JP2005238219A - Plasma treatment apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To prevent the narrowing of a space between the intermediate parts in the longitudinal direction of a pair of long electrodes of a plasma treatment apparatus due to Coulomb force or the like. <P>SOLUTION: The plasma treatment apparatus has a pair of parallel long sections 21 comprising the long electrodes 30. The space between one end and one end in the longitudinal direction of the long sections and the space between the other end and the other end are sealed with gas passageway side demarcation members 26 respectively. A small stick-shaped spacer 70 is installed in the gas passageway 21a between the long sections located between the two long sections 21 and 21 and in the middle of the gas passageway side demarcation members 26 and 26 at both ends. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to an apparatus for performing plasma surface treatment such as cleaning, film formation, etching, and surface modification, and more particularly to a so-called remote type plasma processing apparatus in which an object to be processed is disposed between electrodes.

Plasma processing apparatuses are roughly classified into a so-called direct type in which an object to be processed is disposed between a pair of electrodes (see Patent Document 3 and the like) and a so-called remote type in which the workpiece is disposed outside the electrodes.
As a remote-type plasma processing apparatus, for example, the one described in Patent Document 1, a pair of flat electrodes are arranged in parallel. A processing gas is introduced into the plasma space between these parallel plate electrodes to form plasma, and blown out toward the object to be processed. In the device described in Patent Document 2, a plasma-forming space is formed between the lower portions of the long plate-like high-voltage electrode and the ground electrode, while the insulating plate is extended over the entire length between the upper portions of these electrodes. Is embedded. The processing gas is introduced into the plasmaization space between the electrodes through a passage formed inside the ground electrode.

JP-A-9-92493 Japanese Patent Laid-Open No. 2002-18276 JP 2002-353000 A

In a plasma processing apparatus using a long electrode, surface treatment for the length of the electrode can be performed at a time, and the processing speed can be improved. However, due to the Coulomb force due to the applied electric field, the difference in thermal expansion coefficient between the metal body of the electrode and the solid dielectric coated on the surface, and the thermal stress due to the temperature difference inside the electrode, the electrodes are, for example, intermediate in the longitudinal direction. May be deformed so as to approach each other (see a virtual line in FIG. 6). This phenomenon is clearly seen when the length of the electrode is, for example, 50 cm or more, and becomes more prominent as the length becomes longer. If there is such a deformation, the blowing of the processing gas increases at both ends in the longitudinal direction of the electrode and decreases at the intermediate portion, thereby impairing the processing uniformity.
In the one described in Patent Document 2, the upper portion of the pair of long electrodes can be prevented from approaching deformation by the insulating plate, but the lower portion in which the essential plasmaization space is formed may be deformed.
In the thing of patent document 3, although the both ends of a pair of elongate electrode are each supported by the support frame, it cannot be said that it is very effective with respect to the approaching deformation of an intermediate part.

In order to solve the above problems, the present invention is directed to a plasma processing apparatus in which a processing gas is blown through a plasma forming space and applied to an object to be processed disposed outside the plasma forming space. A pair of long portions, and the long portions are arranged side by side so that the flow direction is directed between the long portions and in the direction intersecting the longitudinal direction and the parallel direction (opposite direction). A gas passage between the long portions is formed, and at least a part of the gas passage between the long portions is defined by the electrodes of the pair of long portions, thereby forming the plasmaization space, A gap between one end portion and the other end portion in the longitudinal direction of the pair of long portions are respectively closed by gas path side end defining members, and the gas between the long portions is formed by the gas path side end defining members at both ends. Side end faces at both ends in the longitudinal direction of the road In the gas path between the pair of long parts and between the long gas parts at the middle of the gas path side end defining members at both ends, a spacer for maintaining the distance between the long parts is provided. It is provided so as to allow the flow of the processing gas.
According to the above characteristic configuration, the thickness of the gas path between the long portions can be reliably maintained constant by the spacer, and can be reliably prevented from becoming narrow at the intermediate portion in the longitudinal direction. Therefore, the processing gas can be blown uniformly along the longitudinal direction, and as a result, a uniform plasma surface treatment can be performed. The spacer can be applied to a remote plasma processing apparatus, and the direct type is unsuitable because it interferes with an object to be processed.

Here, “intermediate between the gas path side end defining members at both ends” means an arbitrary position between one gas path side end defining member and the other gas path side end defining member. The position is not limited to the exact center between the end defining members, and may be a position shifted toward one of the ends.
When the length of the long part is larger than the width of the object to be processed, and the gas path side end defining member is disposed outside the position corresponding to the edge of the object to be processed in the long part. In this case, it is desirable that the spacer is disposed inside a position corresponding to the edge of the workpiece. Accordingly, the distance between the long portions can be kept constant at least in a range corresponding to the object to be processed, and uniform processing can be ensured.

  In the first preferred embodiment of the present invention, the spacer is sandwiched between the electrodes of the pair of long portions and disposed in the plasmaization space. Thereby, it is possible to reliably prevent the electrode from being distorted in the approaching direction, and to ensure the uniformity of processing.

  In the first preferred embodiment, it is desirable that the spacer is disposed to be biased toward an upstream side portion in the plasmatization space. As a result, the processing gas can be introduced into the plasmaization space downstream from the spacer (blowing side), and the plasma blowing flow similar to that at other positions can be reliably obtained even at the spacer arrangement position. Uniformity of processing can be ensured reliably.

  In the first preferred embodiment, one long part has the electrode and a support part that supports the electrode so as to be integrated in the juxtaposed direction, and the support part is a gas between the long parts. A covering portion covering the side surface of the electrode facing the upstream side of the passage, and the covering portion and the other long portion define a passage portion upstream of the plasmaization space in the gas passage between the long portions. It is desirable that the spacer protrudes upstream from the plasmaization space between the electrodes and is inserted into the path portion. As a result, the interval between the long portions can be more reliably maintained constant. Here, “integrated in the juxtaposed direction” means that the electrode and the support portion are displaced integrally without being relatively displaced in the juxtaposed direction of the long portions.

  In the second preferred embodiment of the present invention, one long portion has the electrode and a support portion that supports the electrode so as to be integrated in the juxtaposed direction, and the support portion is the long portion. A cover portion covering the side surface of the electrode facing the upstream side of the inter-gas path, and by this cover portion and the other long portion, a path portion upstream from the plasmaization space in the gas path between the long portions The spacer is sandwiched between the covering portion and the other long portion, and is disposed in the road portion. As a result, no spacers can be provided in the plasma space between the electrodes, and the uniformity of processing can be ensured more reliably.

  In the first and second preferred embodiments, it is desirable that the spacer is engaged with the covering portion. Accordingly, for example, the pair of long portions can be assembled to face each other in a state where the spacer is fixed to one long portion. Further, the spacer can be stably held in the gas path between the long portions.

The spacer may be detachably fastened to the covering portion with a pin.
An engagement recess may be formed in the covering portion, and the spacer may be engaged in the engagement recess.
A step may be formed in the covering portion, and the spacer may be attached to the step.
The other long part (including the spacer connection structure) may also be configured in the same manner as the one long part.

  The covering part has a main body part and a corner constituent part provided at a corner of the main body part on the road part side and the electrode side, and the corner constituent part is made of a material having higher plasma resistance than the main body part. It is desirable that As a result, the cover portion can be prevented from being damaged by the plasma in the plasma space, and the main body portion that is less likely to be exposed to the plasma can be made of a relatively inexpensive material, and as a result, the entire cover portion has high plasma resistance. The material cost can be reduced as compared with the material.

The body part of the covering part has a part covering the side opposite to the electrode side of the corner constituent part, and the spacer straddles the covering part to the corner constituent part of the body part and the corner constituent part. The covering portion and the corner configuration portion may be detachably fastened by pins. Thereby, a main-body part and a corner | angular structure part can be connected via a spacer.
A stepped portion may be formed by retreating a portion of the main body portion that covers the corner constituent portion from the corner constituent portion to the opposite side of the other elongated portion, and the spacer may be hung on the stepped portion.

  1, a rigid member disposed on the back portion of the corresponding electrode opposite to the other long portion, and a pull screw member that is passed through the rigid member and screwed into the electrode (Pull bolt). Accordingly, the support portion and the electrode can be reliably integrated in the juxtaposed direction. In addition, it is possible to reliably prevent the electrode from being strained and deformed toward the other electrode.

  It is desirable that the support portion further includes a push screw member (push bolt) that is screwed into the rigid member and abutted against the back surface of the electrode. As a result, the support portion and the electrode can be more reliably integrated in the juxtaposed direction. Further, it is possible to reliably prevent the electrode from being deformed in a direction away from the other electrode. Furthermore, the distance between the electrodes can be adjusted by moving the electrode closer to or away from the other long portion by the pull screw member and the push screw member. A plurality of approaching means (for example, the push screw member) for moving the electrode of one long part toward the other long part side and a separating means (for example, the pulling screw member) for moving away from each other are provided apart from each other in the longitudinal direction. It is desirable that Accordingly, the electrodes can be adjusted to be straight, and the distance between the electrodes can be adjusted to be uniform along the longitudinal direction, so that the plasma surface treatment can be performed more uniformly.

  It is preferable that the support portion further includes an insulating sandwiched member sandwiched between the rigid member and the electrode, and the sandwiched member is integrated with the covering portion. Thereby, the approach blocking force between the covering portion of the one long portion and the other long portion by the spacer can be reliably transmitted to the electrode of the one long portion. Further, the electrode can be insulated by an insulating sandwiched member.

It is desirable that the spacer has a flat plate shape. Thus, the long portion can be hit with a surface.
The spacer may have a cylindrical shape whose axis is directed in the flow direction of the gas path between the long portions.

  Even if the spacer integrally includes a straddling portion that spans between the upstream side surfaces of the electrodes of the pair of long portions, and an interelectrode portion that is connected to the straddling portion and is disposed in the plasmaization space between the electrodes. Good. Thus, the spacer can be stably sandwiched between the electrodes.

It is desirable that a blow-out side gas guide portion for guiding the processing gas so as to go around to the downstream side (blow-out side) of the spacer is formed in the spacer. For example, as the blow-out side gas guide portion, it is desirable that an end portion of the spacer facing the downstream side of the gas path between the long portions is tapered. As a result, the processing gas can be smoothly introduced to the downstream side of the spacer, and the plasma surface treatment can be performed more reliably and uniformly.
An end portion of the spacer facing the upstream side (gas introduction side) of the gas path between the long portions may be tapered, thereby constituting an introduction side gas guide portion. As a result, the processing gas can smoothly flow on both sides of the spacer.

It is desirable that the spacer has a small piece shape so that the influence on the flow of the processing gas can be ignored. Thereby, the distribution of the processing gas can be allowed with certainty.
A through hole provided as the gas path between the long portions may be formed in the spacer. As a result, the processing gas can flow downstream through the through-holes even at the position where the spacer is arranged, and the plasma surface treatment can be performed more reliably and uniformly. In this case, the spacer does not need to be a small piece, and may have a long shape extending along the long portion.
A long frame in which the spacer extends along the long portion and an internal space is opened in both directions orthogonal to the longitudinal direction, and a partition that divides the internal space of the frame along the longitudinal direction. And the divided internal space may be provided as the gas path between the long portions. Further, the frame may have a length that extends over substantially the entire length of the long portion, and end plates at both ends in the longitudinal direction may be provided as the gas path side end defining member.

  A gas introduction part (gas homogenization part) that guides a processing gas from a processing gas source to the gas path between the long parts is provided, and this gas introduction part substantially halves the processing gas flow along the longitudinal direction. A pair of equalizing passages that gradually leak from the substantially full length region of the peripheral side portion to the outside of the road while flowing so as to face each other, and each of which has an elongated shape along the longitudinal direction and is communicated by one or a plurality of communication passages for each step. A plurality of stages of homogenization chambers, wherein the first stage of homogenization chambers constitutes the extra space of the pair of homogenization paths, and each communication path is a stage of equalization chambers before and after the stages to communicate with. A slit shape or a plurality of spot shapes (small hole shapes) extending in substantially the entire length region of the gas chamber, and the final stage equalization chamber is connected over the entire length of the upstream end of the gas path between the long portions. Is desirable. As a result, the processing gas can be made uniform in the longitudinal direction of the long portion and then introduced into the gas passage between the long portions, and as a result, the plasma surface treatment can be performed more reliably and uniformly.

  According to the present invention, it is possible to reliably prevent the gap between the pair of long portions, that is, the gas passage between the long portions, from being narrowed at the middle portion in the longitudinal direction, and the process gas along the longitudinal direction. It can be made to blow out uniformly and by extension, uniform plasma surface treatment can be performed.

Embodiments of the present invention will be described below with reference to the drawings.
1 to 6 show a first embodiment of the present invention. As shown in FIGS. 1 and 2, the atmospheric pressure plasma processing apparatus M1 according to the first embodiment includes, for example, a workpiece feeding mechanism including a roller conveyor 4, a long nozzle head 1 positioned above the workpiece feeding mechanism, and the nozzle A processing gas source 2 connected to the head 1 and an electric field applying means 3 (FIG. 4) are provided. A workpiece W having a large area as a workpiece is placed on the roller conveyor 4 and fed in the front-rear direction (a direction orthogonal to the paper surface in FIG. 1). Of course, the nozzle head 1 may be moved while the workpiece W is fixed. Then, the processing gas from the processing gas source 2 is introduced into the plasmification space 30 a of the nozzle head 1 and is converted into plasma by applying an electric field by the electric field applying means 3, and then sprayed onto the workpiece W. Thereby, plasma surface treatment such as cleaning of the workpiece W is performed under normal pressure.
In addition, the substantially normal pressure (pressure in the vicinity of atmospheric pressure) in the present invention means a range of 1.013 × 10 ^{4 to} 50.663 × 10 ⁴ Pa, and considers ease of pressure adjustment and simplification of the apparatus configuration. Then, 1.333 × 10 ^{4 to} 10.664 × 10 ⁴ Pa are preferable, and 9.331 × 10 ^{4 to} 10.9797 × 10 ⁴ Pa are more preferable.

The nozzle head 1 of the atmospheric pressure plasma processing apparatus M1 will be described in detail.
As shown in FIGS. 1 and 2, the nozzle head 1 includes an upper gas introduction unit 10 and a lower processing unit 20 and extends long in the left-right direction.

  The gas introduction part 10 at the top of the nozzle head 1 has a housing 11 and a pipe unit 12 accommodated in the housing 11 and extends to the left and right. The pipe unit 12 includes a pair of pipes 13A and 13B that extend in the left and right directions and are arranged in the front and rear directions, and a pair of upper and lower pipe holders 14 and 15 that sandwich them. Spot-like small holes 12a penetrating from the inner peripheral surfaces of the pipes 13A and 13B to the upper surface of the holder 14 are arranged at short intervals along the left-right longitudinal direction in the upper portions of the pipes 13A and 13B and the upper pipe holder 14. Is formed. In place of the spot-like small holes 12a, slit-like holes extending in the left-right longitudinal direction may be formed. The inside of the pair of pipes 13A and 13B of the pipe unit 12 and the small holes 12a constitute “a pair of uniform passages for gradually leaking outside the road while flowing approximately half of the processing gas so as to face each other”.

  The inside of the housing 11 is partitioned into two upper and lower equalizing chambers 11a and 11b by the pipe unit 12. As shown in FIG. 4, the upper and lower chambers 11 a and 11 b are connected via a narrow gap 11 c formed between the front and rear walls of the housing 11 and both front and rear sides of the pipe unit 12. The communication path formed by the gap 11c has a slit shape extending in the left-right direction, but may be configured by a plurality of spot-shaped small holes arranged in a distributed manner in the left-right direction.

  As shown in FIG. 2, the inlet port 13c of one pipe 13A is provided at one end portion in the longitudinal direction of the gas introducing portion 10, and the inlet port 13e of the other pipe 13B is provided at the other end portion. As shown in FIG. 1, the ends of the pipes 13 </ b> A and 13 </ b> B opposite to the ports 13 c and 13 e are closed by plugs 16.

As shown in FIG. 2, a gas supply pipe 2a extends from the processing gas source 2, and the gas supply pipe 2a is branched and connected to the inlet ports 13c and 13e of the pipes 13A and 13B, respectively.
Note that the processing gas source 2, for example, as the processing gas for plasma cleaning, mixed gas of O ₂ in the pure gas or N ₂ and trace amounts of N ₂ are stored.

  This processing gas is introduced into the pipes 13A and 13B from the inlet ports 13c and 13e, and flows through the pipes 13A and 13B (homogenization paths) in opposite directions. Then, after leaking into the upper (first stage) chamber 11a through the hole 12a, it flows into the lower (second stage, final stage) chamber 11b through the gap 11c on both sides. As a result, the processing gas can be made uniform in the left-right longitudinal direction.

Next, the processing unit 20 below the nozzle head 1 will be described.
As schematically shown by a solid line in FIG. 6, the processing unit 20 includes a pair of long portions 21 and 21 that are arranged side by side so as to extend left and right and face each other in the front-rear direction, and the long portions 21 and 21. And end plates 25 provided at both ends in the left-right longitudinal direction. Between the long portions 21 and 21, a processing gas passage 21a connected to the lower chamber 11b is formed (see FIG. 4). The flow direction of the gas path 21a between the long portions is directed in a vertically downward direction (the depth direction in the drawing in FIG. 6) intersecting the longitudinal direction and the parallel direction of the long portions 21 and 21. Each long portion 21 includes an electrode 30 and a support portion 22 that supports the electrode 30. In FIG. 6, the thickness of the electrode 30, the distance between the electrodes, the thickness of the spacers 26 and 70, and the like are exaggerated.

The processing unit 20 will be further described in detail. As shown in FIG.1 and FIG.3, the electrode 30 of each elongate part 21 is formed in prismatic shape, for example with electrically conductive materials, such as stainless steel, and is extended elongate linearly to the left-right direction. The left and right length of the electrode 30 is, for example, about 1.5 m, and the width in the vertical direction is, for example, about 35 mm. As shown in FIG. 4, the electrode 30 of one elongate part 21 is connected to the electric field application means 3 via the feeder 3a, thereby forming a hot electrode (electric field application electrode). The electrode 30 of the other long portion 21 is grounded via the ground wire 3b, thereby forming an earth electrode (ground electrode).
The electric field applying unit 3 outputs a pulse voltage, for example. It is desirable that the rise time and / or fall time of this pulse is 10 μs or less, the electric field strength in the interelectrode space 30a described later is 10 to 1000 kV / cm, and the frequency is 0.5 kHz or more.

  As shown by the solid lines in FIG. 3 and FIG. 6, the electrodes 30 and 30 of the pair of long portions 21 and 21 are arranged in parallel with each other with a narrow interval (for example, 2 mm). A space between the opposing surfaces of these electrodes 30 is a plasmaization space 30a. The plasmification space 30a constitutes a part of the gas path 21a between the long portions.

  As shown in FIGS. 1 and 6, end spacers 26 are attached to the inner surfaces of the end plates 25 provided at the left and right ends of the electrodes 30 and 30. The end spacer 26 is inserted between the end portions of the pair of electrodes 30 and 30 and closes the end spacer 26. The end spacers 26 define side end surfaces at both ends in the left-right longitudinal direction of the plasmified space 30a and are provided as “gas path side end defining members”.

  As shown in FIG. 4, the inner surface of each electrode 30 (the surface facing the other electrode 30), the upper surface and the lower surface are subjected to sandblasting and thermally sprayed with a dielectric material such as ceramic, so that a solid A dielectric layer 33 is coated. The outer surface (the back surface opposite to the facing surface) and the upper surface of the electrode 30 are polished so as to be flat and at right angles to each other. The angle formed between the surfaces of the electrode 30 is subjected to R machining for preventing arcs. Inside the electrode 30, a temperature adjusting refrigerant path 30c is formed.

The electrode support part 22 of each elongate part 21 is demonstrated.
As shown in FIGS. 1, 3, 4, and 6, the support portion 22 includes an electrode holder 40 as a sandwiched member, an upper plate 23, a side plate 24 as a rigid member, and a lower portion 60. have.
As shown in FIGS. 3 and 4, the electrode holder 40 has a sandwiched portion 41 addressed to the back surface of the electrode 30 and a covered portion 42 placed on the upper side of the electrode 30, and has an L-shaped cross section. It extends from side to side. The covering portion 42 includes a main body portion 43 that is integrally connected to the upper end of the sandwiched portion 41 and a corner configuration portion 44 that is a separate body. The electrode holder main body is constituted by the sandwiched portion 41 and the main body portion 43 of the covering portion 42 which are integrated. The electrode holder main bodies 41 and 43 are made of an insulating resin such as polytetrafluoroethylene.

As shown in FIG. 4, a notch 43 a is formed at the lower corner of the inner end (the other long portion 21 side) of the body portion 43 of the covering portion 42. The notch 43 a extends over substantially the entire length of the main body 43 in the left-right longitudinal direction.
The corner | angular structure part 44 has comprised the rectangular column shape elongated on either side, and is engage | inserted by the said notch 43a. The corner component 44 is made of an insulating material having a higher plasma resistance than the holder bodies 41 and 43, for example, ceramic. In general, a material having high plasma resistance such as ceramic is more expensive than other resin such as polytetrafluoroethylene. As a result, the holder 40 can be prevented from being damaged by the plasma in the plasmatized space 30a, and the holder main bodies 41 and 43 that are less likely to be exposed to the plasma can be made of an inexpensive material. The material cost can be reduced as compared with the case of using a high material.

  As shown in FIGS. 3 and 4, the lower surface of the corner component 44 is in contact with the inner portion of the upper surface of the electrode 30. The main body 43 is covered on the upper side of the corner constituting portion 44. The vertical inner end surfaces (end surfaces facing the other long portion 21) of the main body portion 43 and the corner constituting portion 44 are flush with each other.

  As shown in FIG. 4, the main body portion 43 and the corner component portion 44 that are flush with the long portion 21 and the inner end surface of the main body portion 43 and the corner component portion 44 that are flush with the one long portion 21. An inter-holder passage 40a is formed as a part of the long inter-part gas passage 21a between the inner end face and the inner end face. The lower end portion of the inter-holder passage 40a is connected to the upper end portion of the plasmaization space 30a between the electrodes over the entire length in the left-right longitudinal direction.

  The side plate 24 of each long portion 21 is formed in a long plate shape by a rigid material such as steel, and extends straight in the left-right direction (the direction perpendicular to the paper surface of FIG. 4) with the width direction turned up and down. The side plate 24 is addressed to the outer surface (back surface) of the holder 40.

  As shown in FIGS. 2 to 4, the side plate 24 includes a push bolt 51 (push screw member, access means) and a pull bolt 52 (pull screw member, separation means) with a collar 53 in the longitudinal direction. A plurality are provided apart from each other. As shown in FIG. 4, the push bolt 51 is screwed into the side plate 24, and the tip is abutted against the back surface of the sandwiched portion 41 of the holder 40. As a result, the sandwiched portion 41 is pressed against the electrode 30.

  As shown in FIG. 3, a collar 53 (pull bolt holder) is incorporated in the sandwiched portion 41 of the side plate 24 and the holder 40. A flange formed at the outer end of the collar 53 is hooked on the side plate 24. A pulling bolt 52 is accommodated in an accommodation hole formed inside the collar 53. The head of the pulling bolt 52 is hooked on a step formed in the accommodation hole of the collar 53, and is hooked on the side plate 24 via the collar 53. The leading end of the pulling bolt 52 protrudes from the inner end portion of the collar 53 and is screwed into the back portion of the electrode 30. Accordingly, the sandwiched portion 41 of the electrode holder 40 is sandwiched between the side plate 24 and the electrode 30. Thereby, the side plate 24, the electrode holder main bodies 41 and 43, and the electrode 30 are structurally integrated.

  In addition, the electrode 30 can be pushed by the push bolt 51 in a direction approaching the other long portion 21 via the sandwiched portion 41 of the holder 40, and the electrode 30 can be pushed by the pulling bolt 52. It can be pulled away from the part 21. Therefore, by adjusting the screwing amount of the bolts 51 and 52, the distortion of the long electrode 30 can be corrected and adjusted so as to be straight, and as a result, the pair of electrodes 30 and 30 are reliably parallel to each other. Can be adjusted. Moreover, the space | interval between the electrodes 30 and 30 can be adjusted. Thus, the push-pull bolts 51 and 52 constitute a distance adjusting mechanism for the electrodes 30 and 30.

  An upper plate 23 made of a rigid material such as steel is covered on the upper side of the holders 40 and 40 and the side plates 24 and 24 of the pair of long portions 21 and 21. The upper end portions of the front and rear side plates 24 and 24 are connected to the front and rear end portions of the upper plate 23 by bolts, respectively. As a result, the front and rear side plates 24, 24 are connected and rigidly connected via the upper plate 23.

  As shown in FIGS. 1 and 3, a slit 23 a extending along the left-right longitudinal direction is formed in the front-rear center portion of the upper plate 23 as a part of the gas passage 21 a between the long portions. Half of the upper plate 23 across this slit 23 a becomes a component of the electrode support portion 22 of one long portion 21, and the other half becomes a component of the electrode support portion 22 of the other long portion 21. ing.

The gas introduction unit 10 is installed on the upper side of the upper plate 23. The slit 23a of the upper plate 23 is connected to the lower chamber 11b of the gas introduction part 10 over substantially the entire length in the left-right longitudinal direction. The lower end portion of the slit 23a is connected to the inter-holder passage 40a over the entire length in the left-right longitudinal direction.
The slit 23a and the inter-holder passage 40a constitute a path portion on the upstream side of the plasmaization space 30a in the long inter-portion gas path 21a.

  As shown in FIGS. 3 and 4, the lower portion 60 on the lower side of each long portion 21 includes an outer wide insulating plate 61, an inner narrow insulating plate 62, and the insulating plates 61, 62. A conductive plate 63 (discharge shielding plate) covering the lower surface is provided. The outer wide insulating plate 61 is addressed to the outer side portions of the lower surface of the side plate 24, the lower surface of the sandwiched portion 41 of the holder 40, and the lower surface of the electrode 30. The inner narrow insulating plate 62 is attached to the inner portion of the lower surface of the electrode 30. These insulating plates 61 and 62 are joined together by bolts as well as being phased.

  The insulating plates 61 and 62 are made of an insulating material, and the inner narrow insulating plate 62 is made of a material having higher plasma resistance than the outer wide insulating plate 61. For example, the insulating plate 62 is made of quartz, and the insulating plate 61 is made of vinyl chloride. In general, a material having high plasma resistance such as quartz is more expensive than vinyl chloride and the like that are not.

  The conductive plate 63 is made of a metal such as stainless steel, for example. The conductive plate 63 directly faces the workpiece W. As shown in FIG. 4, the conductive plate 63 is grounded via the ground line 3c. This makes it possible to bring the nozzle head 1 sufficiently close to the workpiece W while preventing arc discharge from the electrode 30 to the workpiece W, thereby improving the processing efficiency.

  Between the inner end surfaces of the insulating plates 62 and the inner end surfaces of the conductive plates 63 of the pair of long portions 21 and 21, a blow-out path 60 a that is continuous with the plasmaization space 30 a is formed. The blow-out path 60a constitutes a path portion on the downstream side of the plasmaization space 30a in the long-part gas path 21a. The inner end surface of the conductive plate 63 is drawn outward from the inner end surface of the insulating plate 62. As a result, discharge from the electrode 30 to the conductive plate 63 can be reliably prevented. Note that the insulating plate 62 of the one long portion 21 and the insulating plate 62 of the other long portion 21 may be integrally connected at both ends in the left-right longitudinal direction. The same applies to the insulating plate 61 and the conductive plate 63.

The most characteristic part of the present invention will be described.
As shown in FIGS. 1, 3, and 6, a plurality of intermediate spacers 70 are arranged in an intermediate portion in the longitudinal direction between the pair of long portions 21 and 21. More specifically, two small piece-like intermediate spacers 70 are provided in the gas passage 21a between the pair of long portions 21 and 21 and between the both end spacers 26 and 26 and between the long portions. ing. These intermediate spacers 70 are spaced apart from each other on the left and right. Note that the number of intermediate spacers 70 is not limited to two, and three or more intermediate spacers 70 may be provided apart from each other in the longitudinal direction, or only one may be provided at the center in the longitudinal direction.
Each intermediate spacer 70 is made of an insulating hard material such as ceramic. As shown in FIG. 5, the intermediate spacer 70 has a plate shape elongated vertically. The left-right width of the intermediate spacer 70 is, for example, about 4 mm. The left and right edges of the upper part of the intermediate spacer 70 are perpendicular to each other, while the left and right edges of the lower part are inclined so as to approach each other downward. Accordingly, the lower side portion of the intermediate spacer 70 is sharpened in an inverted triangular shape (tapered), and constitutes a blow-out side gas guide portion 70a.

  As shown in FIGS. 1, 3, and 5, the intermediate spacer 70 is disposed across the plasmaization space 30 a in the gas passage 21 a between the long portions and the inter-holder passage 40 a on the upper side. That is, the intermediate spacer 70 is arranged so as to be biased to the upper side of the plasmatization space 30a between the electrodes. (The upper portion of the intermediate spacer 70 having the same width protrudes upward from the plasmization space 30a and is disposed in the inter-holder passage 40a, and the lower portion including the inverted triangular guide portion 70a is disposed in the plasmification space 30a. There is a certain distance from the lower end of the spacer 70 to the lower end of the plasmaization space 30a. This distance is, for example, about 25 mm, but of course is not limited to this and may be about 15-20 mm. In addition, the vertical length of the arrangement | positioning part in the plasmaization space 30a of the spacer 70 is about 10 mm, for example.

  As shown in FIGS. 3 and 5, the upper portion of the intermediate spacer 70 disposed in the inter-holder passage 40 a straddles the main body 43 and the corner component 44 of the cover 42 of the holder 40. A pair of pin holes 70b are formed in the upper and lower portions of the spacer 70, and the pins 71 are inserted into the pin holes 70b so as to be withdrawn. Both end portions of the upper pin 71 are removably inserted into holes 43b and 43b formed in the inner end surfaces of the pair of cover main body portions 43 and 43, respectively. Both ends of the lower pin 71 are removably inserted into holes 44b and 44b formed in the inner end surfaces of the pair of corner components 44 and 44, respectively. As a result, the spacer 70 is detachably attached to the covering portion 42 of the holder 40. Further, the main body portion 43 and the corner portion 44 of the covering portion 42 are joined via the spacer 70.

  According to the plasma processing apparatus M1 having the above-described configuration, the processing gas uniformed in the left-right longitudinal direction by the gas introduction unit 10 is the slit 23a and the inter-holder passage 40a that constitute the upstream side passage portion of the inter-long portion gas passage 21a. Are sequentially introduced into the plasmatized space 30a. In parallel, a pulse voltage is applied between the electrodes 30 by the electric field applying means 3, and a pulse electric field is formed in the space 30a. As a result, a uniform glow discharge occurs, and the processing gas is turned into plasma. The plasma-ized processing gas is blown downward from the blowout port 60a. Thereby, it is possible to spray the process gas converted into plasma on the upper surface of the workpiece W below the head 1, and to perform plasma cleaning of the workpiece W or the like.

  Even if the intermediate portion of the pair of electrodes 30 and 30 is deformed so as to approach each other by Coulomb force or thermal stress due to the applied electric field at the time of plasma processing (see the phantom line in FIG. 6), the intermediate spacer 70 ensures this. Can be blocked. In particular, since the intermediate spacer 70 is directly disposed in the plasmaization space 30a in which an electric field is formed, the approaching deformation of the electrodes 30 and 30 can be more reliably prevented. As a result, the distance between the electrodes 30 (the thickness of the plasmatizing space 30a) can be kept constant not only at both ends in the longitudinal direction but also at the intermediate portion. Therefore, the uniform state by the gas introduction part 10 can be maintained even in the space 30a, and the processing gas that has been turned into plasma in the space 30a can be uniformly blown out along the left-right longitudinal direction. As a result, the workpiece W can be reliably subjected to plasma processing.

Since the intermediate spacer 70 is so small that the influence on the flow of the processing gas can be ignored, the uniformity of the processing can be reliably ensured.
Further, as shown in FIG. 5, the intermediate spacer 70 is disposed so as to be biased toward the upper part of the plasmaization space 30 a, so that the processing gas can be introduced into the plasmaization space 30 a below the intermediate spacer 70. . In addition, the processing gas can be smoothly drawn to the lower side of the spacer 70 by the inverted triangular guide portion 70a. As a result, the processing gas can be blown out at the arrangement position of the spacer 70 as in the other positions, and the uniformity of the processing can be ensured.
In addition, since the distance between the electrodes 30 can be maintained uniform along the longitudinal direction by the push bolt 51 and the pull bolt 52, uniform plasma surface treatment can be performed more reliably.

FIG. 7 shows a comparison of the processing results when the intermediate spacer 70 is provided in the apparatus M1 (FIG. 7A) and when the intermediate spacer 70 is not provided (FIG. 7B). As shown in FIG. 5B, when the intermediate spacer 70 was not provided, the contact angle at the position corresponding to the central portion in the longitudinal direction of the electrode 30 varied greatly. On the other hand, as shown in FIG. 5A, when the intermediate spacer 70 is provided, the contact angle at the position corresponding to the central portion in the longitudinal direction of the electrode 30 is the contact angle at the position corresponding to both ends. The change with time was almost the same. Thus, it has been found that by providing the spacer 70, uniform processing in the longitudinal direction is possible.
Here, the “contact angle” refers to an angle formed by a line connecting the edge and apex of the droplet hanging on the surface of the workpiece W after the treatment with the surface of the workpiece W, and is an index of wettability. is there.

  When assembling the processing unit 20 of the nozzle head 1, the intermediate spacer 70 is attached in advance to the holder 40 of one of the long portions 21 with a pin 71. And a pair of holder 40 is faced. At this time, the pin 71 is inserted into the holes 43 b and 44 b of the other holder 40. As a result, the spacer 70 can be easily incorporated.

Next, another embodiment of the present invention will be described. In the following embodiments, the same components as those in the first embodiment are denoted by the same reference numerals and the description thereof is omitted. The following embodiment mainly relates to a deformation mode of the intermediate spacer.
In the intermediate spacer 70X shown in FIG. 8, not only the lower side portion but also the upper side portion has a triangular shape (tapered), and constitutes an introduction side gas guide portion 70c. As a result, the processing gas from above can flow smoothly to the left and right sides of the intermediate spacer 70X, and thereafter smoothly flow to the lower side of the spacer 70X (see FIG. 5B).

The shape of the intermediate spacer is not necessarily limited to a flat plate shape like the spacers 70 and 70X described above.
For example, the intermediate spacer 72 shown in FIG. 9 has a thin cylindrical shape (pin shape) with the axis line directed up and down. The intermediate spacer 72 may be detachably fastened to the holder 40 with a fastening pin similar to the pin 71 of the first embodiment. While the upper end portion of the spacer 72 is flat, a tapered taper 72a (blow-out side gas guide portion) that is pointed downward is formed on the lower side portion. As a result, the processing gas can be smoothly introduced to the lower side of the spacer 72.

  In the cylindrical intermediate spacer 72X shown in FIG. 10, a tapered taper 72b (introduction-side gas guide portion) that is pointed upward is also formed on the upper portion. As a result, the processing gas from above can be made to flow smoothly to the left and right sides of the spacer 72X, and thereafter, smoothly flow to the lower side of the spacer 72X.

  The intermediate spacer 73 shown in FIGS. 11 and 12 has a horizontal straddling portion 73b and an inter-electrode portion 73a (an insertion portion between the electrodes) protruding vertically downward from the central portion of the straddling portion 73b. However, it is in the shape of a small piece having a T-shape when viewed from the side. The length of the intermediate spacer 73 in the left-right direction is, for example, about 4 mm. The vertical length of the inter-electrode portion 73a of the intermediate spacer 73 is, for example, about 3 to 4 mm. The material of the spacer 73 is the same ceramic as in the first embodiment.

  As shown in FIG. 12, the straddling portion 73 b of the intermediate spacer 73 straddles between the upper surfaces of the pair of electrodes 30 and 30. A step-like engaging recess 44 e is formed at the corner on the inner end face side and the lower side of the corner constituting portion 44. The end of the straddling portion 73b is fitted into the recess 44e.

  The inter-electrode portion 73 a of the intermediate spacer 73 is inserted and sandwiched between the upper portions of the pair of electrodes 30 and 30. The lower end portion of the inter-electrode portion 73a is flat, but instead, it is sharpened in an inverted triangle shape like the lower side portion of the spacer 70 and the like to constitute the blowout side gas guide portion. Also good.

The intermediate spacer only needs to be disposed in the processing gas path 21 a between the pair of long portions 21 and 21, and does not necessarily have to be disposed in the plasmaization space 30 a between the electrodes 30 and 30.
That is, the intermediate spacer 70Y shown in FIG. 13 is disposed only in the passage 40a between the pair of holders 40 and 40, and does not enter the plasmaization space 30a between the electrodes 30 and 30. The holder 40 is structurally integrated with the electrode 30 and the side plate 24 by bolts 51 and 52 as in the first embodiment. As a result, the intermediate portions in the longitudinal direction of the pair of electrodes 30 and 30 try to distort in the approaching direction, and this approaching force acts on the side plate 24 via the bolts 52 and the collars 53 of the respective long portions 21, Even if the side plate 24 is distorted, the holders 40, 40 integrated with the side plate 24 are prevented from approaching each other by the spacer 70Y. The thickness of the space 30a can be kept constant.

  Also in the embodiment shown in FIG. 14, the intermediate spacer 76 is disposed only in the passage 40 a between the pair of holders 40, 40. The intermediate spacer 76 has a rod-like shape extending in the front-rear direction (the direction in which the pair of long portions 21 and 21 are juxtaposed). An engagement recess 42 e is formed in the cover portion 42 of each holder 40. Both ends of the intermediate spacer 76 are inserted into the engaging recesses 42e of the pair of holders 40, 40, respectively. The cross-sectional shape of the intermediate spacer 76 is, for example, a 1 mm square, but is not limited thereto, and may be, for example, a circular cross section. Although illustration is omitted, the holder 40 of this embodiment is also structurally integrated with the electrode 30 by push-pull bolts 51 and 52. In this embodiment, the cover portion 42 of the holder 40 is configured only by the main body portion 43 and is not provided with the corner configuration portion 44 made of a plasma-resistant material. However, the corner configuration portion 44 may be provided. Good.

  FIG. 15 relates to a modification of FIG. 14, and the support rod spacers 76 and 76 X are provided not only in the passage 40 a between the covered portions 42 of the holder 40 but also in the plasmaization space 30 a between the electrodes 30. ing. The upper intermediate spacer 76 provided in the inter-holder passage 40a and the lower intermediate spacer 76X provided in the plasmification space 30a are arranged in a staggered manner.

  As shown in FIGS. 16 and 17, the length along the left-right direction of the electrode 30 and thus the long portion 21 is based on the width along the left-right direction of the workpiece W (the direction orthogonal to the conveying direction (arrow direction in FIG. 16)). Generally large. In this case, the left and right end portions 21y and 21y of the long portion 21 protrude outward in the left and right directions from the positions corresponding to the left and right edges Wa and Wa of the workpiece W, and the end spacers 26 and 26 are in contact with the edges Wa and Wa. It is located on the left and right outside of the corresponding position. The arrangement position of the intermediate spacer 70 should just be in the part 21x which should correspond to the workpiece | work W in the elongate part 21. FIG. In the present invention, when the electrode 30 and thus the elongated portion 21 is longer than the width of the workpiece W, the workpiece corresponding portion 21x is defined as the “intermediate portion in the longitudinal direction”, and the protruding portion 21y outward from the edge Wa is defined as “ It is defined as “longitudinal end”. Of course, intermediate spacers other than the first embodiment may be applied. 16 and 17, the size of the intermediate spacer 70 is exaggerated.

In the nozzle head 1 </ b> X of the embodiment shown in FIGS. 18 to 20, the inner end surface (the end surface facing the other long portion 21) of the cover portion 42 in each holder 40 is from the inner end surface of the corner component portion 44. Recessed, and a step 42a is formed between these inner end faces. Both end portions of the intermediate spacer 77 having a rectangular parallelepiped shape are mounted on and supported by the steps 42a and 42a of the pair of long portions 21 and 21, respectively. Further, as best shown in FIG. 19, engagement concave portions 43 c are formed at two (plural) intermediate spacer arrangement locations on the inner end surface of the main body portion 43. The end of the intermediate spacer 77 is fitted in the recess 43c.
The inter-holder passage 40a is wide on the upper side and narrowed on the lower side with the step 42a as a boundary.

  As shown in FIG. 18, in this embodiment, the main body portion 43 and the corner configuration portion 44 of the covering portion 42 of the holder 40 are connected and fixed by bolts 45. Further, the sandwiched portion 41 of the holder 40 and the main body portion 43 of the covering portion 42 are separate and are connected and fixed to each other by a bolt 46.

  In the processing unit 20 of the nozzle head 1X, a push bolt 51 (not shown) and a pulling bolt 52 are provided on the long portion 21 on the electric field application side (left side in FIG. 18). Only the pulling bolt 52 is provided on the elongate portion 21 on the right side in FIG. 18, and the push bolt 51 is not provided. On either side, the electrode 30, the holder 40 and the side plate 24 are structurally integrated by the pulling bolt 52, and when the electrode 30 is about to be deformed, the intermediate spacer 77 prevents the approaching deformation. be able to.

At the lower end portion of the sandwiched portion 41 of the holder 40, a convex portion 41a that extends to the lower side of the electrode 30 and supports it is provided. The convex portion 41 a abuts against the plasma-resistant insulating plate 62. The insulating plate 61 is not provided, and an insulating space 60 b is formed between the sandwiched portion 41 and the insulating plate 62 and the conductive plate 63.
An insulating groove 41a is formed on the inner surface of the sandwiched portion 41 facing the electrode 30 side.
Although illustration is omitted, the groove 41 a is not formed in the portion corresponding to the push bolt 51 in the sandwiched portion 41 on the electric field application side, and the inner surface of the sandwiched portion 41 is pushed against the back surface of the electrode 30. It has been applied.

  Further, the gas introduction part 10 of the nozzle head 1X includes two pipes 13A and 13B as “a pair of equalizing paths that gradually leaks out of the path while flowing approximately half of the processing gas so as to face each other”. Instead of the pipe unit 12, a container 17 having a quadrangular cross section is provided. The container 17 is elongated in the left-right direction orthogonal to the paper surface of FIG. The inside of the container 17 is divided into two passages 17 a and 17 b by a partition wall 18. Although detailed illustration is omitted, processing from the processing gas source 2 is applied to one end of one passage 17a (for example, the front side in FIG. 18) and the other end of the other passage 17b (for example, the back side in FIG. 18). A gas inlet port is provided for each. A large number of small holes 17c that connect the passages 17a and 17b to the upper chamber 11a are formed in the upper plate of the container 17 so as to be spaced apart from each other in the direction orthogonal to the plane of FIG.

The intermediate spacer for the nozzle head 1X of FIG. 18 embodiment may not have a rectangular parallelepiped shape.
For example, the intermediate spacer 77A shown in FIG. 21 has a cylindrical spacer main body 77a whose axis is horizontally oriented, and rectangular engaged portions 77b and 77b provided at both ends of the spacer main body 77a. Yes. As shown in FIGS. 22 and 23, the engaged portion 77b of the intermediate spacer 77A is placed on the step 42a of the holder 40 and fitted into the engaging recess 43c. The spacer main body 77a is bridged between the holders 40, 40 of the two long portions 21, 21. The processing gas smoothly wraps around the spacer main body 77a along the circumferential surface of the cylindrical spacer 77a.
The entire intermediate spacer 77A may have a cylindrical shape, and both end portions thereof may be firmly fixed by the engaging recesses 43c of the holder 40.

  24 and 25 show another aspect of the intermediate spacer for the nozzle head 1X of the embodiment of FIG. The intermediate spacer 77B has a rectangular parallelepiped shape, and a through hole 77c penetrating vertically is formed at the center thereof. Thus, the processing gas can flow downward through the through hole 77c even at the position where the intermediate spacer 77B is disposed. The through hole 77c is provided as a part of the gas passage 21a between the long portions.

  FIG. 26 shows a modification of the intermediate spacer with the through hole 77c. In the intermediate spacer 77D, the through hole 77c is continuous with either the left or right outer surface, and the entire intermediate spacer 77D has a U shape.

  27 and 28 show still another aspect of the intermediate spacer for the nozzle head 1X of the embodiment of FIG. The intermediate spacer 77E has a rectangular parallelepiped spacer main body 77d and a quadrangular pyramid-shaped inverted convex portion 77e suspended from the center of the lower surface thereof. Both end portions of the spacer main body 77d are hooked on the steps 42a and 42a of the holders 40 and 40, respectively, while the inverted convex portion 77e is inserted into a gap between the pair of corner constituting portions 44 and 44. The processing gas is smoothly guided to the lower side of the spacer 77E along the inverted convex portion 77e.

The “gas path side end defining member” that defines the side end surfaces at both ends in the longitudinal direction of the gas path 21a between the long parts needs to be constituted by the end spacers 26 sandwiched between the long parts 21 and 21. Absent.
That is, as shown in FIG. 29, the end spacer 26 may be omitted. In this case, both ends in the longitudinal direction of the gas passage 21 a between the long portions are closed by the end plates 25. The end plate 25 constitutes a “gas path side end defining member”. A packing 27 is interposed between the end plate 25 and both end faces in the longitudinal direction of the electrodes 30 and 30. Further, the bolt 28 passed through the end plate 25 is screwed into the end faces of the electrodes 30, 30, so that the end plate 25 is pressed against the end faces of the electrodes 30, 30 via the packing 27. Thereby, the side end surfaces at both ends in the longitudinal direction of the gas path 21a between the long portions (particularly, the plasmified space 30a) are reliably sealed.

  The intermediate spacer provided in the gas path 21a between the long portions does not necessarily have to be a small piece. That is, in the embodiment shown in FIGS. 30 to 32, a long intermediate spacer 78 is used. As shown in FIGS. 30 and 32, the intermediate spacer 78 has a long frame 78a and a partition 78b provided inside the frame 78a. The frame 78 a has a length that extends over the entire length of the long portion 21. The internal space of the frame 78a is opened in both the upper and lower directions. The partition 78b has a plate shape orthogonal to the longitudinal direction of the long portion 21, and divides the internal space of the frame 78a along the longitudinal direction. Three partitions 78b are provided apart in the longitudinal direction, whereby the internal space of the frame 78a is divided into four. These division | segmentation internal spaces comprise the through-hole 78c as a part of gas path 21a between long parts. Note that the number of the partitions 78b is not limited to three, and one or two or four or more may be provided at the center in the longitudinal direction, or separated in the longitudinal direction.

  As shown in FIG. 30, end plates 78d and 78d at both ends in the longitudinal direction of the frame 78a are provided as "gas path side end defining members" that define side end surfaces at both ends in the longitudinal direction of the gas passage 21a between the long portions. ing. The long intermediate spacer 78 is shorter than the long portion 21 so that the processing gas flows outside both ends in the longitudinal direction of the long intermediate spacer 78, and the end plate 25, the end spacer 26, etc. An “end defining member” may be configured.

  As shown in FIG. 31, the long intermediate spacer 78 is disposed in the inter-holder passage 40a in the same manner as the intermediate spacer 77 in the embodiment of FIG. Both sides of the long intermediate spacer 78 in the width direction are respectively placed and supported on the step 42a. The long intermediate spacer 78 may be disposed in the plasmaization space 30 a between the electrodes 30 and 30.

The present invention is not limited to the above embodiment, and various modifications can be made.
For example, the intermediate spacer may be disposed only in the plasmaization space 30 a between the electrodes 30 and 30 and may not be disposed in the passage 40 a between the holders 40 and 40.
In the case where an intermediate spacer is disposed at least in the plasmaization space 30a, the electrode 30 and the support portion 22 do not have to be integrated.
The intermediate spacer may be integrated with the long part on one side (for example, the ground side).
In the long portion on the ground side, the sandwiched portion 41 of the holder 40 may be made of a conductive metal, and the metal sandwiched portion 41 and the side plate 24 may be integrated. Furthermore, the entire lower portion 60 may be made of metal, and the metal lower portion 60, the metal sandwiched portion 41, and the side plate 24 may be integrated. In this case, the ground electrode 30 can be grounded by grounding the side plate 24 and the upper plate 23, for example.
The present invention can be applied not only to atmospheric pressure but also to plasma treatment under reduced pressure, not only to glow discharge, but also to plasma treatment by corona discharge or creeping discharge, not only cleaning, but also etching, film formation, It can be applied to various plasma treatments such as surface modification and ashing.

It is a front sectional view which shows the nozzle head of the atmospheric pressure plasma processing apparatus concerning a 1st embodiment of the present invention, and follows the II line of Drawing 3. It is a perspective view of the nozzle head. It is side surface sectional drawing of the said atmospheric pressure plasma processing apparatus which follows the III-III line of FIG. It is side surface sectional drawing of the said normal pressure plasma processing apparatus which follows the IV-IV line | wire of FIG. It is a front view which expands and shows the intermediate spacer of the said normal pressure plasma processing apparatus. It is a top view which shows typically the process part of the said normal pressure plasma processing apparatus. (A) is a graph which shows the measurement result of the time-dependent change of the contact angle in the workpiece | work processed with the plasma processing apparatus with an intermediate spacer. (B) is a graph which shows the measurement result of the time-dependent change of the contact angle in the workpiece | work processed with the plasma processing apparatus without an intermediate spacer. (A) is a perspective view which shows the 1st deformation | transformation aspect of an intermediate spacer, (b) is a front view explaining the guide effect | action of the process gas flow by the intermediate spacer of (a). It is a perspective view which shows the 2nd deformation | transformation aspect of an intermediate spacer. It is a perspective view which shows the 3rd deformation | transformation aspect of an intermediate spacer. It is side surface sectional drawing of the atmospheric pressure plasma processing apparatus incorporating the intermediate | middle spacer of the 4th deformation | transformation aspect. It is a perspective view of the intermediate spacer of FIG. It is side surface sectional drawing of the atmospheric pressure plasma processing apparatus incorporating the intermediate spacer of the 5th modification. The elongate part incorporating the intermediate spacer which concerns on a 6th deformation | transformation aspect is shown, (a) is the perspective view, (b) is the side sectional drawing. It is a front view which shows the modification of the arrangement structure of the intermediate spacer of FIG. It is a top view which shows embodiment in case electrode length is larger than a workpiece | work width. It is front sectional drawing of FIG. It is side surface sectional drawing of the nozzle head of the atmospheric pressure plasma processing apparatus which concerns on other embodiment of this invention. It is a perspective view of the elongate part of the nozzle head of FIG. 18 embodiment. It is a top view of the process part of the nozzle head of FIG. 18 embodiment. It is a perspective view which shows the deformation | transformation aspect of the intermediate spacer for nozzle heads of FIG. 18 embodiment. It is a top view of the process part of the nozzle head provided with the intermediate spacer of FIG. 21 aspect. It is side surface sectional drawing of a nozzle head provided with the intermediate spacer of the aspect of FIG. It is a perspective view which shows the other deformation | transformation aspect of the intermediate spacer for nozzle heads of FIG. 18 embodiment. It is side surface sectional drawing of a nozzle head provided with the intermediate spacer of the aspect of FIG. It is a perspective view which shows the modification of the intermediate | middle spacer of the aspect of FIG. It is a perspective view which shows the other deformation | transformation aspect of the intermediate spacer for nozzle heads of FIG. 18 embodiment. It is side surface sectional drawing of a nozzle head provided with the intermediate spacer of the aspect of FIG. It is a top view which shows the other aspect of a gas path side end defining member. It is a top view which shows embodiment of the atmospheric pressure plasma processing apparatus incorporating the elongate frame-shaped spacer. FIG. 31 is a side cross-sectional view of the apparatus of FIG. 30 embodiment. It is a perspective view of the elongate frame-shaped spacer of FIG. 30 embodiment.

Explanation of symbols

W Workpiece (Workpiece)
M1 atmospheric pressure plasma processing apparatus 2 processing gas source 10 gas introduction part 11a upper chamber (first-stage homogenization chamber)
11b Lower chamber (2nd stage, final stage homogenization chamber)
11c Clearance (communication path)
12 Pipe unit (homogenization path)
17 Container (homogenization path)
20 treatment part 21 long part 21a gas path 22 between long parts support part 24 side plate (rigid member)
25 End plate (gas path side end defining member)
26 End spacer (gas path side end defining member)
30 Long electrode 30a Plasmaization space 30x End portion 40 that protrudes outside the edge of the object to be processed in the intermediate part 30y electrode in the longitudinal direction that should correspond to the object to be processed in the electrode 40 Holder (member to be sandwiched)
41 Covered portion 42 Covered portion 42a Step 43 Covered portion main body portion 43c Locked recess 44 Covered portion corner component 44e Locked recess 51 Push bolt (push screw member)
52 Pull bolt (Pull screw member)
70,70X, 70Y Small intermediate spacer 70a Blow-side gas guide (tapered end)
70c Gas introduction side gas guide (tapered end)
71 Pins 72, 72X Small intermediate spacers 72a, 72b Taper (tapered end)
73 Small piece-shaped intermediate spacer 73a Interelectrode portion 73b Spacing portions 76, 76X Small piece-shaped intermediate spacer 77 Small piece-shaped intermediate spacer 77A Small piece-shaped intermediate spacer 77B, 77D Small piece-shaped intermediate spacer 77c Through hole 77E Small piece-shaped intermediate spacer 78 long intermediate spacer 78a frame 78b partition 78c through hole 78d end plate of the frame (gas path side end defining member)

Claims (24)

In a plasma processing apparatus for blowing a processing gas through a plasmatizing space and hitting an object to be processed disposed outside the plasmatizing space,
It is provided with a pair of long portions each including a long electrode, and these long portions are arranged in parallel with each other, so that they flow in the direction intersecting the longitudinal direction and the parallel direction between these long portions. A gas passage between the long portions facing the direction is formed, and at least a part of the gas passage between the long portions is defined by the electrodes of the pair of long portions, thereby forming the plasmaization space. And
A gas introduction part is provided on the upstream side of the gas path between the long parts, and the processing gas is made uniform in the longitudinal direction and then introduced into the upstream end of the gas path between the long parts.
Between the one end portions in the longitudinal direction of the pair of long portions and between the other end portions are respectively closed by gas path side end defining members, and between the long portions by the gas path side end defining members at both ends. Side end surfaces at both ends in the longitudinal direction of the gas path are defined,
A small piece of intermediate spacer is provided at the middle of the gas passage between the long portions, which is located closer to the center from the side end surfaces of both ends, to prevent the gap between the middle portions of the long portions from being narrowed. A plasma processing apparatus.   The length of the long portion is larger than the width of the object to be processed, and the gas path end defining member is disposed outside the position corresponding to the edge of the object to be processed in the long portion, and the small portion The plasma processing apparatus according to claim 1, wherein the piece-shaped intermediate spacer is disposed inside a position corresponding to the edge of the workpiece.   3. The plasma processing apparatus according to claim 1, wherein the small piece-shaped intermediate spacer is sandwiched between the pair of long electrodes and disposed in the plasmaization space.   The plasma processing apparatus according to claim 3, wherein the small piece-shaped intermediate spacer is disposed to be deviated toward an upstream side portion in the plasmaization space.   The long portion of 1 has the electrode and a support portion that supports the electrode so as to be integrated in the juxtaposed direction, and the support portion faces the upstream side of the gas path between the long portions. A covering portion covering the side surface of the gas passage, and the covering portion and the other long portion define a path portion upstream of the plasmaization space in the gas passage between the long portions, and The plasma processing apparatus according to claim 3 or 4, wherein an intermediate spacer protrudes upstream from the plasmaization space between the electrodes and is inserted into the path portion.   The long portion of 1 has the electrode and a support portion that supports the electrode so as to be integrated in the juxtaposed direction, and the support portion faces the upstream side of the gas path between the long portions. A covering portion covering the side surface of the gas passage, and the covering portion and the other long portion define a path portion upstream of the plasmaization space in the gas passage between the long portions, and 3. The plasma processing apparatus according to claim 1, wherein an intermediate spacer is sandwiched between the covering portion and the other long portion and disposed in the path portion.   The plasma processing apparatus according to claim 5, wherein the small piece-shaped intermediate spacer is engaged with the covering portion.   The plasma processing apparatus according to claim 5 or 6, wherein the small piece-like intermediate spacer is detachably fastened to the covering portion with a pin.   The plasma processing apparatus according to claim 5, wherein an engagement recess is formed in the covering portion, and the small intermediate spacer is engaged in the engagement recess.   The plasma processing apparatus according to claim 5 or 6, wherein a step is formed in the covering portion, and the small intermediate spacer is engaged with the step.   The covering part has a main body part and a corner constituent part provided at a corner of the main body part on the road part side and the electrode side, and the corner constituent part is made of a material having higher plasma resistance than the main body part. The plasma processing apparatus according to claim 5, wherein the plasma processing apparatus is provided.   The body portion of the covering portion has a portion covering the side opposite to the electrode side of the corner configuration portion, and the small piece-like intermediate spacer is covered with the corner configuration portion of the body portion and the corner configuration portion. The plasma processing apparatus according to claim 11, wherein the plasma processing apparatus is detachably fastened to each of the covering portion and the corner constituting portion by pins.   The body portion of the covering portion has a portion covering the opposite side to the electrode side of the corner constituting portion, and a step is formed by retreating this portion from the corner constituting portion to the opposite side to the other long portion. The plasma processing apparatus according to claim 11, wherein the stepwise intermediate spacer is hung on the step.   1, a rigid member disposed on the back portion of the corresponding electrode opposite to the other long portion, and a pull screw member that is passed through the rigid member and screwed into the electrode The plasma processing apparatus according to claim 5, wherein the plasma processing apparatus includes:   The plasma processing apparatus according to claim 14, wherein the support portion further includes a push screw member screwed into the rigid member and abutted against a back surface of the electrode.   The support portion further includes an insulating sandwiched member sandwiched between the rigid member and an electrode, and the sandwiched member is integrated with the cover portion. Item 16. The plasma processing apparatus according to Item 14 or 15.   The plasma processing apparatus according to claim 1, wherein the small piece-shaped intermediate spacer has a flat plate shape.   The plasma processing apparatus according to claim 1, wherein the small piece-shaped intermediate spacer has a cylindrical shape with an axis line directed in a flow direction of the gas path between the long portions.   The small piece-like intermediate spacer integrally has a straddle straddling between the upstream side surfaces of the pair of long-part electrodes, and an inter-electrode portion that is connected to the straddle and disposed in the plasmaization space between the electrodes. The plasma processing apparatus according to claim 1, wherein the apparatus is a plasma processing apparatus.   The plasma processing apparatus according to any one of claims 1 to 19, wherein an end portion of the small piece-shaped intermediate spacer facing the downstream side of the gas path between the long portions is tapered.   The plasma processing apparatus according to any one of claims 1 to 20, wherein an end portion of the small intermediate spacer facing the upstream side of the gas path between the long portions is tapered. In a plasma processing apparatus for blowing a processing gas through a plasmatizing space and hitting an object to be processed disposed outside the plasmatizing space,
It is provided with a pair of long portions each including a long electrode, and these long portions are arranged in parallel with each other, so that they flow in the direction intersecting the longitudinal direction and the parallel direction between these long portions. A gas passage between the long portions facing the direction is formed, and at least a part of the gas passage between the long portions is defined by the electrodes of the pair of long portions, thereby forming the plasmaization space. And
A gas introduction part is provided on the upstream side of the gas path between the long parts, and the processing gas is made uniform in the longitudinal direction and then introduced into the upstream end of the gas path between the long parts.
Between the one end portions in the longitudinal direction of the pair of long portions and between the other end portions are respectively closed by gas path side end defining members, and between the long portions by the gas path side end defining members at both ends. Side end surfaces at both ends in the longitudinal direction of the gas path are defined,
A long intermediate spacer extending along the long portion is provided at the intermediate portion in the longitudinal direction in the gas passage between the long portions so as to prevent the interval between the intermediate portions of the long portions from being narrowed. And
The plasma processing apparatus, wherein the long intermediate spacer is provided with a through hole provided as a gas path between the long portions.   The long intermediate spacer has a long frame whose internal space is opened in both directions orthogonal to the longitudinal direction, and a partition that divides the internal space of the frame along the longitudinal direction. The plasma processing apparatus according to claim 22, wherein the inner space is provided as the gas path between the long portions.   24. The frame according to claim 23, wherein the frame has a length over substantially the entire length of the long portion, and end plates at both ends in the longitudinal direction are provided as the gas path side end defining members. Plasma processing equipment.

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