JP2005301179A - Multibeam optical recorder - Google Patents

Multibeam optical recorder Download PDF

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JP2005301179A
JP2005301179A JP2004121265A JP2004121265A JP2005301179A JP 2005301179 A JP2005301179 A JP 2005301179A JP 2004121265 A JP2004121265 A JP 2004121265A JP 2004121265 A JP2004121265 A JP 2004121265A JP 2005301179 A JP2005301179 A JP 2005301179A
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semiconductor laser
optical recording
generating means
laser array
beam generating
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Japanese (ja)
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Keiji Kataoka
慶二 片岡
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Ricoh Printing Systems Ltd
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Ricoh Printing Systems Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a multibeam optical recorder attaining high speed optical recording by realizing scanning lines very close to each other at high light utility efficiency in an optical system in which an optical recording is performed by scanning with multibeams from a semiconductor laser array. <P>SOLUTION: A second multibeam generation means further increases the number of beams from the multibeams emitted from the semiconductor laser array, so that optical scanning lines very close to each other are obtained on an optical recording face. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、複数の半導体レーザから出射する多数のビームすなはちマルチビームを走査し、印刷するレーザプリンタに関するものである。   The present invention relates to a laser printer that scans and prints multiple beams emitted from a plurality of semiconductor lasers, that is, multi-beams.

マルチビームを用いたレーザプリンタではマルチビームの本数分、回転多面鏡の回転速度、および光変調速度を低減できるので、高速で印刷するレーザプリンタを実現できる。
半導体基板にレーザ発光部を集積化してアレイ状に形成した半導体レーザアレイから出射するマルチビームをレーザプリンタ装置に適用した概略図を図2に示す。
In a laser printer using a multi-beam, the number of multi-beams, the rotational speed of the rotary polygon mirror, and the light modulation speed can be reduced, so that a laser printer that prints at high speed can be realized.
FIG. 2 shows a schematic diagram in which a multi-beam emitted from a semiconductor laser array formed in an array by integrating laser light emitting portions on a semiconductor substrate is applied to a laser printer apparatus.

図2において、半導体レーザアレイ1から出射するマルチビームのそれぞれはコリメータレンズ2で平行光にし、ビーム拡大器であるレンズ3、4でビーム幅を拡大し、回転多面鏡6で感光ドラム8上を走査している。円筒レンズ5は回転多面鏡6の反射面の面倒れに伴う、感光ドラム上での走査線ピッチ誤差を補正するためのものである。走査レンズ7は回転多面鏡が走査したビームを感光ドラム8上に絞り込む。   In FIG. 2, each of the multi-beams emitted from the semiconductor laser array 1 is collimated by the collimator lens 2, the beam width is expanded by the lenses 3 and 4 which are beam expanders, and the rotating polygon mirror 6 is used on the photosensitive drum 8. Scanning. The cylindrical lens 5 is for correcting a scanning line pitch error on the photosensitive drum due to the tilting of the reflecting surface of the rotary polygon mirror 6. The scanning lens 7 narrows the beam scanned by the rotary polygon mirror onto the photosensitive drum 8.

この光学系では半導体レーザアレイによる感光ドラム面での光スポットアレイはアレイ配列方向が走査方向に垂直となる構成としている。   In this optical system, the light spot array on the photosensitive drum surface by the semiconductor laser array is configured such that the array arrangement direction is perpendicular to the scanning direction.

半導体レーザアレイを構成するの半導体レーザ発光部の間隔は通常100μm程度、小さいものでは14μmのものがある。一方、半導体レーザ発光部はアレイ配列方向に3μm近辺の光スポットの大きさを持っている。したがって、半導体レーザアレイ発光部の間隔は発光部での光スポットの大きさより4倍から30倍程大きいことになる。このためスリット12が無い場合は感光ドラム上に絞り込まれたマルチビームのビーム間隔も図3の14に示すように、この同じ倍率でスポット径より大きくなり、マルチビームが形成する走査線は隣同志に密接したものにならない。   The interval between the semiconductor laser light emitting portions constituting the semiconductor laser array is usually about 100 μm, and a small one is 14 μm. On the other hand, the semiconductor laser light emitting section has a light spot size of about 3 μm in the array arrangement direction. Accordingly, the interval between the semiconductor laser array light emitting portions is about 4 to 30 times larger than the size of the light spot at the light emitting portion. For this reason, when there is no slit 12, the beam interval of the multi-beams narrowed down on the photosensitive drum is larger than the spot diameter at the same magnification, as shown at 14 in FIG. 3, and the scanning lines formed by the multi-beams are adjacent to each other. It will not be closely related to.

この状態で印刷すると、走査線間に非露光領域が生じ、画質の良い印刷は期待できない。スリット12は副走査方向にビームを遮ることにより、感光ドラム面で光スポット15の大きさが概略pになるように回折で広げ、隣接する走査線を密接したものにしている。   If printing is performed in this state, a non-exposed area is generated between the scanning lines, and printing with good image quality cannot be expected. The slit 12 blocks the beam in the sub-scanning direction, and spreads it by diffraction so that the size of the light spot 15 is approximately p on the photosensitive drum surface, thereby bringing adjacent scanning lines into close contact.

図4、図5は図2の光学系の動作を、副走査方向、走査方向で説明するためのものである。半導体レーザアレイからのビームのうち中央の1本のみを示している。6は回転多面鏡位置を示している。スリット12はコリメータ2から出射するビームを副走査方向に遮ることで、感光ドラム8面でのビーム径を拡大している。   4 and 5 are for explaining the operation of the optical system of FIG. 2 in the sub-scanning direction and the scanning direction. Only one central beam from the semiconductor laser array is shown. 6 shows the position of the rotating polygon mirror. The slit 12 enlarges the beam diameter on the surface of the photosensitive drum 8 by blocking the beam emitted from the collimator 2 in the sub-scanning direction.

ところで、この方法ではスリットでビームを遮ることで、スリットが無い場合に比べて絞り込む光スポット径を4倍から30倍に大きくするので、光利用効率は非常に小さいものとなる欠点がある。   By the way, in this method, since the light spot diameter to be narrowed is increased from 4 times to 30 times as compared with the case where there is no slit by blocking the beam with the slit, there is a disadvantage that the light use efficiency becomes very small.

したがって、この方法では感光ドラム上での光強度が小さくなり高速な光記録が図れない問題があった。   Therefore, this method has a problem that the light intensity on the photosensitive drum is reduced and high-speed optical recording cannot be achieved.

したがって、本発明では半導体レーザアレイからのマルチビームを走査し、光記録する光学系において、高い光利用効率で密接した走査線を実現し、高速光記録可能な装置を提供することにある。   Accordingly, an object of the present invention is to provide an apparatus capable of realizing high-speed optical recording by realizing close scanning lines with high light utilization efficiency in an optical system for scanning and optically recording multiple beams from a semiconductor laser array.

上記した課題を解決するために本発明では、第1のマルチビーム発生手段として、複数の半導体レーザ発光部を集積化した半導体レーザアレイを用い、該第1のマルチビーム発生手段から出射する第1のマルチビームから第2のマルチビームを発生する第2のマルチビーム発生手段をもち、該第2のマルチビームのアレイ配列方向を走査方向に対し垂直に配置し、光記録させることを特徴とする。以上の方法をとれば光利用効率を低下させることなく、互いに密接した光走査線が得られ、高速、高精度な光記録が可能となる。   In order to solve the above problems, in the present invention, a semiconductor laser array in which a plurality of semiconductor laser light emitting units are integrated is used as the first multi-beam generating unit, and the first multi-beam generating unit emits the first multi-beam generating unit. And a second multi-beam generating means for generating a second multi-beam from the multi-beam, and arranging the array direction of the second multi-beam perpendicular to the scanning direction for optical recording. . By adopting the above method, optical scanning lines close to each other can be obtained without reducing the light utilization efficiency, and high-speed and high-precision optical recording becomes possible.

本発明の半導体レーザアレイを利用する光記録装置は高い光利用効率で密接した走査線を形成することができるので高速光記録可能な装置が実現できる。   Since the optical recording apparatus using the semiconductor laser array of the present invention can form close scanning lines with high light utilization efficiency, an apparatus capable of high-speed optical recording can be realized.

はじめに本発明の原理を図6を用いて説明する。図6は図3と同様に感光ドラム面での半導体レーザアレイからのマルチビームが形成する光スポット列を示している。   First, the principle of the present invention will be described with reference to FIG. FIG. 6 shows a light spot array formed by multi-beams from the semiconductor laser array on the surface of the photosensitive drum as in FIG.

図3においてはスリット12の動作で光スポットの大きさをpになるまで大きくしていた。本発明の図6では半導体レーザアレイからのマルチビームを第2のマルチビーム発生手段により複数倍化したビーム16とする。図6では簡単のため2倍に本数を増した場合を示している。この場合、密接した走査線17を実現するには光スポットを副走査方向にp/2にまで広がるように、スリットを調整すればよい。   In FIG. 3, the size of the light spot is increased to p by the operation of the slit 12. In FIG. 6 of the present invention, the multi-beam from the semiconductor laser array is a beam 16 that is multiplied by the second multi-beam generating means. FIG. 6 shows a case where the number is doubled for simplicity. In this case, in order to realize the close scanning line 17, the slit may be adjusted so that the light spot spreads to p / 2 in the sub scanning direction.

したがって、図3の場合に比べて、図6の場合はスリットによる光利用効率の低下を小さく抑えることができる。図6の説明では、第2のマルチビーム発生手段はマルチビーム本数を2倍に増加させる場合を示したが、3倍、4倍、5倍と増加させれば、光利用効率は更に高くすることができる。また、究極的には、適当なビーム数にすることによりスリットを無くすこともできる。   Therefore, compared with the case of FIG. 3, in the case of FIG. 6, the fall of the light utilization efficiency by a slit can be suppressed small. In the description of FIG. 6, the second multi-beam generating means has shown a case where the number of multi-beams is increased by a factor of two. be able to. Ultimately, the slit can be eliminated by setting the number of beams appropriately.

第2のマルチビーム発生手段としては偏光素子あるいは回折格子を用いることができる。   As the second multi-beam generating means, a polarizing element or a diffraction grating can be used.

本発明の光記録装置で用いる光学系を図1に示す。図中13は第2のマルチビーム発生手段としての回折格子であり、半導体レーザアレイ1からのビーム本数を複数倍している。その他の光学部品の動作は、すでに図2で説明した。スリット12は密接した走査線を形成するためのものである。   An optical system used in the optical recording apparatus of the present invention is shown in FIG. In the figure, reference numeral 13 denotes a diffraction grating as second multi-beam generating means, which multiplies the number of beams from the semiconductor laser array 1 by a plurality. The operation of other optical components has already been described with reference to FIG. The slit 12 is for forming a close scanning line.

図1ではスリット12を用いた例を示したが、第2のマルチビーム発生手段が発生する複数ビームのみで密接した走査線が形成できる場合はスリット12を用いる必要がなくなる。   Although FIG. 1 shows an example in which the slit 12 is used, it is not necessary to use the slit 12 when a close scanning line can be formed with only a plurality of beams generated by the second multi-beam generating means.

図7は第2のマルチビーム発生手段として用いることができる回折格子20を示している。この回折格子は入射ビーム21から実質的に光強度が等しい複数本の回折光22を発生させる機能をもっている。図では−2次、−1次、0次、+1次、+2次回折光からなる5本ビームを発生させている。   FIG. 7 shows a diffraction grating 20 that can be used as the second multi-beam generating means. This diffraction grating has a function of generating a plurality of diffracted lights 22 having substantially the same light intensity from the incident beam 21. In the figure, five beams consisting of -2nd order, -1st order, 0th order, + 1st order, and + 2nd order diffracted light are generated.

図8は第2のマルチビーム発生手段として用いることができる偏光素子の一例を示している。この偏光素子にレーザ光が入射すると、1/4波長板23はレーザ光を円偏光にし、続くウォラストンプリズム24により2本のレーザ光に分岐するものである。   FIG. 8 shows an example of a polarizing element that can be used as the second multi-beam generating means. When laser light is incident on this polarizing element, the quarter-wave plate 23 makes the laser light circularly polarized, and is branched into two laser lights by the subsequent Wollaston prism 24.

本発明のマルチビーム光記録装置を示す。1 shows a multi-beam optical recording apparatus of the present invention. 従来のマルチビーム光記録装置を示す。1 shows a conventional multi-beam optical recording apparatus. 従来のマルチビーム光記録装置の光学系の動作説明図である。It is operation | movement explanatory drawing of the optical system of the conventional multi-beam optical recording apparatus. 従来のマルチビーム光記録装置の副走査方向における光学系の動作説明図である。It is operation | movement explanatory drawing of the optical system in the subscanning direction of the conventional multibeam optical recording device. 従来のマルチビーム光記録装置の走査方向における光学系の動作説明図である。It is operation | movement explanatory drawing of the optical system in the scanning direction of the conventional multi-beam optical recording apparatus. 本発明のマルチビーム光記録装置の光学系の動作説明図である。It is operation | movement explanatory drawing of the optical system of the multi-beam optical recording apparatus of this invention. 本発明で第2のマルチビーム発生手段として用いる回折格子の動作説明図である。It is operation | movement explanatory drawing of the diffraction grating used as a 2nd multi-beam generation means by this invention. 本発明で第2のマルチビーム発生手段として用いる偏光素子の動作説明図である。It is operation | movement explanatory drawing of the polarizing element used as a 2nd multi-beam generation means by this invention.

符号の説明Explanation of symbols

1 半導体レーザアレイ
2 コリメータレンズ
3 レンズ
4 ビーム拡大器
5 円筒レンズ
6 回転多面鏡
7 走査レンズ
8 感光ドラム
11 光検知器
12 スリット
13 回折格子
DESCRIPTION OF SYMBOLS 1 Semiconductor laser array 2 Collimator lens 3 Lens 4 Beam expander 5 Cylindrical lens 6 Rotating polygon mirror 7 Scan lens 8 Photosensitive drum 11 Photo detector 12 Slit 13 Diffraction grating

Claims (4)

第1のマルチビーム発生手段として、複数の半導体レーザ発光部を集積化した半導体レーザアレイを用い、該第1のマルチビーム発生手段から出射する第1のマルチビームから第2のマルチビームを発生する第2のマルチビーム発生手段をもち、該第2のマルチビームのアレイ配列方向を走査方向に対し垂直に配置し、光記録するマルチビーム光記録装置。   A semiconductor laser array in which a plurality of semiconductor laser light emitting sections are integrated is used as the first multi-beam generating means, and a second multi-beam is generated from the first multi-beam emitted from the first multi-beam generating means. A multi-beam optical recording apparatus having a second multi-beam generating means, optically recording an array arrangement direction of the second multi-beams perpendicular to a scanning direction. 請求項1の第2のマルチビーム発生手段として偏光素子を用いるマルチビーム光記録装置。   A multi-beam optical recording apparatus using a polarizing element as the second multi-beam generating means according to claim 1. 請求項1の第2のマルチビーム発生手段として回折格子を用いるマルチビーム光記録装置。   A multi-beam optical recording apparatus using a diffraction grating as the second multi-beam generating means according to claim 1. 第1のマルチビーム発生手段として、複数の半導体レーザ発光部を集積化した半導体レーザアレイを用い、該第1のマルチビーム発生手段から出射する第1のマルチビームから第2のマルチビームを発生する第2のマルチビーム発生手段をもち、該第1および第2のマルチビームのアレイ配列方向を走査方向に対し垂直に配置し、光記録するマルチビーム光記録装置。
A semiconductor laser array in which a plurality of semiconductor laser light emitting sections are integrated is used as the first multi-beam generating means, and a second multi-beam is generated from the first multi-beam emitted from the first multi-beam generating means. A multi-beam optical recording apparatus having a second multi-beam generating means, optically recording the array arrangement direction of the first and second multi-beams perpendicular to the scanning direction.
JP2004121265A 2004-04-16 2004-04-16 Multibeam optical recorder Pending JP2005301179A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007279670A (en) * 2006-03-17 2007-10-25 Ricoh Co Ltd Optical scanner, image forming apparatus, diffractive optical element for splitting luminous flux and method of manufacturing diffractive optical element
JP2009211004A (en) * 2008-03-06 2009-09-17 Ricoh Co Ltd Semiconductor laser optical recorder and image forming apparatus using the same
JP2013006418A (en) * 2012-08-01 2013-01-10 Ricoh Co Ltd Semiconductor laser light recording apparatus, and image forming apparatus using the same

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07248457A (en) * 1994-03-11 1995-09-26 Hitachi Koki Co Ltd Multibeam scanning optical recorder
JPH095657A (en) * 1995-06-16 1997-01-10 Hitachi Koki Co Ltd Multibeam scanning optical recorder
JPH10197837A (en) * 1996-12-27 1998-07-31 Dainippon Screen Mfg Co Ltd Multichannel optical modulating device
JPH1164617A (en) * 1997-08-22 1999-03-05 Topcon Corp Phase type diffraction lens and laser recorder
JP2001281578A (en) * 2000-03-30 2001-10-10 Ricoh Co Ltd Multi-beam scanner and image forming device
JP2004109204A (en) * 2002-09-13 2004-04-08 Pentax Corp Scanning optical system

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07248457A (en) * 1994-03-11 1995-09-26 Hitachi Koki Co Ltd Multibeam scanning optical recorder
JPH095657A (en) * 1995-06-16 1997-01-10 Hitachi Koki Co Ltd Multibeam scanning optical recorder
JPH10197837A (en) * 1996-12-27 1998-07-31 Dainippon Screen Mfg Co Ltd Multichannel optical modulating device
JPH1164617A (en) * 1997-08-22 1999-03-05 Topcon Corp Phase type diffraction lens and laser recorder
JP2001281578A (en) * 2000-03-30 2001-10-10 Ricoh Co Ltd Multi-beam scanner and image forming device
JP2004109204A (en) * 2002-09-13 2004-04-08 Pentax Corp Scanning optical system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007279670A (en) * 2006-03-17 2007-10-25 Ricoh Co Ltd Optical scanner, image forming apparatus, diffractive optical element for splitting luminous flux and method of manufacturing diffractive optical element
JP2009211004A (en) * 2008-03-06 2009-09-17 Ricoh Co Ltd Semiconductor laser optical recorder and image forming apparatus using the same
JP2013006418A (en) * 2012-08-01 2013-01-10 Ricoh Co Ltd Semiconductor laser light recording apparatus, and image forming apparatus using the same

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