JP2005285480A - Electrode component of solar battery - Google Patents

Electrode component of solar battery Download PDF

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JP2005285480A
JP2005285480A JP2004096256A JP2004096256A JP2005285480A JP 2005285480 A JP2005285480 A JP 2005285480A JP 2004096256 A JP2004096256 A JP 2004096256A JP 2004096256 A JP2004096256 A JP 2004096256A JP 2005285480 A JP2005285480 A JP 2005285480A
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transparent substrate
conductive layer
transparent
solar cell
layer
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JP4522122B2 (en
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Satoshi Odajima
智 小田嶋
Noriyoshi Hosono
則義 細野
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Shin Etsu Chemical Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y02E10/00Energy generation through renewable energy sources
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    • Y02E10/542Dye sensitized solar cells

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Abstract

<P>PROBLEM TO BE SOLVED: To provide an electrode component of a solar battery, capable of preventing light transmittance from worsening, maintaining and increasing the bond strength with respect to the transparent conductive film for a transparent substrate, and preventing deterioration of reliability. <P>SOLUTION: This electrode component is provided with a transparent substrate 1, a high conductivity layer 2 formed on the surface of the transparent substrate 1, a transparent conductive film 4 formed on the high conductivity layer 2, and a metal oxide semiconductor film 5 provided with spectrally sensitized dye 6. A plurality of hollow parts 3 are formed by patterning the high conductivity layer 2. Since the high conductivity layer 2 is interposed between the transparent substrate 1 and the transparent conductive film 4, copper foil to which surface roughening treatment has been applied is not required to be bonded. Accordingly, possibility of worsening light transmittance can be eliminated effectively. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、太陽光を電気エネルギーに変換する有機色素増感型太陽電池の電極部品に関するものである。   The present invention relates to an electrode component of an organic dye-sensitized solar cell that converts sunlight into electric energy.

従来における太陽電池の電極部品は、図示しないが、透明基板と、この透明基板の表面に形成される透明導電膜と、この透明導電膜上に形成され、分光増感色素を備えた金属酸化物半導体膜とを備えている(特許文献1参照)。透明導電膜は、例えば透明基板の表面に、粗面化処理された銅箔が接着され、この銅箔がエッチングされることによりパターン形成される。
特開2003‐123858号公報
Conventional electrode parts for solar cells are not shown, but are a transparent substrate, a transparent conductive film formed on the surface of the transparent substrate, and a metal oxide formed on the transparent conductive film and provided with a spectral sensitizing dye. A semiconductor film (see Patent Document 1). The transparent conductive film is formed into a pattern by, for example, bonding a roughened copper foil to the surface of a transparent substrate and etching the copper foil.
Japanese Patent Laid-Open No. 2003-123858

従来における太陽電池の電極部品は、以上のように粗面化処理された銅箔を接着するので、エッチングによる除去部分が曇り、光線透過率を悪化させるという大きな問題がある。この問題を解消するには、銅箔の粗面化処理を省略すれば良いが、そうすると、透明基板に対する接着強度が低下し、信頼性の低下を招くこととなる。   Conventional electrode parts for solar cells have a large problem in that the copper foil that has been roughened as described above is bonded, so that the portion removed by etching becomes cloudy and the light transmittance is deteriorated. In order to solve this problem, the roughening treatment of the copper foil may be omitted. However, in that case, the adhesive strength to the transparent substrate is lowered, and the reliability is lowered.

本発明は上記に鑑みなされたもので、光線透過率の悪化を防ぎ、透明基板に対する透明導電膜の接着強度を維持向上させ、信頼性の低下を防ぐことのできる太陽電池の電極部品を提供することを目的としている。   The present invention has been made in view of the above, and provides an electrode part for a solar cell that can prevent deterioration in light transmittance, maintain and improve the adhesive strength of a transparent conductive film to a transparent substrate, and prevent deterioration in reliability. The purpose is that.

本発明においては上記課題を解決するため、太陽光を電気エネルギーに変換する太陽電池の電極部品であって、
透明基板と、この透明基板の一面に形成される導電層とを含み、この導電層をパターン化して中空部を形成したことを特徴としている。
なお、透明基板あるいは透明基板と導電層との間に、曇り防止層を形成することができる。
また、導電層上に形成される透明導電膜と、この透明導電膜上に形成され、分光増感色素を備えた金属酸化物半導体膜とを含むと良い。
In the present invention, in order to solve the above-mentioned problem, it is an electrode part of a solar cell that converts sunlight into electric energy,
It includes a transparent substrate and a conductive layer formed on one surface of the transparent substrate, and the conductive layer is patterned to form a hollow portion.
Note that an anti-fogging layer can be formed between the transparent substrate or the transparent substrate and the conductive layer.
Moreover, it is good to include the transparent conductive film formed on a conductive layer, and the metal oxide semiconductor film formed on this transparent conductive film and provided with the spectral sensitizing dye.

ここで、特許請求の範囲における導電層は、複数の導電細線を略平行に配列したもの、あるいは複数の導電細線を略平行に配列した複数の配線体群を互いに導通するように組み合わせることにより形成することができる。また、導電性インクを塗布印刷して形成することもできる。また、感光性の導電性インクを透明基板に塗布し、露光、現像により導電層をパターン形成したり、あるいは合成繊維の短繊維を平織りして織布を形成し、この織布に金属めっきを施して導電層を形成しても良い。   Here, the conductive layer in the claims is formed by combining a plurality of thin conductive wires arranged in parallel or a plurality of wiring bodies arranged in a plurality of conductive thin wires so as to conduct each other. can do. It can also be formed by applying and printing conductive ink. In addition, a photosensitive conductive ink is applied to a transparent substrate, and a conductive layer is patterned by exposure and development, or a woven fabric is formed by plain weaving short fibers of synthetic fibers, and metal plating is applied to the woven fabric. It may be applied to form a conductive layer.

本発明によれば、光線透過率の悪化を防ぎ、透明基板に対する透明導電膜の接着強度を維持向上させ、信頼性の低下を防ぐことができるという効果がある。   ADVANTAGE OF THE INVENTION According to this invention, there exists an effect that the deterioration of light transmittance can be prevented, the adhesive strength of the transparent conductive film with respect to a transparent substrate can be maintained and improved, and the fall of reliability can be prevented.

以下、図面を参照して本発明の好ましい実施の形態を説明すると、本実施形態における太陽電池の電極部品は、図1や図2に示すように、電極板として機能する透明基板1と、この平坦な透明基板1の一面である表面に形成される高導電層2と、この高導電層2上に形成される透明導電膜4と、この透明導電膜4上に形成され、太陽光の照射される分光増感色素6を有する金属酸化物半導体膜5とを備え、高導電層2をパターン形成して複数の中空部3を形成し、太陽光を電気エネルギーに変換する太陽電池の一部を構成する。   Hereinafter, a preferred embodiment of the present invention will be described with reference to the drawings. An electrode component of a solar cell in this embodiment includes a transparent substrate 1 functioning as an electrode plate, as shown in FIGS. A highly conductive layer 2 formed on the surface which is one surface of the flat transparent substrate 1, a transparent conductive film 4 formed on the highly conductive layer 2, and a sunlight irradiation formed on the transparent conductive film 4 Part of a solar cell that includes a metal oxide semiconductor film 5 having a spectral sensitizing dye 6 to be formed, patterns the highly conductive layer 2 to form a plurality of hollow portions 3, and converts sunlight into electrical energy. Configure.

透明基板1は、平面矩形の透明なガラス板、透明なプラスチックシート、又は透明フィルム等からなり、太陽光を透過するよう機能する。この透明基板1は、具体的には、光線透過率50%以上、ヘイズ5%以下程度の基板が選択される。透明基板1は、意匠性を考慮し、着色された基板も使用可能であるが、汎用性の観点からは無色透明の基板が良い。この場合には、光線透過率が80%程度以上であることが好ましい。   The transparent substrate 1 is made of a flat rectangular transparent glass plate, a transparent plastic sheet, a transparent film, or the like, and functions to transmit sunlight. Specifically, a substrate having a light transmittance of 50% or more and a haze of 5% or less is selected as the transparent substrate 1. The transparent substrate 1 may be a colored substrate in consideration of design properties, but a colorless and transparent substrate is preferable from the viewpoint of versatility. In this case, the light transmittance is preferably about 80% or more.

高導電層2は、金属細線、導電性インク、金属めっきされた合成繊維からなり、線幅2〜40μmの格子形、ストライプ形、千鳥格子形、ハニカム形、多角形の集合体形等からなる幾何学模様のパターンに形成されて複数の中空部3により太陽光を透過するよう機能する。高導電層2の線幅が2〜40μmの範囲であるのは、線幅が2μmを下回る場合には、実際の製造作業に少なからず支障を来たし、生産性に悪影響を及ぼすおそれがあるからである。逆に、線幅が40μmを上回る場合、パターンの存在が認識可能なレベルとなり、視認性を悪化させるおそれがあるからである。   The highly conductive layer 2 is made of fine metal wires, conductive ink, and metal-plated synthetic fibers, and has a lattice shape, a stripe shape, a staggered lattice shape, a honeycomb shape, a polygonal aggregate shape or the like having a line width of 2 to 40 μm. It is formed in a geometric pattern and functions to transmit sunlight through the plurality of hollow portions 3. The reason why the line width of the highly conductive layer 2 is in the range of 2 to 40 μm is that if the line width is less than 2 μm, the actual manufacturing operation may be hindered and the productivity may be adversely affected. is there. Conversely, when the line width exceeds 40 μm, the presence of the pattern becomes a recognizable level, and the visibility may be deteriorated.

高導電層2のパターン形成に際しては、単なるストライプとするのではなく、格子形、千鳥格子形、ハニカム形、多角形の集合体形として縦横に細かく導通する形態とすれば、例え部分的に断線等を生じたときにも、複数の導電細線が断線部を補完し、機能喪失を回避することが可能となる。   When forming the pattern of the highly conductive layer 2, it is not a simple stripe, but if it is in the form of a grid, houndstooth, honeycomb, or polygonal aggregate, it is finely connected vertically and horizontally, for example, partially broken Even when the above occurs, the plurality of conductive thin wires complement the disconnection portion, and loss of function can be avoided.

高導電層2を金属細線製とする場合、ステンレス線、ニッケル線、タングステン線、りん青銅線、真鍮線等を使用することができる。この金属細線の直径は、材質により異なるが、5〜40μmの範囲から選択される。これは、5μmを下回る場合には、製造が困難であり、取り扱いも難しく、製品歩留まりに悪影響を及ぼすおそれがあるからである。また、金属細線の直径がそのままパターン幅となるため、上記理由により40μmを上回ることは好ましくない。   When the highly conductive layer 2 is made of a fine metal wire, a stainless wire, a nickel wire, a tungsten wire, a phosphor bronze wire, a brass wire, or the like can be used. The diameter of the fine metal wire varies depending on the material, but is selected from the range of 5 to 40 μm. This is because if the thickness is less than 5 μm, the production is difficult, the handling is difficult, and the product yield may be adversely affected. Further, since the diameter of the fine metal wire becomes the pattern width as it is, it is not preferable to exceed 40 μm for the above reason.

高導電層2を金属細線によりパターン形成する方法としては、(1)接着層からなる固定層を備えた透明基板1上に金属細線をノズルから繰り出し、金属細線を随時固定しながら所定のパターンを形成する方法、(2)円筒形のドラムの外周に、固定層を形成した透明基板1をその固定層が外側になるようにセットし、ドラムを回転させながら金属細線をドラムの回転軸方向に一定速度で移動させつつ繰り出し、透明基板1上の固定層に巻き付けて金属細線を伴った透明基板1を切り開き、所定のピッチで平行に配列した金属細線を得る方法、(3)平行に配列した金属細線を伴った二枚の透明基板1を互いに垂直方向に貼り合わせ、格子形の配線体を得る方法等があげられる。   As a method of patterning the highly conductive layer 2 with fine metal wires, (1) a fine metal wire is fed out from a nozzle on a transparent substrate 1 having a fixing layer made of an adhesive layer, and a predetermined pattern is formed while fixing the fine metal wires as needed. (2) The transparent substrate 1 on which the fixed layer is formed is set on the outer periphery of the cylindrical drum so that the fixed layer is on the outer side, and the fine metal wire is moved in the direction of the rotation axis of the drum while rotating the drum. A method of obtaining the fine metal wires arranged in parallel at a predetermined pitch by cutting out the transparent substrate 1 accompanied by the fine metal wires by drawing out while moving at a constant speed, winding around the fixed layer on the transparent substrate 1, and (3) arranging in parallel For example, a method of obtaining a lattice-shaped wiring body by bonding two transparent substrates 1 with fine metal wires together in the vertical direction.

高導電層2を導電性インク製とする場合、金属、カーボン、金属酸化物等の適当な導電性付与フィラー、樹脂バインダー、所定の有機溶剤を含む導電性インクを使用することができる。この場合、より細いパターンで高い導電性を得るためには、金属系の導電性付与フィラーの使用が好ましく、特に銀を含む導電性インクが最適である。これは、体積固有抵抗値が低いこと、粒子同士の接触抵抗が低いこと、空気中での熱処理等による酸化劣化が起きにくいこと、粒子径を細かくすることで粒子同士が融着し、より高い導電性の発現が可能であるという理由に基づく。   When the highly conductive layer 2 is made of a conductive ink, a conductive ink containing an appropriate conductivity-imparting filler such as metal, carbon, or metal oxide, a resin binder, and a predetermined organic solvent can be used. In this case, in order to obtain high conductivity with a finer pattern, it is preferable to use a metal-based conductivity-imparting filler, and particularly conductive ink containing silver is optimal. This is because the volume resistivity is low, the contact resistance between the particles is low, the oxidation deterioration due to heat treatment in the air is difficult to occur, the particles are fused by making the particle diameter finer, and higher. Based on the reason that the development of conductivity is possible.

導電性インクにより高導電層2をパターン形成する方法としては、スクリーン印刷法、オフセット印刷法、グラビア印刷法等の各種印刷法があげられる。これらの中でも、線幅40μm以下の細いパターン形成が必要であることから、凹版オフセット印刷やスクリーン印刷法が好ましい。   Examples of a method for patterning the highly conductive layer 2 with a conductive ink include various printing methods such as a screen printing method, an offset printing method, and a gravure printing method. Among these, intaglio offset printing and screen printing are preferable because a thin pattern having a line width of 40 μm or less is necessary.

高導電層2に感光性の導電性インクを使用する場合は、上記導電性インクのバインダーとして感光性樹脂を使用することができる。これを用いてパターン形成するには、感光性の導電性インクを透明基板1に塗布し、露光、現像することにより達成することができる。この方法によれば、上記印刷法と比較し、厚いパターンを簡単に形成することができる。また、フォトプロセスを応用するため、パターンエッジの直線性や精度を向上させることができる。   When a photosensitive conductive ink is used for the highly conductive layer 2, a photosensitive resin can be used as a binder for the conductive ink. Pattern formation using this can be achieved by applying a photosensitive conductive ink to the transparent substrate 1, exposing and developing. According to this method, it is possible to easily form a thick pattern as compared with the printing method. In addition, since the photo process is applied, the linearity and accuracy of the pattern edge can be improved.

高導電層2として、合成繊維の短繊維を平織りして織布を形成し、この織布に金属めっきを施したものを用いることもできる。具体的には、ポリエステル等の直径20〜35μmの短繊維を100メッシュ/インチ程度に平織りした織布に銅めっきし、導電性を付与したものを透明基板1に固定して高導電層2とすれば良い。   As the highly conductive layer 2, it is also possible to use a woven fabric formed by plain weaving short fibers of synthetic fibers and metal-plated on the woven fabric. Specifically, copper is plated on a woven fabric obtained by plain weaving a short fiber having a diameter of 20 to 35 μm, such as polyester, to about 100 mesh / inch, and the conductive layer is fixed to the transparent substrate 1 and fixed to the high conductive layer 2. Just do it.

透明導電膜4は、例えば酸化インジウム、酸化スズ、酸化亜鉛、スズドーブ酸化インジウム、及び又はアルミニウムドーブ酸化亜鉛等を使用して気相成膜法等により形成される。
金属酸化物半導体膜5は、例えば酸化チタン、酸化亜鉛、酸化タングステン、チタン酸バリウム、及び又はチタン酸ストロンチウム等を使用して気相成膜法、真空蒸着法、スパッタリング法等により形成され、有機色素である分光増感色素6が単分子膜として吸着する。この金属酸化物半導体膜5は、微細な結晶構造を有する多孔質膜であることが好ましい。
The transparent conductive film 4 is formed by, for example, a vapor deposition method using indium oxide, tin oxide, zinc oxide, tin dove indium oxide, or aluminum dove zinc oxide, or the like.
The metal oxide semiconductor film 5 is formed by, for example, vapor deposition, vacuum deposition, sputtering, or the like using titanium oxide, zinc oxide, tungsten oxide, barium titanate, or strontium titanate, and the like. Spectral sensitizing dye 6 which is a dye is adsorbed as a monomolecular film. The metal oxide semiconductor film 5 is preferably a porous film having a fine crystal structure.

分光増感色素6は、金属酸化物半導体膜5に吸着され、太陽光の照射により可視領域の光線を吸収して励起する。この分光増感色素6としては、例えば金属錯体や有機色素があげられ、特に分光増感の効果や耐久性に優れる金属錯体が最適である。金属錯体には、銅フタロシアニン、金属フタロシアニン、クロロフィル、ヘミン等が該当する。また、有機色素には、例えばメタルフリーフタロシアニン、シアニン系色素、メロシアニン系色素、キサンテン系色素等が該当する。   Spectral sensitizing dye 6 is adsorbed on metal oxide semiconductor film 5 and is excited by absorbing light in the visible region when irradiated with sunlight. Examples of the spectral sensitizing dye 6 include metal complexes and organic dyes, and a metal complex that is particularly excellent in the effect of spectral sensitization and durability is optimal. Examples of the metal complex include copper phthalocyanine, metal phthalocyanine, chlorophyll, and hemin. Examples of organic dyes include metal-free phthalocyanine, cyanine dyes, merocyanine dyes, and xanthene dyes.

上記構成を有する太陽電池の電極部品を用いて太陽電池を構成する場合には、電極部品の周囲を封止壁7により囲み、この封止壁7内にレドックス電解質からなる電解質8を充填し、封止壁7の開口を透明の対電極9で被覆して透明基板1に電解質8を介し対向させ、その後、電極機能を有する透明基板1と対電極9とに図示しないリード線をそれぞれ取り付ければ、太陽電池を製造することができる。
封止壁7としては、各種樹脂が使用される。また、対電極9としては、透明導電性膜のコートされたガラス基板、あるいは白金(図示せず)を担持した透明導電性基板等が使用される。
When a solar cell is configured using the electrode component of the solar cell having the above-described configuration, the periphery of the electrode component is surrounded by a sealing wall 7 and the sealing wall 7 is filled with an electrolyte 8 made of a redox electrolyte. If the opening of the sealing wall 7 is covered with a transparent counter electrode 9 so as to face the transparent substrate 1 with the electrolyte 8 interposed therebetween, and then lead wires (not shown) are attached to the transparent substrate 1 having the electrode function and the counter electrode 9, respectively. A solar cell can be manufactured.
Various resins are used as the sealing wall 7. Further, as the counter electrode 9, a glass substrate coated with a transparent conductive film or a transparent conductive substrate carrying platinum (not shown) is used.

上記構成によれば、透明基板1と透明導電膜4との間に高導電層2が介在するので、粗面化処理された銅箔を接着する必要がない。したがって、エッチングによる除去部分が曇り、光線透過率を悪化させるおそれをきわめて有効に排除することができる。また、透明基板1に対する透明導電膜4の接着強度が低下し、信頼性の低下を招くこともない。   According to the said structure, since the highly conductive layer 2 interposes between the transparent substrate 1 and the transparent conductive film 4, it is not necessary to adhere | attach the roughened copper foil. Accordingly, it is possible to very effectively eliminate the possibility that the portion removed by etching becomes cloudy and the light transmittance is deteriorated. Moreover, the adhesive strength of the transparent conductive film 4 to the transparent substrate 1 is reduced, and reliability is not reduced.

次に、図3は本発明の他の実施の形態を示すもので、この場合には、透明基板1の表面と高導電層2との間に、無彩色の曇り防止層10を介在するようにしている。
曇り防止層10は、少なくとも紫外線により硬化可能な樹脂組成物を含有した黒色インクからなり、増感剤、重合禁止剤、レべリング剤、分散剤、消泡剤、増粘剤、沈殿防止剤等が必要に応じて加えられ、透明基板1の表面に黒色層として形成される。この曇り防止層10は、透明基板1の全表面に高導電層2のパターンと同様のパターンにエッチング等の方法により形成される。その他の部分については、上記実施形態と同様であるので説明を省略する。
Next, FIG. 3 shows another embodiment of the present invention. In this case, an achromatic anti-fogging layer 10 is interposed between the surface of the transparent substrate 1 and the highly conductive layer 2. I have to.
The anti-fogging layer 10 is made of a black ink containing a resin composition curable at least by ultraviolet rays, and is a sensitizer, a polymerization inhibitor, a leveling agent, a dispersant, an antifoaming agent, a thickener, and a precipitation inhibitor. Etc. are added as necessary, and formed as a black layer on the surface of the transparent substrate 1. This anti-fogging layer 10 is formed on the entire surface of the transparent substrate 1 in a pattern similar to the pattern of the high conductive layer 2 by a method such as etching. The other parts are the same as those in the above embodiment, and the description thereof is omitted.

上記実施形態と同様の作用効果が期待でき、透明基板1と高導電層2との間に、光線を吸収する黒色の曇り防止層10を介在し、透明基板1に高導電層2を間接的に設けるので、透明基板1が全体として曇るのを抑制することができるのは明らかである。   The same effect as the above embodiment can be expected, and a black anti-fogging layer 10 that absorbs light is interposed between the transparent substrate 1 and the highly conductive layer 2, and the highly conductive layer 2 is indirectly attached to the transparent substrate 1. It is clear that the transparent substrate 1 can be prevented from being fogged as a whole.

なお、上記実施形態では透明基板1の表面と高導電層2との間に曇り防止層10を介在したが、何らこれに限定されるものではない。例えば、透明基板1の裏面に曇り防止層10を形成しても良い。   In the above embodiment, the anti-fogging layer 10 is interposed between the surface of the transparent substrate 1 and the highly conductive layer 2, but the present invention is not limited to this. For example, the anti-fogging layer 10 may be formed on the back surface of the transparent substrate 1.

以下、本発明に係る太陽電池の電極部品の実施例を比較例と共に説明する。
実施例1
先ず、無アルカリガラスからなる透明基板の表面に、高導電層を感光性銀インクを使用した露光現像により格子のパターンに形成し、この高導電層上に、透明導電膜である膜厚3000オングストロームのITO被膜をスパッタリングし、この三層構造の構造体を5mm×5mm(以下、5mm□と表す)、300mm×300mm(以下、300mm□と表す)の大きさにそれぞれカットした。
Examples of electrode parts for solar cells according to the present invention will be described below together with comparative examples.
Example 1
First, a highly conductive layer is formed in a lattice pattern on the surface of a transparent substrate made of alkali-free glass by exposure and development using a photosensitive silver ink, and a film thickness of 3000 angstrom, which is a transparent conductive film, is formed on the highly conductive layer. The three-layer structure was cut into a size of 5 mm × 5 mm (hereinafter referred to as 5 mm □) and 300 mm × 300 mm (hereinafter referred to as 300 mm □).

銀インクとしては、ネガ型感光性アクリル系樹脂をベースとし、銀粉末の分散したタイプを使用した。露光現像に際しては、パターンとして残したい部分にUV光を照射して感光性の導電性インクの少なくとも表層部を硬化させ、現像することによりパターンを形成した。   As the silver ink, a negative photosensitive acrylic resin was used as a base, and a silver powder dispersed type was used. At the time of exposure and development, a pattern was formed by irradiating UV light to a portion to be left as a pattern to cure at least the surface layer portion of the photosensitive conductive ink and developing.

スパッタリングに際しては、マグネトロンスパッタリング装置、100mm×400mmのITO(インジウム−スズ酸化物)セラミックターゲットを使用し、アルゴンガス50cc/分、酸素ガス3cc/分を供給し、マグネトロンスパッタリング装置内部の圧力を0.7Paに設定するとともに、供給電力2000Wの条件で5分間スパッタリングした。   At the time of sputtering, a magnetron sputtering apparatus and a 100 mm × 400 mm ITO (indium-tin oxide) ceramic target are used, argon gas is supplied at 50 cc / min, oxygen gas is 3 cc / min, and the pressure inside the magnetron sputtering apparatus is set at 0. While setting to 7 Pa, sputtering was performed for 5 minutes under the condition of a supplied power of 2000 W.

次いで、構造体のITO被膜に、金属酸化物半導体膜である酸化チタンペースト〔昭和電工製 商品名SP−200〕をスプレー法により塗布し、120℃、20分の条件で製膜して酸化チタンペーストの厚さを12μmとした。こうして酸化チタンペーストを製膜したら、ルテニウム錯体〔RuL2(NCS)2〕(Lは4,4’−ジカルボキシ−2,2’ビピリジン)で表される分光増感色素を3×10-4モル/lの濃度でエタノールに溶解し、この錯体溶液に、酸化チタンペーストを備えた透明基板を入れ、室温で18時間浸漬して太陽電池の電極、より詳しくは、酸化チタン半導体電極を製造した。分光増感色素の吸着量は、酸化チタン膜の比表面積1cm2当たり1×10-7molであった。 Next, a titanium oxide paste (product name: SP-200, manufactured by Showa Denko), which is a metal oxide semiconductor film, is applied to the ITO film of the structure by a spray method, and the titanium oxide film is formed at 120 ° C. for 20 minutes. The thickness of the paste was 12 μm. When the titanium oxide paste is thus formed, a spectral sensitizing dye represented by a ruthenium complex [RuL 2 (NCS) 2 ] (L is 4,4′-dicarboxy-2,2′bipyridine) is 3 × 10 −4. Dissolved in ethanol at a concentration of mol / l, a transparent substrate equipped with a titanium oxide paste was placed in this complex solution and immersed for 18 hours at room temperature to produce a solar cell electrode, more specifically, a titanium oxide semiconductor electrode. . The adsorption amount of the spectral sensitizing dye was 1 × 10 −7 mol per 1 cm 2 of the specific surface area of the titanium oxide film.

そして、酸化チタン半導体電極を一方の電極とし、他方の電極として本実施例の構造体に白金を担持した透明導電性基板を別に用意し、二つの電極にリード線をそれぞれ接続するとともに、二つの電極の間に電解質を充填し、その後、二つの電極の回りを樹脂で封入して太陽電池を製造した。   Then, a titanium oxide semiconductor electrode is used as one electrode, and as the other electrode, a transparent conductive substrate carrying platinum is separately prepared in the structure of the present embodiment, and lead wires are connected to the two electrodes, respectively. An electrolyte was filled between the electrodes, and then the periphery of the two electrodes was sealed with resin to manufacture a solar cell.

電解質としては、溶媒であるアセトニトリルに、ヨウ化リチウムを0.1mol/l、1,2−ジメチル−3−プロピルイミダゾリウムアイオダイドを0.3mol/l、ヨウ素を0.05mol/l、t−ブチルピリジンを0.5mol/lの濃度となるよう溶解したものを用いた。製造した太陽電池に、ソーラーシミュレーターで100W/m2 の強度の光を照射して変換効率を測定した。 As an electrolyte, acetonitrile as a solvent, lithium iodide 0.1 mol / l, 1,2-dimethyl-3-propylimidazolium iodide 0.3 mol / l, iodine 0.05 mol / l, t- A solution in which butylpyridine was dissolved to a concentration of 0.5 mol / l was used. The conversion efficiency was measured by irradiating the manufactured solar cell with light having an intensity of 100 W / m 2 using a solar simulator.

実施例2
基本的には実施例1と同様であるが、透明基板としてポリカーボネート(PC)を使用してその表面には固定層として透明シリコーンゴム(SR)を塗布し、高導電層にタングステン線(W線)を使用した。高導電層のパターン形成に際しては、円筒形のドラムの外周に固定層を備えた透明基板を固定層が外側になるようにセットし、ドラムを回転させながらタングステン線をドラムの回転軸方向に一定速度で移動させつつ繰り出し、透明基板上の固定層に巻き付けるとともに、タングステン線を伴った透明基板を切り開き、所定のピッチで平行に配列した金属細線を得る方法(線巻き)を採用した。
Example 2
Basically the same as in Example 1, except that polycarbonate (PC) is used as a transparent substrate, transparent silicone rubber (SR) is applied as a fixed layer on its surface, and tungsten wire (W wire) is applied to the highly conductive layer. )It was used. When forming the pattern of the highly conductive layer, set a transparent substrate with a fixed layer on the outer periphery of a cylindrical drum so that the fixed layer faces the outside, and keep the tungsten wire constant in the direction of the drum rotation axis while rotating the drum. A method (wire winding) was adopted in which the wire was drawn out while being moved at a speed, wound around a fixed layer on the transparent substrate, and the transparent substrate with a tungsten wire was cut open to obtain fine metal wires arranged in parallel at a predetermined pitch.

また、300mm□の太陽電池を対象に、R20mmの曲率で180°屈曲を100回行い、熱変換効率を測定し、減少率を10%単位で表1にまとめた。減少率5%未満は「<5」、5%以上15%未満は「10」、15%以上25%未満は「20」、…55%以上65%未満は「60」のように表記した。その他の部分については、実施例1と同様である。   Further, for a 300 mm □ solar cell, 180 ° bending was performed 100 times with a curvature of R20 mm, the thermal conversion efficiency was measured, and the reduction rate was summarized in Table 1 in units of 10%. The decrease rate of less than 5% is expressed as “<5”, 5% or more but less than 15% is “10”, 15% or more and less than 25% is “20”,... 55% or more and less than 65% is expressed as “60”. Other parts are the same as those in the first embodiment.

実施例3
基本的には実施例2と同様であるが、透明基板としてポリエチレンテレフタレート(PET)を使用し、高導電層に実施例1とは別の銀インクを使用した。銀インクとしては、ポリビニルブチラールをベースとし、銀粉末の分散したタイプを使用した。また、高導電層のパターン形成に際しては、スクリーン印刷法を採用した。その他の部分については、実施例2と同様である。
Example 3
Basically the same as Example 2, but polyethylene terephthalate (PET) was used as the transparent substrate, and silver ink different from Example 1 was used for the highly conductive layer. As the silver ink, a polyvinyl butyral-based type in which silver powder was dispersed was used. Further, a screen printing method was employed for pattern formation of the highly conductive layer. Other parts are the same as those in the second embodiment.

実施例4
基本的には実施例2と同様であるが、透明基板としてポリカーボネート(PC)を使用し、高導電層に実施例1と同様の銀インクを使用した。また、高導電層のパターン形成に際しては、実施例1と同様に露光現像を採用した。その他の部分については、実施例2と同様である。
Example 4
Basically the same as in Example 2, but polycarbonate (PC) was used as the transparent substrate, and the same silver ink as in Example 1 was used for the highly conductive layer. Further, in the pattern formation of the highly conductive layer, exposure development was adopted as in Example 1. Other parts are the same as those in the second embodiment.

実施例5
基本的には実施例2と同様であるが、透明基板としてポリカーボネート(PC)を使用してその表面には固定層として透明シリコーンゴム(SR)を塗布し、高導電層に、ポリエステルの単繊維を平織りした後に黒色の銅めっきを施したもの(銅めっきポリエステル)を用いた。また、高導電層のパターン形成に際しては、織布を採用した。
Example 5
Basically the same as in Example 2, except that polycarbonate (PC) is used as the transparent substrate, transparent silicone rubber (SR) is applied as a fixing layer on the surface, and polyester monofilament is applied to the highly conductive layer. After plain weaving, what was subjected to black copper plating (copper-plated polyester) was used. Further, a woven fabric was used for pattern formation of the highly conductive layer.

比較例1
基本的には実施例1と同様であるが、無アルカリガラスからなる透明基板の表面に、高導電層ではなく、透明導電膜である膜厚3000オングストロームのITO被膜をスパッタリングし、この二層構造の構造体を5mm□、300mm□の大きさにカットした。
300mm□の太陽電池を対象とした耐屈曲耐久試験は、実施例1と同様に実施しなかった。その他の部分については、実施例1と同様である。
Comparative Example 1
This is basically the same as in Example 1, except that an ITO film having a thickness of 3000 angstrom, which is a transparent conductive film instead of a highly conductive layer, is sputtered on the surface of a transparent substrate made of alkali-free glass. The structure was cut into 5 mm □ and 300 mm □ sizes.
The bending resistance endurance test for 300 mm □ solar cells was not performed in the same manner as in Example 1. Other parts are the same as those in the first embodiment.

比較例2
基本的には実施例2と同様であるが、透明基板としてポリエチレンテレフタレート(PET)を使用し、高導電層に、粗面化処理の施されていない圧延銅箔を使用した。また、高導電層のパターン形成に際しては、ネガタイプのドライフィルムレジストを用いたエッチング(エッチング法)を採用した。その他の部分については、実施例2と同様である。
Comparative Example 2
Basically the same as in Example 2, but polyethylene terephthalate (PET) was used as the transparent substrate, and a rolled copper foil that had not been subjected to roughening treatment was used for the highly conductive layer. Further, in the pattern formation of the highly conductive layer, etching (etching method) using a negative type dry film resist was employed. Other parts are the same as those in the second embodiment.

Figure 2005285480
Figure 2005285480

結 果
実施例1〜4においては、変換効率が非常に高く、良好な性能を示した上、セル面積を大きくしても性能劣化は殆んど無く、実施例に係る電極部品が大面積セルに有効であること証明された。
Results In Examples 1 to 4, the conversion efficiency was very high, and good performance was exhibited. In addition, even if the cell area was increased, there was almost no performance degradation, and the electrode parts according to the examples were large-area cells. Proved effective.

実施例5においては、高導電層の線幅が広く、光線の吸収量が若干少なくなったため、他の実施例と比較して変換効率が若干見劣りするものの、太陽電池の部品としては十分な性能を有することが証明された。また、他の実施例と同様、面積の増大による変換効率の低下が無く、大面積セルに有効であることが証明された。
また、耐屈曲性試験においては、実施例2〜5の電極部品の変換効率の減少率は全て5%未満と良好な結果だった。
In Example 5, although the line width of the highly conductive layer was wide and the amount of light absorption was slightly reduced, the conversion efficiency was slightly inferior compared to other examples, but sufficient performance as a solar cell component Proved to have Further, as in the other examples, there was no decrease in conversion efficiency due to an increase in area, which proved effective for large area cells.
Moreover, in the bending resistance test, all the reduction rates of the conversion efficiency of the electrode parts of Examples 2 to 5 were good results of less than 5%.

これに対し、比較例1の場合、小面積での変換効率は実用領域にあるものの、大面積にすると、変換効率が著しく悪化し、使用に耐えるものではなかった。
また、比較例2の場合、面積の増大には有効であったが、エッチング部の透明性を確保するために粗面化処理をしていない圧延銅箔を使用したため、透明基板との接着性が不足し、屈曲耐久試験で60%も効率が減少した。
On the other hand, in the case of Comparative Example 1, although the conversion efficiency with a small area is in a practical range, when the area is large, the conversion efficiency is remarkably deteriorated and cannot be used.
Moreover, in the case of the comparative example 2, although it was effective for the increase in an area, since the rolled copper foil which has not roughened in order to ensure the transparency of an etching part was used, adhesiveness with a transparent substrate is used. The efficiency decreased by 60% in the bending endurance test.

本発明に係る太陽電池の電極部品の実施形態における太陽電池を示す断面説明図である。It is sectional explanatory drawing which shows the solar cell in embodiment of the electrode component of the solar cell which concerns on this invention. 本発明に係る太陽電池の電極部品の実施形態における高導電層を示す一部拡大説明図である。It is a partially expanded explanatory view which shows the highly conductive layer in embodiment of the electrode component of the solar cell which concerns on this invention. 本発明に係る太陽電池の電極部品の他の実施形態における太陽電池を示す断面説明図である。It is sectional explanatory drawing which shows the solar cell in other embodiment of the electrode component of the solar cell which concerns on this invention.

符号の説明Explanation of symbols

1 透明基板
2 高導電層(導電層)
3 中空部
4 透明導電膜
5 金属酸化物半導体膜
6 分光増感色素
10 曇り防止層
1 Transparent substrate 2 Highly conductive layer (conductive layer)
3 Hollow part 4 Transparent conductive film 5 Metal oxide semiconductor film 6 Spectral sensitizing dye 10 Anti-fogging layer

Claims (3)

太陽光を電気エネルギーに変換する太陽電池の電極部品であって、透明基板と、この透明基板の一面に形成される導電層とを含み、この導電層をパターン化して中空部を形成したことを特徴とする太陽電池の電極部品。   An electrode component of a solar cell that converts sunlight into electrical energy, including a transparent substrate and a conductive layer formed on one surface of the transparent substrate, the conductive layer being patterned to form a hollow portion The electrode part of the characteristic solar cell. 透明基板あるいは透明基板と導電層との間に、曇り防止層を形成した請求項1記載の太陽電池の電極部品。   The electrode part of the solar cell according to claim 1, wherein a fogging preventing layer is formed between the transparent substrate or the transparent substrate and the conductive layer. 導電層上に形成される透明導電膜と、この透明導電膜上に形成され、分光増感色素を備えた金属酸化物半導体膜とを含んでなる請求項1又は2記載の太陽電池の電極部品。

The electrode part of the solar cell according to claim 1 or 2, comprising a transparent conductive film formed on the conductive layer and a metal oxide semiconductor film formed on the transparent conductive film and provided with a spectral sensitizing dye. .

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JP2011530815A (en) * 2008-08-12 2011-12-22 ダイソル・リミテッド Current collection system used in flexible photoelectric and display devices and method of manufacturing the same
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