JP2006013386A5 - - Google Patents

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JP2006013386A5
JP2006013386A5 JP2004192090A JP2004192090A JP2006013386A5 JP 2006013386 A5 JP2006013386 A5 JP 2006013386A5 JP 2004192090 A JP2004192090 A JP 2004192090A JP 2004192090 A JP2004192090 A JP 2004192090A JP 2006013386 A5 JP2006013386 A5 JP 2006013386A5
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electron
electron beam
exposure
potential
electrode
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JP2004192090A
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JP2006013386A (en
JP4477433B2 (en
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電子ビームを露光対象上に照射して露光する電子ビーム露光装置において、
電子源からの電子ビームを加速して放出する電子銃と、
前記電子ビームを複数の電子ビームに分割するアパーチャアレイと、
前記複数の電子ビームの前記露光対象上への照射をそれぞれ制御するブランキングアレイと、
前記複数の電子ビームをそれぞれ収束させるレンズアレイと、
前記複数の電子ビームの像を縮小投影する縮小投影系と、を備え、
前記ブランキングアレイにおける電子ビームの加速電位は、前記露光対象上における電子ビームの加速電位よりも低いことを特徴とする電子ビーム露光装置。 In an electron beam exposure apparatus that irradiates an exposure object with an electron beam and performs exposure,
An electron gun that accelerates and emits an electron beam from an electron source;
An aperture array for dividing the electron beam into a plurality of electron beams;
A blanking array for controlling the irradiation of the plurality of electron beams onto the exposure target;
A lens array for focusing each of the plurality of electron beams;
A reduction projection system for reducing and projecting images of the plurality of electron beams, and
An electron beam exposure apparatus, wherein an acceleration potential of an electron beam in the blanking array is lower than an acceleration potential of an electron beam on the exposure target. 前記ブランキングアレイと前記電子銃の間に、前記電子ビームの加速電位を減速させる減速電極と、
前記ブランキングアレイと前記露光対象の間に、前記電子ビームの加速電位を加速させる加速電極と、を備えることを特徴とする請求項１に記載の電子ビーム露光装置。 A decelerating electrode for decelerating the accelerating potential of the electron beam between the blanking array and the electron gun ,
The electron beam exposure apparatus according to claim 1 , further comprising an acceleration electrode that accelerates an acceleration potential of the electron beam between the blanking array and the exposure target . 前記減速電極および前記加速電極のうち少なくとも１つは、多段の電極からなることを特徴とする請求項２に記載の電子ビーム露光装置。 The electron beam exposure apparatus according to claim 2 , wherein at least one of the deceleration electrode and the acceleration electrode includes a multi-stage electrode . 前記ブランキングアレイと前記露光対象の間に、前記電子ビームの加速電位を加速させる加速電極を備えることを特徴とする請求項１に記載の電子ビーム露光装置。   2. The electron beam exposure apparatus according to claim 1, further comprising an acceleration electrode that accelerates an acceleration potential of the electron beam between the blanking array and the exposure target. 前記レンズアレイが、前記電子ビームの加速電位を加速させる機能を有していることを特徴とする請求項１に記載の電子ビーム露光装置。 2. The electron beam exposure apparatus according to claim 1 , wherein the lens array has a function of accelerating an acceleration potential of the electron beam. 縮小投影系を介して電子ビームを露光対象上に照射して露光する電子ビーム露光装置において、
電子源からの電子ビームを加速して放出する電子銃と、
前記電子ビームの前記露光対象上への照射を制御するブランカーと、を備え、
前記ブランカーにおける電子ビームの加速電位は、前記露光対象上における電子ビームの加速電位よりも低いことを特徴とする電子ビーム露光装置。 In an electron beam exposure apparatus that irradiates an exposure object with an electron beam via a reduction projection system and performs exposure,
An electron gun that accelerates and emits an electron beam from an electron source;
A blanker for controlling irradiation of the electron beam onto the exposure target ,
The electron beam exposure apparatus according to claim 1, wherein an acceleration potential of the electron beam in the blanker is lower than an acceleration potential of the electron beam on the exposure target. 請求項１〜６のいずれか１つに記載の電子ビーム露光装置を用いて露光対象に露光を行う工程と、露光された前記露光対象を現像する工程と、を有するデバイス製造方法。 A device manufacturing method comprising the steps of performing exposure on the exposure target using an electron beam exposure apparatus according to any one of claims 1 to 6, a step of developing the exposed the exposure target, the. 電子ビームを複数の電子ビームに分割して試料上に照射するマルチビーム電子光学系において、In a multi-beam electron optical system that divides an electron beam into a plurality of electron beams and irradiates the sample,
電子源からの電子ビームを加速して放出する電子銃と、  An electron gun that accelerates and emits an electron beam from an electron source;
前記電子ビームを複数の電子ビームに分割するアパーチャアレイと、  An aperture array for dividing the electron beam into a plurality of electron beams;
前記複数の電子ビームの前記試料上への照射をそれぞれ制御するブランキングアレイと、  A blanking array for controlling irradiation of the plurality of electron beams onto the sample, and
前記複数の電子ビームをそれぞれ収束させるレンズアレイと、  A lens array for focusing each of the plurality of electron beams;
前記複数の電子ビームの像を縮小投影する縮小投影系と、を備え、  A reduction projection system for reducing and projecting images of the plurality of electron beams, and
前記ブランキングアレイにおける電子ビームの加速電位は、前記試料上における電子ビームの加速電位よりも低いことを特徴とするマルチビーム電子光学系。  An electron beam accelerating potential in the blanking array is lower than an electron beam accelerating potential on the sample. 前記ブランキングアレイと前記電子銃の間に、前記電子ビームの加速電位を減速させる減速電極と、  A decelerating electrode for decelerating the accelerating potential of the electron beam between the blanking array and the electron gun,
前記ブランキングアレイと前記露光対象の間に、前記電子ビームの加速電位を加速させる加速電極と、を備えることを特徴とする請求項８に記載のマルチビーム電子光学系。  The multi-beam electron optical system according to claim 8, further comprising an accelerating electrode that accelerates an accelerating potential of the electron beam between the blanking array and the exposure target. 前記減速電極および前記加速電極のうち少なくとも１つは、多段の電極からなることを特徴とする請求項９に記載のマルチビーム電子光学系。  The multi-beam electron optical system according to claim 9, wherein at least one of the deceleration electrode and the acceleration electrode includes a multi-stage electrode. 前記ブランキングアレイと前記露光対象の間に、前記電子ビームの加速電位を加速させる加速電極を備えることを特徴とする請求項８に記載のマルチビーム電子光学系。The multi-beam electron optical system according to claim 8, further comprising an accelerating electrode that accelerates an accelerating potential of the electron beam between the blanking array and the exposure target. 前記レンズアレイが、前記電子ビームの加速電位を加速させる機能を有していることを特徴とする請求項８に記載のマルチビーム電子光学系。The multi-beam electron optical system according to claim 8, wherein the lens array has a function of accelerating an acceleration potential of the electron beam. 縮小投影系を介して電子ビームを試料上に照射する電子光学系おいて、In an electron optical system that irradiates a sample with an electron beam via a reduction projection system,
電子源からの電子ビームを加速して放出する電子銃と、  An electron gun that accelerates and emits an electron beam from an electron source;
前記電子ビームの照射を制御するブランカーと、を備え、A blanker for controlling the irradiation of the electron beam,
前記ブランカーにおける電子ビームの加速電位は、前記露光対象上における電子ビームの加速電位よりも低いことを特徴とする電子光学系。An electron optical system, wherein an acceleration potential of an electron beam on the blanker is lower than an acceleration potential of an electron beam on the exposure target.
JP2004192090A 2004-06-29 2004-06-29 Electron beam exposure apparatus and multi-beam electron optical system Expired - Fee Related JP4477433B2 (en)

Priority Applications (1)

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JP2004192090A JP4477433B2 (en) 2004-06-29 2004-06-29 Electron beam exposure apparatus and multi-beam electron optical system

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JP2004192090A JP4477433B2 (en) 2004-06-29 2004-06-29 Electron beam exposure apparatus and multi-beam electron optical system

Publications (3)

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JP2006013386A JP2006013386A (en) 2006-01-12
JP2006013386A5 true JP2006013386A5 (en) 2007-08-09
JP4477433B2 JP4477433B2 (en) 2010-06-09

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JP6720861B2 (en) 2016-12-28 2020-07-08 株式会社ニューフレアテクノロジー Multi-beam aperture set and multi-charged particle beam drawing device

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