JP2004342902A - Packing structure of exposure device main body and exposure device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a packing structure of an exposure device main body which prevents the invasion of impurities into a packaging even when external atmospheric pressure changes. <P>SOLUTION: The packaging 11 is constituted of raw materials which prevent the permeation of gas and cover constituting members of at least one part or the whole of the exposure device main body 10. The packaging 11 is provided with an opening 12, and impurities contained in gas passing through the opening 12 are removed by a filter 13. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a packaging structure of a main body of an exposure apparatus used in a manufacturing process of an electronic device such as a semiconductor device, a liquid crystal display device, an imaging device (CCD or the like), a thin film magnetic head, and the like.
[0002]
[Prior art]
When an electronic device such as a semiconductor element or a liquid crystal display element is manufactured by a photolithography process, a pattern image of a mask or a reticle (hereinafter, referred to as a reticle) having a pattern formed thereon is exposed to a photosensitive material (resist) via a projection optical system. There is used a projection exposure apparatus that projects onto each projection (shot) area on a substrate coated with. The circuit of the electronic device is transferred by exposing a circuit pattern on a substrate to be exposed by the projection exposure apparatus, and is formed by post-processing.
[0003]
In recent years, high-density integration of integrated circuits, that is, miniaturization of circuit patterns, has been promoted. Therefore, the wavelength of the exposure illumination beam (exposure light) in the projection exposure apparatus tends to be shorter. That is, a short wavelength light source such as a KrF excimer laser (wavelength: 248 nm) is used instead of a mercury lamp that has been mainstream until now, and a practical use of an exposure apparatus using a short wavelength ArF excimer laser (193 nm) is practical. Is also entering the final stage. Also, with the aim of achieving even higher density integration, F₂Exposure equipment using a laser (157 nm) has been developed.
[0004]
Beams with a wavelength of about 190 nm or less belong to the vacuum ultraviolet region, and these beams do not transmit air. This is because the energy of the beam is absorbed by substances (hereinafter, referred to as light absorbing substances) such as oxygen molecules, water molecules, and carbon dioxide molecules contained in the air. In an exposure apparatus that uses exposure light in a vacuum ultraviolet region, in order for the exposure light to reach the substrate to be exposed with sufficient illuminance, it is necessary to reduce or eliminate light-absorbing substances from a space on the optical path of the exposure light. Therefore, in an exposure apparatus, the space on the optical path is often surrounded by a housing, and the space in the housing is filled with a transparent gas that transmits the exposure light.
[0005]
Now, when packing the main body of the exposure apparatus (hereinafter, referred to as “exposure apparatus main body”), it is required that impurities such as the above-described light absorbing substance do not enter the inside of the packing material. This is because, if impurities enter the inside of the packaging material, they may adhere to the surface of the optical member in the exposure apparatus main body and cause a decrease in optical characteristics. As a packing structure of the exposure apparatus main body, there is a technique in which the exposure apparatus main body is hermetically covered with a packing material such as a sheet material (for example, see Patent Document 1).
[0006]
[Patent Document 1]
JP 2000-203678 A
[0007]
[Problems to be solved by the invention]
With the technology that airtightly covers the exposure device body with the packing material, if the pressure of the external environment changes during air transportation, etc., a large load is applied to the packing material due to the difference in pressure between the inside and outside of the packing material. May collapse, and impurities may enter the inside of the packing material from a small gap.
[0008]
The present invention has been made in view of the above-described circumstances, and has as its object to provide a packaging structure of an exposure apparatus main body that can prevent impurities from entering the inside of a packaging material even when the external air pressure changes. And
Another object of the present invention is to provide an exposure apparatus in which the optical characteristics are not significantly reduced during transportation and storage.
[0009]
[Means for Solving the Problems]
The packaging structure of the exposure apparatus main body of the present invention is made of a material that prevents gas permeation, and a packaging material (11) that covers at least a part of the exposure apparatus main body (10) or a member constituting the exposure apparatus main body; An opening (12) provided in the packing material and a filter (13) for removing impurities contained in a gas passing through the opening are provided.
In this packing structure, the gas flows in and out through the opening provided in the packing material, thereby eliminating the pressure difference between the inside and outside of the packing material. Therefore, even when the atmospheric pressure of the external environment changes, the load on the packaging material due to the atmospheric pressure difference is reduced, and gas is prevented from entering and exiting a place different from the opening. In addition, impurities contained in the gas passing through the opening are removed by the filter. As a result, in this packing structure, even when the external atmospheric pressure changes, intrusion of impurities into the inside of the packing material is prevented.
[0010]
In the above packing structure, a gas barrier film is preferably used as the packing material (11) because the load on the packing material due to the change in air pressure is reduced. The film is lightweight and highly flexible, and improves packing workability.
[0011]
Further, in the above-described packing structure, the packing materials (20, 21) are arranged in a multiplex manner, whereby the intrusion of impurities into the packing material is more reliably prevented.
[0012]
Further, since the filter (13) includes a chemical filter for removing gaseous impurities, gaseous impurities contained in the gas passing through the opening are removed. This prevents the gaseous impurities from adhering to the optical member of the exposure apparatus main body, and prevents the optical characteristics of the exposure apparatus from deteriorating.
[0013]
Further, since the filter includes a plurality of filters (13a, 13b) arranged in multiple stages, impurities contained in the gas passing through the opening are more reliably removed.
[0014]
In the above-mentioned packing structure, a valve (18) for opening and closing the opening (12) may be provided. By providing the valve, it is possible to control the opening and closing of the opening, for example, by closing the opening when the change in air pressure is small, and the intrusion of impurities into the packing material is more reliably prevented.
[0015]
In this case, the valve may include a check valve (19a, 19b) that opens the gas flow only in one direction. By providing the check valve, it is possible to suppress the consumption of the filter by controlling the flow direction of the gas accompanying the change in the atmospheric pressure.
[0016]
Further, the above-mentioned packing structure may include a gas storage part (32) connected to the opening (31) and storing a high-purity gas having a low concentration of impurities contained in the main gas. In this case, intrusion of impurities into the packing material is more reliably prevented.
[0017]
Further, an exposure apparatus of the present invention is characterized in that the exposure apparatus is packed by the above-described packing structure.
In the exposure apparatus of the present invention, the above-described packing structure prevents impurities from adhering to the optical member, so that deterioration in optical characteristics due to transportation and storage is small.
[0018]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described.
FIG. 1 schematically shows a first embodiment of a packaging structure for an exposure apparatus main body according to the present invention.
[0019]
In FIG. 1, the exposure apparatus main body 10 is covered with a packaging material 11 made of a film material (or a sheet material) during transportation or storage. The packing material 11 is preferably made of a material that prevents the transmission of impurities that cause deterioration of the optical characteristics of the optical system provided in the exposure apparatus main body. In this example, an ethylene-vinyl alcohol copolymer resin (for example, EVAL (registered trademark)) is used. Trademark)), a polyimide film (for example, Kapton (registered trademark)), a polyethylene terephthalate (PET) film (for example, Mylar (registered trademark)), or the like, and a gas barrier film is used. In addition, as a packing material, for example, various fluoropolymers such as tetrafluoroethylene (so-called Teflon (registered trademark)), tetrafluoroethylene-terfluoro (alkyl vinyl ether), and tetrafluoroethylene-hexafluoropropene copolymer, or Materials such as a so-called high barrier sheet having a three-layer structure composed of nylon (ONY polymerization) -one-side silica-coated pet resin (PET12) -polyethylene (PEF60) can be used.
[0020]
The packing material 11 is provided with an opening 12 for ventilation, and the opening 12 is connected to a pipe 14 in which a filter 13 is provided. The filter 13 removes impurities contained in the gas passing through the opening 12 by an action such as adsorption, absorption, or filtration. In this example, a chemical filter that removes gaseous impurities (light absorbing substance described later) is used. Used. As the chemical filter, a filter effective for impurities that cause a decrease in the optical characteristics of the optical system provided in the exposure apparatus body is appropriately selected, and for example, a zeolite filter, a zirconia filter, silica gel, or the like is used. A filter for removing impurities such as ammonia, amine-based compounds, ionic-based, silicon-based organic substances such as siloxane, silazane, and silanol, plasticizers (phthalsan esters, etc.), and flame retardants (phosphoric acid, chlorine-based substances). For example, an activated carbon filter or a zeolite filter can be used.
[0021]
2A and 2B are diagrams showing the configuration of the exposure apparatus main body 10, in which FIG. 2A schematically shows the state during actual operation, and FIG.
At the time of actual operation shown in FIG. 2A, the exposure apparatus main body 10 is installed in a box-shaped chamber 101 installed on a floor surface in a clean room. A gas (a permeation gas described later) that is more strictly controlled than the air in the external clean room is supplied from an air conditioner (not shown) into the chamber 101. In the exposure apparatus main body 10, a column 103 having a plurality of legs is planted on a surface plate 102 installed in a chamber 101, and a wafer stage WS is movably disposed on a support plate supported by the surface plate 102. Then, the exposure target wafer W coated with the photoresist is suction-held on the wafer stage WS via the wafer holder 104. Further, the projection optical system PL is fixed to the pedestal 103a of the column 103, the reticle stage RS is movably disposed on the pedestal 103b of the column 103, and the pattern to be exposed is placed on the reticle stage RS via a reticle holder (not shown). The reticle R on which is formed is held by suction. Also, a part of the illumination system IU is installed on the illumination system support plate 103c of the column 103. One end (outgoing end) of the beam matching unit BMU is connected to this illumination system IU, and the other end (incident end) of the beam matching unit BMU is connected to a light source (not shown) installed outside the chamber 101.
[0022]
As a light source, a light source that emits light belonging to a vacuum ultraviolet light region having a wavelength of about 120 nm to about 180 nm, for example, a fluorine laser (F₂Laser), a krypton dimer laser (Kr) having an oscillation wavelength of 146 nm.₂Laser), an argon dimer laser (Ar₂Laser) or the like. When light having a wavelength in the vacuum ultraviolet region is used as an exposure beam, it is necessary to exclude a substance having a strong absorption characteristic for light in the wavelength band (hereinafter, referred to as a light absorbing substance) from the optical path. As a light absorbing substance for the beam in the vacuum ultraviolet region, oxygen (O₂), Water (steam: H₂O), carbon dioxide (carbon dioxide: CO₂), Organic substances, and halides. On the other hand, as a gas (substance having little energy absorption) through which the exposure beam IL passes, a nitrogen gas (N₂), There is a rare gas composed of helium (He), neon (Ne), argon (Ar), krypton (Kr), xenon (Xe), and radon (Rn). Hereinafter, the nitrogen gas and the rare gas will be collectively referred to as “permeated gas”. Note that nitrogen gas acts as a light-absorbing substance for light having a wavelength of about 150 nm or less, and helium gas can be used as a transmission gas up to a wavelength of about 100 nm. Helium gas has a thermal conductivity that is about six times that of nitrogen gas, and the amount of change in the refractive index with respect to a change in atmospheric pressure is about 1/8 that of nitrogen gas. Excellent in stability and cooling.
[0023]
On the other hand, at the time of packing shown in FIG. 2B, the exposure apparatus main body 10 is packed in a clean room using the packing material 11 described above. In this example, prior to packing, the illumination system IU and the beam matching unit BMU shown in FIG. 2A are removed, and these are packed separately from the exposure apparatus main body 10. In addition, if necessary, an optical member having an exposed optical surface (such as a lens disposed at an optical path end in the projection optical system PL) is covered with a predetermined member (cap 15), and impurities on the optical surface of the optical member are contaminated. Prevents adhesion. In the packing operation, for example, the inside and outside of the packing material 11 are hermetically sealed by wrapping the exposure apparatus main body 10 with the packing material 11 and heat-sealing a joint at the end of the packing material 11. Alternatively, the packing material 11 is connected to the exposure apparatus main body 10 using a connecting means such as a hose clamp. In addition, the inside and outside of the packing material 11 is kept sealed by using packing or the like as necessary. Further, in order to prevent intrusion of impurities during the operation, N₂ The above-described permeated gas may be appropriately supplied into the packing material 11. An example of the procedure of the packing operation is described in JP-A-2000-203678.
[0024]
Returning to FIG. 1, in the packing structure of the present embodiment, since the opening 12 is provided in the packing material 11, when the atmospheric pressure of the external environment of the packing material 11 changes, gas flows in and out through the opening 12. Thereby, the pressure difference between the inside and outside of the packing material 11 is eliminated. That is, when the inside pressure of the packing material 11 is lower than that of the outside, the gas (air) flows into the packing material 11 from the outside through the opening 12, so that the space between the inside and outside of the packing material 11 is reduced. The pressure becomes almost equal. On the other hand, when the air pressure inside the packing material 11 is higher than the outside, gas flows out from the inside of the packing material 11 to the outside through the opening 12, so that the air pressure between the inside and the outside of the packing material 11 is almost equal. Become equal. By eliminating the pressure difference between the inside and outside of the packing material 11 as described above, even when the pressure of the external environment changes during air transportation or the like, the load on the packing material 11 due to the pressure difference is reduced, and The gas can be prevented from entering and exiting a place other than the opening 12. When the gas passes through the opening 12 of the packing material 11, impurities (such as light-absorbing substances contained in air) contained in the gas are removed by the filter 13. As a result, in this packing structure, even when the external atmospheric pressure changes, intrusion of impurities into the inside of the packing material 11 is prevented. Then, in the exposure apparatus packed by this packing structure, the adhesion of impurities to the optical surface of the optical member at the time of packing is prevented, so that the deterioration of the optical characteristics of the exposure apparatus due to transportation and storage is suppressed.
[0025]
Here, in the present embodiment, as described above, the pressure on the packing material 11 due to the change in the atmospheric pressure is reduced by adjusting the pressure inside the packing material 11. That is, almost no pressure is applied to the packing material 11. Therefore, the above-mentioned film material (or sheet material) is preferably used as the packing material 11. That is, it is possible to use a plate-like material such as a metal plate as a packing material and form a pressure-resistant structure using the material as a partition, but there are many problems in terms of cost, weight, workability, and the like. On the other hand, a film material or a sheet material is lightweight and highly flexible, and the packing workability is improved. Further, although the film material or the sheet material does not always have sufficient breaking strength, in the present embodiment, the possibility of breakage and damage is reduced by reducing the load. The packing material in the present invention is not limited to a film material or a sheet material. Further, as the packing material, it is preferable to use a material such as the above-described light-absorbing substance which emits a small amount of impurities (gas release) which causes deterioration in the optical characteristics of the optical system provided in the exposure apparatus body.
[0026]
The impurities that cause the deterioration of the optical characteristics of the optical system provided in the exposure apparatus main body include O₂, H₂O, CO₂In addition to the above-mentioned light-absorbing substances such as organic compounds, halides, etc., Si compounds, ammonia, dust (particles) and the like can be mentioned. The filter is not limited to a chemical filter for removing gaseous impurities, but may be another filter, for example, a HEPA filter or a ULPA filter for removing dust. Further, a plurality of filters may be used in combination. The type of filter, the number, position, shape, and the like of the openings provided in the packing material are determined as appropriate.
[0027]
3, 4, and 5 show modified examples of the arrangement configuration of the filter.
In the example of FIG. 3, a plurality of (here, two) filters 13 a and 13 b are arranged in multiple stages with respect to the opening 12 provided in the packing material 11. Specifically, a chemical filter 13a is arranged on the side of the opening 12 of the packing material 11, and a dust filter 13b (HEPA filter, ULPA filter or the like) is arranged outside the chemical filter 13a. In this configuration, since the filters 13a and 13b are arranged in multiple stages, impurities contained in the gas passing through the opening 12 are more reliably removed. That is, when gas (air) flows from the outside to the inside of the packing material 11, first, dust (particles) contained in the gas is removed by the dust filter 13b, and thereafter, gaseous impurities contained in the gas are removed. Is removed by the chemical filter 13a. Therefore, the consumption of the chemical filter 13a due to dust is suppressed, and the impurities contained in the gas are reliably removed by the two filters 13a and 13b.
[0028]
When a plurality of filters are arranged in multiple stages, different types of filters may be combined as in the above example, or the same type of filters may be combined. In addition to the above examples, examples of the combination of different types of filters include a combination of a filter for removing ammonia (a filter for polymer impurities) and a filter for removing water. Examples of the filter for removing water include, in addition to silica gel, a filter using calcium chloride, quicklime, natural zeolite, or the like. In the case of a combination of the ammonia removing filter and the water removing filter, it is difficult to remove ammonia in an environment having a low moisture concentration. Therefore, the ammonia removing filter is provided on the opening 12 side of the packing material 11 and the ammonia is provided on the outside thereof. A filter for removal may be provided.
[0029]
In the example of FIG. 4, a valve 18 for opening and closing the opening 12 is provided for the opening 12 provided in the packing material 11. The valve 18 is arranged outside the filter 13 with respect to the opening 12. In this configuration, by providing the valve 18 that opens and closes the opening 12, it is possible to control the opening and closing of the opening 12, for example, by closing the opening 12 when there is little change in atmospheric pressure, and to prevent impurities from entering the packing material 11. More reliably prevented. The control of the valve 18 may be automatic or manual. In the case of automatic control, for example, a sensor that detects a change in atmospheric pressure of the external environment may be provided.
[0030]
In the example of FIG. 5, check valves 19a and 19b are provided for the two openings 12a and 12b provided in the packing material 11 as valves for opening and closing the openings 12a and 12b. The check valves 19a and 19b open the fluid flow only in one direction and prevent the fluid flow in the opposite direction when a predetermined pressure difference is generated. It is arranged outside 13c, 13d. Further, one check valve 19a is arranged so as to open only in a direction of flowing into the inside of the packing material 11 from the outside, and the other check valve 19b is arranged to open only in a direction of flowing out of the inside of the packing material 11 to the outside. It is arranged to be open to the public.
[0031]
In this configuration, when the air pressure inside the packing material 11 is lower than the outside by a predetermined pressure difference and lower, the check valve 19a is opened, and the inside of the packing material 11 is externally supplied through the filter 13c and the opening 12a. The gas flows into the packing material 11, thereby eliminating the pressure difference between the inside and outside of the packing material 11. On the other hand, when the air pressure inside the packing material 11 is higher than the outside, the check valve 19b is opened, and gas flows out from the inside of the packing material 11 to the outside through the filter 13d and the opening 12b. In addition, the pressure difference between the inside and outside of the packing material 11 is eliminated. In this configuration, when the predetermined pressure difference is not exceeded, the check valves 19a and 19b are not opened, so that the opportunity for the filters 13c and 13d to contact the air outside the packing material 11 is limited. As a result, the consumption of the filters 13c and 13d is suppressed.
[0032]
FIG. 6 schematically shows a second embodiment of the packaging structure of the exposure apparatus body according to the present invention.
In the present embodiment, unlike the above-described first embodiment, the packing materials 20 and 21 are multiplexed (doubled in this example) with respect to the exposure apparatus main body 10. That is, the exposure apparatus main body 10 is first airtightly covered with the packing material 20, and the outside thereof is airtightly covered with the packing material 21. As in the first embodiment, a film material (or a sheet material) having gas barrier properties is used for each of the packing materials 20 and 21. As the packing materials 20 and 21, the same type of material may be used, or different types of materials may be used. Further, openings 22 and 23 for ventilation are provided in each of the packing materials 20 and 21, and pipes 26 and 27 provided with filters 24 and 25 are connected to the openings 22 and 23, respectively. The filter 24 connected to the inner packing material 20 is disposed inside the outer packing material 21.
[0033]
With this configuration, in the present embodiment, since the packing materials 20 and 21 are arranged in a multiplex manner, intrusion of impurities into the inside of the packing material 20 where the exposure apparatus main body 10 is arranged is reliably prevented. That is, even if the film material has a gas barrier property, impurities (gaseous impurities) may slightly pass therethrough. However, since the packing materials 20 and 21 are multiplexed, the packing material 20 and the packing material Even if the impurities slightly enter the space between the packing material 21 and the space 21, the possibility that the impurities enter the inside of the packing material 20 further inside is extremely low. Note that the possibility is further reduced by adopting a triple or more packing structure.
[0034]
Further, in the present embodiment, similarly to the first embodiment, gas flows in and out through the openings 22 and 23 provided in the packing materials 20 and 21, and thereby the air pressure inside and outside the packing materials 20 and 21. The difference is eliminated. At this time, impurities contained in the gas passing through the opening 23 of the outer packing material 21 are removed by the filter 25, and impurities contained in the gas passing through the opening 22 of the inner packing material 20 are removed by the filter 24. That is, the impurities contained in the gas flowing into the inside of the packing material 20 are reliably removed by the filters 24 and 25 arranged in multiple stages.
[0035]
FIG. 7 schematically shows a third embodiment of the packaging structure of the exposure apparatus body according to the present invention.
In this embodiment, unlike each of the above-described embodiments, the ventilation opening 31 provided in the packing material 30 is provided in the gas storage portion 32 for storing a high-purity gas having a low concentration of impurities contained in the main gas. It is connected. Specifically, the exposure apparatus main body 10 is hermetically covered with a packing material 30, and a pipe 34 provided with a filter 33 is connected to the ventilation opening 31 of the packing material 30, and the other end of the pipe 34 is connected to It is connected to the gas reservoir 32. The gas storage section 32 has a form in which a flexible material such as a film material is formed in a bag shape. Further, inside the packing material 30 and the gas storage unit 32, N is used as the high-purity gas.₂ Such as an inert gas. This inert gas has transparency that allows exposure light to pass through. When filling the high-purity gas into the gas storage unit 32, the gas storage unit 32 is set in a state in which the gas storage unit 32 can be further expanded. For example, at the time of packing, after filling the gas reservoir 32 with the high-purity gas to the limit, a predetermined amount of the high-purity gas is discharged from the gas reservoir 32 to the outside, and the gas reservoir 32 is contracted to some extent.
[0036]
With this configuration, in the present embodiment, the pressure difference between the inside and outside of the packing material 30 is eliminated by changing the internal volume of the gas storage unit 32 according to the change in the atmospheric pressure of the external environment. That is, when the internal pressure of the packing material 30 is lower than that of the outside, the gas flows into the packing material 30 from the gas storage unit 32 through the opening 31, and the pressure difference between the inside and the outside of the packing material 30. Is eliminated. At this time, the gas reservoir 32 contracts with the outflow of gas. On the other hand, when the pressure inside the packing material 30 is higher than that outside, the gas flows out from the inside of the packing material 30 to the gas storage section 32 through the opening 31, and the pressure difference between the inside and outside of the packing material 30 is increased. Is eliminated. At this time, the gas reservoir 32 expands with the inflow of the gas. As a result, the gas passing through the opening 31 provided in the packing material 30 always becomes a high-purity gas, and the intrusion of impurities into the packing material 30 due to the pressure adjustment is prevented.
[0037]
Further, in the present embodiment, each time a gas passes through the opening 31, impurities contained in the gas are removed by the filter 33. Therefore, even if impurities (such as a permeable gas) may be released from the inside of the packing material 30 or the inside of the gas storage section 32, the impurities are appropriately removed by the filter 33. Therefore, the state where the concentration of impurities in the packing material 30 is low is stably maintained. If the internal release of impurities hardly occurs, a filter between the packing material and the gas storage section may be omitted.
[0038]
Note that the packing structure shown in each of the above embodiments can be similarly applied to some components (illumination optical system, single lens, small parts, etc.) and replacement parts of the exposure apparatus main body.
[0039]
Alternatively, a high-purity gas having a low impurity concentration may be appropriately supplied into the packing material.
[0040]
As the main gas of the high-purity gas, clean air or air may be used in addition to an inert gas such as nitrogen, hydrogen, helium, neon, argon, krypton, xenon, and radon. In the case of air, it is preferable to use chemically clean dry air (air from which a substance causing clouding of a lens, for example, ammonium ions floating in a clean room has been removed, or air having a humidity of 5% or less). .
[0041]
In addition, by using a material such as stainless steel (SUS) whose surface roughness is reduced by a process such as polishing for each casing, lens barrel, gas supply pipe, and the like, generation of degassing can be suppressed.
[0042]
In addition, wiring, cables, supply pipes, and the like that constitute the exposure apparatus are also made of stainless steel, ethylene tetrafluoride, tetrafluoroethylene-terfluoro (alkyl vinyl ether), or tetrafluoroethylene-hexafluoropropene as impurity gas generation suppressing materials. It is preferably formed of various fluoropolymers such as a polymer.
[0043]
In addition, the exposure apparatus is not limited to semiconductor manufacturing. For example, a projection exposure apparatus for liquid crystal that exposes a liquid crystal display element pattern to a square glass plate, a thin film magnetic head, a thin film magnetic head, an imaging device ( A projection exposure apparatus for manufacturing other microdevices (electronic devices) such as a CCD, a micromachine, and a DNA chip may be used, and the technology of the present invention can be applied to these exposure apparatuses. Further, the present invention can be applied to, for example, a proximity type exposure apparatus that does not use a projection optical system.
[0044]
Further, the projection optical system may be any of a total reflection system, a total refraction system, and a catadioptric system, and the magnification may be any of a reduction system, an equal magnification, and an enlargement system. The type of light source is also ArF excimer laser (193 nm), KrF excimer laser (248 nm), F₂A laser (157 nm), a YAG laser or a metal vapor laser may be used.
[0045]
When far ultraviolet rays such as an excimer laser are used as the projection optical system, a material that transmits far ultraviolet rays such as quartz, fluorite, quartz doped with fluorine, barium fluoride, and lithium fluoride may be used as a glass material.
[0046]
As described above, the preferred embodiments according to the present invention have been described with reference to the accompanying drawings, but it is needless to say that the present invention is not limited to such examples. It is clear that those skilled in the art can conceive various changes or modifications within the scope of the technical idea described in the claims. It is understood that it belongs to.
[0047]
【The invention's effect】
As described above, according to the present invention, the following effects can be obtained.
According to the packaging structure of the exposure apparatus body of the present invention, even when the external pressure of the packaging material changes, the pressure difference between the inside and outside of the packaging material is eliminated through the opening in which the filter is disposed, so that the packaging Intrusion of impurities into the material can be prevented.
Further, in the exposure apparatus of the present invention, since the adhesion of impurities to the optical member at the time of packing is prevented, a decrease in optical characteristics due to transportation and storage can be suppressed.
[Brief description of the drawings]
FIG. 1 is a view schematically showing a first embodiment of a packing structure of an exposure apparatus main body according to the present invention.
2A and 2B are diagrams illustrating a configuration of an exposure apparatus main body, where FIG. 2A schematically illustrates a state during actual operation, and FIG. 2B schematically illustrates a state during packing.
FIG. 3 is a diagram showing a modification of the arrangement of filters.
FIG. 4 is a diagram showing a modification of the arrangement of filters.
FIG. 5 is a diagram showing a modification of the arrangement of filters.
FIG. 6 is a view schematically showing a second embodiment of the packing structure of the exposure apparatus main body according to the present invention.
FIG. 7 is a view schematically showing a second embodiment of the packing structure of the exposure apparatus main body according to the present invention.
[Explanation of symbols]
10 Exposure apparatus main body, 11, 20, 21, 30 ... packing material, 12, 22, 23, 31 ... opening, 13, 24, 25, 33 ... filter, 18 ... valve, 19a, 19b ... check valve (valve) ), 32 ... gas storage unit.

Claims (9)

A packaging structure for the exposure apparatus body,
A packing material made of a material that prevents gas permeation, and covering at least a part of the exposure apparatus main body or a member constituting the exposure apparatus main body,
An opening provided in the packing material,
A package structure for an exposure apparatus main body, comprising: a filter for removing impurities contained in a gas passing through the opening. The packaging structure for an exposure apparatus main body according to claim 1, wherein the packaging material is made of a gas barrier film. The packing structure of the exposure apparatus main body according to claim 1 or 2, wherein the packing materials are arranged in a multiplex manner. 4. The packaging structure for an exposure apparatus main body according to claim 1, wherein said filter includes a chemical filter for removing gaseous impurities. The packaging structure for an exposure apparatus main body according to any one of claims 1 to 4, wherein the filter includes a plurality of filters arranged in multiple stages. 6. The packaging structure for an exposure apparatus main body according to claim 1, further comprising a valve that opens and closes the opening. 7. The packaging structure for an exposure apparatus main body according to claim 6, wherein the valve includes a check valve for opening a gas flow only in one direction. 2. The packaging structure for an exposure apparatus main body according to claim 1, further comprising a gas storage unit connected to the opening and storing a high-purity gas having a low concentration of impurities contained in a main gas. 3. An exposure apparatus packed by the packing structure according to any one of claims 1 to 8.

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