JP2004327786A5 - - Google Patents
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- Publication number
- JP2004327786A5 JP2004327786A5 JP2003121451A JP2003121451A JP2004327786A5 JP 2004327786 A5 JP2004327786 A5 JP 2004327786A5 JP 2003121451 A JP2003121451 A JP 2003121451A JP 2003121451 A JP2003121451 A JP 2003121451A JP 2004327786 A5 JP2004327786 A5 JP 2004327786A5
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- JP
- Japan
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003121451A JP4296024B2 (en) | 2003-04-25 | 2003-04-25 | Exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003121451A JP4296024B2 (en) | 2003-04-25 | 2003-04-25 | Exposure method |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2004327786A JP2004327786A (en) | 2004-11-18 |
JP2004327786A5 true JP2004327786A5 (en) | 2005-12-22 |
JP4296024B2 JP4296024B2 (en) | 2009-07-15 |
Family
ID=33500021
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003121451A Expired - Fee Related JP4296024B2 (en) | 2003-04-25 | 2003-04-25 | Exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4296024B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100835495B1 (en) | 2006-05-12 | 2008-06-04 | 주식회사 하이닉스반도체 | Exposure equipment of semiconductor device and method for exposure of semiconductor device |
CN112286005B (en) * | 2020-09-23 | 2022-11-22 | 山东师范大学 | Method for improving resolution of chip photoetching process |
CN113985703B (en) * | 2021-09-28 | 2023-11-03 | 深圳市麓邦技术有限公司 | Optical system |
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2003
- 2003-04-25 JP JP2003121451A patent/JP4296024B2/en not_active Expired - Fee Related