JP2005266414A - Heat developable photosensitive material - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material which has high sensitivity and low fog and is hardly affected by humidity during storage. <P>SOLUTION: The heat developable photosensitive material contains a photosensitive silver halide, an organic silver salt, a reducing agent and a binder on at least one surface of a support and further contains a compound represented by a general formula (1) and a hydrogen bond forming compound represented by a general formula (2). <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a photothermographic material that forms an image by thermal development, and more particularly to a photothermographic material that has high sensitivity, low fog, and is hardly affected by humidity during storage.

  In recent years, in the fields of printing plate making and medical treatment, waste liquids resulting from wet processing of image forming materials have become a problem in terms of workability, and further reduction of processing waste liquids is strongly desired from the viewpoint of environmental conservation and space saving. ing. As a technique for meeting such a demand, a technique for forming a clear black image with high resolution by heat development is known. For example, U.S. Pat. Nos. 3,152,904, 3,457,075 and D. The technique described in “Dry Silver Photographic Materials” by Morgan (Handbook of Imaging Materials, Marcel Dekker, Inc., p. 48, 1991) is well known. Since these photographic materials are usually developed at a temperature of 80 ° C. or higher, they are called photothermographic materials.

  Such a photothermographic material usually contains a reducible non-photosensitive silver salt (for example, an organic silver salt), a reducing agent (developer), and a photocatalyst (for example, photosensitive silver halide) in an organic binder matrix. Oxidation-reduction between a silver salt (acting as an oxidizing agent) and a reducing agent that has a photosensitive layer contained in a dispersed state on the support and is stable at room temperature but can be reduced when heated to a high temperature after exposure. The reaction produces silver. This redox reaction is promoted by the catalytic action of the latent image generated by exposure. The silver produced by the reaction of the organic silver salt in the exposed areas forms a black image, which contrasts with the unexposed areas and forms an image. This image forming layer is an image forming layer.

  However, many conventional photothermographic materials of this type have the disadvantage that they are easily affected by humidity during storage, and the sensitivity, density and fog of the photothermographic material are affected by changes in humidity during storage. There was a problem that it fluctuated.

  As phthalazine derivatives with little fog increase during storage, phthalazine N-oxide compounds are disclosed in US Pat. No. 6,630,291, and alkyl quaternary salts of phthalazine are disclosed in US Pat. No. 6,605,418. However, these compounds also have the drawback that the sensitivity, density and fog of the photothermographic material are likely to vary due to changes in humidity during storage. Further, hydrogen bonding compounds such as phosphine oxide derivatives are disclosed in JP-A No. 2003-177490 and the like as fog inhibitors during storage.

  Further, many of the photothermographic materials have a drawback that fog is increased during storage.

  As an antifoggant, use of specific alkene compounds is disclosed in JP-T-2000-515995, JP-A-2002-207273, JP-A-2003-140298, and JP-A-2000-330235. 2002-236335, 2002-258442, 2003-5323 and the like disclose compounds in which a nitrogen-containing heterocycle is blocked with a specific substituent.

  However, these antifoggants also have the drawback of being easily affected by humidity during storage.

By the way, specific alkene compounds and hydrazine compounds have been studied for the purpose of high sensitivity, high concentration and high contrast for medical diagnosis and printing plate making. These are disclosed in, for example, Patent Documents 1 to 9 and the like, but these compounds have a problem that they are easily fogged during storage.
US Pat. No. 5,545,515 US Pat. No. 5,654,130 JP 11-119372 A JP 2001-125224 A JP 2000-221632 A Japanese Patent Laid-Open No. 11-231459 JP-A-11-133546 JP 2000-162733 A JP 2003-29371 A

  An object of the present invention is to provide a photothermographic material which has high sensitivity, low fog and is hardly affected by humidity during storage.

  The said subject is achieved by the following structures.

(Claim 1)
At least one surface of the support contains photosensitive silver halide, organic silver salt, reducing agent and binder, and further a compound represented by the following general formula (1) and hydrogen represented by the following general formula (2) A photothermographic material comprising a binding compound.

(In the formula, R ₁ represents a substituent, and m represents an integer of 0 to 6).

(Wherein R ₂ , R ₃ and R ₄ each represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, an oxy group or an amino group, and any one of R ₂ , R ₃ and R ₄ ) Two may be bonded to each other to form a ring.)
(Claim 2)
2. The photothermographic material according to claim 1, further comprising a development accelerator on the same side as the image forming layer of the photothermographic material.

(Claim 3)
3. The photothermographic material according to claim 2, wherein the development accelerator is at least one selected from a phenol derivative, a naphthol derivative, a hydrazine derivative, a cyclic imide derivative, and a phthalazinone derivative.

(Claim 4)
The photothermographic material further comprises at least one compound represented by the following general formula (3), general formula (4) or general formula (5) on the same side as the image forming layer. The photothermographic material according to any one of claims 1 to 3.

(Wherein X represents an electron withdrawing group, W represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, a halogen atom, a cyano group, an acyl group, a thioacyl group, an oxalyl group, Oxyoxalyl group, -S-oxalyl group, oxamoyl group, oxycarbonyl group, -S-carbonyl group, carbamoyl group, thiocarbamoyl group, sulfonyl group, sulfinyl group, oxysulfonyl group, -S-sulfonyl group, sulfamoyl group, oxy Sulfinyl group, -S-sulfinyl group, sulfinamoyl group, phosphoryl group, nitro group, imino group, N-carbonylimino group, N-sulfonylimino group, ammonium group, sulfonium group, phosphonium group, pyrylium group, or immonium group represents, R ₆ is hydroxyl group or a hydroxyl Represents salts, R ₇ represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heterocyclic group. Here, each formyl group as X and W are excluded .X and W ring structure bonded with each other (X and R ₆ are shown in a cis form, but X and R ₆ include a trans form.)

(Wherein X ₃ represents a substituent, R ₈ represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group, and n represents an integer of 0 to 4)

(Wherein Q represents an atomic group necessary to form a nitrogen-containing heterocycle, J represents —SO ₂ —, —CO—, —COO— or —CON (R ₁₀ ) —, and R ₁₀ Represents a hydrogen atom or a substituent, and R ₉ represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.
(Claim 5)
The photothermographic material according to claim 1, further comprising a compound represented by the following general formula (6) on the same side as the image forming layer of the photothermographic material. Photosensitive material.

(In the formula, Y represents an electron withdrawing group, and Z ₁ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, a halogen atom, a cyano group, an acyl group, a thioacyl group, or an oxalyl group. Group, oxyoxalyl group, -S-oxalyl group, oxamoyl group, oxycarbonyl group, -S-carbonyl group, carbamoyl group, thiocarbamoyl group, sulfonyl group, sulfinyl group, oxysulfonyl group, -S-sulfonyl group, sulfamoyl group Oxysulfinyl group, -S-sulfinyl group, sulfinamoyl group, phosphoryl group, nitro group, imino group, N-carbonylimino group, N-sulfonylimino group, ammonium group, sulfonium group, phosphonium group, pyrylium group, or immonium .R ₁₁ represents a group of the halogen atom, oxy group, thio , Amino or .Y and Z ₁ represents a heterocycle group may be bonded together to form a ring structure together. Incidentally, Y and R ₁₁ although are displayed in the form of cis Y and R ₁₁ is (Including transformer shape)
(Claim 6)
The photothermographic material according to claim 1, wherein the binder is a hydrophobic binder.

(Claim 7)
7. The photothermographic material according to claim 6, wherein the hydrophobic binder is at least one selected from polyvinyl acetal, a cellulose acetate derivative, and a styrene-butadiene copolymer.

(Claim 8)
The photothermographic material according to claim 1, wherein the binder is a hydrophilic binder.

(Claim 9)
9. The photothermographic material according to claim 8, wherein the hydrophilic binder is at least one selected from gelatin, polyacrylic acid, polymethacrylic acid and polyvinyl alcohol.

(Claim 10)
The photothermographic material according to claim 1, wherein 80% by mass or more of the organic silver salt is silver behenate.

  According to the present invention, it is possible to provide a photothermographic material having high sensitivity, low fog and being hardly affected by humidity during storage.

  As a result of diligent research, the present inventor has included a photosensitive silver halide, an organic silver salt, a reducing agent and a binder on at least one surface of the support, and the compound represented by the general formula (1) and the general It has been found that a photothermographic material containing a hydrogen bonding compound represented by the formula (2) can obtain a photothermographic material having high sensitivity, low fog and being hardly affected by humidity during storage.

  By further containing a development accelerator such as a phenol derivative, a naphthol derivative, a hydrazine derivative, a cyclic imide derivative, a phthalazinone derivative on the same side as the image forming layer of the photothermographic material, the sensitivity is further reduced. It was also found that a photothermographic material that is less susceptible to humidity during storage can be obtained.

  In order to further manifest the effects of the present invention, the photothermographic material is further represented by the general formula (3), the general formula (4), and the general formula (5) on the same side as the image forming layer. A hydrophobic binder such as a polyvinyl acetal, a cellulose acetate derivative, and a styrene-butadiene copolymer, or gelatin, containing at least one of the compounds represented by formula (6) It is preferable that a hydrophilic binder such as polyacrylic acid, polymethacrylic acid and polyvinyl alcohol is contained, and 80% by mass or more of the organic silver salt is silver behenate.

  The present invention will be described in detail below.

  First, the compound represented by the general formula (1) used in the present invention will be described.

In the general formula (1), examples of the substituent represented by R ₁ include an alkyl group (methyl, ethyl, t-butyl, cyclohexyl, etc.), an alkenyl group (vinyl, etc.), an alkynyl group (acetylene, etc.), and an aryl group. (Phenyl, naphthyl, etc.), heterocyclic group (pyridyl, pyrimidyl, etc.), acyl group (acetyl, etc.), oxalyl group, oxyoxalyl group, oxamoyl group, carbamoyl group, oxycarbonyl group (ethoxycarbonyl etc.), sulfonyl group, sulfamoyl Group, oxysulfonyl group, hydroxy group, alkoxy group, aryloxy group, carboxy group, cyano group, nitro group, amino group, acylamino group, sulfonamide group, urea group, oxycarbonylamino group, acyloxy group, sulfonyloxy group, Phosphoryl group, silyl group, sulfo group, Gen atom, a sulfinyl group, a sulfinamoyl group, an oxy-sulfinyl group include an imino group, and the like.

The substituent represented by R ₁ may be bonded to each other to form a carbocyclic ring such as cyclohexane, benzene, pyridine, dioxolane, an aromatic ring, a heterocyclic ring, or the like.

  Specific examples of the compound represented by the general formula (1) of the present invention are given below.

  The compound represented by the general formula (1) of the present invention can be synthesized by the following method. For example, various phthalazine N-oxide derivatives are synthesized using the synthesis method described in US Pat. No. 6,630,291 or the synthesis method described in Synthetic Communications 30 (8), 1529-1534 (2000). can do.

  The compound represented by the general formula (1) of the present invention can be added to a photosensitive layer or a non-photosensitive layer according to a known method. That is, it can be dissolved in alcohols such as methanol and ethanol, ketones such as methyl ethyl ketone and acetone, polar solvents such as dimethyl sulfoxide and dimethylformamide, and added to the coating solution for the photosensitive layer and the coating solution for the non-photosensitive layer. .

  Moreover, it can also be made into fine particles of 1 μm or less and dispersed in water or an organic solvent. Many techniques for fine particle dispersion have been disclosed, but they can be dispersed according to these techniques.

The compound represented by the general formula (1) of the present invention can be used in an amount of 10 ⁻⁸ to 1 mol per mol of silver, preferably 10 ⁻⁶ to 1 mol, and more preferably 10 ⁻⁴ to 1 mol.

  Examples of the phthalazine compound that can be used in combination with the compound represented by the general formula (1) of the present invention include the following compounds.

f1: phthalazine f2: 6-aminophthalazine f3: 5-methylphthalazine f4: 6-chlorophthalazine f5: 6-i-propylphthalazine f6: 6- (4,6-di-t-amylphenyl) phthalazine f7: 6-phenylphthalazine f8: 6-methoxyphthalazine f9: 1,4-dimethylphthalazine f10: 5,6-dimethoxyphthalazine f11: 6-i-butylphthalazine The hydrogen bonding compound represented by the general formula (2) will be described.

  In the present invention, when the reducing agent has an aromatic hydroxyl group, particularly in the case of bisphenols, the hydrogen bond represented by the general formula (2) having a group capable of forming a hydrogen bond with these groups. The active compound is used in combination.

In the general formula (2), the alkyl group, alkenyl group, alkynyl group, aryl group and heterocyclic group represented by R ₂ , R ₃ and R ₄ are the same as those described for R ₁ in the general formula (1). The oxy group includes an alkoxy group (methoxy group, ethoxy group, etc.), an aryloxy group (phenoxy group, etc.), and the amino group includes an alkylamino group (dimethylamino group, diethylamino group, etc.) And arylamino group (diphenylamino group and the like).

These groups may be further substituted with a substituent as described for R ₁ in the general formula (1).

  Specific examples of the hydrogen bonding compound represented by the general formula (2) of the present invention are given below.

  The hydrogen bonding compound represented by the general formula (2) of the present invention is used in a photothermographic material by being contained in a coating solution in a solution state, an emulsified dispersion state, or a solid dispersion fine particle dispersion state, similarly to the reducing agent. However, it is preferably used as a solid fine particle dispersion.

  Depending on the combination of the reducing agent and the hydrogen bonding compound represented by the general formula (2) of the present invention, it can be isolated in a crystalline state as a complex, and the crystal powder thus isolated is dispersed in solid fine particles. It is preferable to use as a product for obtaining stable performance.

  Also preferably used is a method in which the reducing agent and the hydrogen bonding compound represented by the general formula (2) of the present invention are mixed in a powder and complexed at the time of dispersion with a sand grinder mill or the like using an appropriate dispersant. I can do it.

  The hydrogen bonding compound represented by the general formula (2) of the present invention can be used in the range of 1 to 200 mol%, and can be used in the range of 10 to 150 mol% with respect to the reducing agent. Preferably, it is more preferably used in the range of 30 to 100 mol%.

  Development accelerators preferably used in the present invention are phenol derivatives, naphthol derivatives, hydrazine derivatives, cyclic imide derivatives, phthalazinone derivatives, and the like. Specific examples of the phenol derivative and naphthol derivative include compounds described in JP-A Nos. 2003-177490 and 2003-337393, and the compounds represented by the following general formula (7) or (8) Is preferred.

(Wherein X ₂ represents an acyl group, an oxycarbonyl group, a carbamoyl group, a sulfonyl group or a sulfamoyl group, R ₁₁ represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heterocyclic group, and R ₁₂ represents a substituted group) And n represents an integer of 0 to 5.)

Wherein X ₃ , X ₄ , R ₁₃ R ₁₄ and R ₁₅ are each a hydrogen atom, a halogen atom, or a substituent bonded to the benzene ring by a carbon atom, oxygen atom, nitrogen atom, sulfur atom or phosphorus atom. Provided that at least one of X ₃ and X ₄ is a group represented by —N (R ₁₆ ) (R ₁₇ ), wherein R ₁₆ and R ₁₇ are each a hydrogen atom, an alkyl group, Alkenyl, alkynyl, aryl, heterocyclic, acyl, oxycarbonyl, carbamoyl, oxalyl, oxyoxalyl, oxamoyl, sulfonyl, sulfamoyl, oxysulfonyl, sulfinyl, sulfinamoyl, oxy Represents a sulfinyl group, a phosphoryl group or an imino group.)
The compound represented by the general formula (7) will be described.

In the general formula (7), X ₂ is an acyl group (acetyl group, hexanoyl group, benzoyl group, etc.), oxycarbonyl group (ethoxycarbonyl group, phenoxycarbonyl group, etc.), carbamoyl group (N-hexylcarbamoyl group, N-phenyl). Carbamoyl group, etc.), sulfonyl group (methanesulfonyl group, benzenesulfonyl group, etc.) or sulfamoyl group (phenylsulfamoyl group, etc.), and these groups are further substituted as described for R ₁ in formula (1) It may be substituted with a group. X ₂ is preferably a carbamoyl group.

Examples of the alkyl group, alkenyl group, alkynyl group, aryl group or heterocyclic group represented by R ₁₁ include the same groups as those described for R ₁ in the general formula (1). It may be substituted with a substituent as described for R ₁ in formula (1).

Examples of the substituent represented by R ₁₂ include the same substituents as those described for R ₁ in the general formula (1).

  Specific examples of the compound represented by the general formula (7) of the present invention are listed below.

  The compound represented by the general formula (8) will be described.

In the general formula (8), among the groups represented by X ₃ , X ₄ , R ₁₃ R ₁₄ and R ₁₅ , the substituent bonded to the benzene ring with a carbon atom is represented by R ₁ in the general formula (1). Examples thereof include an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, an acyl group, an oxalyl group, a carbamoyl group, an oxycarbonyl group, a carboxy group, and a cyano group.

  Examples of the substituent bonded to the benzene ring with an oxygen atom include a hydroxy group, an alkoxy group, an aryloxy group, an acyloxy group, a sulfonyloxy group, an oxycarbonyloxy group, and an aminocarbonyloxy group.

  Examples of the substituent bonded to the benzene ring with a nitrogen atom include a nitro group, an amino group, an acylamino group, a sulfonamide group, a urea group, an oxycarbonylamino group, and a nitrogen-containing heterocyclic group.

  Examples of the substituent bonded to the benzene ring with a sulfur atom include a sulfonyl group, a sulfo group, a mercapto group, an alkylthio group, and an arylthio group.

  Examples of the substituent bonded to the benzene ring with a phosphorus atom include a phosphoryl group.

At least one of X ₃ and X ₄ is a group represented by —N (R ₁₆ ) (R ₁₇ ). Examples of the substituent other than a hydrogen atom represented by R ₁₆ and R ₁₇ include a compound represented by the general formula ( Examples of the substituent include those described for R ₁ in 1). A preferred combination as R ₁₆ and R ₁₇ is when one of them is a hydrogen atom and the other is an acyl group, a carbamoyl group or a sulfonyl group.

  Specific examples of the compound represented by the general formula (8) of the present invention are given below.

  Specific examples of other naphthol derivatives as development accelerators are given below.

  Of the development accelerators preferably used in the present invention, hydrazine derivatives will be described.

  The hydrazine compound is a compound having a —NHNH— group, and a typical example of the hydrazine compound includes a compound represented by the following general formula (10).

General formula (10) T-NHNH-CO-V
In general formula (10), T represents an optionally substituted alkyl group, aryl group, heterocyclic group, acyl group, or sulfonyl group, and V represents a hydrogen atom or a blocking group.

  Examples of the alkyl group represented by T include linear, branched or cyclic alkyl groups such as methyl, ethyl, propyl, isopropyl and cyclohexyl, and various substituents such as aryl, heterocycle, acyl and cyano. May be substituted, and specific examples include a trityl group and a benzyl group.

The aryl group represented by T includes a benzene ring and a naphthalene ring, and these rings may be substituted with various substituents. As a preferable substituent, a linear or branched alkyl group (preferably Have 1 to 20 carbon atoms, such as methyl, ethyl, propyl, isopropyl, dodecyl, trifluoromethyl, etc., alkoxy groups (preferably having 1 to 20 carbon atoms such as methoxy, ethoxy, propoxy, isopropoxy, dodecyloxy, etc. ), An aliphatic acylamino group (preferably having an alkyl group having 1 to 21 carbon atoms, such as an acetylamino group or a heptylamino group), an aromatic acylamino group, a nitro group, a cyano group, a sulfonyl group, etc. Besides such as substituted or unsubstituted aromatic rings, such as described above -CONH of -, - O -, - sO 2 N -, - NHCONH -, - including those linked by CH ₂ CH = N-linking groups such as. Examples of the heterocyclic group represented by T include pyridyl, furyl, thienyl, pyrimidyl, pyrazinyl, quinoxalinyl, quinazolinyl and the like, and examples of the substituent include the substituents described above for the aryl group. It is done. Examples of the acyl group represented by T include groups such as benzoyl, acetyl, and dodecanoyl, and examples of the sulfonyl group include groups such as methanesulfonyl and toluenesulfonyl.

  T is preferably a phenyl group, a trityl group or a heterocyclic group, and may have the above-described substituent. V represents a hydrogen atom or a blocking group. Examples of the blocking group include alkyl, aryl, heterocycle, carbamoyl, oxycarbonyl, oxy, amino, and the like. The substituents mentioned as the substituents may be similarly substituted. In the present invention, V is preferably an amino group.

  Specific examples of the blocking group other than the hydrogen atom represented by V include, for example, methyl, methoxymethyl, methylthiomethyl, trifluoromethyl, phenyl, naphthyl, pyridyl, thienyl, furyl, ethoxy, t-butoxy, N-methylcarbamoyl. , Ethoxycarbonyl, anilino, butylamino, octylamino and the like.

  Hydrazine compounds are disclosed in U.S. Pat. Nos. 4,269,929, 5,545,515, JP-A-10-512061, JP-A-9-152702, JP-A-8-286340, JP-A-9-152700. No. 9, JP-A-9-152701, JP-A-9-152703, JP-A-9-152704 and the like.

  Examples of the hydrazine compound used in the present invention include, for example, US Pat. In particular, compounds in which V in the general formula (10) is an amino group are preferable, and compounds of 10-16 to 10-22 in the following specific examples are preferable.

  Specific examples of the hydrazine compound are given below.

  Of the development accelerators preferably used in the present invention, cyclic imide derivatives will be described. The cyclic imide derivative is represented by the following general formula (11).

(In the formula, G represents a group that forms a ring together with the —CO—NH—CO— group.)
In the general formula (11), G is preferably a group that forms a 5- or 6-membered ring together with the —CO—NH—CO— group. Specific cyclic imide derivatives include, for example, succinimide, phthalate Acid imide, naphthalic acid imide and the like can be mentioned, and succinimide is particularly preferable.

  Examples of the cyclic imide derivative further include compounds represented by the following general formula (12) such as benzoxazinedione, benzothiazinedione, and quinazolinedione.

(In the formula, L represents —O—, —S—, —Se—, —N (R ₁₉ ) —, R ₁₉ represents a hydrogen atom or a substituent, R ₁₈ represents a substituent, and l represents Represents an integer of 0 to 4)
In the general formula (12), examples of the substituent represented by R ₁₉ include the same as those described for R ₁ in the general formula (1), and as R ₁₉ , hydrogen atom, alkyl group, alkenyl group, alkynyl Group, aryl group and heterocyclic group are preferred. Examples of the substituent represented by R ₁₈ include the same substituents as those described for R ₁ in the general formula (1).

  Specific examples of the compound represented by the general formula (12) are given below.

  Of the development accelerators preferably used in the present invention, phthalazinone derivatives will be described. The phthalazinone derivative is represented by the following general formula (13).

(In the formula, R ₂₀ represents a hydrogen atom or a substituent. R ₂₁ represents a substituent, and p represents an integer of 0 to 4.)
In the general formula (13), examples of the substituent represented by R ₂₀ include the same substituents as those described for R ₁ in the general formula (1), and examples of R ₂₀ include a hydrogen atom, an alkyl group, an alkenyl group, and an alkynyl. Group, aryl group, heterocyclic group, oxy group (hydroxy group, alkoxy group, aryloxy group etc.), thio group (mercapto group, alkylthio group, arylthio group etc.), halogen atom, amino group and the like are preferable. Examples of the substituent represented by R ₂₁ include the same substituents as those described for R ₁ in formula (1).

  Specific examples of the compound represented by the general formula (13) are given below.

  The development accelerator is a compound that accelerates development when added to the main reducing agent in heat development.

The addition amount of the development accelerator used in the present invention is wide, but can be added in the range of 0.001 to 500 mol% with respect to the main reducing agent, and 1 × 10 ⁻⁴ to 1 with respect to 1 mol of silver. It can be added in a molar range. The development accelerator used in the present invention can be added in the same manner as the compound of the general formula (1).

  The development accelerator used in the present invention is preferably a naphthol derivative represented by the general formula (7), a phenol derivative represented by the general formula (8), a hydrazine derivative represented by the general formula (10), or the like. However, a naphthol derivative represented by the general formula (7) is more preferable.

  Next, the compound represented by the general formula (3) preferably used in the present invention will be described.

  The electron withdrawing group represented by X is a substituent whose Hammett's substituent constant σp can take a positive value. Specifically, a substituted alkyl group (such as halogen-substituted alkyl), a substituted alkenyl group (such as cyanovinyl), a substituted or unsubstituted alkynyl group (such as trifluoromethylacetylenyl, cyanoacetylenyl, formylacetylenyl), Substituted aryl groups (such as cyanophenyl), substituted and unsubstituted heterocyclic groups (such as pyridyl, triazinyl, benzoxazolyl), halogen atoms, cyano groups, acyl groups (such as acetyl and trifluoroacetyl), thioacyl groups (such as thioformyl) , Thioacetyl etc.), oxalyl group (methyl oxalyl etc.), oxyoxalyl group (ethoxalyl etc.), -S-oxalyl group (ethyl thiooxalyl etc.), oxamoyl group (methyl oxamoyl etc.), oxycarbonyl group (ethoxycarbonyl, carboxyl) Etc.), -S-carbonyl group (ethyl) Ocarbonyl), carbamoyl group, thiocarbamoyl group, sulfonyl group, sulfinyl group, oxysulfonyl group (ethoxysulfonyl etc.), -S-sulfonyl group (ethylthiosulfonyl etc.), sulfamoyl group, oxysulfinyl group (methoxysulfinyl etc.) , -S-sulfinyl group (such as methylthiosulfinyl group), sulfinamoyl group, phosphoryl group, nitro group, imino group (imino, N-methylimino, N-phenylimino, N-pyridylimino, N-cyanoimino, N-nitroimino, etc.), N -Carbonylimino group (N-acetylimino, N-ethoxycarbonylimino, N-ethoxalylimino, N-formylimino, N-trifluoroacetylimino, N-carbamoylimino, etc.), N-sulfonylimino group (N-methanes) Phonylimino, N-trifluoromethanesulfonylimino, N-methoxysulfonylimino, N-sulfamoylimino, etc.), ammonium group, sulfonium group, phosphonium group, pyrylium group, immonium group, etc., ammonium group, sulfonium group In addition, a heterocyclic group in which a phosphonium group, an immonium group or the like forms a ring is also included. However, X excludes a formyl group. The σp value is preferably 0.2 or more, more preferably 0.3 or more.

  W includes hydrogen atom, alkyl group (methyl, ethyl, trifluoromethyl, etc.) alkenyl group (vinyl, halogen-substituted vinyl, cyanovinyl, etc.), alkynyl group (acetylenyl, cyanoacetylenyl, etc.), aryl group (phenyl, chlorophenyl) , Nitrophenyl, cyanophenyl, pentafluorophenyl, etc.), heterocyclic groups (pyridyl, pyrimidyl, pyrazinyl, quinoxalinyl, triazinyl, succinimide, tetrazolyl, triazolyl, imidazolyl, benzoxazolyl, etc.) as described above for X Halogen atom, cyano group, acyl group, thioacyl group, oxalyl group, oxyoxalyl group, -S-oxalyl group, oxamoyl group, oxycarbonyl group, -S-carbonyl group, carbamoyl group, thiocarbamoyl group, sulfoni Group, sulfinyl group, oxysulfonyl group, -S-sulfonyl group, sulfamoyl group, oxysulfinyl group, -S-sulfinyl group, sulfinamoyl group, phosphoryl group, nitro group, imino group, N-carbonylimino group, N-sulfonylimino group Group, ammonium group, sulfonium group, phosphonium group, pyrylium group, immonium group and the like. However, formyl group is excluded as W.

  W is preferably an electron-withdrawing group other than a formyl group in which Hammett's substituent constant σp can take a positive value, as well as an aryl group and a heterocyclic group as described above.

  Further, those in which X and W are bonded to each other to form a cyclic structure are preferable. Examples of the ring formed by X and W include a saturated or unsaturated carbocycle or heterocycle optionally having a condensed ring, and a cyclic ketone is preferred. As the heterocyclic ring, those containing at least one atom, more preferably 1-2, of N, O and S are preferable.

R ₆ includes a hydroxyl group or an organic or inorganic salt of a hydroxyl group. Specific examples of the alkyl group, alkenyl group, alkynyl group, aryl group and heterocyclic group represented by R ₇ include the examples of the alkyl group, alkenyl group, alkynyl group, aryl group and heterocyclic group exemplified as W. It is done.

In the present invention, X, W, and R ₇ may all contain a diffusion-resistant group. The anti-diffusion group is called a ballast group in a photographic coupler or the like, and has a bulky molecular weight so that the added compound does not move in the film of the photosensitive material.

In the present invention, X, W and R ₇ may contain an adsorption promoting group for silver salt. Adsorption promoting groups for silver salts include thioamide groups, aliphatic mercapto groups, aromatic mercapto groups, heterocyclic mercapto groups and benzotriazoles, triazoles, tetrazoles, indazoles, benzimidazoles, imidazoles, benzothiazoles, thiazoles, benzoxazoles, Examples include groups represented by 5- to 6-membered nitrogen-containing heterocycles such as oxazole, thiadiazole, oxadiazole, and triazine.

  In the present invention, it is preferable that at least one of X and W represents a cyano group, or X and W are bonded to each other to form a cyclic structure.

In the present invention, a compound containing a thioether group (—S—) in the substituent represented by X, W, or R ⁷ is preferred.

  Further, it is preferable that at least one of X and W has an alkene group represented by the following general formula (3a).

Formula _{(3a) -C (R 12)} = C (Y 1) (Z 11)
In the above formula, R ₁₂ represents a hydrogen atom or a substituent, and Y ₁ and Z ₁₁ each represent a hydrogen atom or a substituent, and at least one of Y ₁ and Z ₁₁ represents an electron withdrawing group.

Examples of the electron withdrawing groups of the substituents represented by Y ₁ and Z ₁₁ include those mentioned as the electron withdrawing groups for X and W described above and the formyl group.

  Examples of X and W represented by the general formula (3a) include the following groups.

  In addition, it is also preferable that at least one of X and W has the following alkyne group.

R ₁₃ represents a hydrogen atom or a substituent, and the substituent is preferably an electron-withdrawing group or a formyl group as mentioned above for X and W. Examples of X and W represented by the above general formula include the following groups.

  In addition, it is preferable that at least one of X and W has an acyl group selected from a substituted alkylcarbonyl group, an alkenylcarbonyl group, and an alkynylcarbonyl group. Examples of X and W include the following groups.

  In addition, it is also preferable that at least one of X and W has an oxalyl group. Examples of X and W having an oxalyl group include the following groups.

-COCONCH ₃ , -COCOOC ₂ H ₅ , -COCONHCH ₃ , -COCOSC ₂ H ₅ , -COCOOC ₂ H ₄ SCH ₃ , -COCONHC ₂ H ₄ SCH ₃
In addition, at least one of X and W preferably has an aryl group substituted with an electron withdrawing group or a nitrogen-containing heterocyclic group. Examples of such X and W include the following groups.

In the present invention, the alkene compound represented by the general formula (3) includes all isomers when it can take an isomer structure with respect to the double bond substituted by X, W, R ₆ and R ₇ . In addition, all isomers are included when a tautomeric structure such as keto-enol can be taken.

  Although the specific example of a compound represented by General formula (3) below is shown, this invention is not limited to these.

  Next, a specific example in which, in the general formula (3), X and W are bonded to each other to form a cyclic structure.

  The compound represented by the general formula (3) of the present invention can be synthesized by various methods. For example, the compound can be synthesized with reference to the synthesis method described in JP-T 2000-515995.

  Exemplary compound 3-5 can be synthesized, for example, by the following route.

  Other compounds represented by the general formula (3) can be synthesized in the same manner.

The compound represented by the general formula (3) may be contained in at least one of the photosensitive layer of the photothermographic material or the non-photosensitive layer on the photosensitive layer side, and preferably contained in at least the photosensitive layer. is there. The amount of the compound represented by the general formula (3) is preferably 1 × 10 ⁻⁸ to 1 mol, more preferably 1 × 10 ⁻⁶ to 1 × 10 ⁻¹ mol, relative to 1 mol of silver, 1 ×. 10 ⁻⁴ to 1 × 10 ⁻¹ mol is most preferred.

  The compound represented by the general formula (3) can be added to the photosensitive layer or the non-photosensitive layer according to a known method. That is, it can be dissolved in an alcohol such as methanol or ethanol, a ketone such as methyl ethyl ketone or acetone, or a polar solvent such as dimethyl sulfoxide or dimethylformamide, and added to the coating solution for the photosensitive layer or the non-photosensitive layer. Further, fine particles of 1 μm or less can be dispersed and added in water or an organic solvent. Many techniques for fine particle dispersion are disclosed, but they can be dispersed according to these techniques.

  The compound represented by the general formula (4) that is preferably used in the present invention will be described.

Examples of the alkyl group represented by R ₈ include linear, branched, and cyclic groups such as methyl, ethyl, n-propyl, i-propyl, n-butyl, t-butyl, n-pentyl, n- Examples include hexyl, cyclohexyl, 2-ethylhexyl, t-octyl, n-decyl, n-dodecyl, n-hexadecyl and the like.

Examples of the alkenyl group represented by R ₈ include groups such as vinyl, allyl and crotyl.

Examples of the alkynyl group represented by R ₈ include ethynyl and 1-propynyl groups.

Examples of the aryl group represented by R ₈ include groups such as phenyl and naphthyl.

Examples of the heterocyclic group represented by R ₈ include groups such as pyridyl, pyrimidyl, pyrazinyl, triazinyl, imidazolyl, benzoxazolyl, furyl, thienyl, tetrahydrofuryl, piperidinyl, pyrrolidinyl and the like.

Each group of alkyl, alkenyl, alkynyl, aryl, and heterocyclic represented by R ₈ may further have a substituent. Examples of the substituent include alkyl, alkenyl, alkynyl, aryl, heterocyclic, halogen, hydroxyl , Alkoxy, aryloxy, nitro, amino, acylamino, sulfonylamino, sulfonyl, carboxy, alkoxycarbonyl, aryloxycarbonyl, carbamoyl, sulfamoyl, cyano, sulfo and the like.

X ₃ represents a substituent, and specific examples thereof include the same groups as those exemplified as the substituent for the alkyl, alkenyl, alkynyl, aryl, and heterocyclic groups represented by R ₈ above.

  Although the specific example of a compound represented by General formula (4) below is shown, this invention is not limited to these.

  The compound represented by the general formula (4) of the present invention can be synthesized by the following method.

  According to the above scheme, a hydroxybenzotriazole derivative and a sulfonyl chloride derivative are generally used in a solvent such as acetonitrile, acetone, tetrahydrofuran, ethyl acetate, toluene, N, N-dimethylformamide and the like using a base catalyst such as triethylamine, pyridine, potassium carbonate, etc. A compound represented by the formula (4) can be synthesized.

  Next, the compound represented by the general formula (5) preferably used in the present invention will be described.

  Examples of nitrogen-containing heterocycles formed by Q include pyrrole, indole, imidazole, benzimidazole, pyrazole, carbazole, 1,2,3-triazole, 1,2,4-triazole, tetrazole, benzotriazole, indazole, Examples include purine, phenoxazine, phenothiazine, imidazolidine, pyrazolidine, thiazoline, and the like, more preferably benzotriazole, 1,2,3-triazole, 1,2,4-triazole, indazole, benzimidazole, tetrazole, thiazoline, and the like. It is.

The nitrogen-containing heterocyclic ring formed by Q may further have a substituent, and examples of the substituent include the same groups as those described for X ₃ in formula (4).

J represents —SO ₂ —, —CO—, —COO— or —CON (R ₁₀ ) —, wherein R ₁₀ represents a hydrogen atom or a substituent, and the substituent includes an alkyl group, an alkenyl group, an alkynyl group, Examples thereof include aryl groups and heterocyclic groups, and specific examples thereof include the same groups as those described for R ₈ in formula (4). R ₉ represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group, and specific examples thereof include the same groups as those described for R ₈ in the general formula (4).

  Although the specific example of a compound represented by General formula (5) below is shown, this invention is not limited to these.

  The compound represented by the general formula (5) of the present invention can be synthesized by the following method.

When J is —CON (R ₁₀ ) —, it can also be synthesized by the following method.

  Regarding the synthesis of the compound represented by the general formula (5) of the present invention, the synthesis example of JP 2000-330235 A can also be referred to.

The compound represented by the general formulas (4) and (5) of the present invention may be contained in at least one layer of the photosensitive layer and its adjacent layers, such as alcohols such as methanol and ethanol, methyl ethyl ketone, acetone and the like. It may be added by dissolving in an organic solvent such as ketones, aromatics such as toluene or xylene, or non-aromatics such as normal hexane or decane, or may be dispersed in water, or made into a powder or tablet. May be added directly. The amount is preferably 1 × 10 ^-8 to 1 mol per mol of silver, more preferably 1 × 10 ^-6 ~1 × 10 ^{-1 mol, 1 × 10 -4 ~1 × 10} -1 mol and most preferable.

  The compound represented by formula (6), which is preferably used for increasing the sensitivity in the present invention, will be described.

Examples of the electron withdrawing group represented by Y include the same groups as the specific examples of the electron withdrawing group represented by X in the general formula (3). Examples of Z ₁ include the same groups as the specific examples given for W in formula (3). Y and Z ₁ may be bonded to each other to form a cyclic structure in the same manner as X and W in formula (3).

R ₁₁ includes a halogen atom, an oxy group (hydroxy, aryloxy, heterocyclic oxy, acyloxy, alkoxy, alkenyloxy, alkynyloxy, alkoxycarbonyloxy, aminocarbonyloxy, etc.), a thio group (mercapto, arylthio, heterocyclic thio). , Alkylthio, alkenylthio, alkynylthio, acylthio, alkoxycarbonylthio, aminocarbonylthio, etc.) and organic or inorganic salts of hydroxy group, mercapto group, amino group (amino, alkylamino, arylamino, acylamino, oxycarbonylamino, Ureido, sulfonamide, etc.), heterocyclic groups (5- to 6-membered nitrogen-containing heterocycles) and the like.

  The heterocyclic group is a 5- to 6-membered nitrogen-containing heterocyclic ring, preferably a 5- to 6-membered nitrogen-containing heteroaromatic ring, and more preferably bonded through a nitrogen atom in the ring, pyrrole, diazole, triazole, It is represented by tetrazole or the like, and specifically, imidazole, benzotriazole or the like is preferable.

R ₁₁ is preferably a hydroxy group, mercapto group, halogen atom, hydroxy or mercapto organic or inorganic salt, heterocyclic residue and the like. R ₁₁ is more preferably a hydroxy group, an organic or inorganic salt of hydroxy, or a heterocyclic residue, and an hydroxy or organic or inorganic salt of hydroxy is particularly preferable.

In the present invention, Y, Z ₁ and R ₁₁ may each contain a diffusion-resistant group or a silver salt adsorption promoting group. Specific examples of these groups include the diffusion-resistant groups and groups that promote adsorption to silver salts mentioned in X, W, and R ₇ in the general formula (3).

In the present invention, the alkene compound represented by the general formula (6) includes all isomers when it can take an isomer structure with respect to the double bond substituted by Y, Z ₁ , R ₁₁ and H. In addition, all isomers are included when a tautomeric structure such as keto-enol can be taken.

  Although the specific example of a compound represented by General formula (6) below is shown, this invention is not limited to these.

  The compound represented by the general formula (6) of the present invention can be synthesized by various methods. For example, U.S. Pat. Nos. 5,545,515, 5,635,339, and JP-A-11-119373. It can be synthesized with reference to the synthesis method described in No. etc.

  Exemplary compound 6-12 can be synthesized, for example, by the following route.

  Other compounds represented by the general formula (6) of the present invention can be synthesized in the same manner.

The compound represented by the general formula (6) may be contained in at least one of the photosensitive layer of the photothermographic material or the non-photosensitive layer on the photosensitive layer side. The addition amount of the compound represented by the general formula (6) is preferably 1 × 10 ⁻⁸ to 1 mol, more preferably 1 × 10 ⁻⁶ to 1 × 10 ⁻¹ mol, relative to 1 mol of silver, 1 × 10 ⁻⁴ to 1 × 10 ⁻¹ mol is most preferred.

  The compound represented by the general formula (6) can be added to the photosensitive layer or the non-photosensitive layer in the same manner as the compound represented by the general formula (3). That is, it can be dissolved in an alcohol such as methanol or ethanol, a ketone such as methyl ethyl ketone or acetone, or a polar solvent such as dimethyl sulfoxide or dimethylformamide, and added to the coating solution for the photosensitive layer or the non-photosensitive layer. Further, fine particles of 1 μm or less can be dispersed and added in water or an organic solvent. Many techniques for fine particle dispersion are disclosed, but they can be dispersed according to these techniques.

  Specific examples of the polyhalomethane compound preferably used in the present invention include compounds of the following general formula (14).

In the formula, A represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heterocyclic group. Z ₂₁ , Z ₂₂ and Z ₂₃ each represent a hydrogen atom, a halogen atom, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a sulfonyl group or an aryl group, at least one of which is a halogen atom. J ₁₁ is a group containing —C (═O) —, —SO— or —SO ₂ —, but —C (═O) —, —SO— or —SO ₂ — is —C (Z ₂₁ ). It is assumed that it is directly connected to C in (Z ₂₂ ) (Z ₂₃ ).

Examples of the alkyl group, alkenyl group, and alkynyl group represented by A include the same groups as those described for R ₁ in formula (1).

  The aryl group represented by A may be monocyclic or condensed, and is preferably a monocyclic or bicyclic aryl group having 6 to 30 carbon atoms, more preferably a phenyl group or a naphthyl group, More preferred is a phenyl group.

  The heterocyclic group represented by A is a 3- to 10-membered saturated or unsaturated heterocyclic group containing at least one of N, O or S atoms, and these may be monocyclic or other A ring and a condensed ring may be formed. The heterocyclic group is preferably a 5- to 6-membered unsaturated heterocyclic group which may have a condensed ring, more preferably a 5- to 6-membered aromatic heterocyclic group which may have a condensed ring. is there. More preferably, it is a 5- or 6-membered aromatic heterocyclic group which may have a condensed ring containing a nitrogen atom, and particularly preferably 5 to 6 which may have a condensed ring containing 1 to 4 nitrogen atoms. It is a member aromatic heterocyclic group.

  The heterocyclic ring in such a heterocyclic group is preferably imidazole, pyrazole, pyridine, pyrimidine, pyrazine, pyridazine, triazole, triazine, indole, indazole, purine, thiadiazole, oxadiazole, quinoline, phthalazine, naphthyridine, quinoxaline, quinazoline Cinnoline, pteridine, acridine, phenanthroline, phenazine, tetrazole, thiazole, oxazole, benzimidazole, benzoxazole, benzothiazole, indolenine, tetrazaindene, etc., more preferably imidazole, pyridine, pyrimidine, pyrazine, pyridazine, triazole , Triazine, thiadiazole, oxadiazole, quinoline, phthalazine, naphthyridine, quinoxaline, quina Phosphorus, cinnoline, tetrazole, thiazole, oxazole, benzimidazole, benzoxazole, benzothiazole, tetrazaindene, more preferably imidazole, pyridine, pyrimidine, pyrazine, pyridazine, triazole, triazine, thiadiazole, quinoline, phthalazine, naphthyridine, Quinoxaline, quinazoline, cinnoline, tetrazole, thiazole, benzimidazole, and benzothiazole are preferable, and pyridine, thiadiazole, quinoline, and benzothiazole are particularly preferable.

The alkyl group, alkenyl group, alkynyl group, aryl group and heterocyclic group represented by A may have a substituent in addition to —J ₁₁ —C (Z ₂₁ ) (Z ₂₂ ) (Z ₂₃ ). The substituent is preferably an alkyl group, alkenyl group, alkynyl group, aryl group, alkoxy group, aryloxy group, acyloxy group, acyl group, alkoxycarbonyl group, aryloxycarbonyl group, acyloxy group, acylamino group, alkoxycarbonyl. Amino group, aryloxycarbonylamino group, sulfonylamino group, sulfamoyl group, carbamoyl group, sulfonyl group, ureido group, phosphoric acid amide group, halogen atom, cyano group, sulfo group, carboxyl group, nitro group, heterocyclic group , More preferably alkyl group, aryl group, alkoxy group, aryloxy group , Acyl group, acylamino group, alkoxycarbonylamino group, aryloxycarbonylamino group, sulfonylamino group, sulfamoyl group, carbamoyl group, ureido group, phosphoric acid amide group, halogen atom, cyano group, nitro group, heterocyclic group More preferably, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an acyl group, an acylamino group, a sulfonylamino group, a sulfamoyl group, a carbamoyl group, a halogen atom, a cyano group, a nitro group, and a heterocyclic group are particularly preferable. Is an alkyl group, an aryl group, or a halogen atom.

Z ₂₁ , Z ₂₂ and Z ₂₃ are preferably halogen atoms, haloalkyl groups, acyl groups, alkoxycarbonyl groups, aryloxycarbonyl groups, carbamoyl groups, sulfamoyl groups, sulfonyl groups and heterocyclic groups, more preferably halogen atoms. Haloalkyl group, acyl group, alkoxycarbonyl group, aryloxycarbonyl group and sulfonyl group, more preferably a halogen atom. Among the halogen atoms, preferred are chlorine, bromine and iodine atoms, more preferred are chlorine and bromine atoms, and particularly preferred are bromine atoms.

J ₁₁ represents a group containing —C (═O) —, —SO—, or —SO ₂ —, and preferably a group containing —SO ₂ — or —C (═O) —.

  Specific examples of these compounds are listed below.

  The polyhalomethane compound may be contained in at least one of the photosensitive layer and its adjacent layer, but is preferably contained in at least the photosensitive layer.

  Polyhalomethane compounds may be added by dissolving in organic solvents such as alcohols such as methanol and ethanol, ketones such as methyl ethyl ketone and acetone, aromatics such as toluene and xylene, and non-aromatics such as hexane and decane. It may be dispersed in water, or added directly as a powder or tablet.

The amount used can be 10 ⁻⁸ to 1 mol per mol of silver, preferably 10 ⁻⁶ to ¹ mol, and more preferably 10 ⁻⁴ to 10 ⁻¹ mol. If it is less than this range, it is difficult to obtain the intended effect of improving the image storability. On the other hand, if it exceeds this range, the film becomes soft and the coating film becomes weak.

  Next, photosensitive silver halide grains, spectral sensitizing dyes, organic silver salts, reducing agents, binders, crosslinking agents, and other materials used in the photothermographic material of the present invention will be described in order.

  The photosensitive silver halide grains contained in the photosensitive layer of the photothermographic material can be obtained by any method known in the field of photographic technology such as a single jet or double jet method, for example, an ammonia method emulsion, a neutral method, an acidic method. Or the like, and then mixed with the other components of the present invention and introduced into the composition used in the present invention. In this case, in order to sufficiently contact the photosensitive silver halide grains with the organic silver salt, for example, as a protective polymer when preparing the photosensitive silver halide grains, U.S. Pat. Nos. 3,706,564 and 3 , 706,565, 3,713,833, 3,748,143, British Patent No. 1,362,970, etc. Means for enzymatic degradation of photosensitive silver halide emulsion gelatin as described in US Pat. No. 1,354,186, or photosensitive silver halide grains as described in US Pat. No. 4,076,539. By preparing in the presence of a surfactant, each means such as a means for omitting the use of the protective polymer can be applied.

  The photosensitive silver halide grains preferably have a small grain size in order to keep the white turbidity after image formation low and to obtain good image quality. The average particle size is 0.1 μm or less, preferably 0.01 to 0.1 μm, particularly preferably 0.02 to 0.08 μm. The shape of the silver halide grains is not particularly limited, and cubic, octahedral, so-called normal crystals or non-normal crystals such as spherical, rod-like, and tabular grains can be used. The silver halide composition is not particularly limited, and may be any of silver chloride, silver chlorobromide, silver chloroiodobromide, silver bromide, silver iodobromide, and silver iodide.

  The amount of the photosensitive silver halide grains is suitably 50% by mass or less, preferably 25 to 0.1% by mass, more preferably 15 to 0.1% by mass, based on the total mass of the silver halide and the organic silver salt. % Range. As the photosensitive silver halide grains, a part of the organic silver salt may be converted into silver halide using a silver halide forming component, and various conditions such as reaction temperature, reaction time, reaction pressure, etc. in this step are as follows. The reaction temperature is usually −23 to 74 ° C., the reaction time is 0.1 second to 72 hours, and the reaction pressure is atmospheric pressure. Is preferably set.

  The photosensitive silver halide grains prepared by the various methods described above can be chemically sensitized by, for example, a sulfur-containing compound, a gold compound, a platinum compound, a palladium compound, a silver compound, a tin compound, a chromium compound, or a combination thereof. it can. Regarding the method and procedure of this chemical sensitization, for example, U.S. Pat. No. 4,036,650, British Patent 1,518,850, JP-A-51-22430, 51-78319, 51-81124, etc. It is described in.

  In order to achieve sensitization, as described in US Pat. No. 3,980,482, when a part of the organic silver salt is converted to photosensitive silver halide by the silver halide forming component. A low molecular weight amide compound may coexist.

  Further, these photosensitive silver halide grains include illuminance failure, and metals belonging to groups 6 to 10 of the periodic table for elemental adjustment, such as Rh, Ru, Re, Ir, Os, Fe, etc. Ions, their complexes or complex ions. In particular, it is preferable to contain ions or complex ions of metals belonging to Groups 6 to 10 of the Periodic Table of Elements. As the metal, W, Fe, Co, Ni, Cu, Ru, Rh, Pd, Re, Os, Ir, Pt, and Au are preferable. In the case of the photothermographic material of the present invention, Rh, Re, It is preferably selected from Ru, Ir, and Os.

  These metals can be introduced into the silver halide in the form of a complex. In the present invention, the transition metal complex is preferably a hexacoordinate complex represented by the following general formula (15).

General formula (15) [ML ₆ ] ^m
In General formula (15), M represents a transition metal selected from Group 6 to 10 elements of the periodic table, L represents a bridging ligand, and m represents 0, 1-, 2- or 3-. Specific examples of the ligand represented by L include halides (fluoride, chloride, bromide and iodide), cyanide, cyanate, thiocyanate, selenocyanate, tellurocyanate, azide and aco. A ligand, nitrosyl, thionitrosyl and the like can be mentioned, and ako, nitrosyl, thionitrosyl and the like are preferable. When an acoligand is present, it preferably occupies one or two of the ligands. L may be the same or different. Specific examples of particularly preferable M are iridium (Ir), rhodium (Rh), ruthenium (Ru), rhenium (Re), and osmium (Os).

  Specific examples of sodium salts of transition metal coordination complexes are shown below. For convenience, sodium is not indicated, but in the case of trivalent, it is a salt composed of 3 sodium atoms and in the case of divalent 2 salts.

1: [RhCl ₆ ] ^3-
2: [RuCl ₆ ] ^3-
3: [ReCl ₆ ] ^3-
4: [RuBr ₆ ] ^3-
5: [OsCl ₆ ] ^3-
6: [CrCl ₆ ] ^3-
7: [Ru (NO) Cl ₅ ] ^2-
8: [RuBr ₄ (H ₂ O)] ^2-
9: [Ru (NO) (H ₂ O) Cl ₄ ] ⁻
10: [RhCl ₅ (H ₂ O)] ^2-
11: [Re (NO) Cl ₅ ] ^2-
12: [Re (NO) CN ₅ ] ^2-
13: [Re (NO) ClCN ₄ ] ^2-
14: [Rh (NO) ₂ Cl ₄ ] ⁻
15: [Rh (NO) (H ₂ O) Cl ₄ ] ⁻
16: [Ru (NO) CN ₅ ] ^2-
17: [Fe (CN) ₆ ] ^3-
18: [Rh (NS) Cl ₅ ] ^2-
19: [Os (NO) Cl ₅ ] ^2-
20: [Cr (NO) Cl ₅ ] ^2-
21: [Re (NO) Cl ₅ ] ⁻
22: [Os (NS) Cl ₄ (TeCN)] ^2-
23: [Ru (NS) Cl ₅ ] ²⁻
24: [Re (NS) Cl ₄ (SeCN)] ^2-
25: [Os (NS) Cl (SCN) ₄ ] ^2-
26: [Ir (NO) Cl ₅ ] ^2-
27: [IrCl ₆ ] ^3-
28: [IrCl ₆ ] ^2-
One kind of these metal ions or complex ions may be used, or two or more kinds of the same and different metals may be used in combination. In addition to the sodium salt, a potassium salt or a lithium salt may be used, and a cesium salt or the like can be arbitrarily selected. The content of these metal ions or complex ions is generally suitably 1 × 10 ⁻⁹ to 1 × 10 ⁻² mol, preferably 1 × 10 ⁻⁸ to 1 mol per mol of silver halide. × 10 ^-4 mol. The compounds providing these metal ions or complex ions are preferably added during silver halide grain formation and incorporated into the silver halide grains. Preparation of silver halide grains, that is, nucleation, growth, physical ripening , May be added at any stage before or after chemical sensitization, but is preferably added at the stage of nucleation, growth and physical ripening, more preferably at the stage of nucleation and growth, most preferably Preferably, it is added at the stage of nucleation. In addition, it may be divided and added several times, or it can be uniformly contained in the silver halide grains. JP-A-63-29603, JP-A-2-306236, 3 As described in JP-A Nos. 167545, 4-76534, 6-110146, 5-273683, etc., the particles can be contained with a distribution. Preferably, a distribution can be provided inside the particles. These metal compounds can be added by dissolving in water or an appropriate organic solvent (for example, alcohols, ethers, glycols, ketones, esters, amides). A method in which an aqueous solution or an aqueous solution in which a metal compound and NaCl, KCl are dissolved together is added to a water-soluble silver salt solution or a water-soluble halide solution during silver halide grain formation, or a silver salt solution and a halide solution are added. A method in which a silver halide grain is added by a three-liquid simultaneous mixing method when added simultaneously as a third aqueous solution, a method in which an aqueous solution of a required amount of a metal compound is introduced into a reaction vessel during grain formation, or a halogen There is a method of adding and dissolving another silver halide grain previously doped with metal ions or complex ions at the time of silver halide preparation. In particular, a method of adding an aqueous solution of a metal compound powder or an aqueous solution in which a metal compound and NaCl, KCl are dissolved together is added to the water-soluble halide solution. When the silver halide grains are added to the surface of the silver halide grains, a required amount of an aqueous solution of a metal compound can be charged into the reaction vessel immediately after the formation of the silver halide grains, during or after physical ripening, or at the time of chemical ripening.

  The photosensitive silver halide grains can be sensitized with a spectral sensitizing dye, if necessary. Examples of spectral sensitizing dyes include JP-A-63-159841, JP-A-60-140335, JP-A-63-231437, 63-259651, 63-304242, 63-15245, U.S. Pat.Nos. 4,639,414, 4,740,455, 4,741,966, 4,751,175, Sensitizing dyes described in U.S. Pat. No. 4,835,096 can be used.

  Spectral sensitizing dyes useful in the present invention are described in, for example, documents described or cited in RD17643, page 23, section IV-A (December 1978) and 1831, section 437, Section X (August 1978). Is done. In particular, a sensitizing dye having a spectral sensitivity suitable for the spectral characteristics of various scanner light sources can be advantageously selected. For example, compounds described in JP-A Nos. 9-34078, 9-54409, and 9-80679 are preferably used.

  The organic silver salt contained in the photothermographic material is a reducible silver source, and the organic silver salt as a silver ion source for silver image formation is a silver salt of an organic acid or a heteroorganic acid, particularly among them. Silver salts of long-chain (10 to 30 carbon atoms, preferably 15 to 25) aliphatic carboxylic acids and nitrogen-containing heterocyclic compounds are preferred. Also preferred are organic or inorganic complexes described in Research Disclosure (RD) 17029 and 29963 such that the ligand has a value of 4.0 to 10.0 as the total stability constant for silver ions. Examples of these suitable silver salts include the following.

  Silver salts of organic acids, such as gallic acid, succinic acid, behenic acid, stearic acid, arachidic acid, palmitic acid, lauric acid and the like. Silver carboxyalkylthiourea salts such as 1- (3-carboxypropyl) thiourea, 1- (3-carboxypropyl) -3,3-dimethylthiourea and the like. Silver salts or complexes of polymer reaction products of aldehydes and hydroxy-substituted aromatic carboxylic acids, such as aldehydes (formaldehyde, acetaldehyde, butyraldehyde, etc.) and hydroxy-substituted acids (salicylic acid, benzoic acid, 3,5-dihydroxybenzoic acid) A silver salt or complex of the reaction product of Silver salts or complexes of thiones, for example silver salts or complexes such as 3- (2-carboxyethyl) -4-hydroxymethyl-4-thiazoline-2-thione and 3-carboxymethyl-4-thiazoline-2-thione. Nitric acid and silver complex or salt selected from imidazole, pyrazole, urazole, 1,2,4-thiazole and 1H-tetrazole, 3-amino-5-benzylthio-1,2,4-triazole and benztriazole. Silver salts such as saccharin and 5-chlorosalicylaldoxime, and silver salts of mercaptides.

  Among these, particularly preferred silver salts include silver salts of long-chain aliphatic carboxylic acids such as silver behenate, silver arachidate, and silver stearate.

  In this invention, it turned out that the effect excellent in the objective of this invention is shown because 80 mass% or more of organic silver salt is silver behenate.

  The organic silver salt compound can be obtained by mixing a water-soluble silver compound and a compound that forms a complex with silver. The normal mixing method, the reverse mixing method, the simultaneous mixing method, as described in JP-A-9-127643. A controlled double jet method or the like is preferably used. For example, an alkali metal salt (for example, sodium hydroxide, potassium hydroxide, etc.) is added to an organic acid to produce an organic acid alkali metal salt soap (for example, sodium behenate, sodium arachidate, etc.), then controlled double The soap and silver nitrate are added by a jet method to produce an organic silver salt crystal. In that case, the following silver halide (also referred to as silver halide grains) may be mixed.

  It is preferable to produce silver aliphatic carboxylate under conditions where a compound that functions as a crystal growth inhibitor or dispersant for the aliphatic carboxylate particles is coexisted in the production process of the silver carboxylate particles. Specific examples include monohydric alcohols having 10 or less carbon atoms, preferably secondary alcohols, tertiary alcohols, glycols such as ethylene glycol and propylene glycol, polyethers such as polyethylene glycol, and glycerin. . A preferable addition amount is 10 to 200% by mass with respect to silver carboxylate.

  On the other hand, branched aliphatic carboxylic acids containing isomers such as isoheptanoic acid, isodecanoic acid, isotridecanoic acid, isomyristic acid, isopalmitic acid, isostearic acid, isoarachidic acid, isobehenic acid and isohexaconic acid are also preferred. A preferable addition amount is 0.5 to 10 mol% of the aliphatic carboxylate silver.

  Alcohols having 10 or less carbon atoms, preferably secondary alcohols and tertiary alcohols are reduced in viscosity by increasing the solubility of sodium aliphatic carboxylate in the preparation step, and monodispersed and small by increasing the stirring efficiency. Grain size. Branched aliphatic carboxylic acids and aliphatic unsaturated carboxylic acids have higher steric hindrance than the main component linear aliphatic carboxylic acid silver when crystallization of the aliphatic carboxylic acid silver, and the disorder of the crystal lattice is large. Therefore, large crystals are not generated, and as a result, the particle size is reduced.

  The organic silver salt can be used in various shapes, but tabular grains, particularly tabular organic silver salt grains having an aspect ratio of 3 or more are preferred. The tabular grains having an aspect ratio of 3 or more are grains having a ratio of particle diameter to thickness, a so-called aspect ratio (abbreviated as AR) represented by the following formula of 3 or more.

AR = particle diameter (μm) / thickness (μm)
The aspect ratio of the tabular organic silver salt particles is preferably 3 to 20, and more preferably 3 to 10.

  The method for obtaining the organic silver salt particles having the above-mentioned shape is not particularly limited. However, the mixed state at the time of forming the organic acid alkali metal salt soap and / or the mixed state at the time of adding silver nitrate to the soap is preferably maintained. It is also effective to optimize the ratio of silver nitrate that reacts with soap.

  The tabular organic silver salt particles are preferably preliminarily dispersed together with a binder, a surfactant or the like, if necessary, and then dispersed and pulverized with a media disperser or a high-pressure homogenizer. For the preliminary dispersion, a general stirrer such as an anchor type or a propeller type, a high-speed rotating centrifugal radiation type stirrer (dissolver), or a high-speed rotating shear type stirrer (homomixer) can be used.

  In addition, as the media disperser, a rolling mill such as a ball mill, a planetary ball mill, and a vibrating ball mill, a bead mill that is a medium stirring mill, an attritor, and other basket mills can be used. Various types can be used, such as a type that collides with a wall, a plug, etc., a type in which liquids are collided at a high speed after being divided into a plurality of liquids, and a type that passes through a thin orifice.

  When the above dispersion is performed, the binder concentration is preferably added in an amount of 0.1 to 10% of the mass of the organic silver, and it is preferable that the liquid temperature does not exceed 45 ° C. from the preliminary dispersion through the main dispersion. As preferable operating conditions for the present dispersion, for example, when a high-pressure homogenizer is used as the dispersing means, the preferable operating conditions are 29.42 to 98.06 MPa, and the number of operations is preferably 2 times or more. Moreover, when using a media dispersion machine as a dispersion | distribution means, a peripheral speed is mentioned as 6-13 m / sec as preferable conditions.

In a preferred embodiment of the photothermographic material of the present invention, the ratio of the organic silver salt particles exhibiting a projected area of less than 0.025 μm ² when the cross section perpendicular to the support surface of the material is observed with an electron microscope is organic silver salt particles. An organic silver salt having a characteristic that the ratio of particles exhibiting 70% or more of the total projected area and a projected area of 0.2 μm ² or more is 10% or less of the total projected area of the organic silver salt particles, photosensitive A photosensitive emulsion containing silver halide is coated. In such a case, it is possible to obtain a uniformly distributed state with little aggregation of organic silver salt particles in the photosensitive emulsion.

  The organic silver salt particles are preferably monodisperse particles, and the preferred monodispersity is 1 to 30%. By using monodisperse particles in this range, an image having a high density can be obtained. The monodispersity mentioned here is defined by the following formula.

Monodispersity = (standard deviation of particle size / average value of particle size) × 100
The average particle diameter (equivalent circle diameter) of the organic silver salt is preferably 0.01 to 0.2 μm, more preferably 0.02 to 0.15 μm. The average particle diameter (equivalent circle diameter) represents the diameter of a circle having the same area as each particle image observed with an electron microscope.

In order to prevent devitrification of the photothermographic material, the total amount of silver halide and organic silver salt is preferably 0.5 to 2.2 g per 1 m ² in terms of silver amount. By setting this range, an image preferable as a medical image can be obtained.

  The reducing agent contained in the photothermographic material is for reducing the organic silver salt to form a silver image. Examples of reducing agents include, for example, US Pat. Nos. 3,770,448, 3,773,512, 3,593,863, Research Disclosure (hereinafter abbreviated as RD) 17029 and 29963, 11-119372, JP-A-2002-62616, and the like. Examples of the reducing agent preferably used in the present invention include those represented by the following general formula (16).

In the formula, R ₂₁ , R ₂₁ ′, R ₂₂ and R ₂₂ ′ each represents a substituent. R ₂₃ represents a hydrogen atom or a substituent. X ₂₁ and X ₂₁ ′ represent a hydrogen atom or a substituent.

More specifically, examples of the substituent represented by R ₂₁ , R ₂₁ ′, R ₂₂ , R ₂₂ ′ include an alkyl group (methyl, ethyl, propyl, isopropyl, cyclopropyl, butyl, isobutyl, sec-butyl, t-butyl). Butyl, cyclohexyl, 1-methyl-cyclohexyl, dodecyl, etc.), alkenyl groups (vinyl, propenyl, butenyl, pentenyl, isohexenyl, cyclohexenyl, butenylidene, isopentylidene, etc.), alkynyl groups (ethynyl, Each group such as propynylidene), aryl group (each group such as phenyl and naphthyl), heterocyclic group (each group such as furyl, thienyl, pyridyl, pyrimidyl, triazinyl, quinolyl and tetrahydrofuranyl), halogen, hydroxyl, alkoxy , Aryloxy, acyloxy, sulfonylo Examples include groups such as xyl, nitro, amino, acylamino, sulfonylamino, sulfonyl, carboxy, alkoxycarbonyl, aryloxycarbonyl, carbamoyl, sulfamoyl, cyano, sulfo and the like. R ₂₁ , R ₂₁ ′ R ₂₂ , and R ₂₂ ′ are preferably an alkyl group, an alkenyl group, and an alkynyl group, and an alkyl group is more preferable.

R ₂₃ represents a hydrogen atom or a substituent, and examples of the substituent include the same groups as those described in the description of R ₂₁ , R ₂₁ ′ R ₂₂ and R ₂₂ ′. R ₂₃ is preferably a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or the like.

X ₂₁ and X ₂₁ ′ represent a hydrogen atom or a substituent, and examples of the substituent include the same groups as those described in the description of R ₂₁ , R ₂₁ ′ R ₂₂ , and R ₂₂ ′.

  Specific examples of these compounds are listed below.

  The reducing agent can be dispersed in water or dissolved in an organic solvent and contained in the photosensitive layer coating solution or the coating solution for the adjacent layer to be contained in these layers. As the organic solvent, alcohols such as methanol and ethanol, ketones such as acetone and methyl ethyl ketone, and aromatic systems such as toluene and xylene can be arbitrarily selected.

The amount of the reducing agent used is suitably in the range of 1 × 10 ⁻² to 10 mol, preferably 1 × 10 ^{−2 to} 1.5 mol, per mol of silver.

  In the present invention, a bisphenol compound represented by the following general formula (17) can be preferably used as a color tone adjusting agent for silver images.

In the formula, Z represents an —S— group or a —C (R ₃₃ ) (R ₃₃ ′) — group. R ₃₃ and R ₃₃ ′ each represent a hydrogen atom or a substituent. R ₃₁ , R ₃₂ , R ₃₁ ′ and R ₃₂ ′ each represents a substituent. X ₃₁ and X ₃₁ ′ each represent a hydrogen atom or a substituent. Examples of substituents represented by R ₃₃ and R ₃₃ ′ include alkyl groups (methyl, ethyl, propyl, isopropyl, cyclopropyl, butyl, isobutyl, sec-butyl, t-butyl, cyclohexyl, 1-methyl-cyclohexyl, dodecyl, etc. Each group), alkenyl group (each group such as vinyl, propenyl, butenyl, pentenyl, isohexenyl, cyclohexenyl, butenylidene, isopentylidene), alkynyl group (each group such as ethynyl, propynylidene), aryl group (phenyl, naphthyl) Etc.), heterocyclic groups (furyl, thienyl, pyridyl, pyrimidyl, triazinyl, quinolyl, tetrahydrofuranyl, etc. groups), halogen, hydroxyl, alkoxy, aryloxy, acyloxy, sulfonyloxy, nitro, amino, Acylamino, Ruhoniruamino, sulfonyl, carboxy, alkoxycarbonyl, aryloxycarbonyl, carbamoyl, sulfamoyl, cyano, each group sulfo and the like.

R ₃₃ and R ₃₃ ′ are preferably a hydrogen atom or an alkyl group.

R ₃₁ , R ₃₂ , R ₃₁ ′ and R ₃₂ ′ each represent a substituent, and examples of the substituent include the same groups as those described above for R ₃₃ and R ₃₃ ′.

R ₃₁ , R ₃₂ , R ₃₁ ′ and R ₃₂ ′ are preferably an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group and the like, and an alkyl group is more preferable.

Examples of the substituent on the alkyl group include the same groups as those described in the description of R ₃₃ and R ₃₃ ′.

R ₃₁ , R ₃₂ , R ₃₁ ′ and R ₃₂ ′ are more preferably tertiary alkyl groups such as t-butyl, t-amyl, t-octyl and 1-methyl-cyclohexyl.

X ₃₁ and X ₃₁ ′ each represent a hydrogen atom or a substituent, and examples of the substituent include the same groups as those described in the description of R ₃₃ and R ₃₃ ′.

  Specific examples of the bisphenol compound represented by the general formula (17) are shown below.

  As a method for adding the compound represented by the general formula (17), it can be added by the same method as that for the reducing agent represented by the general formula (16).

  The addition ratio of the compound represented by the general formula (17) to the reducing agent (compound represented by the general formula (17) / reducing agent (molar ratio)) is in the range of 0.001 to 0.2. , Preferably in the range of 0.005 to 0.1.

  As the binder for the photosensitive layer of the photothermographic material and its adjacent layers and other non-photosensitive layers, a colorless transparent or translucent binder is usually used. As a binder, in addition to polyvinyl polymers such as polyvinyl acetal (polyvinyl butyral), polyvinyl acetate, polyolefin, polystyrene, polyacrylate, polymethacrylate, and copolymers thereof, styrene-butadiene copolymers, etc. as hydrophobic binders, cellulose acetate, cellulose Examples thereof include cellulose derivatives such as acetate butyrate and cellulose acetate propionate, and polyesters. Examples of hydrophilic binders include vinyl polymers such as polyvinyl alcohol, polyacrylamide, polyacrylic acid, and polymethacrylic acid in addition to gelatin.

  Examples of the hydrophobic binder preferably used in the present invention include, in addition to polyvinyl acetal and cellulose acetate derivatives (cellulose acetate butyrate, cellulose acetate propionate, etc.) for organic solvent coating, styrene-butadiene copolymers for aqueous coating, etc. Is mentioned.

  The hydrophilic binder preferably used in the present invention includes aqueous coating gelatin, polyvinyl alcohol, polyacrylic acid, polymethacrylic acid and the like, and gelatin is more preferable.

  In the present invention, it is necessary that at least 50% by mass or more of the total binder mass on the image forming layer side is the hydrophobic binder as the hydrophobic binder, and at least 50% by mass of the total binder mass on the image forming layer side is the hydrophilic binder. The above needs to be a hydrophilic binder.

  In the present invention, at least one surface of the support is represented by the compound represented by the general formula (1) and the general formula (2) in addition to the photosensitive silver halide, the organic silver salt, the reducing agent, and the like. A photothermographic material that has high sensitivity, low fog, and is hardly affected by humidity during storage, regardless of whether a hydrophobic binder or a hydrophilic binder is used as a binder. I was able to get it.

  In the photothermographic material of the present invention, at least one of compounds having an isocyanate group, an alkoxysilane group, a vinylsulfone group, or a carbodiimide group as a binder in the photosensitive layer, the adjacent layer and other non-photosensitive layers is added. And may be applied.

  The binder can be used alone to form each layer of the photothermographic material, thereby maintaining adhesion to the lower layer and the upper layer and giving a film strength that is difficult to be damaged. However, the above-mentioned crosslinking agent having each functional group is used. As a result, film adhesion and film strength can be further increased.

  The preferred crosslinking agent is preferably a crosslinking agent having an alkoxysilane group, an isocyanate group, an epoxy group (glycidyl group), a vinylsulfonyl group or a carbodiimide group. Particularly preferred crosslinking agents are crosslinking agents having at least two isocyanate groups, carbodiimide crosslinking agents having at least two carbodiimide groups, alkoxysilane crosslinking agents having at least two alkoxy groups, vinylsulfonyl having at least two vinylsulfonyl groups. A crosslinking agent can be mentioned. Examples of preferred crosslinking agents are shown below.

H1: Hexamethylene diisocyanate H2: Trimer of hexamethylene diisocyanate H3: Tolylene diisocyanate H4: Phenylene diisocyanate H5: Xylylene diisocyanate H6: 1,3-bis (isocyanatomethyl) cyclohexane H7 : Tetramethylene xylylene diisocyanate H8: mi-propenyl-α, α-dimethylbenzyl isocyanate H9: phenylaminopropyltrimethoxysilane H10: p-methylphenylpropyltrimethoxysilane H11: dimethylaminopropyltrimethoxysilane H12: Diethoxyaminopropyltriethoxysilane H13: 1,2-bis (vinylsulfonylacetamido) ethane H14: 1,2-bis (vinylsulfonamido) ethane H15: 1,3 Bis (vinyl sulfonamido) -2-hydroxy-propane H16: 1,3-bis (vinylsulfonyl) -2-propanol

  The vinylsulfonyl compounds represented by H13 to H16 are also preferably used for the purpose of preventing fogging, as described in JP-A-6-208192.

  The carbodiimide compound used in the present invention is preferably a polyfunctional carbodiimide compound represented by the following general formula (CI).

Formula _{(CI) R 31 -J 1 -N} = C = N-J 2 - (L 1) n - (J 3 -N = C = N-J 4 -R 32) V
In the formula, R ₃₁ and R ₃₂ each represent an aryl group or an alkyl group, J ₁ and J ₄ each represent a divalent linking group, and J ₂ and J ₃ each represent an arylene group or an alkylene group. , L ₁ represents a (v + 1) -valent alkyl group, alkenyl group, aryl group or heterocyclic group, or a group in which these groups are bonded by a bonding group, v represents an integer of 1 or more, and n represents 0 or 1 Represents.

  Details of each of the above-described substituents are described in paragraphs [0188] to [0190] of Japanese Patent Application No. 2002-1345. Although the specific example of the carbodiimide compound preferably used for this invention is shown, this invention is not limited to these.

  The crosslinking agent may be added after being dissolved in water, alcohols, ketones or nonpolar organic solvents, or may be added as a solid in the coating solution. The amount added is preferably equivalent to the cross-linking group, but may be increased up to 10 times or reduced to 1/10 or less. If the amount is too small, the crosslinking reaction does not proceed. If the amount is too large, an unreacted crosslinking agent deteriorates the photographic properties, which is not preferable.

In order to improve the charging characteristics of the photothermographic material, it is preferable to add a fluorine compound as an antistatic agent. Examples of the fluorine compound that can be used in the present invention include the fluorine compounds described in JP-A No. 2002-82411, JP-A No. 2003-57780, JP-A No. 2003-149766, JP-A No. 2003-156819, and the like. Examples include compounds of general formulas (4) to (10) described in 2003-306274, NaO ₃ S (CF ₂ ) ₃ SO ₃ Na, C ₈ F ₁₇ SO ₃ Li, and the like.

  The photothermographic material may be in any form in which the photosensitive layer is only on one side of the support or on both sides. In the case where the photosensitive layer is only on one side of the support, a form having a BC layer (back side layer) provided on the opposite side of the photosensitive layer, and optionally a protective layer thereof is included. The adjacent layers of the photosensitive layer are, for example, an antihalation layer (AH layer) on the lower side of the photosensitive layer, a protective layer on the upper side, and the like.

  If necessary, the photothermographic material is provided with an AH layer for preventing halation of the photothermographic material and / or a BC layer for preventing halation. As the dye used for the AH layer and the BC layer, image exposure light is used. Any dye may be used as long as it absorbs, but preferably, a heat decolorable dye described in US Pat. No. 5,384,237 is used. If the dye is not heat decolorable, the amount used is limited to a range that does not cause image damage to the photothermographic material, but if it is a heat decolorable dye, a sufficient amount of dye should be added if necessary. Can do.

  The photothermographic material can be provided with a protective layer. The protective layer preferably contains a matting agent. The matting agent may be either organic or inorganic. Examples of the inorganic matting agent include silica described in Swiss Patent 330,158, polystyrene or polymethacrylate described in Swiss Patent 330,158, US Pat. A matting agent made of polyacrylonitrile described in US Pat. No. 079,257, polycarbonate described in US Pat. No. 3,022,169, or the like can be used.

  The shape of the matting agent may be either a regular shape or an irregular shape, but is preferably a regular shape, and a spherical shape is preferably used. The size of the matting agent is represented by a diameter when the volume of the matting agent is converted into a sphere. When the particle size of the matting agent is represented by a spherically converted diameter, the matting agent used in the present invention preferably has an average particle size of 0.5 to 10 μm, more preferably 1.0 to 8.0 μm. The coefficient of variation of the particle size distribution is preferably 50% or less, more preferably 40% or less, and particularly preferably 20% or less. The method of adding the matting agent may be a method in which the matting agent is dispersed in the coating solution in advance, or a method of spraying the matting agent after the coating solution is applied and before drying is completed.

  As the support for the photothermographic material, a support such as paper, synthetic paper, non-woven fabric, metal foil, plastic film or the like can be used, and a composite sheet combining these can be arbitrarily used.

  As the exposure method for the photothermographic material, known methods can be used. As an exposure method, for example, exposure can be performed with a laser according to methods described in JP-A-9-304869 and JP-A-2000-10230.

  A known apparatus can be used for developing the photothermographic material. For example, apparatuses described in JP-A Nos. 2001-242608, 2000-292902, 2000-292893, and Japanese Patent Application No. 2003-119579 can be used.

  Examples of the present invention will be described below, but the embodiments of the present invention are not limited thereto. Unless otherwise specified, “%” in the examples represents “mass%”.

Example 1
<Preparation of underdrawn support>
A corona discharge treatment of 12 W / m ² · min is applied to both surfaces of a 175 μm thick polyethylene terephthalate (PET) support, and the following undercoat coating solution a-1 is applied to one surface so that the dry film thickness is 0.6 μm. The undercoat layer A-1 is provided by coating and drying, and the following undercoat coating solution b-1 is applied to the opposite surface so as to have a dry film thickness of 0.6 μm and dried to form the undercoat layer. B-1 was provided.

(Undercoating liquid a-1)
A solution obtained by diluting a copolymer latex solution of butyl acrylate / t-butyl acrylate / styrene / 2-hydroxyethyl acrylate (30/20/25/25%) (solid content 30%) 15 times.

(Undercoating liquid b-1)
A solution obtained by diluting a butyl acrylate / styrene / glycidyl acrylate (40/20/40%) copolymer latex solution (solid content 30%) 15 times.

Subsequently, a corona discharge of 12 W / m ² · min is applied to the upper surfaces of the undercoat layer A-1 and the undercoat layer B-1, and the following undercoat upper layer coating solution a- 2 is applied and dried to provide an undercoat upper layer A-2, and the following undercoat upper layer coating solution b-2 is applied and dried on the undercoat layer B-1 to provide an antistatic function. B-2 was provided. Each numerical value of each material indicates a weight per 1 m ² .

(Undercoat upper layer coating solution a-2)
Styrene / butadiene (1/2 mass ratio) copolymer 0.4 g
Silica particles (average particle size 3μm) 0.05g
(Undercoat upper layer coating solution b-2)
Styrene / butadiene (1/2 mass ratio) copolymer 0.4 g
Tin oxide fine particles (average particle size 16nm) 0.023g
<Preparation of photosensitive layer coating solution>
<Preparation of silver halide grain emulsion A>
After dissolving 7.5 g of inert gelatin and 10 mg of potassium bromide in 900 ml of water and adjusting the temperature to 28 ° C. and pH to 3.0, bromide with a molar ratio of (98/2) to 370 ml of an aqueous solution containing 74 g of silver nitrate While maintaining pAg 7.7, 370 ml of an aqueous solution containing potassium and potassium iodide in equimolar amounts with respect to silver nitrate was added over 10 minutes by the controlled double jet method. In synchronization with the addition of silver nitrate, ^10-6 mol / silver 1 mol of sodium salt of hexachloroiridium (compound of general formula (9): Exemplified Compound 28) was added. Thereafter, 0.3 g of 4-hydroxy-6-methyl-1,3,3a, 7-tetrazaindene (stabilizer) was added, the pH was adjusted to 5 with sodium hydroxide, and the average particle size was 0.036 μm. Cubic silver iodobromide grains having a variation coefficient of projected diameter area of 8% and a [100] face ratio of 87% were obtained. This emulsion was coagulated and settled using a gelatin flocculant, and after desalting, water was added to finish it to 160 ml.

(Preparation of organic silver salt)
In 3980 ml of pure water, 111.4 g of behenic acid, 83.8 g of arachidic acid, and 54.9 g of stearic acid were dissolved at 80 ° C. Next, 540.2 ml of a 1.5 mol / L sodium hydroxide aqueous solution was added while stirring at high speed, 6.9 ml of concentrated nitric acid was added, and the mixture was cooled to 55 ° C. to obtain an organic acid sodium solution. While maintaining the temperature of this organic acid sodium solution at 55 ° C., the silver halide grain emulsion A (containing 0.038 mol of silver) and 420 ml of pure water were added and stirred for 5 minutes. Next, 760.6 ml of 1 mol / L silver nitrate solution was added over 2 minutes, stirred for another 20 minutes, and water-soluble salts were removed by filtration. Thereafter, the filtrate was repeatedly washed with deionized water and filtered until the conductivity of the filtrate reached 2 μS / cm, and finally, after spin-drying and drying, an organic silver salt SB-1 was obtained.

  On the other hand, organic silver salts were similarly prepared by changing the charging ratio while maintaining the same total number of moles of behenic acid, arachidic acid, and stearic acid. Thus, organic silver salts SB-2 to SB-5 were obtained.

<Coating on the photosensitive layer side>
The following layers were sequentially formed on the subbing upper layer A-2 of the support having the subbing layer to prepare a photothermographic material sample. In addition, each drying was performed for 1 minute at 45 degreeC. In addition, the amount of material in each coating composition is an amount per 1 m ² .

(AH layer coating composition)
Binder (described in Table 2) 0.5g
C1 (dye) 1.2 × 10 ^-5 mol (photosensitive layer coating composition)
In order to form a photosensitive layer, a coating solution of the following composition was prepared, and coated and dried so as to have the following weight (per 1 m ² ). An organic silver salt preparation solution in an amount of 1.20 g / m ² as a silver amount was mixed with a binder.

Binder (described in Table 2) 6.0g
Compounds represented by general formula (3), (4), (5): (described in Table 2) 3 × 10 ⁻⁵ mol Compound represented by general formula (17): 17-1 2.4 × 10 ^{− 5} mol Compound represented by the general formula (14): 14-65 2 × 10 ⁻⁴ mol A1 (spectral sensitizing dye) 1 × 10 ⁻⁶ mol A2 (spectral sensitizing dye) 1 × 10 ⁻⁶ mol B1 ( Antifoggant) 10mg
Isothiazolone (antifoggant) 1.2mg
Reducing agent (Exemplary compound 16-5) 4 mmol Compound represented by general formula (1) or comparative compound: (described in Table 2) 2 × 10 ⁻³ mol Compound represented by general formula (2): (Table 2) Description) 2 × 10 ⁻³ mol 2- (p-toluenesulfonyloxy) benzoic acid 0.3 g
p-Toluenethiosulfonate potassium 0.03g
2-mercapto-5-methylbenzimidazole 2mg
D1 2mg
Dibenzo-18-crown 6-ether 20mg
Development accelerator (described in Table 2) 1 × 10 ⁻⁴ mol Compound represented by the general formula (6): (described in Table 2) 3 × 10 ⁻⁵ mol (photosensitive layer protective layer coating composition)
A coating solution having the following composition was applied and dried on the photosensitive layer so as to have the following weight (per 1 m ² ) to form a photosensitive layer protective layer.

Binder (Table 2 listed) 2.5g
4-methylphthalic acid 0.7g
Tetrachlorophthalic acid 0.2g
Silica matting agent (average particle size 5μm) 0.5g
1,3-bis (vinylsulfonyl) -2-propanol- (H16, antifoggant)
50mg
Benzotriazole 30mg
Antistatic agent (LiO ₃ S (CF ₂ ) ₃ SO ₃ Li) 3 mg
Antistatic agent _{(C 9 F 17 O (CH} 2 CH 2 O) 22 C 9 F 17) 20mg
<Application on the BC layer side>
On the back surface side, the BC layer prepared to have the following weight (per 1 m ² ) and each coating solution for the protective layer are sequentially applied and dried on the subbing upper layer B-2 to protect the BC layer and the protective layer. A layer was formed.

(BC layer coating composition)
Binder (type added according to the following conditions) (amount added according to the following conditions)
C1 (dye) 1.2 × 10 ⁻⁵ mol (BC layer protective layer coating composition)
Binder (type added according to the following conditions) (amount added according to the following conditions)
Matting agent (polymethyl methacrylate: average particle size 5 μm) 0.12 g
Antistatic agent (LiO ₃ S (CF ₂ ) ₃ SO ₃ Li) 30 mg
Antistatic agent _{(C 9 F 17 O (CH} 2 CH 2 O) 22 C 9 F 17) 250mg
The binder is polyvinyl butyral, cellulose acetate butyrate, a copolymer of styrene and butadiene, and gelatin. In the case of polyvinyl butyral and cellulose acetate butyrate, methyl ethyl ketone (MEK) is used as the organic solvent. In the case of a styrene-butadiene copolymer and gelatin, water was used as a solvent, and the additive was applied as a solid dispersion or solution. Polyvinyl butyral was used after 98% saponification of polyvinyl acetate having a polymerization degree of 500 and 86% of the remaining hydroxyl groups were converted into butyral (referred to as "PVB-1"). As the styrene-butadiene copolymer, a styrene / butadiene (1/2 mass ratio) composition was emulsion-copolymerized by a conventional method (referred to as “STB-1”).

As a binder for the BC layer and the BC layer protective layer, when the binder of the photosensitive layer is polyvinyl butyral, 1.8 g / m ² of polyvinyl butyral is used as the BC layer, and 1.1 g / m ² of cellulose acetate butyrate is used as the BC layer protective layer. When m ^{2 was} used and the binder of the photosensitive layer was a styrene-butadiene copolymer or gelatin, the same amount of gelatin was used as the BC layer and the BC layer protective layer, respectively. When the binder of the photosensitive layer was a styrene-butadiene copolymer, the amount added to the photosensitive layer was 12.0 g / m ² .

When the binder was polyvinyl butyral or cellulose acetate butyrate, the crosslinking agent H2 was used. The crosslinking agent was added to the AH layer, the photosensitive layer, the protective layer, and the BC layer. The photosensitive layer is 2.8 × 10 ⁻⁴ mol / m ² , the protective layer is 0.8 × 10 ⁻⁴ mol / m ² , the AH layer is 0.9 × 10 ⁻⁴ mol / m ² , the BC layer Was added at 2.8 × 10 ⁻⁴ mol / m ² .

  Thus, photothermographic material samples 1 to 10 were prepared.

[Evaluation of photographic performance]
(Normal humidity storage, high humidity storage)
The above photothermographic material sample was divided into two and stored at 25 ° C., 50% RH (normal humidity), 25 ° C., and 80% RH (high humidity) for 5 days, and then exposure and development were performed at 25 ° C. and 50 ° C. This was performed after being placed in an atmosphere of% RH for 1 day.

  Each sample was exposed with a 810 nm semiconductor laser exposure sensitometer, and the sensitivity and fog of the sample obtained by heat and heat development at 127 ° C. for 12.5 seconds after exposure were measured with a densitometer. The sensitivity was evaluated by the reciprocal of the ratio of the exposure amount giving a density 0.3 higher than the fog density, and expressed as a relative value with the sensitivity of the photothermographic material sample 1 being stored at normal humidity as 100.

  The evaluation results are shown in Table 2.

  PVB-1 (polyvinyl butyral): 98% saponified polyvinyl acetate having a polymerization degree of 500 and butyralized 86% of the remaining hydroxyl groups.

  STB-1 (styrene-butadiene copolymer): an emulsion copolymer of styrene / butadiene (1/2 mass ratio) composition by a conventional method.

CAB: cellulose acetate butyrate (Eastman Chemical)
From Table 2, it can be seen that the present invention can provide a photothermographic material having high sensitivity, low fog and being hardly affected by humidity during storage.

Claims (10)

At least one surface of the support contains photosensitive silver halide, organic silver salt, reducing agent and binder, and further a compound represented by the following general formula (1) and hydrogen represented by the following general formula (2) A photothermographic material comprising a binding compound.

(In the formula, R ₁ represents a substituent, and m represents an integer of 0 to 6).

(Wherein R ₂ , R ₃ and R ₄ each represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, an oxy group or an amino group, and any one of R ₂ , R ₃ and R ₄ ) Two may be bonded to each other to form a ring.) 2. The photothermographic material according to claim 1, further comprising a development accelerator on the same side as the image forming layer of the photothermographic material. 3. The photothermographic material according to claim 2, wherein the development accelerator is at least one selected from a phenol derivative, a naphthol derivative, a hydrazine derivative, a cyclic imide derivative, and a phthalazinone derivative. The photothermographic material further comprises at least one compound represented by the following general formula (3), general formula (4) or general formula (5) on the same side as the image forming layer. The photothermographic material according to any one of claims 1 to 3.

(Wherein X represents an electron withdrawing group, W represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, a halogen atom, a cyano group, an acyl group, a thioacyl group, an oxalyl group, Oxyoxalyl group, -S-oxalyl group, oxamoyl group, oxycarbonyl group, -S-carbonyl group, carbamoyl group, thiocarbamoyl group, sulfonyl group, sulfinyl group, oxysulfonyl group, -S-sulfonyl group, sulfamoyl group, oxy Sulfinyl group, -S-sulfinyl group, sulfinamoyl group, phosphoryl group, nitro group, imino group, N-carbonylimino group, N-sulfonylimino group, ammonium group, sulfonium group, phosphonium group, pyrylium group, or immonium group represents, R ₆ is hydroxyl group or a hydroxyl Represents salts, R ₇ represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heterocyclic group. Here, each formyl group as X and W are excluded .X and W ring structure bonded with each other (X and R ₆ are shown in a cis form, but X and R ₆ include a trans form.)

(Wherein X ₃ represents a substituent, R ₈ represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group, and n represents an integer of 0 to 4)

(Wherein Q represents an atomic group necessary to form a nitrogen-containing heterocycle, J represents —SO ₂ —, —CO—, —COO— or —CON (R ₁₀ ) —, and R ₁₀ Represents a hydrogen atom or a substituent, and R ₉ represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group. The photothermographic material according to claim 1, further comprising a compound represented by the following general formula (6) on the same side as the image forming layer of the photothermographic material. Photosensitive material.

(In the formula, Y represents an electron withdrawing group, and Z ₁ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, a halogen atom, a cyano group, an acyl group, a thioacyl group, or an oxalyl group. Group, oxyoxalyl group, -S-oxalyl group, oxamoyl group, oxycarbonyl group, -S-carbonyl group, carbamoyl group, thiocarbamoyl group, sulfonyl group, sulfinyl group, oxysulfonyl group, -S-sulfonyl group, sulfamoyl group Oxysulfinyl group, -S-sulfinyl group, sulfinamoyl group, phosphoryl group, nitro group, imino group, N-carbonylimino group, N-sulfonylimino group, ammonium group, sulfonium group, phosphonium group, pyrylium group, or immonium .R ₁₁ represents a group of the halogen atom, oxy group, thio , Amino or .Y and Z ₁ represents a heterocycle group may be bonded together to form a ring structure together. Incidentally, Y and R ₁₁ although are displayed in the form of cis Y and R ₁₁ is (Including transformer shape) The photothermographic material according to claim 1, wherein the binder is a hydrophobic binder. 7. The photothermographic material according to claim 6, wherein the hydrophobic binder is at least one selected from polyvinyl acetal, a cellulose acetate derivative, and a styrene-butadiene copolymer. The photothermographic material according to claim 1, wherein the binder is a hydrophilic binder. 9. The photothermographic material according to claim 8, wherein the hydrophilic binder is at least one selected from gelatin, polyacrylic acid, polymethacrylic acid and polyvinyl alcohol. The photothermographic material according to claim 1, wherein 80% by mass or more of the organic silver salt is silver behenate.