JP2004335479A5 - - Google Patents

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JP2004335479A5
JP2004335479A5 JP2004145027A JP2004145027A JP2004335479A5 JP 2004335479 A5 JP2004335479 A5 JP 2004335479A5 JP 2004145027 A JP2004145027 A JP 2004145027A JP 2004145027 A JP2004145027 A JP 2004145027A JP 2004335479 A5 JP2004335479 A5 JP 2004335479A5
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Japan
Prior art keywords
plasma gun
column
trigger electrodes
high voltage
signal
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JP2004145027A
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JP2004335479A (en
JP4223989B2 (en
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Priority claimed from US09/283,135 external-priority patent/US6300720B1/en
Priority claimed from US09/352,571 external-priority patent/US6172324B1/en
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Publication of JP2004335479A5 publication Critical patent/JP2004335479A5/ja
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Publication of JP4223989B2 publication Critical patent/JP4223989B2/en
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Claims (16)

高PRFプラズマ銃(10、10′、90)において、
中央電極(12);
上記中央電極に対して実質上同軸の外側電極(14)であって、同軸のコラム(16)が上記中央電極と上記外側電極との間に形成され、上記コラムが閉じたベース端部と開いた出口端部とを有するような外側電極;
選択されたガスを上記コラム内へ導入するための入口機構(70、72、74);
上記コラムのベースでのプラズマ始動時に上記中央電極及び外側電極を横切って高電圧パルスを送給するように作動できるソリッドステート高反復率パルスドライバ(32、34、36)であって、プラズマが上記コラムの上記ベース端部から拡張し、該コラムの上記出口端部から出るようになったソリッドステート高反復率パルスドライバ;
上記コラム(16)の上記ベース端部の、複数のトリガ電極(82);及び
上記複数のトリガ電極(82)に接続されて、上記複数のトリガ電極(82)にRF信号を選択的に提供する無線周波数(RF)信号源(112、130)であって、上記トリガ電極が上記ソリッドステート高反復率パルスドライバ(32、34、36)により上記中央電極及び外側電極を横切って供給される各高電圧パルスに対して3または4振動サイクルを受けるようになっている、RF信号源;
を有することを特徴とするプラズマ銃。
In the high PRF plasma gun (10, 10 ', 90)
Central electrode (12);
An outer electrode (14) substantially coaxial with the central electrode, wherein a coaxial column (16) is formed between the central electrode and the outer electrode, the column being closed and open with a base end; An outer electrode having an outlet end;
An inlet mechanism (70, 72, 74) for introducing the selected gas into the column;
A solid state high repetition rate pulse driver (32, 34, 36) operable to deliver a high voltage pulse across the central and outer electrodes during plasma start-up at the base of the column, wherein the plasma is A solid state high repetition rate pulse driver that extends from the base end of the column and exits from the exit end of the column;
Of the base end of the column (16), a plurality of trigger electrodes (82); and is connected to the plurality of trigger electrodes (82), selectively providing an RF signal to the plurality of trigger electrodes (82) A radio frequency (RF) signal source ( 112, 130), wherein each of the trigger electrodes is fed across the central and outer electrodes by the solid state high repetition rate pulse driver (32, 34, 36) An RF signal source adapted to undergo 3 or 4 oscillation cycles for high voltage pulses;
A plasma gun characterized by comprising:
上記RF信号源(112、130)が10MHzないし1000MHzの範囲の周波数でRF信号を発生することを特徴とする、上記請求項1記載のプラズマ銃。 The plasma gun of any preceding claim, wherein the RF signal source (112, 130) generates an RF signal at a frequency in the range of 10 MHz to 1000 MHz. 上記複数のトリガ電極(82)が、絶縁体(24)に取り付けられ、かつ、上記コラム(16)のまわりで実質上均一に離間した複数のトリガ電極からなり、上記複数のトリガ電極が、上記コラムの上記ベース端部における上記絶縁体の表面で、高電圧場を生じさせることを特徴とする、請求項1記載のプラズマ銃。 The plurality of trigger electrodes (82) comprises a plurality of trigger electrodes attached to the insulator (24) and substantially uniformly spaced around the column (16), wherein the plurality of trigger electrodes are 2. A plasma gun as claimed in claim 1, characterized in that a high voltage field is produced at the surface of the insulator at the base end of the column. 上記絶縁体(24)が上記中央電極のベース端部において上記中央電極を取り囲み、上記複数のトリガ電極(82)が上記コラムの上記ベース端部の近傍で上記絶縁体に取り付けられることを特徴とする請求項3記載のプラズマ銃。 The insulator (24) surrounds the center electrode at the base end of the center electrode, and the plurality of trigger electrodes (82) are attached to the insulator in the vicinity of the base end of the column. The plasma gun according to claim 3. 上記絶縁体(24)が上記コラム(16)のベースを形成し、上記複数のトリガ電極(82)が上記コラムとは反対側の上記絶縁体(24)の側から絶縁体に取付けられ、上記絶縁体により上記コラムから小距離だけ離間され、上記複数のトリガ電極(82)の付勢が上記コラム内で上記絶縁体の側部において高電圧場を生じさせることを特徴とする請求項3記載のプラズマ銃。 The insulator (24) forms the base of the column (16), and the plurality of trigger electrodes (82) are attached to the insulator from the side of the insulator (24) opposite to the column, 4. The insulator is spaced a short distance from the column and the biasing of the plurality of trigger electrodes (82) creates a high voltage field in the side of the insulator within the column. Plasma gun. 上記中央電極(12)及び上記外側電極(14)の少なくとも一方が、焼結粉末耐火金属で形成されることを特徴とする請求項1記載のプラズマ銃。 The plasma gun according to claim 1, wherein at least one of the central electrode (12) and the outer electrode (14) is formed of a sintered powder refractory metal. 上記プラズマ銃が選択された波長での放射線源として作動可能であり、
上記中央電極(12)及び上記外側電極(14)の上記少なくとも一方が上記選択された波長で放射線を発生させるのに適した流体材料で飽和され、
上記流体材料が液体リチウムである
ことを特徴とする請求項6記載のプラズマ銃。
The plasma gun is operable as a radiation source at a selected wavelength;
The at least one of the central electrode (12) and the outer electrode (14) is saturated with a fluid material suitable for generating radiation at the selected wavelength;
7. The plasma gun according to claim 6, wherein the fluid material is liquid lithium.
作動中に液体リチウムを上記中央電極(12)及び上記外側電極(14)の少なくとも一方へ供給することができるように追加の液体リチウムが設けられることを特徴とする請求項7記載のプラズマ銃。 8. The plasma gun according to claim 7, wherein additional liquid lithium is provided so that liquid lithium can be supplied to at least one of the central electrode (12) and the outer electrode (14) during operation. 上記中央電極及び上記外側電極の双方が上記焼結粉末耐火金属で形成されることを特徴とする請求項6記載のプラズマ銃。 7. The plasma gun according to claim 6, wherein both the central electrode and the outer electrode are formed of the sintered powder refractory metal. 上記ソリッドステート高反復率パルスドライバ(32、34、36)が、高電圧スパイク(160)を提供し、上記高電圧スパイク(160)より低い電圧で且つ上記高電圧スパイクより長い期間の持続信号(162)が上記高電圧スパイク(160)に続き、ドライバエネルギの大半が上記持続信号により提供されることを特徴とする請求項1記載のプラズマ銃。 The solid state high repetition rate pulse driver (32, 34, 36) provides a high voltage spike (160), a duration signal (lower than the high voltage spike (160) and longer than the high voltage spike). The plasma gun of claim 1, wherein 162) follows the high voltage spike (160) and a majority of driver energy is provided by the sustain signal. 上記ソリッドステート高反復率パルスドライバが、上記高電圧スパイク(160)を発生するための第1の非線形磁気圧縮回路(166)と、上記持続信号(162)を発生するための第2の非線形磁気圧縮回路(164)とを有することを特徴とする請求項10記載のプラズマ銃。 The solid state high repetition rate pulse driver has a first nonlinear magnetic compression circuit (166) for generating the high voltage spike (160) and a second nonlinear magnetic for generating the sustain signal (162). 11. A plasma gun according to claim 10, comprising a compression circuit (164). 上記第2の非線形磁気圧縮回路(164)が少なくとも2つの段を有し、
上記段のうちの最終段の飽和可能なリアクタ(168)が、上記第1の非線形磁気圧縮回路(166)からの上記高電圧スパイクが第2の非線形磁気圧縮回路(164)へ進入することを阻止するように通常バイアスがかけられており、
上記リアクタ(168)が上記持続信号を通すように再び飽和されるまで上記第2の非線形磁気圧縮回路(164)からの初期流れを禁止するように、上記高電圧スパイクが、当該リアクタ(168)を部分的に脱飽和させる
ことを特徴とする請求項11記載のプラズマ銃。
The second nonlinear magnetic compression circuit (164) has at least two stages;
The last of the stages, the saturable reactor (168), causes the high voltage spike from the first nonlinear magnetic compression circuit (166) to enter the second nonlinear magnetic compression circuit (164). Normally biased to prevent,
The high voltage spike is applied to the reactor (168) to inhibit initial flow from the second nonlinear magnetic compression circuit (164) until the reactor (168) is saturated again to pass the sustained signal. The plasma gun according to claim 11, wherein the plasma gun is partially desaturated.
上記RF信号源(112、130)と上記複数のトリガ電極(82)との間に接続される直流遮断コンデンサ(114)を更に含むことを特徴とする請求項1記載のプラズマ銃。 The plasma gun according to claim 1, further comprising a DC blocking capacitor (114) connected between the RF signal source (112, 130) and the plurality of trigger electrodes (82). 上記RF信号源(112、130)が、臨界周波数以上の周波数で上記RF信号を発生し、
上記臨界周波数は、これよりも低い周波数では、上記選択されたガス内の電子が、上記RF信号の各半サイクルにおいて、上記複数のトリガ電極の対向する導電体間の全ギャップを横切って払拭されるような時間を有する周波数である、請求項1記載のプラズマ銃。
The RF signal source (112, 130) generates the RF signal at a frequency above a critical frequency;
The critical frequency is the frequency lower than this, electrons in the gas that is the selected, at each half cycle of the RF signal is wiped across the entire gap between the conductors of opposing the plurality of trigger electrodes The plasma gun according to claim 1, wherein the frequency is a frequency having such a time.
上記ソリッドステート高反復率パルスドライバ(32、34、36)が、上記中央電極及び上記外側電極を横切って高電圧パルスを発生することを特徴とする請求項2記載のプラズマ銃。 The solid state high repetition rate pulse driver (32, 34, 36) is a plasma gun according to claim 2, characterized in that for generating a high voltage pulse across the upper Symbol central electrode and the outer electrode. 上記RF信号源(130)が、
エネルギが移送されたときに上記RF信号源(130)により発生する上記RF信号の周波数に対応する共振周波数で発振する共振回路(138)と;
エネルギ源(32、132)から上記共振回路(138)へ多くのエネルギが移送され、これにより上記共振回路(138)が上記共振周波数で発振するように、上記エネルギ源(32、132)へ上記共振回路(138)を選択的に接続するスイッチ(134)と;
上記共振回路(138)から上記複数のトリガ電極(82)へ振動信号を供給するように上記共振回路(138)と上記複数のトリガ電極(82)との間に接続される出力結合回路(140)であって、上記共振回路(138)の各振動サイクルに対して、上記共振回路(138)から移送されるエネルギのほんの少量を上記複数のトリガ電極(82)に結合する出力結合回路(140)と;
を備えることを特徴とする請求項1記載のプラズマ銃。
The RF signal source (130) is
A resonant circuit (138) oscillating at a resonant frequency corresponding to the frequency of the RF signal generated by the RF signal source (130) when energy is transferred;
A large amount of energy is transferred from the energy source (32, 132) to the resonant circuit (138), thereby causing the resonant circuit (138) to oscillate at the resonant frequency to the energy source (32, 132). A switch (134) for selectively connecting a resonant circuit (138);
Output coupling circuit connected between the resonant circuit (138) and the plurality of trigger electrodes (82) to supply the oscillating signal from the resonant circuit (138) to said plurality of trigger electrodes (82) (140 An output coupling circuit (140) that couples only a small amount of energy transferred from the resonant circuit (138) to the plurality of trigger electrodes (82) for each oscillation cycle of the resonant circuit (138). )When;
The plasma gun according to claim 1, further comprising:
JP2004145027A 1999-03-31 2004-05-14 Plasma gun Expired - Fee Related JP4223989B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/283,135 US6300720B1 (en) 1997-04-28 1999-03-31 Plasma gun and methods for the use thereof
US09/352,571 US6172324B1 (en) 1997-04-28 1999-07-13 Plasma focus radiation source

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JP2004335479A JP2004335479A (en) 2004-11-25
JP2004335479A5 true JP2004335479A5 (en) 2007-08-02
JP4223989B2 JP4223989B2 (en) 2009-02-12

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EP (1) EP1173874A4 (en)
JP (2) JP3564396B2 (en)
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CA (1) CA2362890C (en)
HK (1) HK1041556A1 (en)
WO (1) WO2000058989A1 (en)

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US8537958B2 (en) 2009-02-04 2013-09-17 General Fusion, Inc. Systems and methods for compressing plasma

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FR2914368B1 (en) * 2007-03-30 2009-10-16 Snecma Sa ELECTROLYTIC IGNITER FOR FLUID ERGOL ENGINE-FUSE
RU2535919C2 (en) 2009-07-29 2014-12-20 Дженерал Фьюжн, Инк. Systems, methods and device of plasma compression
WO2011096899A1 (en) * 2010-02-08 2011-08-11 Giulio Manzoni A micro-nozzle thruster
JP5622026B2 (en) * 2010-04-06 2014-11-12 株式会社Ihi Plasma light source and plasma light generation method
DE102011103464B4 (en) * 2011-06-03 2013-06-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Plasma ion source for a vacuum coating system
PL3223284T3 (en) * 2011-11-14 2019-11-29 Univ California Methods for forming and maintaining a high performance frc

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GB2201051A (en) * 1987-02-12 1988-08-17 Electricity Council Ignition device for a plasma or welding torch
RU2010467C1 (en) * 1991-11-26 1994-03-30 Иван Георгиевич Катаев Magnetic pulse shaper
US5866871A (en) * 1997-04-28 1999-02-02 Birx; Daniel Plasma gun and methods for the use thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8537958B2 (en) 2009-02-04 2013-09-17 General Fusion, Inc. Systems and methods for compressing plasma

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