JP2004225156A - Float for suppressing evaporation and/or controlling temperature of plating liquid - Google Patents

Float for suppressing evaporation and/or controlling temperature of plating liquid Download PDF

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Publication number
JP2004225156A
JP2004225156A JP2003046560A JP2003046560A JP2004225156A JP 2004225156 A JP2004225156 A JP 2004225156A JP 2003046560 A JP2003046560 A JP 2003046560A JP 2003046560 A JP2003046560 A JP 2003046560A JP 2004225156 A JP2004225156 A JP 2004225156A
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Japan
Prior art keywords
plating
float
plating solution
regular
floating body
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Pending
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JP2003046560A
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Japanese (ja)
Inventor
Hirosuke Sato
裕亮 佐藤
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Individual
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Individual
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a plating float capable of suppressing evaporation of plating solution and/or heat radiation from plating solution in a plating solution tank by allowing the plating float on the plating solution surface in the plating solution tank in the wet type plating. <P>SOLUTION: The bulk specific gravity of the plating float is set to be smaller than the specific gravity of the plating solution. The float includes a columnar float, a flanged float and a float with a rotation preventive means added thereto. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

【0001】
【発明の属する技術分野】
本発明は電気メッキ法、無電解メッキ法(化学メッキ法)、或いは、複合メッキ法などの湿式メッキに用いる浮子体に関する。更に詳しくは、本発明は湿式メッキにおけるメッキ液槽内のメッキ液面上に浮遊せしめ、且つ、前記メッキ液面を覆うように配置してなるメッキ液槽内のメッキ液の蒸発抑止及び/又はメッキ液からの放熱抑止を効率良く行い得るメッキ用浮子体に関する。
【0002】
【従来の技術】
湿式メッキにおいて、メッキ処理中に発生するガスによるメッキ液の霧化(ミスト化)や液面からの放熱によるメッキ液の冷却を防ぐために浮子(フロート)の使用は良く知られている。
【0003】
例えば、特開平8−239798号公報はバレルメッキ法において、その形状が直径15±10mmであり、且つ、投入量がバレル内容量の10%〜15%とする浮き玉の使用を開示する。
【0004】
又、実公平3−45952号公報はバレルメッキ法において、メッキ液中に浮遊して自在に回転出来る棒状、球状などの形状の浮子の使用を開示している。
【0005】
【発明が解決しようとする課題】
しかしながら、特開平8−239798号公報が開示する浮き玉は、メッキ液面全面に敷き詰めた場合でも隙間が生じ、又、メッキ液の攪拌に伴い回転してしまう故え、メッキ液の蒸発抑止及び/又はメッキ液からの放熱抑止の目的に対しては課題を残すものである。又、実公平3−45952号公報が開示する浮子はメッキ液中に浮遊して自在に回転する形状であるため、前記特開平8−239798号公報が開示する浮き玉と同様にメッキ液の蒸発抑止及び/又はメッキ液からの放熱抑止の目的に対しては課題を残すものである。
【0006】
【課題を解決するための手段】
本発明は上記課題を解決するもので、湿式メッキにおけるメッキ液槽内のメッキ液面上に浮遊せしめ、且つ、前記メッキ液面を覆うように配置してなるメッキ液槽内のメッキ液の蒸発抑止及び/又はメッキ液からの放熱抑止を効率良く行い得るメッキ用浮子体の提供を目的とする。
【0007】
本発明の目的は以下の手段を採用することによって達成し得る。即ち、請求項1記載のメッキ用浮子体はバルク比重がメッキ液比重より小さいことを特徴とする。請求項2記載のメッキ用浮子体は、請求項1記載のメッキ用浮子体であって円柱、正三角柱、正四角柱、又は、正六角柱のいずれかの形状であることを特徴とする。請求項3記載のメッキ用浮子体は、請求項1、又は、請求項2記載のメッキ用浮子体であって、球形、正四角形の立方体等の三次元体のほぼ中心線上に円形、正三角形、正四角形、又は、正六角形いずれかの鍔状体を具備することを特徴とする。上記構成の本発明のメッキ用浮子体は、メッキ液面を密に覆うことができ、メッキ液槽内のメッキ液の蒸発抑止及び/又はメッキ液からの放熱が抑止でき、メッキ液槽内のメッキ液の温度管理が容易となる。請求項4記載のメッキ用浮子体は、請求項1、請求項2、又は、請求項3いずれかに記載のメッキ用浮子体であって、浮子体が天地方向への回転を防止する為の回転防止手段を有することを特徴とする。請求項5記載のメッキ用浮子体は、請求項1、請求項2、請求項3、又は、請求項4いずれかに記載のメッキ用浮子体であって、回転防止手段が脚状体であることを特徴とする。上記構成の本発明のメッキ用浮子体によれば、より安定的にメッキ液槽内のメッキ液の蒸発抑止及び/又はメッキ液からの放熱抑止を可能とし、メッキ液槽内のメッキ液の温度管理などが高精度で行い得る。
【0008】
【発明の実施の形態】
以下、本発明の実施の形態を図面に基ずいて説明する。図1は本発明のメッキ用浮子体の一実施形態である。図中、Aはメッキ液面Xでの浮遊状態を示す側面図、Bはその上面図である。尚、図中(1)は円柱状、(2)は正三角柱状、(3)は正四角柱状、(4)は正六角柱状の本発明のメッキ用浮子体である。本発明のメッキ用浮子体は柱状体故え、メッキ処理中のメッキ液の攪拌操作でも天地方向の回転が制約されメッキ液の蒸発抑止を効果的に行い得る。
【0009】
図2は本発明のメッキ用浮子体の別の実施形態である。図中、Aはメッキ液面Xでの浮遊状態を示す側面図、Bはその上面図である。尚、図中(11)は円盤状、(12)は正三角状、(13)は正四角状、(14)は正六角状の鍔を有する球形のメッキ用浮子体である。球形の浮子体に鍔状体を付加することで、メッキ液面Xでの浮遊状態において浮子体の天地方向への回転をより効果的に防止でき、浮子体の回転に伴うメッキ液の蒸発という課題を解決するものである。
【0010】
尚、図3aに示す断面形状正六角形の浮子体を例にとれば、2×補角/内角=Nにおいて、Nが正の整数、即ち、N=1であり、複数個の同一形状の浮子体であれば図3bに示すように互いを隙間無く配列できる。同様に、Nが他の正の整数2、4の場合、即ち、正四角形、正三角形のときにも互いを隙間無く配列可能となる。従って、図1(2)、(3)、(4)の浮子体、及び、図2(12)、(13)、(14)の浮子体はメッキ液面を完全に覆うことができ、メッキ液の蒸発抑止及び/又はメッキ液からの放熱抑止効果を最大限に発揮し得る。又、図2(11)に示す様な円盤状の鍔を有する浮子体の場合、メッキ液面を完全に覆うためには多層に重ねることが必要であり、その際には、それらを整然と効率良く浮遊させる為の強制的な整理治具の使用によって可能となる。
【0011】
図4は同一形状の本発明のメッキ用浮子体がメッキ液面X上に浮遊した状態を示す模式図である。図中、Aは本発明の請求項2に記載の柱状の浮子体の場合、又、Bは本発明の請求項3に記載の鍔状体を具備する浮子体の場合を示す。本発明のメッキ用浮子体は後述するようにポリエチレン、ポリビニリデンフロライドなどのポリマーのブロー成型法等によって製造されるが、成型の過程で個々の浮子体の比重(バルク比重)のバラツキが往々にして見られる。この比重(バルク比重)のバラツキによるメッキ液面の空隙の発生は柱状、又は、鍔状部によって防ぐことができる。因みに、鍔状体の厚さは特に限定されないが、成型の過程での個々の浮子体の比重(バルク比重)のバラツキによる浮力差を補正するもので良く、通常0、2mm〜20mmの厚さである。尚、図2では球形の浮子体を例示したが、浮子体の形状はこれに限定されることなく、正三角形、正四角形、正六角形等の三次元体であっても良い。
【0012】
図5は回転防止手段として脚状体を有する本発明のメッキ用浮子体のメッキ液面Xでの浮遊状態を示す側面図である。図中(21)は円柱状、(22)正三角柱状、(23)は正四角柱状、(24)は正六角柱状の本発明のメッキ用浮子体である。
【0013】
図6は回転防止手段として脚状体を有する本発明のメッキ用浮子体の別の実施形態である。図中、Aはメッキ液面Xでの浮遊状態を示す側面図、Bはその上面図である。尚、図中(31)は円盤状、(32)は正三角状、(33)は正四角状、(34)は正六角状の鍔を有する球形のメッキ用浮子体である。
【0014】
脚状体は浮子体の下部に配設し、浮子体の重心を下げ浮遊状態の安定を計ると共に、メッキ液中での抵抗を高め天地方向への回転をより効果的に防止することを目的とするものである。上記目的を達成し得るものであれば脚状体の形状は特に限定されないが、通常、その断面が矩形、或いは、凸レンズ状のもので良い。
【0015】
同様の目的は、例えば、図2に示す球形の内部へ、錘物体を配設するか、又は、メッキ液を導入する方法でも達成し得る。しかしながら、前者の浮子体は製造工程が複雑であり、コスト的にも高くなり、又、後者の浮子体ではメッキ槽からの回収に手間取る欠点を有する。
【0016】
本発明のメッキ用浮子体はメッキ液面に浮遊せしめ、メッキ液槽内のメッキ液の蒸発抑止及び/又はメッキ液からの放熱抑止を行うもの故え、その比重(バルク比重)がメッキ液より小さければ中実体・中空体・発泡体いずれであっても良い。
【0017】
本発明のメッキ用浮子体の構成材料はメッキ液に対して耐蝕性であれば特に限定されず、ポリエチレン、ポリプロピレン、ポリ塩化ビニルなどの高分子材料を例示し得るが、耐蝕性・耐熱性の観点から、特に、弗素系の熱可塑性高分子であるポリビニリデンフルオライド(PVDF)、エチレン−クロロトリフルオロエチレン樹脂(ECTFE)、四ふっ化エチレン・パーフルオロアルコキシエチレン共重合樹脂(PFA)、四ふっ化エチレン・六ふっ化プロピレン共重合樹脂(FEP)などが好ましい。
【0018】
本発明のメッキ用浮子体は通常の高分子材料の成型法、例えば、射出成型法、ブロー成型法、真空成型法などによって製造し得る。
【0019】
尚、図2(12)、(13)、(14)様な浮子体は材料ロスがほとんどなく製造することができ、低コストで生産性の向上が期待できるものである。
【0020】
【発明の効果】
本発明のメッキ用浮子体によれば、1)より優れたメッキ液面遮断性を有する故え、メッキ液からの放熱が抑止され、メッキ液の温度管理が容易となる、2)天地方向への回転がないので、メッキ液の蒸発が抑止され、メッキ液成分組成の変化を防止できるなどの利点があり、結果として、メッキ膜厚の均質な高品位のメッキ被覆製品を低コストで得ることができる。
【図面の簡単な説明】
【図1】本発明のメッキ用浮子体の一実施形態を示す側面図および上面図である。
【図2】本発明のメッキ用浮子体の別の実施形態を示す側面図および上面図である。
【図3】本発明のメッキ用浮子体のメッキ液面での配列状態を説明する上面図である。
【図4】本発明のメッキ用浮子体のメッキ液面での浮遊状態を示す模式図である。
【図5】回転防止手段として脚状体を有する本発明のメッキ用浮子体のメッキ液面での浮遊状態を示す側面図である。
【図6】回転防止手段として脚状体を有する本発明の別のメッキ用浮子体のメッキ液面での浮遊状態を示す側面図および上面図である。
【符号の説明】
1、2、3、4 柱状浮子体
11、12、13、14 鍔状浮子体
21、22、23、24 脚状体付加柱状浮子体
31、32、33、34 脚状体付加鍔状浮子体
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a float used for wet plating such as electroplating, electroless plating (chemical plating), or composite plating. More specifically, the present invention suppresses evaporation of a plating solution in a plating solution tank which is floated on a plating solution surface in a plating solution tank in wet plating and is arranged so as to cover the plating solution surface, and / or The present invention relates to a plating float that can efficiently suppress heat radiation from a plating solution.
[0002]
[Prior art]
In wet plating, the use of a float is well known in order to prevent atomization (mist formation) of a plating solution by gas generated during a plating process and cooling of the plating solution due to heat radiation from the liquid surface.
[0003]
For example, Japanese Patent Application Laid-Open No. Hei 8-239798 discloses the use of floating balls having a diameter of 15 ± 10 mm and a charging amount of 10% to 15% of the barrel inner volume in a barrel plating method.
[0004]
Japanese Utility Model Publication No. 3-44952 discloses the use of a rod-shaped or spherical floating member which can be freely rotated while floating in a plating solution in a barrel plating method.
[0005]
[Problems to be solved by the invention]
However, the floating ball disclosed in Japanese Patent Application Laid-Open No. Hei 8-239798 has a gap even when the floating ball is spread over the entire surface of the plating solution, and also rotates with the stirring of the plating solution. A problem remains for the purpose of suppressing heat radiation from the plating solution. In addition, since the float disclosed in Japanese Utility Model Publication No. 3-59552 has a shape which floats in the plating solution and rotates freely, the evaporation of the plating solution is performed in the same manner as the floating ball disclosed in Japanese Patent Application Laid-Open No. 8-239798. A problem remains for the purpose of suppressing and / or suppressing heat radiation from the plating solution.
[0006]
[Means for Solving the Problems]
SUMMARY OF THE INVENTION The present invention solves the above-mentioned problems, and evaporates a plating solution in a plating solution tank which is floated on a plating solution surface in a plating solution tank in wet plating and arranged so as to cover the plating solution surface. An object of the present invention is to provide a plating float that can efficiently suppress and / or suppress heat radiation from a plating solution.
[0007]
The object of the present invention can be achieved by employing the following means. That is, the floating body for plating according to claim 1 is characterized in that the bulk specific gravity is smaller than the specific gravity of the plating solution. The floating element for plating according to claim 2 is the floating element for plating according to claim 1, wherein the floating element for plating has any one of a cylindrical shape, a regular triangular prism, a regular square prism, or a regular hexagonal prism. The plating float according to claim 3 is the plating float according to claim 1 or claim 2, wherein the three-dimensional body such as a sphere or a square cube has a circular or equilateral triangle substantially on the center line thereof. , A regular quadrangle, or a regular hexagon. The plating float of the present invention having the above-described structure can cover the plating liquid surface densely, suppress evaporation of the plating liquid in the plating liquid tank and / or suppress heat radiation from the plating liquid, It is easy to control the temperature of the plating solution. A plating float according to claim 4 is the plating float according to any one of claims 1, 2 and 3, wherein the float is for preventing rotation of the float in the vertical direction. It is characterized by having rotation prevention means. According to a fifth aspect of the present invention, there is provided a plating float according to any one of the first, second, third, and fourth aspects, wherein the rotation preventing means is a leg. It is characterized by the following. ADVANTAGE OF THE INVENTION According to the float for plating of this invention of the said structure, evaporation of the plating liquid in a plating liquid tank and / or heat radiation from a plating liquid can be suppressed more stably, and the temperature of the plating liquid in a plating liquid tank Management can be performed with high accuracy.
[0008]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 shows an embodiment of a plating float according to the present invention. In the figure, A is a side view showing a floating state at the plating liquid surface X, and B is a top view thereof. In the drawing, (1) is a columnar shape, (2) is a regular triangular prism shape, (3) is a regular square prism shape, and (4) is a regular hexagonal prism float of the present invention. Since the plating float of the present invention has a columnar shape, even in the case of stirring the plating solution during the plating process, the rotation in the vertical direction is restricted, and the evaporation of the plating solution can be effectively suppressed.
[0009]
FIG. 2 shows another embodiment of the floating body for plating of the present invention. In the figure, A is a side view showing a floating state at the plating liquid surface X, and B is a top view thereof. In the figure, (11) is a disk-shaped, (12) is a regular triangular shape, (13) is a regular square shape, and (14) is a spherical floating body having a regular hexagonal flange. By adding a collar to the spherical float, it is possible to more effectively prevent the float from rotating in the vertical direction in the floating state at the plating liquid surface X, and to evaporate the plating solution accompanying the rotation of the float. It is to solve the problem.
[0010]
In the case of the float having a regular hexagonal cross section shown in FIG. 3A as an example, when 2 × supplement angle / inner angle = N, N is a positive integer, ie, N = 1, and a plurality of floats having the same shape If they are bodies, they can be arranged without gaps as shown in FIG. 3b. Similarly, when N is another positive integer 2 or 4, that is, when it is a regular square or a regular triangle, they can be arranged without any gaps. Therefore, the floats of FIGS. 1 (2), (3) and (4) and the floats of FIGS. 2 (12), (13) and (14) can completely cover the plating solution level, The effect of suppressing evaporation of the solution and / or heat radiation from the plating solution can be maximized. Further, in the case of a floating body having a disk-shaped flange as shown in FIG. 2 (11), it is necessary to stack multiple layers in order to completely cover the plating liquid surface. This is made possible by the use of compulsory rearranging jigs for good floating.
[0011]
FIG. 4 is a schematic view showing a state in which a floating body for plating of the present invention having the same shape floats on the plating liquid surface X. In the figure, A shows the case of the columnar float according to claim 2 of the present invention, and B shows the case of the float having the flange-like body according to claim 3 of the present invention. The floater for plating of the present invention is manufactured by a blow molding method of a polymer such as polyethylene or polyvinylidene fluoride as described later, but the specific gravity (bulk specific gravity) of each floater often varies during the molding process. To be seen. The generation of voids in the plating liquid surface due to the variation of the specific gravity (bulk specific gravity) can be prevented by the columnar or flange-like portions. Incidentally, the thickness of the flange-shaped body is not particularly limited, but may be one which corrects a buoyancy difference due to a variation in specific gravity (bulk specific gravity) of each float in the process of molding, and usually has a thickness of 0 to 2 mm to 20 mm. It is. In FIG. 2, a spherical float is illustrated, but the shape of the float is not limited to this, and may be a three-dimensional body such as a regular triangle, a regular square, a regular hexagon, or the like.
[0012]
FIG. 5 is a side view showing a floating state on the plating liquid surface X of the plating float of the present invention having a leg as a rotation preventing means. In the figure, (21) is a columnar shape, (22) is a regular triangular prism shape, (23) is a regular quadrangular prism shape, and (24) is a regular hexagonal prism shape floating member for plating of the present invention.
[0013]
FIG. 6 shows another embodiment of the plating float according to the present invention having a leg as a rotation preventing means. In the figure, A is a side view showing a floating state on the plating liquid surface X, and B is a top view thereof. In the drawing, (31) is a disc-shaped, (32) is a regular triangular shape, (33) is a regular square shape, and (34) is a spherical plating floating body having a regular hexagonal flange.
[0014]
The legs are placed at the bottom of the float, lowering the center of gravity of the float, stabilizing the floating state, and increasing the resistance in the plating solution to prevent rotation in the vertical direction more effectively. It is assumed that. The shape of the leg-like body is not particularly limited as long as the above-mentioned object can be achieved, but usually, the cross-section may be rectangular or convex lens-like.
[0015]
The same purpose can be achieved by, for example, disposing a weight object or introducing a plating solution inside the spherical shape shown in FIG. However, the former float has a drawback that the manufacturing process is complicated and the cost is high, and the latter float has a problem that it takes time to collect it from the plating tank.
[0016]
Since the floating body for plating of the present invention floats on the surface of the plating solution and suppresses evaporation of the plating solution in the plating solution tank and / or heat radiation from the plating solution, its specific gravity (bulk specific gravity) is higher than that of the plating solution. If it is small, it may be any of a solid body, a hollow body, and a foam.
[0017]
The constituent material of the floating body for plating of the present invention is not particularly limited as long as it is corrosion-resistant to a plating solution. Examples of the polymer material include polyethylene, polypropylene, and polyvinyl chloride. From the viewpoint, in particular, polyvinylidene fluoride (PVDF) which is a fluorine-based thermoplastic polymer, ethylene-chlorotrifluoroethylene resin (ECTFE), ethylene tetrafluoride / perfluoroalkoxyethylene copolymer resin (PFA), Preferred are ethylene fluoride and hexafluoropropylene copolymer resin (FEP).
[0018]
The floating body for plating of the present invention can be manufactured by a usual molding method of a polymer material, for example, an injection molding method, a blow molding method, a vacuum molding method, or the like.
[0019]
The floats shown in FIGS. 2 (12), (13) and (14) can be manufactured with almost no material loss, and can be expected to improve productivity at low cost.
[0020]
【The invention's effect】
According to the floating body for plating of the present invention, 1) since the plating float level is more excellent, heat radiation from the plating solution is suppressed, and the temperature control of the plating solution is facilitated. Since there is no rotation of the plating solution, there is an advantage that the evaporation of the plating solution is suppressed and a change in the composition of the plating solution can be prevented, and as a result, a high-quality plated coating product having a uniform plating film thickness can be obtained at low cost. Can be.
[Brief description of the drawings]
FIG. 1 is a side view and a top view showing one embodiment of a plating float according to the present invention.
FIG. 2 is a side view and a top view showing another embodiment of a plating float according to the present invention.
FIG. 3 is a top view for explaining an arrangement state of a plating float of the present invention on a plating liquid surface.
FIG. 4 is a schematic diagram showing a floating state of a plating float of the present invention on a plating solution level.
FIG. 5 is a side view showing a floating state on the plating liquid surface of the plating float of the present invention having a leg as a rotation preventing means.
6A and 6B are a side view and a top view showing a floating state on a plating liquid surface of another plating float according to the present invention having a leg as a rotation preventing means.
[Explanation of symbols]
1, 2, 3, 4 Pillar Floats 11, 12, 13, 14 Collar Floats 21, 22, 23, 24 Leg Addition Column Floats 31, 32, 33, 34 Leg Addition Collar Floats

Claims (5)

メッキ液槽内のメッキ液面上に浮遊せしめ、前記メッキ液面を覆うように配置されることによりメッキ液槽内のメッキ液の蒸発抑止及び/又はメッキ液からの放熱抑止を行う浮子体であって、該浮子体のバルク比重がメッキ液比重より小さいことを特徴とするメッキ用浮子体。A floating body that floats on the plating solution surface in the plating solution tank and is disposed so as to cover the plating solution surface, thereby suppressing evaporation of the plating solution in the plating solution tank and / or heat radiation from the plating solution. A floating body for plating, wherein a bulk specific gravity of the float is smaller than a specific gravity of a plating solution. 浮子体が、円柱、正三角柱、正四角柱、又は、正六角柱のいずれかであることを特徴とする請求項1に記載のメッキ用浮子体。The floating body for plating according to claim 1, wherein the floating body is one of a cylinder, a regular triangular prism, a regular square prism, and a regular hexagonal prism. 浮子体が、球形、正四角形の立方体等の三次元体のほぼ中心線上に円形、正三角形、正四角形、又は、正六角形いずれかの鍔状体を具備することを特徴とする請求項1に記載のメッキ用浮子体。2. The float according to claim 1, wherein the float has a collar, a circle, a regular triangle, a regular square, or a regular hexagon, which is substantially on the center line of a three-dimensional body such as a cube or a regular square cube. Floating body for plating as described. 浮子体が、天地方向への回転を防止する為の回転防止手段を有することを特徴とする請求項1、請求項2、又は請求項3いずれかに記載のメッキ用浮子体。The floating body for plating according to any one of claims 1, 2 and 3, wherein the floating body has rotation preventing means for preventing rotation in the vertical direction. 回転防止手段が、脚状体であることを特徴とする請求項1、請求項2、請求項3、又は請求項4いずれかに記載のメッキ用浮子体。The floating body for plating according to claim 1, wherein the rotation preventing means is a leg-shaped body.
JP2003046560A 2003-01-21 2003-01-21 Float for suppressing evaporation and/or controlling temperature of plating liquid Pending JP2004225156A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3363535A1 (en) 2017-02-16 2018-08-22 Fanuc Corporation Float and evaporation suppressing method
WO2021005579A1 (en) * 2019-07-11 2021-01-14 The State Of Israel, Ministry Of Agriculture & Rural Development, Agricultural Research Organization (Aro) (Volcani Center) Suppression of water evaporation using floating lattice-like structures

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3363535A1 (en) 2017-02-16 2018-08-22 Fanuc Corporation Float and evaporation suppressing method
KR20180094803A (en) * 2017-02-16 2018-08-24 화낙 코퍼레이션 Float and evaporation suppressing method
KR101976978B1 (en) 2017-02-16 2019-05-09 화낙 코퍼레이션 Float and evaporation suppressing method
US10597226B2 (en) 2017-02-16 2020-03-24 Fanuc Corporation Float and evaporation suppressing method
WO2021005579A1 (en) * 2019-07-11 2021-01-14 The State Of Israel, Ministry Of Agriculture & Rural Development, Agricultural Research Organization (Aro) (Volcani Center) Suppression of water evaporation using floating lattice-like structures
CN114269662A (en) * 2019-07-11 2022-04-01 以色列国家农业部、农村发展农业研究组织·沃尔卡尼中心 Liquid evaporation suppressors using floating lattice structure

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