JP2005501240A - 傾斜干渉計 - Google Patents

傾斜干渉計 Download PDF

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Publication number
JP2005501240A
JP2005501240A JP2003523929A JP2003523929A JP2005501240A JP 2005501240 A JP2005501240 A JP 2005501240A JP 2003523929 A JP2003523929 A JP 2003523929A JP 2003523929 A JP2003523929 A JP 2003523929A JP 2005501240 A JP2005501240 A JP 2005501240A
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JP
Japan
Prior art keywords
polarization interferometer
interferometer
polarization
wafer
illumination
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Pending
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JP2003523929A
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English (en)
Japanese (ja)
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JP2005501240A5 (enExample
Inventor
ヘンリー アレン ヒル，
Original Assignee
ザイゴ コーポレイション
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Application filed by ザイゴ コーポレイション filed Critical ザイゴ コーポレイション
Publication of JP2005501240A publication Critical patent/JP2005501240A/ja
Publication of JP2005501240A5 publication Critical patent/JP2005501240A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02059—Reducing effect of parasitic reflections, e.g. cyclic errors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02003—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02018—Multipass interferometers, e.g. double-pass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
JP2003523929A 2001-08-23 2002-08-14 傾斜干渉計 Pending JP2005501240A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US31449001P 2001-08-23 2001-08-23
PCT/US2002/025898 WO2003019109A1 (en) 2001-08-23 2002-08-14 Tilted interferometer

Publications (2)

Publication Number Publication Date
JP2005501240A true JP2005501240A (ja) 2005-01-13
JP2005501240A5 JP2005501240A5 (enExample) 2006-01-05

Family

ID=23220168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003523929A Pending JP2005501240A (ja) 2001-08-23 2002-08-14 傾斜干渉計

Country Status (4)

Country Link
US (1) US6806962B2 (enExample)
EP (1) EP1419360A4 (enExample)
JP (1) JP2005501240A (enExample)
WO (1) WO2003019109A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007537436A (ja) * 2004-05-11 2007-12-20 レニショウ　パブリック　リミテッド　カンパニー 偏光漏れによって生じるエラービームの除去または分離機能付きの偏光干渉計
US7443511B2 (en) 2003-11-25 2008-10-28 Asml Netherlands B.V. Integrated plane mirror and differential plane mirror interferometer system

Families Citing this family (19)

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US7262860B2 (en) * 2002-07-29 2007-08-28 Zygo Corporation Compensation for errors in off-axis interferometric measurements
US7274462B2 (en) * 2002-09-09 2007-09-25 Zygo Corporation In SITU measurement and compensation of errors due to imperfections in interferometer optics in displacement measuring interferometry systems
WO2004113826A2 (en) * 2003-06-19 2004-12-29 Zygo Corporation Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers
US7349072B2 (en) * 2003-10-09 2008-03-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7310152B2 (en) * 2004-03-03 2007-12-18 Zygo Corporation Interferometer assemblies having reduced cyclic errors and system using the interferometer assemblies
US7196797B2 (en) * 2004-05-28 2007-03-27 Agilent Technologies, Inc. Differential interferometer with improved cyclic nonlinearity
WO2006014406A2 (en) 2004-06-30 2006-02-09 Zygo Corporation Interferometric optical assemblies and systems including interferometric optical assemblies
WO2006041984A2 (en) * 2004-10-06 2006-04-20 Zygo Corporation Error correction in interferometry systems
US7277180B2 (en) * 2004-11-09 2007-10-02 Zygo Corporation Optical connection for interferometry
WO2006102234A2 (en) * 2005-03-18 2006-09-28 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping
US7528961B2 (en) * 2005-04-29 2009-05-05 Zygo Corporation Compensation of turbulent effects of gas in measurement paths of multi-axis interferometers
CN100592155C (zh) * 2006-05-30 2010-02-24 台湾薄膜电晶体液晶显示器产业协会 液晶显示器组件制造方法
US8715909B2 (en) 2007-10-05 2014-05-06 Infineon Technologies Ag Lithography systems and methods of manufacturing using thereof
US7652771B2 (en) * 2007-10-31 2010-01-26 Agilent Technologies, Inc. Interferometer with Double Polarizing Beam Splitter
US8223342B2 (en) * 2009-03-16 2012-07-17 Alliant Techsystems Inc. Methods and systems for measuring target movement with an interferometer
TWM476258U (en) * 2009-12-24 2014-04-11 Univ Nat Yunlin Science & Technology Multi-beam interferometric displacement measurement system utilized in the large measuring range
TWI427270B (zh) * 2010-06-02 2014-02-21 Univ Nat Yunlin Sci & Tech 應用一維電耦合裝置之多光束位移量測干涉儀系統
US9194694B2 (en) * 2012-01-31 2015-11-24 Nikon Corporation Interferometer devices for determining initial position of a stage or the like
US20190113329A1 (en) 2017-10-12 2019-04-18 Keysight Technologies, Inc. Systems and methods for cyclic error correction in a heterodyne interferometer

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3450476A (en) * 1966-02-03 1969-06-17 Hewlett Packard Co Apparatus for measuring the index of refraction of a fluid medium
US4189233A (en) * 1977-03-07 1980-02-19 Westinghouse Electric Corp. Passive optical range simulator device
US4347000A (en) * 1979-12-26 1982-08-31 The Perkin-Elmer Corporation Interferometric system
US4784490A (en) * 1987-03-02 1988-11-15 Hewlett-Packard Company High thermal stability plane mirror interferometer
US4865450A (en) * 1988-06-23 1989-09-12 United States Of America As Represented By Secretary Of The Air Force Dual photoelastic modulator heterodyne interferometer
JP2830492B2 (ja) * 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
US5398112A (en) * 1993-10-04 1995-03-14 Wyko Corporation Method for testing an optical window with a small wedge angle
US6330065B1 (en) * 1997-10-02 2001-12-11 Zygo Corporation Gas insensitive interferometric apparatus and methods
US6137574A (en) * 1999-03-15 2000-10-24 Zygo Corporation Systems and methods for characterizing and correcting cyclic errors in distance measuring and dispersion interferometry
US6163379A (en) * 1999-08-27 2000-12-19 Zygo Corporation Interferometer with tilted waveplates for reducing ghost reflections
US6252668B1 (en) * 1999-11-19 2001-06-26 Zygo Corporation Systems and methods for quantifying nonlinearities in interferometry systems
US6246481B1 (en) 1999-11-19 2001-06-12 Zygo Corporation Systems and methods for quantifying nonlinearities in interferometry systems

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7443511B2 (en) 2003-11-25 2008-10-28 Asml Netherlands B.V. Integrated plane mirror and differential plane mirror interferometer system
US7474409B2 (en) 2003-11-25 2009-01-06 Asml Netherlands B.V. Lithographic interferometer system with an absolute measurement subsystem and differential measurement subsystem and method thereof
JP2007537436A (ja) * 2004-05-11 2007-12-20 レニショウ　パブリック　リミテッド　カンパニー 偏光漏れによって生じるエラービームの除去または分離機能付きの偏光干渉計

Also Published As

Publication number Publication date
US6806962B2 (en) 2004-10-19
WO2003019109A1 (en) 2003-03-06
US20030038947A1 (en) 2003-02-27
EP1419360A1 (en) 2004-05-19
EP1419360A4 (en) 2004-10-27

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