JP2005114768A - Plasmon mode optical waveguide - Google Patents

Plasmon mode optical waveguide Download PDF

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JP2005114768A
JP2005114768A JP2003344884A JP2003344884A JP2005114768A JP 2005114768 A JP2005114768 A JP 2005114768A JP 2003344884 A JP2003344884 A JP 2003344884A JP 2003344884 A JP2003344884 A JP 2003344884A JP 2005114768 A JP2005114768 A JP 2005114768A
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optical waveguide
plasmon
mode optical
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JP4530254B2 (en
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Kazuyoshi Hakamata
和喜 袴田
Tomoyuki Hayashi
智幸 林
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FDK Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To increase propagation distance of plasmon polariton while narrowing beam diameter. <P>SOLUTION: An optical waveguide in which a thin film waveguide pattern 22 made of a negative dielectric constant material is formed on a substrate 10 to propagate the plasmon polariton. The thin film waveguide pattern consists of a wide width strip structure section 24 and a narrow width projecting section 26 which is integrally formed on the wide width stripe structure section 24. Consequently, the plasmon polariton being propagated is concentrated onto the narrow width projecting section. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、プラズモンポラリトン伝搬のための光導波路に関し、更に詳しく述べると、薄膜導波路パターンが、広幅ストリップ構造部と、その表面に一体的に形成されている狭幅突条部からなるプラズモンモード光導波路に関するものである。この技術は、例えばナノ光回路などにおいて、その微小な構成要素（例えば金属微粒子や光変調デバイスなど）などと効率よく結合させるために、プラズモンポラリトンを集中させてビーム径を十分に狭くしたいような場合などに有用である。   The present invention relates to an optical waveguide for plasmon polariton propagation, and more specifically, a plasmon mode in which a thin film waveguide pattern is composed of a wide strip structure portion and a narrow protrusion portion integrally formed on the surface thereof. The present invention relates to an optical waveguide. This technology, for example, in a nano-optical circuit, would like to concentrate the plasmon polaritons and make the beam diameter sufficiently narrow so that it can be efficiently combined with the minute components (for example, metal fine particles and light modulation devices). This is useful in some cases.

従来の光閉じ込めの原理に基づく光導波路（例えば光ファイバや誘電体光導波路など）では、回折限界によりビーム径を伝送光の半波長以下にすることができない。ところが、表面プラズモンポラリトン波を利用すると、回折限界を超える半波長以下にすることができる。プラズモンポラリトンは、誘電率の実数部が負となる負誘電率材料と誘電率の実数部が正となる正誘電率材料の結合界面に形成される局在化した電磁界モード（電子の疎密波の１種）である。プラズモンを発生させるには、例えばプリズムの表面に負誘電率材料膜（例えば金属薄膜）を形成し、入射光をプリズム表面で全反射するように照射する。プリズム界面での全反射によってエバネッセント光が発生し、このエバネッセント光が表面プラズモンを励起する。発生した表面プラズモンは金属薄膜上を伝搬する。   In a conventional optical waveguide based on the principle of optical confinement (for example, an optical fiber or a dielectric optical waveguide), the beam diameter cannot be made equal to or less than a half wavelength of transmitted light due to a diffraction limit. However, when the surface plasmon polariton wave is used, it is possible to make the half wavelength or less exceeding the diffraction limit. Plasmon polaritons are localized electromagnetic modes (electron dense waves) formed at the bonding interface between a negative dielectric constant material with a negative real part of the dielectric constant and a positive dielectric material with a positive real part of the dielectric constant. 1 type). In order to generate plasmons, for example, a negative dielectric constant material film (for example, a metal thin film) is formed on the surface of the prism, and incident light is irradiated so as to be totally reflected on the prism surface. Evanescent light is generated by total reflection at the prism interface, and this evanescent light excites surface plasmons. The generated surface plasmon propagates on the metal thin film.

従って、基板に負誘電率材料（例えば金属材料）からなる薄膜パターンを形成すると、それがプラズモンポラリトン伝搬のための光導波路となる。このようなプラズモンモード光導波路を構成すると、回折限界を超える半波長以下にまでビーム径を狭くすることができ、ナノ光回路の小型化や光記録再生装置の高密度化を実現できる。従来のプラズモンモード光導波路は、一般に図５に示すように、基板１０上に金属材料からなる断面矩形状の薄膜導波路パターン１２を形成した構造である。この種のプラズモンモード光導波路は、例えば特許文献１などに開示されている。   Therefore, when a thin film pattern made of a negative dielectric constant material (for example, a metal material) is formed on the substrate, it becomes an optical waveguide for plasmon polariton propagation. When such a plasmon mode optical waveguide is configured, the beam diameter can be narrowed to a half wavelength or less exceeding the diffraction limit, and the miniaturization of the nano optical circuit and the high density of the optical recording / reproducing apparatus can be realized. A conventional plasmon mode optical waveguide generally has a structure in which a thin film waveguide pattern 12 having a rectangular cross section made of a metal material is formed on a substrate 10 as shown in FIG. This type of plasmon mode optical waveguide is disclosed in, for example, Patent Document 1.

このようなプラズモンモード光導波路において、プラズモンポラリトンの伝搬距離を長くするには、薄膜導波路パターンの幅Ｗを広くする（例えば２０００ｎｍ以上）必要がある。パターン幅が狭くなると、放射損失やオーム損失が増大するからである。他方、そのような広幅の薄膜導波路パターン１２を伝搬するプラズモンポラリトンは、それだけビーム径が広がるため、ナノ光回路などの微小な構成要素などと効率よく結合させることが困難となる。   In such a plasmon mode optical waveguide, in order to increase the propagation distance of plasmon polaritons, it is necessary to increase the width W of the thin film waveguide pattern (for example, 2000 nm or more). This is because as the pattern width becomes narrower, radiation loss and ohmic loss increase. On the other hand, since the plasmon polariton propagating through such a wide thin-film waveguide pattern 12 has a larger beam diameter, it is difficult to efficiently couple it with a minute component such as a nano optical circuit.

例えば図５の構造において、基板１０の誘電率ε1 ＝２．１０３（ＳｉＯ2 を想定）、薄膜導波路パターン１２の誘電率ε2 ＝−２６＋１．８ｊ（金薄膜を想定）、それらの周囲が空気により取り囲まれているとする。そして、波長８００ｎｍ、ＴＭモードの光で励起したプラズモンポラリトンが、このプラズモンモード光導波路を伝搬するとする。このときの伝搬のシミュレーション結果は次のようになる。図６は、パターン幅Ｗとプラズモンポラリトン光強度が１／ｅとなるまでの伝搬距離との関係を示している。この結果から分かるように、薄膜導波路パターンの幅Ｗが狭くなるに従い、伝搬距離が短くなる。 For example, in the structure of FIG. 5, the dielectric constant ε 1 = 2.103 of the substrate 10 (assuming SiO 2 ), the dielectric constant ε 2 of the thin film waveguide pattern 12 = −26 + 1.8j (assuming a gold thin film), and their surroundings Is surrounded by air. Then, it is assumed that the plasmon polariton excited by the TM mode light with a wavelength of 800 nm propagates through the plasmon mode optical waveguide. The propagation simulation result at this time is as follows. FIG. 6 shows the relationship between the pattern width W and the propagation distance until the plasmon polariton light intensity becomes 1 / e. As can be seen from this result, the propagation distance becomes shorter as the width W of the thin film waveguide pattern becomes narrower.

ビーム径を狭めるために、薄膜導波路パターンの幅を徐々に狭くする構造も考えられるが、そのようなテーパ構造では、プラズモンポラリトンがテーパ部分を伝搬する間に放射損失などで伝搬光の強度は大きく失われてしまう。
特開平７−１２０６３６号公報 In order to narrow the beam diameter, a structure in which the width of the thin-film waveguide pattern is gradually narrowed is conceivable. However, in such a tapered structure, the intensity of propagating light is reduced due to radiation loss or the like while the plasmon polariton propagates through the tapered portion. It will be lost greatly.
JP-A-7-120636

本発明が解決しようとする課題は、薄膜導波路パターン幅と伝搬距離が相反する関係にあることから、ビーム径を狭く且つ伝搬距離を長くすることができない点である。   The problem to be solved by the present invention is that the beam diameter cannot be narrowed and the propagation distance cannot be increased because the thin film waveguide pattern width and the propagation distance are in a contradictory relationship.

本発明は、基板の表面に負誘電率材料からなる薄膜導波路パターンを形成したプラズモンポラリトン伝搬のための光導波路において、前記薄膜導波路パターンは、広幅ストリップ構造部と、その表面に一体的に形成されている狭幅突条部からなり、伝搬するプラズモンポラリトンが該狭幅突条部に集中するようにしたことを特徴とするプラズモンモード光導波路である。   The present invention provides an optical waveguide for plasmon polariton propagation in which a thin film waveguide pattern made of a negative dielectric constant material is formed on a surface of a substrate. The thin film waveguide pattern is integrated with a wide strip structure portion and the surface thereof. A plasmon mode optical waveguide comprising a narrow ridge formed, wherein propagating plasmon polaritons are concentrated on the narrow ridge.

狭幅突条部は、例えば伝搬方向に直交する断面が三角形状もしくは台形状などであってよい。狭幅突条部は、基板の上方で露出していてもよいし、逆向きで基板に埋め込まれていてもよい。ここで広幅ストリップ構造部の幅は２０００ｎｍ以上とし、それに対して狭幅突条部は、底面幅が５００ｎｍ以下、高さが２００ｎｍ以下であり、狭幅突条部が広幅ストリップ構造部の幅方向のほぼ中央に位置している構成が好ましい。より好ましくは、狭幅突条部の底面幅を２５０ｎｍ以下、高さを１００ｎｍ以下とすることである。   For example, the narrow protrusion may have a triangular or trapezoidal cross section perpendicular to the propagation direction. The narrow protrusion may be exposed above the substrate, or may be embedded in the substrate in the reverse direction. Here, the width of the wide strip structure is 2000 nm or more, while the narrow ridge has a bottom width of 500 nm or less and a height of 200 nm or less, and the narrow ridge is in the width direction of the wide strip structure. The structure located in the approximate center of is preferable. More preferably, the bottom width of the narrow protrusion is 250 nm or less and the height is 100 nm or less.

本発明に係るプラズモンモード光導波路は、負誘電率材料からなる薄膜導波路パターンを、広幅ストリップ構造部と、その表面に一体的に形成されている狭幅突条部とからなる構造としたことにより、伝搬するプラズモンポラリトンが狭幅突条部に集中するようになり、伝搬距離を長く且つビーム径を狭くすることができる。その結果、ナノ光回路の微小な構成要素などとの高効率での結合や光記録再生装置による記録の高密度化などが実現できる。   In the plasmon mode optical waveguide according to the present invention, a thin film waveguide pattern made of a negative dielectric constant material has a structure composed of a wide strip structure portion and a narrow protrusion portion integrally formed on the surface thereof. As a result, the plasmon polariton that propagates is concentrated on the narrow protrusion, and the propagation distance can be increased and the beam diameter can be decreased. As a result, it is possible to realize high-efficiency coupling with minute components of the nano-optical circuit and higher recording density by the optical recording / reproducing apparatus.

正誘電率材料からなる基板の表面に負誘電率材料からなる薄膜導波路パターンを形成したプラズモンモード光導波路である。薄膜導波路パターンは、広幅ストリップ構造部と、その表面の中央に一体的に形成されている１本の狭幅突条部からなり、該狭幅突条部は、伝搬方向に直交する断面が三角形状である。広幅ストリップ構造部の幅は２０００ｎｍ以上とし、それに対して狭幅突条部は、底面幅を２５０ｎｍ以下、高さを１００ｎｍ以下とする。   This is a plasmon mode optical waveguide in which a thin film waveguide pattern made of a negative dielectric constant material is formed on the surface of a substrate made of a positive dielectric constant material. The thin film waveguide pattern is composed of a wide strip structure portion and a single narrow protrusion formed integrally at the center of the surface, and the narrow protrusion has a cross section perpendicular to the propagation direction. It is triangular. The width of the wide strip structure is 2000 nm or more, while the narrow ridge has a bottom width of 250 nm or less and a height of 100 nm or less.

図１は、本発明に係るプラズモンモード光導波路の一実施例を示す説明図である。このプラズモンポラリトン伝搬のための光導波路は、正誘電率材料からなる基板１０の平坦な表面に、金属材料（負誘電率材料）からなる薄膜導波路パターン２２を形成した構造である。本発明では、薄膜導波路パターン２２は、広幅ストリップ構造部２４と、その表面に一体的に形成されている狭幅突条部２６からなる。この実施例では、狭幅突条部２６は、プラズモンポラリトンの伝搬方向に直交する断面が二等辺三角形状をなしている。広幅ストリップ構造部２４と狭幅突条部２６とは、同じ材料であってもよいし、異なる材料で構成することもできる。   FIG. 1 is an explanatory view showing an embodiment of a plasmon mode optical waveguide according to the present invention. This optical waveguide for plasmon polariton propagation has a structure in which a thin film waveguide pattern 22 made of a metal material (negative dielectric constant material) is formed on a flat surface of a substrate 10 made of a positive dielectric constant material. In the present invention, the thin film waveguide pattern 22 is composed of a wide strip structure portion 24 and a narrow protrusion 26 formed integrally on the surface thereof. In this embodiment, the narrow ridge 26 has an isosceles triangle cross section perpendicular to the propagation direction of the plasmon polariton. The wide strip structure 24 and the narrow protrusion 26 may be made of the same material or may be made of different materials.

図１に示す構造のプラズモンモード光導波路において、基板１０の誘電率ε1 ＝２．１０３（ＳｉＯ2 を想定）、薄膜導波路パターン２２の誘電率ε2 ＝−２６＋１．８ｊ（金薄膜を想定）とし、波長８００ｎｍ、ＴＭモードの光で励起したプラズモンポラリトンがプラズモンモード光導波路を伝搬するものとしてシミュレーションを行った。ここで、広幅ストリップ構造部２４の断面形状は幅２０００ｎｍ、厚さ５０ｎｍの矩形状であり、狭幅突条部２６の断面形状は幅（底辺の長さ）２００ｎｍ、高さ１００ｎｍの二等辺三角形状とする。そして、このようなプラズモンモード光導波路が空気により囲まれていると仮定する。 In the plasmon mode optical waveguide having the structure shown in FIG. 1, the dielectric constant ε 1 = 2.103 (assuming SiO 2 ) of the substrate 10 and the dielectric constant ε 2 = −26 + 1.8j of the thin film waveguide pattern 22 (assuming a gold thin film). The simulation was performed assuming that the plasmon polariton excited by the TM mode light with a wavelength of 800 nm propagates through the plasmon mode optical waveguide. Here, the cross-sectional shape of the wide strip structure portion 24 is a rectangular shape having a width of 2000 nm and a thickness of 50 nm, and the cross-sectional shape of the narrow-width protruding portion 26 is an isosceles triangle having a width (base length) of 200 nm and a height of 100 nm. Shape. It is assumed that such a plasmon mode optical waveguide is surrounded by air.

図２は、このようなプラズモンモード光導波路における狭幅突条部近傍の電界強度分布の計算結果を示している。本発明によるプラズモンモード光導波路では、エネルギーは狭幅突条部の先端部分に集中し、この例ではビーム半値幅は約６０ｎｍとなる。従って、伝搬する光の波長８００ｎｍよりも著しく狭いビーム径で光信号を伝搬させることが可能なことが分かる。これによって、例えばナノ光回路の微小な構成要素に対して、伝搬してきたプラズモンポラリトンを正確に且つ高い効率で結合させることができる。また、このプラズモンモード光導波路による伝搬距離は１２．５μｍとなり、これは従来構造（図５参照）のプラズモンモード光導波路の伝搬距離と同様の値である。   FIG. 2 shows the calculation result of the electric field strength distribution in the vicinity of the narrow ridge in such a plasmon mode optical waveguide. In the plasmon mode optical waveguide according to the present invention, energy is concentrated at the tip of the narrow protrusion, and in this example, the beam half width is about 60 nm. Therefore, it can be seen that an optical signal can be propagated with a beam diameter that is significantly narrower than the wavelength of 800 nm of propagating light. Thereby, for example, the propagated plasmon polariton can be accurately and efficiently coupled to a minute component of the nano-optical circuit. The propagation distance by this plasmon mode optical waveguide is 12.5 μm, which is the same value as the propagation distance of the plasmon mode optical waveguide of the conventional structure (see FIG. 5).

図３は、本発明に係るプラズモンモード光導波路の他の実施例を示す説明図である。基本的な構成は、図１に示すものと同様であるので、対応する部分には同一符号を付す。このプラズモンポラリトン伝搬のための光導波路も、基板１０の平坦な表面に金属材料（負誘電率材料）からなる薄膜導波路パターン３２を形成した構造である。薄膜導波路パターン３２は、広幅ストリップ構造部２４と、その表面に一体的に形成されている狭幅突条部３６からなる。この実施例では、狭幅突条部３６は、伝搬方向に直交する断面が台形状をなしている。このような構造であっても、狭幅突条部３６に電界が集中するため、ビーム径を狭くすることができる。   FIG. 3 is an explanatory view showing another embodiment of the plasmon mode optical waveguide according to the present invention. Since the basic configuration is the same as that shown in FIG. 1, the corresponding parts are denoted by the same reference numerals. This optical waveguide for plasmon polariton propagation also has a structure in which a thin film waveguide pattern 32 made of a metal material (negative dielectric constant material) is formed on the flat surface of the substrate 10. The thin film waveguide pattern 32 includes a wide strip structure 24 and a narrow protrusion 36 formed integrally on the surface thereof. In this embodiment, the narrow protrusion 36 has a trapezoidal cross section perpendicular to the propagation direction. Even with such a structure, since the electric field concentrates on the narrow protrusion 36, the beam diameter can be reduced.

図１及び図３に示すようなプラズモンモード光導波路は、フォトリソグラフィー技術を用いて作製できる。狭幅突出部２６、３６は、例えばスパッタ法や蒸着法などにより薄膜を成膜した後、イオンミリングのようなドライエッチングを施すことで形成できる。   The plasmon mode optical waveguide as shown in FIGS. 1 and 3 can be manufactured by using a photolithography technique. The narrow protrusions 26 and 36 can be formed by forming a thin film by, for example, sputtering or vapor deposition, and then performing dry etching such as ion milling.

本発明に係るプラズモンモード光導波路の更に他の実施例を図４に示す。このプラズモンポラリトン伝搬のための光導波路も、基板４０の表面に金属材料（負誘電率材料）からなる薄膜導波路パターン４２を形成した構造である。基板４０の表面にＶ溝４１を形成する。Ｖ溝４１は、例えばイオンミリングのようなドライエッチングを施すことで形成できる。次に、このＶ溝４１を埋めるように金属材料をスパッタ法などにより充填して狭幅突条部４６を形成し、更に狭幅突条部４６を覆うように成膜により広幅ストリップ構造部４４を形成する。このような構造としても、狭幅突条部４６に電界が集中するため、ビーム径を狭くすることができる。   FIG. 4 shows still another embodiment of the plasmon mode optical waveguide according to the present invention. The optical waveguide for plasmon polariton propagation also has a structure in which a thin film waveguide pattern 42 made of a metal material (negative dielectric constant material) is formed on the surface of the substrate 40. A V-groove 41 is formed on the surface of the substrate 40. The V groove 41 can be formed by performing dry etching such as ion milling, for example. Next, a metal material is filled by a sputtering method or the like so as to fill the V-groove 41 to form a narrow protrusion 46, and further, a wide strip structure 44 is formed by film formation so as to cover the narrow protrusion 46. Form. Even in such a structure, since the electric field concentrates on the narrow protrusion 46, the beam diameter can be reduced.

本発明に係るプラズモンモード光導波路は、薄膜導波路パターン全長にわたって狭幅突条部を形成する場合の他、広幅ストリップ構造部の一部分（特に他の光部品との結合部近傍）のみに狭幅突条部を形成するような構成も含んでいる。また、プリズムを用いるプラズモン発生装置のプラズモン伝搬部分に適用してもよい。   The plasmon mode optical waveguide according to the present invention has a narrow width only in a part of a wide strip structure part (particularly in the vicinity of a coupling part with another optical component) in addition to the case where a narrow protrusion is formed over the entire length of the thin film waveguide pattern The structure which forms a protrusion part is also included. Moreover, you may apply to the plasmon propagation part of the plasmon generator which uses a prism.

本発明に係るプラズモンモード光導波路の一実施例を示す説明図。Explanatory drawing which shows one Example of the plasmon mode optical waveguide which concerns on this invention. その狭幅突条部への光強度の集中状態を示すグラフ。The graph which shows the concentration state of the light intensity to the narrow ridge part. 本発明に係るプラズモンモード光導波路の他の実施例を示す説明図。Explanatory drawing which shows the other Example of the plasmon mode optical waveguide which concerns on this invention. 本発明に係るプラズモンモード光導波路の更に他の実施例を示す説明図。Explanatory drawing which shows the further another Example of the plasmon mode optical waveguide which concerns on this invention. 従来技術の一例を示す説明図。Explanatory drawing which shows an example of a prior art. 薄膜導体パターン幅と伝搬距離の関係を示すグラフ。The graph which shows the relationship between a thin film conductor pattern width and propagation distance.

符号の説明Explanation of symbols

１０ 基板
２２ 薄膜導波路パターン
２４ 広幅ストリップ構造部
２６ 狭幅突条部
10 Substrate 22 Thin Film Waveguide Pattern 24 Wide Strip Structure 26 Narrow Projection

Claims (4)

基板の表面に負誘電率材料からなる薄膜導波路パターンを形成した表面プラズモンポラリトン伝搬のための光導波路において、前記薄膜導波路パターンは、広幅ストリップ構造部と、その表面に一体的に形成されている狭幅突条部からなり、伝搬するプラズモンポラリトンが該狭幅突条部に集中するようにしたことを特徴とするプラズモンモード光導波路。 In an optical waveguide for surface plasmon polariton propagation in which a thin film waveguide pattern made of a negative dielectric constant material is formed on the surface of a substrate, the thin film waveguide pattern is formed integrally with a wide strip structure portion and the surface thereof. A plasmon mode optical waveguide characterized in that the plasmon polariton that propagates is composed of narrow ridges that are concentrated on the narrow ridges. 狭幅突条部は、伝搬方向に直交する断面が三角形状もしくは台形状をなしている請求項１記載のプラズモンモード光導波路。 The plasmon mode optical waveguide according to claim 1, wherein the narrow protrusion has a triangular or trapezoidal cross section orthogonal to the propagation direction. 狭幅突条部が基板に埋め込まれている請求項１又は２記載のプラズモンモード光導波路。 The plasmon mode optical waveguide according to claim 1 or 2, wherein the narrow protrusion is embedded in the substrate. 広幅ストリップ構造部の幅は２０００ｎｍ以上であるのに対して、狭幅突条部の底面幅は５００ｎｍ以下、高さが２００ｎｍ以下であり、該狭幅突条部が広幅ストリップ構造部の幅方向のほぼ中央に位置している請求項１乃至３のいずれかに記載のプラズモンモード光導波路。
The width of the wide strip structure is 2000 nm or more, whereas the bottom width of the narrow protrusion is 500 nm or less and the height is 200 nm or less. The narrow protrusion is the width direction of the wide strip structure. The plasmon mode optical waveguide according to any one of claims 1 to 3, wherein the plasmon mode optical waveguide is positioned substantially at the center of the plasmon mode.
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JPH0320724A (en) * 1988-08-26 1991-01-29 American Teleph & Telegr Co <Att> Light communication device
JPH07120636A (en) * 1993-10-21 1995-05-12 Matsushita Electric Ind Co Ltd Light frequency wave transmission line
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