JP2005127830A - Shape profile measuring device and manufacturing method of semiconductor device using it - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a shape profile measuring device capable of realizing highly accurate measurement of a fine short-wavelength pattern by imparting a scatterometer device for solving the problem of grazing incidence in the case of using a reflection type objective lens and the problem of chromatic aberration in the case of using the reflection type objective lens. <P>SOLUTION: In this shape profile measuring device for performing shape profile measurement by collation between a measured spectral waveform and a simulation waveform, vertical incidence can be realized by using one concave mirror 21 and one convex mirror 22 as an image formation system and by using an optical system wherein the image side is on the same side as the object side to the concave mirror 21, namely, by using an Offner type lens as the reflection type objective lens, and since only a vertical reflection component can be detected, the collation between the simulation waveform and the measured waveform becomes possible, to thereby realize highly-accurate short-wavelength measurement. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a shape profile measuring apparatus using a short wavelength light source, and more particularly to a technique effective when applied to a scatterometry apparatus using a short wavelength light source and a semiconductor device manufacturing method using the scatterometry apparatus.

  According to a study by the present inventors, in the manufacture of a semiconductor device, a film forming process for forming a conductive film or an insulating film on a semiconductor wafer, a resist as a photosensitive agent is applied on the film, and a reticle is formed. After the circuit pattern is exposed and developed on the resist, the lithography process for forming the circuit pattern on the semiconductor wafer by etching the film using the remaining resist as a mask is repeated for each layer.

  Here, as a reference technique of the present invention, an exposure process for printing a pattern on a photosensitive agent in a lithography process will be described with reference to FIG. A circuit pattern 61 is drawn on the reticle 6, and these are transferred onto the photosensitive agent of the semiconductor wafer 3 through the exposure lens 7 by the exposure light 6001. In order to check whether or not the transferred circuit pattern is in conformity with the dimensional standard, a dimensional inspection is usually performed by an SEM (Scanning Electron Microscope). In the inspection, there are a case where the transfer circuit pattern 351 is directly measured and a case where the transfer test pattern 352 existing outside the chip region 350 is measured. In general, correction is performed with the exposure amount of the exposure apparatus depending on the size of the measured dimension. This automation of exposure amount correction is described in Non-Patent Document 1, for example.

  On the other hand, the cause of the dimensional variation is a focus shift other than the exposure amount variation of the exposure apparatus. For example, Patent Document 1 discloses a method of correcting not only the exposure amount but also the focus. This is a method of obtaining the exposure amount and the focus correction amount directly from the SEM waveform by associating the SEM waveform change with the exposure amount and the focus shift in advance.

  Recently, for example, Non-Patent Document 2 discloses a method called scatterometry that optically measures a cross-sectional profile of a transfer circuit pattern. Here, the configuration of the scatterometry measuring apparatus will be described with reference to FIG. FIG. 7 shows a spectroscopic scatterometry measuring apparatus. White light 1111 emitted from the white light source 1110 is irradiated onto the repetitive pattern 31 on the substrate 33, specularly reflected light is spectrally separated by the diffraction grating 400, and a spectral waveform is detected by the sensor 500.

  Next, a method for processing the spectral waveform obtained by the above measuring apparatus will be described with reference to FIG. The spectral waveform 800 is called a signature, and in the case of a signal obtained by the measurement apparatus of FIG. 7, it becomes a signal of a light intensity change with respect to the wavelength. The signature changes depending on the cross-sectional profile of the repeated pattern 31. Therefore, signatures for various cross-sectional profiles are obtained in advance by wave optical simulation, and these are stored as a library. For example, the cross-sectional profile is modeled as a rectangle according to the bottom line width L, the film thickness D, and the taper angle α of the repetitive pattern 31, and signature simulation is performed. The spectral waveform 800 is compared with the signature library, and the cross-sectional profile that gives the matched signature, that is, the line width L1, the film thickness D1, and the taper angle α1 are measured values.

  This method is advantageous because scatterometry is a measurement by light, compared to SEM, which has a concern that the line width may change during electron beam irradiation due to the reaction of the photosensitive agent. In addition, it can be measured in the atmosphere, and since it does not take time for evacuation unlike SEM, high-speed measurement is possible.

Scatterometry has an advantage over SEM in measuring a circuit pattern cross-sectional profile as described above. However, since it is necessary to calculate a large number of waveforms in advance, high-speed optical simulation is required. For this reason, for example, a calculation method called Rigorous Coupled Wave Analysis (RCWA) disclosed in Non-Patent Document 3 is adopted. This approximates the cross section of the pattern with multiple rectangular layers, considers each rectangular layer as a diffraction grating with the same pitch and duty that continues indefinitely, and determines the coefficient of the series solution of the wave equation by matching the boundary conditions between the rectangular layers It is a method to do. Compared with the finite element method, which is another method of solving the wave equation, the waveform can be calculated at a very high speed.
JP 2001-143982 A Implementation of a Closed Loop CD and Overlay Controller for Sub 0.25 μm Patterning, SPIE Vol. 3332, 1998, pp461-470 Specular Spectroscopic Scatterometry in DUV Lithography, SPIE Vol. 3677, 1999, pp 159-168 Diffraction Analysis of Dielectric Surface-relief Gratings, J.A. Opt. Soc. Am. , Vol. 72, no. 10, 1982

  By the way, in the manufacture of semiconductor devices, the circuit pattern of a semiconductor has been miniaturized and has now reached a line width of less than 100 nm. Whether the fine line width can be accurately measured by scatterometry depends on whether the sensitivity of the above-mentioned spectral waveform is sensitive to a fine line width change.

  Here, the sensitivity of the spectral waveform with respect to the line width change of the repetitive pattern shown in FIG. 9 will be considered. An antireflection film 302 having a thickness of 100 nm is applied on a silicon substrate 301, and a repeated pattern 303 of a resist having a thickness of 400 nm is formed thereon. FIG. 10 shows the spectral waveform calculated by the above-mentioned Rigorous coupled wave analysis for this pattern. With respect to the change from the line width of 100 nm to 90 nm, the difference between the waveforms corresponding to both is large in the wavelength region of 350 nm or less. That is, it can be seen that the sensitivity to a change in line width is large in a short wavelength region of 350 nm or less.

  In the current normal scatterometry apparatus, a xenon lamp is used as a light source, so that the light intensity is significantly reduced in a short wavelength region of 350 nm or less. On the other hand, a deuterium lamp having an intensity in a wavelength range of 190 to 250 nm is known as a short wavelength light source. For example, N. Kondo et al., Film Thickness Measurement of Ultrathin Film, Using Light of Ubi Waveence (Film thickness measurement of ultrathin film using light of UV wavelength). ), SPIE Vol. 1673, pp 395-396.

  Here, the configuration of this apparatus will be described with reference to FIG. The light emitted from the deuterium lamp 100 is once condensed on the field stop 103 via the elliptical mirror 101 and the bending mirror 102 and then onto the semiconductor wafer 3 by the reflective objective lens 20 via the half mirror 104. Focused. The reflective objective lens 20 is composed of a concave concave mirror 201 and a convex mirror 202, and is called a Schwartzchild type.

The reflected light emitted from the semiconductor wafer 3 is condensed on the diaphragm 105 by the reflective objective lens 20. The diaphragm 105 has a function of shielding light defocused in the film on the semiconductor wafer 3. The light emitted from the stop 105 is dispersed by the holographic grating 40 having an imaging function, and the spectral waveform is measured by a one-dimensional imaging device 50 such as a CCD sensor. The reason why the reflective objective lens 20 is used is that, in the wavelength range of the deuterium lamp 100, the glass material is limited to synthetic quartz and CaF ₂ , and chromatic aberration correction realized by a combination of different materials is impossible. If the chromatic aberration cannot be corrected, the aberration of light to a specific point on the semiconductor wafer becomes difficult.

  As described above, when the reflective objective lens 20 is used, the illumination light is not perpendicular to the semiconductor wafer 3 but is incident obliquely, and the component reflected obliquely is detected. This is not a problem when the apparatus of FIG. 11 is used for measuring the film thickness of an object without a pattern, but becomes a problem when it is used as a scatterometry apparatus for measuring the shape of a repetitive pattern.

  This will be described with reference to FIGS. FIG. 12 shows the relationship of the incident direction of the illumination light with respect to the direction X of the repetitive pattern 31. The inclination with respect to Z in the XZ plane is θ, and the angle from the X axis to the Y axis side with Z as the rotation axis is φ. Assuming that the reflective objective lens 20 has an aperture ratio equivalent to NA 0.2, the inclination θ is 11.537 degrees from ARCSIN (0.2), and spectral waveforms at φ 0 degrees, 45 degrees, and 90 degrees are shown in FIG. Show. The target repeating pattern 31 is the same as the pattern of FIG.

  As a result, the spectral waveform changes greatly due to the change in φ, that is, the change in the incident angle of the light collected by the reflective objective lens 20 in the plane of the semiconductor wafer with respect to the direction of the repetitive pattern. Therefore, it becomes impossible to correspond to the library which is a database of simulation spectral waveforms. On the other hand, if a normal refractive lens can be used instead of the reflective objective lens 20, normal incidence can be realized and this problem can be cleared, but there is a problem that light cannot be condensed due to chromatic aberration.

  Therefore, an object of the present invention is to provide a scatterometry apparatus that solves the problem of oblique incidence when a reflective objective lens is used and the problem of chromatic aberration when a reflective objective lens is used. An object of the present invention is to provide a shape profile measuring apparatus that can realize highly accurate measurement. The novel features of the present invention will become apparent from the description of the specification and the accompanying drawings.

  Of the inventions disclosed in the present application, the outline of typical ones will be described as follows.

  That is, the present invention uses a single concave mirror and a single convex mirror as an imaging system in a shape profile measurement apparatus that performs shape profile measurement by comparing an actually measured spectral waveform and a simulation waveform. An optical system in which the semiconductor wafer side) and the image side (imaging device side) are the same side, that is, an Offner type is used as a reflective objective lens. This eliminates the problem that the incident direction cannot be limited with respect to the repetitive pattern, which occurs when using the Schwarztilde optical system used in the conventional film thickness measurement device, and allows for vertical illumination and vertical detection, making it easy With this configuration, profile shape measurement using a short wavelength light source can be realized, and as a result, high-precision measurement can be performed on a fine pattern.

  On the other hand, the reflecting surface of the concave mirror is limited to two locations facing each other in the diametrical direction while taking a conventional Schwarzchild type configuration. In other words, by using one convex mirror and two concave mirrors as the imaging system and constructing an optical system in which the object side and the image side are opposite to the concave mirror, the incident direction can be limited to repeated patterns, and simulation Since collation with the waveform is possible, as a result, profile shape measurement using a short wavelength light source can be realized.

  In addition, the hardware configuration synthesizes a waveform simulating an actual measurement waveform from a plurality of oblique incident waveforms on the simulation side without changing the Schwarztilde type at all. In other words, by comparing the spectral waveform obtained from the simulation results of multiple spectral waveforms for each incident direction on the measurement target repetition pattern of the Schwarztilde optical system with the measured spectral waveform, it is possible to verify the actual waveform. Thus, profile shape measurement using a short wavelength light source can be realized.

  Further, even when an imaging system is configured by a refractive lens, a blur function for each wavelength generated due to chromatic aberration is obtained in advance, and a simulation waveform is converted into a waveform simulating an actual waveform using this function. That is, a refraction type optical system, means for storing a chromatic aberration-induced blur function for each wavelength generated in this refraction type optical system, and means for comparing a waveform obtained by converting a simulation waveform using this function with an actually measured spectral waveform Therefore, it is possible to collate with an actual waveform and to realize profile shape measurement using a short wavelength light source.

  Of the inventions disclosed in the present application, effects obtained by typical ones will be briefly described as follows.

  (1) By using an offner type reflection optical system, it becomes possible to detect reflected light of a vertical component in a scatterometry apparatus using a short wavelength light source such as a deuterium lamp. A short-wavelength scatterometry device can be realized, and high-precision shape measurement of a fine pattern becomes possible.

  (2) By constructing the reflecting part of the concave mirror of the Schwarzchild-type reflective objective so that it is in one direction with respect to the repetitive pattern to be measured, collation with the simulation results in one direction is realized in the scatterometry device It is possible to measure the shape of the fine pattern with high accuracy.

  (3) By adding the angle of the obliquely incident light in the plane when using a Schwarztilde-type reflective objective on the circumference, the simulation waveform can be made closer to the actual measurement waveform, and high-precision shape measurement of fine patterns Is possible.

  (4) By calculating beforehand the blur caused by the chromatic aberration caused by the refractive objective lens for each wavelength, the simulation waveform can be converted into a spectral waveform blurred by the chromatic aberration, and the actual waveform and the simulation waveform are collated. Therefore, a highly accurate shape measurement of a fine pattern is possible.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. Note that components having the same function are denoted by the same reference symbols throughout the drawings for describing the embodiment, and the repetitive description thereof will be omitted.

  First, an example of the configuration and operation of a shape profile measuring apparatus using a short wavelength light source according to the first embodiment of the present invention will be described with reference to FIG. FIG. 1 is a configuration diagram showing a shape profile measuring apparatus using a short wavelength light source according to the first embodiment.

  The shape profile measuring apparatus according to the first embodiment includes a scatterometry apparatus using an Offner reflection optical system, and includes a deuterium lamp 10, an elliptical mirror 11, a bending mirror 12, a field stop 13, a half mirror 14, An optical system composed of a bending mirror 15, an aperture 16, a concave mirror 21, a convex mirror 22, a holographic grating 41, a one-dimensional image sensor 51, a processing system 81, a simulation spectral waveform library 82, a shape data storage means 83, a calculation engine 84, and the like. And a spectral waveform processing system.

  In this shape profile measuring apparatus, the light emitted from the deuterium lamp 10 is condensed on the field stop 13 by the elliptical mirror 11 via the bending mirror 12. The field stop 13 has an effect of limiting the range of light irradiated onto the semiconductor wafer 3 to a repetitive pattern region on the semiconductor wafer 3. The light emitted from the field stop 13 is reflected by the half mirror 14 and imaged on the repetitive pattern on the semiconductor wafer 3 by the concave mirror 21, the convex mirror 22, and the concave mirror 21. The concave mirror 21 and the convex mirror 22 constitute an Offner type reflection optical system, and the semiconductor wafer 3 side and the one-dimensional imaging device 51 side are the same side with respect to the concave mirror 21.

  Offner type reflection optical systems are described in, for example, Rudolf Kingslake, Lens Design Fundamentals, Academic Press Inc., 1978, pp 321-322. The Offner type is advantageous for the scatterometry apparatus compared to the aforementioned Schwarztilde type in which the vertical component cannot be detected in that the normal incidence and reflection components can be detected. In addition, it is difficult to achieve a high NA due to the configuration, but in the case of scatterometry applications, an imaging optical system with an NA of about 0.08 is sufficient because a vertical incident reflection component can be obtained. Since it is a reflection optical system, chromatic aberration does not occur unlike the refraction type, and an image is formed on a repetitive pattern on the semiconductor wafer 3 without blurring light in the wavelength range of about 190 to 250 nm emitted from the deuterium lamp 10. be able to.

  The light reflected by the repetitive pattern on the semiconductor wafer 3 is imaged on the diaphragm 16 by the concave mirror 21, the convex mirror 22, and the concave mirror 21 through the half mirror 14 and the bending mirror 15. The diaphragm 16 has a function of cutting defocus components and stray light, which are reflected light from surfaces other than the repeated pattern surface. The light emitted from the diaphragm 16 is imaged as a spectral waveform on the one-dimensional image sensor 51 by the holographic grating 41 having an imaging function. Subsequent spectral waveform processing is performed in the same procedure as a conventional scatterometry apparatus.

  That is, the spectral waveform processing system 81 collates the spectral waveform in the simulated spectral waveform library 82 with the spectral waveform detected by the one-dimensional imaging device 51, finds a matching waveform, and obtains cross-sectional profile data (line width, (Shape film thickness, taper angle, etc.) are stored in the shape data storage means 83 as shape data corresponding to the detected spectral waveform. The spectral waveform corresponding to each shape profile is calculated in advance by the calculation engine 84 and stored in the simulation spectral waveform library 82 using the above-mentioned Rigorous coupled wave analysis (RCWA). Note that the simulation spectral waveform library 82 may not be provided, and the simulation may be sequentially performed according to the measured spectral waveform.

  As described above, according to the shape profile measuring apparatus of the first embodiment, by using an Offner type reflection optical system, in the scatterometry apparatus using a short wavelength light source such as the deuterium lamp 10, the vertical component of Reflected light can be detected. As a result, a short wavelength scatterometry apparatus can be realized with a simple configuration, and the shape measurement of a fine pattern can be performed with high accuracy.

  Next, an example of the configuration and operation of the shape profile measuring apparatus using the short wavelength light source according to the second embodiment will be described with reference to FIG. FIG. 2 is a configuration diagram showing a shape profile measuring apparatus using a short wavelength light source according to the second embodiment.

  In the above (problem to be solved by the invention), the disadvantages of using a Schwarztilde-type reflective objective lens in the scatterometry apparatus have been described, but the oblique incident component is narrowed down in one direction with respect to the repeating direction of the repeating pattern. Is the solution. Therefore, in the second embodiment of the present invention, the incident direction of the Schwarztilde-type reflective optical system is limited to one direction.

  That is, the shape profile measuring apparatus according to the second embodiment is composed of a scatterometry apparatus in which the incident direction of the Schwarztilt-type reflective optical system is limited to one direction. The light source 1, the half mirror 140, the convex mirror 23, the concave mirror 24, 25, a diaphragm 160, a holographic grating 42, a one-dimensional imaging device 52, and an optical system, and a spectral processing system including a control processing system 810, a simulation spectral waveform library 820, a shape data storage means 830, a calculation engine 840, and the like. Consists of.

  In this shape profile measuring apparatus, the light emitted from the light source 1 is reflected by the half mirror 140, enters the convex mirror 23, is reflected by the concave mirrors 24 and 25, and is condensed on the repeated pattern 31 on the semiconductor wafer 3. . The light source 1 includes the deuterium lamp 10, the elliptical mirror 11, and the field stop 13 shown in FIG. The concave mirrors 24 and 25 and the convex mirror 23 constitute a Schwarztilde-type reflective imaging optical system, and the semiconductor wafer 3 side and the one-dimensional imaging device 52 side are opposite to the concave mirrors 24 and 25. An image of the field stop 13 is formed on the semiconductor wafer 3. In this example, in order to limit the incident direction, it is divided into concave mirrors 24 and 25. However, only a part of the integrated concave surface indicated by a two-dot chain line (a portion corresponding to the concave mirrors 24 and 25) is made of aluminum or the like. A reflective coating may be applied.

  Then, the light reflected by the semiconductor wafer 3 is collected by the concave mirrors 24 and 25 and the convex mirror 23 through the half mirror 140 onto the diaphragm 160. The diaphragm 160 has a function of cutting defocused light and stray light from other than the surface of the repeated pattern 31. The light emitted from the diaphragm 160 is imaged as a spectral waveform on the one-dimensional image sensor 52 by the holographic grating 42 having an imaging function. The spectral waveform is processed in the same procedure as the scatterometry apparatus of the first embodiment.

  That is, the spectral waveform control processing system 810 collates the spectral waveform in the simulation spectral waveform library 820 with the spectral waveform detected by the one-dimensional image sensor 52, finds a matching waveform, and obtains cross-sectional profile data (line width) of the simulation. , Film thickness, taper angle, etc.) is stored in the shape data storage means 830 as shape data corresponding to the detected spectral waveform. The spectral waveform corresponding to each shape profile is calculated in advance by the calculation engine 840 using the above-described RCWA and stored in the simulation spectral waveform library 820.

  The simulation spectral waveform library 820 may not be provided, and the simulation may be sequentially performed according to the measured spectral waveform. Further, the incident angle on the repetitive pattern 31 within the semiconductor wafer surface can be changed by rotating the wafer rotation stage 300 by the control processing system 810. For this reason, it is possible to perform highly accurate profile measurement by setting an incident angle that is sensitive and sensitive to the target shape profile.

  As described above, according to the shape profile measuring apparatus of the second embodiment, the reflecting parts of the concave mirrors 24 and 25 of the Schwarztilde-type reflecting objective are configured to be in one direction with respect to the repeated pattern to be measured. Thus, in the scatterometry apparatus, it is possible to collate with the simulation result in one direction. As a result, the shape measurement of the fine pattern can be performed with high accuracy.

  Next, an example of the configuration and operation of the shape profile measuring apparatus using the short wavelength light source according to the third embodiment will be described with reference to FIG. FIG. 3 is a block diagram showing a shape profile measuring apparatus using a short wavelength light source according to the third embodiment.

  In the third embodiment, the configuration of the measuring apparatus itself is exactly the same as that of the conventional Schwarztilt-type film thickness measuring apparatus described with reference to FIG.

  That is, the shape profile measuring apparatus according to the third embodiment includes a scatterometry apparatus that matches a simulation result with a spectral waveform of a Schwarztilde-type reflective optical system, and includes a deuterium lamp 100, an elliptical mirror 101, a bending mirror 102, a field of view. An optical system including an aperture 103, a half mirror 104, a reflective objective lens 20 (concave mirror 201, convex mirror 202), an aperture 105, a holographic grating 40, a one-dimensional image sensor 50, a processing system 811, a simulation spectral waveform library 821, A spectral waveform processing system including a shape data storage unit 831, a calculation engine 841, and the like.

  In this shape profile measuring apparatus, in the reflective objective lens 20, light is incident on and reflected from the direction of 360 degrees in the plane with the normal line of the semiconductor wafer 3 as the rotation axis with respect to the repetitive pattern. Therefore, the spectral waveform detected by the one-dimensional image sensor 50 is obtained by adding all the spectral waveforms in the in-plane 360 degree direction. Actually, the spectral waveform changes from 0 degrees to 90 degrees due to the repetitive pattern and the symmetry of the apparatus. In order to calculate the spectral waveform at what angle pitch in the range of 0 to 90 degrees and add it, the optimal pitch can be determined according to the target pattern by calculating the angle pitch in advance. can get.

  The calculation engine 841 calculates a plurality of spectral waveforms at an optimum angle of incidence angle, and the simulation spectral waveform library 821 stores these average waveforms in a database. The processing system 811 compares the detected spectral waveform with the spectral waveform in the simulation spectral waveform library 821, and stores the corresponding shape profile data in the shape data storage unit 831. The simulation spectral waveform library 821 may not be provided, and the simulation may be sequentially performed according to the measured spectral waveform.

  As described above, according to the shape profile measuring apparatus of the third embodiment, the simulation waveform is obtained by adding the angle in the plane of the oblique incident light in the case of using the Schwarzchild-type reflective objective on the circumference. It can be close to the measured waveform. As a result, the shape measurement of the fine pattern can be performed with high accuracy.

  Next, an example of the configuration and operation of the shape profile measuring apparatus using the short wavelength light source according to the fourth embodiment will be described with reference to FIG. FIG. 4 is a configuration diagram showing a shape profile measuring apparatus using a short wavelength light source according to the fourth embodiment.

  In the fourth embodiment, a blur function due to chromatic aberration generated in a refractive objective lens is obtained for each wavelength, and a simulation waveform calculated in an ideal state is converted into a waveform having a chromatic aberration to convert the measured waveform into a waveform. A library is created and collation is performed so that a highly accurate shape profile can be obtained.

  That is, the shape profile measuring apparatus according to the fourth embodiment includes a scatterometry apparatus that creates a library by simulation in consideration of chromatic aberration of a refractive imaging system, and includes a deuterium lamp 1000, an elliptical mirror 1001, and a bending mirror 1002. , Field stop 1003, half mirror 1004, condenser lens 2001, refractive objective lens 2002, imaging lens 2003, holographic grating 43, one-dimensional image sensor 53, processing system 812, simulation spectral waveform library 8420. And a spectral waveform processing system comprising a shape data storage means 832, a calculation engine 842, a chromatic aberration function database 852, and the like.

  In this shape profile measuring apparatus, the light emitted from the deuterium lamp 1000 is condensed on the field stop 1003 by the elliptical mirror 1001. The light emitted from the field stop 1003 is illuminated on the repetitive pattern on the semiconductor wafer 3 by the condenser lens 2001 and the refractive objective lens 2002 via the half mirror 1004. The reflected light from the semiconductor wafer 3 is once imaged by the refractive objective lens 2002 and the imaging lens 2003 via the half mirror 1004. Due to the chromatic aberration of the refractive objective lens 2002 and the imaging lens 2003, the imaging position varies depending on the wavelength.

  For example, in the case of the wavelength λ 1, an image is formed on the point A and is imaged on the one-dimensional image sensor 53 by the holographic grating 43, but in the case of the wavelength λ 2, the image is formed on the point B and is formed on the one-dimensional image sensor 53. Then, the image is taken in a defocused state. The chromatic aberration function database 852 stores, for example, blur functions F1 (λ), F2 (λ), and F3 (λ) due to chromatic aberration of wavelengths λ1, λ2, and λ3. The blur function due to chromatic aberration is an intensity distribution with each wavelength as the center wavelength, and can be obtained by ray tracing of design data, or by experiments using the refractive objective lens 2002 and the imaging lens 2003 and a wavelength filter.

  The blur function caused by chromatic aberration is made into a database every 1 nm, for example. The calculation engine 842 converts the spectral waveform in the ideal state calculated by the RCWA into a real waveform using Expression (1) using a blur function caused by chromatic aberration in the chromatic aberration function database 852, and creates a library.

I ′ (λ) = {F1 (λ) + F2 (λ) + F3 (λ) +.
・ E (λ) ・ I (λ) (Formula 1)
In this equation (1), λ is a wavelength, I (λ) is a spectral waveform in an ideal state calculated by RCWA, E (λ) is a spectral distribution of illumination light on the semiconductor wafer 3, and E (λ) Is obtained by experiment. The processing system 812 compares the detected spectral waveform with the simulation spectral waveform library 8420 of the database converted into the actual waveform, and stores the shape profile data of the target pattern in the shape data storage unit 832. Note that the simulation spectral waveform library 8420 may not be provided, and the simulation may be sequentially performed according to the measured spectral waveform.

  As described above, according to the shape profile measuring apparatus of the fourth embodiment, the chromatic aberration caused by the refractive objective lens 2002 is obtained in advance for each wavelength so that the simulation waveform is blurred by chromatic aberration. It can be converted into a spectral waveform. As a result, since the actually measured waveform and the simulation waveform can be collated, the shape measurement of the fine pattern can be performed with high accuracy.

  Next, an example of a semiconductor device manufacturing method using the shape profile measuring apparatus according to the first to fourth embodiments described above will be described with reference to FIG. FIG. 5 is a flowchart showing a method for manufacturing a semiconductor device using the shape profile measuring apparatus.

  In the manufacture of semiconductor devices, for example, a semiconductor wafer is prepared in a process such as slicing or polishing a semiconductor single crystal ingot (step S1), and the exposure values and focus optimum values of the product circuit pattern and the test pattern are previously prepared. The difference ΔA and ΔB from the measurement (step S20), and the cross-sectional shape of the test pattern or a signal waveform related to the cross-sectional shape is stored in the library in association with the exposure amount and the deviation from the optimum focus value (step S30). , Keep going.

  After a thin film or the like is formed on the semiconductor wafer (step S2), a planarization process is performed (step S3), and then a resist coating (step S4), an exposure process (step S5) by an exposure apparatus, and a development process (step S6). I do.

  Here, in the present embodiment, the signal waveform of the test pattern on the developed semiconductor wafer is measured by a shape profile measuring device using scatterometry (step S7), and the measurement result and step S30 are constructed. The library signal waveforms are collated to obtain deviations ΔAt and ΔBt from the optimum exposure value and focus value for the test pattern (step S8).

  Further, the deviations ΔAt and ΔBt of the test pattern obtained in step S8 are corrected using the known ΔA and ΔB in step S20 to obtain deviations ΔAp and ΔBp from the optimum exposure value and focus value for the product pattern. The deviation is fed back to the exposure process in step S5 as exposure process correction information and reflected in the subsequent exposure process (step S9).

  Thereafter, product pattern formation and resist removal are performed by etching using a resist as a mask (step S10), and it is determined whether or not the wafer process is completed (step S11). If it is not completed, step S2 and subsequent steps are repeated.

  When the wafer process is completed, non-defective products are selected by a function test of each semiconductor chip such as a wafer probe (step S12), and then the semiconductor chips are individually separated by dicing the semiconductor wafer (step S12). In step S13, packaging such as sealing is performed on only good semiconductor chips (step S14), and pre-shipment inspection such as burn-in test is performed (step S15), and only good semiconductor devices are shipped (step S16). ).

  As described above, in the case of the present embodiment, the variation from the optimum value of the exposure condition in the exposure process of step S5 in the lithography of steps S2 to S10 is measured by measuring the test pattern by scatterometry, and further by the product. In the correction to the pattern, each exposure amount and focus are individually detected and fed back to the subsequent exposure processing, so that exposure conditions such as the exposure amount and focus are always maintained within a range close to the optimum value. Thus, the yield of semiconductor devices can be improved.

  The measurement results obtained by the shape profile measuring apparatus of this embodiment can be applied not only to the exposure process but also to each process such as a film forming process, a planarization process, a resist coating process, a developing process, and an etching process. The yield of the semiconductor device can be further improved by feeding back to the processing conditions in each step.

It is a block diagram which shows the shape profile measuring apparatus using the short wavelength light source which is the 1st Embodiment of this invention. It is a block diagram which shows the shape profile measuring apparatus using the short wavelength light source which is the 2nd Embodiment of this invention. It is a block diagram which shows the shape profile measuring apparatus using the short wavelength light source which is the 3rd Embodiment of this invention. It is a block diagram which shows the shape profile measuring apparatus using the short wavelength light source which is the 4th Embodiment of this invention. It is a flowchart which shows the manufacturing method of the semiconductor device using the shape profile measuring apparatus which is the 1st-4th embodiment of this invention. It is a figure for demonstrating an exposure process as reference technology of this invention. It is a figure for demonstrating a scatterometry apparatus as reference technology of this invention. It is a figure for demonstrating the principle of a scatterometry as a reference technique of this invention. It is a figure for demonstrating the repeating pattern made into the object of simulation as a reference technique of this invention. It is a figure for demonstrating the simulation result of the spectral waveform of line width 100nm and 90nm as a reference technique of this invention. It is a figure for demonstrating the conventional film thickness measuring apparatus using the Schwarzchild type | mold reflective objective lens as a reference technique of this invention. It is a figure for demonstrating the relationship between the direction of a repeating pattern, and illumination light incident direction as the reference technique of this invention. It is a figure for demonstrating the difference in the spectral waveform by the difference in illumination light incident direction as the reference technique of this invention.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Light source 10, 100, 1000 ... Deuterium lamp, 11, 101, 1001 ... Ellipse mirror, 12, 102, 1002 ... Bending mirror, 13, 103, 1003 ... Field stop, 14, 104, 140, 1004 ... Half Mirror, 15 ... Bending mirror, 16, 105, 160 ... Aperture, 20 ... Reflective objective lens, 21 ... Concave mirror, 22 ... Convex mirror, 23 ... Convex mirror, 24,25 ... Concave mirror, 201 ... Concave mirror, 202 ... Convex mirror, 2001 ... Condenser lens, 2002 ... Refractive objective lens, 2003 ... Imaging lens, 3 ... Semiconductor wafer, 300 ... Wafer rotation stage, 31 ... Repeat pattern, 40, 41, 42, 43 ... Holographic grating, 50, 51, 52, 53 ... One-dimensional imaging device, 6 ... Reticle, 61 ... Circuit pattern, 7 ... Exposure lens, DESCRIPTION OF SYMBOLS 1,811,812 ... Processing system, 810 ... Control processing system, 82,820,821,8420 ... Spectral waveform library, 83,830,831,832 ... Shape data storage means, 84,840, 841,842 ... Calculation engine , 852... Chromatic aberration function database.

Claims (12)

A shape profile measuring device that performs shape profile measurement by comparing an actually measured spectral waveform with a simulation waveform,
A shape profile measurement characterized by having an optical system configured such that one concave mirror and one convex mirror are used as the imaging system, and the object side and the image side are the same side with respect to the concave mirror. apparatus. The shape profile measuring apparatus according to claim 1,
The optical profile is an Offner type, and a shape profile measuring apparatus. The shape profile measuring apparatus according to claim 1,
The optical system comprises a scatterometry apparatus using a short wavelength light source. A shape profile measuring device that performs shape profile measurement by comparing an actually measured spectral waveform with a simulation waveform,
A shape profile measurement characterized by having an optical system configured such that one convex mirror and two concave mirrors are used as the imaging system, and the object side and the image side are opposite to the concave mirror. apparatus. In the shape profile measuring apparatus according to claim 4,
2. The shape profile measuring apparatus according to claim 2, wherein the two concave mirrors have reflecting surfaces only at two locations facing each other in the diameter direction of the concave mirror of the Schwarztilde optical system. In the shape profile measuring apparatus according to claim 4,
The optical system comprises a scatterometry apparatus using a short wavelength light source. A shape profile measuring device that performs shape profile measurement by comparing an actually measured spectral waveform with a simulation waveform,
A shape profile measuring apparatus, comprising: means for obtaining the simulation waveform from simulation results of a plurality of spectral waveforms for each incident direction on the measurement target repetition pattern of the Schwarztilde optical system. In the shape profile measuring device according to claim 7,
An optical system comprises a scatterometry apparatus using a short wavelength light source, and a shape profile measuring apparatus. A shape profile measuring device that performs shape profile measurement by comparing an actually measured spectral waveform with a simulation waveform,
A refractive optical system; means for storing a chromatic aberration-induced blur function for each wavelength generated in the refractive optical system; means for comparing a waveform obtained by converting a simulation waveform using the function with an actually measured spectral waveform; A shape profile measuring apparatus comprising: In the shape profile measuring device according to claim 9,
The refraction type optical system comprises a scatterometry apparatus using a short wavelength light source. A method for manufacturing a semiconductor device using the shape profile measuring apparatus according to any one of claims 1 to 10,
A lithography process for forming a circuit pattern on a semiconductor wafer;
A manufacturing method of a semiconductor device, wherein a shape profile measurement result by the shape profile measuring apparatus is reflected in the lithography process. The method of manufacturing a semiconductor device according to claim 11.
The lithography process includes an exposure process, and the shape profile measurement result is fed back to the exposure process.

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