JP2004170928A - Defoaming dispersant for photoresist developer solutions - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a defoaming dispersant for a resist developer solution, the dispersant having excellent defoaming property for foams in a developer solution and excellent dispersibility of scum produced in the developer solution in a developing process of a photoresist using the developer solution. <P>SOLUTION: The defoaming dispersant for a photoresist developer solution contains a partial fatty acid ester obtained by allowing a mixture fatty acid having the proportion of 5 to 300 parts by mass of 6-14C middle fatty acid with respect to 100 parts by mass of ≥15C higher fatty acid to react with an aliphatic trihydric alcohol. The obtained defoaming dispersant for a resist developer solution has high defoaming property for a developer solution even when a resist component dissolved or dispersed in the developer solution increases during developing the resist, as well as has excellent dispersibility with the scum produced in the developer solution, and thereby, the dispersant can prevent the scum from depositing on the resist or the substrate. <P>COPYRIGHT: (C)2004,JPO

Description

  INDUSTRIAL APPLICABILITY The present invention has excellent defoaming properties against foaming of a developing solution and excellent dispersibility of scum generated in the developing solution in a developing process of a photoresist (hereinafter simply referred to as “resist”) using a developing solution. The present invention relates to an antifoam dispersant for a resist developer.

  2. Description of the Related Art Conventionally, resists have been widely used when forming wiring patterns such as printed circuit boards, integrated circuits, and color filters. In the step of forming a wiring pattern, usually, a film or liquid resist is laminated or coated on a base material, and then the resist is exposed to ultraviolet rays, X-rays, active radiation such as an electron beam, and the resist is exposed. After curing in a pattern, the resist is developed by removing the uncured resist portion (non-irradiated portion) with a developer to form a patterned resist film. As the developing solution, an alkaline aqueous solution is usually used, and as the alkali agent of the developing solution, an inorganic alkaline compound such as an alkali metal carbonate or an alkali metal hydroxide, or an organic alkaline compound such as tetramethylammonium hydroxide is used. Have been.

  In such an alkaline developer, during development of the resist, the resin components in the uncured portion of the resist, dyes, pigments, polymerization initiators, crosslinking agents, etc. contained in the resist are dissolved and dispersed in the developer. These are mixed and coagulated in the developing solution, float on the surface of the developing solution or precipitate in the developing solution, and so-called scum is generated in the developing solution. This scum adheres to the inside of the developing device during development and hinders the development of the resist. In addition, when the scum adheres to the resist to be developed or the base material on which the resist is provided during development, the resist However, there is a problem that the resolution of the resist pattern is lowered and a good resist pattern is not formed. Therefore, the developer is required to have a performance of dispersing scum generated during development to prevent scum aggregation.

  On the other hand, when air is entrained in the developing solution during the development of the resist, bubbles are generated in the developing solution. However, since the developing solution is usually circulated, the defoaming of the bubbles generated in the developing solution is insufficient. If so, bubbles will accumulate in the developer. In particular, as the amount of resist components (such as resin) dissolved or dispersed in the developer increases due to the circulating use of the developer, bubbles generated in the developer become more difficult to disappear. Such bubbles not only prevent good circulation of the developer but also hinder contact between the developer and the resist, so that the uncured resist portion is not sufficiently removed and a good resist pattern is not formed. cause. In recent years, in spray development of resist, which has become mainstream, development is performed by vigorously spraying a developer from a spray nozzle onto a resist after exposure, so that foaming easily occurs in the developer, and bubbles in the developer are easily generated. Controlling and defoaming are very important issues.

  In order to suppress such foaming of the developing solution, it is effective to add an antifoaming agent to the developing solution. However, the antifoaming agent aggregates in the developing solution to form an oily scum. If the resist adheres to the resist or its substrate during development, not only is a good resist pattern not formed, but also the substrate on which the resist is formed is contaminated. In general defoaming applications, silicone-based defoamers are said to have a high defoaming effect.Since silicone-based defoamers tend to form oily scum, they are used as defoamers for developing solutions. For example, an acetylene alcohol-based surfactant (for example, see Patent Document 1), a polyalkylene glycol or a derivative thereof (for example, see Patent Documents 2 to 7), a mono-higher fatty acid glycerin ester (for example, see Patent Document 8) ) Etc. are used.

  However, these conventional antifoaming agents do not have sufficient dispersibility of scum generated in the developer, and the antifoaming agent has an antifoaming effect at an early stage of its use. As the number of resist components dissolved or dispersed therein increases, the defoaming effect rapidly decreases, and scum tends to occur.

Japanese Patent Publication No. 4-51020 JP-A-7-128865 JP-A-8-10600 JP-A-8-87382 JP-A-9-172256 JP-A-10-319606 JP 2001-222115 A JP-A-9-293964

  Therefore, an object of the present invention is to provide a high defoaming property for a developer even when the amount of a resist component dissolved or dispersed in the developer increases during the development of the resist, and to improve the dispersibility of the scum generated in the developer. An object of the present invention is to provide a defoaming dispersant for a resist developer which is excellent and can prevent scum from adhering to a resist or its substrate.

  Therefore, the present inventors have proposed a defoaming property for a developing solution (hereinafter sometimes simply referred to as “defoaming property”) and a dispersing property for scum generated in a developing solution (hereinafter simply referred to as “scum dispersing property”). The present inventors have intensively studied a drug having a specific fatty acid composition and found that a partial fatty acid ester of a mixed fatty acid having a specific fatty acid composition and an aliphatic trihydric alcohol has excellent defoaming properties and scum dispersibility, thereby completing the present invention. Was. That is, in the present invention, a mixed fatty acid in which the ratio of the middle fatty acid having 6 to 14 carbon atoms is 5 to 300 parts by mass with respect to 100 parts by mass of the higher fatty acid having 15 or more carbon atoms was reacted with the aliphatic trihydric alcohol. An antifoam dispersant for a resist developing solution characterized by containing a partial fatty acid ester (hereinafter sometimes referred to as "partial fatty acid ester"), and an alkaline resist developing solution containing the same.

  The effect of the present invention is that when developing a resist with a developer, even if the amount of resist components dissolved or dispersed in the developer increases, the resist has high defoaming properties with respect to the developer and disperses scum generated in the developer. Another object of the present invention is to provide a defoaming dispersant for a resist developer, which is excellent in property and can prevent the scum from adhering to the resist and the substrate.

  In the present invention, higher fatty acids represent fatty acids having 15 or more carbon atoms, and intermediate fatty acids represent fatty acids having 6 to 14 carbon atoms. The mixed fatty acid as the raw material of the partial fatty acid ester of the present invention is a mixed fatty acid in which the ratio of the intermediate fatty acid to 100 parts by mass of the higher fatty acid is 5 to 300 parts by mass. When the proportion of the intermediate fatty acid is less than 5 parts by mass, the scum dispersibility of the defoaming dispersant for a resist developer of the present invention is reduced, and when it exceeds 300 parts by mass, the foam generated in the developer is reduced. This is because the defoaming property with respect to is reduced. The ratio of the intermediate fatty acid to 100 parts by mass of the higher fatty acid is preferably from 10 to 200 parts by mass, more preferably from 25 to 150 parts by mass, and most preferably from 40 to 100 parts by mass.

  Examples of higher fatty acids having 15 or more carbon atoms include pentadecanoic acid, hexadecanoic acid (palmitic acid), heptadecanoic acid, octadecanoic acid (stearic acid), 12-hydroxyoctadecanoic acid (12-hydroxystearic acid), and eicosanoic acid (arachinic acid). ), Linear saturated fatty acids such as docosanoic acid (behenic acid), tetracosanoic acid (lignoceric acid), hexacosanoic acid (serotinic acid), and octacosanoic acid (montanic acid); 2-pentylnonanoic acid, 2-hexyldecanoic acid, 2-heptyldodecane Branched fatty acids such as acid and isostearic acid; and unsaturated fatty acids such as palmitoleic acid, oleic acid, isooleic acid, elaidic acid, linoleic acid, linolenic acid, ricinoleic acid, gadrenic acid, erucic acid, and seracoleic acid. Among these higher fatty acids, fatty acids having 16 to 22 carbon atoms are preferable, fatty acids having 16 to 20 carbon atoms are more preferable, and fatty acids having 16 to 18 carbon atoms are most preferable.

  Examples of the middle fatty acids having 6 to 14 carbon atoms include hexanoic acid (caproic acid), heptanoic acid, octanoic acid (caprylic acid), nonanoic acid (pelargonic acid), decanoic acid (capric acid), undecanoic acid, dodecanoic acid ( Linear saturated fatty acids such as lauric acid), tridecanoic acid, and tetradecanoic acid (myristic acid); isohexanoic acid, isoheptanoic acid, 2-ethylhexanoic acid, isooctanoic acid, isononanoic acid, 2-propylheptanoic acid, isodecanoic acid, and isoundecanoic acid And branched fatty acids such as 2-butyloctanoic acid, isododecanoic acid and isotridecanoic acid; and unsaturated fatty acids such as 10-undecenoic acid. Among these intermediate fatty acids, fatty acids having 7 to 14 carbon atoms are preferable, fatty acids having 8 to 13 carbon atoms are more preferable, and fatty acids having 10 to 12 carbon atoms are most preferable.

  Further, the mixed fatty acid which is a raw material of the partial fatty acid ester of the present invention is a mixed fatty acid containing a linear saturated fatty acid and a branched fatty acid or a linear unsaturated fatty acid, rather than a mixed fatty acid consisting of only a linear saturated fatty acid. Is preferable because the scum dispersibility in the developing solution by the partial fatty acid ester of the present invention is improved and the partial fatty acid ester is easily dispersed in the developing solution. The proportion of the branched fatty acid and the linear unsaturated fatty acid in the mixed fatty acid is preferably from 5 to 80% by mass, more preferably from 10 to 70% by mass, and more preferably from 15 to 60% by mass, based on the total amount of the mixed fatty acid. Most preferably, it is% by mass.

  In addition, the mixed fatty acid which is a raw material of the partial fatty acid ester of the present invention is in the range of not deteriorating the defoaming property or the scum dispersing property of the defoaming dispersant for a resist developer of the present invention, and the above-mentioned intermediate fatty acids and higher fatty acids. A carboxylic acid other than a fatty acid may be contained.

  Examples of the aliphatic trihydric alcohol which is a raw material of the partial fatty acid ester of the present invention include glycerin, 1,2,3-butanetriol, 1,2,4-butanetriol, 2-hydroxymethyl-1,3-propanediol, 2-methyl-1,2,3-propanetriol, 1,2,5-pentanetriol, 1,3,5-pentanetriol, 2-methyl-1,2,4-propanetriol, 2-hydroxymethyl-1 , 3-butanediol, trimethylolethane, 1,3,5-hexanetriol, 1,2,6-hexanetriol, 3-hydroxymethyl-1,5-pentanediol, 3-methyl-1,3,5- Pentanetriol, trimethylolpropane, trimethylolbutane, 2,5-dimethyl-1,2,5-hexanetriol and the like. It is. Among these aliphatic triols, aliphatic triols having 3 to 6 carbon atoms are preferable from the viewpoint of scum dispersibility, and glycerin, 1,3,5-pentanetriol, trimethylolethane, 1,2,6-hexanetriol are preferable. And trimethylolpropane are more preferred, glycerin, trimethylolethane, and trimethylolpropane are still more preferred, and glycerin is most preferred.

  The partial fatty acid ester obtained by esterifying the mixed fatty acid with an aliphatic trihydric alcohol is usually a monofatty acid ester (hereinafter, referred to as “monoester”), a difatty acid ester (hereinafter, referred to as “diester”), and a trifatty acid ester (hereinafter, referred to as “triester”). "Triesters"). In the partial fatty acid ester of the present invention, if the content of the triester is too large, the scum dispersibility may be reduced. Therefore, the content of the triester is 20 mass% based on the total amount of the partial fatty acid ester. %, More preferably 10% by mass or less, and most preferably 5% by mass or less. Further, when the content of the diester is too large, the defoaming property with respect to the developer decreases, and when the content is too small, the scum dispersibility may decrease, so that the monoester in the partial fatty acid ester of the present invention may be used. The ratio with the diester is preferably from 5 to 1,500 parts by mass, more preferably from 10 to 500 parts by mass, and still more preferably from 20 to 150 parts by mass, based on 100 parts by mass of the monoester. Is most preferred.

  The partial fatty acid ester of the present invention can be produced by a known method. Known methods include, for example, (a) a method by direct esterification of a mixed fatty acid and an aliphatic trihydric alcohol, (b) a method by an ester exchange reaction between a lower alcohol ester of the mixed fatty acid and an aliphatic trihydric alcohol, (C) a method by transesterification of a triester such as glycerin trifatty acid ester with an aliphatic trihydric alcohol. After completion of the reaction, the generated partial fatty acid ester may be purified, if necessary. For example, a partial fatty acid ester having a high monoester or diester content can be obtained by performing purification by molecular distillation or the like.

  The defoaming dispersant for a resist developing solution of the present invention further contains a polyether polyol ester of a higher fatty acid having 10 to 20 carbon atoms, whereby scum dispersibility and defoaming properties are improved. Such a polyether polyol ester is obtained by reacting an alkylene oxide adduct of a polyhydric alcohol or a polyhydric phenol with a fatty acid having 10 to 20 carbon atoms.

  Examples of the polyhydric alcohol include, in addition to the aliphatic trihydric alcohol, ethylene glycol, propylene glycol, 1,2-butanediol, 1,4-butanediol, neopentyl glycol, isoprene glycol (3-methyl- Dihydric alcohols such as 1,3-butanediol) and 1,6-hexanediol; other trihydric alcohols such as triethanolamine and triisopropanolamine; pentaerythritol, diglycerin, sorbitan, N, N, N ', Tetrahydric alcohols such as N'-tetrakis (2-hydroxypropyl) ethylenediamine; and tetrahydric or higher alcohols such as methylglucoside, dipentaerythritol, and sucrose.

Examples of the polyhydric phenol include diphenols such as bisphenol A, bisphenol F, catechol and hydroquinone; and trihydric phenols such as tris (4-hydroxyphenyl) methane and tris (4-hydroxyphenyl) ethane. No.
Among these polyhydric alcohols and polyhydric phenols, dihydric alcohols are preferable, ethylene glycol, propylene glycol and 1,2-butanediol are more preferable, and propylene glycol is most preferable.

  Examples of the alkylene oxide to be added to the polyhydric alcohol or polyphenol include ethylene oxide, propylene oxide, butylene oxide, tetrahydrofuran (1,4-butylene oxide), long-chain α-olefin oxide, styrene oxide and the like. The mode of addition may be homopolymerization of one type of alkylene oxide, random copolymerization of two or more types of alkylene oxides, block copolymerization, random / block copolymerization, or the like. Particularly preferred is a copolymerization of ethylene oxide and propylene oxide. In this case, the proportion of ethylene oxide is preferably 5 to 100 parts by mass, and more preferably 10 to 60 parts by mass with respect to 100 parts by mass of propylene oxide. More preferably, it is most preferably 15 to 40 parts by mass. This is because if the proportion of ethylene oxide is less than 5 parts by mass, the scum dispersibility in the developing solution may be insufficient, and if it exceeds 100 parts by mass, the foaming property of the developing solution may increase.

  The addition mole number of the alkylene oxide of the polyalkylene oxide or polyhydric phenol alkylene oxide adduct is preferably from 20 to 200, more preferably from 30 to 150, and most preferably from 40 to 120.

  In addition, among the fatty acids having 10 to 20 or more carbon atoms, fatty acids having 10 to 16 carbon atoms are preferable, fatty acids having 10 to 14 carbon atoms are more preferable, and fatty acids having 10 to 14 carbon atoms are preferable from the viewpoint of scum dispersibility. Straight-chain saturated fatty acids are particularly preferred, and from the viewpoint of foam suppressing properties, fatty acids having 14 to 20 carbon atoms are preferable, fatty acids having 16 to 18 carbon atoms are more preferable, and linear saturated fatty acids having 16 to 18 carbon atoms are used. Is most preferred.

  The defoaming dispersant for a resist developing solution of the present invention may contain other components as long as its performance is not impaired. Examples of such components include water-soluble solvents such as ethanol, ethylene glycol, propylene glycol, dipropylene glycol, glycerin, butanediol, and hexanediol; alkylene oxide adducts of monohydric alcohols or monohydric phenols, and fatty acid esters thereof, and coloring. Agents and the like.

  The developer in which the defoaming dispersant for a resist developer of the present invention is used is an alkaline developer. Examples of the alkaline agent in the developer include alkali metal carbonates such as lithium carbonate, sodium carbonate and potassium carbonate; alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate and potassium hydrogen carbonate; lithium borate, boric acid Alkali metal borates such as sodium and potassium borate; alkali metal silicates such as lithium silicate, sodium silicate and potassium silicate; alkali metal hydroxide such as lithium hydroxide, sodium hydroxide and potassium hydroxide Inorganic alkaline compounds such as ethylenediamine, propylenediamine, pyrrolidine, morpholine, piperazine, tetramethylammonium hydroxide, tetraethylammonium hydroxide and trimethyl (2-hydroxyethyl) ammonium hydroxide; It is. Among these alkali agents, alkali metal carbonates and organic alkaline compounds are preferred, and sodium carbonate and tetramethylammonium hydroxide are more preferred.

  The concentration of the alkali agent in the developing solution varies depending on the type of the alkali agent used and the type of the resist to which the developing solution is applied. The amount is preferably 1 to 5 parts by mass, more preferably 0.3 to 3 parts by mass, and most preferably 0.5 to 2 parts by mass. In the case of an organic alkaline compound, the concentration of the alkaline agent in the developer is preferably 0.5 to 25 parts by mass, and more preferably 1 to 15 parts by mass with respect to 100 parts by mass of water. More preferably, it is most preferably 1.5 to 10 parts by mass.

  The temperature of the developing solution when developing the resist using the above developing solution is preferably 15 to 50 ° C, more preferably 20 to 40 ° C, and most preferably 25 to 35 ° C. If the temperature of the developing solution is lower than 15 ° C., the dissolution of the uncured resist portion may be insufficient, and if the temperature exceeds 50 ° C., the cured resist portion may peel off from the substrate. is there.

  In addition, the resist developing solution of the present invention includes, as long as the object of the present invention is not impaired, additional components conventionally used in resist developing solutions, for example, various known surfactants, lubricants, and stabilizers. An agent, a solubilizing agent, and the like may be appropriately added.

  The amount of the defoaming dispersant for the resist developer of the present invention is not particularly limited, and the amount to be used is selected according to various conditions such as the type of the developer, the concentration of the developer, the developing method, and the type of the resist. can do. For example, in the case of developing a dry film (film-like resist) using a 1% by mass aqueous solution of sodium carbonate as a developing solution, the antifoaming dispersant for a resist developing solution of the present invention is added to the developing solution using a glycerin partial fatty acid ester. It is preferable to use 0.005 to 0.2% by mass in terms of pure content. The addition method may be a partial fatty acid ester as it is, or a partial fatty acid ester diluted with water may be added. In preparing the developing solution, a partial fatty acid ester or a partial fatty acid ester diluted with water may be added, or may be further added to a foamed developing solution. The partial fatty acid ester according to the present invention may be used alone or in combination of two or more.

  The resist to be developed by the developer of the present invention may be any resist, whether negative or positive, as long as it can be developed using an aqueous alkali solution. Specifically, for example, (1) a positive resist containing a naphthoquinonediazide compound and a novolak resin; (2) a compound which generates an acid upon exposure, a compound which is decomposed by an acid to increase solubility in an aqueous alkali solution, and an alkali (3) Positive resist containing a soluble resin; (3) Positive resist containing a compound capable of generating an acid upon exposure to light, and an alkali-soluble resin having a group that is decomposed by an acid and increases the solubility in an aqueous alkali solution; (5) Negative resist containing a compound that generates an acid, a crosslinking agent, and an alkali-soluble resin; (5) Negative resist containing a compound that generates a radical upon exposure, a crosslinking agent, and an alkali-soluble resin; (6) Radical upon exposure Negative-type resin containing a compound which generates an alkali-soluble resin having a radical polymerizable group Strike, and the like.

  Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples. In the following Examples and Comparative Examples, “parts” and “%” are based on mass unless otherwise specified.

  In the test, the defoaming agents of Examples 1 to 9 and Comparative Examples 1 to 10 shown below were used. Examples 1 to 7 and Comparative Examples 1 and 2 are partial fatty acid esters obtained by esterifying a mixed fatty acid with an aliphatic trihydric alcohol. Table 1 shows the fatty acid composition (%) and the ester composition (%). The fatty acid composition was measured by gas chromatography (detector: FID) after saponifying the sample and methylesterification in accordance with the standard fat and oil analysis method. Further, the ester composition was measured by a TLC-FID method (yatron Co., Ltd., model Iatroscan MK5).

Example 8
A mixture of 100 parts of the partial fatty acid ester of Example 1 and 50 parts of a polyether polyol ester (a bis-octadecanoate ester of a block adduct of propylene oxide of 80 mol and ethylene oxide of 30 mol).

Example 9
A mixture of 100 parts of the partial fatty acid ester of Example 2 and 50 parts of a polyether polyol ester (tris dodecanoic acid ester of a random addition product of 50 mol of propylene oxide and 30 mol of ethylene oxide of trimethylolpropane).

Comparative Example 3
10 mol ethylene oxide adduct of 2,4,7,9-tetramethyldec-5-yne-4,7-diol.

Comparative Example 4
Polypropylene glycol (number average molecular weight 700).

Comparative Example 5
Polyoxypropylene glyceryl ether (number average molecular weight 1,000).

Comparative Example 6
Octadecanoic acid (stearic acid) ester of a block adduct of 40 mol of propylene oxide of octadecanol (stearyl alcohol) and 8 mol of ethylene oxide.

Comparative Example 7
Block adduct of 20 mol of propylene oxide and 20 mol of ethylene oxide of 2,2-diethyl-1,3-propanediol.

Comparative Example 8
Octadecanoic acid ester of the block adduct of Comparative Example 7.

Comparative Example 9
Bisoctadecanoic acid ester of a block adduct of propylene oxide 80 mol of propylene glycol and 30 mol of ethylene oxide.

Comparative Example 10
Dodecanoic acid ester of a random adduct of 50 mol of propylene oxide and 30 mol of ethylene oxide of trimethylolpropane.

<Preparation of test solution>
To 100 parts of a 1% aqueous sodium carbonate (Na ₂ CO ₃ ) solution, 0.05 parts of each of the defoamers of Examples 1 to 9 and Comparative Examples 1 to 10 was added to prepare a developer. A dry film prepared from an unexposed acrylic photosensitive resin in the developer was dissolved in a concentration of 0.2 g / L of the resin as a test solution, and used as a test solution in the following tests. In addition, a similar test was performed on a 2.5% tetramethylammonium hydride (TMAH) aqueous solution instead of the 1% aqueous sodium carbonate solution.

<Defoaming test>
50 mL of the test solution was placed in a 100-mL stoppered graduated cylinder, shaken 50 times a minute, allowed to stand, the state of the foam was observed, and the defoaming property was evaluated based on the following criteria.
：: The bubbles disappeared in less than 15 seconds, and the defoaming property was good.
Δ: The foam disappeared in 15 to 60 seconds, and the defoaming property was slightly poor.
X: Foam does not disappear even after more than 60 seconds, and the defoaming property is poor.

<Scum dispersibility test 1>
300 mL of the above test solution was placed in a glass container with a lid having a capacity of 400 mL, allowed to stand in a dark place at 30 ° C. for one week, the amount of sediment was visually determined, and the scum dispersibility was evaluated based on the following criteria.
：: No sediment was observed and scum dispersibility was good.
：: Slight sediment was observed, and scum dispersibility was slightly good.
Δ: A small amount of sediment was observed, and the scum dispersibility was slightly poor.
X: A large amount of sediment was observed and scum dispersibility was poor.

<Scum dispersibility test 2>
After laminating a dry film made of an acrylic photosensitive resin on a printed circuit board and partially exposing it with a mercury lamp, spray treatment with the test liquid (liquid temperature 30 ° C., spray time 10 seconds, spray pressure 150 kPa) Then, the adhesion of scum to the dry film or the substrate was visually determined, and the scum dispersibility was evaluated based on the following criteria.
：: No scum was adhered and scum dispersibility was good.
：: Scum adhesion was slightly observed, and scum dispersibility was slightly good.
Δ: A small amount of scum was observed, and scum dispersibility was slightly poor.
X: A large amount of scum adhered, poor scum dispersibility.

According to the present invention, when developing the resist, even if the resist component dissolved or dispersed in the developer increases, while having a high defoaming property with respect to the developer, excellent dispersibility of scum generated in the developer, An antifoaming dispersant for a resist developer that can prevent scum from adhering to a resist or its substrate can be provided.

Claims (6)

  It contains a mixed fatty acid in which the ratio of the middle fatty acid having 6 to 14 carbon atoms is 5 to 300 parts by mass with respect to 100 parts by mass of the higher fatty acid having 15 or more carbon atoms, and a partial fatty acid ester obtained by reacting an aliphatic trihydric alcohol with the mixed fatty acid. A defoaming dispersant for a photoresist developer.   The defoaming dispersant for a photoresist developer according to claim 1, wherein the ratio of the diester to the monoester of 100 parts by mass in the partial fatty acid ester is 5 to 1,500 parts by mass.   The defoaming dispersant for a photoresist developer according to claim 1 or 2, wherein the content of the branched fatty acid and the linear unsaturated fatty acid in the mixed fatty acid is 5 to 80% by mass based on the total amount of the mixed fatty acid.   The antifoam dispersant for a photoresist developer according to any one of claims 1 to 3, wherein the aliphatic trihydric alcohol is an aliphatic trihydric alcohol having 3 to 6 carbon atoms.   The defoaming dispersant for a photoresist developer according to any one of claims 1 to 4, further comprising a polyether polyol ester of a fatty acid having 10 to 20 carbon atoms. An alkaline photoresist developer comprising the defoaming dispersant for a photoresist developer according to claim 1.