JP2005274594A5 - - Google Patents

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Publication number
JP2005274594A5
JP2005274594A5 JP2004083353A JP2004083353A JP2005274594A5 JP 2005274594 A5 JP2005274594 A5 JP 2005274594A5 JP 2004083353 A JP2004083353 A JP 2004083353A JP 2004083353 A JP2004083353 A JP 2004083353A JP 2005274594 A5 JP2005274594 A5 JP 2005274594A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004083353A
Other versions
JP2005274594A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004083353A priority Critical patent/JP2005274594A/ja
Priority claimed from JP2004083353A external-priority patent/JP2005274594A/ja
Priority to US11/084,041 priority patent/US20050221222A1/en
Publication of JP2005274594A publication Critical patent/JP2005274594A/ja
Publication of JP2005274594A5 publication Critical patent/JP2005274594A5/ja
Priority to US11/778,761 priority patent/US20070275327A1/en
Pending legal-status Critical Current

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JP2004083353A 2004-03-22 2004-03-22 感光性樹脂組成物及びレジストパターンの形成方法 Pending JP2005274594A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004083353A JP2005274594A (ja) 2004-03-22 2004-03-22 感光性樹脂組成物及びレジストパターンの形成方法
US11/084,041 US20050221222A1 (en) 2004-03-22 2005-03-21 Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing method
US11/778,761 US20070275327A1 (en) 2004-03-22 2007-07-17 Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004083353A JP2005274594A (ja) 2004-03-22 2004-03-22 感光性樹脂組成物及びレジストパターンの形成方法

Publications (2)

Publication Number Publication Date
JP2005274594A JP2005274594A (ja) 2005-10-06
JP2005274594A5 true JP2005274594A5 (ja) 2007-05-10

Family

ID=35174388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004083353A Pending JP2005274594A (ja) 2004-03-22 2004-03-22 感光性樹脂組成物及びレジストパターンの形成方法

Country Status (1)

Country Link
JP (1) JP2005274594A (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4802551B2 (ja) * 2005-05-19 2011-10-26 Ｊｓｒ株式会社 感放射線性樹脂組成物
KR20090024246A (ko) * 2006-06-27 2009-03-06 제이에스알 가부시끼가이샤 패턴 형성 방법 및 그것에 이용하는 유기 박막 형성용 조성물
US11675266B2 (en) * 2021-04-15 2023-06-13 Industrial Technology Research Institute Photosensitive compound, photosensitive composition, and patterning method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02149854A (ja) * 1988-11-30 1990-06-08 Fujitsu Ltd レジストパターンの形成方法
JP2848625B2 (ja) * 1989-03-31 1999-01-20 株式会社東芝 パターン形成方法
JP3942263B2 (ja) * 1997-03-05 2007-07-11 信越化学工業株式会社 高分子化合物、化学増幅ポジ型レジスト材料及びパターン形成方法
JP2001151824A (ja) * 1999-06-09 2001-06-05 Wako Pure Chem Ind Ltd レジスト組成物
JP2002030118A (ja) * 2000-07-14 2002-01-31 Tokyo Ohka Kogyo Co Ltd 新規コポリマー、ホトレジスト組成物、および高アスペクト比のレジストパターン形成方法
JP4328570B2 (ja) * 2002-06-28 2009-09-09 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法

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