JP2004311890A - Guide mechanism of moving body - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a guide mechanism of a moving body in which the moving body can be moved surely while utilizing the installation footprint effectively. <P>SOLUTION: The guide mechanism for guiding the movement of a moving body 100 through wheels 116 and 118 between a first position P1 and a second position P2 comprises first and second rails 112 and 114 laid in parallel between the first position P1 and the second position P2 wherein the first and second rails 112 and 114 are laid rotatably about proximal end parts 112a and 114a in the installation footprint. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a moving body guide mechanism for guiding movement of a moving body between two positions.
[0002]
[Prior art]
An exposure system using an electron beam includes a vacuum chamber. The vacuum chamber has a container body and an upper lid that covers an upper opening of the container body. An irradiation unit for irradiating an electron beam is provided on the upper lid, and a wafer stage for positioning and holding a wafer and a mask stage for positioning and holding a mask are provided in the container body. The vacuum chamber has a rectangular shape in a plan view, and a mask loader for supplying a mask is provided on one of the four side walls, and a wafer loader is provided on the other side wall. A wafer loader for supplying is provided. An opening / closing door is provided on the other side wall portion, and the wafer stage in the chamber can be pulled out through the opening / closing door for maintenance.
[0003]
In such an exposure system, a control panel for controlling the processing of the wafer in the vacuum chamber faces the remaining one of the four side walls, and furthermore, the control panel is connected to the vacuum chamber for maintenance. They are arranged with a predetermined space between them and the control panel (for example, see Non-Patent Document 1).
[0004]
[Non-patent document 1]
Hiroshi Nosue, et al., “Development of Next Generation Electron Beam Exposure Apparatus”, 2002, Applied Physics, Vol. 71, No. 4, p. 421-424
[0005]
[Problems to be solved by the invention]
However, the conventional exposure system described above has a problem that a footprint (installation area) including a maintenance space is always required even during a normal operation, and the cost of ownership (COO: Cost of ownership) increases.
[0006]
In order to reduce the footprint during normal operation, the inventor places a control panel close to the side wall of the vacuum chamber from which the wafer stage is pulled out during maintenance, and moves the control panel in the direction in which the wafer stage is pulled out. I thought about making it possible. In this configuration, a guide mechanism for reliably moving the control panel between the position during normal operation and the position during maintenance is required, and this guide mechanism needs to be configured so as not to be in the way during normal operation. .
[0007]
The present invention has been made in order to solve the above-described problem, and has an object to provide a guide mechanism of a moving body that enables secure movement of the moving body and effective use of an installation surface. I do.
[0008]
[Means for Solving the Problems]
The guide mechanism for a moving body according to the present invention is a guide mechanism for guiding the movement of the moving body via wheels between a first position and a second position. The guide mechanism includes first and second rails laid parallel to each other between a first position and a second position, and the first and second rails are installed around a base end. It is characterized by being provided rotatably in the plane.
[0009]
According to this guide mechanism, the moving body is reliably moved between the first position and the second position by being guided by the first and second rails laid in parallel with each other. Further, since the first and second rails are provided so as to be rotatable around the base end in the installation plane, the first and second rails can be rotated inside each other and overlapped when not in use. Thus, the installation surface can be effectively used.
[0010]
The guide mechanism of the moving body according to the present invention includes a connecting rib that is bridged between the end portions of the first and second rails, and the connecting rib is rotatable about the starting end in the installation plane. , May be characterized by being fixed to the terminal end of the first rail. With this configuration, the distance between the first rail and the second rail is maintained as desired, and the movement of the moving body is further ensured. In addition, when not in use, the connecting rib can be folded along the first rail by rotating the connecting rib about the starting end in the installation plane.
[0011]
In the guide mechanism of the moving body according to the present invention, the connecting rib has the first rib portion and the second rib portion, and the first rib portion is rotatable about the base end within the installation plane. And the second rib portion may be rotatably fixed to the first rib portion so as to be rotatable in the installation plane around the leading end portion. With this configuration, even when the distance between the first rail and the second rail is wide and the length of the connecting rib is long, the second rib portion is formed along the first rib portion. By folding, it is possible to make the entire connecting rib follow the first rail.
[0012]
The guide mechanism for a moving body according to the present invention includes a third rail continuously laid at the start of the first rail and a fourth rail continuously laid at the start of the second rail. And a leading end of the first rail is fixed to an end of the third rail, and a starting end of the second rail is fixed to an end of the fourth rail. May be characterized. With this configuration, when the moving body is located at the first position, the moving body can be mounted on the third and fourth rails, and the moving body moves to the first and second rails. Is performed smoothly, and the moving body is smoothly and reliably moved between the first position and the second position.
[0013]
The guide mechanism of the moving body according to the present invention is provided at each of a connecting portion between the first rail and the third rail and a connecting portion between the second rail and the fourth rail. It may be provided with a regulation means which regulates rotation more than a predetermined angle in the installation surface of the second rail. In this way, it is possible to position the first rail with respect to the third rail and to position the second rail with respect to the fourth rail during use and non-use.
[0014]
The moving body guide mechanism according to the present invention is provided at the end of each of the first and second rails, and has a protrusion for preventing the moving body from falling off from the first and second rails. It may be characterized. This prevents the moving body from falling off the first and second rails.
[0015]
In the moving body guide mechanism according to the present invention, the wheels guided by the first rail may be a sheave, and the first rail and the wheels may be engaged. With this configuration, it is possible to prevent the moving body from falling off the rail and to move the moving body more smoothly.
[0016]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. In the description of the drawings, the same elements will be denoted by the same reference symbols, without redundant description.
[0017]
FIG. 1 is a perspective view showing a configuration of an electron beam exposure system (hereinafter, also simply referred to as “exposure system”) to which a guide mechanism for a moving body according to the present embodiment is applied. FIG. 2 is a plan view showing the configuration of the exposure system. As shown in FIGS. 1 and 2, the exposure system 1 includes an electron beam exposure apparatus (hereinafter, also simply referred to as “exposure apparatus”) 10 and a control panel (moving body) 100.
[0018]
The exposure apparatus 10 has a vacuum chamber 12 as shown in FIG. The vacuum chamber 12 has a container body 16 having an open upper end, and an upper lid 18 for closing an upper opening of the container body 16.
[0019]
The upper lid 18 has a rectangular cross section in plan view, and is provided with an electron beam irradiator 20 for irradiating the center with an electron beam. As shown in FIG. 4, the electron beam irradiation unit 20 includes an electron barrel 22 including an upper wall and a side wall, an electron gun 24 provided on the upper wall in the electron barrel 22, and an electron gun 24. And a polarizer 28 for collimating the electron beam emitted from. The electron gun 24, the lens 26, and the polarizer 28 are arranged vertically in this order, and the electron beam emitted from the electron gun 24 is collimated by the lens 26 and scanned by the polarizer 28. Irradiation is performed on the semiconductor wafer W.
[0020]
As shown in FIGS. 3 and 4, the container body 16 has a bottom wall portion 16a having a rectangular cross section and two sets of side wall portions 16b erected on the edge of the bottom wall portion 16a. A wafer stage 30 for holding a semiconductor wafer W for performing an exposure process is accommodated in the container body 16. The wafer stage 30 has a positioning stage 32 for positioning the semiconductor wafer W, and an electrostatic chuck 34 mounted on the positioning stage 32 for sucking and holding the semiconductor wafer W. The positioning stage 32 is provided with a coarse movement stage for performing rough positioning in two axial directions (XY directions) orthogonal to each other in a horizontal plane, and a vertical direction (Z direction) orthogonal to the XY directions and the XY directions. , A fine movement stage for finely adjusting the rotation direction (θ direction) in the horizontal plane and the tilt. The electrostatic chuck 34 is mounted on this fine movement stage. Therefore, the semiconductor wafer W is positioned by the positioning stage 32 while being held by the electrostatic chuck 34.
[0021]
As shown in FIG. 4, a mask stage 36 for positioning and holding a mask M on which a desired pattern is formed is housed in the container body 16. The mask stage 36 performs positioning in the rotation direction (θ direction), the vertical direction (Z direction), and the inclination in the horizontal plane. This mask stage 36 is mounted on a reference base 35 fixed in the vacuum chamber 12.
[0022]
A light detector 37 such as a white light microscope that irradiates light onto the mask M and the semiconductor wafer W and detects light scattered by an alignment mark (not shown) is provided inside the container body 16. This photodetector 37 is mounted on a reference base 35. The data detected by the photodetector 37 is sent to an image processing device (not shown) for processing, and the positional relationship between the mask M and the semiconductor wafer W is determined from the degree of overlap of the alignment marks. When there is a misalignment between the mask M and the semiconductor wafer W, a signal for correcting the position of the mask M and / or the semiconductor wafer W is generated, and based on this signal, the position of the mask M and / or the semiconductor wafer W is changed. Slightly modified.
[0023]
The semiconductor wafer W and the mask M are precisely positioned by the wafer stage 30 and the mask stage 36 described above. In the present embodiment, the mask M is arranged close to the semiconductor wafer W (the gap between the mask M and the semiconductor wafer W is about 50 μm).
[0024]
The internal space of the vacuum chamber 12 is depressurized by a vacuum pump (not shown). By scanning the entire surface of the mask M with the electron beam emitted from the electron beam irradiation unit 20 under this reduced pressure environment, the desired pattern is transferred to the resist on the semiconductor wafer W at the same magnification.
[0025]
As shown in FIGS. 3 and 4, the vacuum chamber 12 is mounted on an anti-vibration table 38 provided below the bottom wall 16a. As shown in FIG. 5, an openable door 40 is provided on the right side wall of the vacuum chamber 12. Accordingly, the maintenance of the wafer stage 30 can be performed by opening the opening / closing door 40 and sliding the wafer stage 30 in the horizontal direction (the direction of the arrow) and pulling it out.
[0026]
An elevating device 14 for raising and lowering the upper lid 18 of the vacuum chamber 12 is provided integrally with the vacuum chamber 12 above the vacuum chamber 12.
[0027]
As shown in FIGS. 1 and 2, a wafer loader 102 for supplying a semiconductor wafer W into the vacuum chamber 12 is provided on a left side wall of the vacuum chamber 12. A mask loader 104 that supplies a mask M having a desired pattern formed in the vacuum chamber 12 is provided on the rear wall 104 of the vacuum chamber 12. A mask stocker 106 for stocking the mask M is provided on the right side wall of the mask loader 104.
[0028]
As shown in FIGS. 1 and 2, the control panel 100 is disposed along the right side wall of the vacuum chamber 12 where the opening / closing door 40 is provided without providing a space for maintenance. The control panel 100 performs various controls for performing necessary control when performing exposure processing on the semiconductor wafer W in the vacuum chamber 12 such as positioning of the semiconductor wafer W and the mask M and image processing for performing exposure correction. The control devices are included in a housing having a rectangular parallelepiped outer shape. The lower portion of the housing is hollow and has a space 108 formed therein, and can accommodate an extra length of a cable 110 connecting the vacuum chamber 12 and the control panel 100.
[0029]
The control panel 100 is provided so as to be movable along the direction in which the wafer stage 30 is pulled out (the direction of the arrow in FIG. 5). That is, as shown in FIG. 6, the control panel 100 includes a normal operation position (first position) P <b> 1 along the right side wall of the vacuum chamber 12 and a predetermined distance from the vacuum chamber 12 along the drawing direction of the wafer stage 30. The guide mechanism according to the present embodiment is movably provided between the maintenance position (second position) P2 and the maintenance position (second position) P2.
[0030]
The guide mechanism has first and second rails 112 and 114 laid parallel to each other between the normal operation position P1 and the maintenance position P2. The control panel 100 is guided on the first and second rails 112 and 114 via wheels 116 and 118 provided at the lower part of the housing.
[0031]
As shown in FIG. 7, the cross-sectional shapes of the first and second rails 112 and 114 perpendicular to the longitudinal direction are different from each other. The upper surface 113 of the first rail 112 has a pair of inverted V-shaped inclined surfaces inclined with respect to the vertical direction, while the upper surface 115 of the second rail 114 is flat. Correspondingly, the wheel 116 on the first rail 112 side of the wheels 116 and 118 is a V-shaped grooved wheel in which the diameter of the central portion of the rolling surface is smaller than the outer diameter, The wheels 118 on the second rail 114 side are flat wheels. As described above, since the wheel 116 having a V-shaped rolling surface is engaged with and guided by the first rail 112 having the inverted V-shaped upper surface 113, control is performed without falling off the rails 112 and 114. The board 100 is reliably guided. Also, unlike the first rail 112 side, the wheel 118 having a flat rolling surface is configured to be guided on the second rail 114 having the flat upper surface 115, so that the second rail 114 The positional relationship in the horizontal direction with the wheels 118 is not rigidly restricted, and there is a certain degree of freedom, so that the control panel 100 moves smoothly.
[0032]
Further, the guide mechanism includes a third rail 122 continuously laid on the leading end 112a of the first rail 112 and a fourth rail continuously laid on the leading end 114a of the second rail 114. 124. The third and fourth rails 122 and 124 are provided so as to extend along the direction in which the wafer stage 30 is pulled out. The starting end 112a of the first rail 112 is fixed to the terminal end 122b of the third rail 122, and the starting end 114a of the second rail 114 is connected to the terminal end of the fourth rail 124. The shaft is fixed to 124b. The cross-sectional shapes of the third and fourth rails 122 and 124 perpendicular to the longitudinal direction are the same as the cross-sectional shapes of the first and second rails 112 and 114, respectively. Accordingly, when the control panel 100 is located at the normal operation position P1, it is mounted on the third and fourth rails 122 and 124, and moves from the normal operation position P1 to the maintenance position P2 (or vice versa). Is performed smoothly. The end portions 112b and 114b of the first and second rails 112 and 114 and the starting portions 122a and 124a of the third and fourth rails 122 and 124 prevent the wheels 116 and 118 from falling off. Are provided.
[0033]
Further, the guide mechanism has a connecting rib 128 which is bridged between the end portions 112b and 114b of the first and second rails 112 and 114. As described above, by bridging the connecting rib 128 between the first rail 112 and the second rail 114, the first rail 112 and the second rail 114 are maintained at a predetermined interval.
[0034]
The above-described third and fourth rails 122 and 124 are completely fixed to the installation surface of the exposure system 1. On the other hand, the first and second rails 112 and 114 are provided so as to be rotatable inward in the installation plane around the base ends 112a and 114a. As shown in FIG. 8, the first and second rails 112 and 114 and the connecting rib 128 are provided so as to be accommodated below the control panel 100 when the control panel 100 is located at the normal operation position P1. Have been.
[0035]
That is, the connecting rib 128 has the first rib portion 130 and the second rib portion 132. The base end of the first rib portion 130 is axially fixed to the end portion 112b of the first rail 112 so as to be rotatable inward in the installation plane around the end portion 112b of the first rail 112 (FIG. 9, arrow I). The second rib 132 is axially fixed to the first rib 130 so as to be rotatable inward in the installation plane around the end of the first rib 130 (see arrow II in FIG. 9). In addition, the first rail 112 is axially fixed to the terminal end 122b of the third rail 122 so as to be rotatable inward in the installation plane about the base end 112a (see the arrow III in FIG. 9). Further, the second rail 114 is axially fixed to the terminal end 124b of the fourth rail 124 so as to be rotatable inward in the installation plane around the base end 114a (see the arrow IV in FIG. 9). With this configuration, the first and second rails 112 and 114 and the connecting rib 128 are connected to the control panel 100 when the control panel 100 is located at the normal operation position P1, as shown in FIG. It can be accommodated below.
[0036]
FIG. 10 is a diagram for explaining a configuration of a connecting portion between the first rail 112 and the third rail 122 and a connecting portion between the second rail 114 and the fourth rail 124. Here, the configuration of the connecting portion between the first rail 112 and the third rail 122 will be described, but the configuration of the connecting portion between the second rail 114 and the fourth rail 124 is also the same.
[0037]
As shown in FIG. 10A, the upper surface of the end portion 122b of the third rail 122 is ground into a predetermined shape to provide a step portion 134. A through hole 136 is provided in a predetermined portion of the end portion 122b in a vertical direction, and a side wall 138 of the step portion 134 forms a part of a circle centered on the through hole 136 in plan view. Most of the front surface 140 of the end portion 122b of the third rail 122 is provided in an arc shape centering on the through hole 136 in plan view, and the outside of the third rail 122 is expanded without being cut in an arc shape. An area 142 is provided. On the other hand, the lower surface and the front surface 150 of the starting portion 112a of the first rail 112 are formed in the same manner as the upper surface and the front surface 140 of the terminal end portion 122b of the third rail 122. That is, the lower surface of the first end 112 a of the first rail 112 is ground into a predetermined shape, and the step 144 is provided. A through hole 146 is provided in a predetermined portion of the starting end 112a in the vertical direction, and a side wall 148 of the step 144 forms a part of a circle centered on the through hole 146 in plan view. In addition, most of the front surface 150 of the leading end 112a of the first rail 112 is provided in an arc shape centering on the through hole 146 in plan view, and the outside swells without being cut in an arc shape. A bulging region 152 is provided.
[0038]
Then, as shown in FIG. 10B, the step 134 of the third rail 122 and the step 144 of the first rail 112 overlap so that the through holes 136 and 146 are coaxially continuous. Then, as shown in FIG. 10C, the shaft is fixed by a bolt 154. Accordingly, as shown in FIG. 10D, the first rail 112 is rotatable inward in the installation plane around the terminal end of the third rail 122. As shown in FIG. 10D, the side wall 138 of the step portion 134 of the third rail 122 and the side wall 148 of the step portion 144 of the first rail 112 extend inward of the first rail 112. It functions as a stopper (restriction means) for restricting rotation beyond a predetermined angle. Further, as shown in FIG. 10B, the bulging region 142 of the third rail 122 and the bulging region 152 of the first rail 112 are provided with stoppers (R) for restricting the rotation of the first rail 112 to the outside. Regulating means). Thus, the positioning of the first rail 112 with respect to the third rail 122 and the positioning of the second rail 114 with respect to the fourth rail 124 when the rail is used and when not in use.
[0039]
Next, the operation and effect of the exposure system 1 having the above configuration will be described.
[0040]
During normal operation (during exposure processing), as shown in FIGS. 1 and 2, the control panel 100 is disposed at the normal operation position P <b> 1 along the right side wall of the vacuum chamber 12. Although FIGS. 1 and 2 show a state where the first and second rails 112 and 114 are extended, during normal operation, as shown in FIG. 8, the first and second rails 112 and 114 are provided. 114 is housed below the control panel 100 together with the connecting rib 128. At this time, the upper lid 18 of the vacuum chamber 12 of the exposure apparatus 10 is located at the lowermost position and closes the upper opening of the container body 16.
[0041]
In this state, as shown in FIG. 4, the semiconductor wafer W is supplied into the container body 16, sucked on the electrostatic chuck 34, and positioned by the positioning stage 32. Further, the mask M is supplied into the container main body 16 and positioned by the mask stage 36. As a result, the mask M and the semiconductor wafer W are positioned close to each other. The positioning of the mask M and the semiconductor wafer W is performed based on a signal sent from the control panel 100 to the vacuum chamber 12 through the cable 110.
[0042]
Next, electron beam irradiation is started from the electron beam irradiation unit 20 in the vacuum chamber 12 under a reduced pressure environment. The electron beam emitted from the electron gun 24 of the electron beam irradiation unit 20 is collimated by a lens 26 and scanned by a polarizer 28 to scan the entire surface of the mask M. Thus, the desired mask pattern is transferred to the resist on the semiconductor wafer W at the same magnification.
[0043]
The above process is repeated, and the exposure process is performed a predetermined number of times. However, maintenance in the vacuum chamber 12 is performed periodically or when a sudden trouble occurs. At the time of maintenance, first, a jig 160 having a grip portion 162 and a hook portion 164 as shown in FIGS. 11B and 11C is used, and as shown in FIG. The hooks 164 of the jig 160 are hooked on the projections 126 provided on the upper surfaces of the end portions 112b and 114b of the rails 112 and 114, and the first and second rails 112 and 114 accommodated below the control panel 100 are attached. Pull out together with the connecting rib 128. Then, as shown in FIGS. 1 and 2, the first and second rails 112 and 114 are arranged so as to be parallel to each other, and the terminal end 112b of the first rail 112 and the terminal end of the second rail 114 are arranged. The connecting rib 128 is laid across the portion 114b.
[0044]
Next, as shown in FIGS. 12 and 13, the control panel 100 is moved from the normal operation position P1 to the maintenance position P2 while guiding along the first and second rails 112 and 114. At this time, the cable 110 housed in the space 108 provided below the control panel 100 is in an extended state. Then, the door 40 provided on the right side wall of the vacuum chamber 12 is opened, and the wafer stage 30 is pulled out. In this state, maintenance of the wafer stage 30 and the control panel 100 is performed. As shown in FIG. 13, when the control panel 100 is located at the maintenance position P2, a space sufficient for maintenance is provided between the vacuum chamber 12 and the control panel 100.
[0045]
In addition, the elevating device 14 raises the upper lid 18 of the vacuum chamber 12 to open the upper opening of the container body 16, and performs maintenance of the mask stage 36 and the electron beam irradiation unit 20 inside the container body 16.
[0046]
When the maintenance is completed, first, the upper lid 18 of the vacuum chamber 12 is lowered, and the upper opening of the container body 16 is closed. Further, the wafer stage 30 is housed in the vacuum chamber 12, and the opening / closing door 40 is closed. Then, as shown in FIGS. 1 and 2, the control panel 100 is moved from the maintenance position P2 to the normal operation position P1 while guiding on the first and second rails 112 and 114.
[0047]
Finally, as shown in FIG. 8, the first and second rails 112 and 114 are housed together with the connection rib 128 below the control panel 100 located at the normal operation position P1.
[0048]
As described in detail above, according to the guide mechanism according to the present embodiment, the guide mechanism is guided by the first and second rails 112 and 114 laid in parallel with each other, and is moved between the normal operation position P1 and the maintenance position P2. Thus, the control panel 100 can be reliably moved. As a result, during normal operation, the control panel 100 is disposed along the right side wall of the vacuum chamber 12 where the opening / closing door 40 is provided without providing a space for maintenance between the control panel 100 and the vacuum chamber 12. Therefore, the footprint during normal operation can be reduced, and the cost of ownership can be reduced. At the time of maintenance, the control panel 100 is moved in the pull-out direction of the wafer stage 30 and is positioned at the maintenance position P2, so that a sufficient maintenance space for the wafer stage 30 and the control panel 100 itself can be secured, and the maintenance property is improved. It does not decline.
[0049]
In addition, since the first and second rails 112 and 114 can be rotated around the starting ends 112a and 114a, when the control panel 100 is located at the normal operation position P1, the first and second rails 112 and 114 can be rotated. By accommodating the rails 112 and 114 below the control panel 100, the rails 112 and 114 are not hindered, and the installation surface can be effectively used.
[0050]
In addition, the guide mechanism according to the present embodiment is laid continuously on the third rail 122 continuously laid on the leading end 112a of the first rail 112 and on the leading end 114a of the second rail 114. When the control panel 100 is located at the normal operation position P1, the control panel 100 is mounted on the third and fourth rails 122 and 124 and has the normal operation position P1. To the maintenance position P2 (or vice versa).
[0051]
Further, since the guide mechanism according to the present embodiment includes the connecting rib 128 that is bridged between the end portions 112a and 114a of the first and second rails 112 and 114, the first rail 112 and the second rail 112 are provided. By keeping the interval with 114 as desired, the movement of control panel 100 becomes more reliable. In addition, when not in use, the connecting rib 128 can be folded along the first rail 112 by rotating the connecting rib 128 about the starting end in the installation surface, so that the installation surface can be effectively used without obstruction. Becomes possible.
[0052]
In the guide mechanism according to the present embodiment, the connection rib 128 has the first rib portion 130 and the second rib portion 132, and the first rib portion 130 is rotatable about the base end in the installation plane. Since the first rib 112 is axially fixed to the terminal end portion 112b, the second rib portion 132 is axially fixed to the first rib portion 130 so as to be rotatable about the starting end in the installation plane. Even if the distance between the first rail 112 and the second rail 114 is wide and the length of the connecting rib 128 is long, the second rib 132 is arranged along the first rib 130. The connection rib 128 can be folded and can be accommodated along the first rail 112 as a whole so as not to interfere.
[0053]
The guide mechanism according to the present embodiment is provided at each of a connecting portion between the first rail 112 and the third rail 122 and a connecting portion between the second rail 114 and the fourth rail 124, Since there is provided a regulating means for regulating the rotation of the first and second rails 112 and 114 around the base ends 112a and 114a at a predetermined angle or more in the installation surface, the third rail is used when the apparatus is used and not used. Positioning of the first rail 112 with respect to 122 and positioning of the second rail 114 with respect to the fourth rail 124 can be performed reliably.
[0054]
Further, in the guide mechanism according to the present embodiment, the protrusions 126 are provided at the end portions 112b and 114b of the first and second rails 112 and 114 and at the start portions 112a and 114a of the third and fourth rails 122 and 124, respectively. Is provided, it is possible to prevent the control panel 100 from falling off from the rails 112, 114, 122, and 124.
[0055]
In the guide mechanism according to the present embodiment, the wheels 116 guided by the first rails 112 are groove wheels, and the first rails 112 and the wheels 116 are engaged with each other. , And the control panel 100 can be moved more smoothly. When the upper surface 115 of the second rail 114 is engaged with the flat wheel 118, the upper surface 115 of the second rail 114 is also formed by an inclined surface having an inverted V-shaped cross section, and this is engaged with a groove wheel. The control panel 100 can be moved more smoothly than in the case of the first embodiment.
[0056]
Note that the present invention is not limited to the above-described embodiment, and various modifications can be made. For example, in the above-described embodiment, a description has been given of an embodiment in which the guide mechanism of the moving body is applied to the electron beam exposure system. However, the present invention is not limited to this, and a wheel is interposed between the first position and the second position. The present invention can be widely applied to the movement of a moving object that has been moved.
[0057]
【The invention's effect】
ADVANTAGE OF THE INVENTION According to this invention, the guide mechanism of the mobile body which enables the secure movement of the mobile body and effective use of the installation surface is provided.
[Brief description of the drawings]
FIG. 1 is a perspective view showing a configuration of an electron beam exposure system to which a moving body guide mechanism according to an embodiment is applied (a control panel is located at a normal operation position).
FIG. 2 is a plan view showing a configuration of an electron beam exposure system in a state shown in FIG.
FIG. 3 is a perspective view illustrating a configuration of an electron beam exposure apparatus.
FIG. 4 is a sectional view showing a configuration of a vacuum chamber.
FIG. 5 is a cross-sectional view showing a state where a wafer stage is pulled out from a door provided on a side wall of a vacuum chamber.
FIG. 6 is a perspective view showing a state where a control panel is mounted on rails via wheels.
FIG. 7 is a partial cross-sectional view showing a state where a control panel is mounted on rails via wheels.
FIG. 8 is a diagram for explaining a state in which first and second rails are accommodated below a control panel located at a normal operation position.
FIG. 9 is a diagram for explaining a procedure for storing the first and second rails and the connecting rib below the control panel.
FIG. 10 is a diagram for explaining a configuration of a connecting portion between a first rail and a third rail.
FIG. 11 is a diagram illustrating a state in which first and second rails housed below a control panel located at a normal operation position are pulled out using a jig.
FIG. 12 is a perspective view showing a configuration of an electron beam exposure system according to the embodiment (a state in which a control panel is located at a maintenance position).
FIG. 13 is a plan view showing the configuration of the electron beam exposure system in the state shown in FIG.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 ... Electron beam exposure system, 10 ... Electron beam exposure apparatus, 12 ... Vacuum chamber, 100 ... Control panel, 112 ... 1st rail, 114 ... 2nd rail, 116, 118 ... Wheel, 122 ... 3rd rail , 124: fourth rail, 126: protrusion, 128: connecting rib, 130: first rib, 132: second rib, 134, 144: step, 138, 148: side wall, 142, 152: bulge Area, P1: normal operation position, P2: maintenance position.

Claims (7)

A guide mechanism for guiding movement of a moving body via wheels between a first position and a second position,
First and second rails laid parallel to each other between the first position and the second position;
A guide mechanism for a moving body, wherein the first and second rails are provided so as to be rotatable about a base end in an installation plane. A connection rib laterally interposed between end portions of the first and second rails,
The guide mechanism for a moving body according to claim 1, wherein the connecting rib is rotatably fixed to an end portion of the first rail so as to be rotatable about the starting end in the installation plane. . The connection rib has a first rib portion and a second rib portion,
The first rib portion is axially fixed to the terminal end portion of the first rail so as to be rotatable about the base end portion in the installation plane,
3. The guide mechanism according to claim 2, wherein the second rib portion is rotatably fixed to the first rib portion so as to be rotatable in the installation surface around a starting end portion. 4. A third rail continuously laid on the leading end of the first rail, and a fourth rail continuously laid on the leading end of the second rail;
The starting end of the first rail is axially fixed to the terminal end of the third rail, and the starting end of the second rail is axially fixed to the terminal end of the fourth rail. The guide mechanism for a moving body according to claim 1, wherein the guide mechanism is provided. A connecting portion between the first rail and the third rail and a connecting portion between the second rail and the fourth rail are provided respectively. The guide mechanism for a moving body according to claim 4, further comprising a restricting means for restricting rotation of the installation surface by a predetermined angle or more. 2. The vehicle according to claim 1, further comprising a projection provided at the terminal end of each of the first and second rails to prevent the moving body from falling off from the first and second rails. 2. The guide mechanism for a moving body according to 1. The guide mechanism according to claim 1, wherein the wheel guided by the first rail is a groove wheel, and the first rail and the wheel are engaged with each other.

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