JP2005148432A - Optical apparatus and method for controlling intensity distribution - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To control the profile of laser beams in a surface to be irradiated variably using a homogenizer. <P>SOLUTION: A homogenizer 3 divides an incident laser beam L into plural lines of laser beams as to positions in the cross section of the beams and also superposes the divided plural lines of laser beams on a common area in a face 5 to be irradiated. A profiler 6 measures profile data 61 expressing a profile equivalent to the profile in the face 5 to be irradiated of the laser beams superposed by the homogenizer 3. A controller 7 controls the beam width of the incident laser beam L using a movable expander 2 based on the profile data 61. Then, the profile on the face 5 to be irradiated is changed by the beam width of the incident laser beam L. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to an optical device including a homogenizer that uniformizes an intensity distribution in a beam cross section of laser light, and an intensity distribution control method.

  A homogenizer is known as a means for homogenizing an intensity distribution (hereinafter referred to as a profile) in a beam cross section of a laser beam. For example, there is a homogenizer provided with a pair of cylinder arrays and a focus lens. Considering an XYZ Cartesian coordinate system in which the direction parallel to the optical axis of the laser light incident on the homogenizer is the Z direction, each of the cylinder arrays has the lens optical axis direction parallel to the Z direction, and the generatrix direction of the cylindrical surface Are arranged in parallel with the Y direction, and a plurality (N) of cylindrical lenses are arranged in the X direction. Such a cylinder array is arranged in two stages in the front and rear in the Z direction. The lens optical axis of the cylindrical lens constituting the front cylinder array coincides with the lens optical axis of the corresponding cylindrical lens constituting the rear cylinder array. A focus lens is disposed downstream of the pair of cylinder arrays in the Z direction.

  A pair of cylinder arrays divides one laser beam into N laser beams in the X direction with respect to the position in the beam cross section. The divided N laser beams are superimposed on a common area in the irradiated surface by the focus lens. Thereby, the profile of each divided laser beam is added in the common area. As a result, a profile more uniform than the original laser light profile is obtained.

  Patent Document 1 listed below discloses a technique for obtaining a profile having a desired shape using a homogenizer. In this technique, the optical path length between a pair of front and rear cylindrical lenses out of N pairs of front and rear cylindrical lenses configured by the pair of cylinder arrays is different from the optical path length between the other pair of front and rear cylindrical lenses. Make it. The profile of the divided laser beams on the irradiated surface depends on the optical path length between a pair of front and rear cylindrical lenses through which the laser beams pass. Therefore, by finding the optimum optical path length between a certain pair of front and rear cylindrical lenses, the profile on the irradiated surface can be made a desired shape.

Japanese Patent Laid-Open No. 2001-156016 (page 3-4, FIG. 1)

  The profile of the laser light incident on the homogenizer changes with time. Therefore, even if the optical path length between the pair of front and rear cylindrical lenses is set to an optimum value, if the profile of the incident laser beam itself fluctuates, the profile in the irradiated surface will also differ from the intended one. Come. Therefore, a technique for controlling the profile on the irradiated surface so as to be close to a desired target profile is desired.

  In addition, when it is going to control a profile using the technique of the said patent document 1, it is necessary to adjust the optical path length between a pair of front and rear cylindrical lenses. For this purpose, for example, a mechanism for individually moving each cylindrical lens in the lens optical axis direction must be incorporated in the homogenizer. Therefore, the configuration of the homogenizer becomes complicated.

  In the technique of Patent Document 1, in order to obtain a desired shape profile, the optical path length between which pair of front and rear cylindrical lenses among N pairs of front and rear cylindrical lenses is adjusted within what range. I'm not sure what to do. Therefore, a technique that can more easily obtain a profile having a desired shape is desired.

  An object of the present invention is to provide a technique for controlling the profile of a laser beam using a homogenizer. Another object of the present invention is to provide a technique for controlling the profile of a laser beam without complicating the configuration of the homogenizer. Still another object of the present invention is to provide a technique for easily obtaining a profile of a desired shape using a homogenizer.

  According to one aspect of the present invention, a homogenizer that uniformizes an intensity distribution in a beam cross section of incident laser light incident on itself, and an intensity for measuring the intensity distribution of the laser light whose intensity distribution is uniformed by the homogenizer An optical apparatus is provided that includes a distribution measuring unit and a beam width control unit that controls a beam width of the incident laser light based on a measurement result of the intensity distribution measuring unit.

  The intensity distribution made uniform by the homogenizer changes depending on the beam width of the incident laser light incident on the homogenizer. Therefore, the beam width control means can change the beam width of the incident laser light so as to change the intensity distribution made uniform by the homogenizer. Thereby, an intensity distribution having a desired shape can be easily obtained regardless of the intensity distribution of the incident laser beam. In order to obtain the intensity distribution of the desired shape, it is only necessary to change the beam width of the incident laser light, so that the configuration of the homogenizer itself is not complicated.

  FIG. 1 shows the configuration of the homogenizer according to the embodiment. Consider an XYZ orthogonal coordinate system in which the direction parallel to the optical axis of laser light (hereinafter referred to as incident laser light) L incident on the homogenizer 3 is the Z direction. 1A is a cross-sectional view parallel to the XZ plane, and FIG. 1B is a cross-sectional view parallel to the YZ plane. The homogenizer 3 includes a beam width limiting member 30 that limits the beam width of the incident laser light L, a pair of X cylinder arrays 31 and 32, a pair of Y cylinder arrays 33 and 34, and a focus lens 35.

  The beam width limiting member 30 is formed of a light shielding plate having an opening 30a as a laser light passage portion that allows passage of laser light at the center. The arrangement position of the beam width limiting member 30 is the foremost stage in the Z direction. Each of the X and Y cylinder arrays 31 to 34 includes a plurality of mutually equivalent cylindrical lenses. One cylindrical lens has a uniform cross-sectional shape in the longitudinal direction (the generatrix direction of the cylindrical surface), and the cross-sectional shape is line symmetric with respect to a straight line parallel to the Z direction.

  As shown in FIG. 1A, the width in the X direction of the opening 30 a formed in the beam width limiting member 30 is equal to the width in the X direction of the X cylinder arrays 31 and 32. Each of the X cylinder arrays 31 and 32 is configured by arranging N (seven in this case) cylindrical lenses in the X direction with the longitudinal direction parallel to the Y direction and the lens optical axis direction parallel to the Z direction. ing. The pair of X cylinder arrays 31 and 32 are arranged in two stages in the front and rear in the Z direction. The lens optical axes of the respective cylindrical lenses constituting the front X cylinder array 31 coincide with the lens optical axes of the corresponding cylindrical lenses constituting the rear X cylinder array 32.

  The X cylinder arrays 31 and 32 divide the incident laser light L that has passed through the opening 30a formed in the beam width limiting member 30 into N parts (here, seven parts) in the X direction with respect to the position in the beam cross section. In FIG. 1A, only three laser beams at the center in the X direction and at both ends of the divided laser beams are representatively shown.

  As shown in FIG. 1B, the width of the opening 30a formed in the beam width limiting member 30 in the Y direction is equal to the width of the Y cylinder arrays 33 and 34 in the Y direction. Each of the Y cylinder arrays 33 and 34 is configured by arranging M (seven in this case) cylindrical lenses in the Y direction with the longitudinal direction parallel to the X direction and the lens optical axis direction parallel to the Z direction. ing. The pair of Y cylinder arrays 33 and 34 are arranged in two front and rear stages in the Z direction. The lens optical axes of the respective cylindrical lenses constituting the front-stage Y cylinder array 33 coincide with the lens optical axes of the corresponding cylindrical lenses constituting the rear-stage Y cylinder array 34.

  The Y cylinder arrays 33 and 34 divide the incident laser light L that has passed through the opening 30a formed in the beam width limiting member 30 into M parts (here, seven parts) in the Y direction with respect to the position in the beam cross section. In FIG. 1B, only three laser beams at the center and both ends in the Y direction are representatively shown among the divided laser beams.

  The Y cylinder array is obtained by making the longitudinal direction of the cylindrical lenses constituting the Y cylinder arrays 33 and 34 orthogonal to the longitudinal direction of the cylindrical lenses constituting the X cylinder arrays 31 and 32 when viewed in a line of sight parallel to the Z direction. The lens action of 33 and 34 and the lens action of the X cylinder arrays 31 and 32 are independent of each other. The X cylinder arrays 31 and 32 are equivalent to a translucent plate having no lens action in the YZ plane (see FIG. 1B), and the Y cylinder arrays 33 and 34 are in the XZ plane (see FIG. a)) is equivalent to a light-transmitting plate having no lens action.

  The front Y cylinder array 33 is arranged in the front stage in the Z direction with respect to the front X cylinder array 31, and the rear Y cylinder array 34 is located between the front X cylinder array 31 and the rear X cylinder array 32. Is arranged. However, since the lens action of the X cylinder arrays 31 and 32 and the lens action of the Y cylinder arrays 33 and 34 are independent from each other, the arrangement order of the X and Y cylinder arrays 31 to 34 in the Z direction is arbitrary.

  A focus lens 35 is disposed at a position downstream of the X and Y cylinder arrays 31 to 34 in the Z direction. The focus lens 35 superimposes the laser light group divided into a plurality of positions with respect to the position in the beam cross section by the X and Y cylinder arrays 31 to 34 on a common irradiation region in the homogenized surface S.

  FIG. 2 shows a laser beam irradiation apparatus provided with the homogenizer 3 shown in FIG. The light source 1 emits laser light. On the optical path of laser light emitted from the light source 1, a movable expander 2, a homogenizer 3, and a beam splitter 4 are arranged in this order.

  The movable expander 2 variably adjusts the beam width of the laser light emitted from the light source 1. Incident laser light L that has passed through the movable expander 2 enters the homogenizer 3. As described above, the homogenizer 3 divides the incident laser light L whose beam width has been adjusted into a plurality of pieces with respect to the position in the beam cross section, and superimposes the divided laser light groups on the homogenization surface.

  The beam splitter 4 branches the laser light emitted from the homogenizer 3, that is, a plurality of laser light groups emitted from the focus lens 35 of FIG. One of the branched laser light groups La is incident on the irradiated surface 5. An irradiation object to be irradiated with laser light is arranged on the irradiated surface 5. The other branched laser light group Lb is incident on the profiler 6 for monitoring. The position of the homogenized surface S corresponding to the laser beam group La is the irradiated surface 5, and the profiler 6 is disposed at the position of the homogenized surface S corresponding to the laser beam group Lb.

  The profiler 6 measures profile data 61 representing a profile on the homogenized surface of the laser beam group Lb. The profile data 61 is data in which the position of the laser beam group Lb in the beam cross section is associated with the light intensity at that position. The profile on the homogenized surface of the laser beam group Lb is equal to the profile on the irradiated surface 5 of the laser beam group La. Therefore, the profile on the irradiated surface 5 can be known from the profile data 61.

  The controller 7 changes the beam width of the incident laser light L by controlling the movable expander 2 based on the profile data 61 that is the measurement result of the profiler 6.

  With reference to FIG. 3, the relationship between the beam width of the incident laser beam L and the profile on the homogenized surface (irradiated surface 5) will be described. As described with reference to FIG. 1, in the homogenizer 3, the lens action in the XZ plane and the lens action in the YZ plane are independent of each other. Therefore, as an example, description will be given focusing on only the XZ plane.

  3 (a) to 3 (c), in order to simplify the explanation, instead of the X cylinder array 31 consisting of seven cylindrical lenses shown in FIG. 1 (a), an X cylinder array consisting of three cylindrical lenses. An example using 40 is shown. That is, it is assumed that the incident laser light is divided into three in the X direction. Illustration of an equivalent X cylinder array and a focus lens paired with the X cylinder array 40 is omitted.

3 (a) to 3 (c), waveforms P _{1 to} P ₆ and A _{2 to} J ₂ each take a position in the beam cross section of the laser beam in the XY plane, and indicate the light intensity at the position in the plane as Z. A one-dimensional profile equivalent to a cross section parallel to the XZ plane of a two-dimensional profile expressed in a direction is schematically shown. In these profiles, the axis in the X direction indicates a position on a straight line representing the beam width in the X direction in the beam cross section.

3A shows a state in which the beam width in the X direction of the incident laser light L is adjusted to be equal to the width in the X direction of the X cylinder array 40 by the movable expander 2 in FIG. The incident laser light L has a profile P ₁ whose intensity decreases as it approaches the end in the X direction. In response to the incident laser beam L is divided into three parts in the X direction, the profile P ₁ is divided into three parts in the X direction. Beam width in the X direction of the incident laser beam L, is equal to the width in the X direction of the X cylinder array 40, the profile P ₁ is evenly by the width of the X direction of each cylindrical lens forming the X cylinder array 40, the profile Divided into A ₁ , B ₁ , and C ₁ .

Laser beams having profiles A ₁ , B ₁ , and C ₁ have profiles A ₂ , B ₂ , and C ₂ on the homogenized surface, respectively. These profiles A ₂ , B ₂ , and C ₂ are equal to the original profiles A ₁ , B ₁ , and C ₁ stretched in the X direction, respectively. Corresponding to the fact that the laser beam group divided into three in the X direction is superimposed on a common irradiation region in the homogenization plane, the profiles A ₂ , B ₂ , and C ₂ are added in the irradiation region. As a result, the profile _{P 2} is obtained.

Profile B ₂ is because it was stretched profile B ₁ generally planar X-direction central portion of the original profile P _1, a substantially flat shape. Both profiles A ₂ and C ₂ gradually decrease from one end to the other end in the X direction, but both are in a relationship reversed with respect to the X direction. Therefore, as a result of adding the profiles A ₂ , B ₂ , and C ₂ , a profile P ₂ having a substantially flat intensity distribution in the X direction is obtained.

  3B shows a state in which the beam width in the X direction of the incident laser light L is adjusted to be larger than the width in the X direction of the X cylinder array 40 by the movable expander 2 in FIG. The beam width in the X direction is expanded without moving the central optical axis of the incident laser light L. When the beam width in the X direction of the incident laser light L is larger than the width in the X direction of the X cylinder array 40, a part of the incident laser light is shielded by the beam width limiting member 30 in FIG.

Profile of the laser beam passing through the aperture 30a formed in the beam width restriction member 30 of the incident laser beam L is equally by the width of the X direction of each cylindrical lens forming the X cylinder array 40, the profile D _1, E Divided into ₁ and F ₁ in three. Note that the profiles G ₁ and H _{1 at} the end portion of the profile P ₃ of the incident laser beam are profiles of the laser beam shielded by the beam width limiting member 30, respectively.

Laser beams having profiles D ₁ , E ₁ , and F ₁ have profiles D ₂ , E ₂ , and F ₂ on the homogenized surface, respectively. These profiles D ₂ , E ₂ , and F ₂ are equal to the original profiles D ₁ , E ₁ , and F ₁ stretched in the X direction, respectively. The profile E ₂ is an extension of the profile E ₁ of the substantially flat central portion in the X direction of the original profile P ₃ , and thus has a substantially flat shape. Both profiles D ₂ and F ₂ gradually decrease from one end to the other end in the X direction, and both are in a relationship reversed with respect to the X direction.

However, not using the profile G ₁ and H ₁ of the distal portion of the original profile P ₃ that each of the profiles D ₂ and F ₂ is the intensity of the X-direction central portion of the X-direction one end and the other end It has a distribution that is greater than the average intensity. Therefore, as a result of adding the profiles D ₂ , E ₂ , and F ₂ , a profile P _{4 in} which the central portion in the X direction is expanded is obtained.

FIG. 3C shows a state in which the beam width in the X direction of the incident laser light L is adjusted to be smaller than the width in the X direction of the X cylinder array 40 by the movable expander 2 in FIG. The beam width in the X direction is reduced without moving the central optical axis of the incident laser light L. Corresponding to the incident laser beam L being divided into three in the X direction, the profile P ₅ of the incident laser beam is divided into three in the X direction into profiles I ₁ , J ₁ , and K ₁ . However, the incident laser beam from but are not incident on the entire area of the cylinder array 40, the profile P ₅ to the equally not divided into three parts.

Laser beams having profiles I ₁ , J ₁ , and K ₁ have profiles I ₂ , J ₂ , and K ₂ on the homogenized surface, respectively. Profile J ₂ is because it was stretched profile J ₁ generally planar X-direction central portion of the original profile P _5, a substantially flat shape. Both the profiles I ₂ and K ₂ gradually decrease from one end to the other end in the X direction, and both are in a relationship reversed with respect to the X direction.

However, as a result of the profile P ₅ being unevenly divided into three so that the width in the X direction of the profile I ₁ and the profile K ₁ is shorter than the width in the X direction of the profile J ₁ , as a result of the profiles I ₂ and K ₂ The width in the X direction is shorter than the width in the X direction of the common irradiation region on the homogenized surface. Extension takes profile I ₂ and K _2, extending toward the X-direction end of the profile I ₂ common irradiation region to the other, with the profile K ₂ is toward one end in the X direction and the other end of the common illumination area It is arranged to exist. Therefore, as a result of adding the profiles I ₂ , J ₂ , and K ₂ , a profile P _{6 in} which the central portion in the X direction is recessed is obtained.

As described above, depending on the beam width in the X direction of the incident laser light L, the two-dimensional profile on the homogenized surface is equivalent to a cross section parallel to the XZ plane (hereinafter referred to as a profile in the X direction). Changes. That is, the X direction of the beam width of the incident laser beam, the X-direction of the profile, any flat type such as profile P _2, middle bulge types such as profile P _4, and the middle dent type, such as a profile P ₆ Can also be shaped.

  In FIG. 3, the description has been made focusing on the lens action in the XZ plane, but the same result can be obtained by focusing on the lens action in the YZ plane. That is, depending on the beam width in the Y direction of the incident laser light L, the two-dimensional profile on the homogenized surface S is also a flat type, medium one-dimensional profile equivalent to a cross section parallel to the YZ plane (hereinafter referred to as the Y direction profile). It can be shaped into either a bulge type or an indentation type.

  Therefore, in FIG. 2, the controller 7 can control the profile on the irradiated surface 5 (homogenized surface) by changing the beam width of the incident laser light L using the movable expander 2. Specifically, the controller 7 makes the profile on the irradiated surface 5 approach the target profile based on the comparison result between the current profile on the irradiated surface 5 specified by the profile data 61 and the target profile. Thus, the beam width of the incident laser light L is controlled.

  Thereby, for example, even when the profile of the incident laser light L varies due to maintenance of the light source 1, the profile on the irradiated surface 5 is shaped in real time regardless of the profile of the incident laser light L. , It can be matched to the shape of the target profile.

  When the movable expander 2 changes the X-direction beam width of the incident laser light L, it simultaneously changes the Y-direction beam width. Accordingly, the controller 7 can simultaneously control the X-direction and Y-direction profiles on the homogenized surface by simultaneously changing the X- and Y-direction beam widths of the incident laser light L using the movable expander 2.

  Hereinafter, an experiment that specifically examines the relationship between the beam width of the incident laser light L and the profile shape on the homogenized surface S will be described.

FIG. 4 schematically shows a profile in the X direction on the homogenized surface. This profile corresponds to the profiles P ₂ , P ₄ and P ₆ of FIG. The horizontal axis indicates the position in the X direction within the common irradiation region, and the vertical axis indicates the light intensity. When the intensity at the center in the X direction of this profile is I _OX and the intensity of both shoulders in the X direction (for example, the average of the intensity of one shoulder and the other shoulder) is _Im x The profile uniformity K _X in the X direction at is defined by the following equation. K _X = (I _OX −I _mX ) / (I _OX + I _mX )

When I _OX > I _mX , that is, when the profile in the X direction on the homogenized surface is a middle bulge type, the value of K _X is positive. At this time, it indicates that the larger the absolute value of K _X is, the larger the way of swelling in the central portion in the X direction of the profile is.

When I _OX <I _mX , that is, when the profile in the X direction on the homogenized surface is a dent type, the value of K _X is negative. In this case, as the absolute value of K _X is large, indicating a greater way dent X direction central portion of the profile.

When I _OX = I _mX , that is, when the profile in the X direction on the homogenized surface is a flat type, the value of K _X is zero. As the value of I _OX approaches the value of I _mX , that is, the profile approaches the flat type, the value of K _X approaches zero.

As described above, according to the profile uniformity K _X in the X direction, the degree of uniformity of the profile in the X direction is quantified by the absolute value, and whether the type of the profile in the X direction is the middle bulge type by the sign. Alternatively, it is determined whether it is a dent type.

FIG. 5 shows a measured profile of the incident laser light L. This profile corresponds to the profiles P ₁ , P ₃ and P ₅ in FIG. The horizontal axis indicates the position in the X direction within the beam cross section, and the vertical axis indicates the light intensity. Incident laser light L having this profile is incident on the homogenizer 3. Then, how the profile uniformity K _X in the X direction changes on the homogenized surface S while changing the beam width in the X direction of the incident laser light L using the movable expander 2 was examined. The result is shown in FIG.

FIG. 6 is a graph showing the relationship between the X-direction beam width D _{X of the} incident laser light L having the profile shown in FIG. 5 and the X-direction profile uniformity K _X on the homogenized surface S. The horizontal axis indicates the beam width D _X and the vertical axis indicates the uniformity K _X. Each of a pair of X cylinder array which comprises the homogenizer 3 used for this experiment consists of 13 cylindrical lenses. The width of each cylindrical lens constituting the X cylinder array in the X direction is 8 mm. That is, the width of each X cylinder array in the X direction is 104 mm. The value of the beam width _{D X} was varied in the range of 40Mm～120mm. A value of the uniformity K _X with respect to the beam width D _X was plotted, and a smooth curve was connected between the plots to obtain this graph.

As the beam width D _X increases, the uniformity K _X vibrates and the vibration is attenuated. The maximum value of the degree of uniformity K _X within an arbitrary period of vibration is a positive value, and the minimum value is a negative value. When the uniformity K _X takes the maximum value in any one period, the profile in the X direction becomes the most swelled shape in that period, and when the uniformity K _X takes the minimum value, The profile becomes the most concave shape within the period.

The manner in which the degree of uniformity K _X changes with respect to the beam width D _X is continuous, which means that the profile shape in the X direction is continuous between the most swollen state and the most depressed state within an arbitrary period. It shows that it changes. When the uniformity K _X becomes zero in the course of the transition, the profile shape in the X direction becomes a flat type.

One period of vibration of K _X is equal to twice the width of one cylindrical lens in the X direction (16 mm). Thus, the beam width D _X in the X direction of the incident laser beam L, when caused to by twice the change in the X direction width of at least the cylindrical lens, in the course of the change, the X direction profile in homogenization surface S, It can be shaped into any of the middle bulge type, flat type, and middle dent type. Similarly, if the beam width in the Y direction of the incident laser beam L is changed by twice the width in the Y direction of each cylindrical lens constituting the Y cylinder array, the profile in the Y direction on the homogenized surface is changed in the process. It can be shaped into any of the middle bulge type, flat type, and middle dent type.

  Therefore, in FIG. 2, in order to shape the profile on the irradiated surface (homogenized surface) 5 into a desired shape, the amount of change in the beam width in the X direction of the incident laser light L by the controller 7 constitutes the X cylinder array. It is sufficient if it is not more than twice the width of the cylindrical lens in the X direction. The amount of change in the beam width in the Y direction is sufficient if it is not more than twice the width in the Y direction of the cylindrical lenses constituting the Y cylinder array. As described above, since the upper limit of the amount of change in the beam width of the incident laser light L for obtaining the desired shape profile is known, the desired shape profile can be easily obtained.

Note that the change amount of the beam width D _X by the controller 7 may be made to coincide with, for example, a half cycle of the vibration of K _X , that is, the width of the cylindrical lens in the X direction. The uniformity K _X vibrates so as to alternately take a maximum value and a minimum value as the beam width D _X increases. The maximum value of the uniformity K _X is a positive value, and the minimum value is a negative value. Therefore, when matching the variation of beam width D _X to a half period of oscillation of the K _X is a beam width D _X D _X1 above, both end points D _X1 and when to alter the range of D _X2 below The change range of the beam width D _X may be selected so that the value of D _X2 becomes an extreme value of the uniformity K _X. As a result, in the process of changing the beam width D _X by the half period of the vibration with the uniformity K _X , the profile in the X direction can be shaped into any of the middle bulge type, the flat type, and the middle dent type.

However, the profile of the incident laser light L varies due to a change in the output characteristics of the light source 1 with time. Therefore, the condition that the uniformity K _X takes an extreme value when the beam width D _X is D _X1 and D _X2 is not always maintained. Therefore, it is preferable to make the amount of change from D _X1 to D _X2 equal to twice the width of the cylindrical lens in the X direction.

In FIG. 6, the vibration with the uniformity K _X is attenuated as the beam width D _X approaches the X-direction width (104 mm) of the X cylinder array. In the vicinity of the point where the beam width D _X coincides with the width in the X direction of the X cylinder array, change in uniformity K _X to changes in the beam width D _X is smaller. Therefore, when the beam width D _X is changed within the range of D _X1 or more and D _X2 or less, for example, a point representing the width in the X direction of the X cylinder array is included between D _X1 and D _X2. If D _X1 and D _X2 are determined (for example, D _X1 = 92 mm and D _X2 = 108 mm), the profile shape in the X direction can be finely adjusted. On the other _hand, if determined _{D X1} and _{D X2} as _{D X1} and _{D X2} becomes the width less than the X direction of the X cylinder array, while changing the _{D X} from _{D X1} to _{D X2,} the X-direction profile of the The shape can be changed significantly.

  As mentioned above, although the Example was described, this invention is not limited to this. In the embodiment, the homogenizer 3 includes the beam width limiting member 30, but the maximum value of the X direction beam width of the incident laser L emitted from the movable expander 2 is, for example, the X cylinder array 31 and 32 in the X direction. The homogenizer 3 may not include the beam width limiting member 30 when the width is equal to or smaller than the width and the maximum value of the beam width in the Y direction is equal to or smaller than the width of the Y cylinder arrays 33 and 34 in the Y direction.

  In the embodiment, the movable expander 2 is used to simultaneously adjust the beam width in the X direction and the beam width in the Y direction of the incident laser light. However, the beam width in the X direction and the beam width in the Y direction are adjusted. You may make it adjust independently. Changing the beam width of the incident laser beam in the X direction does not affect the shape of the profile in the Y direction on the homogenized surface, and changing the beam width of the incident laser beam in the Y direction does not affect the X direction on the homogenized surface. Does not affect the profile shape. Therefore, if the beam width in the X direction and the beam width in the Y direction are adjusted independently, the profile in the X direction and the profile in the Y direction on the homogenized surface can be controlled independently. Therefore, since the profile on the irradiated surface can be controlled more flexibly, the versatility of the laser beam irradiation apparatus can be improved.

  In the embodiment, a cylinder array type homogenizer is used, but the present invention is not limited to this. A homogenizer that uniformizes the intensity distribution in the beam cross section of the laser beam, and the homogenizer in which the uniform intensity distribution varies depending on the beam width of the incident laser beam incident on the homogenizer can be used. . Therefore, a reflection type homogenizer, for example, a parabolic mirror type homogenizer may be used. A parabolic mirror array type homogenizer includes a parabolic mirror array in which a plurality of minute parabolic mirrors are arranged in a direction intersecting the incident direction of incident laser light, and the parabolic mirror array. And a lens that superimposes the laser light divided in the arrangement direction of the parabolic mirrors on a common region.

  The application of the laser beam whose profile is controlled by the controller 7 is not particularly limited. For example, it can be used for modification of the surface of an object, processing of a material, or exposure. Specifically, in FIG. 2, an amorphous silicon film may be disposed on the irradiated surface 5, and the amorphous silicon film may be subjected to crystallization annealing by irradiating laser light having a shaped profile.

  Alternatively, a multilayer substrate may be disposed on the irradiated surface 5 and a laser beam with a profile adjusted may be used for drilling the multilayer substrate. There is a report that a hole having a large aperture ratio can be formed by using a laser beam whose profile is shaped into a concave shape (see Japanese Patent Application Laid-Open No. 2003-236690). The aperture ratio is a value defined by Db / Dt, where Dt is the diameter of the opening of the hole and Db is the diameter of the bottom surface. FIG. 1 shows a state in which the beam shape on the homogenized surface S is elongated in the X direction, but the beam shape on the homogenized surface S is the distance between the X cylinder arrays 31 and 32, and Y It can be arbitrarily shaped according to the distance between the cylinder arrays 33 and 34.

  Further, an exposure apparatus can be configured by arranging a reticle on the irradiated surface 5 and further including a projection lens that projects the image of the reticle on the wafer after the reticle. It will be apparent to those skilled in the art that various modifications, improvements, combinations, and the like can be made.

It is the schematic which shows typically the structure of the homogenizer which concerns on an Example. It is the schematic which shows the structure of a laser beam irradiation apparatus. It is a conceptual diagram which shows the relationship between the beam width of the X direction of the incident laser beam which injects into a homogenizer, and the profile in a homogenization surface. It is a diagram which shows typically the profile of the X direction in a homogenization surface. It is a graph which shows the measured profile of the incident laser beam which injects into a homogenizer. And beam width D _X in the X direction of the incident laser beam to be incident on the homogenizer is a graph showing the relationship between X-direction profile uniformity K _X in homogenization plane.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Light source 2 Movable expander 3 Homogenizer 4 Beam splitter 5 Irradiation surface 6 Profiler (intensity distribution measuring means)
7 Controller (beam width control means)
30 Beam width limiting member (shading plate)
30a aperture (laser beam passage)
31 X-cylinder array in the first stage (first optical system)
32 Second-stage X cylinder array 33 First-stage Y cylinder array (second optical system)
34 Y-cylinder array at the rear stage 35 Focus lens S Homogenized surface L Incident laser beam

Claims (13)

A homogenizer for uniformizing the intensity distribution in the beam cross section of the incident laser light incident on the self,
Intensity distribution measuring means for measuring the intensity distribution of the laser light whose intensity distribution is uniformized by the homogenizer;
An optical apparatus comprising: a beam width control unit that controls a beam width of the incident laser light based on a measurement result of the intensity distribution measurement unit. 2. The optical device according to claim 1, wherein the homogenizer divides the incident laser beam into a plurality of laser beams with respect to a position in a beam cross section, and superimposes the divided laser beams on a common region. . The homogenizer includes a first optical system configured such that a plurality of first condensing elements each condensing laser light are arranged in the X direction intersecting the incident direction of the incident laser light,
The optical apparatus according to claim 1, wherein the beam width control unit changes a beam width of the incident laser light in at least the X direction. The widths in the X direction of the first light condensing elements constituting the first optical system are equal,
4. The optical device according to claim 3, wherein an amount of change in the X direction of the beam width of the incident laser light by the beam width control unit is less than or equal to twice the width in the X direction of one of the first condensing elements. apparatus. The X direction is a direction orthogonal to the incident direction of the incident laser light,
When the incident laser beam is incident in the Z direction and the direction perpendicular to both the Z direction and the X direction is the Y direction, each of the first condensing elements has a cross section perpendicular to the Y direction. The optical device according to claim 3 or 4, comprising a cylindrical lens having a uniform shape with respect to the Y direction and a cross-sectional shape being axisymmetric with respect to a straight line parallel to the Z direction. The homogenizer has a second optical system in which a plurality of second condensing elements that condense laser light are arranged in the Y direction perpendicular to both the incident direction of the incident laser light and the X direction. Including
The optical apparatus according to claim 3, wherein the beam width control unit changes a beam width of the incident laser light also in the Y direction. The widths in the Y direction of the second light collecting elements constituting the second optical system are equal,
The optical amount according to claim 6, wherein the amount of change in the Y direction of the beam width of the incident laser light by the beam width control unit is less than or equal to twice the width in the Y direction of one of the second condensing elements. apparatus. Each of the second light-collecting elements includes a cylindrical lens whose cross-sectional shape perpendicular to the X direction is uniform with respect to the X direction, and whose cross-sectional shape is axisymmetric with respect to a straight line parallel to the Z direction. The optical device according to claim 6 or 7. (A) By making the incident laser light incident on a homogenizer that homogenizes the intensity distribution in the beam cross section of the incident laser light incident on itself, the intensity distribution is made more uniform than the intensity distribution of the incident laser light. Obtaining a laser beam having,
(B) measuring the intensity distribution of the obtained laser beam;
(C) controlling the beam width of the incident laser light incident on the homogenizer based on the measured intensity distribution. The homogenizer includes a first optical system configured such that a plurality of first condensing elements each condensing laser light are arranged in the X direction intersecting the incident direction of the incident laser light,
The intensity distribution according to claim 9, wherein the step (c) includes a step (c1) of changing a beam width of the incident laser light in the X direction based on the intensity distribution measured in the step (b). Control method. The amount of change when changing the beam width of the incident laser light in the X direction in the step (c1) is less than or equal to twice the width of the first condensing element in the X direction. 10. The intensity distribution control method according to 10. The X direction is a direction orthogonal to the incident direction of the incident laser light,
The homogenizer has a second optical system in which a plurality of second condensing elements that condense laser light are arranged in the Y direction perpendicular to both the incident direction of the incident laser light and the X direction. Including
The step (c) includes a step (c2) of changing a beam width of the incident laser light in the Y direction based on the intensity distribution measured in the step (b). Intensity distribution control method. The amount of change when changing the beam width of the incident laser light in the Y direction in the step (c2) is less than or equal to twice the width of the second condensing element in the Y direction. 12. The intensity distribution control method according to 12.

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