JP2004279471A5 - - Google Patents
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- Publication number
- JP2004279471A5 JP2004279471A5 JP2003067010A JP2003067010A JP2004279471A5 JP 2004279471 A5 JP2004279471 A5 JP 2004279471A5 JP 2003067010 A JP2003067010 A JP 2003067010A JP 2003067010 A JP2003067010 A JP 2003067010A JP 2004279471 A5 JP2004279471 A5 JP 2004279471A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- hydrogen atom
- atom
- general formula
- alkyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003067010A JP4166598B2 (ja) | 2003-03-12 | 2003-03-12 | ポジ型レジスト組成物 |
| EP04004961A EP1457819A3 (en) | 2003-03-12 | 2004-03-03 | Positive resist composition and method of forming a resist pattern using the same |
| US10/796,083 US7118846B2 (en) | 2003-03-12 | 2004-03-10 | Positive resist composition and method of forming a resist pattern using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003067010A JP4166598B2 (ja) | 2003-03-12 | 2003-03-12 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004279471A JP2004279471A (ja) | 2004-10-07 |
| JP2004279471A5 true JP2004279471A5 (US06780888-20040824-C00057.png) | 2005-09-29 |
| JP4166598B2 JP4166598B2 (ja) | 2008-10-15 |
Family
ID=32767944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003067010A Expired - Fee Related JP4166598B2 (ja) | 2003-03-12 | 2003-03-12 | ポジ型レジスト組成物 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US7118846B2 (US06780888-20040824-C00057.png) |
| EP (1) | EP1457819A3 (US06780888-20040824-C00057.png) |
| JP (1) | JP4166598B2 (US06780888-20040824-C00057.png) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4639062B2 (ja) | 2003-11-21 | 2011-02-23 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法 |
| JP5675070B2 (ja) * | 2009-07-30 | 2015-02-25 | 富士フイルム株式会社 | 感活性光線性または感放射線性樹脂組成物、及び該組成物を用いたパターン形成方法 |
| JP5331624B2 (ja) * | 2009-09-04 | 2013-10-30 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、及びそれを用いたパターン形成方法 |
| KR101810520B1 (ko) * | 2009-07-30 | 2017-12-19 | 후지필름 가부시키가이샤 | 감활성 광선성 또는 감방사선성 수지 조성물 및 그것을 사용한 패턴 형성 방법 |
| JP5621432B2 (ja) * | 2009-09-17 | 2014-11-12 | 住友化学株式会社 | レジスト組成物 |
| JP5556522B2 (ja) * | 2009-09-17 | 2014-07-23 | 住友化学株式会社 | レジスト組成物 |
| US9726976B2 (en) * | 2009-09-17 | 2017-08-08 | Sumitomo Chemical Company, Limited | Photoresist composition |
| US9223208B2 (en) | 2011-12-29 | 2015-12-29 | Fujifilm Corporation | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition |
| KR20150101074A (ko) * | 2014-02-26 | 2015-09-03 | 삼성전자주식회사 | 포토레지스트 조성물, 이를 이용한 패턴 형성 방법 및 반도체 소자의 제조 방법 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3591672B2 (ja) * | 1996-02-05 | 2004-11-24 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
| WO2000017712A1 (en) | 1998-09-23 | 2000-03-30 | E.I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
| AU4678100A (en) * | 1999-05-04 | 2000-11-17 | E.I. Du Pont De Nemours And Company | Fluorinated polymers, photoresists and processes for microlithography |
| TWI224713B (en) * | 2000-01-27 | 2004-12-01 | Fuji Photo Film Co Ltd | Positive photoresist composition |
| US20020155376A1 (en) * | 2000-09-11 | 2002-10-24 | Kazuhiko Hashimoto | Positive resist composition |
| JP3876968B2 (ja) | 2001-04-26 | 2007-02-07 | 信越化学工業株式会社 | 高分子化合物、化学増幅レジスト材料及びパターン形成方法 |
| US7108951B2 (en) * | 2002-02-26 | 2006-09-19 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
| KR100955454B1 (ko) * | 2002-05-31 | 2010-04-29 | 후지필름 가부시키가이샤 | 포지티브 레지스트 조성물 |
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2003
- 2003-03-12 JP JP2003067010A patent/JP4166598B2/ja not_active Expired - Fee Related
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2004
- 2004-03-03 EP EP04004961A patent/EP1457819A3/en not_active Withdrawn
- 2004-03-10 US US10/796,083 patent/US7118846B2/en not_active Expired - Fee Related
