JP2005314822A - Embroidering and dyeing system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an embroidering and dyeing system enabling an accurate relative relation between the position of an embroidered pattern and the position of a dyed pattern on a common fabric to be secured. <P>SOLUTION: The embroidering and dyeing system carries out the formation of an embroidered pattern on the fabric by an embroidering machine before or after formation of the dyed pattern on the fabric by a dyeing device. The dyed pattern and the embroidered pattern are formed by using a standard point formed on the fabric as a starting point. As a result, the accurate relative position relation between the dyed pattern and the embroidered pattern is secured even if the position of the fabric on an embroidery frame is changed, or the embroidery frame is loaded from the embroidery machine to the dyeing device while expanding or holding the fabric (the reversed case is the same). <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to an embroidery / dyeing system, and more particularly to an embroidery / dyeing system in which embroidery is performed on a work before dyeing or after dyeing.

In the sewing industry, it is clear that if a printed pattern is applied to a fabric and a part of the printed pattern is further embroidered, the decorativeness is further enhanced. Therefore, as a method of manufacturing such a decorative object, first, using a printing machine or the like as described in Patent Document 1, a desired printed pattern is printed on the fabric, and then the printed fabric is applied. In some cases, the embroidery frame is set on an embroidery frame and embroidered by a known embroidery machine.
Japanese Patent No. 30669937

  However, when such a method is employed, it is difficult to accurately align the embroidery pattern with respect to a printed pattern that has already been printed. For this reason, the pattern positions of the printed pattern and the embroidery pattern are often misaligned, which causes a serious problem that the appearance and quality of the product is deteriorated.

  Therefore, it is a technical object of the present invention to provide an embroidery / dyeing system that does not cause such problems.

In order to solve the above technical problem, the technical means taken in the invention described in claim 1 is:
“In an embroidery / dyeing system in which an embroidery pattern is formed on a cloth by an embroidery machine before and after the dyeing pattern is formed on the cloth by a dyeing device, the dyeing pattern and the embroidery pattern are Embroidery / dyeing system with a common reference point formed in
It is to have constituted.

  According to the first aspect of the present invention, in the embroidery / dyeing system, the embroidery pattern is formed on the cloth by the embroidery machine before and after the dyeing pattern is formed on the cloth by the dyeing apparatus. Since the relative position between the pattern and the embroidery pattern is corrected, the relative position shift between the embroidery pattern and the dyed pattern is caused by the shrinkage of the fabric and the shift of the loading position of the frame device that stretches and holds the fabric. Can be eliminated, and there is a great practical effect.

  Embodiments of an embroidery / dyeing system according to the present invention will be described below with reference to the accompanying drawings.

  As shown in FIGS. 1 and 2, the embroidery / dyeing system EBS includes a control device 10, an embroidery machine 20 under the control of the control device 10, and a dyeing device 30 under the control of the control device 10. In the embroidery / dyeing system EBS, an embroidery pattern is formed by the embroidery machine 20 on the fabric W spread and held on the frame device 40 before / after the formation of the dyed pattern by the dyeing device 30. Yes. Such pattern formation is controlled by software stored in the control device 10, and the result of pattern formation is displayed on the display 50.

  When dyeing is performed after embroidery on the fabric W, the relative relationship between the dyed pattern and the embroidery pattern is accurately adjusted as follows.

  That is, as shown in FIG. 3, the embroidery machine 20 has the embroidery pattern E and the dyeing device 30 to form before the embroidery pattern E is formed on the fabric W stretched and held on the frame device 40. The rectangle R is sewn so as to include the pattern P. This sewing is performed by dropping needles onto the four vertices RA, RB, RC and RD of the rectangle R. The number of needle drops at each vertex is several, and each vertex constitutes a circle that can be optically recognized. As a result, the coordinates of the four vertices RA, RB, RC, and RD of the rectangle R are set to (XA1, YA1), (XB2, YB2), (XC3, YC3), and (XD4, YD4), respectively. The embroidery pattern E is formed using any of the coordinates as a reference point. Thus, since the relative positional relationship between the embroidery pattern E and the dyed pattern P has already been determined by the sewing software, each coordinate is also uniquely determined for the dyed pattern P. Become.

  Next, the frame device 40 for spreading and holding the fabric W on which the embroidery pattern E is formed is removed from the embroidery machine 20 and loaded into the dyeing device 30. While the frame device 40 is being driven, the control device 10 uses the sensor (not shown) to set the coordinates of the four vertices RA, RB, RC, and RD of the rectangle R formed on the fabric W, respectively. It is recognized as (XA2, YA2), (XA2, YA2), (XA3, YA3) and (XA4, YA4). Thus, the coordinates (XA2, YA2), (XA2, YA2), (XA3, YA3) and (XA4, YA4) are coordinates (XA1, YA1), (XB2, YB2), (XC3, YC3), and (XD4, YD4) have a 1: 1 relationship. Therefore, the formation of the dyed pattern P is determined by coordinates (XA2, YA2), (XA2, YA2), (XA3, YA3) and If (XA4, YA4) is used as a reference, the relative positional relationship with respect to the embroidery pattern E can be accurately performed. After this, the rectangle R is removed from the fabric W by removing the yarn.

  In the opposite case (that is, after forming the dyed pattern P on the fabric W, the frame device 40 for expanding and holding the fabric W on which the dyed pattern P is formed is removed from the dyeing device 30 and loaded into the embroidery machine 20). In the dyeing apparatus 30, the four vertices RA, RB, RC and RD of the rectangle R are colored with special ink (ink whose color disappears after a predetermined time), and the dyeing pattern P is formed and this coloring is performed. After the frame device 40 that stretches and holds the fabric W is embroidered, the coordinates of the colored vertices RA, RB, RC, and RD are read by a sensor (not shown).

  In short, since a reference point common to both the embroidery pattern E and the dyed pattern P is added to the fabric W, even if the frame device 40 is different between the embroidery and the dyeing, the fabric is the same. Even when moved by the frame device 40, the relative positional relationship between the embroidery pattern E and the dyed pattern P can be set accurately.

It is a general-view figure which shows the structure of the embroidery and the dyeing | staining system concerning this invention. It is sectional drawing of the frame apparatus which extended and hold | maintained the fabric. It is a figure explaining embroidery pattern formation. It is a figure explaining dyeing | staining pattern formation.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 ... Control apparatus 20 ... Embroidery machine 30 ... Dyeing apparatus 40 ... Frame apparatus

Claims (1)

In an embroidery / dyeing system in which an embroidery pattern is formed on a cloth by an embroidery machine before and after the dyeing pattern is formed on the cloth by a dyeing device, the dyed pattern and the embroidery pattern are formed on the cloth. An embroidery / dyeing system with the common reference point formed as the origin.

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