JP2006019588A5 - - Google Patents
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- JP2006019588A5 JP2006019588A5 JP2004197117A JP2004197117A JP2006019588A5 JP 2006019588 A5 JP2006019588 A5 JP 2006019588A5 JP 2004197117 A JP2004197117 A JP 2004197117A JP 2004197117 A JP2004197117 A JP 2004197117A JP 2006019588 A5 JP2006019588 A5 JP 2006019588A5
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- medium
- color filter
- imaging device
- solid
- state imaging
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Claims (7)
各色信号に合わせて、フォトセンサ上方の屈折率差のある媒質の境界面形状が各画素ごとに異なる
ことを特徴とする固体撮像装置。 A solid-state imaging device including a color filter above each photosensor serving as a light receiving unit,
A solid-state imaging device, wherein a boundary surface shape of a medium having a refractive index difference above a photosensor is different for each pixel in accordance with each color signal.
フォトセンサ上方に形成される前記媒質の屈折率が上側媒質＜下側媒質の場合、
各画素の色に相当する波長範囲における屈折率差が大きい画素の媒質境界形状は凸形状に形成し、
前記屈折率差が小さい画素の媒質境界形状は凹形状に形成する
ことを特徴とする固体撮像装置。 A solid-state imaging device including a color filter above each photosensor serving as a light receiving unit,
When the refractive index of the medium formed above the photosensor is an upper medium <lower medium,
The medium boundary shape of the pixel having a large refractive index difference in the wavelength range corresponding to the color of each pixel is formed in a convex shape,
A solid-state imaging device, wherein a medium boundary shape of a pixel having a small refractive index difference is formed in a concave shape.
フォトセンサ上方に形成される前記媒質の屈折率が上側媒質＜下側媒質の場合、
媒質境界形状は凸形状であり、各画素の色に相当する波長範囲における屈折率差が大きい画素程凸形状の曲率が大きくなる
ことを特徴とする固体撮像装置。 A solid-state imaging device including a color filter above each photosensor serving as a light receiving unit,
When the refractive index of the medium formed above the photosensor is an upper medium <lower medium,
A solid-state imaging device characterized in that the medium boundary shape is a convex shape, and the curvature of the convex shape increases as the difference in refractive index in the wavelength range corresponding to the color of each pixel increases.
フォトセンサ上方に形成される媒質の屈折率が上側媒質＞下側媒質の場合、
各画素の色に相当する波長範囲における屈折率差が大きい画素の媒質境界形状は凸形状に形成し、
前記屈折率差が小さい画素の媒質境界形状は凹形状に形成する
ことを特徴とする固体撮像装置。 A solid-state imaging device including a color filter above each photosensor serving as a light receiving unit,
When the refractive index of the medium formed above the photosensor is higher medium> lower medium,
The medium boundary shape of the pixel having a large refractive index difference in the wavelength range corresponding to the color of each pixel is formed in a convex shape,
It said medium boundary shape of the pixel difference in refractive index is small solid state imaging device, and forming a concave shape.
フォトセンサ上方に形成される媒質の屈折率が上側媒質＞下側媒質の場合、
媒質境界形状は凹形状であり、各画素の色に相当する波長範囲における屈折率差が大きい画素ほど凹形状の曲率が小さくなる
ことを特徴とする固体撮像装置。 A solid-state imaging device including a color filter above each photosensor serving as a light receiving unit,
When the refractive index of the medium formed above the photosensor is higher medium> lower medium,
A solid-state imaging device, wherein the medium boundary shape is a concave shape, and the curvature of the concave shape decreases as the refractive index difference in the wavelength range corresponding to the color of each pixel increases.
前記色フィルターのうち上面が平坦な第１の色フィルター成分を形成する工程と、
前記第１の色フィルター成分を含む全面に該第１の色フィルター成分以外の部分の上面が凹形状となるように、第２の色フィルター材料膜を形成する工程と、
前記第２の色フィルター材料膜をフォトリソグラフィ法によりパターニングして上面が凹形状の第２の色フィルター成分を形成する工程と、
第３の色フィルター材料膜を形成し、フォトリソグラフィ法によりパターニングして第３の色フィルターを形成する工程と、
前記第３の色フィルター成分の上面を熱リフロー処理して凸形状に形成する工程と、
前記各色フィルター上に上側媒質層であるマイクロレンズを形成する工程を有する
ことを特徴とする固体撮像装置の製造方法。 A method of manufacturing a solid-state imaging device including a color filter composed of a plurality of color filter components, which is a lower medium layer above the photosensor of each light receiving unit,
Forming a first color filter component having a flat upper surface among the color filters;
Forming a second color filter material film on the entire surface including the first color filter component so that the upper surface of the portion other than the first color filter component has a concave shape;
Patterning the second color filter material film by a photolithography method to form a second color filter component having a concave upper surface;
Forming a third color filter material film and patterning by a photolithography method to form a third color filter;
Forming a convex shape by heat reflowing the upper surface of the third color filter component;
A method of manufacturing a solid-state imaging device, comprising: forming a microlens as an upper medium layer on each color filter.
前記下側媒質層上の第１の画素となる部分に凸状部を形成する工程と、
前記下側媒質層の第２の画素となる部分に開口を有するレジスト層を形成する工程と、
前記開口を介して等方性エッチングし、下側媒質層に凹状部を形成する工程と、
前記レジスト層を除去した後、前記下側媒質層より屈折率が大きい上側媒質層を積層する工程と、
前記上側媒質層上に各色フィルター成分及びマイクロレンズを形成する工程を有する
ことを特徴とする固体撮像装置の製造方法。 A method of manufacturing a solid-state imaging device including a color filter including a plurality of filter components above a photosensor of each light receiving unit,
Forming a convex portion in a portion to be the first pixel on the lower medium layer;
Forming a resist layer having an opening in a portion to be the second pixel of the lower medium layer;
Performing isotropic etching through the opening to form a concave portion in the lower medium layer;
Laminating an upper medium layer having a refractive index larger than that of the lower medium layer after removing the resist layer;
A method of manufacturing a solid-state imaging device, comprising: forming each color filter component and a microlens on the upper medium layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004197117A JP4595405B2 (en) | 2004-07-02 | 2004-07-02 | Solid-state imaging device and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004197117A JP4595405B2 (en) | 2004-07-02 | 2004-07-02 | Solid-state imaging device and manufacturing method thereof |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006019588A JP2006019588A (en) | 2006-01-19 |
| JP2006019588A5 true JP2006019588A5 (en) | 2007-12-13 |
| JP4595405B2 JP4595405B2 (en) | 2010-12-08 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004197117A Expired - Fee Related JP4595405B2 (en) | 2004-07-02 | 2004-07-02 | Solid-state imaging device and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4595405B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009164385A (en) * | 2008-01-08 | 2009-07-23 | Fujifilm Corp | Imaging device of rear face irradiation type |
| JP4998310B2 (en) * | 2008-02-15 | 2012-08-15 | 大日本印刷株式会社 | Solid-state imaging device and imaging apparatus using the same |
| JP2010205843A (en) * | 2009-03-02 | 2010-09-16 | Sharp Corp | Solid-state image sensor, method of manufacturing the same, and electronic information apparatus |
| CN104300071B (en) * | 2014-10-12 | 2017-10-31 | 河南中显电子有限公司 | A kind of Novel LED lamp bulb |
| JP2019091853A (en) * | 2017-11-16 | 2019-06-13 | ソニーセミコンダクタソリューションズ株式会社 | Solid state image pickup element and electronic apparatus |
| JP7417819B1 (en) | 2022-11-17 | 2024-01-19 | 東洋インキＳｃホールディングス株式会社 | Solid-state image sensor, solid-state image sensor manufacturing method, and electronic equipment |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2601148B2 (en) * | 1993-07-23 | 1997-04-16 | 日本電気株式会社 | Solid-state imaging device |
| JPH10174003A (en) * | 1996-12-12 | 1998-06-26 | Sony Corp | Solid-state image sensing device and its manufacture |
| JP3809708B2 (en) * | 1997-07-15 | 2006-08-16 | ソニー株式会社 | Solid-state imaging device and manufacturing method thereof |
| JP4329142B2 (en) * | 1998-11-24 | 2009-09-09 | ソニー株式会社 | Method for forming an in-layer lens |
| JP2002151670A (en) * | 2000-08-30 | 2002-05-24 | Sony Corp | Solid-state image pickup device and manufacturing method |
| JP2003086778A (en) * | 2001-09-11 | 2003-03-20 | Sharp Corp | Semiconductor device and manufacturing method therefor |
| JP2003249634A (en) * | 2002-02-25 | 2003-09-05 | Sony Corp | Solid imaging device and manufacturing method thereof |
-
2004
- 2004-07-02 JP JP2004197117A patent/JP4595405B2/en not_active Expired - Fee Related
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