JP2005187506A - Method for producing vinylic polymer composition - Google Patents
Method for producing vinylic polymer composition Download PDFInfo
- Publication number
- JP2005187506A JP2005187506A JP2003427041A JP2003427041A JP2005187506A JP 2005187506 A JP2005187506 A JP 2005187506A JP 2003427041 A JP2003427041 A JP 2003427041A JP 2003427041 A JP2003427041 A JP 2003427041A JP 2005187506 A JP2005187506 A JP 2005187506A
- Authority
- JP
- Japan
- Prior art keywords
- reactor
- solvent
- producing
- meth
- vinyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 229920000642 polymer Polymers 0.000 title claims abstract description 65
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 239000000203 mixture Substances 0.000 title claims abstract description 11
- 125000002348 vinylic group Chemical group 0.000 title abstract 7
- 239000000178 monomer Substances 0.000 claims abstract description 63
- 239000002904 solvent Substances 0.000 claims abstract description 48
- 238000006243 chemical reaction Methods 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 24
- 239000002994 raw material Substances 0.000 claims abstract description 24
- 239000002253 acid Chemical group 0.000 claims abstract description 19
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 15
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 12
- 239000012295 chemical reaction liquid Substances 0.000 claims abstract description 8
- 239000007791 liquid phase Substances 0.000 claims abstract description 4
- 229920002554 vinyl polymer Polymers 0.000 claims description 60
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 53
- 239000012071 phase Substances 0.000 claims description 44
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 35
- 238000006116 polymerization reaction Methods 0.000 claims description 29
- 239000007921 spray Substances 0.000 claims description 21
- 238000005507 spraying Methods 0.000 claims description 13
- 150000002148 esters Chemical class 0.000 claims description 9
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 claims description 7
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 6
- 238000009835 boiling Methods 0.000 claims description 6
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 claims description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 4
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 claims description 3
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims 2
- 239000012808 vapor phase Substances 0.000 abstract description 4
- 230000000379 polymerizing effect Effects 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 38
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 28
- -1 alkyl methacrylate Chemical compound 0.000 description 22
- 230000000694 effects Effects 0.000 description 13
- 238000001816 cooling Methods 0.000 description 10
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- 239000003505 polymerization initiator Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 5
- 238000007142 ring opening reaction Methods 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 2
- OEVVKKAVYQFQNV-UHFFFAOYSA-N 1-ethenyl-2,4-dimethylbenzene Chemical compound CC1=CC=C(C=C)C(C)=C1 OEVVKKAVYQFQNV-UHFFFAOYSA-N 0.000 description 2
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 2
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 2
- WHFHDVDXYKOSKI-UHFFFAOYSA-N 1-ethenyl-4-ethylbenzene Chemical compound CCC1=CC=C(C=C)C=C1 WHFHDVDXYKOSKI-UHFFFAOYSA-N 0.000 description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- 125000003368 amide group Chemical class 0.000 description 2
- 238000012662 bulk polymerization Methods 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- XLYMOEINVGRTEX-UHFFFAOYSA-N fumaric acid monoethyl ester Natural products CCOC(=O)C=CC(O)=O XLYMOEINVGRTEX-UHFFFAOYSA-N 0.000 description 2
- NKHAVTQWNUWKEO-UHFFFAOYSA-N fumaric acid monomethyl ester Natural products COC(=O)C=CC(O)=O NKHAVTQWNUWKEO-UHFFFAOYSA-N 0.000 description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- HDBWAWNLGGMZRQ-UHFFFAOYSA-N p-Vinylbiphenyl Chemical compound C1=CC(C=C)=CC=C1C1=CC=CC=C1 HDBWAWNLGGMZRQ-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical group O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 2
- FVQMJJQUGGVLEP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOOC(C)(C)C FVQMJJQUGGVLEP-UHFFFAOYSA-N 0.000 description 1
- HCXVPNKIBYLBIT-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 3,5,5-trimethylhexaneperoxoate Chemical compound CC(C)(C)CC(C)CC(=O)OOOC(C)(C)C HCXVPNKIBYLBIT-UHFFFAOYSA-N 0.000 description 1
- QEQBMZQFDDDTPN-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy benzenecarboperoxoate Chemical compound CC(C)(C)OOOC(=O)C1=CC=CC=C1 QEQBMZQFDDDTPN-UHFFFAOYSA-N 0.000 description 1
- KDGNCLDCOVTOCS-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy propan-2-yl carbonate Chemical compound CC(C)OC(=O)OOC(C)(C)C KDGNCLDCOVTOCS-UHFFFAOYSA-N 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- UTOVMEACOLCUCK-SNAWJCMRSA-N (e)-4-butoxy-4-oxobut-2-enoic acid Chemical compound CCCCOC(=O)\C=C\C(O)=O UTOVMEACOLCUCK-SNAWJCMRSA-N 0.000 description 1
- XLYMOEINVGRTEX-ONEGZZNKSA-N (e)-4-ethoxy-4-oxobut-2-enoic acid Chemical compound CCOC(=O)\C=C\C(O)=O XLYMOEINVGRTEX-ONEGZZNKSA-N 0.000 description 1
- VTWGIDKXXZRLGH-CMDGGOBGSA-N (e)-4-octoxy-4-oxobut-2-enoic acid Chemical compound CCCCCCCCOC(=O)\C=C\C(O)=O VTWGIDKXXZRLGH-CMDGGOBGSA-N 0.000 description 1
- HVZKWAQLXHTHSG-PLNGDYQASA-N (z)-2-ethyl-3-methylbut-2-enedioic acid Chemical compound CC\C(C(O)=O)=C(/C)C(O)=O HVZKWAQLXHTHSG-PLNGDYQASA-N 0.000 description 1
- IQBLWPLYPNOTJC-FPLPWBNLSA-N (z)-4-(2-ethylhexoxy)-4-oxobut-2-enoic acid Chemical compound CCCCC(CC)COC(=O)\C=C/C(O)=O IQBLWPLYPNOTJC-FPLPWBNLSA-N 0.000 description 1
- UICXTANXZJJIBC-UHFFFAOYSA-N 1-(1-hydroperoxycyclohexyl)peroxycyclohexan-1-ol Chemical compound C1CCCCC1(O)OOC1(OO)CCCCC1 UICXTANXZJJIBC-UHFFFAOYSA-N 0.000 description 1
- QEDJMOONZLUIMC-UHFFFAOYSA-N 1-tert-butyl-4-ethenylbenzene Chemical compound CC(C)(C)C1=CC=C(C=C)C=C1 QEDJMOONZLUIMC-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- XKBHBVFIWWDGQX-UHFFFAOYSA-N 2-bromo-3,3,4,4,5,5,5-heptafluoropent-1-ene Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(Br)=C XKBHBVFIWWDGQX-UHFFFAOYSA-N 0.000 description 1
- CKSAKVMRQYOFBC-UHFFFAOYSA-N 2-cyanopropan-2-yliminourea Chemical compound N#CC(C)(C)N=NC(N)=O CKSAKVMRQYOFBC-UHFFFAOYSA-N 0.000 description 1
- XUDBVJCTLZTSDC-UHFFFAOYSA-N 2-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C=C XUDBVJCTLZTSDC-UHFFFAOYSA-N 0.000 description 1
- BOVPVRGRPPYECC-UHFFFAOYSA-N 2-methoxycarbonylcyclohexane-1-carboxylic acid Chemical compound COC(=O)C1CCCCC1C(O)=O BOVPVRGRPPYECC-UHFFFAOYSA-N 0.000 description 1
- JJRDRFZYKKFYMO-UHFFFAOYSA-N 2-methyl-2-(2-methylbutan-2-ylperoxy)butane Chemical compound CCC(C)(C)OOC(C)(C)CC JJRDRFZYKKFYMO-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- BIISIZOQPWZPPS-UHFFFAOYSA-N 2-tert-butylperoxypropan-2-ylbenzene Chemical compound CC(C)(C)OOC(C)(C)C1=CC=CC=C1 BIISIZOQPWZPPS-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- WFGDTJSCHCKYOK-UHFFFAOYSA-N 3-(2-ethylhexoxycarbonyl)but-3-enoic acid Chemical compound CCCCC(CC)COC(=O)C(=C)CC(O)=O WFGDTJSCHCKYOK-UHFFFAOYSA-N 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- VVAAYFMMXYRORI-UHFFFAOYSA-N 4-butoxy-2-methylidene-4-oxobutanoic acid Chemical compound CCCCOC(=O)CC(=C)C(O)=O VVAAYFMMXYRORI-UHFFFAOYSA-N 0.000 description 1
- HMBNQNDUEFFFNZ-UHFFFAOYSA-N 4-ethenoxybutan-1-ol Chemical compound OCCCCOC=C HMBNQNDUEFFFNZ-UHFFFAOYSA-N 0.000 description 1
- RTTAGBVNSDJDTE-UHFFFAOYSA-N 4-ethoxy-2-methylidene-4-oxobutanoic acid Chemical compound CCOC(=O)CC(=C)C(O)=O RTTAGBVNSDJDTE-UHFFFAOYSA-N 0.000 description 1
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
- OPPHXULEHGYZRW-UHFFFAOYSA-N 4-methoxy-2,4-dimethyl-2-phenyldiazenylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC1=CC=CC=C1 OPPHXULEHGYZRW-UHFFFAOYSA-N 0.000 description 1
- OIYTYGOUZOARSH-UHFFFAOYSA-N 4-methoxy-2-methylidene-4-oxobutanoic acid Chemical compound COC(=O)CC(=C)C(O)=O OIYTYGOUZOARSH-UHFFFAOYSA-N 0.000 description 1
- NFWPZNNZUCPLAX-UHFFFAOYSA-N 4-methoxy-3-methylaniline Chemical compound COC1=CC=C(N)C=C1C NFWPZNNZUCPLAX-UHFFFAOYSA-N 0.000 description 1
- QNRSQFWYPSFVPW-UHFFFAOYSA-N 5-(4-cyanobutyldiazenyl)pentanenitrile Chemical compound N#CCCCCN=NCCCCC#N QNRSQFWYPSFVPW-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- RWAQBACITPYEMT-UHFFFAOYSA-N C1=CC=C(C=C1)C=C(Cl=O)Cl=O Chemical compound C1=CC=C(C=C1)C=C(Cl=O)Cl=O RWAQBACITPYEMT-UHFFFAOYSA-N 0.000 description 1
- RZKGPIFISVSCMM-UHFFFAOYSA-N C=CC1=CC(=C(C=C1)Cl=O)Cl=O Chemical compound C=CC1=CC(=C(C=C1)Cl=O)Cl=O RZKGPIFISVSCMM-UHFFFAOYSA-N 0.000 description 1
- XLYMOEINVGRTEX-ARJAWSKDSA-N Ethyl hydrogen fumarate Chemical compound CCOC(=O)\C=C/C(O)=O XLYMOEINVGRTEX-ARJAWSKDSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- MZVQCMJNVPIDEA-UHFFFAOYSA-N [CH2]CN(CC)CC Chemical group [CH2]CN(CC)CC MZVQCMJNVPIDEA-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- GSCLMSFRWBPUSK-UHFFFAOYSA-N beta-Butyrolactone Chemical group CC1CC(=O)O1 GSCLMSFRWBPUSK-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
本発明は、特定のビニル系モノマーと溶剤を含むビニル系重合体の連続溶液重合方法に関し、より詳しくは、ビニル系重合体を重合する際、反応器の気相部内壁に重合体スケールが付着することを防止したビニル系重合体組成物の製造方法に関する。 The present invention relates to a continuous solution polymerization method of a vinyl polymer containing a specific vinyl monomer and a solvent, and more specifically, when polymerizing a vinyl polymer, a polymer scale adheres to the inner wall of the gas phase part of the reactor. The present invention relates to a method for producing a vinyl polymer composition that is prevented.
従来、ビニル系モノマーを攪拌機付反応器内で連続塊状重合あるいは連続溶液重合する方法が知られている。これら重合方法においては、反応熱の除去、安全および操作上の問題、重合装置上の制限等の理由により、反応器内の全空間を重合反応液で満たして重合を行うことは少なく、通常、気相部分が存在した状態で重合が行われる。 Conventionally, a method of continuous bulk polymerization or continuous solution polymerization of a vinyl monomer in a reactor equipped with a stirrer is known. In these polymerization methods, polymerization is rarely performed by filling the entire space in the reactor with the polymerization reaction solution for reasons such as removal of reaction heat, safety and operational problems, limitations on the polymerization apparatus, etc. Polymerization is carried out in the presence of a gas phase portion.
しかし、気相部分が存在した状態で重合を行った場合、気相中に存在するガス状のモノマーが反応器気相部で重合し、反応器の気相部内壁に多量の重合体スケールが付着することがある。このような重合体が付着すると、ノズルが閉塞したり、攪拌機の機能に障害が起こるなどの機械的異常の発生要因となることがある。また、重合体スケールの剥離スケールが製品中に混入して異常製品が発生することもある。しかも、この付着した重合体スケールの除去には多大な労力と時間を要する場合がある。このように、工場規模で生産を行う場合、反応器の気相部内壁への重合体の付着は大きな問題となる。 However, when polymerization is performed in a state where the gas phase portion exists, the gaseous monomer present in the gas phase is polymerized in the gas phase portion of the reactor, and a large amount of polymer scale is formed on the inner wall of the gas phase portion of the reactor. May adhere. When such a polymer adheres, it may cause a mechanical abnormality such as blocking of the nozzle or failure of the function of the stirrer. In addition, a polymer scale release scale may be mixed in the product to generate an abnormal product. In addition, removal of the attached polymer scale may require a great deal of labor and time. Thus, when production is carried out on a factory scale, the adhesion of the polymer to the inner wall of the gas phase part of the reactor becomes a big problem.
このような反応器気相部内壁への重合体スケールの付着防止方法として、特許文献1には、メタクリル酸メチルを主成分とするモノマーを連続塊状重合するに際し、モノマーの一部を反応液面、反応液面と接触している反応器壁面、および反応液面と接触している攪拌軸に一様に噴霧状態で吹き付けて供給させて重合を行う方法が開示されている。しかしながら、この方法によれば、反応器気相部壁面への重合体スケールの付着を抑制する効果は得られるものの、噴霧媒体として反応性の高いモノマーを使用した場合には、若干の重合体スケールの付着が生じる場合がある。
本発明の目的は、反応器の気相部内壁への重合体スケールの付着を効果的に防止し、生産性よく高品質の製品を得ることが出来る連続溶液重合法によるビニル系重合体組成物の製造方法を提供することにある。 An object of the present invention is to provide a vinyl polymer composition by a continuous solution polymerization method that can effectively prevent the adhesion of polymer scale to the inner wall of the gas phase part of the reactor and obtain a high-quality product with high productivity. It is in providing the manufacturing method of.
本発明者らは、溶剤の噴霧による供給に着目し鋭意検討を行った結果、簡略な工程により前述の問題点が解決できることを見出し、本発明を完成した。 As a result of intensive studies focusing on supply by solvent spraying, the present inventors have found that the above-mentioned problems can be solved by a simple process, and have completed the present invention.
すなわち、本発明は、エポキシ基、水酸基および酸基からなる群より選ばれた1種以上の基を有するビニル系モノマーと、溶剤とを含む反応原料を連続的に槽型反応器に供給し、同時に反応液を連続的に抜き出してビニル系重合体組成物を製造する方法において、前記反応器内には、前記ビニル系モノマーおよび前記溶剤を含む反応液である液相部と、気相部とが存在し、該反応原料のうち該ビニル系モノマーの重合体が可溶である溶剤の一部または全部を、ビニル系モノマーとは別供給路から該反応器の気相部内壁に向けて噴霧しながら連続的に供給させて重合反応を行うことを特徴とするビニル系重合体組成物の製造方法である。 That is, the present invention continuously supplies a reaction raw material containing a vinyl monomer having one or more groups selected from the group consisting of an epoxy group, a hydroxyl group and an acid group, and a solvent to a tank reactor, In the method for producing a vinyl polymer composition by continuously extracting a reaction liquid at the same time, the reactor includes a liquid phase part which is a reaction liquid containing the vinyl monomer and the solvent, a gas phase part, A part or all of the solvent in which the polymer of the vinyl monomer is soluble in the reaction raw material is sprayed from the supply path different from the vinyl monomer toward the inner wall of the gas phase part of the reactor. It is a method for producing a vinyl polymer composition, wherein the polymerization reaction is carried out while continuously supplying the polymer.
本発明によれば、連続溶液重合において重合体スケールの付着を防止できる上に、ビニル系重合体が使用される製品中の溶剤を噴霧溶剤として利用することにより、噴霧溶剤の分離、除去工程を別途設けることもなく、生産性よく高品質なビニル系重合体を得ることができる。 According to the present invention, in addition to preventing adhesion of polymer scale in continuous solution polymerization, the solvent in the product in which the vinyl polymer is used is used as a spraying solvent, thereby separating and removing the spraying solvent. Without providing it separately, a high-quality vinyl polymer can be obtained with high productivity.
すなわち、本発明においては、ビニル系モノマーと溶剤を含む反応原料を連続溶液重合する際において、反応原料に含まれるビニル系重合体が可溶である溶剤の一部または全部を、別供給路により反応器の気相部内壁に向けて噴霧状に連続的に供給させ、反応器気相部内壁を常に洗い流すことにより、重合体スケールの生成を効果的に防止し、反応器気相部内壁への重合体スケールの付着を抑制できる。これにより、洗浄に用いた溶剤を分離することなく、極めて簡便な方法での重合体スケール付着抑制効果を得ることが可能となる。 That is, in the present invention, when continuous reaction polymerization is performed on a reaction raw material containing a vinyl monomer and a solvent, a part or all of the solvent in which the vinyl polymer contained in the reaction raw material is soluble is separated by a separate supply path. Continuously supplying the reactor in the vapor phase toward the inner wall of the gas phase part, and constantly washing away the inner wall of the gas phase of the reactor, effectively preventing the formation of polymer scale, and to the inner wall of the reactor gas phase part. The adhesion of the polymer scale can be suppressed. This makes it possible to obtain a polymer scale adhesion suppressing effect by a very simple method without separating the solvent used for washing.
ここで、重合体スケールとは、一般的な反応装置で見られる固形またはゲル状の付着物である。重合性のモノマーにおいては、気相中の反応性ガスが気相部壁面で滞留し、重合しながら凝集するために生成すると考えられている。従って、反応性物質を壁面に滞留させないことが重要である。そのためには、壁面に接する物質は常に更新されることが好ましい。さらに、壁面に接している溶液中の、反応性物質の濃度は低いことが好ましい。本願発明者らは、このような状況を鑑みて本発明を為すに至った。 Here, the polymer scale is a solid or gel deposit observed in a general reaction apparatus. In the polymerizable monomer, it is considered that the reactive gas in the gas phase stays on the wall surface of the gas phase and aggregates while being polymerized. Therefore, it is important not to make the reactive substance stay on the wall surface. For this purpose, it is preferable that the material in contact with the wall surface is constantly updated. Furthermore, the concentration of the reactive substance in the solution in contact with the wall surface is preferably low. The present inventors have made the present invention in view of such a situation.
一般的には、アルキルメタクリレートやスチレンなどは、重合体スケールの付着は多くはないが、エポキシ基、水酸基または酸基を有するビニル系モノマーでは、重合スケールの付着が多くなり、問題となっている。一般的に、エポキシ基は、開環しやすいために、重合体スケールが付着しやすい。さらに、重合体スケールが付着した際、高温にさらされることにより、エポキシ基が開環し架橋反応を起こし強固な重合体スケールとなるために、通常の方法では洗浄困難となる。また、水酸基、酸基を有するモノマーに関しては、理由は定かではないが、他のモノマーとの重合性や壁面との相互作用に起因すると思われる重合体スケールができやすい。 In general, alkyl methacrylate and styrene do not have much polymer scale adhesion, but vinyl monomer having an epoxy group, hydroxyl group or acid group has a problem because the polymer scale adhesion increases. . Generally, since an epoxy group is easy to open a ring, a polymer scale is easily attached. Furthermore, when the polymer scale is attached, it is exposed to a high temperature, whereby the epoxy group is ring-opened to cause a cross-linking reaction, resulting in a solid polymer scale. In addition, regarding the monomer having a hydroxyl group or an acid group, the reason is not clear, but it is easy to form a polymer scale that may be caused by polymerizability with other monomers or interaction with the wall surface.
本発明によれば、このような重合体スケールの付着しやすいビニル系モノマーに対しても、ビニル系重合体が可溶である溶剤を噴霧することで、スケール付着を防止することが可能となる。 According to the present invention, it is possible to prevent scale adhesion by spraying a solvent in which the vinyl polymer is soluble even to such a vinyl monomer to which the polymer scale easily adheres. .
本発明に使用する溶剤としては、重合温度で不活性であれば特に制限されない。例えば、トルエン、キシレン、SS150(新日本石油化学(株)製)、SS100(新日本石油化学(株)製)のような芳香族系炭化水素類;酢酸エチル、エチル−3−エトキシプロピオネート、酢酸n−ブチルのようなエステル類;メチルエチルケトン、メチルイソブチルケトンのようなケトン類;イソプロパノール、n−ブタノールのようなアルコール類等が挙げられる。 The solvent used in the present invention is not particularly limited as long as it is inert at the polymerization temperature. For example, aromatic hydrocarbons such as toluene, xylene, SS150 (manufactured by Nippon Petrochemical Co., Ltd.), SS100 (manufactured by Shin Nippon Petrochemical Co., Ltd.); ethyl acetate, ethyl-3-ethoxypropionate And esters such as n-butyl acetate; ketones such as methyl ethyl ketone and methyl isobutyl ketone; and alcohols such as isopropanol and n-butanol.
上記の溶剤のうち、芳香族系炭化水素類、エステル類が好ましい。さらに、芳香族系炭化水素類としては炭素数が9〜10の芳香族系炭化水素の混合物、エステル類としてはプロピレングリコールモノメチルエーテルアセテート、エチル3−エトキシプロピオネートがより好ましい。このような溶剤を用いると、重合体スケール付着をより効果的に防止することが可能となる。 Of the above solvents, aromatic hydrocarbons and esters are preferred. Furthermore, as the aromatic hydrocarbons, a mixture of aromatic hydrocarbons having 9 to 10 carbon atoms, and as the esters, propylene glycol monomethyl ether acetate and ethyl 3-ethoxypropionate are more preferable. When such a solvent is used, it becomes possible to more effectively prevent polymer scale adhesion.
低沸点の溶剤を用いた場合、重合温度が高くなると、系内の圧力が高くなるために、槽型反応器の耐圧性を高める必要がある。このような問題は、高沸点の溶剤を用いることで、解決が可能となる。特に、エポキシ基、水酸基、酸基を有するビニル系モノマーは、重合温度が高くなるほど、スケール付着が多くなる傾向にあり、重合温度が130℃以上でスケールが顕著に付着してくるので、このような高温の重合でも槽型反応器の耐圧性を高めることを回避するためには、沸点が130℃以上の溶剤を用いることが好ましい。 When a low-boiling solvent is used, the pressure in the tank reactor needs to be increased because the pressure in the system increases as the polymerization temperature increases. Such a problem can be solved by using a solvent having a high boiling point. In particular, vinyl monomers having an epoxy group, a hydroxyl group, and an acid group tend to increase the scale adhesion as the polymerization temperature increases, and the scale adheres remarkably when the polymerization temperature is 130 ° C. or higher. In order to avoid increasing the pressure resistance of the tank reactor even at high temperature polymerization, it is preferable to use a solvent having a boiling point of 130 ° C. or higher.
溶剤の使用量は、最終的に得られるビニル系重合体が使用される製品の用途に応じて決めることが好ましい。ビニル系モノマー100質量部に対して200質量部以下の割合で反応原料に含まれることが好ましく、ビニル系モノマー100質量部に対して25〜100質量部の割合で反応原料に含まれることがさらに好ましい。 The amount of the solvent used is preferably determined according to the application of the product in which the finally obtained vinyl polymer is used. It is preferably contained in the reaction raw material at a ratio of 200 parts by mass or less with respect to 100 parts by mass of the vinyl monomer, and further included in the reaction raw material at a ratio of 25 to 100 parts by mass with respect to 100 parts by mass of the vinyl monomer. preferable.
重合体スケールの付着を効果的に防止するためには、反応性物質を壁面に滞留させないことが重要であるが、反応性物質の反応性を低下させる方法もある。反応性物質の反応性を低下させる方法としては、例えば一般的な重合禁止剤を添加する方法がある。本発明においても、このような方法をとることも可能である。ただし本発明においては、このような方法をとることなく、すなわち原料以外の物質を用いることなく重合体スケールの付着を効果的に防止するという効果を得ることも可能である。 In order to effectively prevent the adhesion of the polymer scale, it is important not to retain the reactive substance on the wall surface, but there is a method for reducing the reactivity of the reactive substance. As a method of reducing the reactivity of the reactive substance, for example, there is a method of adding a general polymerization inhibitor. In the present invention, such a method can also be taken. However, in the present invention, it is also possible to obtain an effect of effectively preventing adhesion of the polymer scale without taking such a method, that is, without using a substance other than the raw material.
さらに、反応性物質の反応性を低下させる方法として、例えば、温度を下げる方法がある。この方法は非常に効果的である。すなわち、反応器の気相部壁面の温度を下げることで、重合体スケール付着の抑制効果は更に大きくなる。また、温度を下げることで反応性を低下させるだけでなく、気相部のガスを積極的に壁面で凝縮させる効果も期待できる。冷却温度は、重合温度より低ければ特に制限されないが、凝縮効果を大きくさせるためには反応器気相部の圧力における噴霧溶剤の沸点以下が好ましい。冷却方法としては、特に制限はなく、ジャケット式の反応器でジャケットに冷却媒体を流す方法、反応器壁面を、冷却媒体の流れるパイプで冷やす方法などがある。 Furthermore, as a method of reducing the reactivity of the reactive substance, for example, there is a method of lowering the temperature. This method is very effective. That is, the effect of suppressing the polymer scale adhesion is further increased by lowering the temperature of the gas phase wall of the reactor. In addition to reducing the reactivity by lowering the temperature, the effect of positively condensing the gas in the gas phase on the wall surface can be expected. The cooling temperature is not particularly limited as long as it is lower than the polymerization temperature, but is preferably not higher than the boiling point of the spray solvent at the pressure in the gas phase part of the reactor in order to increase the condensation effect. The cooling method is not particularly limited, and includes a method in which a cooling medium is passed through the jacket using a jacket-type reactor, and a method in which the reactor wall surface is cooled with a pipe through which the cooling medium flows.
本発明においては、例えば、攪拌装置、原料供給装置、反応生成物の抜き出し装置を備えた、一般的な連続槽型反応器を用いて、連続溶液重合を行うことができる。この連続溶液重合においては、重合終了後のシャットダウンでは反応原料供給を停止し、反応生成物を抜き出していく方法が一般的である。この方法の場合、反応生成物を抜き出した後の壁面で溶液が蒸発し、壁面が乾燥することで、重合体スケールが付着する場合がある。従って、シャットダウン時に、溶剤の噴霧を継続すれば、このような乾燥を防止することができ、重合体スケール付着抑制効果は更に大きくなるので好ましい。 In the present invention, for example, continuous solution polymerization can be performed using a general continuous tank reactor equipped with a stirring device, a raw material supply device, and a reaction product extraction device. In this continuous solution polymerization, a general method is to stop the supply of the reaction raw material and to extract the reaction product in the shutdown after the completion of the polymerization. In the case of this method, the solution evaporates on the wall surface after extracting the reaction product and the wall surface is dried, so that the polymer scale may adhere. Therefore, it is preferable to continue spraying the solvent at the time of shutdown because such drying can be prevented and the effect of suppressing the polymer scale adhesion is further increased.
本発明において、溶剤を噴霧して供給する方法としては、噴霧状、シャワー状、スリットからの供給等、壁面を濡らすものであれば、特に限定されない。ただし、濡れない箇所を少なくすることで重合体スケール付着抑制効果が大きくなるので、特に好ましい方法として、スプレーノズルを用いる方法が挙げられる。スプレーノズルとしては、フラットスプレーノズル、長円吹ノズル、楕円吹ノズル、角吹ノズル、ホロコーンノズル、フルコーンノズル、サイドスプレーノズル、多孔式ノズル等が挙げられる。反応器の形状、大きさに応じて、スプレーノズルを1個または2個以上を組み合わせて使用しても良い。スプレーノズルの材質は、耐食性を有するものであれば特に制限されず、通常、ステンレス鋼が用いられる。 In the present invention, the method of spraying and supplying the solvent is not particularly limited as long as it wets the wall surface, such as spray, shower, or supply from a slit. However, since the effect of suppressing polymer scale adhesion is increased by reducing the number of portions that do not get wet, a method using a spray nozzle is particularly preferable. Examples of the spray nozzle include a flat spray nozzle, an oblong spray nozzle, an elliptical spray nozzle, a square spray nozzle, a holocorn nozzle, a full cone nozzle, a side spray nozzle, and a porous nozzle. Depending on the shape and size of the reactor, one or a combination of two or more spray nozzles may be used. The material of the spray nozzle is not particularly limited as long as it has corrosion resistance, and stainless steel is usually used.
反応原料に含まれるビニル系モノマーとしては、エポキシ基、水酸基および酸基からなる群より選ばれた1種以上の基を有するビニル系モノマーであれば特に限定はされず、最終的に得られるビニル系重合体の用途に応じて選べばよい。例えば、エポキシ基を有するビニルモノマー類、水酸基を有するモノマー類、酸基を有するモノマー類、炭化水素置換基を有する(メタ)アクリル酸エステル類、スチレン系モノマー類、エチレン性不飽和ニトリル類、ビニルエステル類、エチレン性不飽和塩基性ビニルモノマー類、N−アルコキシアルキル置換アミド基を有するα,β−不飽和ビニルモノマー類などが挙げられる。これらの中でも、スチレン系モノマー、上述したモノマー類の中のアクリル系モノマーが好適に用いられる。これは、塗料、粘着剤、コーティング剤などに使用されるビニル系重合体としては、スチレン系モノマーおよび/またはアクリル系モノマーを重合した重合体が好ましいためである。 The vinyl monomer contained in the reaction raw material is not particularly limited as long as it is a vinyl monomer having one or more groups selected from the group consisting of an epoxy group, a hydroxyl group, and an acid group. What is necessary is just to select according to the use of a polymer. For example, vinyl monomers having an epoxy group, monomers having a hydroxyl group, monomers having an acid group, (meth) acrylic acid esters having a hydrocarbon substituent, styrene monomers, ethylenically unsaturated nitriles, vinyl Examples include esters, ethylenically unsaturated basic vinyl monomers, and α, β-unsaturated vinyl monomers having an N-alkoxyalkyl-substituted amide group. Among these, styrene monomers and acrylic monomers among the above-described monomers are preferably used. This is because a polymer obtained by polymerizing a styrene monomer and / or an acrylic monomer is preferable as a vinyl polymer used for a paint, an adhesive, a coating agent and the like.
エポキシ基を有するビニルモノマー類としては、例えば、グリシジル(メタ)アクリレート、メチルグリシジル(メタ)アクリレート、アリルグリシジルエーテル等が挙げられる。これらの中でも、特に好ましいエポキシ基を有するビニルモノマー類としては、グリシジル(メタ)アクリレート等が挙げられる。 Examples of vinyl monomers having an epoxy group include glycidyl (meth) acrylate, methyl glycidyl (meth) acrylate, and allyl glycidyl ether. Among these, particularly preferable vinyl monomers having an epoxy group include glycidyl (meth) acrylate.
水酸基を有するモノマーとしては、例えば、2−ヒドロキシエチル(メタ)アクリレート、2−ヒドロキシプロピル(メタ)アクリレート、3−ヒドロキシプロピル(メタ)アクリレート、2−ヒドロキシブチル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレート、6−ヒドロキシヘキシル(メタ)アクリレート等のヒドロキシアルキル基を有する(メタ)アクリル酸エステル類、2−ヒドロキシエチル(メタ)アクリレートへのβ−ブチロラクトン開環付加物、2−ヒドロキシエチル(メタ)アクリレートへのε−カプロラクトン開環付加物、(メタ)アクリル酸へのエチレンオキシドの開環付加物、(メタ)アクリル酸へのプロピレンオキシドの開環付加物、2−ヒドロキシエチル(メタ)アクリレートまたは2−ヒドロキシプロピル(メタ)アクリレートの2量体や3量体等の末端に水酸基を有する(メタ)アクリル酸エステル類、4−ヒドロキシブチルビニルエーテル、p−ヒドロキシスチレン等の他の水酸基含有ビニルモノマー類等が挙げられる。特に好ましい水酸基を有するモノマーとしては、2−ヒドロキシエチル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレート等が挙げられる。 Examples of the monomer having a hydroxyl group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 4-hydroxybutyl ( (Meth) acrylate, (meth) acrylic acid ester having a hydroxyalkyl group such as 6-hydroxyhexyl (meth) acrylate, β-butyrolactone ring-opening adduct to 2-hydroxyethyl (meth) acrylate, 2-hydroxyethyl ( Ε-caprolactone ring-opening adduct to (meth) acrylate, ring-opening adduct of ethylene oxide to (meth) acrylic acid, ring-opening adduct of propylene oxide to (meth) acrylic acid, 2-hydroxyethyl (meth) acrylate Or 2-hydroxy Other hydroxyl group-containing vinyl monomers such as (meth) acrylic acid esters having 4-hydroxybutyl vinyl ether, p-hydroxystyrene, etc. having a hydroxyl group at the terminal, such as dimers and trimers of propyl (meth) acrylate It is done. Particularly preferable examples of the monomer having a hydroxyl group include 2-hydroxyethyl (meth) acrylate and 4-hydroxybutyl (meth) acrylate.
酸基を有するモノマーとしては、例えば、メタクリル酸、アクリル酸、クロトン酸、ビニル安息香酸、フマール酸、イタコン酸、マレイン酸、シトラコン酸等の一塩基酸または二塩基酸ビニルモノマー類、無水マレイン酸等の二塩基酸無水物ビニルモノマー類、β−カルボキシエチル(メタ)アクリレート、β−カルボキシプロピル(メタ)アクリレート、β−(メタ)アクリロキシエチルアシッドサクシネート、β−(メタ)アクリロキシエチルアシッドマレエート、β−(メタ)アクリロキシエチルアシッドフタレート、β−(メタ)アクリロキシエチルアシッドヘキサヒドロフタレート、β−(メタ)アクリロキシエチルアシッドメチルヘキサヒドロフタレート、Y−(メタ)アクリロキシプロピルアシッドサクシネート、2−ヒドロキシエチル(メタ)アクリレートへのε−カプロラクトンまたはY−ブチロラクトンの開環付加物(例えば、ダイセル化学(株)製プラクセルF単量体、UCC社製トーンM単量体)の末端水酸基を無水コハク酸、無水フタル酸、あるいは無水ヘキサヒドロフタル酸でエステル化して末端にカルボキシル基を導入したコハク酸モノエステル、フタル酸モノエステル、あるいは無水ヘキサヒドロフタル酸モノエステル等のカプロラクトン変性水酸基含有(メタ)アクリル酸エステルと二塩基酸無水物のモノエステル反応生成物等の長鎖カルボキシル基含有ビニルモノマー類、マレイン酸モノメチル、マレイン酸モノエチル、マレイン酸モノブチル、マレイン酸モノオクチル、イタコン酸モノメチル、イタコン酸モノエチル、イタコン酸モノブチル、イタコン酸モノオクチル、イタコン酸モノ2−エチルヘキシル、フマール酸モノメチル、フマール酸モノエチル、フマール酸モノブチル、フマール酸モノオクチル、シトラコン酸モノエチル等の二塩基酸または二塩基酸無水物ビニルモノマーのモノエステル化物類等が挙げられる。特に好ましい酸基を有するモノマーとしては、無水マレイン酸等が挙げられる。 Examples of the monomer having an acid group include monobasic or dibasic vinyl monomers such as methacrylic acid, acrylic acid, crotonic acid, vinyl benzoic acid, fumaric acid, itaconic acid, maleic acid, citraconic acid, maleic anhydride, and the like. Dibasic acid anhydride vinyl monomers such as β-carboxyethyl (meth) acrylate, β-carboxypropyl (meth) acrylate, β- (meth) acryloxyethyl acid succinate, β- (meth) acryloxyethyl acid Maleate, β- (meth) acryloxyethyl acid phthalate, β- (meth) acryloxyethyl acid hexahydrophthalate, β- (meth) acryloxyethyl acid methyl hexahydrophthalate, Y- (meth) acryloxypropyl acid Succinate, 2-hydroxy The terminal hydroxyl group of the ring-opening adduct of ε-caprolactone or Y-butyrolactone to til (meth) acrylate (eg, Plaxel F monomer manufactured by Daicel Chemical Industries, Inc., tone M monomer manufactured by UCC) is succinic anhydride. Caprolactone-modified hydroxyl group-containing (meth) acrylic ester such as succinic acid monoester, phthalic acid monoester or hexahydrophthalic anhydride monoester esterified with phthalic anhydride or hexahydrophthalic anhydride and introduced with a carboxyl group at the terminal Long chain carboxyl group-containing vinyl monomers such as monoester reaction products of acid ester and dibasic acid anhydride, monomethyl maleate, monoethyl maleate, monobutyl maleate, monooctyl maleate, monomethyl itaconate, monoethyl itaconate, Monobutyl itaconate, ita Monoesters of dibasic acid or dibasic anhydride vinyl monomers such as monooctyl acrylate, mono-2-ethylhexyl itaconate, monomethyl fumarate, monoethyl fumarate, monobutyl fumarate, monooctyl fumarate, monoethyl citraconic acid Etc. A particularly preferable monomer having an acid group includes maleic anhydride.
炭化水素置換基を有する(メタ)アクリル酸エステル類としては、例えば、メチル(メタ)アクリレート、エチル(メタ)アクリレート、n−プロピル(メタ)アクリレート、n−ブチル(メタ)アクリレート、i−ブチル(メタ)アクリレート、t−ブチル(メタ)アクリレート、sec−ブチル(メタ)アクリレート、n−ペンチル(メタ)アクリレート、n−オクチル(メタ)アクリレート、ラウリル(メタ)アクリレート、ステアリル(メタ)アクリレート、トリデシル(メタ)アクリレート、2−エチルヘキシル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、フェニル(メタ)アクリレート、ベンジル(メタ)アクリレート、イソボロニル(メタ)アクリレート等が挙げられる。 Examples of (meth) acrylic acid esters having a hydrocarbon substituent include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, n-butyl (meth) acrylate, i-butyl ( (Meth) acrylate, t-butyl (meth) acrylate, sec-butyl (meth) acrylate, n-pentyl (meth) acrylate, n-octyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, tridecyl ( Examples include meth) acrylate, 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, phenyl (meth) acrylate, benzyl (meth) acrylate, and isobornyl (meth) acrylate.
スチレン系モノマーとしては、例えば、スチレン、o−メチルスチレン、m−メチルスチレン、p−メチルスチレン、α−メチルスチレン、p−エチルスチレン、2,4−ジメチルスチレン、p−n−ブチルスチレン、p−tert−ブチルスチレン、p−n−ヘキシルスチレン、p−n−オクチルスチレン、p−n−ノニルスチレン、p−n−デシルスチレン、p−n−ドデシルスチレン、p−フェニルスチレン、3,4−ジクロシルスチレン、ビニルトルエン等のスチレン誘導体類などが挙げられる。 Examples of the styrene monomer include styrene, o-methyl styrene, m-methyl styrene, p-methyl styrene, α-methyl styrene, p-ethyl styrene, 2,4-dimethyl styrene, pn-butyl styrene, p. -Tert-butyl styrene, pn-hexyl styrene, pn-octyl styrene, pn-nonyl styrene, pn-decyl styrene, pn-dodecyl styrene, p-phenyl styrene, 3,4- Examples thereof include styrene derivatives such as dichlorosyl styrene and vinyl toluene.
これらの中でも、特に好ましいスチレン系モノマーとしては、スチレン、o−メチルスチレン、m−メチルスチレン、p−メチルスチレン、α−メチルスチレン、p−エチルスチレン、2,4−ジメチルスチレン、p−n−ブチルスチレン、p−tert−ブチルスチレン、p−n−ヘキシルスチレン、p−n−オクチルスチレン、p−n−ノニルスチレン、p−n−デシルスチレン、p−n−ドデシルスチレン、p−フェニルスチレン、3,4−ジクロシルスチレン、ビニルトルエン等が挙げられる。 Among these, particularly preferable styrenic monomers include styrene, o-methylstyrene, m-methylstyrene, p-methylstyrene, α-methylstyrene, p-ethylstyrene, 2,4-dimethylstyrene, and pn-. Butyl styrene, p-tert-butyl styrene, pn-hexyl styrene, pn-octyl styrene, pn-nonyl styrene, pn-decyl styrene, pn-dodecyl styrene, p-phenyl styrene, 3,4-Dichlorosyl styrene, vinyl toluene, etc. are mentioned.
エチレン性不飽和ニトリル類としては、アクリロニトリル、メタクリロニトリル等が挙げられる。 Examples of the ethylenically unsaturated nitriles include acrylonitrile and methacrylonitrile.
ビニルエステル類としては、例えば、酢酸ビニル等が挙げられる。 Examples of vinyl esters include vinyl acetate.
エチレン性不飽和塩基性ビニルモノマー類としては、ジメチルアミノエチル(メタ)アクリレート、ジエチルアミノエチル(メタ)アクリレート等が挙げられる。 Examples of the ethylenically unsaturated basic vinyl monomers include dimethylaminoethyl (meth) acrylate and diethylaminoethyl (meth) acrylate.
N−アルコキシアルキル置換アミド基を有するα,β−不飽和ビニルモノマー類等としては、例えば、N−メトキシメチルアクリルアミド、N−メトキシメチルメタクリルアミド、N−エトキシメチルアクリルアミド、N−プロポキシメチルアクリルアミド、N−ブトキシメチルアクリルアミド等が挙げられる。これらは、必要に応じて単独であるいは2種以上を併用して用いることができる。 Examples of α, β-unsaturated vinyl monomers having an N-alkoxyalkyl-substituted amide group include N-methoxymethyl acrylamide, N-methoxymethyl methacrylamide, N-ethoxymethyl acrylamide, N-propoxymethyl acrylamide, N -Butoxymethyl acrylamide etc. are mentioned. These may be used alone or in combination of two or more as required.
また、上述したビニル系モノマーの中の特に好ましいアクリル系モノマーとしては、メチル(メタ)アクリレート、エチル(メタ)アクリレート、n−ブチル(メタ)アクリレート、t−ブチル(メタ)アクリレート、i−ブチル(メタ)アクリレート、n−オクチル(メタ)アクリレート、ラウリル(メタ)アクリレート、ステアリル(メタ)アクリレート、2−エチルヘキシル(メタ)アクリレート、イソボルニル(メタ)アクリレート等の炭化水素置換基を有する(メタ)アクリル酸エステル類、2−ヒドロキシエチル(メタ)アクリレート、2−ヒドロキシプロピル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレート等のヒドロキシアルキル基を有する(メタ)アクリル酸エステル類が挙げられる。 Particularly preferable acrylic monomers among the above-mentioned vinyl monomers include methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, t-butyl (meth) acrylate, i-butyl ( (Meth) acrylic acid having a hydrocarbon substituent such as (meth) acrylate, n-octyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, isobornyl (meth) acrylate, etc. (Meth) acrylic acid ester which has hydroxyalkyl groups, such as ester, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, is mentioned.
重合工程では、重合促進剤として重合開始剤を反応原料に含有させて反応器に供給することもできる。 In the polymerization step, a polymerization initiator as a polymerization accelerator can be contained in the reaction raw material and supplied to the reactor.
重合開始剤としては、重合温度で分解してラジカルを発生できれば特に制限されず、例えば、2,2−ビス(4,4−ジ−t−ブチルパーオキシシクロヘキシル)プロパン、t−ブチルパーオキシ 2−エチルヘキサノエート、t−ブチルパーオキシラウレート、t−ブチルパーオキシ3,5,5−トリメチルヘキサノエート、シクロヘキサノンパーオキサイド、t−ブチルパーオキシイソプロピルカーボネート、t−ブチルパーオキシアセテート、t−ブチルパーオキシベンゾエート、t−ヘキシルパーオキシ2−エチルヘキサノエート、ジクミルパーオキサイド、t−ブチルクミルパーオキサイド、ジイソプロピルベンゼンハイドロパーオキサイド、ジ−t−ブチルパーオキサイド、ジ−t−アミルパーオキサイド、ジ−t−ヘキシルパーオキサイド、p−メタンハイドロパーオキサイド、クメンハイドロパーオキサイド、t−ブチルハイドロパーオキサイド等の有機過酸化物、アゾビスイソブチルニトリル、アゾビスバレロニトリル、2−(カルバモイルアゾ)イソブチロニトリル、2,2−アゾビス(2,4,4−トリメチルペンタン)、2−フェニルアゾ−2,4−ジメチル−4−メトキシバレロニトリル等のアゾ化合物、過硫酸カリウム等の過硫酸塩、レドックス系重合開始剤等が挙げられ、このような重合開始剤の使用量には特に制限はなく、重合温度や目的とする重合体添加率によって適宜決定されるが、通常、ビニル系モノマー100質量部に対して0.001〜12質量部の割合で含まれるものが好ましい。 The polymerization initiator is not particularly limited as long as it can be decomposed at the polymerization temperature to generate radicals. For example, 2,2-bis (4,4-di-t-butylperoxycyclohexyl) propane, t-butylperoxy 2 -Ethyl hexanoate, t-butyl peroxylaurate, t-butyl peroxy 3,5,5-trimethylhexanoate, cyclohexanone peroxide, t-butyl peroxyisopropyl carbonate, t-butyl peroxyacetate, t -Butylperoxybenzoate, t-hexylperoxy 2-ethylhexanoate, dicumyl peroxide, t-butylcumyl peroxide, diisopropylbenzene hydroperoxide, di-t-butyl peroxide, di-t-amylper Oxide, di-t-hexyl par Organic peroxides such as oxide, p-methane hydroperoxide, cumene hydroperoxide, t-butyl hydroperoxide, azobisisobutylnitrile, azobisvaleronitrile, 2- (carbamoylazo) isobutyronitrile, 2, Azo compounds such as 2-azobis (2,4,4-trimethylpentane) and 2-phenylazo-2,4-dimethyl-4-methoxyvaleronitrile, persulfates such as potassium persulfate, redox polymerization initiators, etc. The amount of such a polymerization initiator used is not particularly limited and is appropriately determined depending on the polymerization temperature and the target polymer addition rate, but is usually 0.001 with respect to 100 parts by mass of the vinyl monomer. What is contained in the ratio of -12 mass parts is preferable.
本発明では、最終的に得られるビニル系重合体が使用される製品が溶剤を含むため、ビニル系重合体を得た後に、ビニル系重合体から溶剤を分離、除去しなくてもよい。このようにすることより、多大な手間、多量のエネルギーを必要とする溶剤の除去が不要となり、ビニル系重合体の製造に要するコストがさらに低下する。 In the present invention, since the product using the finally obtained vinyl polymer contains a solvent, it is not necessary to separate and remove the solvent from the vinyl polymer after obtaining the vinyl polymer. By doing so, it is not necessary to remove a solvent that requires a lot of labor and a large amount of energy, and the cost required for the production of the vinyl polymer is further reduced.
以下、実施例により本発明を更に詳細に説明する。以下の記載において「部」は「質量部」を意味する。 Hereinafter, the present invention will be described in more detail with reference to examples. In the following description, “part” means “part by mass”.
[実施例1]
攪拌翼、原料供給ライン、重合物排出ライン、窒素加圧ライン、温調装置を備えた連続式槽型反応器を用い、スチレン10部、i―ブチルメタクリレート35部、グリシジルメタクリレート35部、2−ヒドロキシエチルメタクリレート20部に、溶剤としてSS150(新日本石油化学(株)製)10部、更に重合開始剤としてジターシャリーブチルパーオキサイド(日本油脂(株)製、商品名パーブチルD)5部を添加した反応原料を、220℃、1.0MPaに保たれた反応器に滞在時間が10分となるように連続的に供給し、重合した。それと同時に、噴霧溶剤としてSS150を20部別供給路にてスプレーノズル1個を使用し、反応器気相部壁面に噴霧状に供給した。また、反応器内から反応重合体をギアポンプで連続的に抜き出した。3時間の定常運転を行ったところ、反応器内には若干の膜状の汚れはあったが、重合体スケールの付着は見られなかった。
[Example 1]
Using a continuous tank reactor equipped with a stirring blade, a raw material supply line, a polymer discharge line, a nitrogen pressure line, and a temperature control device, 10 parts of styrene, 35 parts of i-butyl methacrylate, 35 parts of glycidyl methacrylate, 2- To 20 parts of hydroxyethyl methacrylate, 10 parts of SS150 (Shin Nippon Petrochemical Co., Ltd.) as a solvent and 5 parts of ditertiary butyl peroxide (Nippon Yushi Co., Ltd., trade name Perbutyl D) as a polymerization initiator are added. The reaction raw material was continuously supplied to a reactor maintained at 220 ° C. and 1.0 MPa so that the residence time was 10 minutes, and polymerization was performed. At the same time, one spray nozzle was used as a spraying solvent for SS150 in a 20-part supply path, and was supplied to the reactor gas-phase wall surface in a spray form. Moreover, the reaction polymer was continuously extracted from the reactor with a gear pump. When steady operation was carried out for 3 hours, there was some film-like contamination in the reactor, but no polymer scale was observed.
[実施例2]
反応器気相部を冷却ジャケットにより冷却したこと以外は、実施例1と同様にして重合反応を行った。3時間の定常運転を行ったところ、反応器内には若干の膜状の汚れはあったが、重合体スケールの付着は見られなかった。
[Example 2]
The polymerization reaction was performed in the same manner as in Example 1 except that the reactor gas phase was cooled by the cooling jacket. When steady operation was carried out for 3 hours, there was some film-like contamination in the reactor, but no polymer scale was observed.
[実施例3]
攪拌翼、原料供給ライン、重合物排出ライン、窒素加圧ライン、温調装置、気相部の冷却ジャケットを備えた連続式槽型反応器を用い、スチレン75部、n―ブチルアクリレート20部、4−ヒドロキシブチルアクリレート5部に、溶剤としてSS150を10部、更に重合開始剤としてジターシャリーブチルパーオキサイド4部を添加した反応原料を、220℃、1.0MPaに保たれた反応器に滞在時間が10分となるように連続的に供給し、重合した。それと同時に、噴霧溶剤としてSS150を10部別供給路にてスプレーノズル1個を使用し、冷却ジャケットにより冷却された反応器気相部壁面に噴霧状に供給した。また、反応器内から反応重合体をギアポンプで連続的に抜き出した。3時間の定常運転を行ったところ、反応器内には重合体スケールの付着は見られなかった。
[Example 3]
Using a continuous tank reactor equipped with a stirring blade, a raw material supply line, a polymer discharge line, a nitrogen pressurization line, a temperature control device, and a cooling jacket for the gas phase part, 75 parts of styrene, 20 parts of n-butyl acrylate, Residence time of a reaction raw material obtained by adding 10 parts of SS150 as a solvent and 4 parts of ditertiary butyl peroxide as a polymerization initiator to 5 parts of 4-hydroxybutyl acrylate in a reactor maintained at 220 ° C. and 1.0 MPa Was continuously fed and polymerized so as to be 10 minutes. At the same time, SS150 was sprayed as a spray solvent in a 10-part supply path, and was sprayed to the reactor gas phase wall surface cooled by the cooling jacket. Moreover, the reaction polymer was continuously extracted from the reactor with a gear pump. When steady operation was performed for 3 hours, no polymer scale was observed in the reactor.
[実施例4]
実施例3と同じ連続式槽型反応器を用い、スチレン35部、メチルメタクリレート35部、無水マレイン酸30部、溶剤としてプロピレングリコールモノメチルエーテルアセテート20部、更に重合開始剤としてジターシャリーブチルパーオキサイド6部を添加した反応原料を、200℃、1.0MPaに保たれた反応器に滞在時間が10分となるように連続的に供給し、重合した。それと同時に、噴霧溶剤としてプロピレングリコールモノメチルエーテルアセテート20部を別供給路にてスプレーノズル1個を使用し、冷却ジャケットにより冷却された反応器気相部壁面に噴霧状に供給した。また、反応器内から反応重合体をギアポンプで連続的に抜き出した。4時間の定常運転を行ったところ、反応器内には重合体スケールの付着は見られなかった。
[Example 4]
Using the same continuous tank reactor as in Example 3, 35 parts of styrene, 35 parts of methyl methacrylate, 30 parts of maleic anhydride, 20 parts of propylene glycol monomethyl ether acetate as a solvent, and ditertiary butyl peroxide 6 as a polymerization initiator The reaction raw material to which the part was added was continuously fed to a reactor maintained at 200 ° C. and 1.0 MPa so that the residence time was 10 minutes, and polymerization was performed. At the same time, 20 parts of propylene glycol monomethyl ether acetate as a spraying solvent was supplied to the reactor gas phase part wall surface cooled by the cooling jacket in a spray form using one spray nozzle in a separate supply path. Moreover, the reaction polymer was continuously extracted from the reactor with a gear pump. When steady operation was performed for 4 hours, no polymer scale was observed in the reactor.
[比較例1]
溶剤の噴霧状供給を行わず、反応原料内の溶剤(SS150)の量を30部に増量したこと以外は、実施例1と同様にして重合反応を行った。3時間の定常運転後、反応器内を観察した結果、反応器気相部壁面、硬い層状の重合体スケールの付着が見られた。また、攪拌軸部に固形の重合体スケールの付着が見られた。この重合体スケール2gをアセトン、トルエン、SS150、各15gに浸漬し、25℃で5時間保持したが、どの溶剤においても全く溶解しなかった。
[Comparative Example 1]
The polymerization reaction was carried out in the same manner as in Example 1 except that the solvent was not sprayed and the amount of the solvent (SS150) in the reaction raw material was increased to 30 parts. As a result of observing the inside of the reactor after steady operation for 3 hours, adhesion of a reactor gas phase wall and a hard layered polymer scale was observed. Moreover, adhesion of a solid polymer scale was seen in the stirring shaft part. Although 2 g of this polymer scale was immersed in 15 g of acetone, toluene, and SS150, and held at 25 ° C. for 5 hours, it did not dissolve in any solvent.
[比較例2]
溶剤の噴霧状供給を行わず、反応原料内の溶剤(SS150)の量を30部に増量したこと以外は、実施例2と同様にして重合反応を行った。3時間の定常運転後、反応器内を観察した結果、気相部の冷却ジャケット部に若干の膜状の重合体スケールの付着が見られた。また、気相部の冷却されていない部分に硬い膜状の重合体スケールの付着が見られた。さらに、攪拌軸部に、固形の重合体スケールの付着が見られた。
[Comparative Example 2]
The polymerization reaction was carried out in the same manner as in Example 2 except that the solvent was not supplied in a spray form and the amount of the solvent (SS150) in the reaction raw material was increased to 30 parts. As a result of observing the inside of the reactor after steady operation for 3 hours, some film-like polymer scale was attached to the cooling jacket portion of the gas phase portion. In addition, adhesion of a hard film-like polymer scale was observed in an uncooled portion of the gas phase portion. Furthermore, adhesion of a solid polymer scale was observed on the stirring shaft.
[比較例3]
噴霧媒体として溶剤の代わりに、重合開始剤を含まない反応原料130部中の20部を噴霧状に供給したこと以外は、実施例1と同様にして重合反応を行った。反応器内を観察した結果、反応器気相部壁面に若干の膜状の重合体スケールの付着が見られた。また、攪拌軸部に、若干の固形の重合体スケールの付着が見られた。
[Comparative Example 3]
The polymerization reaction was carried out in the same manner as in Example 1 except that 20 parts in 130 parts of the reaction raw material not containing a polymerization initiator was supplied as a spraying medium instead of the solvent. As a result of observing the inside of the reactor, some film-like polymer scale was adhered to the wall surface of the gas phase part of the reactor. Further, a slight amount of solid polymer scale adhered to the stirring shaft.
[評価結果]
以上説明した結果から明らかなように、実施例1では噴霧媒体として溶剤を使用しているため、反応器気相部壁面を洗い流す効果が大きく、運転後に重合体スケールの付着は見られなかったが、若干の膜状の汚れが確認できた。また、実施例2〜4では、実施例1に加えて反応器気相部のジャケット冷却をあわせることにより、気相部壁面において、重合体スケール抑制効果が大きく、重合体スケールの付着は見られなかったが、液相部では若干の膜状の汚れが確認できた。重合体スケールの付着、汚れは確認されなかった。
[Evaluation results]
As is clear from the results described above, Example 1 uses a solvent as the spray medium, so the effect of washing away the wall surface of the gas phase in the reactor is large, and no adhesion of polymer scale was observed after operation. Some film-like dirt was confirmed. In Examples 2 to 4, in addition to Example 1, by combining jacket cooling of the gas phase part of the reactor, the effect of suppressing polymer scale is large on the wall surface of the gas phase part, and adhesion of polymer scale is observed. Although no film-like soiling was observed in the liquid phase part. Adhesion and contamination of the polymer scale were not confirmed.
これに対し、比較例1では噴霧媒体が無いので、反応器気相部壁面を洗い流すことができず、また、気相部の冷却を行っていないため気相部に存在するガス状のモノマーの凝縮を効果的に行うことができず、反応器気相部壁面にて凝縮されモノマーが壁面に滞留し続け、異常重合を起こし、気相部壁面のほぼ全面に溶剤に不溶な重合体スケールを形成してしまった。比較例2では、冷却ジャケットの効果により冷却部分での重合体スケールの抑制効果が見られた。しかし、気相部の冷却されていない部分、攪拌軸部には重合体スケールの付着が確認された。比較例3では、噴霧媒体として反応原料を用いたため、反応器気相部壁面を洗い流す効果はあるものの、噴霧媒体自体が反応性の液体なので反応器気相部壁面、攪拌軸部において若干の重合体スケールの付着が確認され、完全に重合体スケールの付着を防止するには至らなかった。 On the other hand, in Comparative Example 1, since there is no spraying medium, the reactor gas-phase part wall surface cannot be washed away, and since the gas-phase part is not cooled, the gaseous monomer present in the gas-phase part Condensation cannot be carried out effectively, and condensation continues on the wall surface of the gas phase in the reactor and the monomer continues to stay on the wall surface, causing abnormal polymerization, and a polymer scale that is insoluble in the solvent is formed on almost the entire wall surface of the gas phase. It has formed. In Comparative Example 2, the effect of suppressing the polymer scale at the cooling portion was observed due to the effect of the cooling jacket. However, it was confirmed that the polymer scale adhered to the uncooled portion of the gas phase portion and the stirring shaft portion. In Comparative Example 3, since the reaction raw material was used as the spraying medium, there was an effect of washing away the reactor gas phase wall surface. However, since the spray medium itself is a reactive liquid, a slight amount of weight is applied to the reactor gas phase wall surface and the stirring shaft. The adhesion of the coal scale was confirmed, and the adhesion of the polymer scale was not completely prevented.
それら実施例1〜4および比較例1〜3の評価結果を、まとめて下記表1に示す。 The evaluation results of Examples 1 to 4 and Comparative Examples 1 to 3 are collectively shown in Table 1 below.
Claims (9)
前記反応器内には、前記ビニル系モノマーおよび前記溶剤を含む反応液である液相部と、気相部とが存在し、該反応原料のうち該ビニル系モノマーの重合体が可溶である溶剤の一部または全部を、ビニル系モノマーとは別供給路から該反応器の気相部内壁に向けて噴霧しながら連続的に供給させて重合反応を行うことを特徴とするビニル系重合体組成物の製造方法。 A reaction raw material containing a vinyl monomer having one or more groups selected from the group consisting of an epoxy group, a hydroxyl group and an acid group, and a solvent is continuously supplied to the tank reactor, and the reaction solution is continuously supplied. In the method of producing a vinyl polymer composition by extracting into
In the reactor, there are a liquid phase part which is a reaction liquid containing the vinyl monomer and the solvent, and a gas phase part, and the polymer of the vinyl monomer is soluble in the reaction raw material. A vinyl polymer characterized in that a polymerization reaction is carried out by continuously supplying a part or all of a solvent from a supply path separate from the vinyl monomer while spraying toward the gas phase inner wall of the reactor. A method for producing the composition.
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JPH04372603A (en) * | 1991-06-20 | 1992-12-25 | Mitsubishi Petrochem Co Ltd | Production of water-soluble or water-swelling polymer |
JPH11116638A (en) * | 1997-10-09 | 1999-04-27 | Nippon Synthetic Chem Ind Co Ltd:The | Polymerization of ethylene-vinyl acetate copolymer |
JP2000226417A (en) * | 1999-02-04 | 2000-08-15 | Denki Kagaku Kogyo Kk | Preparation of copolymer |
JP2003095996A (en) * | 2001-09-27 | 2003-04-03 | Idemitsu Petrochem Co Ltd | METHOD FOR PRODUCING LOW GRADE POLYMER OF alpha-OLEFIN |
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JPH04372603A (en) * | 1991-06-20 | 1992-12-25 | Mitsubishi Petrochem Co Ltd | Production of water-soluble or water-swelling polymer |
JPH11116638A (en) * | 1997-10-09 | 1999-04-27 | Nippon Synthetic Chem Ind Co Ltd:The | Polymerization of ethylene-vinyl acetate copolymer |
JP2000226417A (en) * | 1999-02-04 | 2000-08-15 | Denki Kagaku Kogyo Kk | Preparation of copolymer |
JP2003095996A (en) * | 2001-09-27 | 2003-04-03 | Idemitsu Petrochem Co Ltd | METHOD FOR PRODUCING LOW GRADE POLYMER OF alpha-OLEFIN |
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