JP2004257849A - Scanning mechanism for scanning probe microscope, and scanning probe microscope - Google Patents

Scanning mechanism for scanning probe microscope, and scanning probe microscope Download PDF

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JP2004257849A
JP2004257849A JP2003048591A JP2003048591A JP2004257849A JP 2004257849 A JP2004257849 A JP 2004257849A JP 2003048591 A JP2003048591 A JP 2003048591A JP 2003048591 A JP2003048591 A JP 2003048591A JP 2004257849 A JP2004257849 A JP 2004257849A
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scanning
fine movement
movement mechanism
probe
stage
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JP4162508B2 (en
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Masato Iyogi
誠人 伊與木
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Seiko Instruments Inc
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Seiko Instruments Inc
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Abstract

<P>PROBLEM TO BE SOLVED: To heighten stiffness of a scanning mechanism, and to lower the height, in a scanning probe microscope. <P>SOLUTION: This scanning probe microscope is equipped with a stage 2 for placing thereon a measurement object S, a probe P to be brought close to or into contact with the measurement object, and a scanning mechanism 8 for moving relatively the probe in the three-dimensional direction relative to the measurement object. The scanning mechanism is equipped with a horizontal micro-motion mechanism 9 capable of moving relatively the probe and the stage on a two-dimensional plane, and a vertical micro-motion mechanism 10 capable of moving relatively the probe and the stage in the vertical direction to the two-dimensional plane, and the horizontal micro-motion mechanism and the vertical micro-motion mechanism are installed divisionally, and the vertical micro-motion mechanism directly supports the stage. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

【0001】
【発明の属する技術分野】
本発明は、走査型近接場顕微鏡等の走査型プローブ顕微鏡用の走査機構及び走査型プローブ顕微鏡に関するものである。
【0002】
【従来の技術】
従来の走査型プローブ顕微鏡(SPM)は、例えば走査型近接場顕微鏡を例に説明すると、図5に示すように、サンプルSを3軸微動機構1上のステージ2に載せ、プローブPから励起光をサンプルSの表面に照射し、サンプルSの局所的な光学特性を、透過側に配置された対物レンズL1により集光し、集光された光信号を光検出器3に導入することにより、サンプルS上の光学特性を測定するように構成されている(例えば、特許文献1参照)。すなわち、この従来例では、対物レンズL1がステージ2の下方に支持された倒立顕微鏡を組み合わせたタイプとなっている。
【0003】
上記測定時においては、プローブPの先端からは励起光としてエバネッセント光が照射される。該エバネッセント光は、プローブPの極近傍にしか存在せず、その強度はプローブ先端からの距離に対して指数関数的に減衰するため、波長以下の領域にサンプルSを位置決めし、減衰の少ない近接位置でエバネッセント光をサンプルSに照射している。また、この状態でプローブ先端とサンプルSとを相対的に移動させてサンプルSの表面をスキャン(走査)することにより測定を行っている。
【0004】
プローブ先端とサンプルSとの最も代表的な位置決め方法は、プローブ先端の先鋭性を利用して、サンプル表面とプローブ先端間に働く原子間力によりプローブ先端とサンプル表面との距離制御を行う方法である。この場合、原子間力はプローブ先端とサンプル表面との距離に依存するため、両者の距離が一定となるように3軸微動機構1のうち垂直微動機構4により制御している。また、このように距離制御を掛けながら、3軸微動機構1のうち水平微動機構5によりサンプルSを2次元平面内でスキャンさせることにより、2次元平面内での光学特性が測定される。なお、垂直微動機構4に印加される電圧によりサンプル表面の凹凸像も同時に測定することができる。
また、走査機構である上記3軸微動機構1では、対物レンズL1の周囲に3本配設され、水平微動機構5上に直接、垂直微動機構4が設けられており、一体となった状態でステージ2を支持している。なお、水平微動機構5及び垂直微動機構4は、円筒状の圧電素子(ピエゾ素子)で構成されている。
【0005】
上記のような倒立顕微鏡と組み合わせた走査型プローブ顕微鏡では、レバースキャンが行われる。例えば、走査型近接場顕微鏡ではスキャンを行う場合に、レバースキャン方式では対物レンズL1とプローブ先端とのフォーカスずれが発生するため、サンプル表面のスキャンを行う必要がある。このサンプルスキャンを行う場合、走査機構の真中に空間が必要となる。
【0006】
また、上述したような走査型プローブ顕微鏡に用いる3軸微動機構の他の従来例としては、圧電素子を4本水平上に横にして設置したタイプも知られている(例えば、特許文献2参照)。
さらに、3軸微動機構の別の従来例としては、市販されているいわゆるフラットスキャナ等が知られている。このフラットスキャナは、複数の積層型圧電素子と微動ストロークの拡大機構とを組み合わせた構造を有している(例えば、非特許文献3参照)。
【0007】
【特許文献1】
特開2000−304755号公報(段落番号0002〜0003の記載及び図7)
【特許文献2】
米国特許第5,705,878号明細書
【非特許文献3】
Physik Instrumente社の製品P−517,P−527、[online]、[平成14年2月24日検索]、インターネット<URL:http://www.physikinstrumente.de/products/prdetail.php?secid=2−32>
【0008】
【発明が解決しようとする課題】
しかしながら、上記従来の走査型プローブ顕微鏡における走査技術には、以下の課題が残されている。すなわち、倒立顕微鏡と組み合わせた場合、高さ方向の空間が狭いため、走査機構をできるだけ薄くする必要がある。また、走査型プローブ顕微鏡では、走査精度を高めるために走査機構自体の剛性をできるだけ高くする必要がある。さらに、倒立顕微鏡での対象サンプルが生体細胞等の場合もあり、このような場合は特にスキャンエリアを広く設定する必要がある。
上記従来例では、水平微動機構上に垂直微動機構が直接かつ一体に連結された機構の場合、走査機構全体の高さが高くなり、スキャンエリアも広く設定することが困難であるという不都合がある。また、水平方向(X、Y方向)及び垂直方向(Z方向)の各軸微動機構を水平面上に横に配置したタイプや上記フラットスキャナタイプでは、走査機構全体を薄くできると共にスキャナエリアも広くできるが、走査機構全体の剛性が低いという不都合があった。特に、これらの場合、垂直方向における剛性を高めることが困難であった。
【0009】
本発明は、前述の課題に鑑みてなされたもので、機構自体の剛性を高めることができると共に高さも低くすることができる走査型プローブ顕微鏡用の走査機構及び走査型プローブ顕微鏡を提供することを目的とする。
【0010】
【課題を解決するための手段】
本発明は、前記課題を解決するために以下の構成を採用した。すなわち、本発明の走査型プローブ顕微鏡用の走査機構は、被測定物を載置するステージと、前記被測定物に近接又は接触させるプローブとを備えた走査型プローブ顕微鏡に取り付けられ、前記プローブを前記被測定物に対して3次元方向に相対的に移動させる走査機構であって、前記プローブと前記ステージとを2次元平面内で相対的に移動可能な水平微動機構と、前記プローブと前記ステージとを前記2次元平面に垂直な方向に相対的に移動可能な垂直微動機構とを備え、前記水平微動機構と前記垂直微動機構とが、分割して設置され、前記垂直微動機構が、前記ステージを直接支持していることを特徴とする。
【0011】
この走査型プローブ顕微鏡用の走査機構では、水平微動機構と垂直微動機構とが、分割して設置され、垂直微動機構がステージを直接支持しているので、水平微動機構と垂直微動機構とが一体に設けられた従来の機構に比べて垂直微動機構の剛性を高めることができる。特に、垂直微動機構が単独でステージを直接支持しているので、微動ストロークを比較的長くでき、垂直方向において高剛性を得ることができる。また、水平微動機構と垂直微動機構とが分割されているので、水平微動機構上に垂直微動機構を直接かつ一体に設けた従来例に比べ、走査機構全体の高さを低くするように配置することも可能である。
【0012】
また、本発明の走査型プローブ顕微鏡用の走査機構は、前記垂直微動機構が積層型圧電素子であることが好ましい。
すなわち、この走査型プローブ顕微鏡用の走査機構では、垂直微動機構を積層型圧電素子とすることにより、微動ストロークを大きく設定することができ、小型化しやすい。
【0013】
また、本発明の走査型プローブ顕微鏡用の走査機構は、前記垂直微動機構を支持する垂直微動機構台を備え、前記水平微動機構が、前記垂直微動機構台を水平方向に移動可能にかつ吊り下げ状態で支持していることを特徴とする。
すなわち、この走査型プローブ顕微鏡用の走査機構では、水平微動機構が垂直微動機構台を水平方向に移動可能にかつ吊り下げ状態で支持しているので、水平及び垂直方向の微動機構を直接連結した場合よりも走査機構全体の高さを低くすることができる。
【0014】
本発明の走査型プローブ顕微鏡は、被測定物を載置するステージと、前記被測定物に近接又は接触させるプローブと、該プローブを前記被測定物に対して3次元方向に相対的に移動させる走査機構とを備えた走査型プローブ顕微鏡であって、前記走査機構が、上記本発明の走査機構であることを特徴とする。
すなわち、この走査型プローブ顕微鏡では、上記本発明の走査機構を備えているので、上述した走査機構の作用を有し、高剛性な微動機構により、プローブ、サンプル及びステージの位置及び走査の高精度な制御が可能になる。
【0015】
また、本発明の走査型プローブ顕微鏡は、前記ステージが、前記垂直微動機構の上部に設けられたボールベアリングで支持され、前記ステージ及び前記垂直微動機構の一方に磁石が取り付けられていると共に他方に金属部が設けられ、互いに磁力により引きつけられていることを特徴とする。
すなわち、この走査型プローブ顕微鏡では、ステージが、垂直微動機構の上部に設けられたボールベアリングで支持されているので、ステージが動きやすくガタつきが生じ難い。さらに、ステージ及び垂直微動機構の一方に磁石が取り付けられていると共に他方に金属部が設けられ、互いに磁力により引きつけられているので、ステージが完全に固定されておらず、ステージが移動して対物レンズ等に接触しても、容易に外れて破損を防ぐことができる。
【0016】
また、本発明の走査型プローブ顕微鏡は、前記ステージの下方かつ前記プローブの直下に配され前記被測定物からの光を集光する対物レンズを備え、前記垂直微動機構が、前記対物レンズの周囲に配されていることを特徴とする。
すなわち、この走査型プローブ顕微鏡は、対物レンズをステージ下方に配した倒立顕微鏡を組み合わせたものであり、垂直微動機構が対物レンズの周囲に配されているので、対物レンズの設置空間を確保することができる。
【0017】
さらに、本発明の走査型プローブ顕微鏡は、前記垂直微動機構が、前記対物レンズを中心軸上に配した円筒状の積層型圧電素子であることが好ましい。
すなわち、この走査型プローブ顕微鏡では、倒立顕微鏡と組み合わせた場合に、円筒状の積層型圧電素子の内側に対物レンズを配した状態となるため、垂直方向のより高い剛性及び微動ストロークを得ることができる。
【0018】
【発明の実施の形態】
以下、本発明に係る走査型プローブ顕微鏡用の走査機構及びこれを備えた走査型プローブ顕微鏡の第1実施形態を、図1及び図2を参照しながら説明する。
【0019】
本実施形態の走査型プローブ顕微鏡は、図1に示すように、例えば蛍光染色された生体細胞等のサンプル(被測定物)Sにエバネッセント光(近接場光)を励起光として照射してサンプルSの局所的な光学特性を下方の対物レンズL1で集光し測定する倒立顕微鏡を組み合わせた走査型近接場顕微鏡である。この走査型プローブ顕微鏡は、サンプルSを載置するステージ2と、サンプルSに先端を近接させるプローブPと、該プローブPをサンプルSに対して2次元平面内に相対的に移動させサンプルSをプローブ先端に近接させるステッピングモータ等の粗動機構27と、該粗動機構27よりも高い分解能で微動可能にプローブPをサンプルSに対して3次元方向に相対的に移動させる走査機構8とを備えている。
【0020】
上記走査機構8は、プローブPとステージ2とを2次元平面(XY平面)内で相対的に移動可能な水平微動機構9と、プローブPとステージ2とを上記2次元平面に垂直な方向(Z方向)に相対的に移動可能な垂直微動機構10とを備えている。すなわち、水平微動機構9は、2次元平面内の走査を行うための2軸微動可能なアクチュエータであるXYスキャナとして機能し、垂直微動機構10は、プローブPとサンプルSとの間の距離制御を行うためのアクチュエータであるZスキャナとして機能する。
【0021】
上記水平微動機構9は、位置決め用のXYステージXY1を介して倒立顕微鏡7の支柱に固定され、垂直微動機構10を支持する垂直微動機構台11を水平方向に移動可能にかつ吊り下げ状態で支持している。この垂直微動機構台11は、垂直微動機構10が固定される中央台部11aと、該中央台部11aの周囲に設けられ上方に立設されていると共に半径方向外方に上部が突出して水平微動機構9の上部に支持された断面L字状の支持部11bとで構成されている。中央台部11aには、対物レンズL1が挿通可能な孔部11cが形成され、対物レンズL1の周囲に3本の垂直微動機構10が立設されている。したがって、本実施形態では、水平微動機構9と垂直微動機構10とが、垂直微動機構台11を介して分割して設置されている。
【0022】
なお、上記水平微動機構9は、2次元平面である水平面(X方向及びY方向の2軸)においてステージ2を走査可能な複数の圧電素子を内蔵したスキャナであり、例えば、微動ストロークの拡大機能付きフラットスキャナである。また、垂直微動機構10は、圧電材料と電極とを交互に積層させた積層型圧電素子(ピエゾ素子)である。
【0023】
上記垂直微動機構10は、図2に示すように、その上部に設けられたボールベアリング12によりステージ2を直接支持している。すなわち、垂直微動機構10における圧電素子本体10aの上部に、絶縁座10bが固定され、該絶縁座10b内には鉄製のヨーク10cと円筒状の磁石10dとが固定されている。上記ヨーク10cの上面には、ボールベアリング12が位置決めされて配される断面V字状の溝部10eが形成されている。また、前記ヨーク10c及び磁石10dに対向するステージ2の下面には、円環状の鉄プレート(金属部)2aが埋設されている。なお、該鉄プレート2aにも、ボールベアリング12が位置決めされて配される断面V字状の溝部2bが形成されている。したがって、ステージ2と垂直微動機構10とは、互いに磁力により引きつけられた状態とされている。
【0024】
上記プローブPは、光ファイバの先端付近が曲げられて、先端部を先鋭化して先端部分にナノメートルオーダーの微小開口部(図示略)が設けられ、その他の部分は金属膜(図示略)でコーティングされた構造を有している。また、プローブPの背面部分には、振幅検出用のレーザ光を反射させるためのミラー面が形成されている。
また、プローブPは、プローブホルダ13に基端側を固定され、該プローブホルダ13に設けられた圧電素子の振動子14により微小振動が加えられる。そして、この際、プローブPの振幅量は、振幅検出用発光部LDと振幅検出用受光部PDとを有し、光てこ方式を用いた光学ヘッド15によって検出される。
光学ヘッド15とプローブホルダ13とは、プローブ先端と対物レンズL1との光軸中心に位置決めするためのXYステージXY2を介して粗動機構27に固定される。
さらに、プローブPの基端は、レーザ光源16と光学的にカップリングされ、プローブPの先端開口付近にエバネッセント場が形成されるようになっている。
【0025】
上記対物レンズL1は、上述したようにサンプルSを挟んでプローブPと対向する側に配置されており、倒立顕微鏡7上に設置された対物レンズ駆動機構17上に設けられている。該対物レンズ駆動機構17は、光路を確保するために中心部に中空部分を設けた粗動用送りネジ機構18と、円筒状に形成された微動用積層型圧電素子19とで構成されている。
【0026】
また、対物レンズL1の下方であって倒立顕微鏡7内の空洞部7aには、ダイクロイックミラーMと吸収フィルタFとが設けられ、対物レンズL1で集光された光のうち励起光をカットして蛍光成分を外部に設けられた結像レンズL2へと反射するように配されている。この検出光は、結像レンズL2で結像され、さらに光検出器3に導入されるようになっている。また、該光検出器3は、対物レンズL1の焦点が合った状態で光軸が合うように設定されている。また、光検出器3は、受光面が数百μmと非常に小さいアバランシェフォトダイオードが用いられている。なお、この光検出器3では、受光面が小さいため僅かな焦点ズレが測定効率の低下を招くことになる。この光検出器3としては、他にもフォトマルや分光器などが使用される。
【0027】
なお、上記粗動機構27、走査機構(水平微動機構9及び垂直微動機構10)8及び対物レンズ駆動機構17は、いずれもCPU等の制御部Cに電気的に接続され、制御部Cによって所定の位置への移動を行うように制御される。
【0028】
次に、本実施形態の走査型プローブ装置を用いた測定方法について説明する。
【0029】
まず、対物レンズ駆動機構17の粗動用送りネジ機構18により、サンプルSの表面に対物レンズL1の焦点を合わせる。次に、プローブ側のXYステージXY2により対物レンズL1の光軸中心にプローブ先端を位置決めする。次に、プローブ先端とサンプルSとの間の距離制御を行う。すなわち、振動子14によりプローブPを共振周波数近傍で振動させながら、サンプルSに近接させたときの振幅の減衰量をモニタし、振幅が一定となるように垂直微動機構10を動作させる。そして、粗動機構27によりサンプルSとプローブ先端との間に原子間力が働く領域若しくは接触する領域までサンプルSをプローブ先端に近接させた後、垂直微動機構10によりサンプルSとプローブとの間が最適動作点となるように距離制御を行う。このとき、測定前に合わせた焦点位置は垂直微動機構10の動作分だけずれてしまう。このずれ量を補正するため、対物レンズ駆動機構17の微動用積層型圧電素子19を垂直微動機構10の移動量だけ変化させ、アプローチが完了した段階で対物レンズL1の焦点がプローブ先端の発光点に合うように設定する。
【0030】
以上のような動作により、アプローチ時のずれ量を補正した後は、プローブ先端と対物レンズL1との位置関係は一定に保たれるため、微動用積層型圧電素子19への印加電圧は一定に保ったままスキャン(走査)を行う。この状態で、水平微動機構9を用いてサンプルを2次元平面内でスキャンし、そのときの透過光を集光することにより、光信号の2次元強度分布が測定される。また、垂直微動機構10に印加される電圧をモニタすればサンプルSの凹凸像も同時に測定可能である。
【0031】
なお、焦点ずれの補正方法として、垂直微動機構10の変位を垂直微動機構10に取り付けた例えば静電容量型の変位センサ20により測定し、制御部Cにおいて変位センサ20から得られた変位信号に基づいてずれ量を認識し、フィードバックさせて垂直微動機構10の移動量を補正するクローズドループ方式を採用している。この変位センサ20を取り付けたことにより、圧電素子のヒステリシスやクリープ等を防止することができ、測定精度を向上させることができる。なお、変位センサは、静電容量型に限らず、光干渉法など別の方式のものも使用可能である。
【0032】
本実施形態の走査型プローブ顕微鏡では、水平微動機構9と垂直微動機構10とが分割して設置され、垂直微動機構10がステージ2を直接支持しているので、水平微動機構9と垂直微動機構10とが一体に設けられた従来の機構に比べて垂直微動機構10の剛性を高めることができる。特に、垂直微動機構10が単独でステージ2を直接支持しているので、微動ストロークを比較的長くでき、垂直方向において高剛性を得ることができる。
【0033】
また、垂直微動機構10を積層型圧電素子としているので、微動ストロークを大きく設定することができ、小型化しやすい。さらに、また、水平微動機構9と垂直微動機構10とが分割され、特に水平微動機構9が垂直微動機構台11を水平方向に移動可能にかつ吊り下げ状態で支持しているので、水平微動機構9上に垂直微動機構10を直接かつ一体に設けた従来例に比べ、走査機構8全体の高さを低くすることができる。
【0034】
また、ステージ2が、垂直微動機構10の上部に設けられたボールベアリング12で支持されているので、ステージ2が動きやすくガタつきが生じ難い。さらに、垂直微動機構10に磁石10dが取り付けられていると共にステージ2に鉄プレート2aが設けられ、互いに磁力により引きつけられているので、ステージ2が完全に固定されておらず、ステージ2が移動して対物レンズL1等に接触しても、容易に外れて破損を防ぐことができる。
【0035】
次に、本発明に係る走査型プローブ顕微鏡の第2及び3実施形態について、図3及び図4を参照して説明する。なお、以下の説明において、上記実施形態において説明した同一の構成要素には同一の符号を付し、その説明は省略する。
【0036】
第2実施形態と第1実施形態との異なる点は、第1実施形態では、対物レンズL1の周囲に配した3本の積層型圧電素子からなる垂直微動機構10によりステージ2を支持しているのに対し、第2実施形態の走査機構28では、図3に示すように、対物レンズL1を中心軸上に配した円筒状の積層型圧電素子である垂直微動機構30によりステージ2を支持している点である。
【0037】
すなわち、本実施形態では、一つの垂直微動機構30でステージ2を支持すると共に微動させると共に、円筒状の積層型圧電素子の内側に対物レンズL1を配した状態となるため、垂直方向のより高い剛性及び微動ストロークを得ることができる。
【0038】
第3実施形態と第1実施形態との異なる点は、第1実施形態では、水平微動機構9がステージ2下方側に位置されて垂直微動機構台11を介して垂直微動機構10と共にステージ2を移動させるのに対し、第3実施形態の走査機構38では、図4に示すように、垂直微動機構10が位置決め用XYステージXY1を介して倒立顕微鏡7上に立設されていると共に、水平微動機構49は、ステージ2の上方に配されてプローブPに接続され該プローブP側をステージ2に対して移動可能になっている点である。すなわち、本実施形態では、水平微動機構49がプローブPを直接移動させるレバースキャン式となっている。この水平微動機構49は、プローブ先端を対物レンズL1の光軸に対して位置決めするためのXYステージXY2を介して粗動機構27に接続されている。
本実施形態においても、垂直微動機構10でステージ2を直接支持しているため、垂直方向に高剛性を得ることができる。
【0039】
なお、本発明の技術範囲は上記実施の形態に限定されるものではなく、本発明の趣旨を逸脱しない範囲において種々の変更を加えることが可能である。
【0040】
例えば、上記第1実施形態では、垂直微動機構10を積層型圧電素子としたが、単に円筒状圧電素子としても良い。この場合、上述したように垂直方向の微動ストロークについては積層型圧電素子よりも不利となる。
また、第3実施形態においても、垂直微動機構10を第2実施形態と同様に円筒状の積層型圧電素子としても構わない。
【0041】
また、プローブ先端とサンプルSとの距離制御の他の手段として、プローブを振動させずに撓み量が一定となるように制御を掛ける方式、サンプルに対して水平方向にプローブを振動させ、その時のシアフォースによるプローブの減衰量がゼロになるように制御を掛ける方式、プローブに金属コートを施し、導電性サンプルとの間にトンネル電流を発生させ、トンネル電流の距離依存性を利用して制御を掛ける方式、プローブ先端で発生するエバネッセント光をサンプル表面で散乱させ、その散乱光強度を測定してエバネッセント場の距離依存性を利用して制御を行う方式などが考えられる。
【0042】
また、プローブ形状も、上記各実施形態に示したベント型に限らず、ストレート型プローブや、光導波路を形成したカンチレバー型プローブなども考えられる。さらに、プローブの振幅量の検出方式としては光てこ方式の他に、水晶振動子や圧電体にプローブを固定し、電荷量の変化を利用して振幅量を検出する方式なども使用可能である。
また、上記各実施形態では、走査型プローブ顕微鏡として走査型近接場顕微鏡に適用したが、他の走査型プローブ顕微鏡に採用しても構わない。例えば、AFM(原子間力顕微鏡)等に適用してもよい。
【0043】
【発明の効果】
本発明によれば、以下の効果を奏する。
すなわち、本発明に係る走査型プローブ顕微鏡によれば、水平微動機構と垂直微動機構とが分割して設置され、垂直微動機構がステージを直接支持しているので、垂直方向において高剛性を得ることができると共に垂直方向の微動ストロークを長くすることができる。また、水平微動機構上に垂直微動機構を直接かつ一体に設けた従来例に比べ、走査機構全体の高さを低くするように配置することも可能となり、倒立顕微鏡との組み合わせが容易となる。したがって、本発明では、高剛性な微動機構により、プローブ、サンプル及びステージの位置及び走査の高精度な制御が可能になり、走査型近接場顕微鏡に適用した場合、集光効率、分解能、光検出器の受光効率及びS/N比等のさらなる向上が可能になって、より高精度かつ正確な測定を実現することができる。
【図面の簡単な説明】
【図1】本発明に係る第1実施形態の走査型プローブ顕微鏡の全体構成を示す概要図である。
【図2】本発明に係る第1実施形態の走査型プローブ顕微鏡における垂直微動機構の上部を示す拡大断面図である。
【図3】本発明に係る第2実施形態の走査型プローブ顕微鏡における要部の構成を示す概要図である。
【図4】本発明に係る第3実施形態の走査型プローブ顕微鏡における要部の構成を示す概要図である。
【図5】本発明に係る従来例の走査型プローブ顕微鏡の全体構成を示す概要図である。
【符号の説明】
2 ステージ
2a 鉄プレート(金属部)
7 倒立顕微鏡
8、28、38 走査機構
9、49 水平微動機構
10、30 垂直微動機構
10d 磁石
11 垂直微動機構台
12 ボールベアリング
17 対物レンズ駆動機構
27 粗動機構
C 制御部
L1 対物レンズ
S サンプル(被測定物)
P プローブ
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a scanning mechanism and a scanning probe microscope for a scanning probe microscope such as a scanning near-field microscope.
[0002]
[Prior art]
In a conventional scanning probe microscope (SPM), for example, taking a scanning near-field microscope as an example, a sample S is mounted on a stage 2 on a three-axis fine movement mechanism 1 as shown in FIG. Is irradiated on the surface of the sample S, local optical characteristics of the sample S are collected by the objective lens L1 disposed on the transmission side, and the collected optical signal is introduced into the photodetector 3. It is configured to measure optical characteristics on the sample S (for example, see Patent Document 1). That is, in this conventional example, the objective lens L1 is of a type in which an inverted microscope supported below the stage 2 is combined.
[0003]
During the measurement, evanescent light is emitted as excitation light from the tip of the probe P. The evanescent light exists only in the vicinity of the probe P, and its intensity attenuates exponentially with the distance from the tip of the probe. The sample S is irradiated with the evanescent light at the position. In this state, the measurement is performed by relatively moving the tip of the probe and the sample S and scanning the surface of the sample S.
[0004]
The most typical positioning method between the probe tip and the sample S is a method in which the sharpness of the probe tip is used to control the distance between the probe tip and the sample surface by an atomic force acting between the sample surface and the probe tip. is there. In this case, since the interatomic force depends on the distance between the tip of the probe and the sample surface, the vertical fine movement mechanism 4 of the three-axis fine movement mechanism 1 is controlled so that the distance between them is constant. Further, by scanning the sample S in a two-dimensional plane by the horizontal fine movement mechanism 5 of the three-axis fine movement mechanism 1 while performing the distance control as described above, the optical characteristics in the two-dimensional plane are measured. In addition, the unevenness image on the sample surface can be simultaneously measured by the voltage applied to the vertical fine movement mechanism 4.
In the three-axis fine movement mechanism 1, which is a scanning mechanism, three are provided around the objective lens L1 and the vertical fine movement mechanism 4 is provided directly on the horizontal fine movement mechanism 5, so that the three-axis fine movement mechanism 1 is integrated. Stage 2 is supported. Note that the horizontal fine movement mechanism 5 and the vertical fine movement mechanism 4 are formed of cylindrical piezoelectric elements (piezo elements).
[0005]
In a scanning probe microscope combined with an inverted microscope as described above, a lever scan is performed. For example, when scanning is performed with a scanning near-field microscope, when the lever scan method is used, a focus shift occurs between the objective lens L1 and the tip of the probe, and thus it is necessary to scan the sample surface. When performing this sample scan, a space is required in the middle of the scanning mechanism.
[0006]
Further, as another conventional example of the three-axis fine movement mechanism used for the scanning probe microscope as described above, a type in which four piezoelectric elements are installed horizontally horizontally is known (for example, see Patent Document 2). ).
Further, as another conventional example of the three-axis fine movement mechanism, a commercially available so-called flat scanner or the like is known. This flat scanner has a structure in which a plurality of stacked piezoelectric elements and a mechanism for enlarging a fine stroke are combined (for example, see Non-Patent Document 3).
[0007]
[Patent Document 1]
JP-A-2000-304755 (paragraphs 0002 to 0003 and FIG. 7)
[Patent Document 2]
US Patent No. 5,705,878 [Non-Patent Document 3]
Physik Instrumente's products P-517, P-527, [online], [searched February 24, 2002], Internet <URL: http: // www. physikinstrumente. de / products / prdetail. php? second = 2-32>
[0008]
[Problems to be solved by the invention]
However, the following problems remain in the scanning technique in the conventional scanning probe microscope. That is, when combined with an inverted microscope, the space in the height direction is narrow, so the scanning mechanism needs to be as thin as possible. Further, in the scanning probe microscope, it is necessary to increase the rigidity of the scanning mechanism itself as much as possible in order to increase the scanning accuracy. Furthermore, the target sample in the inverted microscope may be a living cell or the like, and in such a case, it is particularly necessary to set a wide scan area.
In the above-described conventional example, in the case of a mechanism in which the vertical fine movement mechanism is directly and integrally connected to the horizontal fine movement mechanism, there is a disadvantage that the height of the entire scanning mechanism increases and it is difficult to set a wide scan area. . Further, in the type in which the horizontal fine movement mechanisms in the horizontal direction (X and Y directions) and the vertical direction (Z direction) are horizontally arranged on a horizontal plane or in the flat scanner type, the entire scanning mechanism can be thinned and the scanner area can be widened. However, there is a disadvantage that the rigidity of the entire scanning mechanism is low. In particular, in these cases, it was difficult to increase the rigidity in the vertical direction.
[0009]
The present invention has been made in view of the above-described problems, and provides a scanning mechanism and a scanning probe microscope for a scanning probe microscope that can increase the rigidity of the mechanism itself and reduce the height. Aim.
[0010]
[Means for Solving the Problems]
The present invention has the following features to attain the object mentioned above. That is, the scanning mechanism for a scanning probe microscope of the present invention is mounted on a scanning probe microscope including a stage on which an object to be measured is mounted, and a probe that comes close to or comes into contact with the object to be measured. A scanning mechanism for moving the probe and the stage relatively in a two-dimensional plane; a scanning mechanism for moving the probe and the stage relatively in a two-dimensional plane; A vertical fine movement mechanism capable of relatively moving the horizontal fine movement mechanism in a direction perpendicular to the two-dimensional plane, wherein the horizontal fine movement mechanism and the vertical fine movement mechanism are separately installed, and the vertical fine movement mechanism is mounted on the stage. Is directly supported.
[0011]
In the scanning mechanism for the scanning probe microscope, the horizontal fine movement mechanism and the vertical fine movement mechanism are divided and installed, and the vertical fine movement mechanism directly supports the stage. Therefore, the horizontal fine movement mechanism and the vertical fine movement mechanism are integrated. The rigidity of the vertical fine movement mechanism can be increased as compared with the conventional mechanism provided in. In particular, since the vertical fine movement mechanism alone directly supports the stage, the fine movement stroke can be made relatively long, and high rigidity can be obtained in the vertical direction. In addition, since the horizontal fine movement mechanism and the vertical fine movement mechanism are divided, they are arranged so that the height of the entire scanning mechanism is reduced as compared with the conventional example in which the vertical fine movement mechanism is provided directly and integrally on the horizontal fine movement mechanism. It is also possible.
[0012]
In the scanning mechanism for a scanning probe microscope of the present invention, it is preferable that the vertical fine movement mechanism is a laminated piezoelectric element.
That is, in the scanning mechanism for the scanning probe microscope, the vertical fine movement mechanism is a stacked piezoelectric element, so that the fine movement stroke can be set large and the size can be easily reduced.
[0013]
Further, the scanning mechanism for a scanning probe microscope of the present invention includes a vertical fine movement mechanism base supporting the vertical fine movement mechanism, and the horizontal fine movement mechanism suspends the vertical fine movement mechanism base so as to be movable in a horizontal direction. It is characterized by being supported in a state.
In other words, in the scanning mechanism for this scanning probe microscope, the horizontal fine movement mechanism directly supports the horizontal and vertical fine movement mechanisms because the horizontal fine movement mechanism supports the vertical fine movement mechanism base so as to be movable in the horizontal direction and in a suspended state. The height of the entire scanning mechanism can be made lower than in the case.
[0014]
A scanning probe microscope according to the present invention includes a stage on which an object to be measured is mounted, a probe that approaches or contacts the object to be measured, and a probe that is relatively moved in a three-dimensional direction with respect to the object to be measured. A scanning probe microscope including a scanning mechanism, wherein the scanning mechanism is the above-described scanning mechanism of the present invention.
That is, since this scanning probe microscope is provided with the above-described scanning mechanism of the present invention, it has the function of the above-described scanning mechanism, and the position of the probe, the sample and the stage and the high accuracy of the scanning are achieved by the highly rigid fine movement mechanism. Control becomes possible.
[0015]
Further, in the scanning probe microscope of the present invention, the stage is supported by a ball bearing provided on an upper part of the vertical fine movement mechanism, and a magnet is attached to one of the stage and the vertical fine movement mechanism and the other is provided to the other. A metal portion is provided and is attracted to each other by magnetic force.
That is, in this scanning probe microscope, since the stage is supported by the ball bearing provided on the upper part of the vertical fine movement mechanism, the stage is easy to move and rattling hardly occurs. Further, since the magnet is attached to one of the stage and the vertical fine movement mechanism and the other is provided with a metal part and is attracted to each other by magnetic force, the stage is not completely fixed, and the stage moves and the objective moves. Even if it comes into contact with a lens or the like, it can be easily removed to prevent damage.
[0016]
Further, the scanning probe microscope of the present invention includes an objective lens arranged below the stage and directly below the probe and condensing light from the object to be measured, and the vertical fine movement mechanism is provided around the objective lens. It is characterized by being arranged in.
That is, this scanning probe microscope is a combination of an inverted microscope in which the objective lens is arranged below the stage, and the vertical fine movement mechanism is arranged around the objective lens, so that the installation space for the objective lens is secured. Can be.
[0017]
Further, in the scanning probe microscope of the present invention, it is preferable that the vertical fine movement mechanism is a cylindrical laminated piezoelectric element having the objective lens arranged on a central axis.
That is, in this scanning probe microscope, when combined with an inverted microscope, the objective lens is arranged inside the cylindrical laminated piezoelectric element, so that higher rigidity and fine movement stroke in the vertical direction can be obtained. it can.
[0018]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, a first embodiment of a scanning mechanism for a scanning probe microscope according to the present invention and a scanning probe microscope including the scanning mechanism will be described with reference to FIGS.
[0019]
As shown in FIG. 1, the scanning probe microscope according to the present embodiment irradiates a sample (measurement object) S of, for example, a fluorescently-stained living cell with evanescent light (near-field light) as excitation light. Is a scanning near-field microscope combined with an inverted microscope that collects and measures the local optical characteristics of the optical system with a lower objective lens L1. The scanning probe microscope includes a stage 2 on which a sample S is placed, a probe P whose tip is close to the sample S, and a movement of the probe P relative to the sample S within a two-dimensional plane to move the sample S. A coarse movement mechanism 27 such as a stepping motor which is brought close to the probe tip; and a scanning mechanism 8 which moves the probe P relative to the sample S in a three-dimensional direction so as to be finely movable with a higher resolution than the coarse movement mechanism 27. Have.
[0020]
The scanning mechanism 8 includes a horizontal fine movement mechanism 9 that can relatively move the probe P and the stage 2 within a two-dimensional plane (XY plane) and a direction perpendicular to the two-dimensional plane ( (A Z direction). That is, the horizontal fine movement mechanism 9 functions as an XY scanner which is an actuator capable of performing two-axis fine movement for performing scanning in a two-dimensional plane, and the vertical fine movement mechanism 10 controls the distance between the probe P and the sample S. It functions as a Z scanner which is an actuator for performing the operation.
[0021]
The horizontal fine movement mechanism 9 is fixed to a column of the inverted microscope 7 via an XY stage XY1 for positioning, and supports a vertical fine movement mechanism base 11 that supports a vertical fine movement mechanism 10 so as to be movable in the horizontal direction and in a suspended state. are doing. The vertical fine movement mechanism base 11 is provided with a central base part 11a to which the vertical fine movement mechanism 10 is fixed, and is provided around the central base part 11a and is erected upward, and the upper part protrudes outward in the radial direction to be horizontal. And a support portion 11b having an L-shaped cross section supported on the upper portion of the fine movement mechanism 9. A hole 11c through which the objective lens L1 can be inserted is formed in the center base portion 11a, and three vertical fine movement mechanisms 10 are erected around the objective lens L1. Therefore, in the present embodiment, the horizontal fine movement mechanism 9 and the vertical fine movement mechanism 10 are separately installed via the vertical fine movement mechanism base 11.
[0022]
The horizontal fine movement mechanism 9 is a scanner including a plurality of piezoelectric elements capable of scanning the stage 2 on a horizontal plane (two axes in the X direction and the Y direction) which is a two-dimensional plane. With flat scanner. The vertical fine movement mechanism 10 is a laminated piezoelectric element (piezo element) in which piezoelectric materials and electrodes are alternately laminated.
[0023]
As shown in FIG. 2, the vertical fine movement mechanism 10 directly supports the stage 2 by a ball bearing 12 provided on the upper part thereof. That is, an insulating seat 10b is fixed above the piezoelectric element main body 10a in the vertical fine movement mechanism 10, and an iron yoke 10c and a cylindrical magnet 10d are fixed inside the insulating seat 10b. On the upper surface of the yoke 10c, a groove 10e having a V-shaped cross section in which the ball bearing 12 is positioned and arranged is formed. An annular iron plate (metal portion) 2a is embedded on the lower surface of the stage 2 facing the yoke 10c and the magnet 10d. The iron plate 2a is also formed with a V-shaped groove 2b in which the ball bearing 12 is positioned and arranged. Therefore, the stage 2 and the vertical fine movement mechanism 10 are attracted to each other by magnetic force.
[0024]
In the probe P, the vicinity of the tip of the optical fiber is bent, the tip is sharpened, and a minute opening (not shown) on the order of nanometers is provided at the tip, and the other portion is made of a metal film (not shown). It has a coated structure. Further, a mirror surface for reflecting the laser beam for amplitude detection is formed on the back surface of the probe P.
The probe P has a base end fixed to the probe holder 13, and a minute vibration is applied by a vibrator 14 of a piezoelectric element provided on the probe holder 13. At this time, the amplitude of the probe P is detected by the optical head 15 having an amplitude detecting light emitting unit LD and an amplitude detecting light receiving unit PD and using an optical lever system.
The optical head 15 and the probe holder 13 are fixed to the coarse movement mechanism 27 via an XY stage XY2 for positioning the probe tip and the objective lens L1 at the center of the optical axis.
Further, the proximal end of the probe P is optically coupled to the laser light source 16 so that an evanescent field is formed near the distal opening of the probe P.
[0025]
The objective lens L <b> 1 is disposed on the side facing the probe P with the sample S interposed therebetween as described above, and is provided on the objective lens driving mechanism 17 installed on the inverted microscope 7. The objective lens driving mechanism 17 is composed of a coarse movement feed screw mechanism 18 having a hollow portion at the center to secure an optical path, and a fine movement multilayer piezoelectric element 19 formed in a cylindrical shape.
[0026]
A dichroic mirror M and an absorption filter F are provided below the objective lens L1 and in the cavity 7a in the inverted microscope 7, and cut out the excitation light from the light collected by the objective lens L1. The fluorescent component is disposed so as to be reflected to an imaging lens L2 provided outside. This detection light is formed into an image by the imaging lens L2, and is further introduced to the photodetector 3. The photodetector 3 is set so that the optical axis is aligned with the objective lens L1 in focus. The photodetector 3 uses an avalanche photodiode whose light receiving surface is as small as several hundred μm. In this photodetector 3, a slight defocus causes a decrease in measurement efficiency because the light receiving surface is small. As the photodetector 3, a photomultiplier, a spectroscope, or the like is also used.
[0027]
The coarse movement mechanism 27, the scanning mechanism (the horizontal fine movement mechanism 9 and the vertical fine movement mechanism 10) 8, and the objective lens driving mechanism 17 are all electrically connected to a control unit C such as a CPU. Is controlled to be moved to the position.
[0028]
Next, a measurement method using the scanning probe device of the present embodiment will be described.
[0029]
First, the objective lens L1 is focused on the surface of the sample S by the coarse movement feed screw mechanism 18 of the objective lens driving mechanism 17. Next, the probe tip is positioned at the center of the optical axis of the objective lens L1 by the XY stage XY2 on the probe side. Next, distance control between the tip of the probe and the sample S is performed. That is, while the probe P is vibrated near the resonance frequency by the vibrator 14, the amount of attenuation of the amplitude when the probe P is brought close to the sample S is monitored, and the vertical fine movement mechanism 10 is operated so that the amplitude becomes constant. Then, after the sample S is brought close to the probe tip to an area where an atomic force acts between or contacts the sample S and the probe tip by the coarse movement mechanism 27, the vertical fine movement mechanism 10 causes the sample S to move between the sample S and the probe. Is controlled so that is the optimum operating point. At this time, the focus position adjusted before the measurement is shifted by an amount corresponding to the operation of the vertical fine movement mechanism 10. In order to correct this shift amount, the fine-movement laminated piezoelectric element 19 of the objective lens drive mechanism 17 is changed by the movement amount of the vertical fine movement mechanism 10, and when the approach is completed, the focus of the objective lens L1 is shifted to the light emitting point at the tip of the probe. Set to match.
[0030]
After correcting the amount of displacement at the time of approaching by the above operation, the positional relationship between the tip of the probe and the objective lens L1 is kept constant, so that the voltage applied to the fine-movement laminated piezoelectric element 19 is kept constant. A scan is performed while keeping it. In this state, the sample is scanned in a two-dimensional plane using the horizontal fine movement mechanism 9 and the transmitted light at that time is collected, whereby the two-dimensional intensity distribution of the optical signal is measured. Further, if the voltage applied to the vertical fine movement mechanism 10 is monitored, an uneven image of the sample S can be measured at the same time.
[0031]
In addition, as a method of correcting the defocus, the displacement of the vertical fine movement mechanism 10 is measured by, for example, a capacitance type displacement sensor 20 attached to the vertical fine movement mechanism 10, and the control unit C outputs a displacement signal obtained from the displacement sensor 20. A closed-loop system is used in which the amount of deviation is recognized based on the amount of movement, and the amount of movement of the vertical fine movement mechanism 10 is corrected by feedback. By attaching this displacement sensor 20, hysteresis and creep of the piezoelectric element can be prevented, and the measurement accuracy can be improved. Note that the displacement sensor is not limited to the capacitance type, and another type such as an optical interference method can be used.
[0032]
In the scanning probe microscope of the present embodiment, the horizontal fine movement mechanism 9 and the vertical fine movement mechanism 10 are divided and installed, and the vertical fine movement mechanism 10 directly supports the stage 2. The rigidity of the vertical fine movement mechanism 10 can be increased as compared with a conventional mechanism in which the vertical movement mechanism 10 is integrally provided. In particular, since the vertical fine movement mechanism 10 directly supports the stage 2 alone, the fine movement stroke can be relatively long, and high rigidity can be obtained in the vertical direction.
[0033]
Further, since the vertical fine movement mechanism 10 is a stacked piezoelectric element, the fine movement stroke can be set large, and the size can be easily reduced. Furthermore, the horizontal fine movement mechanism 9 and the vertical fine movement mechanism 10 are divided, and in particular, the horizontal fine movement mechanism 9 supports the vertical fine movement mechanism base 11 so as to be movable in the horizontal direction and in a suspended state. As compared with the conventional example in which the vertical fine movement mechanism 10 is provided directly and integrally on the scanning mechanism 9, the entire height of the scanning mechanism 8 can be reduced.
[0034]
Further, since the stage 2 is supported by the ball bearing 12 provided on the upper part of the vertical fine movement mechanism 10, the stage 2 is easy to move, and the backlash hardly occurs. Further, since the magnet 10d is attached to the vertical fine movement mechanism 10 and the iron plate 2a is provided on the stage 2 and are attracted to each other by magnetic force, the stage 2 is not completely fixed and the stage 2 moves. Therefore, even if it comes into contact with the objective lens L1 or the like, it can be easily detached to prevent damage.
[0035]
Next, second and third embodiments of the scanning probe microscope according to the present invention will be described with reference to FIGS. In the following description, the same components as those described in the above embodiment are denoted by the same reference numerals, and description thereof will be omitted.
[0036]
The difference between the second embodiment and the first embodiment is that in the first embodiment, the stage 2 is supported by a vertical fine movement mechanism 10 composed of three laminated piezoelectric elements arranged around the objective lens L1. On the other hand, in the scanning mechanism 28 of the second embodiment, as shown in FIG. 3, the stage 2 is supported by the vertical fine movement mechanism 30 which is a cylindrical laminated piezoelectric element having the objective lens L1 arranged on the central axis. That is the point.
[0037]
That is, in the present embodiment, the stage 2 is supported and finely moved by one vertical fine movement mechanism 30, and the objective lens L1 is arranged inside the cylindrical laminated piezoelectric element. Rigidity and fine movement stroke can be obtained.
[0038]
The difference between the third embodiment and the first embodiment is that, in the first embodiment, the horizontal fine movement mechanism 9 is located below the stage 2 and the stage 2 is moved together with the vertical fine movement mechanism 10 via the vertical fine movement mechanism base 11. On the other hand, in the scanning mechanism 38 of the third embodiment, as shown in FIG. 4, the vertical fine movement mechanism 10 is set up on the inverted microscope 7 via the positioning XY stage XY1, and the horizontal fine movement is performed. The mechanism 49 is arranged above the stage 2 and connected to the probe P so that the probe P can move with respect to the stage 2. That is, in this embodiment, the horizontal fine movement mechanism 49 is of a lever scan type in which the probe P is directly moved. The horizontal fine movement mechanism 49 is connected to the coarse movement mechanism 27 via an XY stage XY2 for positioning the tip of the probe with respect to the optical axis of the objective lens L1.
Also in the present embodiment, since the stage 2 is directly supported by the vertical fine movement mechanism 10, high rigidity can be obtained in the vertical direction.
[0039]
The technical scope of the present invention is not limited to the above-described embodiment, and various changes can be made without departing from the spirit of the present invention.
[0040]
For example, in the first embodiment, the vertical fine movement mechanism 10 is a laminated piezoelectric element, but may be a simple cylindrical piezoelectric element. In this case, as described above, the fine movement stroke in the vertical direction is disadvantageous as compared with the stacked piezoelectric element.
Also in the third embodiment, the vertical fine movement mechanism 10 may be a cylindrical laminated piezoelectric element as in the second embodiment.
[0041]
Further, as another means of controlling the distance between the tip of the probe and the sample S, a method of controlling the deflection so as to be constant without vibrating the probe, vibrating the probe in the horizontal direction with respect to the sample, A method in which the attenuation of the probe due to shear force is controlled to be zero, a metal coating is applied to the probe, a tunnel current is generated between the probe and the conductive sample, and control is performed using the distance dependence of the tunnel current. A method in which evanescent light generated at the tip of the probe is scattered on the sample surface, the intensity of the scattered light is measured, and control is performed using the distance dependence of the evanescent field can be considered.
[0042]
Further, the shape of the probe is not limited to the bent type shown in each of the above embodiments, but may be a straight type probe or a cantilever type probe having an optical waveguide formed thereon. Further, as a method of detecting the amplitude of the probe, in addition to the optical lever method, a method of fixing the probe to a quartz oscillator or a piezoelectric body and detecting the amplitude by utilizing a change in the amount of charge can be used. .
In each of the above embodiments, the scanning probe microscope is applied to the scanning near-field microscope. However, the scanning probe microscope may be applied to other scanning probe microscopes. For example, the present invention may be applied to an AFM (atomic force microscope) or the like.
[0043]
【The invention's effect】
According to the present invention, the following effects can be obtained.
That is, according to the scanning probe microscope of the present invention, the horizontal fine movement mechanism and the vertical fine movement mechanism are separately installed, and the vertical fine movement mechanism directly supports the stage, thereby obtaining high rigidity in the vertical direction. And the vertical fine movement stroke can be lengthened. Further, as compared with the conventional example in which the vertical fine movement mechanism is directly and integrally provided on the horizontal fine movement mechanism, it is possible to arrange the scanning mechanism so that the height of the whole scanning mechanism is reduced, and the combination with the inverted microscope becomes easy. Therefore, in the present invention, the position and scanning of the probe, sample, and stage can be controlled with high precision by the highly rigid fine movement mechanism. When applied to a scanning near-field microscope, light collection efficiency, resolution, and light detection It is possible to further improve the light receiving efficiency and the S / N ratio of the device, and to realize more accurate and accurate measurement.
[Brief description of the drawings]
FIG. 1 is a schematic diagram showing an overall configuration of a scanning probe microscope according to a first embodiment of the present invention.
FIG. 2 is an enlarged sectional view showing an upper part of a vertical fine movement mechanism in the scanning probe microscope according to the first embodiment of the present invention.
FIG. 3 is a schematic diagram showing a configuration of a main part in a scanning probe microscope according to a second embodiment of the present invention.
FIG. 4 is a schematic diagram showing a configuration of a main part in a scanning probe microscope according to a third embodiment of the present invention.
FIG. 5 is a schematic diagram showing the overall configuration of a conventional scanning probe microscope according to the present invention.
[Explanation of symbols]
2 Stage 2a Iron plate (metal part)
7 Inverted microscope 8, 28, 38 Scanning mechanism 9, 49 Horizontal fine movement mechanism 10, 30 Vertical fine movement mechanism 10d Magnet 11 Vertical fine movement mechanism base 12 Ball bearing 17 Objective lens drive mechanism 27 Coarse movement mechanism C Control unit L1 Objective lens S Sample ( DUT)
P probe

Claims (7)

被測定物を載置するステージと、前記被測定物に近接又は接触させるプローブとを備えた走査型プローブ顕微鏡に取り付けられ、前記プローブを前記被測定物に対して3次元方向に相対的に移動させる走査機構であって、
前記プローブと前記ステージとを2次元平面内で相対的に移動可能な水平微動機構と、
前記プローブと前記ステージとを前記2次元平面に垂直な方向に相対的に移動可能な垂直微動機構とを備え、
前記水平微動機構と前記垂直微動機構とが、分割して設置され、
前記垂直微動機構が、前記ステージを直接支持していることを特徴とする走査型プローブ顕微鏡用の走査機構。
The probe is attached to a scanning probe microscope having a stage on which an object to be measured is mounted and a probe that comes close to or comes into contact with the object to be measured, and moves the probe relative to the object to be measured in a three-dimensional direction. Scanning mechanism,
A horizontal fine movement mechanism capable of relatively moving the probe and the stage in a two-dimensional plane,
A vertical fine movement mechanism capable of relatively moving the probe and the stage in a direction perpendicular to the two-dimensional plane,
The horizontal fine movement mechanism and the vertical fine movement mechanism are divided and installed,
A scanning mechanism for a scanning probe microscope, wherein the vertical fine movement mechanism directly supports the stage.
請求項1に記載の走査型プローブ顕微鏡用の走査機構において、
前記垂直微動機構が、積層型圧電素子であることを特徴とする走査型プローブ顕微鏡用の走査機構。
The scanning mechanism for a scanning probe microscope according to claim 1,
A scanning mechanism for a scanning probe microscope, wherein the vertical fine movement mechanism is a laminated piezoelectric element.
請求項1又は2に記載の走査型プローブ顕微鏡用の走査機構において、
前記垂直微動機構を支持する垂直微動機構台を備え、
前記水平微動機構が、前記垂直微動機構台を水平方向に移動可能にかつ吊り下げ状態で支持していることを特徴とする走査型プローブ顕微鏡用の走査機構。
A scanning mechanism for a scanning probe microscope according to claim 1,
A vertical fine movement mechanism supporting the vertical fine movement mechanism,
A scanning mechanism for a scanning probe microscope, wherein the horizontal fine movement mechanism supports the vertical fine movement mechanism base so as to be movable in a horizontal direction and in a suspended state.
被測定物を載置するステージと、前記被測定物に近接又は接触させるプローブと、該プローブを前記被測定物に対して3次元方向に相対的に移動させる走査機構とを備えた走査型プローブ顕微鏡であって、
前記走査機構が、請求項1から3のいずれかに記載の走査機構であることを特徴とする走査型プローブ顕微鏡。
A scanning probe including a stage for mounting an object to be measured, a probe for approaching or contacting the object to be measured, and a scanning mechanism for moving the probe relative to the object to be measured in a three-dimensional direction. A microscope,
The scanning probe microscope according to claim 1, wherein the scanning mechanism is the scanning mechanism according to claim 1.
請求項4に記載の走査型プローブ顕微鏡において、
前記ステージが、前記垂直微動機構の上部に設けられたボールベアリングで支持され、
前記ステージ及び前記垂直微動機構の一方に磁石が取り付けられていると共に他方に金属部が設けられ、互いに磁力により引きつけられていることを特徴とする走査型プローブ装置。
The scanning probe microscope according to claim 4,
The stage is supported by a ball bearing provided above the vertical fine movement mechanism,
A scanning probe device, wherein a magnet is attached to one of the stage and the vertical fine movement mechanism, and a metal part is provided on the other, and are attracted to each other by magnetic force.
請求項4または5に記載の走査型プローブ顕微鏡において、
前記ステージの下方かつ前記プローブの直下に配され前記被測定物からの光を集光する対物レンズを備え、
前記垂直微動機構が、前記対物レンズの周囲に配されていることを特徴とする走査型プローブ顕微鏡。
The scanning probe microscope according to claim 4 or 5,
An objective lens is provided below the stage and directly below the probe to collect light from the object to be measured,
The scanning probe microscope, wherein the vertical fine movement mechanism is arranged around the objective lens.
請求項6に記載の走査型プローブ顕微鏡において、
前記垂直微動機構が、前記対物レンズを中心軸上に配した円筒状の積層型圧電素子であることを特徴とする走査型プローブ顕微鏡。
The scanning probe microscope according to claim 6,
A scanning probe microscope, wherein the vertical fine movement mechanism is a cylindrical laminated piezoelectric element in which the objective lens is arranged on a central axis.
JP2003048591A 2003-02-26 2003-02-26 Scanning mechanism for scanning probe microscope and scanning probe microscope Expired - Fee Related JP4162508B2 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006090594A1 (en) * 2005-02-24 2006-08-31 Sii Nanotechnology Inc. Inching mechanism for scanning probe microscope and scanning probe microscope employing it

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006090594A1 (en) * 2005-02-24 2006-08-31 Sii Nanotechnology Inc. Inching mechanism for scanning probe microscope and scanning probe microscope employing it
US7614288B2 (en) 2005-02-24 2009-11-10 Sii Nano Technology Inc. Scanning probe microscope fine-movement mechanism and scanning probe microscope using same
JP5111102B2 (en) * 2005-02-24 2012-12-26 エスアイアイ・ナノテクノロジー株式会社 Fine movement mechanism for scanning probe microscope and scanning probe microscope using the same

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