定ハンドフレーム31のU字状の先端部に夫々固定された円柱の中間部が括れた鼓状の固定把持爪32A,32Bと、前記駆動軸8に連結され前記固定把持爪32A,32Bとほぼ同形状をなし固定把持爪32A,32Bとの間隔を拡縮する可動把持爪33と、この可動把持爪33に連結された速度制御棒34と、この速度制御棒34の移動速度を減速する減速手段7とから構成されている。   That is, the wafer transfer device 30 shown in FIGS. 16 and 17 includes a base 2 fixed to a transfer device (not shown), and an actuator 3 fixed to the base 2 such as an air cylinder or a vacuum cylinder. A drive shaft 8 that protrudes from the actuator 3 and advances and retreats in one direction, a fixed hand frame 31 that is fixed to the base 2 and is formed in a U-shape, and a U-shaped tip of the fixed hand frame 31, respectively. The interval between the drum-shaped fixed gripping claws 32A and 32B in which the middle part of the fixed cylinder is constricted and the fixed gripping claws 32A and 32B connected to the drive shaft 8 and having substantially the same shape as the fixed gripping claws 32A and 32B. A movable gripping claw 33 that expands and contracts, a speed control rod 34 connected to the movable gripping claw 33, and a speed reduction means 7 that decelerates the moving speed of the speed control rod 34.

上記構成のウェハの搬送装置30は、ウェハ15を把持するときには、可動把持爪33のみ矢印A方向に移動させて固定把持爪32A,32Bとの間でウェハ15のエッジを把持する。そして、前記減速手段7は、既述の各減速手段と同じ構成とする。しかし、前記ウェハの搬送装置1の各減速手段7は、駆動軸8が減速手段7内に入り込む動作時に機能するように構成されているので、駆動軸8と連動する制御棒34が把持動作時に減速手段7から突出するウェハの搬送装置30では、制御棒34が減速手段7から突出するときに、機能するように構成することが必要である。   When gripping the wafer 15, the wafer transfer apparatus 30 configured as described above moves only the movable gripping claw 33 in the direction of arrow A to grip the edge of the wafer 15 between the fixed gripping claws 32 </ b> A and 32 </ b> B. The speed reduction means 7 has the same configuration as each speed reduction means described above. However, each speed reduction means 7 of the wafer transfer apparatus 1 is configured to function when the drive shaft 8 enters the speed reduction means 7, so that the control rod 34 interlocked with the drive shaft 8 is operated during the gripping operation. The wafer transfer device 30 protruding from the speed reduction means 7 needs to be configured to function when the control rod 34 protrudes from the speed reduction means 7.

また、上記説明は、ウェハの検査装置に用いられる搬送装置を例に説明したが、これらに限定されるものではなく、フラットパネルディスプレイ装置のガラス基板等の精密薄板材の製造装置や検査装置に用いられる精密薄板材の搬送装置にも適用できるのは勿論のことである。   In addition, the above description has been described with reference to a transfer device used in a wafer inspection apparatus, but the present invention is not limited to these, and the present invention is not limited to these, and is applicable to a manufacturing apparatus and inspection apparatus for precision thin plate materials such as a glass substrate of a flat panel display device. Needless to say, the present invention can also be applied to a precision thin plate material transfer device used.

本発明による精密薄板材の搬送装置の第1の実施の形態を示す平面図。The top view which shows 1st Embodiment of the conveyance apparatus of the precision thin-plate material by this invention. 図1のA−A線に沿う縦断側面図。FIG. 2 is a longitudinal side view taken along line AA in FIG. 1. 図1に用いた減速手段の待機状態を示す概略側面図。The schematic side view which shows the standby state of the deceleration means used for FIG. 図1に用いた減速手段の把持状態を示す概略側面図。The schematic side view which shows the holding | grip state of the deceleration means used for FIG. (a)〜(c)は、図1の精密薄板材の搬送装置の各時点の把持爪の位置を示す平面図。(A)-(c) is a top view which shows the position of the holding nail | claw of each time of the conveyance apparatus of the precision thin-plate material of FIG. 図1の精密薄板材の搬送装置の把持爪の位置と力及び移動速度を示す線図。FIG. 2 is a diagram showing the position, force, and moving speed of a gripping claw of the precision thin plate material conveying device of FIG. 本発明による精密薄板材の搬送装置の第2の実施の形態を示す側面図。The side view which shows 2nd Embodiment of the conveyance apparatus of the precision thin-plate material by this invention. 図7の把持位置を示す側面図。The side view which shows the holding | grip position of FIG. 本発明による精密薄板材の搬送装置の第3の実施の形態を示す側面図。The side view which shows 3rd Embodiment of the conveyance apparatus of the precision thin-plate material by this invention. 図9の把持位置を示す側面図。The side view which shows the holding | grip position of FIG. 本発明による精密薄板材の搬送装置の第4の実施の形態を示す側面図。The side view which shows 4th Embodiment of the conveyance apparatus of the precision thin-plate material by this invention. 図11の把持位置を示す側面図。The side view which shows the holding position of FIG. 本発明による精密薄板材の搬送装置の第5の実施の形態を示す側面図。The side view which shows 5th Embodiment of the conveyance apparatus of the precision thin-plate material by this invention. 図13の把持位置を示す側面図。The side view which shows the holding | grip position of FIG. 把持爪の移動時間と速度との関係を示す比較線図。The comparison diagram which shows the relationship between the movement time of a holding nail | claw, and speed. 本発明による精密薄板材の搬送装置の別な構成を示す平面図。The top view which shows another structure of the conveyance apparatus of the precision thin board | plate material by this invention. 図16のB−B線に沿う縦断側面図。FIG. 17 is a longitudinal side view taken along line BB in FIG. 16.

符号の説明Explanation of symbols

1,30…ウェハの搬送装置、3…アクチュエータ、5…第1ハンドフレーム、6…第2ハンドフレーム、7…減速手段、8…駆動軸、10A,10B11A,11B…把持爪、12…第1磁石、13…第2磁石、16,21…球状突起、17…プランジャノーズ、18,25…圧縮ばね、20,27…弾性体、22…ローラ、31…固定ハンドフレーム、32A,32B…固定把持爪、33…可動把持爪、34…速度制御棒。   DESCRIPTION OF SYMBOLS 1,30 ... Wafer conveyance apparatus, 3 ... Actuator, 5 ... 1st hand frame, 6 ... 2nd hand frame, 7 ... Deceleration means, 8 ... Drive shaft, 10A, 10B11A, 11B ... Gripping claw, 12 ... 1st Magnet, 13 ... second magnet, 16, 21 ... spherical projection, 17 ... plunger nose, 18, 25 ... compression spring, 20,27 ... elastic body, 22 ... roller, 31 ... fixed hand frame, 32A, 32B ... fixed grip Claw, 33 ... movable gripping claw, 34 ... speed control rod.

Claims (7)

精密薄板材の板面に沿って移動させて前記精密薄板材のエッジを把持する複数の把持部材を備えた精密薄板材の搬送装置において、前記把持部材の移動速度を前記精密薄板材のエッジに接触する直前に減速させる減速手段を設けたことを特徴とする精密薄板材の搬送装置。   In a precision thin plate material transport apparatus having a plurality of gripping members that move along the plate surface of the precision thin plate material and grip the edges of the precision thin plate material, the moving speed of the gripping member is set to the edge of the precision thin plate material. A precision thin plate material conveying apparatus comprising a speed reducing means for decelerating immediately before contact. 前記減速手段は、前記把持部材の移動を抑制する抵抗部材であることを特徴とする請求項1記載の精密薄板材の搬送装置。   2. The precision thin plate material conveying apparatus according to claim 1, wherein the speed reducing means is a resistance member that suppresses movement of the gripping member. 前記抵抗部材は、前記把持部材の移動に伴って流動する流動物質と、その流動物質の流路に設けた小断面流路で構成されていることを特徴とする請求項2記載の精密薄板材の搬送装置。   3. The precision thin plate material according to claim 2, wherein the resistance member includes a fluid substance that flows along with the movement of the gripping member and a small cross-sectional channel provided in the fluid substance channel. Transport device. 前記減速手段は、前記把持部材の移動に伴って弾性力を低下させる手段であることを特徴とする請求項1記載の精密薄板材の搬送装置。   2. The precision thin plate material conveying apparatus according to claim 1, wherein the speed reducing means is means for reducing an elastic force as the gripping member moves. 前記減速手段は、前記把持部材の把持方向の移動に伴って磁気力を増大させる手段であることを特徴とする請求項1記載の精密薄板材の搬送装置。   2. The precision thin plate material conveying apparatus according to claim 1, wherein the speed reducing means is means for increasing a magnetic force in accordance with movement of the gripping member in a gripping direction. 前記減速手段は、前記把持部材の把持方向の移動に伴って弾性体の反発力を増大させる手段であることを特徴とする請求項1記載の精密薄板材の搬送装置。   2. The precision thin plate material conveying apparatus according to claim 1, wherein the speed reducing means is means for increasing a repulsive force of the elastic body in accordance with movement of the gripping member in the gripping direction. 前記減速手段は、前記把持部材の把持方向の移動に伴って弾性体の変形量を小さくさせる手段であることを特徴とする請求項1記載の精密薄板材の搬送装置。
2. The precision thin plate material conveying apparatus according to claim 1, wherein the speed reducing means is means for reducing the deformation amount of the elastic body in accordance with movement of the gripping member in the gripping direction.
JP2004223020A 2004-07-30 2004-07-30 Transport device for precision thin-sheet material Pending JP2006041423A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008302437A (en) * 2007-06-05 2008-12-18 Nidec Sankyo Corp Industrial robot
KR101025017B1 (en) * 2007-10-05 2011-03-25 가와사키 쥬코교 가부시키가이샤 Target position detection apparatus for robot
CN112005360A (en) * 2018-07-06 2020-11-27 川崎重工业株式会社 Substrate transfer robot and control method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008302437A (en) * 2007-06-05 2008-12-18 Nidec Sankyo Corp Industrial robot
KR101025017B1 (en) * 2007-10-05 2011-03-25 가와사키 쥬코교 가부시키가이샤 Target position detection apparatus for robot
US8121732B2 (en) 2007-10-05 2012-02-21 Kawasaki Jukogyo Kabushiki Kaisha Target position detection apparatus for robot
CN112005360A (en) * 2018-07-06 2020-11-27 川崎重工业株式会社 Substrate transfer robot and control method thereof

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