JP2004299947A - Alkali-free glass and its manufacturing method - Google Patents

Alkali-free glass and its manufacturing method Download PDF

Info

Publication number
JP2004299947A
JP2004299947A JP2003093356A JP2003093356A JP2004299947A JP 2004299947 A JP2004299947 A JP 2004299947A JP 2003093356 A JP2003093356 A JP 2003093356A JP 2003093356 A JP2003093356 A JP 2003093356A JP 2004299947 A JP2004299947 A JP 2004299947A
Authority
JP
Japan
Prior art keywords
glass
alkali
fining
free glass
sno
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003093356A
Other languages
Japanese (ja)
Other versions
JP4305025B2 (en
Inventor
Hironori Takase
寛典 高瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Electric Glass Co Ltd
Original Assignee
Nippon Electric Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Glass Co Ltd filed Critical Nippon Electric Glass Co Ltd
Priority to JP2003093356A priority Critical patent/JP4305025B2/en
Publication of JP2004299947A publication Critical patent/JP2004299947A/en
Application granted granted Critical
Publication of JP4305025B2 publication Critical patent/JP4305025B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C03C3/093Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00Compositions for glass with special properties
    • C03C4/20Compositions for glass with special properties for chemical resistant glass

Abstract

<P>PROBLEM TO BE SOLVED: To provide alkali-free glass using no As<SB>2</SB>O<SB>3</SB>as a clarifier, and including no foam causing display fault in using as a glass substrate for a display. <P>SOLUTION: This alkali-free glass is manufactured to contain 40-70% SiO<SB>2</SB>, 6-25% Al<SB>2</SB>O<SB>3</SB>, 5-20% B<SB>2</SB>O<SB>3</SB>, 0-10% MgO, 0-15% CaO, 0-30% BaO, 0-10% SrO, 0-10% ZnO, 0.0001-0.03% SO<SB>3</SB>, and 0.05-2% SnO<SB>2</SB>in mass%, and to contain essentially no alkali metal oxide. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

【0001】
【発明の属する技術分野】
本発明は、無アルカリガラス、特にディスプレイ等の透明ガラス基板として使用されている無アルカリガラスとその製造方法に関するものである。
【0002】
【従来の技術】
従来、液晶ディスプレイ等の透明ガラス基板として、無アルカリガラスが使用されている。ディスプレイ用途の無アルカリガラスには、耐熱性、耐薬品性等の特性の他に、表示欠陥となる泡がないことが要求される。
【0003】
このような無アルカリガラスとして、従来より種々のガラスが提案されており、例えば、特許文献1には、SiO−Al−B−CaO−SrO−BaO系の無アルカリガラスが開示されている。
【0004】
【特許文献1】
特開平6−263473号公報
【0005】
【発明が解決しようとする課題】
ところで泡のないガラスを得るためには、固相反応、固相−液相反応によるガラス化反応過程と、ガラス融液の脱泡化が起こる清澄過程で清澄ガスを発生する清澄剤を選択することが重要である。これは原料がガラス化反応を起こす時に発生するガスを清澄ガスによってガラス融液から追い出し、さらに清澄過程において再び発生させた清澄ガスによって残りの微少な泡を大きくして浮上させて除去するためである。
【0006】
液晶ディスプレイ用ガラス基板に使用されるような無アルカリガラスは、ガラス融液の粘度が高く、アルカリ成分を含有するガラスに比べて、より高温で溶融が行われる。この種の無アルカリガラスでは、通常1200〜1300℃でガラス化反応が起こり、1400℃以上の高温で脱泡、均質化が行われる。このような高温条件下でのガラス化反応過程と清澄過程において清澄ガスを発生させることができる清澄剤としてAsが知られており、特許文献1でも、清澄剤としてAsを使用することが開示されている。
【0007】
しかしながらAsは、毒性が非常に強い物質であり、ガラスの製造工程や廃ガラスの処理時等に環境を汚染する可能性があり、近年では、その使用が制限されつつある。
【0008】
本発明は、上記事情に鑑みなされたものであり、清澄剤としてAsを使用せず、しかもディスプレイ用ガラス基板として使用しても、表示欠陥となるような泡が存在しない無アルカリガラスを提供することを目的とする。
【0009】
【課題を解決するための手段】
本発明者は、種々の実験を繰り返した結果、無アルカリガラスの清澄剤としてAsの代わりに、硫酸塩と酸化錫を併用することによって上記目的を達成できることを見いだし、本発明として提案するものである。
【0010】
すなわち本発明の無アルカリガラスは、質量%で、SiO 40〜70%、Al 6〜25%、B 5〜20%、MgO 0〜10%、CaO 0〜15%、BaO 0〜30%、SrO 0〜10%、ZnO 0〜10%、SO 0.0001〜0.03%、SnO 0.05〜2%を含有し、本質的にアルカリ金属酸化物を含まないことを特徴とする。
【0011】
また本発明の無アルカリガラスの製造方法は、質量%で、SiO 40〜70%、Al 6〜25%、B 5〜20%、MgO 0〜10%、CaO 0〜15%、BaO 0〜30%、SrO 0〜10%、ZnO 0〜10%を含有し、本質的にアルカリ金属酸化物を含まないガラスとなるように調合したガラス原料調合物を溶融した後、成形する無アルカリガラスの製造方法において、ガラス原料調合物に清澄剤として硫酸塩をSO換算で0.005〜1%及びSnOを0.05〜2%添加することを特徴とする。
【0012】
【発明の実施の形態】
本発明において使用する硫酸塩は、1200〜1500℃程度の温度域で分解し、分解により多量の清澄ガス(二酸化硫黄、酸素ガス)を発生する。SOは1400℃の高温でも分解するため、無アルカリガラスのようなガラス化反応過程が高温となるガラスには最適である。つまりSOは102.5dPa・sの粘度に相当する温度が1500℃以上のガラスを溶融する時に、清澄剤として有効に作用する。しかしながら、一般にSOのガラスへの溶解度はアルカリ含有量が少なくなるほど低くなるので、無アルカリガラスの場合、SOの溶解度は非常に低い。つまりSOは、ガラス化反応過程において大量のガスを放出するが、ガラス化した後の清澄過程においては、残存するSOが少ないために、その清澄効果は小さくなる。
【0013】
ところがSnOは、1400℃以上、特に1500℃以上の温度域で起こるSnイオンの価数変化による化学反応により多量の清澄ガス(酸素ガス)を放出する。すなわちSnO(4価)は、温度を上昇させることでSnO(2価)に変化し、その際に多量の清澄ガスを放出する。
【0014】
従って、SOに加え、分解ではなく、価数変化によって清澄ガスを発生し、その価数変化が無アルカリガラスを溶融する温度域で起こるSnOを使用することで、比較的低温で起こるガラス化反応過程から高温の清澄過程にかけての広い温度域で高い清澄効果が得られることになり、泡の少ない無アルカリガラスを製造することができる。
【0015】
次に本発明の無アルカリガラスの製造方法を述べる。
【0016】
まず質量%で、SiO 40〜70%、Al 6〜25%、B 5〜20%、MgO 0〜10%、CaO 0〜15%、BaO 0〜30%、SrO 0〜10%、ZnO 0〜10%の組成を含有するガラスとなるようにガラス原料調合物を用意する。
【0017】
次に、このガラス原料調合物に、硫酸塩とSnOを添加する。硫酸塩としては、BaSO、CaSO等が使用できる。硫酸塩の添加量は、ガラス原料調合物100質量%に対し、SO換算で0.005〜1質量%であり、この添加量でガラス中のSOは0.0001〜0.03%となる。硫酸塩が0.005%より少ないと、ガラス化過程で発生したガスを追い出し難くなり、1%より多いと、再発泡しやすくなり、却ってガラス中に泡が残存しやすくなる。硫酸塩の好ましい添加量は、SO換算で0.01〜1%、より好ましくは0.05〜1%である。SOの好ましい含有量は、0.001〜0.03%、より好ましくは0.005〜0.03%である。またSnOの添加量は、ガラス原料調合物100質量%に対し、0.05〜2質量%である。SnOが0.05%より少ないと清澄過程でガラス融液中に残った泡を除去し難くなり、2%より多いとガラスが失透しやすくなる。SnOの好ましい添加量は、0.05〜1%、好ましくは0.1〜0.5%である。
【0018】
本発明では、硫酸塩とSnO以外にも、清澄剤として、Sbを3%まで、塩化物(Cl換算)を1%まで添加できる。ただしフッ化物は、Asほどではないが、毒性があるため添加しないことが好ましい。またFeも清澄作用を有する成分であるが、多量に含有させると、ガラスの可視光透過率が低下し、ディスプレイ用途には不向きとなるため、800ppm以下、好ましくは500ppm以下に抑えることが好ましい。
【0019】
次いで調合したガラス原料調合物を溶融する。ガラス原料を加熱していくと、まずガラス化反応が起こるが、この時、硫酸塩の分解によって二酸化硫黄、酸素ガスが発生し、ガラス化反応過程で発生したガスが融液中から追い出される。その後、清澄過程において温度上昇すると、SnOの価数変化が起こり、酸素ガスが発生してガラス融液中に残存する微少な泡が除去される。
【0020】
その後、溶融ガラスを所望の形状に成形する。ディスプレイ用途に使用する場合、オーバーフローダウンドロー法、スロットダウンドロー法、フロート法、ロールアウト法等の方法を用いて薄板状に成形する。特にオーバーフローダウンドロー法とスロットダウンドロー法によって成形すると、非常に表面品位に優れたガラス板が得られるため好ましい。
【0021】
こうして、質量%で、SiO 40〜70%、Al 6〜25%、B 5〜20%、MgO 0〜10%、CaO 0〜15%、BaO 0〜30%、SrO 0〜10%、ZnO 0〜10%、SO 0.0001〜0.03%、SnO 0.05〜2%を含有し、本質的にアルカリ金属酸化物を含まない無アルカリガラスが得られる。因みに、本質的にアルカリ金属酸化物を含まないとは、ガラス原料としてアルカリ金属酸化物(LiO、NaO、KO)を添加しないことを意味しており、不純物として0.2質量%以下混入しても、本発明が妨げられることはない。
【0022】
このように無アルカリガラスの組成を限定した理由は、次のとおりである。
【0023】
SiOは、ガラスのネットワークとなる成分であり、その含有量は40〜70%である。SiOが40%より少ないと耐薬品性が悪化すると共に、歪点が低下して耐熱性が悪くなる。70%より多くなると、高温粘度が高くなって溶融性が悪くなると共にクリストバライトの失透物が析出しやすくなる。SiOの好ましい含有量は、45〜65%である。
【0024】
Alは、ガラスの耐熱性、耐失透性を高める成分であり、その含有量は6〜25%である。Alが6%より少ないと失透温度が著しく上昇してガラス中に失透が生じやすくなり、25%より多いと耐酸性、特に耐バッファードフッ酸性が低下してガラス表面に白濁が生じやすくなる。Alの好ましい含有量は、10〜20%である。
【0025】
は融剤として働き、粘性を下げて溶融を容易にする成分であり、その含有量は5〜20%である。Bが5%より少ないと融剤としての効果が不十分となり、20%より多いと耐塩酸性が低下すると共に、歪点が低下して耐熱性が悪化する。Bの好ましい含有量は、7.5〜15%、より好ましい含有量は8.5〜15%である。
【0026】
MgOは、歪点を下げずに高温粘性を下げてガラスの溶融を容易にする成分であり、その含有量は0〜10%である。MgOが10%より多いと、ガラスの耐バッファードフッ酸性が著しく低下する。MgOの好ましい含有量は、0〜3.5%、より好ましい含有量は0〜3%である。
【0027】
CaOも、MgOと同様の働きをする成分であり、その含有量は0〜15%である。CaOが15%より多いと、耐バッファードフッ酸性が著しく低下する。CaOの好ましい含有量は、0〜10%、より好ましい含有量は6〜10%である。
【0028】
BaOは、ガラスの耐薬品性を向上させると共に失透性を改善する成分であり、その含有量は0〜30%である。BaOが30%より多いと、歪点が低下して耐熱性が悪くなる。BaOの好ましい含有量は、0〜20%である。
【0029】
SrOも、BaOと同様の働きをする成分であり、その含有量は0〜10%である。SrOが10%より多いと失透性が増すため好ましくない。SrOの好ましい含有量は、0〜7%である。
【0030】
ところで携帯電話やノート型パソコンといった携帯型デバイスには、携帯時の利便性から機器の軽量化が要求されており、それに使用されるガラス基板にも軽量化を図るため、低密度化が要求されている。また、この種のガラス基板は、薄膜トランジスタ(TFT)材料との熱膨張係数が大きくなると、反りが発生するため、TFT材料の熱膨張係数(約30〜33×10−7/℃)に近似するような低膨張、具体的には28〜35×10−7/℃の熱膨張係数を有することが望ましい。BaOとSrOは、ガラスの密度と熱膨張係数にも影響を与える成分であり、低密度、低膨張のガラスを得るためには、これらを合量で6%以下、好ましくは4%以下に抑えるべきである。
【0031】
ZnOは、耐バッファードフッ酸性と失透性を改善する成分であり、その含有量は0〜10%である。しかしながらZnOが10%より多いと、逆にガラスが失透しやすくなり、また歪点が低下して耐熱性が悪くなる。ZnOの好ましい含有量は、0〜7%である。
【0032】
また本発明では、上記成分の他に、ZrO、TiO、Fe、P、Y、Nb、La等を合量で5%まで含有することができる。
【0033】
【実施例】
以下、本発明を実施例に基づいて説明する。
【0034】
表1は、無アルカリガラスに対するSOとSnOの効果を示すものである。表中、試料aのガラスは、清澄剤としてAsを添加した従来の無アルカリガラス、試料bのガラスは、試料aからAsを除いて作製した無アルカリガラス、試料cのガラスは、硫酸塩(BaSO)のみを添加した無アルカリガラス、試料dのガラスは、SnOのみを添加した無アルカリガラス、試料e、fのガラスは、硫酸塩とSnOを併用した無アルカリガラスである。
【0035】
【表1】

Figure 2004299947
【0036】
表中の各試料ガラスは、次のようにして作製した。
【0037】
まず表1のSiO、Al、B、CaO、SrO、BaO、ZnOの合計100質量%となるようにガラス原料を調製し、清澄剤(SO、SnO、As)は、これに添加(外挿)する形で加え混合した後、電気炉で溶融した。ガラス化反応過程での清澄性を評価するために、1600℃で4時間と、1600℃で8時間溶融し、また清澄過程での清澄性を評価するために1600℃で4時間溶融した後、さらに1650℃で4時間溶融した。尚、SOは溶融時に分解するため、試料c、e、fのガラス中のSOの残存量は、いずれの溶融条件でも0.001質量%であった。
【0038】
次いで溶融ガラスをカーボン板上に流し出し、徐冷した。流し出した板状ガラスの大きさは、長さ10cm、幅6cm、高さ1cm程度であり、このガラスの流し始め1.5〜7cmの部分について、ガラス中の泡数を顕微鏡を用いて目視で観察し、表に示した。この泡数は、最大径が20μm以上の大きさの泡を求めたものであり、ガラス100g中の泡が10000個を超える場合は×、1001〜10000個の場合は△、101〜1000個の場合は○、100個以下の場合は◎で示した。
【0039】
また表中の歪点はASTM C336−71の方法に基づいて測定した。粘度102.5dPa・sの温度は、白金球引き上げ法で測定した高温粘度から、Fulcherの式を用いて計算した。耐塩酸性は、各試料ガラスを80℃に保持された10質量%塩酸水溶液に24時間浸漬した後、ガラスの表面状態を観察した。耐バッファードフッ酸性は、各試料ガラスを20℃に保持された38.7質量%フッ化アンモニウムと1.6%質量%フッ酸からなるバッファードフッ酸に30分間浸漬した後、ガラスの表面状態を観察した。耐塩酸性と耐バッファードフッ酸性は、外観変化が無かったものを◎、外観変化が起きたものを×として示した。
【0040】
表から明らかなように、Asを添加した試料aのガラスは、良好な清澄性を有していたが、清澄剤を添加しない試料bのガラスは清澄性が著しく悪かった。また硫酸塩(SO)のみを添加した試料cのガラスは、ガラス化過程で多量の清澄ガスが発生したものの、清澄過程では十分な清澄ガスが発生せず、結果として清澄性が悪かった。さらにSnOのみを添加した試料dのガラスは、清澄過程で多量のガスが発生したものの、ガラス化過程で十分な清澄ガスが発生せず、結果として清澄性が悪かった。
【0041】
一方、硫酸塩とSnOを添加した試料e、fのガラスは、Asを添加した試料aのガラスと略同等の良好な清澄性を有していた。また試料e、fのガラスは、いずれも歪点が665℃であるため耐熱性に優れ、塩酸やバッファードフッ酸処理しても外観変化が認められず、耐薬品性にも優れていた。
【0042】
【発明の効果】
以上のように、本発明の方法によれば、清澄剤として所定量の硫酸塩とSnOを添加するため、Asを使用することなく、清澄性に優れ、泡の少ない無アルカリガラスを製造することが可能である。
【0043】
また本発明の無アルカリガラスは、清澄性に優れ、泡が少なく、優れた耐熱性、耐薬品性を有しているため、特にディスプレイ用ガラス基板として好適である。[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to an alkali-free glass, particularly to an alkali-free glass used as a transparent glass substrate for a display or the like, and a method for producing the same.
[0002]
[Prior art]
Conventionally, non-alkali glass has been used as a transparent glass substrate for a liquid crystal display or the like. Alkali-free glass for display applications is required to have no bubbles that cause display defects in addition to properties such as heat resistance and chemical resistance.
[0003]
Various glasses have been conventionally proposed as such non-alkali glass. For example, Patent Literature 1 discloses a non-alkali glass based on SiO 2 —Al 2 O 3 —B 2 O 3 —CaO—SrO—BaO. Is disclosed.
[0004]
[Patent Document 1]
JP-A-6-263473
[Problems to be solved by the invention]
By the way, in order to obtain a bubble-free glass, a fining agent that generates a fining gas in a vitrification reaction process by a solid-phase reaction, a solid-liquid phase reaction, and a fining process in which defoaming of a glass melt is selected. This is very important. This is because the gas generated when the raw material undergoes the vitrification reaction is expelled from the glass melt by the fining gas, and the remaining fine bubbles are enlarged and removed by the fining gas generated again in the fining process. is there.
[0006]
Alkali-free glass such as that used for a glass substrate for a liquid crystal display has a high viscosity of a glass melt, and is melted at a higher temperature than glass containing an alkali component. In this type of alkali-free glass, a vitrification reaction usually occurs at 1200 to 1300 ° C., and defoaming and homogenization are performed at a high temperature of 1400 ° C. or higher. Such As 2 O 3 are known as a fining agent capable of generating a fining gas in a vitrification reaction process and refining process under high temperature conditions, even Patent Literature 1, the As 2 O 3 as a fining agent It is disclosed for use.
[0007]
However, As 2 O 3 is a very toxic substance, and may pollute the environment during the glass manufacturing process, the processing of waste glass, and the like. In recent years, its use has been restricted.
[0008]
The present invention has been made in view of the above circumstances, and does not use As 2 O 3 as a fining agent and, even when used as a glass substrate for a display, has no alkali-free glass that causes display defects. The purpose is to provide.
[0009]
[Means for Solving the Problems]
As a result of repeating various experiments, the present inventor has found that the above object can be achieved by using a sulfate and tin oxide in place of As 2 O 3 as a fining agent for alkali-free glass, and proposed as the present invention. Is what you do.
[0010]
That is, the alkali-free glass of the present invention is, by mass%, 40 to 70% of SiO 2 , 6 to 25% of Al 2 O 3 , 5 to 20% of B 2 O 3 , 0 to 10% of MgO, 0 to 15% of CaO, BaO 0-30%, SrO 0-10%, ZnO 0-10%, SO 3 0.0001-0.03%, SnO 2 0.05-2%, essentially containing alkali metal oxides It is characterized by not having.
[0011]
The process for producing an alkali-free glass of the present invention, in mass%, SiO 2 40~70%, Al 2 O 3 6~25%, B 2 O 3 5~20%, 0~10% MgO, CaO 0~ After fusing a glass raw material formulation containing 15%, BaO 0-30%, SrO 0-10%, and ZnO 0-10% and blended so as to be essentially free of alkali metal oxides, The method for producing an alkali-free glass to be molded is characterized in that a sulfate is added to the glass raw material mixture as a fining agent in an amount of 0.005 to 1% in terms of SO 3 and SnO 2 in an amount of 0.05 to 2 %.
[0012]
BEST MODE FOR CARRYING OUT THE INVENTION
The sulfate used in the present invention is decomposed in a temperature range of about 1200 to 1500 ° C., and generates a large amount of fining gas (sulfur dioxide and oxygen gas) by decomposition. Since SO 3 is decomposed even at a high temperature of 1400 ° C., it is most suitable for glass whose vitrification reaction process is at a high temperature such as non-alkali glass. That SO 3 when the temperature corresponding to a viscosity of 10 2.5 dPa · s to melt the 1500 ° C. or more glass, effectively acts as a fining agent. However, since the solubility of SO 3 in glass generally decreases as the alkali content decreases, the solubility of SO 3 is very low in the case of non-alkali glass. That is, SO 3 releases a large amount of gas in the vitrification reaction process, but in the fining process after vitrification, the fining effect is reduced due to the small amount of remaining SO 3 .
[0013]
However, SnO 2 releases a large amount of fining gas (oxygen gas) by a chemical reaction caused by a change in the valence of Sn ions occurring in a temperature range of 1400 ° C. or higher, particularly 1500 ° C. or higher. That is, SnO 2 (tetravalent) changes to SnO (divalent) by increasing the temperature, and releases a large amount of fining gas at that time.
[0014]
Therefore, in addition to SO 3 , a glass that occurs at a relatively low temperature by using SnO 2 that generates a fining gas not by decomposition but by a change in valence, and the valence change occurs in a temperature range where the alkali-free glass is melted is used. A high fining effect can be obtained in a wide temperature range from the crystallization reaction process to the high-temperature fining process, and an alkali-free glass with few bubbles can be produced.
[0015]
Next, a method for producing an alkali-free glass of the present invention will be described.
[0016]
First, in terms of mass%, SiO 2 40 to 70%, Al 2 O 3 6 to 25%, B 2 O 3 5 to 20%, MgO 0 to 10%, CaO 0 to 15%, BaO 0 to 30%, SrO 0 A glass raw material preparation is prepared so as to be a glass containing a composition of 10% to 10% and ZnO of 0% to 10%.
[0017]
Next, sulfate and SnO 2 are added to the glass raw material mixture. As the sulfate, BaSO 4 , CaSO 4 and the like can be used. Amount of sulfate, glass batch formulation 100% by mass of a 0.005 mass% converted to SO 3, SO 3 in the glass in this amount of addition and 0.0001 to 0.03% Become. If the amount of the sulfate is less than 0.005%, it is difficult to expel the gas generated in the vitrification process. If the amount of the sulfate is more than 1%, the foam tends to be re-foamed, and the bubbles easily remain in the glass. The preferred amount of sulfate, 0.01% to 1% converted to SO 3, more preferably from 0.05 to 1%. The preferable content of SO 3 is 0.001 to 0.03%, more preferably 0.005 to 0.03%. The addition amount of SnO 2 is 0.05 to 2 % by mass based on 100% by mass of the glass raw material mixture. If SnO 2 is less than 0.05%, it is difficult to remove bubbles remaining in the glass melt during the fining process, and if it is more than 2%, the glass tends to be devitrified. The preferred amount of SnO 2 is 0.05 to 1%, preferably 0.1% to 0.5%.
[0018]
In the present invention, in addition to sulfate and SnO 2 , as a fining agent, Sb 2 O 3 can be added up to 3%, and chloride (in terms of Cl 2 ) can be added up to 1%. However, fluoride is not added as much as As 2 O 3 but is not added because of toxicity. In addition, Fe 2 O 3 is also a component having a clarifying action. However, if it is contained in a large amount, the visible light transmittance of the glass is reduced, and the glass is not suitable for display applications. Therefore, the content should be suppressed to 800 ppm or less, preferably 500 ppm or less. Is preferred.
[0019]
Next, the prepared glass raw material preparation is melted. As the glass raw material is heated, a vitrification reaction occurs first. At this time, sulfur dioxide and oxygen gas are generated due to decomposition of sulfate, and the gas generated in the vitrification reaction process is expelled from the melt. Thereafter, when the temperature rises in the fining process, the valence of SnO 2 changes, and oxygen gas is generated to remove fine bubbles remaining in the glass melt.
[0020]
Thereafter, the molten glass is formed into a desired shape. When used for display applications, it is formed into a thin plate using a method such as an overflow downdraw method, a slot downdraw method, a float method, or a rollout method. In particular, it is preferable that the glass sheet is formed by the overflow down draw method and the slot down draw method, since a glass sheet having very excellent surface quality can be obtained.
[0021]
Thus, in mass%, SiO 2 40~70%, Al 2 O 3 6~25%, B 2 O 3 5~20%, 0~10% MgO, CaO 0~15%, BaO 0~30%, SrO 0~10%, 0~10% ZnO, sO 3 0.0001~0.03%, containing SnO 2 0.05 to 2%, an alkali-free glass is obtained which is essentially free of alkali metal oxides . Incidentally, essentially containing no alkali metal oxide means that no alkali metal oxide (Li 2 O, Na 2 O, K 2 O) is added as a glass raw material, and 0.2% as an impurity. Even if it is contained in an amount of not more than mass%, the present invention is not hindered.
[0022]
The reasons for limiting the composition of the alkali-free glass in this way are as follows.
[0023]
SiO 2 is a component serving as a glass network, and its content is 40 to 70%. If the content of SiO 2 is less than 40%, the chemical resistance is deteriorated, and the strain point is lowered to deteriorate the heat resistance. If it is more than 70%, the high temperature viscosity increases, the meltability deteriorates, and the devitrified cristobalite tends to precipitate. The preferred content of SiO 2 is 45 to 65%.
[0024]
Al 2 O 3 is a component that enhances the heat resistance and devitrification resistance of the glass, and its content is 6 to 25%. If the content of Al 2 O 3 is less than 6%, the devitrification temperature rises remarkably and devitrification tends to occur in the glass. If it is more than 25%, acid resistance, especially buffered hydrofluoric acid resistance, decreases, and the glass surface becomes cloudy. Tends to occur. The preferred content of Al 2 O 3 is 10 to 20%.
[0025]
B 2 O 3 is a component that functions as a flux, lowers the viscosity and facilitates melting, and has a content of 5 to 20%. If the content of B 2 O 3 is less than 5%, the effect as a flux will be insufficient, and if it is more than 20%, the hydrochloric acid resistance will be reduced, and the strain point will be lowered, thus deteriorating the heat resistance. The preferable content of B 2 O 3 is 7.5 to 15%, and the more preferable content is 8.5 to 15%.
[0026]
MgO is a component that lowers the high-temperature viscosity without lowering the strain point to facilitate melting of the glass, and its content is 0 to 10%. If the content of MgO is more than 10%, the buffered hydrofluoric acid resistance of the glass is significantly reduced. The preferred content of MgO is 0 to 3.5%, and the more preferred content is 0 to 3%.
[0027]
CaO is also a component having the same function as MgO, and its content is 0 to 15%. If the content of CaO is more than 15%, the resistance to buffered hydrofluoric acid is significantly reduced. A preferable content of CaO is 0 to 10%, and a more preferable content is 6 to 10%.
[0028]
BaO is a component that improves the chemical resistance of glass and also improves the devitrification, and its content is 0 to 30%. If the content of BaO is more than 30%, the strain point is lowered and the heat resistance is deteriorated. The preferable content of BaO is 0 to 20%.
[0029]
SrO is also a component having the same function as BaO, and its content is 0 to 10%. If the content of SrO is more than 10%, the devitrification will increase, which is not preferable. The preferred content of SrO is 0 to 7%.
[0030]
By the way, portable devices such as mobile phones and notebook computers are required to be lightweight for convenience in carrying, and the glass substrate used for them is also required to have a low density in order to reduce the weight. ing. In addition, since a glass substrate of this kind is warped when its coefficient of thermal expansion with a thin film transistor (TFT) material increases, it is close to the coefficient of thermal expansion of the TFT material (about 30 to 33 × 10 −7 / ° C.). It is desirable to have such a low expansion, specifically a thermal expansion coefficient of 28 to 35 × 10 −7 / ° C. BaO and SrO are components that also affect the density and the coefficient of thermal expansion of the glass. In order to obtain a glass having a low density and a low expansion, the total amount of these components is controlled to 6% or less, preferably 4% or less. Should.
[0031]
ZnO is a component that improves buffered hydrofluoric acid resistance and devitrification, and its content is 0 to 10%. However, when the content of ZnO is more than 10%, the glass is liable to be devitrified, and the strain point is lowered to deteriorate the heat resistance. The preferable content of ZnO is 0 to 7%.
[0032]
In the present invention, in addition to the above components, ZrO 2 , TiO 2 , Fe 2 O 3 , P 2 O 5 , Y 2 O 3 , Nb 2 O 3 , La 2 O 3 and the like are contained up to 5% in total. can do.
[0033]
【Example】
Hereinafter, the present invention will be described based on examples.
[0034]
Table 1 shows the effects of SO 3 and SnO 2 on the alkali-free glass. In the table, the glass of sample a was a conventional alkali-free glass to which As 2 O 3 was added as a fining agent, the glass of sample b was an alkali-free glass prepared by removing As 2 O 3 from sample a, and a glass of sample c. The glass was alkali-free glass to which only sulfate (BaSO 4 ) was added, the glass of sample d was alkali-free glass to which only SnO 2 was added, and the glass of samples e and f was non-alkali glass to which both sulfate and SnO 2 were used. It is an alkali glass.
[0035]
[Table 1]
Figure 2004299947
[0036]
Each sample glass in the table was produced as follows.
[0037]
First, a glass raw material was prepared so that the total amount of SiO 2 , Al 2 O 3 , B 2 O 3 , CaO, SrO, BaO, and ZnO in Table 1 was 100% by mass, and a fining agent (SO 3 , SnO 2 , As 2 O 3 ) was added (extrapolated) to this, mixed, and then melted in an electric furnace. After melting at 1600 ° C. for 4 hours and at 1600 ° C. for 8 hours to evaluate clarity in the vitrification process, and after melting at 1600 ° C. for 4 hours to evaluate fining in the fining process, Further, it was melted at 1650 ° C. for 4 hours. Since SO 3 is decomposed during melting, the residual amount of SO 3 in the glasses of Samples c, e, and f was 0.001% by mass under any melting conditions.
[0038]
Next, the molten glass was poured out onto a carbon plate and gradually cooled. The size of the poured sheet glass was about 10 cm in length, about 6 cm in width, and about 1 cm in height. The number of bubbles in the glass was visually observed using a microscope for a portion of 1.5 to 7 cm at which the glass started to flow. And were shown in the table. The number of bubbles is obtained by measuring bubbles having a maximum diameter of 20 μm or more. When the number of bubbles in glass 100 g exceeds 10,000, x; when the number of bubbles is 1001 to 10,000, Δ is 101 to 1000. The case was indicated by ○, and the case of 100 or less was indicated by ◎.
[0039]
The strain points in the table were measured based on the method of ASTM C336-71. Temperature viscosity of 10 2.5 dPa · s, from the high temperature viscosity measured at platinum ball pulling method was calculated using the formula Fulcher. Hydrochloric acid resistance was determined by immersing each sample glass in a 10% by mass aqueous hydrochloric acid solution maintained at 80 ° C. for 24 hours, and then observing the surface state of the glass. The buffered hydrofluoric acid resistance is determined by immersing each sample glass in buffered hydrofluoric acid composed of 38.7% by mass of ammonium fluoride and 1.6% by mass of hydrofluoric acid maintained at 20 ° C. for 30 minutes, and then immersing the glass surface. The condition was observed. Regarding the hydrochloric acid resistance and the buffered hydrofluoric acid resistance, ◎ indicates that there was no change in appearance, and X indicates that the change in appearance occurred.
[0040]
As is clear from the table, the glass of Sample a to which As 2 O 3 was added had good clarity, but the glass of Sample b to which no fining agent was added had extremely poor clarity. In addition, in the glass of Sample c to which only sulfate (SO 3 ) was added, although a large amount of fining gas was generated in the vitrification process, sufficient fining gas was not generated in the fining process, and as a result, fining was poor. Furthermore, although the glass of sample d to which only SnO 2 was added generated a large amount of gas in the fining process, sufficient fining gas was not generated in the vitrification process, resulting in poor fining properties.
[0041]
On the other hand, the glasses of Samples e and f to which sulfate and SnO 2 were added had almost the same good clarity as the glass of Sample a to which As 2 O 3 was added. Further, the glasses of Samples e and f each had a strain point of 665 ° C., and thus had excellent heat resistance, no change in appearance even when treated with hydrochloric acid or buffered hydrofluoric acid, and also had excellent chemical resistance.
[0042]
【The invention's effect】
As described above, according to the method of the present invention, a predetermined amount of sulfate and SnO 2 are added as fining agents, so that alkali-free glass with excellent fining properties and little bubbles is used without using As 2 O 3. Can be manufactured.
[0043]
Further, the alkali-free glass of the present invention is excellent in clarity, has few bubbles, and has excellent heat resistance and chemical resistance, and thus is particularly suitable as a glass substrate for displays.

Claims (2)

質量%で、SiO 40〜70%、Al 6〜25%、B 5〜20%、MgO 0〜10%、CaO 0〜15%、BaO 0〜30%、SrO 0〜10%、ZnO 0〜10%、SO 0.0001〜0.03%、SnO 0.05〜2%を含有し、本質的にアルカリ金属酸化物を含まないことを特徴とする無アルカリガラス。By mass%, SiO 2 40~70%, Al 2 O 3 6~25%, B 2 O 3 5~20%, 0~10% MgO, CaO 0~15%, BaO 0~30%, SrO 0~ Alkali-free glass containing 10%, ZnO 0 to 10%, SO 3 0.0001 to 0.03%, and SnO 2 0.05 to 2 %, and containing essentially no alkali metal oxide. . 質量%で、SiO 40〜70%、Al 6〜25%、B 5〜20%、MgO 0〜10%、CaO 0〜15%、BaO 0〜30%、SrO 0〜10%、ZnO 0〜10%を含有し、本質的にアルカリ金属酸化物を含まないガラスとなるように調合したガラス原料調合物を溶融した後、成形する無アルカリガラスの製造方法において、ガラス原料調合物に清澄剤として硫酸塩をSO換算で0.005〜1%及びSnOを0.05〜2%添加することを特徴とする無アルカリガラスの製造方法。By mass%, SiO 2 40~70%, Al 2 O 3 6~25%, B 2 O 3 5~20%, 0~10% MgO, CaO 0~15%, BaO 0~30%, SrO 0~ In a method for producing an alkali-free glass, a glass raw material mixture containing 10% and ZnO of 0 to 10% and containing essentially no alkali metal oxide is melted and then molded. A method for producing an alkali-free glass, comprising adding a sulfate as a fining agent to the composition in an amount of 0.005 to 1% in terms of SO 3 and 0.05 to 2 % of SnO 2 .
JP2003093356A 2003-03-31 2003-03-31 Alkali-free glass Expired - Lifetime JP4305025B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003093356A JP4305025B2 (en) 2003-03-31 2003-03-31 Alkali-free glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003093356A JP4305025B2 (en) 2003-03-31 2003-03-31 Alkali-free glass

Publications (2)

Publication Number Publication Date
JP2004299947A true JP2004299947A (en) 2004-10-28
JP4305025B2 JP4305025B2 (en) 2009-07-29

Family

ID=33406176

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003093356A Expired - Lifetime JP4305025B2 (en) 2003-03-31 2003-03-31 Alkali-free glass

Country Status (1)

Country Link
JP (1) JP4305025B2 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006306690A (en) * 2005-05-02 2006-11-09 Asahi Glass Co Ltd Alkali-free glass, and method for producing the same
US7137278B2 (en) * 2002-03-30 2006-11-21 Schott Ag Process for producing alkali-free aluminosilicate glass
WO2008007676A1 (en) * 2006-07-13 2008-01-17 Asahi Glass Company, Limited Alkali-free glass substrate, process for production of the same and liquid crystal display panels
US7534734B2 (en) * 2006-11-13 2009-05-19 Corning Incorporated Alkali-free glasses containing iron and tin as fining agents
JP2009203080A (en) * 2007-02-27 2009-09-10 Avanstrate Inc Glass substrate for display and display
JP2010235444A (en) * 2007-02-27 2010-10-21 Avanstrate Inc Glass substrate for display and display
JP2014501682A (en) * 2010-11-09 2014-01-23 イリコ グループ コーポレイション Alkali-free glass for flat panel display and its melting process
JP2015514655A (en) * 2012-02-22 2015-05-21 ショット・アーゲー Methods for producing glass, glass-ceramics and their use
KR20190077350A (en) 2016-11-02 2019-07-03 에이지씨 가부시키가이샤 Non-alkali glass and manufacturing method thereof

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1025132A (en) * 1996-07-09 1998-01-27 Nippon Electric Glass Co Ltd Alkali-free glass and its production
JPH1036133A (en) * 1996-04-30 1998-02-10 Carl Zeiss:Fa Alkali-free aluminoborosilicate glass and its use
JPH1059741A (en) * 1996-08-21 1998-03-03 Nippon Electric Glass Co Ltd Non-alkali glass and its production
JPH10324526A (en) * 1997-05-20 1998-12-08 Asahi Glass Co Ltd Method for refining alkali-free glass
JP2000169180A (en) * 1998-11-30 2000-06-20 Asahi Glass Co Ltd Float glass for display substrate
JP2001500098A (en) * 1996-07-19 2001-01-09 コーニング インコーポレイテッド Arsenic-free glass
JP2002293571A (en) * 2001-03-30 2002-10-09 Nippon Electric Glass Co Ltd Glass for illumination

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1036133A (en) * 1996-04-30 1998-02-10 Carl Zeiss:Fa Alkali-free aluminoborosilicate glass and its use
JPH1025132A (en) * 1996-07-09 1998-01-27 Nippon Electric Glass Co Ltd Alkali-free glass and its production
JP2001500098A (en) * 1996-07-19 2001-01-09 コーニング インコーポレイテッド Arsenic-free glass
JPH1059741A (en) * 1996-08-21 1998-03-03 Nippon Electric Glass Co Ltd Non-alkali glass and its production
JPH10324526A (en) * 1997-05-20 1998-12-08 Asahi Glass Co Ltd Method for refining alkali-free glass
JP2000169180A (en) * 1998-11-30 2000-06-20 Asahi Glass Co Ltd Float glass for display substrate
JP2002293571A (en) * 2001-03-30 2002-10-09 Nippon Electric Glass Co Ltd Glass for illumination

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7137278B2 (en) * 2002-03-30 2006-11-21 Schott Ag Process for producing alkali-free aluminosilicate glass
WO2006120872A1 (en) * 2005-05-02 2006-11-16 Asahi Glass Company, Limited Alkali-free glass and method for production thereof
TWI409238B (en) * 2005-05-02 2013-09-21 Asahi Glass Co Ltd E-glass and its manufacturing method
KR100935562B1 (en) * 2005-05-02 2010-01-07 아사히 가라스 가부시키가이샤 Alkali-free glass and method for production thereof
US7670975B2 (en) 2005-05-02 2010-03-02 Asahi Glass Company, Limited Alkali free glass and process for its production
JP2006306690A (en) * 2005-05-02 2006-11-09 Asahi Glass Co Ltd Alkali-free glass, and method for producing the same
US7754631B2 (en) 2006-07-13 2010-07-13 Asahi Glass Company, Limited Alkali-free glass substrate, method for producing it and liquid crystal display panel
WO2008007676A1 (en) * 2006-07-13 2008-01-17 Asahi Glass Company, Limited Alkali-free glass substrate, process for production of the same and liquid crystal display panels
JP5359271B2 (en) * 2006-07-13 2013-12-04 旭硝子株式会社 Non-alkali glass substrate, method for producing the same, and liquid crystal display panel
US7696113B2 (en) * 2006-11-13 2010-04-13 Corning Incorporated Method of manufacturing alkali-free glasses containing iron and tin as fining agents
US7935649B2 (en) 2006-11-13 2011-05-03 Corning Incorporated Alkali-free glasses containing iron and tin as fining agents
CN102515521A (en) * 2006-11-13 2012-06-27 康宁股份有限公司 Alkali-free glasses containing iron and tin as fining agents
US7534734B2 (en) * 2006-11-13 2009-05-19 Corning Incorporated Alkali-free glasses containing iron and tin as fining agents
JP2010235444A (en) * 2007-02-27 2010-10-21 Avanstrate Inc Glass substrate for display and display
JP2009203080A (en) * 2007-02-27 2009-09-10 Avanstrate Inc Glass substrate for display and display
JP2014501682A (en) * 2010-11-09 2014-01-23 イリコ グループ コーポレイション Alkali-free glass for flat panel display and its melting process
JP2015514655A (en) * 2012-02-22 2015-05-21 ショット・アーゲー Methods for producing glass, glass-ceramics and their use
KR20190077350A (en) 2016-11-02 2019-07-03 에이지씨 가부시키가이샤 Non-alkali glass and manufacturing method thereof
US10730786B2 (en) 2016-11-02 2020-08-04 AGC Inc. Alkali-free glass and method for producing the same

Also Published As

Publication number Publication date
JP4305025B2 (en) 2009-07-29

Similar Documents

Publication Publication Date Title
JP4941872B2 (en) Transparent alkali-free glass substrate for liquid crystal display
JP3083586B2 (en) Alkali-free glass
US5801109A (en) Alkali-free glass and flat panel display
JP5483821B2 (en) Glass substrate for display device and display device
JP3800657B2 (en) Alkali-free glass and flat display panel
JP3800443B2 (en) Non-alkali glass substrate for display and method for producing the same
JPH10324526A (en) Method for refining alkali-free glass
JPWO2009028570A1 (en) Glass plate, method for producing the same, and method for producing TFT panel
JP3800440B2 (en) Alkali-free glass and method for producing the same
JP2005053712A (en) Alkali-free glass
JP2005306719A (en) Glass for display substrate
JP2001151534A (en) Glass substrate for liquid crystal display
JP7182871B2 (en) glass
JP5359824B2 (en) Clarification method of alkali-free glass
JP3861271B2 (en) Alkali-free glass and method for producing the same
JPH1025132A (en) Alkali-free glass and its production
JP4306044B2 (en) Alkali-free glass and method for producing the same
JP2001348247A (en) Alkaline-free glass
JP3897194B2 (en) Alkali-free glass and method for producing the same
JP4305025B2 (en) Alkali-free glass
WO2020080163A1 (en) Alkali-free glass plate
JP3861272B2 (en) Alkali-free glass and method for producing the same
JP3804111B2 (en) Alkali-free glass and display substrate
JP2003137591A (en) Process for making no-alkali glass
JP2020172423A (en) Alkali-free glass plate

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20051111

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080116

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081107

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20081226

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090120

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090407

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090420

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 4305025

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120515

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130515

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140515

Year of fee payment: 5

EXPY Cancellation because of completion of term