JP2004357698A - Treatment apparatus - Google Patents

Treatment apparatus Download PDF

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JP2004357698A
JP2004357698A JP2004052145A JP2004052145A JP2004357698A JP 2004357698 A JP2004357698 A JP 2004357698A JP 2004052145 A JP2004052145 A JP 2004052145A JP 2004052145 A JP2004052145 A JP 2004052145A JP 2004357698 A JP2004357698 A JP 2004357698A
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stirring member
processing apparatus
processing
gap
plane
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Takayoshi Furusawa
孝良 古澤
Katsunori Suzuki
克典 鈴木
Koji Ogawa
宏治 小川
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Hitachi Ltd
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Aloka Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a treatment apparatus with a comparatively simple structure, having a stirring means with simple structure, for stirring liquid to be treated on a sheet-like substrate on which the object to be treated is adhered. <P>SOLUTION: The treatment apparatus allows treatment of the object S by a treating liquid R present on the adhering face P1 of the sheet-like substrate P on which the object S is adhered. The treatment apparatus is provided with a treating section on which the substrate P is installed, a stirring member 3 which has a flat face 31 and installed on the countering position to the adhered face P1 with a space and a displacement means which displaces the stirring member 3 to the face direction of the adhered face P1. The treatment apparatus has a distance regulating means 5 which keeps the gap distance h1 of the prescribed gap constant, and the displacement of the stirring member 3 by the actuation of the displacement means comprises the displacement with a gap constant distance h1. The treatment apparatus stirs the treating liquid R in a state filling the gap with the treating liquid R and then displacing the stirring member 3 by operating the displacing means. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、処理装置に関する。   The present invention relates to a processing device.

例えば、核酸(RNA、DNA)に対するハイブリダイゼーション等の処理を行なう場合には、プレート(支持体)上に、核酸(被処理物)を付着させ、かかる核酸に処理液を供給して(接触させて)処理することが行なわれる。   For example, when performing a process such as hybridization for nucleic acids (RNA, DNA), a nucleic acid (object to be treated) is attached to a plate (support), and a treatment solution is supplied to the nucleic acid (contact). Processing) is performed.

このような核酸と処理液とを接触させる方法としては、各支持体上に処理液を滴下して、さらに、この上から展開部材を重ね合わせ、それらの間に形成された隙間に処理液を展開させることにより、核酸と処理液とを接触させる。   As a method of bringing the nucleic acid into contact with the treatment liquid, the treatment liquid is dropped on each support, and further, a developing member is overlapped thereon, and the treatment liquid is filled in a gap formed therebetween. By developing, the nucleic acid is brought into contact with the treatment liquid.

従来の処理装置は、カバープレート(展開部材)560を、被処理物を付着させたプレート(支持体)PであるマイクロアレイMに重ね合わせ、このマイクロアレイMとの間に形成される隙間569に、前記被処理物を処理する処理液を展開させるものである(例えば、特許文献1参照)。なお、ここで使用した符号は、特許文献1に記載の符号である。   In the conventional processing apparatus, a cover plate (development member) 560 is superimposed on a microarray M which is a plate (support) P to which an object to be processed is attached, and a gap 569 formed between the microarray M and The processing liquid for processing the object to be processed is developed (for example, see Patent Document 1). Note that the code used here is the code described in Patent Document 1.

このように、前記のサンプル処理装置では、複数のマイクロアレイ(プレート)を処理する場合、分注装置等を用いて各マイクロアレイに個別に処理液を滴下し、カバープレート(展開部材)にてその処理液を展開していた。しかしながら、展開後の処理液を撹拌(アジテーション)する手段がなかったので、撹拌を十分に行なえず、処理液にムラが生じるという問題があった。すなわち、プレート上に付着した核酸全体に処理液を撹拌する手段がなかったという問題があった。   As described above, in the above-described sample processing apparatus, when processing a plurality of microarrays (plates), the processing liquid is individually dropped onto each microarray using a dispenser or the like, and the processing is performed on the cover plate (development member). The liquid was developing. However, since there is no means for stirring (agitation) the developed processing solution, there is a problem that stirring cannot be performed sufficiently and unevenness occurs in the processing solution. That is, there was a problem that there was no means for stirring the treatment solution over the entire nucleic acid attached to the plate.

特開2003−57245号公報JP-A-2003-57245

本発明の目的は、構造が比較的簡単であり、被処理物を付着させた板状の支持体上に存在する処理液を簡単な構造で撹拌する撹拌手段を有する処理装置を提供することにある。   An object of the present invention is to provide a processing apparatus which has a relatively simple structure and has a stirring means for stirring a processing liquid existing on a plate-like support to which an object to be processed is attached with a simple structure. is there.

このような目的は、下記(1)〜(8)の本発明により達成される。
(1) 被処理物を付着させた板状の支持体の付着面上に存在する処理液によって、前記被処理物を処理する処理装置であって、
前記支持体が設置される処理部と、
前記付着面に対し、間隙を介して対向配置された平面を有する撹拌部材と、
前記撹拌部材を前記付着面の面方向に変位させる変位手段とを有し、
前記間隙に前記処理液を充填した状態で、前記変位手段の作動により、前記撹拌部材を変位させ、前記処理液を撹拌することを特徴とする処理装置。
Such an object is achieved by the present invention described in the following (1) to (8).
(1) A processing apparatus for processing an object to be processed by a processing liquid existing on an attachment surface of a plate-shaped support to which the object is attached,
A processing unit in which the support is installed,
A stirrer having a flat surface opposed to the adhesion surface with a gap therebetween,
Displacing means for displacing the stirring member in the plane direction of the adhesion surface,
A processing apparatus, wherein the stirring member is displaced by the operation of the displacement means in a state where the processing liquid is filled in the gap, and the processing liquid is stirred.

(2) 前記変位手段の作動により、前記撹拌部材は、少なくとも前記付着面上を往復動する上記(1)に記載の処理装置。   (2) The processing apparatus according to (1), wherein the stirring member reciprocates at least on the attachment surface by the operation of the displacement unit.

(3) 前記間隙の間隙距離を一定に保つ距離規制手段を有する上記(1)または(2)に記載の処理装置。   (3) The processing apparatus according to (1) or (2), further including a distance regulating unit that keeps a gap distance of the gap constant.

(4) 前記距離規制手段は、前記平面の縁部付近に設けられ、前記処理部内に当接して前記間隙距離を一定に保つスペーサで構成されている上記(3)に記載の処理装置。   (4) The processing apparatus according to (3), wherein the distance regulating unit is provided near an edge of the plane, and is configured by a spacer that abuts inside the processing unit and keeps the gap distance constant.

(5) 前記距離規制手段は、前記平面の縁部付近に設けられ、前記支持体上に当接して前記間隙距離を一定に保つスペーサで構成されている上記(3)に記載の処理装置。   (5) The processing apparatus according to (3), wherein the distance regulating unit is provided near an edge of the plane, and is configured by a spacer that abuts on the support to keep the gap distance constant.

(6) 前記平面は、ほぼ四角形状をなし、前記スペーサは、少なくとも前記平面の四隅に設けられている上記(4)または(5)に記載の処理装置。   (6) The processing apparatus according to (4) or (5), wherein the plane has a substantially quadrangular shape, and the spacer is provided at least at four corners of the plane.

(7) 前記距離規制手段は、前記平面と平行に前記撹拌部材から突出した突出部と、
前記処理部側に形成され、前記突出部が当接する当接部とを有する上記(3)に記載の処理装置。
(7) the distance restricting means includes a projecting portion projecting from the stirring member in parallel with the plane;
The processing apparatus according to (3), further including a contact portion formed on the processing unit side and contacting the protruding portion.

(8) 前記撹拌部材は、少なくとも前記処理液を撹拌する部分が親水性を有している上記(1)ないし(7)のいずれかに記載の処理装置。   (8) The processing apparatus according to any one of (1) to (7), wherein at least a portion of the stirring member for stirring the processing liquid has hydrophilicity.

本発明によれば、比較的簡単な構造によって、被処理物を付着させた板状の支持体上に存在する処理液を撹拌することができる。   ADVANTAGE OF THE INVENTION According to this invention, the processing liquid which exists on the plate-shaped support body to which the to-be-processed object was adhered can be stirred with a comparatively simple structure.

また、本発明は、支持体上に付着した被処理物に対して、少量の処理液でも均一かつ確実に処理液を撹拌することができる。   Further, according to the present invention, the processing liquid can be uniformly and reliably stirred with a small amount of the processing liquid with respect to the processing target adhered to the support.

以下、本発明の処理装置を添付図面に示す好適な実施形態に基づいて詳細に説明する。
<第1実施形態>
なお、以下では、被処理物の一例として、核酸(DNA、cDNA、RNA等)を代表とし、この核酸(核酸断片)をプレート(支持体)に散点状に付着させたマイクロアレイ(DNAチップ)を処理するマイクロアレイ処理装置に、本発明の処理装置を適用した場合について説明する。
Hereinafter, a processing apparatus of the present invention will be described in detail based on preferred embodiments shown in the accompanying drawings.
<First embodiment>
In the following, a nucleic acid (DNA, cDNA, RNA, etc.) is represented as an example of the object to be treated, and a microarray (DNA chip) in which the nucleic acid (nucleic acid fragment) is attached to a plate (support) in a scattered manner. A case in which the processing apparatus of the present invention is applied to a microarray processing apparatus for processing the above will be described.

また、処理液(反応液)の一例として、被験者から採取された核酸(例えばmRNA、DNA等)、または、この核酸を基に合成されたもの(例えばcDNA等)を標識(例えば、色素、蛍光物質、放射性物質等により標識)した物質(プローブ)を含む液(以下、「プローブ液」と言う。)を代表に説明する。   In addition, as an example of the treatment liquid (reaction liquid), a nucleic acid (for example, mRNA, DNA, or the like) collected from a subject or a nucleic acid (for example, cDNA or the like) synthesized based on this nucleic acid is labeled (for example, a dye, a fluorescent light, or the like). A liquid containing a substance (probe) labeled with a substance, a radioactive substance, or the like (hereinafter, referred to as a “probe liquid”) will be described as a representative.

ここでいう処理とは、好ましくは、プレートに散点状に付着させた核酸と、プローブ液中に含まれる核酸またはプローブとをハイブリダイゼーションさせることをいう。   The treatment referred to herein preferably refers to hybridization of the nucleic acid adhered to the plate in a scattered manner with the nucleic acid or probe contained in the probe solution.

図1は、本発明の処理装置の第1実施形態を示す全体構成図、図2は、図1中のA−A線断面図、図3は、図1中のB−B線断面図(X)および図1中の処理装置が備える撹拌部材の下面図(Y)である。なお、以下では、説明の都合上、図1(図2、3も同様)の上側を「上」または「上方」、下側を「下」または「下方」と言い、図1および図3の左側を「左」または「左方」、右側を「右」または「右方」と言う。ただし、図1(図2、3、4、5も同様)中の核酸は、説明上、その大きさを誇張して描いている。   1 is an overall configuration diagram showing a first embodiment of the processing apparatus of the present invention, FIG. 2 is a cross-sectional view taken along line AA in FIG. 1, and FIG. 3 is a cross-sectional view taken along line BB in FIG. It is a bottom view (Y) of X) and the stirring member with which the processing apparatus in FIG. 1 is provided. In the following, for convenience of explanation, the upper side of FIG. 1 (also in FIGS. 2 and 3) is referred to as “upper” or “upper”, and the lower side is referred to as “lower” or “lower”. The left side is called “left” or “left”, and the right side is called “right” or “right”. However, the nucleic acids in FIG. 1 (similarly in FIGS. 2, 3, 4, and 5) are exaggerated for the sake of description.

図1に示す処理装置1は、核酸(被処理物)Sを付着させた(散点状に付着させた)板状のプレート(支持体)P(マイクロアレイM)の付着面P1上に存在するプローブ液(処理液)Rによって、核酸Sを処理する処理装置である。この処理装置1は、プレートPが設置される処理部2と、付着面P1に対し、間隙を介して対向配置された平面31を有し、プローブ液Rを撹拌する撹拌部材3と、撹拌部材3を付着面P1の面方向に変位させる変位手段4とを備えている。   The processing apparatus 1 shown in FIG. 1 is present on an attachment surface P1 of a plate-like plate (support) P (microarray M) on which nucleic acids (objects to be treated) S are attached (scattered). This is a processing apparatus for processing a nucleic acid S with a probe liquid (processing liquid) R. The processing apparatus 1 has a processing unit 2 on which a plate P is installed, a flat surface 31 opposed to an attachment surface P1 via a gap, a stirring member 3 for stirring the probe liquid R, and a stirring member. And a displacement means 4 for displacing 3 in the plane direction of the attachment surface P1.

なお、本発明の処理装置1では、この処理装置1を図示しない密閉可能な密閉槽内に収納し、温度および湿度を管理した環境下で処理を行なうことが好ましい。   In the processing apparatus 1 of the present invention, it is preferable that the processing apparatus 1 is housed in a hermetically sealed airtight tank (not shown) and the processing is performed in an environment in which temperature and humidity are controlled.

また、この処理装置1によれば、核酸Sとプローブ液Rとを反応させるとともに、各種液体等により核酸Sを処理することができる。そして、核酸Sの反応結果からは、例えば、遺伝子DNA(核酸)の変異解析、多型解析、塩基配列解析、発現解析(存在の有無)、さらに、これらに基づいて各種疾患の診断等を、好適に行なうことができる。以下、各部の構成について説明する。   Further, according to the processing apparatus 1, the nucleic acid S can be reacted with the probe solution R, and the nucleic acid S can be treated with various liquids. From the reaction results of the nucleic acid S, for example, mutation analysis of gene DNA (nucleic acid), polymorphism analysis, base sequence analysis, expression analysis (presence / absence), and diagnosis of various diseases based on these are performed. It can be suitably performed. Hereinafter, the configuration of each unit will be described.

処理部2は、上面にプレートPを1枚以上設置(載置)できるよう成形された底板21を有している。   The processing unit 2 has a bottom plate 21 formed on the upper surface so that one or more plates P can be installed (placed).

撹拌部材3は、平面31が形成されている本体32を有している。また、撹拌部材3は、底板21上の付着面P1に対し、平面31が間隙を介して対向して配置されるよう、底板21(付着面P1)上に設置(載置)され、当該間隙に充填されたプローブ液Rを撹拌する。   The stirring member 3 has a main body 32 on which a flat surface 31 is formed. Further, the stirring member 3 is placed (placed) on the bottom plate 21 (attachment surface P1) such that the flat surface 31 is arranged to face the attachment surface P1 on the bottom plate 21 with a gap therebetween, and The probe liquid R filled in is stirred.

変位手段4は、撹拌部材3を付着面P1の面方向に移動させる(変位させる)移動機構41を有している。移動機構41は、移動駆動源としてのエアシリンダ411と、撹拌部材3とエアシリンダ411とを接続する接続部材412とを有している。エアシリンダ411は、例えば、処理装置1の一部に固定されている。接続部材412は、エアシリンダ411の長手方向の軸と同軸上にそのエアシリンダ411と接続されている。接続部材412は、エアシリンダ411の伸縮方向(引き込んだり押し出したりする方向)と平面31とが平行になるよう、撹拌部材3とエアシリンダ411とを連結している(接続している)。   The displacement unit 4 has a moving mechanism 41 that moves (displaces) the stirring member 3 in the plane direction of the attachment surface P1. The movement mechanism 41 has an air cylinder 411 as a movement drive source, and a connection member 412 that connects the stirring member 3 and the air cylinder 411. The air cylinder 411 is fixed to, for example, a part of the processing apparatus 1. The connection member 412 is connected to the air cylinder 411 coaxially with the longitudinal axis of the air cylinder 411. The connection member 412 connects (connects) the stirring member 3 and the air cylinder 411 such that the expansion / contraction direction of the air cylinder 411 (the direction in which the air cylinder 411 is drawn in and pushed out) is parallel to the plane 31.

なお、本実施形態では、撹拌部材3と、接続部材412とが別々の部材で構成されたようになっているが、これらが一体的に成形された構成になっていてもよい。   In the present embodiment, the stirring member 3 and the connection member 412 are configured as separate members, but may be configured to be integrally formed.

なお、図示の構成では、移動駆動源にエアシリンダ411を用いているが、特にエアシリンダには限定しない。例えば、モータ駆動、歯車機構等であってもよい。   In the illustrated configuration, the air cylinder 411 is used as the moving drive source, but the invention is not particularly limited to the air cylinder. For example, a motor drive, a gear mechanism, or the like may be used.

また、このようなエアシリンダ411(移動機構41)の作動によって、撹拌部材3が引き込まれたり、押し出されたりするので、撹拌部材3は、底板21上を往復動する。なお、撹拌部材3により撹拌されるプローブ液は、付着面P1上に存在するため、撹拌部材3が往復動する範囲は、少なくとも付着面P1上の範囲であれば十分である。   Further, the stirring member 3 is drawn in or pushed out by the operation of the air cylinder 411 (moving mechanism 41), so that the stirring member 3 reciprocates on the bottom plate 21. Since the probe liquid stirred by the stirring member 3 is present on the attachment surface P1, the range in which the stirring member 3 reciprocates is at least sufficient as long as it is on the attachment surface P1.

処理装置1は、平面31と付着面P1との間隙の間隙距離h1を一定に保つ距離規制手段5を有している。   The processing apparatus 1 includes a distance regulating unit 5 that keeps a constant gap distance h1 between the plane 31 and the attachment surface P1.

距離規制手段5は、間隙距離h1を一定に保つスペーサ51で構成されている。また、スペーサ51は、底板21(処理部2内)に当接するよう、平面31の縁部付近に形成されている。このスペーサ51は、撹拌部材3をマイクロアレイMに重ね合わせた状態で、平面31と、付着面P1とが、互いに他方に対して傾斜することなく互いにほぼ平行となるように保持する機能を有するものである。すなわち、スペーサ51は、間隙距離h1を、ほぼ一定に保持する機能を有するものである。   The distance regulating means 5 is constituted by a spacer 51 for keeping the gap distance h1 constant. The spacer 51 is formed near the edge of the flat surface 31 so as to contact the bottom plate 21 (inside the processing unit 2). The spacer 51 has a function of holding the plane member 31 and the attachment surface P1 such that the stirring member 3 is superimposed on the microarray M so that the plane 31 and the attachment surface P1 are substantially parallel to each other without being inclined with respect to the other. It is. That is, the spacer 51 has a function of keeping the gap distance h1 almost constant.

また、図3(Y)に示すように、平面31は、ほぼ長方形状(四角形状)をなしており、本実施形態では、4つのスペーサ51が、それぞれ、平面31の縁部付近、特に、四隅に設けられている。また、各スペーサ51は、互いにほぼ等しい厚さに設定されている。このような構成により、間隙距離h1を、より容易かつ正確に一定に保持することが可能となる。   Further, as shown in FIG. 3 (Y), the plane 31 has a substantially rectangular shape (square shape), and in the present embodiment, the four spacers 51 are respectively provided near the edges of the plane 31, particularly, It is provided in the four corners. Each spacer 51 is set to have substantially the same thickness. With such a configuration, the gap distance h1 can be maintained more easily and accurately.

なお、本実施形態では、平面31とスペーサ51とが別々の部材で構成されているような構成になっているが、これらが一体的に成形された構成になっていてもよい。   In the present embodiment, the plane 31 and the spacer 51 are configured as separate members, but they may be integrally formed.

なお、各スペーサ51は、それぞれ、平面視での形状がほぼ扇状をなしていることが好ましい。これにより、プローブ液R中の気泡の平面31と付着面P1との間隙からの排出をより良好に行うことができる。   It is preferable that each spacer 51 has a substantially fan-like shape in plan view. Thereby, the air bubbles in the probe liquid R can be better discharged from the gap between the flat surface 31 and the attachment surface P1.

なお、スペーサ51は、平面31と付着面P1との間隙を規制すること、すなわち、間隙距離h1をほぼ一定に保持することができれば、図示の構成に限定されず、いかなるものであってもよい。例えば、スペーサ51は、平面31の縁部付近に複数個設けた構成等とすることができる。例えば、スペーサ51を5つ以上設ける場合には、本実施形態のように、少なくとも平面31の四隅に設けるようにするのが好ましい。   The configuration of the spacer 51 is not limited to the illustrated one as long as it can regulate the gap between the flat surface 31 and the adhesion surface P1, that is, can maintain the gap distance h1 substantially constant. . For example, it is possible to adopt a configuration in which a plurality of spacers 51 are provided near the edge of the plane 31. For example, when five or more spacers 51 are provided, it is preferable to provide them at least at four corners of the plane 31 as in the present embodiment.

このような処理装置1において、間隙距離h1の間隙(通液部)にプローブ液Rを充填した状態で、移動機構41(変位手段4)の作動により、撹拌部材3は、往復動し、付着面P1上のプローブ液Rをムラなく撹拌する。すなわち、移動機構41の作動により往復動した撹拌部材3が付着面P1上に存在するプローブ液Rを流動させる。この流動により、プローブ液R内に存在するプローブが付着面P1の全体に行き渡るので、プローブを付着面P1上の核酸Sと確実に反応させることができる。   In such a processing apparatus 1, the stirrer 3 reciprocates and adheres by the operation of the moving mechanism 41 (displacement means 4) in a state where the probe liquid R is filled in the gap (liquid passage portion) with the gap distance h1. The probe liquid R on the surface P1 is uniformly stirred. That is, the stirring member 3 reciprocated by the operation of the moving mechanism 41 causes the probe liquid R existing on the attachment surface P1 to flow. By this flow, the probe present in the probe solution R spreads over the entirety of the attachment surface P1, so that the probe can reliably react with the nucleic acid S on the attachment surface P1.

また、このように撹拌部材3(平面31)がプローブ液Rを撹拌するよう構成されていることにより、プレートP上のプローブ液Rの領域(面積)に応じて、撹拌部材3の平面31の面積(位置)を適宜設定することによって、より効率的にプローブ液Rを撹拌することができるとともに、プローブ液Rの乾燥を抑制することができる。   In addition, since the stirring member 3 (the flat surface 31) is configured to stir the probe liquid R in this manner, the flat surface 31 of the stirring member 3 is changed according to the area (area) of the probe liquid R on the plate P. By appropriately setting the area (position), the probe liquid R can be more efficiently stirred and the drying of the probe liquid R can be suppressed.

また、例えば、撹拌部材3(平面31)とプローブ液Rとの間に気泡が存在した場合には、撹拌部材3が往復動することにより、前記気泡が押し出され、よって、より効率的にプローブ液Rを撹拌することができる。   Further, for example, when air bubbles exist between the stirring member 3 (the flat surface 31) and the probe liquid R, the air bubbles are pushed out by the reciprocating movement of the stirring member 3, so that the probe can be more efficiently used. The liquid R can be stirred.

次に、撹拌部材3における好適な表面の状態について述べる。撹拌部材3は、少なくともプローブ液Rを撹拌する部分が親水性を有していることが好ましい。すなわち、撹拌部材3は、それ自体が親水性を有する材料で構成されているか、または、その表面に親水化処理が施されていることが好ましい。ここでいう親水性とは、水との接触角が、好ましくは40度以下、より好ましくは1〜30度程度であることをいう。   Next, a preferable surface state of the stirring member 3 will be described. It is preferable that at least the portion of the stirring member 3 for stirring the probe liquid R has a hydrophilic property. That is, it is preferable that the stirring member 3 itself is made of a material having hydrophilicity, or that the surface thereof is subjected to a hydrophilic treatment. Here, hydrophilicity means that the contact angle with water is preferably 40 degrees or less, more preferably about 1 to 30 degrees.

このようにプローブ液Rに接触する撹拌部材3の部分が親水性を有していることは、プローブ液Rが少量の場合でも、それを撹拌するのに有効である。すなわち、図3に示すように、撹拌部材3に付着したプローブ液Rにより形成されたメニスカスJが、撹拌部材3と共に移動する(往復動する)ことによって、プローブ液Rが流動して撹拌される。このことから、メニスカスJをある程度有効に作るために親水性は重要であることがわかる。   The fact that the portion of the stirring member 3 that comes into contact with the probe liquid R has hydrophilicity is effective in stirring the probe liquid R even when the amount is small. That is, as shown in FIG. 3, the meniscus J formed by the probe liquid R attached to the stirring member 3 moves (reciprocates) together with the stirring member 3 so that the probe liquid R flows and is stirred. . This indicates that hydrophilicity is important for making the meniscus J to some extent effective.

また、スペーサ51(距離規制手段5)によって、撹拌部材3は、間隙距離h1を保った位置に位置しているので、移動機構41の作動による撹拌部材3の往復動は、間隙距離h1を一定に保った往復動となる。これによって、撹拌部材3は、付着面P1上を均等な条件でプローブ液Rを撹拌できる。ここでいう均等な条件とは、撹拌部材3がプローブ液から断続的に離れたり、核酸Sと干渉したりしないことなどをいう。   Further, since the stirring member 3 is located at the position where the gap distance h1 is maintained by the spacer 51 (distance regulating means 5), the reciprocation of the stirring member 3 by the operation of the moving mechanism 41 makes the gap distance h1 constant. The reciprocation is maintained. Thus, the stirring member 3 can stir the probe liquid R on the attachment surface P1 under uniform conditions. Here, the uniform condition means that the stirring member 3 does not intermittently separate from the probe solution, does not interfere with the nucleic acid S, or the like.

間隙距離h1と、プレートP上のメニスカスJ部を除くプローブ液Rの深さh2との比h1/h2は、特に限定されないが、0.7〜1.5であるのが好ましく、0.85〜1.2であるのがより好ましい。比h1/h2が前記上限値を超えると、撹拌部材3の親水性が十分でないような場合には、メニスカスJが適正に形成されにくくなったり、撹拌部材3がプローブ液Rを連続して撹拌できなくなったり、撹拌効率が低下する可能性がある。また、比h1/h2が前記下限値未満であると、撹拌部材3と、付着面P1との距離が近くなるので、撹拌部材3の移動精度によっては、撹拌部材3が核酸Sに干渉する可能性がある。   The ratio h1 / h2 of the gap distance h1 to the depth h2 of the probe liquid R excluding the meniscus J on the plate P is not particularly limited, but is preferably 0.7 to 1.5, and 0.85. More preferably, it is .about.1.2. When the ratio h1 / h2 exceeds the upper limit, when the hydrophilicity of the stirring member 3 is not sufficient, the meniscus J is difficult to be properly formed, or the stirring member 3 continuously stirs the probe liquid R. It may not be possible or the stirring efficiency may decrease. If the ratio h1 / h2 is less than the lower limit, the distance between the stirring member 3 and the attachment surface P1 becomes short, so that the stirring member 3 may interfere with the nucleic acid S depending on the movement accuracy of the stirring member 3. There is.

本実施形態では、付着面P1へ供給されたプローブ液Rの付着面P1上での展開を撹拌部材3が行ってもよい。スペーサ51により、付着面P1上の核酸Sへ供給したプローブ液Rの量を正確に調整することが可能となるとともに、その核酸Sに対してプローブ液Rを均一に展開することが可能となる。その結果、正確な核酸Sの反応結果が得られる。   In this embodiment, the stirring member 3 may develop the probe liquid R supplied to the attachment surface P1 on the attachment surface P1. The spacer 51 makes it possible to accurately adjust the amount of the probe solution R supplied to the nucleic acid S on the attachment surface P1, and to uniformly spread the probe solution R on the nucleic acid S. . As a result, an accurate reaction result of the nucleic acid S can be obtained.

<第2実施形態>
図4は、本発明の処理装置の第2実施形態を示す全体構成図、図5は、図4中のA−A線断面図である。なお、以下では、説明の都合上、図4および図5の上側を「上」または「上方」、下側を「下」または「下方」と言い、図4の左側を「左」または「左方」、右側を「右」または「右方」と言う。
<Second embodiment>
FIG. 4 is an overall configuration diagram showing a second embodiment of the processing apparatus of the present invention, and FIG. 5 is a sectional view taken along line AA in FIG. 4 and 5 are referred to as "up" or "upper", the lower side is referred to as "lower" or "lower", and the left side of FIG. 4 is referred to as "left" or "left". The right side is called "right" or "right side."

以下、これらの図を参照して本発明の処理装置の第2実施形態について説明するが、前述した第1実施形態との相違点を中心に説明し、同様の事項はその説明を省略する。   Hereinafter, a second embodiment of the processing apparatus of the present invention will be described with reference to these drawings, but the description will focus on differences from the above-described first embodiment, and description of similar items will be omitted.

図4に示す本実施形態の処理装置1’は、距離規制手段の構成が異なること以外は前記第1実施形態と同様である。   The processing apparatus 1 'of this embodiment shown in FIG. 4 is the same as the first embodiment except that the configuration of the distance regulating means is different.

距離規制手段5’は、本体32から突出した突出部52と、処理部2側に形成され、突出部52がそれぞれ当接する当接部53とを有している。突出部52は、平面31と平行で、移動機構41の作動による撹拌部材3の往復動の方向にほぼ垂直な方向に本体32から互いに逆の方向に突出するよう形成されている。また、当接部53は、平面31と付着面P1との隙間が間隙距離h1を保つよう、突出部52の外周面にそれぞれ当接し、底板21と垂直な方向に底板21上に形成されている。なお、距離規制手段5’は、本実施形態のように、突出部52が互いに逆の方向になるよう本体32に形成されていてもよいし、その形成された突出部52の内の一方の突出部52のみが本体32に形成されていてもよい。   The distance restricting means 5 ′ has a protruding portion 52 protruding from the main body 32 and a contact portion 53 formed on the processing unit 2 side, with which the protruding portions 52 abut. The protruding portions 52 are formed so as to protrude from the main body 32 in directions opposite to each other in a direction parallel to the plane 31 and substantially perpendicular to the direction of reciprocation of the stirring member 3 by the operation of the moving mechanism 41. The contact portions 53 are respectively formed on the bottom plate 21 in a direction perpendicular to the bottom plate 21 so as to contact the outer peripheral surfaces of the protruding portions 52 so that the gap between the flat surface 31 and the attachment surface P1 keeps the gap distance h1. I have. Note that the distance regulating means 5 'may be formed on the main body 32 so that the protruding portions 52 are opposite to each other as in the present embodiment, or one of the protruding portions 52 formed. Only the protrusion 52 may be formed on the main body 32.

なお、本実施形態では、本体32と突出部52とが別々の部材で構成されているような構成になっているが、これらが一体的に成形された構成になっていてもよい。   In the present embodiment, the main body 32 and the protruding portion 52 are configured as separate members, but they may be integrally formed.

<第3実施形態>
図7は、本発明の処理装置の第3実施形態を示す全体構成図、図8は、図7中のA−A線断面図(X)および図7中の処理装置が備える撹拌部材の下面図(Y)である。なお、以下では、説明の都合上、図7(図8も同様)の上側を「上」または「上方」、下側を「下」または「下方」と言う。
<Third embodiment>
7 is an overall configuration diagram showing a third embodiment of the processing apparatus of the present invention, FIG. 8 is a cross-sectional view taken along line AA in FIG. 7 (X), and a lower surface of a stirring member provided in the processing apparatus in FIG. FIG. In the following, for convenience of description, the upper side of FIG. 7 (also in FIG. 8) is referred to as “upper” or “upper”, and the lower side is referred to as “lower” or “lower”.

以下、これらの図を参照して本発明の処理装置の第3実施形態について説明するが、前述した第1実施形態との相違点を中心に説明し、同様の事項はその説明を省略する。   Hereinafter, a third embodiment of the processing apparatus of the present invention will be described with reference to these drawings, but the description will focus on differences from the above-described first embodiment, and description of similar items will be omitted.

図7に示す本実施形態の処理装置1は、距離規制手段の形状が異なること以外は前記第1実施形態と同様である。   The processing apparatus 1 of the present embodiment shown in FIG. 7 is the same as the first embodiment except that the shape of the distance regulating means is different.

距離規制手段5Aは、間隙距離h1を一定に保つスペーサ54で構成されている(図7、図8参照)。各スペーサ54は、平面31の縁部311、312のそれぞれからプレートPに向って突出するように形成され、下面541がプレートP(付着面P1と同一の面)上に当接している(図8参照)。また、図8(Y)に示すように、各スペーサ54は、その形状が平面視で長尺状をなしており、その幅(図8中、wで示す長さ)がほぼ一定である。   The distance regulating means 5A is constituted by a spacer 54 for keeping the gap distance h1 constant (see FIGS. 7 and 8). Each spacer 54 is formed so as to protrude from each of the edges 311 and 312 of the plane 31 toward the plate P, and the lower surface 541 is in contact with the plate P (the same surface as the attachment surface P1) (FIG. 8). As shown in FIG. 8 (Y), each spacer 54 has an elongated shape in plan view, and its width (length indicated by w in FIG. 8) is substantially constant.

また、平面31の幅(図8(Y)中、u1で示す長さ)と各スペーサ54の幅(図8(Y)中、wで示す長さ)との和は、プレートPの幅(図8中(X)、u2で示す長さ)と同等またはそれより若干小さいのが好ましい。   The sum of the width of the plane 31 (length indicated by u1 in FIG. 8 (Y)) and the width of each spacer 54 (length indicated by w in FIG. 8 (Y)) is the width of the plate P ( It is preferably equal to or slightly smaller than (X) in FIG. 8 and the length indicated by u2).

これにより、撹拌部材3が往復動するときに、スペーサ54がプレートP上から脱落するのを確実に防止することができ、よって、間隙距離h1を確実に一定に保つことができる。   Thereby, when the stirring member 3 reciprocates, it is possible to reliably prevent the spacer 54 from falling off from above the plate P, and thus, it is possible to reliably keep the gap distance h1 constant.

このような構成により、プレートPがスペーサ54(撹拌部材3)により処理部2の底板21に押し付けられているため、プレートPが底板21から浮き上がる(離間する)のを防止することができるとともに、間隙距離h1をより容易かつ正確に一定に維持することができる。   With such a configuration, since the plate P is pressed against the bottom plate 21 of the processing unit 2 by the spacer 54 (stirring member 3), it is possible to prevent the plate P from floating (separating) from the bottom plate 21, and The gap distance h1 can be maintained more easily and accurately.

なお、本実施形態では、撹拌部材3の本体32とスペーサ54とが一体的に形成されている(図8(X)参照)のに限定されず、これらが別々の部材で形成されていてもよい。   In the present embodiment, the main body 32 of the stirring member 3 and the spacer 54 are not limited to being integrally formed (see FIG. 8 (X)), and may be formed of separate members. Good.

さて、変位手段4の作動による撹拌部材3の変位の例について図6に基づき説明する。図6は、付着面P1上での変位手段4の作動による撹拌部材3の変位を矢印で示した図である。   Now, an example of displacement of the stirring member 3 due to operation of the displacement means 4 will be described with reference to FIG. FIG. 6 is a diagram in which the displacement of the stirring member 3 by the operation of the displacement means 4 on the attachment surface P1 is indicated by an arrow.

付着面P1上での変位手段4の作動による撹拌部材3の変位は、図6(a)に示すように、本実施形態のように、付着面P1上をプレートPの長手方向に沿って、往復動してもよい。   As shown in FIG. 6A, the displacement of the stirring member 3 due to the operation of the displacement means 4 on the attachment surface P1 is performed on the attachment surface P1 along the longitudinal direction of the plate P as shown in FIG. It may reciprocate.

また、前記長手方向とほぼ垂直な方向に撹拌部材3を往復動させるような機構のみを備えていれば、図6(b)に示すように、撹拌部材3の変位は、撹拌部材3が前記長手方向とほぼ垂直な方向に往復動してもよい。   If only a mechanism for reciprocating the stirring member 3 in a direction substantially perpendicular to the longitudinal direction is provided, as shown in FIG. 6B, the displacement of the stirring member 3 It may reciprocate in a direction substantially perpendicular to the longitudinal direction.

前記長手方向と、前記長手方向とほぼ垂直な方向とに撹拌部材3を往復動させるそれぞれの機構を備えていれば、適宜それぞれの機構の作動を組合わせて、図6(c)に示すように、撹拌部材3の変位は、図6(a)中の矢印の方向と図6(b)中の矢印の方向とを組合わせたような変位であってもよい。   If each mechanism for reciprocating the stirring member 3 in the longitudinal direction and a direction substantially perpendicular to the longitudinal direction is provided, the operation of each mechanism is appropriately combined as shown in FIG. 6C. Alternatively, the displacement of the stirring member 3 may be a displacement obtained by combining the direction of the arrow in FIG. 6A and the direction of the arrow in FIG. 6B.

同様に、図6(d)に示すように、撹拌部材3の変位は、プレートPの縁部に沿うような変位であってもよい。   Similarly, as shown in FIG. 6D, the displacement of the stirring member 3 may be a displacement along the edge of the plate P.

同様に、図6(e)に示すように、撹拌部材3の変位は、前記長手方向とほぼ垂直な方向に往復動しつつ、前記長手方向にも往復動するような変位であってもよい。   Similarly, as shown in FIG. 6E, the displacement of the stirring member 3 may be a displacement that reciprocates in a direction substantially perpendicular to the longitudinal direction and also reciprocates in the longitudinal direction. .

撹拌部材3を平面31と付着面P1とが平行な状態で回転させる機構を備えていれば、図6(f)に示すように、撹拌部材3の変位は、回転する変位であってもよい。   If a mechanism for rotating the stirring member 3 in a state where the plane 31 and the attachment surface P1 are parallel to each other is provided, the displacement of the stirring member 3 may be a rotating displacement as shown in FIG. .

撹拌部材3を前記長手方向に往復動させる前記機構と、回転させる前記機構とを備えていれば、図6(g)に示すように、撹拌部材3の変位は、回転しつつ、前記長手方向に往復動するような変位であってもよい。   If the mechanism for reciprocating the stirring member 3 in the longitudinal direction and the mechanism for rotating the stirring member 3 are provided, as shown in FIG. 6 (g), the displacement of the stirring member 3 is changed while rotating in the longitudinal direction. The displacement may be such that it reciprocates.

以上、本発明の処理装置を図示の実施形態について説明したが、本発明は、これに限定されるものではなく、処理装置を構成する各部は、同様の機能を発揮し得る任意の構成のものと置換することができる。また、任意の構成物が付加されていてもよい。   The processing apparatus of the present invention has been described with reference to the illustrated embodiment. However, the present invention is not limited to this, and each unit constituting the processing apparatus may have any configuration capable of exhibiting the same function. Can be replaced by Further, an arbitrary component may be added.

また、第1実施形態のスペーサは、第3実施形態のスペーサのように撹拌部材の平面の縁部のほぼ全長にわたって形成されて(設けられて)いてもよい。   Further, the spacer of the first embodiment may be formed (provided) over substantially the entire length of the planar edge of the stirring member like the spacer of the third embodiment.

また、第3実施形態のスペーサは、第1実施形態のスペーサのように撹拌部材の平面四隅に形成されて(設けられて)いてもよい。
また、撹拌部材の平面の縁部(エッジ)は、丸みを帯びていてもよい。
Further, the spacers of the third embodiment may be formed (provided) at the four corners of the plane of the stirring member like the spacers of the first embodiment.
In addition, the edge of the plane of the stirring member may be rounded.

本発明の処理装置の第1実施形態を示す全体構成図である。1 is an overall configuration diagram illustrating a first embodiment of a processing apparatus according to the present invention. 図1中のA−A線断面図である。FIG. 2 is a sectional view taken along line AA in FIG. 1. 図1中のB−B線断面図(X)および図1中の処理装置が備える撹拌部材の下面図(Y)である。FIG. 2 is a cross-sectional view (X) taken along line BB in FIG. 1 and a bottom view (Y) of a stirring member provided in the processing apparatus in FIG. 1. 本発明の処理装置の第2実施形態を示す全体構成図である。FIG. 4 is an overall configuration diagram illustrating a second embodiment of the processing apparatus of the present invention. 図4中のA−A線断面図である。FIG. 5 is a sectional view taken along line AA in FIG. 4. 付着面P1上での変位手段の作動による撹拌部材の変位を矢印で示した図である。It is the figure which showed the displacement of the stirring member by operation | movement of the displacement means on the adhesion surface P1 with the arrow. 本発明の処理装置の第3実施形態を示す全体構成図である。FIG. 6 is an overall configuration diagram showing a third embodiment of the processing apparatus of the present invention. 図7中のA−A線断面図(X)および図7中の処理装置が備える撹拌部材の下面図(Y)である。FIG. 8 is a cross-sectional view taken along line AA in FIG. 7 (X) and a bottom view (Y) of a stirring member provided in the processing apparatus in FIG. 7.

符号の説明Explanation of reference numerals

1 処理装置
1’ 処理装置
2 処理部
21 底板
3 撹拌部材
31 平面
311 縁部
312 縁部
32 本体
4 変位手段
41 移動機構
411 エアシリンダ
412 接続部材
5 距離規制手段
5’ 距離規制手段
5A 距離規制手段
51 スペーサ
52 突出部
53 当接部
54 スペーサ
541 下面
h1 間隙距離
h2 深さ
w 幅
u1 幅
u2 幅
J メニスカス
M マイクロアレイ
P プレート
P1 付着面
R プローブ液
S 核酸
DESCRIPTION OF SYMBOLS 1 Processing apparatus 1 'Processing apparatus 2 Processing part 21 Bottom plate 3 Stirring member 31 Flat surface 311 Edge 312 Edge 32 Main body 4 Displacement means 41 Moving mechanism 411 Air cylinder 412 Connection member 5 Distance regulating means 5' Distance regulating means 5A Distance regulating means 51 Spacer 52 Projecting part 53 Contact part 54 Spacer 541 Lower surface h1 Gap distance h2 Depth w Width u1 Width u2 Width J Meniscus M Microarray P plate P1 Attachment surface R Probe solution S Nucleic acid

Claims (8)

被処理物を付着させた板状の支持体の付着面上に存在する処理液によって、前記被処理物を処理する処理装置であって、
前記支持体が設置される処理部と、
前記付着面に対し、間隙を介して対向配置された平面を有する撹拌部材と、
前記撹拌部材を前記付着面の面方向に変位させる変位手段とを有し、
前記間隙に前記処理液を充填した状態で、前記変位手段の作動により、前記撹拌部材を変位させ、前記処理液を撹拌することを特徴とする処理装置。
A processing apparatus for processing the object to be processed, by a processing liquid present on an attachment surface of a plate-shaped support to which the object is attached,
A processing unit in which the support is installed,
A stirrer having a flat surface opposed to the adhesion surface with a gap therebetween,
Displacing means for displacing the stirring member in the plane direction of the adhesion surface,
A processing apparatus, wherein the stirring member is displaced by the operation of the displacement means in a state where the processing liquid is filled in the gap, and the processing liquid is stirred.
前記変位手段の作動により、前記撹拌部材は、少なくとも前記付着面上を往復動する請求項1に記載の処理装置。   The processing apparatus according to claim 1, wherein the stirring member reciprocates at least on the attachment surface by the operation of the displacement unit. 前記間隙の間隙距離を一定に保つ距離規制手段を有する請求項1または2に記載の処理装置。   The processing apparatus according to claim 1, further comprising a distance regulating unit that keeps a gap distance of the gap constant. 前記距離規制手段は、前記平面の縁部付近に設けられ、前記処理部内に当接して前記間隙距離を一定に保つスペーサで構成されている請求項3に記載の処理装置。   4. The processing apparatus according to claim 3, wherein the distance regulating unit is provided near an edge of the plane, and is configured by a spacer that abuts inside the processing unit and keeps the gap distance constant. 5. 前記距離規制手段は、前記平面の縁部付近に設けられ、前記支持体上に当接して前記間隙距離を一定に保つスペーサで構成されている請求項3に記載の処理装置。   4. The processing apparatus according to claim 3, wherein the distance regulating unit is provided near an edge of the plane, and is configured by a spacer that abuts on the support and keeps the gap distance constant. 5. 前記平面は、ほぼ四角形状をなし、前記スペーサは、少なくとも前記平面の四隅に設けられている請求項4または5に記載の処理装置。   The processing apparatus according to claim 4, wherein the plane has a substantially quadrangular shape, and the spacer is provided at least at four corners of the plane. 前記距離規制手段は、前記平面と平行に前記撹拌部材から突出した突出部と、
前記処理部側に形成され、前記突出部が当接する当接部とを有する請求項3に記載の処理装置。
The distance restricting means, a protrusion protruding from the stirring member parallel to the plane,
The processing apparatus according to claim 3, further comprising: a contact portion formed on the processing unit side and contacting the protruding portion.
前記撹拌部材は、少なくとも前記処理液を撹拌する部分が親水性を有している請求項1ないし7のいずれかに記載の処理装置。
The processing apparatus according to claim 1, wherein at least a portion of the stirring member that stirs the processing liquid has hydrophilicity.
JP2004052145A 2003-05-09 2004-02-26 Treatment apparatus Pending JP2004357698A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005090997A1 (en) * 2004-03-23 2005-09-29 Toray Industries, Inc. Method of agitating solution
US7820381B2 (en) 2004-07-23 2010-10-26 Ventana Medical Systems, Inc. Method and apparatus for applying fluids to a biological sample

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JP2002501611A (en) * 1996-12-04 2002-01-15 ナノゲン・インコーポレイテッド Stacked assembly for active bioelectronic devices
WO2002087761A1 (en) * 2001-04-26 2002-11-07 Vrije Universiteit Brussel Method for accelaration and intensification of target-receptor binding and devices therefor
WO2002089982A2 (en) * 2001-05-07 2002-11-14 Massachusetts Institute Of Technology Methods for screening substances in a microwell array
JP2002350305A (en) * 2001-05-28 2002-12-04 Aloka Co Ltd Liquid expansion member and sample treatment apparatus using the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002501611A (en) * 1996-12-04 2002-01-15 ナノゲン・インコーポレイテッド Stacked assembly for active bioelectronic devices
WO2002087761A1 (en) * 2001-04-26 2002-11-07 Vrije Universiteit Brussel Method for accelaration and intensification of target-receptor binding and devices therefor
WO2002089982A2 (en) * 2001-05-07 2002-11-14 Massachusetts Institute Of Technology Methods for screening substances in a microwell array
JP2002350305A (en) * 2001-05-28 2002-12-04 Aloka Co Ltd Liquid expansion member and sample treatment apparatus using the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005090997A1 (en) * 2004-03-23 2005-09-29 Toray Industries, Inc. Method of agitating solution
US8298832B2 (en) 2004-03-23 2012-10-30 Toray Industries, Inc. Method of agitating solution
US7820381B2 (en) 2004-07-23 2010-10-26 Ventana Medical Systems, Inc. Method and apparatus for applying fluids to a biological sample

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