JP2005183879A - High heat radiation type plastic package - Google Patents

High heat radiation type plastic package Download PDF

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JP2005183879A
JP2005183879A JP2003426365A JP2003426365A JP2005183879A JP 2005183879 A JP2005183879 A JP 2005183879A JP 2003426365 A JP2003426365 A JP 2003426365A JP 2003426365 A JP2003426365 A JP 2003426365A JP 2005183879 A JP2005183879 A JP 2005183879A
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high heat
plastic package
heat radiation
radiation type
type plastic
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Shigenao Tomabechi
重尚 苫米地
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Sumitomo Metal SMI Electronics Device Inc
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Sumitomo Metal SMI Electronics Device Inc
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Priority to JP2003426365A priority Critical patent/JP2005183879A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item

Abstract

<P>PROBLEM TO BE SOLVED: To provide a high heat radiation type plastic package in which cutting quality when cutting an aggregate into independent parts is excellent, and cost is inexpensive. <P>SOLUTION: In a high heat radiation type plastic package 10 which has an internal layer Cu foil layer 14 between a plurality of resin core substrate 13, and is formed by dividing an aggregate 12, in which plural parts including a dummy portion 11 adjacently stand in a row, into each rectangular independent part, a thickness of the internal layer Cu foil layer 14 is 25μm or more, and the internal layer Cu foil layer 14 at a location through which a cutting blade 16 for dividing the aggregate 12 into the each independent part is removed in such a dimension that it is 90 to 100% of an outline length of the internal layer Cu foil layer 14 including the dummy portion 11, and that a width more greater than that of the cutting blade 16 simultaneously. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、半導体素子搭載用の高放熱型プラスチックパッケージに関し、より詳細には、半導体素子からの発熱を効率的に放熱するための比較的厚い内層Cu箔、又はCuコア基板を有する高放熱型プラスチックパッケージに関する。   The present invention relates to a high heat dissipation plastic package for mounting a semiconductor element, and more specifically, a high heat dissipation type having a relatively thick inner layer Cu foil or Cu core substrate for efficiently dissipating heat generated from the semiconductor element. It relates to plastic packages.

近年、半導体素子を搭載するためのプラスチックパッケージは、半導体素子の高性能化、小型化にともない、半導体素子からの発熱量の増大、外部と接続するための端子の多端子化、半導体素子の実装性、低コスト化、低インピーダンス化等の観点から、パッケージ構造を工夫した高放熱構造を有するBGA(Ball Grid Array)タイプの高放熱型プラスチックパッケージが多く用いられている。   In recent years, plastic packages for mounting semiconductor elements have increased the amount of heat generated from the semiconductor elements as the performance and miniaturization of the semiconductor elements increase, the number of terminals for connecting to the outside, and the mounting of semiconductor elements BGA (Ball Grid Array) type high heat dissipation plastic packages having a high heat dissipation structure with a devised package structure are often used from the viewpoints of performance, cost reduction, impedance reduction, and the like.

図3(A)に示すように、従来の典型的な高放熱型プラスチックパッケージ50は、片面又は両面に導体配線パターン(図示せず)を有する1層又は多層からなる高耐熱性の樹脂基板51と、熱伝導率の高いCu等の金属板からなる放熱板52をプリプレグ等の接着材53を介して接合して形成されている。樹脂基板51には、平面視して実質的中央部に、半導体素子54を搭載させるためのキャビティ部55用の切り欠き部56を有している。半導体素子54は、キャビティ部55の底面となり、樹脂基板51の切り欠き部56を開口部として露出している放熱板52上に搭載されている。そして、半導体素子54と、樹脂基板51の上面の導体配線パターンは、ボンディングワイヤ57で接続し電気的に接続している。半導体素子54と、ボンディングワイヤ57等は、外部環境から保護するために、封止樹脂58で気密に封止されている。樹脂基板51の上面の導体配線パターン上には、導体配線パターンと電気的に接続し、外部接続端子59を接合させるための外部接続端子パッド(図示せず)を開口部から露出するソルダーレジスト膜60が形成されている。半田ボール等からなる外部接続端子59は、外部接続端子パッドに接合されることで、導体配線パターン及びボンディングワイヤ57を介して半導体素子54と電気的に接続される。この高放熱型プラスチックパッケージ50は、半導体素子54が放熱板52に直接接して搭載することができるので、半導体素子54からの発熱を放熱板52を介して外部に効率よく放熱させることができる。なお、この高放熱型プラスチックパッケージ50は、半導体素子54と外部接続端子59が同じ主面側に設けられるキャビティダウン型になっている。   As shown in FIG. 3A, a conventional typical high heat radiation type plastic package 50 has a high heat resistance resin substrate 51 composed of one layer or multiple layers having a conductor wiring pattern (not shown) on one side or both sides. In addition, a heat radiating plate 52 made of a metal plate such as Cu having high thermal conductivity is joined through an adhesive 53 such as a prepreg. The resin substrate 51 has a cutout portion 56 for the cavity portion 55 for mounting the semiconductor element 54 in a substantially central portion in plan view. The semiconductor element 54 is mounted on the heat dissipation plate 52 which becomes the bottom surface of the cavity portion 55 and is exposed with the cutout portion 56 of the resin substrate 51 as an opening. The semiconductor element 54 and the conductor wiring pattern on the upper surface of the resin substrate 51 are connected by bonding wires 57 and are electrically connected. The semiconductor element 54, the bonding wire 57, and the like are hermetically sealed with a sealing resin 58 in order to protect them from the external environment. On the conductor wiring pattern on the upper surface of the resin substrate 51, a solder resist film that is electrically connected to the conductor wiring pattern and exposes external connection terminal pads (not shown) for joining the external connection terminals 59 from the openings. 60 is formed. The external connection terminal 59 made of a solder ball or the like is electrically connected to the semiconductor element 54 via the conductor wiring pattern and the bonding wire 57 by being bonded to the external connection terminal pad. Since the semiconductor element 54 can be mounted in direct contact with the heat sink 52 in the high heat dissipation plastic package 50, the heat generated from the semiconductor element 54 can be efficiently radiated to the outside through the heat sink 52. The high heat dissipation plastic package 50 is a cavity down type in which the semiconductor element 54 and the external connection terminal 59 are provided on the same main surface side.

しかしながら、この高放熱型プラスチックパッケージ50は、放熱板52の厚さが厚くなったり、プリプレグ等の接着材が厚くなるので、パッケージ全体の厚さが厚くなり、軽薄短小化が求められる携帯電話やパソコン等の電子機器への利用の妨げとなっている。また、パッケージの形態がキャビティダウン型であるので、外部接続端子59をボード等に接合させる時の間隔が狭くなり、接合部の接合信頼性に問題がある。そこで、図3(B)に示すように、高放熱型プラスチックパッケージ50aには、1又は複数の樹脂コア基板51aの両面にCu箔や、内層にCu箔を接合し、更に、Cu箔から形成される上面側の導体配線パターン61と、下面側の導体配線パターン61aを有し、半導体素子54からの発熱を樹脂コア基板51aの下面側に効率よく放熱させるために、上、下面の導体配線パターン61、61aを接続するサーマルビア62が設けられたものがある。この高放熱型プラスチックパッケージ50aは、導体配線パターン61、61aの必要部分を開口部として露出させてソルダーレジスト膜60を形成したり、上、下面の導体配線パターン61、61aを電気的に導通させるための導通ビア63を設けたり等することで、半導体素子54と外部接続端子59がそれぞれ対向する面に設けられるキャビティアップ型としている。   However, in the high heat dissipation type plastic package 50, the thickness of the heat dissipation plate 52 is increased or the adhesive material such as the prepreg is increased. This is an obstacle to the use of electronic devices such as personal computers. In addition, since the package form is a cavity down type, the interval when the external connection terminal 59 is joined to a board or the like is narrowed, and there is a problem in the joining reliability of the joining portion. Therefore, as shown in FIG. 3B, the high heat radiation type plastic package 50a is formed by bonding Cu foil to both surfaces of one or a plurality of resin core substrates 51a, Cu foil to the inner layer, and further forming from Cu foil. In order to efficiently dissipate heat generated from the semiconductor element 54 to the lower surface side of the resin core substrate 51a, the upper and lower conductor wiring patterns 61 and 61 are provided. Some have thermal vias 62 for connecting the patterns 61 and 61a. In this high heat radiation type plastic package 50a, necessary portions of the conductor wiring patterns 61, 61a are exposed as openings to form the solder resist film 60, or the upper and lower conductor wiring patterns 61, 61a are electrically connected. For example, by providing conductive vias 63 for the purpose, a cavity-up type is provided in which the semiconductor element 54 and the external connection terminal 59 are provided on opposite surfaces.

パッケージの複数個が隣接して整列する集合体から個片体のプラスチックパッケージにするには、集合体の状態で半導体素子を搭載した後に、封止樹脂の上面から第1のダイシングブレードで導体配線パターンを切断し、更に、第2のダイシングブレードで樹脂基板を切断して形成するものが提案されている(例えば、特許文献1参照)。また、プラスチックパッケージには、集合体から個片体のパッケージにするために、ダミー部に設けられる切断切刃幅より大きい幅を有する切分けガイドマークを基準に切断して形成するものが提案されている(例えば、特許文献2参照)。更に、高放熱型プラスチックパッケージには、コア基板に金属コアを用いたパッケージも提案されている(例えば、特許文献3参照)。
特開2000−183218号公報 特開2002−16172号公報 特開平7−321250号公報
In order to change from an assembly in which a plurality of packages are arranged adjacent to each other to a single-piece plastic package, a semiconductor element is mounted in the state of the assembly, and then the conductor wiring is performed from the upper surface of the sealing resin with the first dicing blade. There has been proposed a method in which a pattern is cut and a resin substrate is cut with a second dicing blade (see, for example, Patent Document 1). Also, a plastic package is proposed that is formed by cutting with reference to a cutting guide mark having a width larger than the cutting cutting edge width provided in the dummy portion in order to change the package from an aggregate to a single piece. (For example, refer to Patent Document 2). Furthermore, a package using a metal core as a core substrate has also been proposed as a high heat dissipation plastic package (see, for example, Patent Document 3).
JP 2000-183218 A JP 2002-16172 A JP 7-321250 A

しかしながら、前述したような従来の高放熱型プラスチックパッケージには、次のような問題がある。
(1)樹脂コア基板の両面や、複数の樹脂コア基板間に接合されたCu箔をもとに形成される高放熱型プラスチックパッケージは、Cu箔の厚さが薄いので、十分な放熱効果がなく、搭載される半導体素子によって、放熱性に限界が発生している。
(2)Cu箔の厚さを厚くした高放熱型プラスチックパッケージや、コア材に熱伝導性のよい金属板等を用いた高放熱型プラスチックパッケージは、集合体から個片体のパッケージにするために、ダイシングソー等の回転方式で切断しているので、厚さが比較的厚いCu箔や、金属コアを切断切刃で切断するには、切断抵抗が大きく、切断切刃の摩耗が激しくなり、刃先の不具合による切断面にバリ等の発生によって品質低下や、歩留まりの低下が発生している。また、切断切刃の摩耗による頻繁な切断切刃の交換により、切断切刃費用と切断処理のためにかかる時間が多くなり切断のためのコストが上昇して、高放熱型プラスチックパッケージのコストアップとなっている。
本発明は、かかる事情に鑑みてなされたものであって、集合体から個片体にする時の切断品質がよく、安価な高放熱型プラスチックパッケージを提供することを目的とする。
However, the conventional high heat dissipation plastic package as described above has the following problems.
(1) A high heat dissipation plastic package formed on both sides of a resin core substrate or a Cu foil bonded between a plurality of resin core substrates has a sufficient heat dissipation effect because the Cu foil is thin. However, there is a limit in heat dissipation depending on the semiconductor element to be mounted.
(2) High heat dissipation plastic packages with a thick Cu foil and high heat dissipation plastic packages using a metal plate with good thermal conductivity as the core material are used to change the package from a single piece to a single piece. In addition, since cutting is performed by a rotating method such as a dicing saw, in order to cut a relatively thick Cu foil or metal core with a cutting blade, the cutting resistance is high and the cutting blade wears heavily. As a result of burrs and the like on the cut surface due to a defect in the cutting edge, quality and yield are reduced. Also, frequent cutting blade replacement due to cutting blade wear increases the cutting blade cost and the time required for cutting processing, increasing the cost for cutting and increasing the cost of high heat dissipation plastic packages. It has become.
The present invention has been made in view of such circumstances, and an object of the present invention is to provide an inexpensive high heat radiation type plastic package which has good cutting quality when the aggregate is separated into individual pieces.

前記目的に沿う本発明に係る高放熱型プラスチックパッケージは、複数の樹脂コア基板間に内層Cu箔層を有し、ダミー部を含めて複数個が隣接して整列する集合体からそれぞれの四角形状の個片体に分割して形成される高放熱型プラスチックパッケージにおいて、内層Cu箔層の厚さが25μm以上からなり、集合体からそれぞれ個片体に分割するための切断切刃を通過させる場所の内層Cu箔層が、ダミー部を含めた内層Cu箔層の外形長さの90〜100%、しかも切断切刃幅以上の大きさ幅で除去されている。   The high heat radiation type plastic package according to the present invention that meets the above-mentioned object has an inner layer Cu foil layer between a plurality of resin core substrates, and each of the quadrangular shapes from an assembly in which a plurality including a dummy portion are arranged adjacent to each other. In a high heat dissipation type plastic package formed by dividing into individual pieces, the inner layer Cu foil layer has a thickness of 25 μm or more, and passes through a cutting blade for dividing the aggregate into individual pieces. The inner layer Cu foil layer is removed with a width of 90 to 100% of the outer length of the inner layer Cu foil layer including the dummy portion, and more than the cutting edge width.

前記目的に沿う本発明に係る他の高放熱型プラスチックパッケージは、樹脂基材で被覆されるCuコア基板を有し、ダミー部を含めて複数個が隣接して整列する集合体からそれぞれの四角形状の個片体に分割して形成される高放熱型プラスチックパッケージにおいて、Cuコア基板の厚さが80μm以上からなり、集合体からそれぞれ個片体に分割するための切断切刃を通過させる場所のCuコア基板が、ダミー部を含めたCuコア基板の外形長さの90〜98%、しかも切断切刃幅以上の大きさ幅で除去されている。   Another high heat radiation type plastic package according to the present invention that meets the above-mentioned object has a Cu core substrate coated with a resin base material, and a plurality of adjacent squares including a dummy portion are arranged from respective assemblies. In a high heat dissipation plastic package formed by dividing into individual pieces, the location where the thickness of the Cu core substrate is 80 μm or more, and a cutting blade for dividing the aggregate into individual pieces is passed through The Cu core substrate is removed with 90 to 98% of the external length of the Cu core substrate including the dummy portion, and with a width larger than the cutting edge width.

請求項1記載の高放熱型プラスチックパッケージは、内層Cu箔層の厚さが25μm以上からなり、集合体からそれぞれ個片体に分割するための切断切刃を通過させる場所の内層Cu箔層が、ダミー部を含めた内層Cu箔層の外形長さの90〜100%、しかも切断切刃幅以上の大きさ幅で除去されているので、切断切刃が厚さの厚い内層Cu箔と接触するのを少なくして集合体から個片体のパッケージを作製することができ、品質がよく、歩留まりのよい安価な高放熱型プラスチックパッケージを提供できる。   The high heat radiation type plastic package according to claim 1, wherein the inner layer Cu foil layer has a thickness of 25 μm or more, and the inner layer Cu foil layer in a place through which a cutting cutting blade for dividing the aggregate into individual pieces is passed. , 90-100% of the outer length of the inner layer Cu foil layer including the dummy portion is removed with a width larger than the cutting edge width, so that the cutting edge contacts the thick inner layer Cu foil. Therefore, it is possible to manufacture a single-piece package from the assembly with a small amount of manufacturing, and it is possible to provide an inexpensive high heat radiation type plastic package with good quality and high yield.

請求項2記載の高放熱型プラスチックパッケージは、Cuコア基板の厚さが80μm以上からなり、集合体からそれぞれ個片体に分割するための切断切刃を通過させる場所のCuコア基板が、ダミー部を含めたCuコア基板の外形長さの90〜98%、しかも切断切刃幅以上の大きさ幅で除去されているので、切断切刃が厚さの厚いCuコア基板と接触するのを少なくして集合体から個片体のパッケージを作製することができ、品質がよく、歩留まりのよい安価な高放熱型プラスチックパッケージを提供できる。   The high heat radiation type plastic package according to claim 2, wherein the Cu core substrate has a thickness of 80 μm or more, and the Cu core substrate at a location through which cutting blades for dividing the aggregate into individual pieces are passed is a dummy. 90% to 98% of the external length of the Cu core substrate including the portion, and more than the cutting cutting edge width, the cutting cutting blade comes into contact with the thick Cu core substrate. A package of individual pieces can be manufactured from the assembly with a small amount, and an inexpensive high heat radiation type plastic package with good quality and good yield can be provided.

続いて、添付した図面を参照しつつ、本発明を具体化した実施するための最良の形態について説明し、本発明の理解に供する。
ここに、図1(A)〜(C)はそれぞれ本発明の一実施の形態に係る高放熱型プラスチックパッケージの上面側平面図、下面側平面図、縦断面図、図2(A)〜(C)はそれぞれ本発明の他の実施の形態に係る高放熱型プラスチックパッケージの上面側平面図、下面側平面図、縦断面図である。
Subsequently, the best mode for carrying out the present invention will be described with reference to the accompanying drawings to provide an understanding of the present invention.
1A to 1C are respectively a top plan view, a bottom plan view, a longitudinal sectional view, and a vertical sectional view of a high heat dissipation plastic package according to an embodiment of the present invention. C) is a top plan view, a bottom plan view, and a longitudinal sectional view, respectively, of a high heat dissipation plastic package according to another embodiment of the present invention.

図1(A)〜(C)に示すように、本発明の一実施の形態に係る高放熱型プラスチックパッケージ10は、ダミー部11を含めてマトリックス状や、短冊状に複数個が隣接して配列する集合体12から平面視してそれぞれの四角形状の個片体の高放熱型プラスチックパッケージ10に分割することで形成されている。この高放熱型プラスチックパッケージ10の集合体12を形成する時の支持体は、BT樹脂(ビスマイレイミドトリアジンを主成分にした樹脂)や、ポリイミド樹脂等をシート状基材とする複数の樹脂コア基板13からなり、この樹脂コア基板13間に、厚さが25μm以上有する比較的厚さの厚い内層Cu箔層14が設けられている。また、最上面の樹脂コア基板13、最下面の樹脂コア基板13の外表面側の一方、又は両面には、例えば、厚さが10〜20μmm程度の比較的薄いCu箔が接合されており、この上に更に無電解めっき及び電解めっきによってCuめっき被膜が設けられ、フォトリソグラフィ法とエッチング手法を用いて導体配線パターン15が形成されている。樹脂コア基板13間の内層Cu箔層14には、集合体12からそれぞれの四角形状の個片体の高放熱型プラスチックパッケージ10に分割するための、例えば、ダイシングソー等の切断切刃16が通過する場所に、ダミー部11を含めて内層Cu箔層14の外形長さの90〜100%を、フォトリソグラフィ法とエッチング手法で除去した部分を有している。しかも、この除去部分の幅寸法aは、切断切刃16の幅寸法b以上の大きさ幅を有している。   As shown in FIGS. 1A to 1C, a high heat radiation type plastic package 10 according to an embodiment of the present invention includes a dummy portion 11 and a plurality of adjacent ones in a matrix shape or a strip shape. It is formed by dividing the assembly 12 to be divided into high-radiation plastic packages 10 each having a rectangular shape in plan view. The support for forming the aggregate 12 of the high heat dissipation plastic package 10 is a plurality of resin cores using BT resin (resin containing bis-maleimide triazine as a main component) or polyimide resin as a sheet-like base material. A relatively thick inner layer Cu foil layer 14 having a thickness of 25 μm or more is provided between the resin core substrates 13. Moreover, a relatively thin Cu foil having a thickness of about 10 to 20 μm, for example, is bonded to one or both sides of the outer surface side of the uppermost resin core substrate 13 and the lowermost resin core substrate 13, A Cu plating film is further provided thereon by electroless plating and electrolytic plating, and a conductor wiring pattern 15 is formed using a photolithography method and an etching method. The inner Cu foil layer 14 between the resin core substrates 13 is provided with a cutting edge 16 such as a dicing saw for dividing the aggregate 12 into high-radiation plastic packages 10 each having a rectangular shape. It has a portion where 90 to 100% of the outer length of the inner layer Cu foil layer 14 including the dummy portion 11 is removed by a photolithography method and an etching method in a place where it passes. In addition, the width dimension a of the removed portion has a width greater than or equal to the width dimension b of the cutting edge 16.

更に、この高放熱型プラスチックパッケージ10には、導体配線パターン15の必要部分を開口部から露出するソルダーレジスト膜17が設けられている。高放熱型プラスチックパッケージ10の上、下面に導体配線パターン15を有する場合には、パターン間の電気的導通を取るためにそれぞれの樹脂コア基板13に貫通孔と、この貫通孔の壁面にCuめっき被膜を設けて形成される導通ビア18を有している。また、この高放熱型プラスチックパッケージ10は、半導体素子19が搭載される部位の樹脂コア基板13の下面から放熱させるためにそれぞれの樹脂コア基板13に貫通孔を設けて形成されたサーマルビア20を有している。   Further, the high heat dissipation plastic package 10 is provided with a solder resist film 17 that exposes a necessary portion of the conductor wiring pattern 15 from the opening. In the case where the conductive wiring pattern 15 is provided on the upper and lower surfaces of the high heat radiation type plastic package 10, through holes are formed in the respective resin core substrates 13 and Cu is plated on the wall surfaces of the through holes in order to establish electrical continuity between the patterns. The conductive via 18 is formed by providing a film. In addition, the high heat dissipation plastic package 10 has thermal vias 20 formed by providing through holes in each resin core substrate 13 in order to dissipate heat from the lower surface of the resin core substrate 13 where the semiconductor element 19 is mounted. Have.

この高放熱型プラスチックパッケージ10は、通常、キャビティアップ型のパッケージとして形成されており、上面側で半導体素子19と上面側の導体配線パターン15をボンディングワイヤ21で接合し、下面側で下面側の導体配線パターン15に、例えば、半田ボール等からなる外部接続端子22を接合し、半導体素子19と外部接続端子22を電気的に導通状態なるようにしている。また、高放熱型プラスチックパッケージ10の上面側に半導体素子19が実装された後には、半導体素子19や、ボンディングワイヤ21等を覆うように封止樹脂23が設けられ、半導体素子19や、ボンディングワイヤ21等を外気から保護して気密に封止している。そして、半導体素子19等が実装された高放熱型プラスチックパッケージ10の集合体12は、ダイシングソー等の切断切刃16が通過する場所で分割されることで、半導体素子19等が実装された個片体からなる高放熱型プラスチックパッケージ10を作製している。なお、サーマルビア20には、半導体素子19からの発熱をサーマルビア20を介して放熱させるために、外部接続端子22と同様の接続用端子が接合されている。   This high heat radiation type plastic package 10 is usually formed as a cavity-up type package, in which the semiconductor element 19 and the conductor wiring pattern 15 on the upper surface side are joined by the bonding wires 21 on the upper surface side, and the lower surface side on the lower surface side. An external connection terminal 22 made of, for example, solder balls or the like is joined to the conductor wiring pattern 15 so that the semiconductor element 19 and the external connection terminal 22 are electrically connected. In addition, after the semiconductor element 19 is mounted on the upper surface side of the high heat radiation type plastic package 10, a sealing resin 23 is provided so as to cover the semiconductor element 19, the bonding wire 21, and the like. 21 etc. are protected from the outside air and hermetically sealed. Then, the assembly 12 of the high heat dissipation plastic package 10 on which the semiconductor elements 19 and the like are mounted is divided at a place where a cutting edge 16 such as a dicing saw passes, so that the semiconductor elements 19 and the like are mounted. A high heat radiation type plastic package 10 made of a single body is produced. Note that a connection terminal similar to the external connection terminal 22 is joined to the thermal via 20 in order to dissipate heat generated from the semiconductor element 19 through the thermal via 20.

高放熱型プラスチックパッケージ10の内層Cu箔層14の厚さは、25μmを下まわると放熱効果が低くなり、効率のよい放熱性を確保することができなくなる。また、集合体12から個片体の分割するための切断切刃16が通過する所に存在する内層Cu箔層14の長さがダミー部11を含めて内層Cu箔層14の外形長さの10%を超えたり、内層Cu箔層14の除去部分の幅寸法aが切断切刃16の幅寸法bより小さい場合には、切断切刃16で切断するときの切断部の品質が悪くなる。   If the thickness of the inner Cu foil layer 14 of the high heat dissipation plastic package 10 is less than 25 μm, the heat dissipation effect is reduced, and efficient heat dissipation cannot be ensured. Further, the length of the inner layer Cu foil layer 14 existing where the cutting edge 16 for dividing the individual piece from the assembly 12 passes is the outer length of the inner layer Cu foil layer 14 including the dummy portion 11. If it exceeds 10% or the width dimension a of the removed portion of the inner Cu foil layer 14 is smaller than the width dimension b of the cutting blade 16, the quality of the cut portion when cutting with the cutting blade 16 is deteriorated.

次に、図2(A)〜(C)に示すように、本発明の他の実施の形態に係る高放熱型プラスチックパッケージ10aは、ダミー部11を含めてマトリックス状や、短冊状に複数個が隣接して配列する集合体12から平面視してそれぞれの四角形状の個片体の高放熱型プラスチックパッケージ10aに分割することで形成されている。この高放熱型プラスチックパッケージ10aの集合体12を形成する時の支持体は、熱伝導性のよいシート状高放熱金属板であり、厚さが80μm以上のCuコア基板24からなり、このCuコア基板24の両面には、絶縁性のある樹脂基材25が設けられている。このCuコア基板24の樹脂基材25のそれぞれの個片体に相当する部分の平面視して一方の主面の実質的中央部には、半導体素子19を搭載させるためのキャビティ部26用の切り欠き部27が穿設されて設けられている。このCuコア基板24には、集合体12からそれぞれの四角形状の個片体の高放熱型プラスチックパッケージ10aに分割するための、例えば、ダイシングソー等の切断切刃16が通過する場所に、ダミー部11を含めてCuコア基板24の外形長さの90〜98%をフォトリソグラフィ法とエッチング手法で除去した部分を有している。しかも、この除去部分の幅寸法aは、切断切刃16の幅寸法b以上の大きさ幅を有している。そして、それぞれ個片体の樹脂基材25の両方の面には、導体配線パターン15を有し、更に、この導体配線パターン15の必要部分を開口部から露出するソルダーレジスト膜17が設けられている。高放熱型プラスチックパッケージ10aの上、下面に導体配線パターン15を有する場合には、パターン間の電気的導通を取るためにそれぞれのCuコア基板24に貫通孔と、この貫通孔の壁面に樹脂基材25による絶縁被膜を設け、この絶縁被膜にもCuめっき被膜を設けて形成される導通ビア18を有している。また、この高放熱型プラスチックパッケージ10aは、半導体素子19が搭載される部位のCuコア基板24の下面から半導体素子19からの発熱を放熱させるためにそれぞれのCuコア基板24の下面の樹脂基材25に貫通孔を設けて形成されたサーマルビア20を有し、このサーマルビア20に接合させて外部接続端子22と同様の接続用端子を設けることができる。   Next, as shown in FIGS. 2A to 2C, a plurality of high heat radiation type plastic packages 10a according to other embodiments of the present invention include a dummy shape 11 and a matrix shape or a strip shape. Are divided into high-radiation type plastic packages 10a each having a rectangular shape in plan view from the assembly 12 arranged adjacent to each other. The support for forming the aggregate 12 of the high heat radiation type plastic package 10a is a sheet-like high heat radiation metal plate having good thermal conductivity, and is composed of a Cu core substrate 24 having a thickness of 80 μm or more. An insulating resin base 25 is provided on both surfaces of the substrate 24. A portion corresponding to each piece of the resin base material 25 of the Cu core substrate 24 is a cavity portion 26 for mounting the semiconductor element 19 in a substantially central portion of one main surface in plan view. A notch 27 is provided by being drilled. In this Cu core substrate 24, a dummy is provided at a location where a cutting edge 16 such as a dicing saw passes for dividing the aggregate 12 into high-radiation plastic packages 10 a each having a rectangular shape. 90 to 98% of the external length of the Cu core substrate 24 including the portion 11 is removed by a photolithography method and an etching method. In addition, the width dimension a of the removed portion has a width greater than or equal to the width dimension b of the cutting edge 16. Each surface of the resin base material 25 is provided with a conductor wiring pattern 15 and a solder resist film 17 that exposes a necessary portion of the conductor wiring pattern 15 from the opening. Yes. When the conductor wiring pattern 15 is provided on the upper and lower surfaces of the high heat dissipation plastic package 10a, a through hole is formed in each Cu core substrate 24 and a resin base is formed on the wall surface of the through hole in order to establish electrical continuity between the patterns. An insulating coating made of the material 25 is provided, and this insulating coating has a conductive via 18 formed by providing a Cu plating coating. In addition, the high heat dissipation plastic package 10a has a resin base material on the lower surface of each Cu core substrate 24 in order to dissipate heat generated from the semiconductor element 19 from the lower surface of the Cu core substrate 24 where the semiconductor element 19 is mounted. 25 has a thermal via 20 formed with a through hole, and a connection terminal similar to the external connection terminal 22 can be provided by being joined to the thermal via 20.

この高放熱型プラスチックパッケージ10aは、通常、キャビティアップ型のパッケージとして形成されており、キャビティ部26に半導体素子19が搭載され、半導体素子19と上面側の導体配線パターン15をボンディングワイヤ21で接合し、下面側で下面側の導体配線パターン15に、例えば、半田ボール等からなる外部接続端子22が接合されて半導体素子19と外部接続端子22が電気的に導通状態なるようになっている。また、高放熱型プラスチックパッケージ10aの上面側に半導体素子19が実装された後には、半導体素子19や、ボンディングワイヤ21等を覆うように封止樹脂23が設けられ、半導体素子19や、ボンディングワイヤ21等を外気から保護して気密に封止している。そして、半導体素子19等が実装された高放熱型プラスチックパッケージ10aの集合体12は、ダイシングソー等の切断切刃16が通過する場所で分割されることで、半導体素子19等が実装された個片体からなる高放熱型プラスチックパッケージ10aを作製している。   This high heat radiation type plastic package 10a is usually formed as a cavity-up type package. A semiconductor element 19 is mounted in the cavity portion 26, and the semiconductor element 19 and the conductor wiring pattern 15 on the upper surface side are bonded by a bonding wire 21. On the lower surface side, the external connection terminals 22 made of, for example, solder balls or the like are joined to the conductor wiring pattern 15 on the lower surface side so that the semiconductor element 19 and the external connection terminals 22 are electrically connected. In addition, after the semiconductor element 19 is mounted on the upper surface side of the high heat dissipation plastic package 10a, a sealing resin 23 is provided so as to cover the semiconductor element 19, the bonding wire 21, and the like. 21 etc. are protected from the outside air and hermetically sealed. The assembly 12 of the high heat dissipation plastic package 10a on which the semiconductor elements 19 and the like are mounted is divided at a place where a cutting edge 16 such as a dicing saw passes, so that the semiconductor elements 19 and the like are mounted. A high heat radiation type plastic package 10a made of a single body is produced.

高放熱型プラスチックパッケージ10aのCuコア基板24の厚さは、80μmを下まわると放熱効果が低くなり、効率のよい放熱性を確保することができなくなる。また、集合体12から個片体に分割するための切断切刃16が通過する所に存在するCuコア基板24の長さがダミー部11を含めてCuコア基板24の外形長さの10%を超えたり、Cuコア基板24の除去部分の幅寸法aが切断切刃16の幅寸法bより小さい場合には、切断切刃16で切断するときの切断部の品質が悪くなる。また、集合体12から個片体に分割するための切断切刃16が通過する所に存在するCuコア基板24は、全てを除去するとダミー部11や、高放熱型プラスチックパッケージ10aの隣接間での繋がり部分がなくなるので、隣接間を接続させるためには最小限2%程度必要となる。   When the thickness of the Cu core substrate 24 of the high heat dissipation plastic package 10a is less than 80 μm, the heat dissipation effect is lowered, and efficient heat dissipation cannot be ensured. Further, the length of the Cu core substrate 24 existing where the cutting blade 16 for dividing the assembly 12 into individual pieces passes is 10% of the external length of the Cu core substrate 24 including the dummy portion 11. Or the width dimension a of the removed portion of the Cu core substrate 24 is smaller than the width dimension b of the cutting blade 16, the quality of the cut portion when cutting with the cutting blade 16 is deteriorated. Further, the Cu core substrate 24 existing where the cutting blade 16 for dividing the assembly 12 into individual pieces passes is removed between the dummy portion 11 and the adjacent high heat radiation type plastic package 10a when all are removed. Since there is no connection part, it is necessary to have a minimum of about 2% in order to connect adjacent parts.

上記の高放熱型プラスチックパッケージ10、10aは、コア基板の両面に導体配線パターン15を有するキャビティアップ型で説明したが、高放熱型プラスチックパッケージ10、10aは、片面のみに導体配線パターンを有するキャビティダウン型のものであってもよい。この場合には、導通ビア18の形成が不要となり、外部接続端子22と半導体素子19が同じ側にに形成される。   The high heat radiation type plastic packages 10 and 10a have been described as the cavity-up type having the conductor wiring pattern 15 on both surfaces of the core substrate. However, the high heat radiation type plastic package 10 and 10a has a conductor wiring pattern only on one side. It may be a down type. In this case, it is not necessary to form the conductive via 18, and the external connection terminal 22 and the semiconductor element 19 are formed on the same side.

本発明の活用例としては、高発熱量を擁する半導体素子からの熱を効率的に放熱させることができ、且つ薄型で、安価なパッケージとすることができるので、半導体素子を搭載する電子機器、例えば、携帯電話や、ノートブック型のコンピューター等に適用することができる。   As an application example of the present invention, heat from a semiconductor element having a high calorific value can be efficiently dissipated, and a thin and inexpensive package can be obtained. For example, the present invention can be applied to a mobile phone, a notebook computer, or the like.

(A)〜(C)はそれぞれ本発明の一実施の形態に係る高放熱型プラスチックパッケージの上面側平面図、下面側平面図、縦断面図である。(A)-(C) are the upper surface side top view, lower surface side top view, and longitudinal cross-sectional view of the high thermal radiation type plastic package which concerns on one embodiment of this invention, respectively. (A)〜(C)はそれぞれ本発明の他の実施の形態に係る高放熱型プラスチックパッケージの上面側平面図、下面側平面図、縦断面図である。(A)-(C) are the upper surface side top view, lower surface side top view, and longitudinal cross-sectional view of the high thermal radiation type plastic package which concerns on other embodiment of this invention, respectively. (A)、(B)はそれぞれ従来の高放熱型プラスチックパッケージの説明図である。(A), (B) is explanatory drawing of the conventional high thermal radiation type plastic package, respectively.

符号の説明Explanation of symbols

10、10a:高放熱型プラスチックパッケージ、11:ダミー部、12:集合体、13:樹脂コア基板、14:内層Cu箔層、15:導体配線パターン、16:切断切刃、17:ソルダーレジスト膜、18:導通ビア、19:半導体素子、20:サーマルビア、21:ボンディングワイヤ、22:外部接続端子、23:封止樹脂、24:Cuコア基板、25:樹脂基材、26:キャビティ部、27:切り欠き部   10, 10a: High heat radiation type plastic package, 11: Dummy part, 12: Assembly, 13: Resin core substrate, 14: Inner layer Cu foil layer, 15: Conductor wiring pattern, 16: Cutting blade, 17: Solder resist film , 18: conduction via, 19: semiconductor element, 20: thermal via, 21: bonding wire, 22: external connection terminal, 23: sealing resin, 24: Cu core substrate, 25: resin base material, 26: cavity portion, 27: Notch

Claims (2)

複数の樹脂コア基板間に内層Cu箔層を有し、ダミー部を含めて複数個が隣接して整列する集合体からそれぞれの四角形状の個片体に分割して形成される高放熱型プラスチックパッケージにおいて、
前記内層Cu箔層の厚さが25μm以上からなり、前記集合体からそれぞれ前記個片体に分割するための切断切刃を通過させる場所の前記内層Cu箔層が、前記ダミー部を含めた該内層Cu箔層の外形長さの90〜100%、しかも前記切断切刃幅以上の大きさ幅で除去されていることを特徴とする高放熱型プラスチックパッケージ。
A high heat dissipation plastic formed by dividing an assembly of a plurality of adjacent layers including a dummy portion into a quadrangular piece having an inner layer Cu foil layer between a plurality of resin core substrates. In the package,
The inner layer Cu foil layer has a thickness of 25 μm or more, and the inner layer Cu foil layer in a place where a cutting cutting blade for dividing each of the aggregates into the individual pieces passes through the dummy portion includes the dummy portion. A high heat radiation type plastic package characterized in that it is removed with a width of 90 to 100% of the outer length of the inner layer Cu foil layer and more than the cutting edge width.
樹脂基材で被覆されるCuコア基板を有し、ダミー部を含めて複数個が隣接して整列する集合体からそれぞれの四角形状の個片体に分割して形成される高放熱型プラスチックパッケージにおいて、
前記Cuコア基板の厚さが80μm以上からなり、前記集合体からそれぞれ前記個片体に分割するための切断切刃を通過させる場所の前記Cuコア基板が、前記ダミー部を含めた該Cuコア基板の外形長さの90〜98%、しかも前記切断切刃幅以上の大きさ幅で除去されていることを特徴とする高放熱型プラスチックパッケージ。
A high heat radiation type plastic package having a Cu core substrate coated with a resin base material and divided into a plurality of rectangular pieces from an assembly in which a plurality of adjacent portions including a dummy portion are aligned. In
The Cu core substrate having a thickness of 80 μm or more, and the Cu core substrate where the cutting blade for dividing the aggregate into the individual pieces is passed, the Cu core including the dummy portion. A high heat radiation type plastic package characterized by being removed by 90 to 98% of the outer length of the substrate and having a width larger than the cutting edge width.
JP2003426365A 2003-12-24 2003-12-24 High heat radiation type plastic package Pending JP2005183879A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008091714A (en) * 2006-10-03 2008-04-17 Rohm Co Ltd Semiconductor device
JP2009117489A (en) * 2007-11-02 2009-05-28 Sharp Corp Semiconductor device package and mounting substrate
WO2021192926A1 (en) * 2020-03-24 2021-09-30 日東電工株式会社 Wiring circuit board assembly sheet

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008091714A (en) * 2006-10-03 2008-04-17 Rohm Co Ltd Semiconductor device
JP2009117489A (en) * 2007-11-02 2009-05-28 Sharp Corp Semiconductor device package and mounting substrate
WO2021192926A1 (en) * 2020-03-24 2021-09-30 日東電工株式会社 Wiring circuit board assembly sheet

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