JP2005247746A - Method for producing 1-indanones - Google Patents
Method for producing 1-indanones Download PDFInfo
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- JP2005247746A JP2005247746A JP2004060084A JP2004060084A JP2005247746A JP 2005247746 A JP2005247746 A JP 2005247746A JP 2004060084 A JP2004060084 A JP 2004060084A JP 2004060084 A JP2004060084 A JP 2004060084A JP 2005247746 A JP2005247746 A JP 2005247746A
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- QNXSIUBBGPHDDE-UHFFFAOYSA-N indan-1-one Chemical class C1=CC=C2C(=O)CCC2=C1 QNXSIUBBGPHDDE-UHFFFAOYSA-N 0.000 title claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 claims abstract description 10
- 239000002841 Lewis acid Substances 0.000 claims abstract description 9
- 150000007517 lewis acids Chemical class 0.000 claims abstract description 9
- 150000001450 anions Chemical group 0.000 claims abstract description 7
- 230000003197 catalytic effect Effects 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims abstract description 5
- 239000002184 metal Substances 0.000 claims abstract description 5
- 230000007935 neutral effect Effects 0.000 claims abstract description 5
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052797 bismuth Inorganic materials 0.000 claims abstract description 4
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 4
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 4
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052738 indium Inorganic materials 0.000 claims abstract description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 4
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 4
- 238000006243 chemical reaction Methods 0.000 claims description 17
- 239000007983 Tris buffer Substances 0.000 claims description 3
- LGRLWUINFJPLSH-UHFFFAOYSA-N methanide Chemical compound [CH3-] LGRLWUINFJPLSH-UHFFFAOYSA-N 0.000 claims description 3
- 150000001408 amides Chemical class 0.000 claims description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 abstract description 11
- 238000000034 method Methods 0.000 abstract description 9
- 238000009833 condensation Methods 0.000 abstract description 3
- 230000005494 condensation Effects 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 3
- 239000003905 agrochemical Substances 0.000 abstract description 2
- 238000007796 conventional method Methods 0.000 abstract description 2
- 238000011109 contamination Methods 0.000 abstract 1
- 229940079593 drug Drugs 0.000 abstract 1
- 239000003814 drug Substances 0.000 abstract 1
- 230000007613 environmental effect Effects 0.000 abstract 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 238000006482 condensation reaction Methods 0.000 description 4
- 230000018044 dehydration Effects 0.000 description 4
- 238000006297 dehydration reaction Methods 0.000 description 4
- 239000011968 lewis acid catalyst Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 3
- FSBIQEDMEKAAMA-UHFFFAOYSA-N 3,4,7-trimethyl-2,3-dihydroinden-1-one Chemical compound CC1=CC=C(C)C2=C1C(C)CC2=O FSBIQEDMEKAAMA-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000004705 ethylthio group Chemical group C(C)S* 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- GCZQTQUHBZZQAC-UHFFFAOYSA-N 4,7-dimethyl-2,3-dihydroinden-1-one Chemical compound CC1=CC=C(C)C2=C1CCC2=O GCZQTQUHBZZQAC-UHFFFAOYSA-N 0.000 description 1
- WTLRVKCXXBNJOI-UHFFFAOYSA-N 4,7-dimethyl-3-phenyl-2,3-dihydroinden-1-one Chemical compound C1=2C(C)=CC=C(C)C=2C(=O)CC1C1=CC=CC=C1 WTLRVKCXXBNJOI-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- UEXCJVNBTNXOEH-UHFFFAOYSA-N Ethynylbenzene Chemical class C#CC1=CC=CC=C1 UEXCJVNBTNXOEH-UHFFFAOYSA-N 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- -1 among others Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- HYGWNUKOUCZBND-UHFFFAOYSA-N azanide Chemical compound [NH2-] HYGWNUKOUCZBND-UHFFFAOYSA-N 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- DQYBDCGIPTYXML-UHFFFAOYSA-N ethoxyethane;hydrate Chemical compound O.CCOCC DQYBDCGIPTYXML-UHFFFAOYSA-N 0.000 description 1
- 125000000457 gamma-lactone group Chemical group 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000011964 heteropoly acid Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002468 indanes Chemical class 0.000 description 1
- 238000003402 intramolecular cyclocondensation reaction Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 150000002736 metal compounds Chemical group 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 239000000575 pesticide Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
本発明は、医農薬、金属触媒の配位子、液晶などの有機材料の合成中間体として有用な１−インダノン類の製造方法に関するものである。 The present invention relates to a method for producing 1-indanones useful as synthetic intermediates for organic materials such as medical pesticides, metal catalyst ligands, and liquid crystals.
従来、１−インダノン類を製造する方法としては、３−アリールプロピオン酸類の分子内環化反応（例えば、非特許文献１参照）、インダン類の酸化反応（例えば、特許文献１、２参照）、芳香族炭化水素とγーラクトンとの反応（例えば、非特許文献２参照）フェニルアセチレン類と一酸化炭素との反応（例えば、特許文献３参照）など種々の方法が知られている。
また、α，β−不飽和カルボン酸と芳香族炭化水素との反応により１−インダノン類を製造する方法としては、トリフルオロメタンスルホン酸を過剰量用いて反応させる方法（非特許文献３）が知られているが、多量の廃酸が発生するという難点がある。また、ヘテロポリ酸やゼオライトを触媒として用いる方法（非特許文献４）も報告されているが、利用できる基質が極めて限定されているという問題があり、これまでに触媒量のルイス酸を用いる方法は報告されていない。
Conventionally, methods for producing 1-indanones include intramolecular cyclization reaction of 3-arylpropionic acids (for example, refer to Non-patent Document 1), oxidation reaction of indanes (for example, refer to Patent Documents 1 and 2), Various methods are known such as a reaction between an aromatic hydrocarbon and γ-lactone (for example, see Non-patent Document 2), a reaction between phenylacetylenes and carbon monoxide (for example, see Patent Document 3).
Further, as a method for producing 1-indanones by reaction of an α, β-unsaturated carboxylic acid and an aromatic hydrocarbon, a method in which an excess amount of trifluoromethanesulfonic acid is used (Non-patent Document 3) is known. However, there is a problem that a large amount of waste acid is generated. In addition, a method using a heteropolyacid or zeolite as a catalyst has been reported (Non-patent Document 4), but there is a problem that the substrates that can be used are extremely limited. Not reported.
本発明の目的は、医農薬、金属触媒の配位子、液晶などの有機材料の合成中間体として有用な１−インダノン類を、芳香族炭化水素とα，β−不飽和カルボン酸類との脱水縮合により、安価にかつ容易に製造する方法を提供することにある。 The object of the present invention is to dehydrate 1-indanones useful as synthetic intermediates for organic materials such as medical and agricultural chemicals, metal catalyst ligands, and liquid crystals, and to dehydrate aromatic hydrocarbons with α, β-unsaturated carboxylic acids. An object of the present invention is to provide a method for producing easily and inexpensively by condensation.
本発明者らは、１−インダノンの合成法について鋭意研究を重ねた結果、ある種のルイス酸を触媒量添加することにより、芳香族炭化水素とα，β−不飽和カルボン酸との脱水縮合が速やかに進行して容易に１−インダノン類が得られることを見出し、これらの事実に基づいて本発明を完成させるに至った。 As a result of intensive studies on the synthesis method of 1-indanone, the present inventors have added a catalytic amount of a certain Lewis acid, thereby dehydrating condensation of an aromatic hydrocarbon and an α, β-unsaturated carboxylic acid. It has been found that 1-indanones can be easily obtained by proceeding quickly, and the present invention has been completed based on these facts.
すなわち、本発明は、
（式中、Ｒ５〜Ｒ7は、それぞれ反応に関与しない１価の基を示す。）で表されるα，β−不飽和カルボン酸とを、一般式（III）
ＭＸｍ・Ｌｎ （III）
（式中、Ｍは希土類元素、ビスマス、ガリウム、インジウム、ハフニウムから選ばれる金属イオンを示し、Ｘはアニオンを示し、Ｌは配位力のある中性分子を示す。ｍは金属Ｍの原子価数であり、ｎは０〜１０の整数である。）で表されるルイス酸の触媒量の存在下に反応させることによる一般式（IV）
または一般式（V)
（式中、Ｒ１〜Ｒ7は、それぞれ前記と同じ意味を持つ。）で表される１−インダノン類の製造方法である。
上記一般式（III）で表されるルイス酸としては、Ｘがパーフルオロアルキルスルホナート、ビス（パーフルオロアルキルスルホニル）アミド、トリス（パーフルオロアルキルスルホニル）メチドから選ばれるアニオンからなるものを用いることが好ましい。
That is, the present invention
(Wherein R 5 to R 7 each represent a monovalent group that does not participate in the reaction) and an α, β-unsaturated carboxylic acid represented by the general formula (III)
MXm · Ln (III)
(In the formula, M represents a metal ion selected from rare earth elements, bismuth, gallium, indium, and hafnium, X represents an anion, L represents a neutral molecule having a coordination power, and m represents a valence of the metal M. And n is an integer of 0 to 10.) by reacting in the presence of a catalytic amount of a Lewis acid represented by the general formula (IV)
Or general formula (V)
(Wherein R 1 to R 7 each have the same meaning as described above).
As the Lewis acid represented by the above general formula (III), one in which X is an anion selected from perfluoroalkylsulfonate, bis (perfluoroalkylsulfonyl) amide, and tris (perfluoroalkylsulfonyl) methide is used. Is preferred.
本発明によれば、特定のルイス酸を触媒量用いることにより、各種芳香族炭化水素とα，β−不飽和カルボン酸との反応は容易に進行し、簡易に各種１−インダノン類を得ることができる。 According to the present invention, by using a catalytic amount of a specific Lewis acid, the reaction between various aromatic hydrocarbons and α, β-unsaturated carboxylic acid proceeds easily, and various 1-indanones can be easily obtained. Can do.
本発明の製法において原料として用いられる前記一般式（Ｉ）で表される芳香族炭化水素は、隣接する２個の炭素原子上に置換可能な水素原子を有するものであり、その他の炭素原子に結合する置換基Ｒ１〜Ｒ４は、いずれも本発明の脱水縮合反応に悪影響を及ぼさないものであれば、特に制限されるものではない。
一般式（Ｉ）中のＲ１〜Ｒ４は、それぞれ脱水縮合反応に関与しない基であって、例えば、水素原子、ハロゲン原子、メチル、エチル、プロピル、ｔ−ブチルなどのアルキル基、メトキシ、エトキシなどのアルコキシ基、メチルチオ、エチルチオなどのアルキルチオ基などが挙げられる。
The aromatic hydrocarbon represented by the general formula (I) used as a raw material in the production method of the present invention has a hydrogen atom that can be substituted on two adjacent carbon atoms, and other carbon atoms There are no particular limitations on the bonding groups R 1 to R 4 as long as they do not adversely affect the dehydration condensation reaction of the present invention.
R 1 to R 4 in the general formula (I) are groups not participating in the dehydration condensation reaction, for example, a hydrogen atom, a halogen atom, an alkyl group such as methyl, ethyl, propyl, t-butyl, methoxy, Examples thereof include an alkoxy group such as ethoxy, and an alkylthio group such as methylthio and ethylthio.
次に、本発明におけるもう一方の原料は、前記一般式（II）で表されるα，β−不飽和カルボン酸であり、反応に悪影響を及ぼさない置換基を有していても良い。
一般式（II）中のＲ５〜Ｒ７は、ともに本発明の脱水縮合反応に関与しない基であって、例えば、水素原子、ハロゲン原子、メチル、エチル、プロピル、ｔ−ブチルなどのアルキル基、フェニル、１−ナフチルなどのアリール基、メトキシ、エトキシなどのアルコキシ基、メチルチオ、エチルチオなどのアルキルチオ基、シアノ基、トリフルオロメチルなどのパーフルオロアルキル基などが挙げられる。
Next, the other raw material in the present invention is an α, β-unsaturated carboxylic acid represented by the general formula (II) and may have a substituent that does not adversely influence the reaction.
R 5 to R 7 in the general formula (II) are groups that do not participate in the dehydration condensation reaction of the present invention, and examples thereof include a hydrogen atom, a halogen atom, an alkyl group such as methyl, ethyl, propyl, and t-butyl. Aryl groups such as phenyl and 1-naphthyl, alkoxy groups such as methoxy and ethoxy, alkylthio groups such as methylthio and ethylthio, perfluoroalkyl groups such as cyano group and trifluoromethyl.
次に、本発明に触媒として用いられるルイス酸は、一般式（III）
ＭＸｍ・Ｌｎ （III）
で表される金属化合物である。
一般式（III）において、Ｍは金属イオンであり、ルテチウム、イッテルビウム、スカンジウムなどの希土類元素、ガリウム、インジウム、ハフニウム、ジルコニウムおよびビスマスから選ばれる。また、アニオンＸとしては、その共役酸が高い酸性度を示すものがよく、例えばパーフルオロアルキルスルホナートアニオン、ビス（パーフルオロアルキルスルホニル）アミドアニオン、トリス（パーフルオロアルキルスルホニル）メチドアニオンなどが挙げられる。
Next, the Lewis acid used as a catalyst in the present invention has the general formula (III)
MXm · Ln (III)
It is a metal compound represented by these.
In the general formula (III), M is a metal ion and is selected from rare earth elements such as lutetium, ytterbium and scandium, gallium, indium, hafnium, zirconium and bismuth. Further, as the anion X, those whose conjugate acid shows high acidity are good, and examples thereof include a perfluoroalkylsulfonate anion, a bis (perfluoroalkylsulfonyl) amide anion, and a tris (perfluoroalkylsulfonyl) methide anion. .
本発明に用いられるルイス酸触媒の好ましい例としては、Ｌｕ（ＯＳＯ２ＣＦ３）３、Ｙｂ（ＯＳＯ２ＣＦ３）３、Ｓｃ（ＯＳＯ２ＣＦ３）３、Ｌｕ［Ｎ（ＳＯ２ＣＦ３）２］３ 、Ｙｂ［Ｎ（ＳＯ２ＣＦ３）２］３ 、Ｓｃ［Ｎ（ＳＯ２ＣＦ３）２］３ 、Ｌｕ［Ｃ（ＳＯ２ＣＦ３）３］３ 、Ｙｂ［Ｃ（ＳＯ２ＣＦ３）３］３、Ｓｃ［Ｃ（ＳＯ２ＣＦ３）３］３などが挙げられる。
これらのルイス酸触媒には、さらに反応に悪影響を及ぼさない中性分子が配位していても差し支えない。この中性分子は一般式（III）におけるＬであり、例えば水やジエチルエーテルなどのエーテル類が挙げられ、その数ｎは０〜１０である。このルイス酸触媒の使用量は、いわゆる触媒量の少量でよく、化合物（Ｉ）に対し０．０００１〜５０モル％の範囲で実施できるが、あまりに少ないと反応が有利な速度で進行せず、また、あまりに多いと反応の経済性が悪くなるので、好ましくは０．０１〜３０モル％、さらに好ましくは０．１〜２０モル％の範囲である。
Preferred examples of the Lewis acid catalyst used in the present invention include Lu (OSO 2 CF 3 ) 3 , Yb (OSO 2 CF 3 ) 3 , Sc (OSO 2 CF 3 ) 3 , and Lu [N (SO 2 CF 3 ). 2 ] 3 , Yb [N (SO 2 CF 3 ) 2 ] 3 , Sc [N (SO 2 CF 3 ) 2 ] 3 , Lu [C (SO 2 CF 3 ) 3 ] 3 , Yb [C (SO 2 CF 3 ) 3 ] 3 , Sc [C (SO 2 CF 3 ) 3 ] 3 and the like.
These Lewis acid catalysts may be coordinated with neutral molecules that do not adversely influence the reaction. This neutral molecule is L in the general formula (III), and examples thereof include ethers such as water and diethyl ether, and the number n is 0 to 10. The amount of the Lewis acid catalyst used may be a small amount of the so-called catalyst amount and can be carried out in the range of 0.0001 to 50 mol% with respect to the compound (I), but if it is too small, the reaction does not proceed at an advantageous rate. Moreover, since the economical efficiency of reaction will worsen when it is too much, Preferably it is 0.01-30 mol%, More preferably, it is the range of 0.1-20 mol%.
本発明の脱水縮合反応には、必ずしも溶媒を要しないが、溶媒を使用しても良い。使用し得る溶媒としては、塩素化炭化水素系、芳香族炭化水素系、ニトロ化炭化水素系、脂肪族炭化水素系などが挙げられるが、なかでも塩素化炭化水素系溶媒、芳香族炭化水素系が好ましく、具体的には、クロロベンゼン、１，２−ジクロロベンゼン、１，２−ジクロロエタン等が例示される。
反応温度としては、あまりに低温では反応が有利な速度では進行せず、一方、あまりに高温では副反応が起こるという問題があり、また経済性に劣ることから、一般的には０〜３００℃の範囲から選ばれるが、好ましくは８０〜２６０℃の範囲である。
反応生成混合物から所望の目的生成物を分離するには、溶媒抽出、再結晶、蒸留、クロマトグラフィーおよび昇華などの通常の分離精製方法を適用することにより容易に達成される。
The dehydration condensation reaction of the present invention does not necessarily require a solvent, but a solvent may be used. Solvents that can be used include chlorinated hydrocarbons, aromatic hydrocarbons, nitrated hydrocarbons, aliphatic hydrocarbons, among others, chlorinated hydrocarbons, aromatic hydrocarbons Specifically, chlorobenzene, 1,2-dichlorobenzene, 1,2-dichloroethane and the like are exemplified.
As the reaction temperature, the reaction does not proceed at an advantageous rate at a very low temperature, while there is a problem that a side reaction occurs at a too high temperature, and since it is not economical, it is generally in the range of 0 to 300 ° C. However, it is preferably in the range of 80 to 260 ° C.
Separation of a desired target product from the reaction product mixture is easily achieved by applying usual separation and purification methods such as solvent extraction, recrystallization, distillation, chromatography, and sublimation.
以下、本発明を実施例によりさらに具体的に説明するが、本発明はこれらの実施例によって何ら限定されるものではない。
実施例１
３，４，７−トリメチル−１−インダノンの合成
p−キシレン２ｍＬ、クロトン酸２２ｍｇ（０．２５ｍｍｏｌ）、Ｌｕ（ＯＳＯ２ＣＦ３）３２４ｍｇ（０．０３７５ｍｍｏｌ）及びクロロベンゼン５ｍＬの混合物を、密閉容器中２５０℃で３時間加熱撹拌した。反応混合物を放冷し、飽和炭酸水素ナトリウム水溶液５ｍＬを加え、生成した有機層を分離した後、水層を酢酸エチル５ｍＬで２回抽出した。その後、有機層を合わせて硫酸マグネシウムで乾燥後溶媒を減圧留去した。これをシリカゲルクロマトグラフィーで精製（展開溶媒：ヘキサン／酢酸エチル＝９／１）することにより３，４，７−トリメチル−１−インダノン３４ｍｇ（収率７９％）を得た。このようにして得られた生成物の化学構造は１Ｈ−ＮＭＲにより確認した。
EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to these examples.
Example 1
Synthesis of 3,4,7-trimethyl-1-indanone
A mixture of 2 mL of p-xylene, 22 mg (0.25 mmol) of crotonic acid, 24 mg (0.0375 mmol) of Lu (OSO 2 CF 3 ) 3 and 5 mL of chlorobenzene was heated and stirred at 250 ° C. for 3 hours in a sealed container. The reaction mixture was allowed to cool, 5 mL of a saturated aqueous sodium hydrogen carbonate solution was added, the generated organic layer was separated, and the aqueous layer was extracted twice with 5 mL of ethyl acetate. Thereafter, the organic layers were combined and dried over magnesium sulfate, and the solvent was distilled off under reduced pressure. This was purified by silica gel chromatography (developing solvent: hexane / ethyl acetate = 9/1) to obtain 34 mg (yield 79%) of 3,4,7-trimethyl-1-indanone. The chemical structure of the product thus obtained was confirmed by 1 H-NMR.
実施例２〜１３
実施例１におけるp−キシレンとクロトン酸との反応による３，４，７−トリメチル−１−インダノンの合成において使用するルイス酸触媒の種類、触媒量、溶媒の使用の有無、反応温度及び反応時間をそれぞれ表１に示すものに代えたこと以外は、実施例１と同様にして反応及び生成物の確認を行った。実施例１〜１３で得られた結果を表１に示す。なお、実施例２〜１３に関しては表中の収率はガスクロマトグラフィーで分析し決定した値である。
Examples 2-13
The kind of Lewis acid catalyst used in the synthesis of 3,4,7-trimethyl-1-indanone by the reaction of p-xylene and crotonic acid in Example 1, the amount of catalyst, the presence or absence of solvent, the reaction temperature and the reaction time The reaction and the product were confirmed in the same manner as in Example 1 except that each was replaced with those shown in Table 1. The results obtained in Examples 1 to 13 are shown in Table 1. In addition, regarding Examples 2-13, the yield in a table | surface is the value determined by analyzing by gas chromatography.
実施例１４
３−フェニル−４，７−ジメチル−１−インダノンの合成
クロトン酸の代わりに桂皮酸３８ｍｇ（０．２５ｍｍｏｌ）を用いたこと以外は実施例１と同様に反応を行うことにより、３−フェニル−４，７−ジメチル−１−インダノン３６ｍｇ（収率６０％）を得た。このようにして得られた生成物の化学構造は１Ｈ−ＮＭＲにより確認した。
Example 14
Synthesis of 3-phenyl-4,7-dimethyl-1-indanone By reacting in the same manner as in Example 1 except that 38 mg (0.25 mmol) of cinnamic acid was used instead of crotonic acid, 3-phenyl- 36 mg (yield 60%) of 4,7-dimethyl-1-indanone was obtained. The chemical structure of the product thus obtained was confirmed by 1 H-NMR.
本発明は、入手容易な芳香族炭化水素とα，β−不飽和カルボン酸から一段階で１−インダノン類を容易に製造できる方法であり、原料の製造に数段階を要する従来法に比して簡易に１−インダノンの製造が可能であり、工業的実施に有用な方法である。 The present invention is a method capable of easily producing 1-indanones from readily available aromatic hydrocarbons and α, β-unsaturated carboxylic acids in one step, as compared with the conventional method which requires several steps for the production of raw materials. Thus, 1-indanone can be easily produced, which is a useful method for industrial implementation.
Claims (2)
ＭＸｍ・Ｌｎ （III）
（式中、Ｍは希土類元素、ビスマス、ガリウム、インジウム、ハフニウムから選ばれる金属イオンを示し、Ｘはアニオンを示し、Ｌは配位力のある中性分子を示す。ｍは金属Ｍの原子価数であり、ｎは０〜１０の整数である。）で表されるルイス酸の触媒量の存在下に反応させることによる一般式（IV）
（式中、Ｒ１〜Ｒ7は、それぞれ前記と同じ意味を持つ。）
または一般式（V)
MXm · Ln (III)
(In the formula, M represents a metal ion selected from rare earth elements, bismuth, gallium, indium, and hafnium, X represents an anion, L represents a neutral molecule having a coordination power, and m represents a valence of the metal M. And n is an integer of 0 to 10.) by reacting in the presence of a catalytic amount of a Lewis acid represented by the general formula (IV)
(Wherein R 1 to R 7 each have the same meaning as described above.)
Or general formula (V)
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