JP2005054269A5 - - Google Patents

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JP2005054269A5
JP2005054269A5 JP2004215774A JP2004215774A JP2005054269A5 JP 2005054269 A5 JP2005054269 A5 JP 2005054269A5 JP 2004215774 A JP2004215774 A JP 2004215774A JP 2004215774 A JP2004215774 A JP 2004215774A JP 2005054269 A5 JP2005054269 A5 JP 2005054269A5
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surfactant
pores
layer
forming
polymer compound
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JP2004215774A
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JP4115434B2 (en
JP2005054269A (en
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Description

そこで本発明は、基板上に柱状の細孔を有する層を備え、
前記柱状の細孔が前記基板と前記層との境界面に対して平行に位置し、且つ一軸配向し、
前記細孔中にポリジアセチレン、ポリチオフェン、ポリピロールのいずれかを有する構造体を提供する。 Therefore, the present invention comprises a layer having columnar pores on a substrate,
The columnar pores are positioned parallel to the interface between the substrate and the layer, and are uniaxially oriented;
Provided is a structure having any one of polydiacetylene, polythiophene, and polypyrrole in the pores .

また、本発明では、細孔内に共役高分子化合物を有する構造体の製造方法であって、
共役高分子化合物を形成するための官能基を分子構造中に有する界面活性剤と細孔壁を構成する材料の原料とを含む溶液を、異方性を示す基板に付与し、前記基板上に前記界面活性剤を含む構造体を形成する工程と、
前記界面活性剤を重合し、前記構造体中で前記共役高分子化合物を形成する工程とを備える構造体の製造方法を提供する。 The present invention also provides a method for producing a structure having a conjugated polymer compound in the pores ,
A solution containing a surfactant having a functional group for forming a conjugated polymer compound in a molecular structure and a raw material of a material constituting a pore wall is applied to an anisotropic substrate, Forming a structure containing the surfactant;
And a step of polymerizing the surfactant to form the conjugated polymer compound in the structure.

重合して高分子化合物を形成し得る官能基としては、ジアセチレン基、ピロール基、チオフェン基等が特に好ましく、これを構造中に含む界面活性剤を用いることによって後述するように、ポリジアセチレン、ポリピロール、ポリチオフェン等を形成することが可能である。 As the functional group capable of forming a polymer compound by polymerization, a diacetylene group, a pyrrole group, a thiophene group and the like are particularly preferable, and a polydiacetylene, Polypyrrole, polythiophene and the like can be formed .

Claims (8)

基板上に柱状の細孔を有する層を備え、
前記柱状の細孔が前記基板と前記層との境界面に対して平行に位置し、且つ一軸配向し、
前記細孔中にポリジアセチレン、ポリチオフェン、ポリピロールのいずれかを有することを特徴とする構造体。 Provided with a layer having columnar pores on the substrate,
The columnar pores are positioned parallel to the interface between the substrate and the layer, and are uniaxially oriented;
A structure having any of polydiacetylene, polythiophene, and polypyrrole in the pores . 前記層は前記柱状の細孔を複数有することを特徴とする請求項１に記載の構造体。 The structure of claim 1 wherein the layer is characterized by having a plurality of pores of the columnar. 前記層が、酸化ケイ素、酸化スズ、または酸化チタンのいずれかを含有していることを特徴とする請求項１又は２に記載の構造体。 Said layer, silicon oxide, tin oxide or structure according to claim 1 or 2, characterized by containing one of titanium oxide. 前記層が、有機物を含有していることを特徴とする請求項１から３のいずれかに記載の構造体。 The structure according to any one of claims 1 to 3, wherein the layer contains an organic substance. 細孔内に共役高分子化合物を有する構造体の製造方法であって、
共役高分子化合物を形成するための官能基を分子構造中に有する界面活性剤と細孔壁を構成する材料の原料とを含む溶液を、異方性を示す基板に付与し、前記基板上に前記界面活性剤を含む構造体を形成する工程と、
前記界面活性剤を重合し、前記構造体中で前記共役高分子化合物を形成する工程とを備えることを特徴とする構造体の製造方法。 A method for producing a structure having a conjugated polymer compound in pores ,
A solution containing a surfactant having a functional group for forming a conjugated polymer compound in a molecular structure and a raw material of a material constituting a pore wall is applied to an anisotropic substrate, Forming a structure containing the surfactant;
Polymerizing the surfactant and forming the conjugated polymer compound in the structure. 前記界面活性剤が、前記分子構造中にジアセチレン基、ピロール基、またはチオフェン基のいずれかを含むことを特徴とする請求項５に記載の製造方法。 The production method according to claim 5 , wherein the surfactant contains any one of a diacetylene group, a pyrrole group, and a thiophene group in the molecular structure. 前記界面活性剤を重合する工程が、熱重合、光重合、または酸化反応を用いた重合のいずれかで行われることを特徴とする請求項５又は６に記載の製造方法。 The method according to claim 5 or 6 , wherein the step of polymerizing the surfactant is performed by any one of thermal polymerization, photopolymerization, or polymerization using an oxidation reaction. 前記構造体を形成する工程中で、相対湿度を変化させることを特徴とする請求項５から７のいずれかに記載の製造方法。The manufacturing method according to claim 5, wherein the relative humidity is changed during the step of forming the structure.
JP2004215774A 2003-07-23 2004-07-23 Manufacturing method of structure Expired - Fee Related JP4115434B2 (en)

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JP2004215774A JP4115434B2 (en) 2003-07-23 2004-07-23 Manufacturing method of structure

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JP2003278340 2003-07-23
JP2004215774A JP4115434B2 (en) 2003-07-23 2004-07-23 Manufacturing method of structure

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JP2005054269A JP2005054269A (en) 2005-03-03
JP2005054269A5 true JP2005054269A5 (en) 2006-04-06
JP4115434B2 JP4115434B2 (en) 2008-07-09

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Publication number Priority date Publication date Assignee Title
JP5135571B2 (en) * 2005-03-28 2013-02-06 国立大学法人東京工業大学 Anisotropic ion conductive polymer membrane
JP4708861B2 (en) * 2005-05-25 2011-06-22 キヤノン株式会社 Method for manufacturing field effect transistor

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