JP2005148626A - Microstructure and its manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To solve the problem associated with conventional technology so as to easily manufacture a microstructure such as three dimensional photonic crystals or the like by making vertical through-put holes with a prescribed interval on a substrate and by hierarchically filling a plurality of filling materials into the holes with a prescribed thickness having a different refractive index from that of the substrate. <P>SOLUTION: Vertical through-put holes are formed with a prescribed interval on a substrate made of the material having a first refractive index. Then, a plurality of filling materials having refractive indexes, which differ from the first refractive index, is hierarchically filled into the vertical through-put holes with a prescribed thickness to manufacture a microstructure such as photonic crystals or the like. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a microstructure, a microstructure device, and a manufacturing method thereof. The present invention relates to a microstructure having a periodic structure in the x, y, and z directions and a method for manufacturing the same, and more particularly to a microstructure such as a photonic crystal used for an optical functional element and the method for manufacturing the same.

  In the field of optoelectronics, the use of photonic crystals is being studied as a new element. The photonic crystal optical element has a basic structure based on an arrangement (periodic structure) of substances having different refractive indexes. In order to provide a function, the difference in the refractive index is increased or periodic disturbance (called a defect) is caused. Or introduce.

First, a two-dimensional photonic crystal will be described with reference to FIGS.
A conventional example of the most general two-dimensional photonic crystal (Japanese Patent Laid-Open No. 2001-272557) will be described with reference to FIG. The substrate 1 is patterned by electron beam exposure or the like, and a metal mask is formed on the substrate. Next, a vertical hole 2 is formed by etching, and a material 3 having a high refractive index is filled in the vertical hole 2 by sputtering or the like, so that a photonic crystal is manufactured. In this example, a vertical hole 2 is formed in a substrate 1 having a refractive index of 1.5 with a period of 390 nm, and a material 3 having a refractive index of 2.5 is filled, whereby a photonic band having a transmittance of zero near 780 nm is obtained. A gap can be created.

Another conventional example of the same two-dimensional photonic crystal (Japanese Patent Laid-Open No. 2002-277659) will be described with reference to FIG. 2A is a plan view and FIG. 2B is a cross-sectional view. A number of vertical holes arranged in a square pattern in the SiO ₂ substrate 4 are formed by a semiconductor process similar to that of the conventional example shown in FIG. 1, and only one row is formed as holes 5 at both ends, and the other holes are opened at only one side. Set to 6. Then, when PMMA (polymethyl methacrylate) is applied thereto, only the vertical through holes 5 are selectively filled with PMMA by capillary action. Thereby, since the refractive indexes of PMMA and SiO ₂ are substantially equal, a waveguide in which light having a wavelength twice as long as the period of only one row filled with PMMA can be produced.

  It is known that the periodic vertical holes as in the conventional example can be formed more easily than the semiconductor process by anodic oxidation or anodization. A substrate made of a metal such as aluminum or titanium, or a semiconductor such as silicon, gallium arsenide, or indium arsenide is used in an appropriate electrolytic solution (in the case of an aluminum substrate or a substrate made of an aluminum thin film formed on a predetermined substrate, It is oxidized or formed when immersed in an acidic electrolyte solution such as an acid and placed on the anode and a voltage is applied. FIG. 3 shows an example of anodized Al, in which pores having a diameter (2r) of several nanometers to several hundreds of nanometers are regularly arranged in a triangular lattice pattern with a period (2R) of several nanometers to several hundreds of nanometers. A layer is formed, and it is possible to easily obtain a pore portion having very high perpendicularity and an extremely high aspect ratio. Thereby, a two-dimensional photonic crystal in which media having different refractive indexes are arranged with a two-dimensional period is obtained by alumina and air in the pores. The arrangement of the pores can be controlled by providing a base point in advance, and the interval between the pores is approximately proportional to the applied voltage at the time of anodization, so the interval between the pores can be controlled by controlling the applied voltage. The desired optical properties can be obtained by controlling. Furthermore, in the conventional example using such anodization (Japanese Patent Laid-Open No. 2001-162600), a two-dimensional photonic device is formed by selectively filling the pores with substances having different refractive indexes by electrodeposition. Is produced.

  In these two-dimensional photonic crystals, anisotropy of refractive index dispersion occurs with respect to incident light having different wavelengths and polarization directions incident from different directions within a plane parallel to the plane. However, there is a problem that the light leaks when the incident light is not parallel to the plane but is inclined. Therefore, a three-dimensional photonic crystal formed so that the refractive index is periodically different also in the thickness direction is required. Hereinafter, an example of a method for producing a three-dimensional photonic crystal will be described.

Next, a conventional example relating to a method for producing a three-dimensional photonic crystal will be described with reference to FIGS.
As shown in FIG. 4, in the conventional example described in Japanese Patent Application Laid-Open No. 2003-131003, materials 7 and 8 having different refractive indexes are alternately arranged by a method such as inkjet, and these are stacked to form a three-dimensional photonic. It is crystal. (Conventional example 1)
In the conventional example described in Japanese Patent Application Laid-Open No. 2000-284136, a fine hole is formed on a substrate by a semiconductor process, a thin film is formed thereon by a material having a different refractive index, and this material is pushed into the fine hole. A two-dimensional photonic crystal is prepared by Further, a three-dimensional photonic crystal is formed by repeatedly forming and pushing a thin film with a material having a different refractive index. (Conventional example 2)

Further, in the conventional example described in Japanese Patent Laid-Open No. 2001-74955, as shown in FIG. 6, a two-dimensional periodic structure is formed by thin film formation, lithography, and dry etching for each layer, and a plurality of them are joined. Thus, a photonic crystal is formed by three-dimensionally stacking. (Conventional example 3)
The conventional example described in Japanese Patent No. 3288976 is a method using a multilayer bias sputtering method as shown in FIG. 7, in which a fine structure is formed in advance on a substrate 12, and silicon 14 and silicon dioxide 13 are formed. A three-dimensional photonic crystal reflecting the fine structure on the substrate is formed by alternately laminating the substrate 12 and applying a bias sputtering method. (Conventional example 4)
In addition, as a conventional example using an ink jet, there is one disclosed in Japanese Patent Application Laid-Open No. 2001-91911 (see FIG. 5). This is because a dot pattern 10 is formed by inkjet or the like, and a dot pattern 11 having a refractive index different from that of the dot pattern 10 is formed, thereby forming a two-dimensional periodicity and a defect as a central plane pattern, The three-dimensional structure is formed by alternately laminating materials having different refractive indexes. (Conventional example 5)

The conventional method for producing a three-dimensional photonic crystal has the following problems to be solved.
First, the above conventional example 1 can theoretically produce a three-dimensional photonic crystal, but it is practically difficult to overlap the droplets and have a thickness in the vertical direction by the inkjet method. It is not suitable for manufacturing.
In the above conventional example 2, it is possible to introduce a non-uniform portion (defect) in the three-dimensional periodic structure, but a thin film formation process or an indentation process is required for each layer, which is problematic in terms of accuracy and manufacturing time. is there.

Further, in the above conventional example 3, it is possible to introduce a non-uniform portion of the period when manufacturing the two-dimensional periodic structure, and it seems to be a promising method from the viewpoint of device manufacturing. In addition, lithography, dry etching, and wafer fusion processes are required, and the manufacturing process is complicated and time-consuming. Therefore, there is a practical problem in processing a large number of substrates.
In the conventional example 4, the manufacturing process is simple and the material is the most promising at present because of the combination of silicon and silicon dioxide. There is a problem that it is easy in the stacking direction (direction perpendicular to the substrate) but not so easy in the horizontal direction (direction horizontal to the substrate).
Further, in the conventional example 5 as well, since both sides are simply laminated, it is difficult to introduce defects other than the center.

JP 2003-131003 A JP 2000-284136 A JP 2001-74955 A Japanese Patent No. 3288976 JP 2001-91911 A

  An object of the present invention is to three-dimensionally fill a vertical through-hole formed in a substrate with a predetermined period by hierarchically filling a plurality of filler materials having a refractive index different from that of the substrate with a predetermined thickness. An object of the present invention is to solve the above-mentioned problems of the prior art by making it possible to easily produce a fine structure such as a photonic crystal.

A solution to the above problem is to form vertical through holes (fine vacancies) in the substrate at a predetermined cycle, and to add a plurality of filling materials having a refractive index different from that of the substrate to the vertical through holes with a predetermined thickness. Basically, the filling is hierarchical.
[Solution 1] (corresponding to claim 1)
Solution 1 taken in order to solve the above-mentioned problem forms a vertical through-hole with a predetermined period in a substrate made of a material having a first refractive index, and the first refractive index with respect to the vertical through-hole. Is to hierarchically fill a plurality of filling materials having different refractive indexes with a predetermined thickness.
[Work]
By vertically filling a plurality of materials with a predetermined thickness into the vertical through-holes of the substrate having a periodicity of refractive index in the planar direction, the periodicity of the refractive index can also be provided in the vertical direction.

[Embodiment 1] (corresponding to claim 2)
Embodiment 1 is that in the manufacturing method of Solution 1, the filling of the vertical through hole is performed by increasing or decreasing the pressure of the vertical through hole.
[Work]
The filling material moves through the vertical through-hole due to the pressure difference and can be filled with materials having multiple refractive indexes across the gap, creating a microstructure with periodicity not only in the horizontal direction but also in the vertical direction can do.

[Embodiment 2] (corresponding to claim 3)
Embodiment 2 is that in the manufacturing method of Solution 1, the filling of the vertical through hole is performed by making the adhesion of the filling material to the vertical through hole larger than the cohesive force of the filling material. .
[Work]
By making the adhesive force of the filling material to the vertical through-hole larger than the cohesive force of the filling material, the filling material can be filled and moved in the vertical through-hole, not only in the horizontal direction but also in the vertical direction. In addition, a fine structure having periodicity can be manufactured.

[Embodiment 3] (corresponding to claim 4)
Embodiment 3 is that in the manufacturing method of Solution 1, Embodiment 1 or Embodiment 2 described above, the filler materials have the property of not mixing with each other.
[Work]
Since the filling material does not mix, the periodicity of the refractive index is ensured.

[Embodiment 4] (corresponding to claim 5)
Embodiment 4 is that in the production method of any one of Solution 1 and Embodiments 1 to 3, one of the filling materials is a gas.
[Work]
A substrate having a refractive index periodicity in a plane direction can be filled with a material with a gap therebetween, and a refractive index periodicity can be provided by a gas having a low refractive index and a material having a high refractive index.

[Embodiment 5] (corresponding to claim 6)
Embodiment 5 is that in the manufacturing method of any one of Solution 1 and Embodiments 1 to 4, a material other than gas among the filler material is dropped into the vertical through hole.
[Work]
A substrate having a refractive index periodicity in a plane direction can be alternately filled with a plurality of materials having different refractive indexes by an ink jet method (filling materials with a gap), not only in the horizontal direction but also in the vertical direction. Can also have periodicity.

[Embodiment 6] (corresponding to claim 7)
Embodiment 6 is that, in the manufacturing method of Embodiment 4 or Embodiment 5, a taper having a predetermined angle is formed at the entrance of the vertical through hole on the filling material dropping side.
[Work]
By providing a taper in the vertical through-hole, it is possible to fill a material having a plurality of refractive indexes across the gap, and to have periodicity not only in the horizontal direction but also in the vertical direction. In addition, by providing a taper in the vertical through hole, the vertical through hole can be reliably filled even if the droplet dropping position is displaced.

[Embodiment 7] (corresponding to claim 8)
Embodiment 7 is that, in the manufacturing method according to any one of Embodiments 4 to 6, when the filling material is filled in the vertical through hole, the filling region is reduced by heating.
[Work]
By dropping the next droplet after shrinking the filled material, it is possible to fill a material having a plurality of refractive indexes with a gap in between, so that it has periodicity not only in the horizontal direction but also in the vertical direction. Can be made. Further, by reducing after filling, fine filling can be achieved even if the droplets are large.

[Embodiment 8] (corresponding to claim 9)
Embodiment 8 is that in the manufacturing method of Embodiment 7, the heating is performed from the filling material dropping side of the vertical through hole.
[Work]
By heating from the filling material dropping side, not only the droplet closest to the dropping side can be reduced, but also a specific region can be heated and reduced.

[Embodiment 9] (corresponding to claim 10)
Embodiment 9 is that in the manufacturing method of any one of Solution 1 and Embodiments 1 to 8, the material other than gas among the filling material is a liquid in which nanoparticles are dispersed.
[Work]
The liquid filling material can be provided with an appropriate fluidity necessary for the ink jet method and a sufficient refractive index.

[Embodiment 10] (corresponding to claim 11)
Embodiment 10 is the manufacturing method according to any one of Solution 1 and Embodiments 1 to 9, wherein the filling material is made of an energy ray curable resin, and the filling material is filled with the energy beam after filling the vertical through hole. To solidify.
[Work]
By solidifying the material after filling, it can be stabilized against the surrounding environment such as heat or vibration.

[Embodiment 11] (corresponding to claim 12)
Embodiment 11 is the manufacturing method according to any one of Solution 1 and Embodiments 1 to 9, wherein the vertical through holes are hierarchically filled with a plurality of filling materials and then both ends of the vertical through holes are sealed. That is.
[Work]
By sealing both ends of the vertical through hole after filling the filling material, it can be stabilized against the surrounding environment such as heat or vibration.

[Solution 2] (Corresponding to Claim 13)
Solution 2 taken in order to solve the above problems is a fine structure such as a photonic crystal produced by the manufacturing method of any one of Solution 1 and Embodiments 1 to 11.
[Work]
A plurality of materials are hierarchically filled with a predetermined thickness into a vertical through hole of a substrate having a periodicity of refractive index in the plane direction, and has a band gap not only in the horizontal direction but also in the vertical direction. Even when there is a deviation in the incident angle of the incident light, the loss is small and it has good characteristics.

The effects of the present invention are summarized for each main claim as follows.
(1) Invention according to claim 1 By vertically filling a plurality of materials with a predetermined thickness into vertical through holes (fine vacancies) of a substrate having a refractive index periodicity in a plane direction, the vertical direction Therefore, a fine structure such as a three-dimensional photonic crystal having periodicity not only in the x and y directions but also in the z direction can be produced. Thereby, it is possible to produce a photonic crystal such as a waveguide with a small loss even when there is a deviation in the incident angle.
(2) The invention according to claim 2 The filling material can be filled with a filling material having a plurality of refractive indexes across the gap by being moved through the vertical through hole due to the pressure difference. A fine structure having periodicity also in the vertical direction can be manufactured. As a result, it is possible to produce a three-dimensional photonic crystal having a band gap not only in the horizontal direction but also in the vertical direction.

(3) The invention according to claim 3 By making the adhesive force of the filling material to the vertical through hole larger than the cohesive force of the filling material, the filling material can be filled into the vertical through hole and moved. A fine structure having periodicity not only in the horizontal direction but also in the vertical direction can be manufactured. As a result, it is possible to produce a three-dimensional photonic crystal having a band gap not only in the horizontal direction but also in the vertical direction.
(4) Invention of Claim 4 When filling a plurality of filling materials into the vertical through-holes, the filling materials do not mix with each other, so that the accuracy of the periodicity of the refractive index can be improved.

(5) The invention according to claim 5 A material having a refractive index periodicity in a plane direction can be filled with a material sandwiching a gap, and a refractive index periodicity is formed by a gas having a low refractive index and a material having a high refractive index. Therefore, a fine structure having periodicity not only in the horizontal direction but also in the vertical direction can be manufactured. As a result, it is possible to produce a three-dimensional photonic crystal having a band gap not only in the horizontal direction but also in the vertical direction.
(6) The invention according to claim 6 Since a substrate having a periodicity of refractive index in the plane direction can be alternately filled with a plurality of materials having different refractive indexes by an ink jet method (filling with a gap), only in the horizontal direction. In addition, a fine structure having periodicity in the vertical direction can be manufactured. As a result, it is possible to produce a three-dimensional photonic crystal having a band gap not only in the horizontal direction but also in the vertical direction.

(7) The invention according to claim 7 By forming a taper in the vertical through-hole, it is possible to fill a material having a plurality of refractive indexes with a gap interposed therebetween, so that not only in the horizontal direction but also in the vertical direction It is possible to manufacture a fine structure having a property. In addition, by providing a taper in the vertical through-hole, a margin for the deviation of the droplet dropping position can be increased, so that even if a positional deviation occurs in the dropping of the droplet, it can be reliably filled.
(8) Inventions according to Claims 8 and 9 By heating and reducing the material filled in the vertical through-holes, a material having a plurality of refractive indexes can be filled across the gap, so that the horizontal direction In addition, a fine structure having periodicity in the vertical direction can be manufactured. Further, by reducing after filling, it is possible to make fine filling even if the droplet is large. Furthermore, by heating the filling material from the dropping side of the material, not only the droplet closest to the dropping side can be reduced, but also a specific area can be heated to reduce the filling. The length of the agent can be easily controlled, and a fine structure with good periodicity can be produced.

(9) The invention according to claim 10 Since the liquid filling material can be provided with appropriate fluidity required for the ink jet method and a sufficiently large refractive index, a fine structure having good characteristics is produced. be able to.
(10) The invention according to claim 11 Since the material after filling can be solidified by irradiating energy rays, it is possible to produce a microstructure that is stable against the surrounding environment such as heat and vibration. it can.

(11) The invention according to claim 12 After filling the filling material, the both ends of the vertical through hole are sealed to produce a microstructure that is stable against the surrounding environment such as heat and vibration.
(12) Invention according to claim 13 A microstructure such as a photonic crystal produced by the manufacturing method according to claims 1 to 12, wherein the substrate has a refractive index periodicity in a plane direction. By vertically filling the vertical through holes with a plurality of materials with a predetermined thickness, the vertical gap has a periodicity of refractive index in the vertical direction, and not only in the horizontal direction but also in the vertical direction. Therefore, even when there is a deviation in the incident angle of incident light, the loss is small and good characteristics are provided.

  For the purpose of making it possible to easily produce a fine structure such as a three-dimensional photonic crystal, a vertical through hole is formed in a substrate at a predetermined cycle, and a refractive index different from that of the substrate is given to the vertical through hole. This was realized by a relatively simple manufacturing method of hierarchically filling a plurality of filling materials having a predetermined thickness.

Before describing each embodiment of the present invention, a microstructure such as a three-dimensional photonic crystal will be described with reference to FIGS.
A substrate (fine hole array) 20 having a refractive index n having a square array or triangular array of vertical through holes (fine holes) 21 is prepared, and two or more kinds of materials having different refractive indexes are alternately arranged in the vertical through holes 21. By filling in, the periodicity of the refractive index can be provided in both the horizontal direction and the vertical direction. A three-dimensional microstructure can be produced by sealing both ends of the vertical through-hole 21 or solidifying the filled material.
Two or more kinds of materials to be filled are shown in FIG. 16 ((a) is a perspective view, (b) is a cross-sectional view of mm ′ of (a)), and two or more kinds of liquids having the property of not mixing. 22 and 38 (first filler 22, second filler 38), and FIG. 8 (FIG. 8A is a perspective view, FIG. 8B is m-m in FIG. 8A). There is a second configuration in which one of the two or more kinds of materials is a gas (a gap 25 is formed between the filler and the filler) as shown in 'cross-sectional view'. In the first configuration, it is possible to easily introduce a defect as compared with the conventional manufacturing method by changing one part of a plurality of alternately filled filling materials to a different filling material, and the second configuration. Then, it is possible to easily introduce defects by changing the length of the gap or the like as compared with the conventional manufacturing method.

  In order to fabricate such a three-dimensional microstructure as described above, it is necessary to selectively fill both the horizontal and vertical directions. Substantial femtoliter droplets have been realized by recent technological advances. The ink jet method is an optimal droplet supplying means because it can selectively supply droplets in the horizontal direction. Then, it is possible to selectively fill a plurality of filling materials also in the vertical direction by dropping two kinds of liquid droplets that do not mix or by dropping the liquid droplets with a gap.

Next, a method for producing a microscopic hole array common to the respective embodiments of the present invention and a process of dropping and filling droplets into the microscopic hole array using the ink jet method will be described.
First, a method for producing a microscopic hole array in which vertical through holes are periodically formed in a substrate will be described with reference to FIGS.
The fine hole array in which vertical holes having a diameter of several tens of nm to several μm are periodically arranged used in the embodiment of the present invention is manufactured by two methods described below. As shown in FIG. 12a, an SOI substrate in which SiO ₂ 31 is laminated on a Si substrate 30 is prepared, a photosensitive material 39 such as a photoresist is applied to the SOI substrate, and a circular pattern or the like is formed by an electron beam or the like. A square array or a triangular array is formed on the resist (FIG. 12B). Using this photoresist as a mask, the SiO ₂ is etched by dry etching such as RIE (reactive ion etching) to form the vertical holes 33 (FIG. 12C). By this manufacturing method, it is possible to form a vertical hole 33 having a hole aspect ratio (ratio of hole diameter to hole depth) of 1: 5 or more. Furthermore, by dry-etching the Si substrate 30 from the back surface, the fine hole array 20 having the vertical through holes 21 as shown in FIG. In the above example, an SOI substrate is used. However, it is also possible to form a pattern on a quartz substrate and form a vertical through hole by dry etching. However, at present, it is difficult to form a vertical hole having an aspect ratio of 1:10 or more in SiO ₂ , and as a result, the thickness of the fine hole array 20 has a limit value of several μm. In FIG. 12 (d), the entire surface of the Si substrate 30 is etched, but in order to ensure mechanical strength, the outer periphery of the Si substrate 30 is not etched, and the vertical through hole 21 is formed only in the central portion. May be.

In the production of the microporous array by the semiconductor process as described above, the thickness is a limit value of several μm, but the second method, the anodic oxidation method, easily has a microporous array having a thickness of several hundred μm or more. Can be produced. When the surface layer of the Al substrate is anodized in a 5-20% sulfuric acid solution at 0 to 20 ° C. (± 2 ° C.), as shown in FIG. 14, a surface layer portion 35 made of Al ₂ O _{3 on} the surface of the Al substrate 34. Is formed. The surface layer portion 35 is a so-called anodic oxide film, and has a plurality of minute vertical holes 33 as shown in FIG. The hole 33 has a hole diameter of several nm to several hundred nm and a hole pitch of several tens nm to several hundred nm. The hole diameter and hole pitch can be controlled by the current density during anodic oxidation, the applied voltage, and the like. The hole diameter can also be controlled by wet etching after anodic oxidation. Since the holes are arranged in a triangular pattern and the degree of alignment is not sufficient, in general, the base point of anodization is pressed against the Al substrate 34 by using a FIB (Focused Ion Beam) or a Si mold produced by a semiconductor process. It can be controlled freely by the method. By removing the Al portion of the anodized substrate and the bottom portion 36 of the vertical hole 33 of the surface layer portion 35 made of Al ₂ O ₃ by dry etching from the back surface, a fine hole array can be produced. In addition to aluminum, titanium, gallium arsenide, indium arsenide, and the like can be used to produce a fine hole array by anodization.

  As shown in FIG. 13, the fine hole array 20 produced by the above method is immersed in an etching solution 32 such as hydrofluoric acid so that the tip of the hole is slowly pulled up, or acid evaporation is performed. By using it, the opening of the vertical hole 33 can be tapered as shown in FIG. As a result, in the subsequent filling step by the ink jet method, a margin for the shift of the dropping position of the droplets can be increased, and further, the formation of voids at the time of filling is facilitated.

Next, the step of selectively filling the fine hole array produced by the above-described method with the ink jet method using the ink jet method will be described with reference to FIG.
This inkjet method is generally used to drop a droplet of several tens of μm in diameter (picoliter in liquid volume) at an arbitrary position and draw an image with an ink droplet, or to join a fine structure with an adhesive. It is. However, it has been difficult to apply a droplet having a diameter of 10 μm to a photonic crystal that requires a period of several μm or less, but recently, due to technological progress, a droplet having a sub-μm diameter (subfemto Liter), and application to photonic crystals has become a reality.

As shown in FIG. 9 (a), when a droplet 28 of a filling material such as an ultraviolet curable resin is dropped on the microhole array 20, the droplet 28 is formed into a vertical through-hole as shown in FIG. 9 (b) by capillary action. 21 is filled. In order for the droplets 28 to be filled into the vertical through-holes 21 by capillary action, the adhesion force between the liquid molecules and the vertical through-holes 21 needs to exceed the force (cohesive force) at which the liquid molecules try to become spheres. . This adhesion force increases as the wettability of the vertical through hole 21 is improved, and the cohesive force decreases as the surface tension determined by the liquid decreases, and decreases as the wettability increases. That is, by increasing the wettability, the capillary phenomenon is likely to occur, so that the choice of liquid droplets that can be filled is expanded. Basically, oxides such as Al ₂ O ₃ and SiO ₂ have high hydrophilicity and good wettability with respect to solvents and the like, so that the droplets are filled by capillary action. By UV irradiation, the wettability is further improved and filling becomes easier. When the vertical through hole 21 does not have a taper 21 ′, the filled droplet stops at the entrance of the vertical through hole 21 due to the adhesion force (see FIG. 10B). If the vertical through hole has a taper 21 ′, it tends to become smaller due to the cohesive force of the liquid droplets, so that it moves to the position 26 where the taper ends and stops (see FIG. 9B).

  In addition, the filled droplets are subjected to gravity downward, a vertical through hole that prevents the filled droplets from moving, and the frictional force of the filled droplets. In the present invention, there are two methods for moving the filled droplet. First, the first method is to pressurize or depressurize the air pressure with respect to the vertical through-hole, thereby moving the droplet. The second method is to make the sum of the adhesion force and the gravity exceed the sum of the cohesion force and the frictional force. Next, the previous droplet is pushed down by the gravity and adhesion force of the dropped droplet. Can be moved. The frictional force can be reduced by reducing the viscosity of the droplet. Further, the adhesion force can be increased by selecting the wettability of the vertical through hole and the dropping material.

  The period required for the photonic crystal (hole pitch 29 (see FIG. 8B)) is 750 nm when the wavelength used is 1500 nm. When the ratio of the holes 21 of the fine hole array to the substrate is 4: 6, the hole diameter is about 0.484 μm in the case of the triangular arrangement. When a 0.1 femtoliter droplet (droplet diameter: 0.58 μm) is dropped on this, the filling length 23 (see FIG. 8B) becomes 0.54 μm. By setting the gap length 24 (see FIG. 8B) to 0.21 μm, a refractive index change having a period of 750 nm can also be formed in the vertical direction. When two kinds of droplets (droplet diameter 0.51 μm) of 0.07 femtoliter are alternately dropped, the filling length 23 becomes 0.375 μm, so that the two kinds of refractive indexes are mixed. By alternately dropping incompatible fillers, it is possible to form a refractive index change having a period of 750 nm in the vertical direction. Furthermore, since the filling length can be reduced by heating with infrared light from the droplet dropping side after filling, 0.1 femtoliter can be dropped by reducing the filling length 23 in this way. Even in this case, the filling length can be reduced to 0.375 μm.

The refractive index of the fine hole array 20 is 1.4 when the material is SiO ₂ , about 1.8 when the material is Al ₂ O ₃ , and 2.5 when titanium oxide is used. The photonic crystal preferably has a larger refractive index change, and the fine hole array 20 has a higher refractive index. Therefore, the larger the refractive index of the fine hole array, the better the characteristics. The refractive index of the air gap is 1.0, and there are various types of ultraviolet curable resins having a refractive index of about 1.3 to 1.7. Furthermore, this ultraviolet curable resin can control the refractive index to about 1.3 to 2.3 as a filler by dispersing titanium oxide fine particles (refractive index 2.5). As a material that has a small refractive index and does not mix with the ultraviolet curable resin that is the first filler, a water-soluble material such as water is desirable, and its refractive index is about 1.3. In order to make it easy to fill by lowering the surface tension, by using a PVA (polyvinyl alcohol) aqueous solution, filling and movement after filling are easier than pure water.
In this manufacturing method, since filling is performed by an ink jet method, selective filling is possible. By not filling a part, defects (regions in which the refractive index period is disturbed) can be easily introduced in the horizontal direction. Can do. In addition, defects can be easily introduced in the vertical direction by lengthening the gap only partly, filling with UV curable resin with a low refractive index, or changing the dropping order of two fillers that are alternately filled. can do.

Next, Example 1 (corresponding to claims 1, 2, 4 to 6, 10 to 13) of the present invention will be described with reference to FIGS. 11 and 20 to 23. FIG.
A method of manufacturing a three-dimensional microstructure having a second configuration (see FIG. 8) in which one of two or more kinds of materials filled in a vertical through hole is a gas, and the liquid filled in the vertical through hole A method of manufacturing a three-dimensional microstructure in which a droplet is moved by applying atmospheric pressure, and a refractive index variation is formed in a vertical direction by a filling material and the void by forming a void between the droplets. This will be described with reference to FIG.

  A fine hole array 20 made of a material having a refractive index n is produced, and the vertical through holes 21 of the fine hole array 20 are selectively diluted with a volatile solvent having a refractive index m by an ink jet method. A droplet 28 of ultraviolet curable resin was dropped (FIG. 11 (a)). The dropped droplet 28 is filled as a filler 22 in a part of the vertical through hole 21 by capillary action (FIG. 11B). Further, the filled droplet is obtained by reducing the pressure of the reverse surface of the droplet dropping surface of the vertical through-hole 21 (or pressurizing the droplet dropping surface), thereby reversing the surface of the vertical through-hole 21 of the droplet dropping surface. Move to the side (FIG. 11C). When the next droplet 28 is dropped at a timing when it has moved by a predetermined amount (FIG. 11 (d)), two droplets are filled in the vertical through hole 21 as fillers 22 and 22 with the gap 25 interposed therebetween. (FIG. 11 (e)). By repeating this, the material having the refractive index m is filled with a predetermined length with the gap 25 having a predetermined length interposed therebetween. By controlling the amount by which the filled droplets are moved, defects can be easily introduced. After the filling is completed, the reduced pressure is released and the resin is solidified by irradiating it with ultraviolet rays, whereby a photonic crystal can be produced.

The first embodiment will be described in more detail with reference to FIGS.
First, with reference to FIG. 20, in order to provide a photonic band gap at a wavelength of 1.5 μm used for communication or the like, a square array with a pitch of 750 nm and a hole diameter of 484 nm formed by an anodic oxidation method of an Al substrate is used. A fine hole array 20 is produced. The side opposite to the droplet dropping side of the fine hole array 20 is decompressed. When 0.07 femtoliter droplets 28 of an ultraviolet curable resin diluted with a volatile solvent having a refractive index of 2.2 are dropped into the vertical through holes 21 of the fine hole array 20, the vertical through holes 21 are dropped. And move to the opposite side of the droplet dropping side. By synchronizing the period of dropping the droplets 28 of the ultraviolet curable resin and the time for moving the filled droplets, the pitch is 0 in a face-centered cubic arrangement as shown in FIGS. The filling can be performed with a filling length of .375 μm and a filling length of 0.375 μm. After the filling is completed, the photonic crystal having a face-centered cubic structure can be manufactured by irradiating the resin with ultraviolet rays to solidify the resin (FIG. 20 (e)).

In the photonic crystal shown in FIG. 20, the period of dropping the ultraviolet curable resin droplets 28 is synchronized with the time during which the filled droplets move, so that FIGS. ), When filling with a face-centered cubic arrangement with a pitch of 0.75 μm and a filling length of 0.375 μm, the drop timing is shifted as shown in FIG. Only the plane is not a face-centered cubic structure, but is filled as shown in FIG. 21B, and both sides of the mm′-nn ′ plane are filled in a face-centered cubic arrangement. After filling, the resin is solidified by irradiating it with ultraviolet rays, whereby a photonic crystal waveguide as shown in FIG. 21 can be produced. Since this waveguide also has a periodicity of refractive index in the vertical direction, even if the incident angle of the incident light 47 is shifted up and down, light does not leak in the vertical direction.
In FIG. 21, the face-centered cubic arrangement is filled. However, as shown in FIGS. 22 and 23, even if the body-centered cubic arrangement or the hexagonal arrangement is filled, the band is not only in the x and y directions but also in the z direction. A gap is obtained.

Embodiment 2 of the present invention (corresponding to claims 1, 3 to 7, 10 to 13) will be described with reference to FIG.
Example 2 is a method for manufacturing a three-dimensional microstructure having a second configuration (see FIG. 8) in which one of two or more kinds of materials filled in the vertical through-holes of the micro-hole array is a gas. In addition to using the taper formed at the opening of the vertical through hole, the droplet is filled into the vertical through hole using capillary action and gravity, and the refractive index varies in the vertical direction due to the filling material and the gap. 9 will be described with reference to FIG. 9, focusing on such points.
In addition, since it is a matter common to each Example about the manufacturing method of the micropore array 20, filling with a droplet by the inkjet method, etc., those description is abbreviate | omitted.

  The fine hole array 20 is made of a material having a refractive index n, and the entrance on the material dropping side of the vertical through-hole 21 has a taper 21 'having a predetermined angle as described in the method for producing the fine hole array. It is processed by etching or the like (see FIG. 13). A droplet 28 of an ultraviolet curable resin having a higher refractive index m is selectively dropped onto the vertical through hole 21 by an inkjet method (FIG. 9A). The dropped liquid droplet 28 is filled as a filler 22 in a part of the vertical through hole 21 by capillary action (FIG. 9B). At this time, the entrance on the material dropping side of the vertical through-hole 21 has a taper 21 ′ having a predetermined angle, so that the droplet 28 is moved and filled to a position 26 where the taper disappears. Further, the next droplet 28 is dropped on this by the ink jet method, so that two droplets are filled as a filler 22 in a part of the vertical through-hole 21 across the gap 25 (FIG. 9C). , (d)). By repeating this, an ultraviolet curable resin having a refractive index m is filled with a predetermined length with a gap 25 having a predetermined length in between. After completion of filling, a three-dimensional photonic crystal can be produced by irradiating ultraviolet rays to solidify the resin. It is also possible to introduce defects by using a plurality of inkjet nozzles and partially changing the material to be dropped.

The second embodiment will be described in more detail.
In order to have a photonic band gap at a wavelength of 1.5 μm used in communications, etc., a fine hole array of triangular arrangement with a pitch of 750 nm and a hole diameter of 484 nm by an Al anodic oxidation method (refractive index is 1.8) Further, a predetermined taper is formed at the entrance of the vertical through hole by the method described above. The taper length was adjusted to 0.4 μm as a result of adjusting the length of the gap to be 0.21 μm. By dropping 0.1 femtoliter droplets of UV curable resin containing titanium oxide fine particles having a refractive index of 1.8 into the fine hole array a plurality of times, a 0.21 μm void is formed by the tapered region. As a result, an ultraviolet curable resin having a 0.75 μm pitch and a filling length of 0.54 μm is filled with a gap. Thereafter, the resin is solidified by irradiating it with ultraviolet rays, thereby producing a photonic crystal. As a result, since the resin having a refractive index of 1.8 is filled with a gap (refractive index of 1.0), the average refractive index of the vertical through-hole is 1.4. A region with a refractive index of 1.8 and a refractive index of 1.4 is arranged with a period of 750 nm, and a region with a refractive index of 1.8 and a refractive index of 1.0 is arranged with a period of 750 nm in a 40% region in the vertical direction.

Next, a third embodiment (corresponding to claims 1, 3 to 6, 8 to 13) of the present invention will be described with reference to FIGS.
Example 3 is a method for manufacturing a three-dimensional microstructure having a second configuration (see FIG. 8) in which one of two or more kinds of materials filled in the vertical through holes of the microhole array is gas. In addition to utilizing the fact that the ultraviolet curable resin is reduced by heating, the liquid droplets are filled into the vertical through-hole using capillary action and gravity, and moved to change the refractive index in the vertical direction due to the filling material and the gap. 10 will be described with reference to FIG.
In addition, since it is a matter common to each Example about the manufacturing method of the micropore array 20, filling with a droplet by the inkjet method, etc., those description is abbreviate | omitted.

  The fine hole array 20 is made of a material having a refractive index n, and droplets 28 of an ultraviolet curable resin that have a refractive index m and are diluted with a volatile solvent selectively by an inkjet method with respect to the vertical through-hole 21. Is dropped (FIG. 10A). The dropped liquid droplet 28 is filled as a filler 22 in a part of the vertical through hole 21 by capillary action (FIG. 10B). This is heated from the droplet dropping side with infrared light or the like of the heating light source 27 to control the volatility of the droplet, thereby reducing the filled ultraviolet curable resin (FIG. 10C). Further, a droplet 28 of the ultraviolet curable resin is dropped on this by an ink jet method (FIG. 10 (d)), and similarly heated by infrared light or the like from the droplet dropping side, the gap 25 is sandwiched between the two. Two ultraviolet curable resins are filled as a filler 22 in a part of the vertical through hole 21 (FIGS. 10E and 10F). By repeating this, an ultraviolet curable resin (filler 22) having a refractive index m is filled with a predetermined length with a gap 25 having a predetermined length interposed therebetween. Then, a three-dimensional photonic crystal is produced by irradiating this with ultraviolet rays to solidify the resin. By reducing the droplet size after dropping it, the vertical length can be shortened even if the droplet size drops to some extent, and the gap distance can be varied by controlling the amount and size of the droplet. Therefore, defects can be easily introduced.

Example 3 will be described in more detail with reference to FIG.
In order to have a photonic band gap at a wavelength of 1.5 μm used in communication or the like, a fine hole array 20 having a triangular arrangement with a pitch of 750 nm and a hole diameter of 484 nm formed by an anodic oxidation method of an Al substrate is produced. A 0.1 femtoliter droplet 28 of an ultraviolet curable resin having a refractive index of 1.8 and diluted with a volatile solvent is dropped onto the fine hole array 20 (FIG. 19A). The through hole 21 is filled as a filler 22 (FIG. 19B). The ultraviolet curable resin has a refractive index adjusted to 1.9 with titanium oxide fine particles. By heating with infrared light from the heating light source 27 from the dropping side, the solvent is evaporated and the filling length is reduced to 0.375 μm (FIG. 19C). In this manner, droplet dropping, filling, and reduction of the filling length are repeated, and an ultraviolet curable resin (filler 22) having a pitch of 0.75 μm and a filling length of 0.375 μm is filled across the gap 25 ( FIG. 19 (d)). At the defect introduction section, the droplets are dropped twice in succession (FIG. 19 (e)), and after filling the double UV curable resin (FIG. 19 (f)), the heating time with infrared light is increased. The amount of reduction is increased to increase the gap length (FIG. 19 (g)). Thereafter, the dropping of the droplet, filling, and reduction of the filling length are repeated, and an ultraviolet curable resin (filler 22) having a pitch of 0.75 μm and a filling length of 0.375 μm is filled with the gap 25 interposed therebetween ( FIG. 19 (h), (i), (j)). And a photonic crystal is produced by irradiating this with an ultraviolet-ray and hardening resin. As a result, a photonic crystal having a periodicity of a refractive index of 0.75 μm pitch in both the horizontal direction and the vertical direction and in which a defect 43 is partially introduced can be produced.

Next, a fourth embodiment of the present invention (corresponding to claims 1, 3, 4, 6, and 10 to 13) will be described with reference to FIGS. 15, 17, and 18. FIG.
This Example 4 is a three-dimensional microstructure having a first configuration (see FIG. 16) in which two or more kinds of materials filling the vertical through holes of the fine hole array are liquids that do not mix. Since this is a manufacturing method in which a refractive index variation is formed in the vertical direction by alternately dropping two kinds of liquid filling materials, this point will be mainly described with reference to FIG. .
In addition, since it is a matter common to said each Example about the production method of the micropore array 20, filling with a droplet by the inkjet method, etc., those description is abbreviate | omitted.

  The fine hole array 20 is made of a material having a refractive index n, and droplets of ultraviolet curable resin having a higher refractive index m are selectively dropped onto the vertical through-hole 21 by an inkjet method (FIG. 15 ( a)). The dropped liquid droplet 28 is filled as a first filler 22 in a part of the vertical through-hole 21 by capillary action (FIG. 15B). Further, a droplet 37 of water having a refractive index k different from that of the droplet 28 and not mixed with the droplet 28 is dropped into the vertical through-hole 21 selectively by an ink jet method (FIG. 15C). )). The dropped droplet 37 is filled as a second filler 38 in a part of the vertical through-hole 21 by capillary action (FIG. 15D). By alternately dropping the droplets 28 of the ultraviolet curable resin having the refractive index m and the water droplets 37 having the refractive index k and not mixed with the droplets 28, the droplets having different refractive indexes are alternately arranged. To form a refractive index period (FIGS. 15E and 15F). And it is also possible to introduce the defect 43 easily by dropping water at the timing of dropping the ultraviolet curable resin in the middle of the filling step (FIG. 15G).

Example 4 will be described in more detail with reference to FIGS. 17 and 18.
First, the three-dimensional photonic crystal shown in FIG. 17 will be described. FIG. 17A is a perspective view, and FIG. 17B is a cross-sectional view taken along line mm ′ of FIG.
In order to have a photonic band gap at a wavelength of 1.5 μm used in communication or the like, a fine hole array 20 having a pitch of 750 nm and a hole diameter of 484 nm and a square array (with a refractive index of 1.8) is formed by anodizing Al. ). To this fine hole array 20, an ultraviolet curable resin containing titanium oxide fine particles having a refractive index of 1.8 and water are alternately dropped by 0.07 femtoliter. As a result, the ultraviolet curable resin 40 having a refractive index of 1.8 and the water 41 having a refractive index of 1.3 are filled at a pitch of 0.75 μm. In this manner, as shown in FIG. 17, the horizontal direction is a 50% region, and the regions of refractive index 1.8 and refractive index 1.3 can be arranged with a period of 750 nm, and the vertical direction is In the 40% region, regions having a refractive index of 1.8 and a refractive index of 1.3 can be arranged with a period of 750 nm. Then, a three-dimensional photonic crystal can be produced by irradiating this with ultraviolet rays to solidify the resin.

Next, the three-dimensional photonic crystal shown in FIG. 18 will be described. 18A is a perspective view, and FIG. 18B is a sectional view taken along mm′-nn ′ in FIG. 18A.
In the same manner as shown in FIG. 17 above, in order to have a photonic band gap at a wavelength of 1.5 μm used for communication or the like, a square arrangement with a pitch of 750 nm and a hole diameter of 484 nm is performed by anodizing Al. A fine hole array 20 (with a refractive index of 1.8) is produced. To this fine hole array 20, an ultraviolet curable resin containing titanium oxide fine particles having a refractive index of 2.2 and water are alternately dropped by 0.07 femtoliter. Further, by partially replacing the dripping of water and the dripping of the ultraviolet curable resin, an array of the ultraviolet curable resin 40 and the water 41 as shown in FIG. 18 is formed. And a photonic crystal can be produced by irradiating this with ultraviolet rays and solidifying the resin. In this way, the ultraviolet curable resin 40 having a refractive index of 2.2 and the water 41 having a refractive index of 1.3 are filled at a 0.75 μm pitch. In the mm′-nn ′ cross section of FIG. As shown in b), a waveguide in which the periphery is filled with an ultraviolet curable resin 40 having a refractive index of 2.2 and a hole 41 is filled with water 41 having a refractive index of 1.3 is prepared. Can do. Since this waveguide has a refractive index periodicity and defects introduced also in the vertical direction, light does not leak in the vertical direction even when the incident angle of the incident light 47 is deviated. Reference numeral 48 denotes outgoing light.

  In Example 4 above, an ultraviolet curable resin in which titanium oxide fine particles are dispersed is used as a filler having a high refractive index, and water is used as a filler that does not mix with the filler having a low refractive index and a high refractive index. However, the present invention is not limited to this, and any resin can be applied as long as it is not an ultraviolet curable resin and can be dropped by an inkjet method, and a high refractive index is realized by mixing fine particles other than titanium oxide. You can also. Further, a stable photonic crystal can be realized by sealing both ends of the vertical through-hole 21 of the fine hole array 20 without solidifying after filling. Furthermore, although the filler having a low refractive index is water, an ultraviolet curable resin having a low refractive index is used, and a PVA (polyvinyl alcohol) aqueous solution in which titanium oxide or the like is dispersed may be used as a filler having a high refractive index. it can.

These are the schematic diagrams explaining the prior art example of the most general two-dimensional photonic crystal. These are the schematic diagrams explaining another prior art example of a two-dimensional photonic crystal. These are the schematic diagrams explaining the prior art example of the two-dimensional photonic crystal which formed the fine hole periodically by anodizing aluminum. These are the schematic diagrams explaining the prior art example of a three-dimensional photonic crystal. These are the schematic diagrams explaining another prior art example of a three-dimensional photonic crystal. These are the schematic diagrams explaining another prior art example of a three-dimensional photonic crystal. These are the schematic diagrams explaining the prior art example of the three-dimensional photonic crystal produced using the multilayer bias sputtering method. These are the schematic diagrams of the three-dimensional photonic crystal of this invention which used one of the filling materials as gas, (a) is a perspective view, (b) is m-m 'sectional drawing of (a). These are the schematic diagrams explaining the manufacturing method of Example 2 which forms a refractive index fluctuation | variation in a perpendicular direction with a filling material and a space | gap using a taper. These are the schematic diagrams explaining the manufacturing method of Example 3 which uses the reduction | decrease of the filling material by heating, and forms a refractive index fluctuation | variation in a perpendicular direction with a filling material and a space | gap. These are the schematic diagrams explaining the manufacturing method of Example 1 which forms a refractive index fluctuation | variation in the orthogonal | vertical direction with a filling material and a space | gap using a reduced pressure. These are the schematic diagrams explaining the method of producing a micropore array using an SOI substrate. These are the schematic diagrams explaining the method of forming a taper in opening of a fine hole array. These are the schematic diagrams explaining the method of producing a micropore array using an Al substrate. These are the schematic diagrams explaining the manufacturing method of Example 4 which forms a refractive index fluctuation | variation in a perpendicular direction using two types of liquids as a filling material. These are the schematic diagrams of the three-dimensional photonic crystal of this invention which made the filling material two types of liquids, (a) is the perspective view, (b) is m-m 'sectional drawing of (a). These are the schematic diagrams explaining the manufacturing method of Example 4 which forms a refractive index fluctuation | variation in a perpendicular direction using two types of liquid as a filling material, (a) is a perspective view, (b) is m of (a). It is -m 'sectional drawing. FIG. 6 is a schematic diagram for explaining a method of manufacturing a waveguide of a photonic crystal in Example 4 in which a refractive index variation is formed in the vertical direction using two kinds of liquid as a filling material, (a) is a perspective view, b) is a sectional view taken on line mm′-nn ′ of FIG. These are the schematic diagrams explaining the manufacturing method of Example 3 which uses the reduction | decrease of the filling material by heating, and forms a refractive index fluctuation | variation in a perpendicular direction with a filling material and a space | gap. These are the schematic diagrams explaining the manufacturing method of Example 1 which forms a face-centered cubic structure with a filling material and a space | gap using a pressure reduction. FIG. 4 is a schematic diagram for explaining a method of manufacturing a waveguide of a photonic crystal in Example 1 in which a face-centered cubic structure is formed by a filling material and voids using reduced pressure, (a) is a perspective view, b) is a sectional view taken on line mm′-nn ′ of FIG. These are the schematic diagrams explaining the photonic crystal manufactured with the manufacturing method of Example 1 which forms a body-centered cubic structure with a filling material and a space | gap, (a) is a perspective view, (b) is mm of (a). It is '-nn' sectional drawing. These are the schematic diagrams explaining the photonic crystal manufactured by the manufacturing method of Example 1 which forms a hexagonal structure with a filling material and a space | gap.

Explanation of symbols

20 ... Fine hole array 21 ... Vertical through hole 21 '... Taper 22 ... (First) filler 23 ... Filling length 24 ... Air gap length 25 ... Air gap 26 ... Taper end position 27 ... Heating light source 28 ... Droplet (first material)
29 ... Hole pitch 30 ... Si substrate 31 ... SiO ₂
32 Etching solution 33 Vertical hole 34 Al substrate 35 Al ₂ O ₃ (surface layer)
36 ... Bottom of hole 37 ... Droplet (second material)
38 ... 2nd filler 39 ... Photosensitive material 40 ... UV curable resin 41 ... Water 43 ... Defect 44 ... 2nd filling length 45 ... Resin filling length 46 ... Water Filling length 47 ... Incident light 48 ... Output light

Claims (13)

  A vertical through-hole is formed in a predetermined cycle on a substrate made of a material having a first refractive index, and a plurality of filling materials having a refractive index different from the first refractive index are added to the vertical through-hole with a predetermined thickness. A method of manufacturing a fine structure such as a photonic crystal, which is hierarchically filled.   2. The method for producing a fine structure such as a photonic crystal according to claim 1, wherein the filling of the vertical through hole is performed by increasing or decreasing the pressure of the vertical through hole.   The fine filling of the photonic crystal according to claim 1, wherein the filling of the vertical through-hole is performed by making the adhesion of the filling material to the vertical through-hole larger than the cohesive force of the filling material. Manufacturing method of structure.   The method for producing a fine structure such as a photonic crystal according to any one of claims 1 to 3, wherein the filling materials have a property of not mixing with each other.   One of the said filling materials is gas, The manufacturing method of microstructures, such as a photonic crystal, in any one of Claims 1-4 characterized by the above-mentioned.   The method for producing a fine structure such as a photonic crystal according to any one of claims 1 to 5, wherein a material other than a gas is dropped into the vertical through-hole among the filling material.   The method for producing a fine structure such as a photonic crystal according to claim 5 or 6, wherein a taper having a predetermined angle is formed at an entrance of the vertical through hole on a filling material dropping side.   8. The manufacturing of a fine structure such as a photonic crystal according to claim 5, wherein when the filling material is filled in the vertical through hole, the filling region is reduced by heating. Method.   9. The method for manufacturing a fine structure such as a photonic crystal according to claim 8, wherein the heating is performed from a filling material dropping side of the vertical through hole.   The method for producing a fine structure such as a photonic crystal according to any one of claims 1 to 9, wherein a material other than gas in the filling material is a liquid in which nanoparticles are dispersed.   The photonic according to any one of claims 1 to 10, wherein the filling material is made of an energy ray curable resin, and the filling material is solidified by energy rays after filling the vertical through hole. A method for producing a fine structure such as a crystal.   The photonic crystal according to any one of claims 1 to 10, wherein both ends of the vertical through hole are sealed after the plurality of filling materials are hierarchically filled into the vertical through hole. A manufacturing method of a fine structure.   A fine structure such as a photonic crystal produced by the production method according to claim 1.

Images