JP2004335479A5 - - Google Patents
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- JP2004335479A5 JP2004335479A5 JP2004145027A JP2004145027A JP2004335479A5 JP 2004335479 A5 JP2004335479 A5 JP 2004335479A5 JP 2004145027 A JP2004145027 A JP 2004145027A JP 2004145027 A JP2004145027 A JP 2004145027A JP 2004335479 A5 JP2004335479 A5 JP 2004335479A5
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- JP
- Japan
- Prior art keywords
- plasma gun
- column
- trigger electrodes
- high voltage
- signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Claims (16)
中央電極(12);
上記中央電極に対して実質上同軸の外側電極(14)であって、同軸のコラム(16)が上記中央電極と上記外側電極との間に形成され、上記コラムが閉じたベース端部と開いた出口端部とを有するような外側電極;
選択されたガスを上記コラム内へ導入するための入口機構(70、72、74);
上記コラムのベースでのプラズマ始動時に上記中央電極及び外側電極を横切って高電圧パルスを送給するように作動できるソリッドステート高反復率パルスドライバ(32、34、36)であって、プラズマが上記コラムの上記ベース端部から拡張し、該コラムの上記出口端部から出るようになったソリッドステート高反復率パルスドライバ;
上記コラム(16)の上記ベース端部の、複数のトリガ電極(82);及び
上記複数のトリガ電極(82)に接続されて、上記複数のトリガ電極(82)にRF信号を選択的に提供する無線周波数(RF)信号源(112、130)であって、上記トリガ電極が上記ソリッドステート高反復率パルスドライバ(32、34、36)により上記中央電極及び外側電極を横切って供給される各高電圧パルスに対して3または4振動サイクルを受けるようになっている、RF信号源;
を有することを特徴とするプラズマ銃。 In the high PRF plasma gun (10, 10 ', 90)
Central electrode (12);
An outer electrode (14) substantially coaxial with the central electrode, wherein a coaxial column (16) is formed between the central electrode and the outer electrode, the column being closed and open with a base end; An outer electrode having an outlet end;
An inlet mechanism (70, 72, 74) for introducing the selected gas into the column;
A solid state high repetition rate pulse driver (32, 34, 36) operable to deliver a high voltage pulse across the central and outer electrodes during plasma start-up at the base of the column, wherein the plasma is A solid state high repetition rate pulse driver that extends from the base end of the column and exits from the exit end of the column;
Of the base end of the column (16), a plurality of trigger electrodes (82); and is connected to the plurality of trigger electrodes (82), selectively providing an RF signal to the plurality of trigger electrodes (82) A radio frequency (RF) signal source ( 112, 130), wherein each of the trigger electrodes is fed across the central and outer electrodes by the solid state high repetition rate pulse driver (32, 34, 36) An RF signal source adapted to undergo 3 or 4 oscillation cycles for high voltage pulses;
A plasma gun characterized by comprising:
上記中央電極(12)及び上記外側電極(14)の上記少なくとも一方が上記選択された波長で放射線を発生させるのに適した流体材料で飽和され、
上記流体材料が液体リチウムである
ことを特徴とする請求項6記載のプラズマ銃。 The plasma gun is operable as a radiation source at a selected wavelength;
The at least one of the central electrode (12) and the outer electrode (14) is saturated with a fluid material suitable for generating radiation at the selected wavelength;
7. The plasma gun according to claim 6, wherein the fluid material is liquid lithium.
上記段のうちの最終段の飽和可能なリアクタ(168)が、上記第1の非線形磁気圧縮回路(166)からの上記高電圧スパイクが第2の非線形磁気圧縮回路(164)へ進入することを阻止するように通常バイアスがかけられており、
上記リアクタ(168)が上記持続信号を通すように再び飽和されるまで上記第2の非線形磁気圧縮回路(164)からの初期流れを禁止するように、上記高電圧スパイクが、当該リアクタ(168)を部分的に脱飽和させる
ことを特徴とする請求項11記載のプラズマ銃。 The second nonlinear magnetic compression circuit (164) has at least two stages;
The last of the stages, the saturable reactor (168), causes the high voltage spike from the first nonlinear magnetic compression circuit (166) to enter the second nonlinear magnetic compression circuit (164). Normally biased to prevent,
The high voltage spike is applied to the reactor (168) to inhibit initial flow from the second nonlinear magnetic compression circuit (164) until the reactor (168) is saturated again to pass the sustained signal. The plasma gun according to claim 11, wherein the plasma gun is partially desaturated.
上記臨界周波数は、これよりも低い周波数では、上記選択されたガス内の電子が、上記RF信号の各半サイクルにおいて、上記複数のトリガ電極の対向する導電体間の全ギャップを横切って払拭されるような時間を有する周波数である、請求項1記載のプラズマ銃。 The RF signal source (112, 130) generates the RF signal at a frequency above a critical frequency;
The critical frequency is the frequency lower than this, electrons in the gas that is the selected, at each half cycle of the RF signal is wiped across the entire gap between the conductors of opposing the plurality of trigger electrodes The plasma gun according to claim 1, wherein the frequency is a frequency having such a time.
エネルギが移送されたときに上記RF信号源(130)により発生する上記RF信号の周波数に対応する共振周波数で発振する共振回路(138)と;
エネルギ源(32、132)から上記共振回路(138)へ多くのエネルギが移送され、これにより上記共振回路(138)が上記共振周波数で発振するように、上記エネルギ源(32、132)へ上記共振回路(138)を選択的に接続するスイッチ(134)と;
上記共振回路(138)から上記複数のトリガ電極(82)へ振動信号を供給するように上記共振回路(138)と上記複数のトリガ電極(82)との間に接続される出力結合回路(140)であって、上記共振回路(138)の各振動サイクルに対して、上記共振回路(138)から移送されるエネルギのほんの少量を上記複数のトリガ電極(82)に結合する出力結合回路(140)と;
を備えることを特徴とする請求項1記載のプラズマ銃。 The RF signal source (130) is
A resonant circuit (138) oscillating at a resonant frequency corresponding to the frequency of the RF signal generated by the RF signal source (130) when energy is transferred;
A large amount of energy is transferred from the energy source (32, 132) to the resonant circuit (138), thereby causing the resonant circuit (138) to oscillate at the resonant frequency to the energy source (32, 132). A switch (134) for selectively connecting a resonant circuit (138);
Output coupling circuit connected between the resonant circuit (138) and the plurality of trigger electrodes (82) to supply the oscillating signal from the resonant circuit (138) to said plurality of trigger electrodes (82) (140 An output coupling circuit (140) that couples only a small amount of energy transferred from the resonant circuit (138) to the plurality of trigger electrodes (82) for each oscillation cycle of the resonant circuit (138). )When;
The plasma gun according to claim 1, further comprising:
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/283,135 US6300720B1 (en) | 1997-04-28 | 1999-03-31 | Plasma gun and methods for the use thereof |
US09/352,571 US6172324B1 (en) | 1997-04-28 | 1999-07-13 | Plasma focus radiation source |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000608400A Division JP3564396B2 (en) | 1999-03-31 | 2000-03-08 | Plasma gun and method of using the same |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2004335479A JP2004335479A (en) | 2004-11-25 |
JP2004335479A5 true JP2004335479A5 (en) | 2007-08-02 |
JP4223989B2 JP4223989B2 (en) | 2009-02-12 |
Family
ID=26961888
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000608400A Expired - Fee Related JP3564396B2 (en) | 1999-03-31 | 2000-03-08 | Plasma gun and method of using the same |
JP2004145027A Expired - Fee Related JP4223989B2 (en) | 1999-03-31 | 2004-05-14 | Plasma gun |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000608400A Expired - Fee Related JP3564396B2 (en) | 1999-03-31 | 2000-03-08 | Plasma gun and method of using the same |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1173874A4 (en) |
JP (2) | JP3564396B2 (en) |
KR (1) | KR100637816B1 (en) |
CA (1) | CA2362890C (en) |
HK (1) | HK1041556A1 (en) |
WO (1) | WO2000058989A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8537958B2 (en) | 2009-02-04 | 2013-09-17 | General Fusion, Inc. | Systems and methods for compressing plasma |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004058500A1 (en) * | 2004-12-04 | 2006-06-08 | Philips Intellectual Property & Standards Gmbh | Method and device for operating an electrical discharge device |
FR2914369B1 (en) * | 2007-03-30 | 2014-02-07 | Snecma | ELECTROLYTIC IGNITER FOR ENGINE-ROCKET IN MONERGOL |
FR2914368B1 (en) * | 2007-03-30 | 2009-10-16 | Snecma Sa | ELECTROLYTIC IGNITER FOR FLUID ERGOL ENGINE-FUSE |
RU2535919C2 (en) | 2009-07-29 | 2014-12-20 | Дженерал Фьюжн, Инк. | Systems, methods and device of plasma compression |
WO2011096899A1 (en) * | 2010-02-08 | 2011-08-11 | Giulio Manzoni | A micro-nozzle thruster |
JP5622026B2 (en) * | 2010-04-06 | 2014-11-12 | 株式会社Ihi | Plasma light source and plasma light generation method |
DE102011103464B4 (en) * | 2011-06-03 | 2013-06-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Plasma ion source for a vacuum coating system |
PL3223284T3 (en) * | 2011-11-14 | 2019-11-29 | Univ California | Methods for forming and maintaining a high performance frc |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2201051A (en) * | 1987-02-12 | 1988-08-17 | Electricity Council | Ignition device for a plasma or welding torch |
RU2010467C1 (en) * | 1991-11-26 | 1994-03-30 | Иван Георгиевич Катаев | Magnetic pulse shaper |
US5866871A (en) * | 1997-04-28 | 1999-02-02 | Birx; Daniel | Plasma gun and methods for the use thereof |
-
2000
- 2000-03-08 WO PCT/US2000/006009 patent/WO2000058989A1/en active IP Right Grant
- 2000-03-08 CA CA002362890A patent/CA2362890C/en not_active Expired - Fee Related
- 2000-03-08 KR KR1020017012523A patent/KR100637816B1/en not_active IP Right Cessation
- 2000-03-08 JP JP2000608400A patent/JP3564396B2/en not_active Expired - Fee Related
- 2000-03-08 EP EP00921371A patent/EP1173874A4/en not_active Withdrawn
-
2002
- 2002-04-30 HK HK02103241.9A patent/HK1041556A1/en unknown
-
2004
- 2004-05-14 JP JP2004145027A patent/JP4223989B2/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8537958B2 (en) | 2009-02-04 | 2013-09-17 | General Fusion, Inc. | Systems and methods for compressing plasma |
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