JP2005196753A5 - - Google Patents

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Publication number
JP2005196753A5
JP2005196753A5 JP2004360133A JP2004360133A JP2005196753A5 JP 2005196753 A5 JP2005196753 A5 JP 2005196753A5 JP 2004360133 A JP2004360133 A JP 2004360133A JP 2004360133 A JP2004360133 A JP 2004360133A JP 2005196753 A5 JP2005196753 A5 JP 2005196753A5
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JP
Japan
Prior art keywords
region
elements
conductive layers
semiconductor device
substrate
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Application number
JP2004360133A
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Japanese (ja)
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JP2005196753A (en
JP4989847B2 (en
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Priority to JP2004360133A priority Critical patent/JP4989847B2/en
Priority claimed from JP2004360133A external-priority patent/JP4989847B2/en
Publication of JP2005196753A publication Critical patent/JP2005196753A/en
Publication of JP2005196753A5 publication Critical patent/JP2005196753A5/ja
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Publication of JP4989847B2 publication Critical patent/JP4989847B2/en
Expired - Fee Related legal-status Critical Current
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Claims (8)

絶縁表面を有する基板の一表面に、複数の導電層が設けられる領域、複数の1の素子が設けられる領域、及び複数の2の素子が設けられる領域があり、
前記複数の1の素子は、前記複数の導電層から1つを選択するデコーダを構成
前記複数の2の素子は、前記複数の導電層から伝達される信号を増幅するセンスアンプを構成
前記複数の1の素子が設けられる領域の間に、前記複数の2の素子が設けられる領域が配置されていることを特徴とする半導体装置。
On one surface of the substrate having an insulating surface, there are a region where a plurality of conductive layers are provided, a region where a plurality of first elements are provided, and a region where a plurality of second elements are provided,
Wherein the plurality of first element constitutes a decoder for selecting one of said plurality of conductive layers,
Wherein the plurality of second element constitutes a sense amplifier for amplifying a signal transmitted from said plurality of conductive layers,
The semiconductor device characterized by between a region where the plurality of first elements are provided, a region in which the plurality of second elements are provided are arranged.
絶縁表面を有する基板の一表面に、複数の導電層が設けられる領域、複数の1の素子が設けられる領域、及び複数の2の素子が設けられる領域があり、
前記複数の1の素子は、前記複数の導電層から1つを選択するデコーダを構成
前記複数の2の素子は、前記複数の導電層から伝達される信号を増幅するセンスアンプを構成
前記複数の1の素子が設けられる領域と前記複数の2の素子が設けられる領域は、交互に配置されていることを特徴とする半導体装置。
On one surface of the substrate having an insulating surface, there are a region where a plurality of conductive layers are provided, a region where a plurality of first elements are provided, and a region where a plurality of second elements are provided,
Wherein the plurality of first element constitutes a decoder for selecting one of said plurality of conductive layers,
Wherein the plurality of second element constitutes a sense amplifier for amplifying a signal transmitted from said plurality of conductive layers,
A region in which the plurality of first elements are provided and a region in which the plurality of second elements are provided are alternately arranged.
請求項1又は請求項2において、
前記複数の1の素子が設けられる領域は、前記複数の導電層の各々に対応した複数の素子形成領域に分割され、
前記複数の素子形成領域から選択された1つの素子形成領域の行方向のピッチと、前記複数の導電層間のピッチは異なることを特徴とする半導体装置。
In claim 1 or claim 2,
The region where the plurality of first elements are provided is divided into a plurality of element formation regions corresponding to each of the plurality of conductive layers,
A semiconductor device, wherein a pitch in a row direction of one element formation region selected from the plurality of element formation regions is different from a pitch between the plurality of conductive layers.
請求項1又は請求項2において、In claim 1 or claim 2,
前記複数の第1の素子と前記複数の第2の素子は、それぞれ、トランジスタを有することを特徴とする半導体装置。The plurality of first elements and the plurality of second elements each include a transistor.
請求項1又は請求項2において、
前記基板はガラス基板であることを特徴とする半導体装置。
In claim 1 or claim 2,
The semiconductor device, wherein the substrate is a glass substrate.
請求項1又は請求項2において、
前記基板上に設けられた記憶素子を有することを特徴とする半導体装置。
In claim 1 or claim 2,
A semiconductor device comprising a memory element provided on the substrate .
請求項1又は請求項2において、
前記基板上に設けられた発光素子または液晶素子を有することを特徴とする半導体装置。
In claim 1 or claim 2,
A semiconductor device comprising a light-emitting element or a liquid crystal element provided over the substrate .
請求項1又は請求項2において、
制御手段、電源発生手段及び送受信手段を有することを特徴とする半導体装置。
In claim 1 or claim 2,
A semiconductor device comprising control means, power supply generation means, and transmission / reception means.
JP2004360133A 2003-12-12 2004-12-13 Semiconductor device Expired - Fee Related JP4989847B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004360133A JP4989847B2 (en) 2003-12-12 2004-12-13 Semiconductor device

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003415169 2003-12-12
JP2003415169 2003-12-12
JP2004360133A JP4989847B2 (en) 2003-12-12 2004-12-13 Semiconductor device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011007086A Division JP5256310B2 (en) 2003-12-12 2011-01-17 Semiconductor device

Publications (3)

Publication Number Publication Date
JP2005196753A JP2005196753A (en) 2005-07-21
JP2005196753A5 true JP2005196753A5 (en) 2007-11-29
JP4989847B2 JP4989847B2 (en) 2012-08-01

Family

ID=34829095

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004360133A Expired - Fee Related JP4989847B2 (en) 2003-12-12 2004-12-13 Semiconductor device

Country Status (1)

Country Link
JP (1) JP4989847B2 (en)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63247990A (en) * 1987-10-21 1988-10-14 Hitachi Ltd Semiconductor memory device
DE3776798D1 (en) * 1987-11-23 1992-03-26 Philips Nv FAST WORKING STATIC RAM WITH LARGE CAPACITY.
JP2663651B2 (en) * 1989-06-26 1997-10-15 日本電気株式会社 Semiconductor memory integrated circuit
JPH04335296A (en) * 1991-05-10 1992-11-24 Sony Corp Semiconductor memory device
JPH0878538A (en) * 1994-09-06 1996-03-22 Hitachi Ltd Semiconductor memory and information processor employing it
US5923605A (en) * 1997-09-29 1999-07-13 Siemens Aktiengesellschaft Space-efficient semiconductor memory having hierarchical column select line architecture
JP2002093160A (en) * 2000-09-18 2002-03-29 Mitsubishi Electric Corp Semiconductor memory
JP3913534B2 (en) * 2001-11-30 2007-05-09 株式会社半導体エネルギー研究所 Display device and display system using the same
KR100648543B1 (en) * 2002-06-03 2006-11-27 후지쯔 가부시끼가이샤 Semiconductor integrated circuit

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