JP2004214426A - Ultra-high-pressure deionized water cleaning apparatus with static charge removal function - Google Patents

Ultra-high-pressure deionized water cleaning apparatus with static charge removal function Download PDF

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Publication number
JP2004214426A
JP2004214426A JP2002383807A JP2002383807A JP2004214426A JP 2004214426 A JP2004214426 A JP 2004214426A JP 2002383807 A JP2002383807 A JP 2002383807A JP 2002383807 A JP2002383807 A JP 2002383807A JP 2004214426 A JP2004214426 A JP 2004214426A
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JP
Japan
Prior art keywords
potential
cleaned
cleaning
charged
deionized water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002383807A
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Japanese (ja)
Inventor
Masami Murata
正美 村田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Sunac Corp
Original Assignee
Asahi Sunac Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Sunac Corp filed Critical Asahi Sunac Corp
Priority to JP2002383807A priority Critical patent/JP2004214426A/en
Publication of JP2004214426A publication Critical patent/JP2004214426A/en
Pending legal-status Critical Current

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Abstract

<P>PROBLEM TO BE SOLVED: To prevent electrostatic damage to an electric circuit, which is generated on an object to be cleaned because of static electricity during pressure feeding and spraying of an deionized water in a cleaning apparatus wherein the deionized water is fed by pressure and sprayed and the mist hits the object for cleaning. <P>SOLUTION: A nozzle head 5 and its vicinity are electrically insulated from the earth, and they are charged in advance in a reverse polarity where the object 15 to be cleaned is charged by an internal application device 3, and then the surface potential of the object is controlled at less than potential where an electric circuit generated on the surface of the object is electrostatically damaged. In addition, the potential on the surface of the object is measured by a detector 2, and the charging potential of the object is controlled by a controller 12 so that it can be kept at zero or under a potential to prevent the electrostatic breakage. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

【0001】
【産業上の利用分野】
純水を噴霧し、その霧を被洗浄物にぶつけて被洗浄物を洗浄する洗浄方法および洗浄装置に関する。
【0002】
【従来の技術】
純水を圧送・噴霧すると、圧送時・噴霧時夫々に静電気が発生する。そして、発生した静電気は、大地間で火花放電し、その放電ノイズで周辺制御装置を誤動作させたり、被洗浄物を帯電させ、被洗浄物表面に生成された電気回路を静電気破壊させる不都合を生じさせる。
【0003】
そこで、火花放電防止の為、圧送・ノズルヘッド部・その近傍は、大地に接地し静電気を事前に放電させる様に構成することが一般的であった。
【0004】
【発明が解決しようとする課題】
しかしながら、ノズルヘッドから噴霧された霧の状態で帯電した純水は、前記接地では除電効果がなく、被洗浄物を帯電させ、被洗浄物表面に生成された電気回路を静電気破壊させる不都合を解消できていない。
【0005】
【課題を解決するための手段】
ノズルヘッドから噴霧された霧は、プラス帯電した液滴と、マイナス帯電した液滴の両方が混在するが、被洗浄物は、両者の数量の多い方の電位に荷電される。
【0006】
したがって、上記課題を解決するため、予め被洗浄物が帯電されるのと逆極性の電荷を、霧になる前に荷電すれば、結果として、被洗浄物の帯電電位を低下でき、被洗浄物表面に生成された電気回路の静電気破壊を防止できる。
【0007】
これを実現する為に、ノズルヘッドとその近傍を電気的に大地から絶縁し、予め被洗浄物が帯電されるのと逆極性の電荷を荷電し、被洗浄物表面に生成された電気回路が静電気破壊する電位未満に被洗浄物の表面電位を制御する。
【0008】
また、被洗浄物表面の電位を計測して、被洗浄物の帯電電位を、静電気破壊を防止できる電位以下に維持できるように制御を行う。
【0009】
【作用】
ノズルヘッド・その近傍を電気的に大地から絶縁し、純水を圧送および噴霧する際に発生する静電気によって生ずる被洗浄物上の帯電量を相殺する逆極性の電荷を荷電することによって、被洗浄物表面に生成された電気回路が静電気破壊する電位未満に除電する。
【0010】
また、洗浄中の被洗浄物表面の電位を検出器によって検出し、帯電量を相殺する逆極性の電位を制御することによって、被洗浄物の表面電位を電気回路が静電気破壊する電位未満にいじする。
【0011】
【実施例】
以下に本発明の一実施例を説明する。
図1は、本発明による洗浄装置の一実施例の構成を示す。洗浄装置は、純水噴射部分1と検出器部分2および内部印加装置部分3からなる。
【0012】
純水噴射部分1は、ノズルヘッド4およびノズルヘッド4を固定する樹脂製のノズルヘッドの支持棒2からなり、図示されていない高圧ポンプに、樹脂製高圧ホース3によってつながれている。
【0013】
検出器部分2は、検出器7および検出器7と電極9をつなぐ同軸ケーブル8および電極9の表面電位を測定する表面電位計10からなる。
【0014】
内部印加装置部分3は、表面電位計10から検出された電位と同じ値の逆極性の電位をノズルヘッド4にかけるように制御するコントローラ12と逆極性の電位を発生させる高圧発生器11からなる。
【0015】
純水噴射部分1および被洗浄物15と検出器7は洗浄槽13の内部に設置され、表面電位計10と洗浄槽13およびコントローラ12はアース14がされている。
【0016】
上記洗浄装置では、図示されていない高圧ポンプから、樹脂製高圧ホース4を通して純水供給方向16からノズルヘッド5に供給され、霧化される。その時、純水が高圧ポンプからノズルヘッド5に圧送される間および噴霧時に静電気が発生する。発生した静電気を相殺するため、高圧発生器5によって、被洗浄物15の表面に生成されている電気回路を静電破壊することが防止できる。
【0017】
また、被洗浄物15の近傍に設置された検出器8から検出された電位により被洗浄物15の表面電位を監視するとともに、測定電位をコントローラ12にフィードバックすることにより被洗浄物15の表面電位が0になるように高圧発生器5の出力を制御する。
【0018】
検出器8からの電位の検出は、連続的に行うこともあらかじめ設定された時間毎に行うことも選択的にできる。
【0019】
被洗浄物15の表面電位の検出は、上記表面電位計の他、あらかじめ静電容量が既知の検出器で、電荷を検出し、電荷=静電容量×電位の関係から、電位を求めることもできる。
【0020】
【発明の効果】
以上の説明から明らかなように、本発明による洗浄装置によって、被洗浄物の帯電電位を低下することができ、被洗浄物の表面に生成されている電気回路を静電気破壊することなく、洗浄を行うことができる。
【図面の簡単な説明】
【図1】洗浄装置の一実施例の構成
【符号の説明】
1 純水噴射部分
2 検出器部分
3 内部印加装置部分
4 樹脂製高圧ホース
5 ノズルヘッド
6 ノズルヘッドの支持棒
7 検出器被洗浄物
8 同軸ケーブル
9 電極
10 表面電位計
11 高圧発生器
12 コントローラ
13 洗浄槽
14 アース
15 被洗浄物
16 純水供給方向
[0001]
[Industrial applications]
The present invention relates to a cleaning method and a cleaning apparatus for cleaning an object to be cleaned by spraying pure water and hitting the mist against the object to be cleaned.
[0002]
[Prior art]
When pure water is pumped and sprayed, static electricity is generated at the time of pumping and spraying, respectively. The generated static electricity causes a spark discharge between the grounds, and the discharge noise causes malfunctions of the peripheral control device, charges the object to be cleaned, and causes a problem that the electric circuit generated on the surface of the object to be cleaned is electrostatically destroyed. Let it.
[0003]
Therefore, in order to prevent spark discharge, it has been common practice to construct the pumping / nozzle head portion and its vicinity to be grounded to the ground to discharge static electricity in advance.
[0004]
[Problems to be solved by the invention]
However, pure water charged in the state of mist sprayed from the nozzle head does not have a static elimination effect when grounded, and eliminates the inconvenience of charging an object to be cleaned and electrostatically destroying an electric circuit generated on the surface of the object to be cleaned. Not done.
[0005]
[Means for Solving the Problems]
In the fog sprayed from the nozzle head, both positively charged droplets and negatively charged droplets are mixed, but the object to be cleaned is charged to the potential with the larger number of both.
[0006]
Therefore, in order to solve the above-mentioned problem, if the electric charge having the opposite polarity to the electric charge of the object to be cleaned is charged before it becomes fog, as a result, the charged potential of the object to be cleaned can be reduced, and the object to be cleaned can be reduced. Electrostatic breakdown of the electric circuit generated on the surface can be prevented.
[0007]
In order to realize this, the nozzle head and its vicinity are electrically insulated from the ground, and the electric charge generated in advance on the surface of the object to be cleaned is charged with a charge of the opposite polarity to that of the object to be cleaned. The surface potential of the object to be cleaned is controlled to be lower than the potential at which electrostatic breakdown occurs.
[0008]
In addition, the potential of the surface of the object to be cleaned is measured, and control is performed so that the charged potential of the object to be cleaned can be maintained at a potential or less that can prevent electrostatic destruction.
[0009]
[Action]
The nozzle head and its vicinity are electrically insulated from the ground, and charged by the opposite polarity charge that offsets the amount of charge on the object to be cleaned caused by static electricity generated when the pure water is pumped and sprayed. Static electricity is removed below the potential at which an electric circuit generated on the surface of the object breaks down electrostatically.
[0010]
In addition, the potential of the surface of the object to be cleaned during the cleaning is detected by a detector, and the potential of the opposite polarity that offsets the charge amount is controlled, so that the surface potential of the object to be cleaned can be adjusted to a value lower than the potential at which the electric circuit causes electrostatic breakdown. I do.
[0011]
【Example】
An embodiment of the present invention will be described below.
FIG. 1 shows the configuration of an embodiment of the cleaning apparatus according to the present invention. The cleaning device comprises a pure water injection part 1, a detector part 2, and an internal application device part 3.
[0012]
The pure water jetting part 1 includes a nozzle head 4 and a resin nozzle head support rod 2 for fixing the nozzle head 4, and is connected to a high-pressure pump (not shown) by a high-pressure resin hose 3.
[0013]
The detector section 2 includes a detector 7, a coaxial cable 8 connecting the detector 7 and the electrode 9, and a surface voltmeter 10 for measuring the surface potential of the electrode 9.
[0014]
The internal application device portion 3 includes a controller 12 that controls the nozzle head 4 to apply a reverse polarity potential having the same value as the potential detected by the surface voltmeter 10 and a high voltage generator 11 that generates a reverse polarity potential. .
[0015]
The pure water jetting part 1, the object to be cleaned 15 and the detector 7 are installed inside the cleaning tank 13, and the surface voltmeter 10, the cleaning tank 13 and the controller 12 are grounded.
[0016]
In the cleaning device, a high-pressure pump (not shown) is supplied to the nozzle head 5 from the pure water supply direction 16 through the high-pressure resin hose 4 and atomized. At that time, static electricity is generated while pure water is being pumped from the high-pressure pump to the nozzle head 5 and at the time of spraying. In order to cancel the generated static electricity, the high-voltage generator 5 can prevent the electric circuit generated on the surface of the cleaning object 15 from being electrostatically damaged.
[0017]
In addition, the surface potential of the object 15 to be cleaned is monitored based on the potential detected from the detector 8 installed near the object 15 to be cleaned, and the measured potential is fed back to the controller 12 so that the surface potential of the object 15 to be cleaned is Is controlled to be 0.
[0018]
The detection of the potential from the detector 8 can be selectively performed continuously or at predetermined intervals.
[0019]
The surface potential of the article 15 to be cleaned can be detected by detecting the electric charge with a detector having a known capacitance in addition to the above-mentioned surface potentiometer, and calculating the electric potential from the relation of electric charge = capacitance × potential. it can.
[0020]
【The invention's effect】
As is apparent from the above description, the cleaning device according to the present invention can lower the charged potential of the object to be cleaned, and can perform cleaning without electrostatically destroying an electric circuit generated on the surface of the object to be cleaned. It can be carried out.
[Brief description of the drawings]
FIG. 1 shows the configuration of an embodiment of a cleaning apparatus.
DESCRIPTION OF SYMBOLS 1 Pure water injection part 2 Detector part 3 Internal application device part 4 Resin high pressure hose 5 Nozzle head 6 Nozzle head support rod 7 Detector to be cleaned 8 Coaxial cable 9 Electrode 10 Surface electrometer 11 High pressure generator 12 Controller 13 Cleaning tank 14 Ground 15 Object to be cleaned 16 Direction of pure water supply

Claims (3)

純水を圧送し、噴霧し、その霧を被洗浄物にぶつけて被洗浄物を洗浄する経路において、噴霧するノズルヘッドおよびその近傍を電気的に大地から絶縁するとともに、霧により帯電された被洗浄物と逆極性の電荷を、電気的に大地から絶縁されたノズルヘッドおよびその近傍に荷電する洗浄方法および洗浄装置。Pure water is sprayed, sprayed, and the mist is hit on the object to be cleaned. In the path for cleaning the object to be cleaned, the nozzle head to be sprayed and its vicinity are electrically insulated from the ground, and the surface charged by the mist is charged. A cleaning method and a cleaning apparatus for charging a charge having a polarity opposite to that of a cleaning object to a nozzle head electrically insulated from the ground and the vicinity thereof. 請求項1の洗浄方法において、洗浄中及び洗浄後の被洗浄物の電位が0V付近になる様に荷電電位を調整することを特長とする洗浄装置。2. The cleaning method according to claim 1, wherein the charging potential is adjusted so that the potential of the object to be cleaned during and after the cleaning is close to 0V. 被洗浄物の帯電電位を測定する為の電位を計測する手段を持つ請求項2の洗浄装置。3. The cleaning apparatus according to claim 2, further comprising means for measuring a potential for measuring a charged potential of the object to be cleaned.
JP2002383807A 2002-12-27 2002-12-27 Ultra-high-pressure deionized water cleaning apparatus with static charge removal function Pending JP2004214426A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002383807A JP2004214426A (en) 2002-12-27 2002-12-27 Ultra-high-pressure deionized water cleaning apparatus with static charge removal function

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002383807A JP2004214426A (en) 2002-12-27 2002-12-27 Ultra-high-pressure deionized water cleaning apparatus with static charge removal function

Publications (1)

Publication Number Publication Date
JP2004214426A true JP2004214426A (en) 2004-07-29

Family

ID=32818429

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002383807A Pending JP2004214426A (en) 2002-12-27 2002-12-27 Ultra-high-pressure deionized water cleaning apparatus with static charge removal function

Country Status (1)

Country Link
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007250769A (en) * 2006-03-15 2007-09-27 Dainippon Screen Mfg Co Ltd Apparatus and method for treating substrate
CN110824833A (en) * 2018-08-14 2020-02-21 台湾积体电路制造股份有限公司 System and method for cleaning photomask

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007250769A (en) * 2006-03-15 2007-09-27 Dainippon Screen Mfg Co Ltd Apparatus and method for treating substrate
CN110824833A (en) * 2018-08-14 2020-02-21 台湾积体电路制造股份有限公司 System and method for cleaning photomask
US11675264B2 (en) 2018-08-14 2023-06-13 Taiwan Semiconductor Manufacturing Co., Ltd. Reticle cleaning system
CN110824833B (en) * 2018-08-14 2023-09-05 台湾积体电路制造股份有限公司 Photomask cleaning system and method

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