JP2004129928A - Low-frequency generation probe - Google Patents

Low-frequency generation probe Download PDF

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Publication number
JP2004129928A
JP2004129928A JP2002298923A JP2002298923A JP2004129928A JP 2004129928 A JP2004129928 A JP 2004129928A JP 2002298923 A JP2002298923 A JP 2002298923A JP 2002298923 A JP2002298923 A JP 2002298923A JP 2004129928 A JP2004129928 A JP 2004129928A
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JP
Japan
Prior art keywords
low
electrodes
probe
frequency
frequency generation
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JP2002298923A
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Japanese (ja)
Inventor
Hajime Matsumura
松村 元
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JAPAN GIYARUZU KK
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JAPAN GIYARUZU KK
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Priority to JP2002298923A priority Critical patent/JP2004129928A/en
Publication of JP2004129928A publication Critical patent/JP2004129928A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a handy low-frequency generation probe suitable especially for the treatment of a face, concerning the low-frequency generation probe for generating a low-frequency pulse from a probe head part. <P>SOLUTION: Two electrodes 2, 3 for generating the low-frequency pulse are arranged in the head part 11 of a probe body 1. At least one of the two electrodes 2, 3 is arranged so as to be movable in an approaching/separating direction with respect to the other electrode. Thus, both the electrodes are used at a proper interval for a site to be treated on the face (e.g., the corner of each eye, or the cheek). <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本願発明は、プローブヘッド部から低周波パルスを発生させるようにした低周波発生プローブに関し、特に顔面のトリートメントに適したハンディタイプの低周波発生プローブに関するものである。
【0002】
【従来の技術】
低周波パルスを肌面に与えてマッサージ機能を発生させるようにした低周波治療器は、多数出回っている。この種の一般的な低周波治療器としては、治療器本体(低周波発生器)にそれぞれリード線を介して2つの低周波発生電極を接続したものがある(例えば、特許文献1参照)。
【0003】
この特許文献1の低周波治療器では、各低周波発生電極がそれぞれリード線を介して治療器本体に接続されているので、両電極間の間隔に自由度があり、身体肌面におけるかなり離間した2位置を同時にマッサージするのに適している。
【0004】
又、公知の低周波治療器の中には、顔面のような比較的狭い範囲のトリートメントを対象にしたハンディタイプの低周波発生プローブもある(例えば、特許文献2)。尚、この種の顔面用の低周波発生プローブは、顔の表情筋に低周波パルスを与えることにより、表情筋を刺激して該表情筋に弾力を与え、顔肌のたるみをとる(ハリのある肌にする)機能を有するものである。
【0005】
そして、この特許文献2の低周波発生プローブ(発明の名称は生体刺激装置)では、プローブ本体のヘッド部における、比較的小間隔をもった定位置に2つの低周波発生電極(パルス伝達導子)を取付けている。尚、この2つの低周波発生電極の間隔は、不変である。
【0006】
【特許文献1】
特開2001−212249号公報
【特許文献2】
特開平11−89945号公報
【0007】
【発明が解決しようとする課題】
ところが、特許文献1(特開2001−212249号公報)のように、リード線を介して各低周波発生電極を接続した低周波治療器では、各電極の接触位置に自由度があって離れた2位置を同時にマッサージできるが、各リード線が絡み合ったり邪魔になるという問題があった。又、このように、各リード線の先に各電極を接続させたものでは、例えば顔面のような狭い範囲をトリートメント(マッサージ)する場合には適さないものである。
【0008】
ところで、顔面を低周波パルスでトリートメント(マッサージ)する場合、例えば目尻付近のように小面積範囲を集中してトリートメントするには2つの電極を近接させる(例えば2cm程度の間隔にする)方がトリートメント効果が高くなり、他方、頬や額などの広面積部分をトリートメントするには2つの電極を離間させて(例えば4〜7cm程度の間隔)行う方が広範囲の面積を短時間でトリートメントできる。
【0009】
ところが、特許文献2(特開平11−89945号公報)に示す低周波発生プローブでは、2つの低周波発生電極をプローブ本体のヘッド部の定位置に(間隔不変状態で)取付けているので、該各電極を顔面の部位(例えば、目尻部分や頬部分)に適した間隔で使用することができなかった。
【0010】
本願発明は、主として顔面のトリートメントを行う低周波発生プローブにおいて、2つの電極を顔面の部位に適した間隔で使用し得るようにすることを目的としてなされたものである。
【0011】
【課題を解決するための手段】
本願発明は、上記課題を解決するための手段として次の構成を有している。尚、本願発明は、主として顔面のトリートメントを行う低周波発生プローブを対象にしている。
【0012】
そして、本願発明の低周波発生プローブは、プローブ本体のヘッド部に低周波パルスを発生させる2つの電極を設けるとともに、該2つの電極のうち、少なくとも一方の電極を他方の電極に対して近接・離間方向に移動可能に設けていることを特徴としている。
【0013】
2つの電極(低周波発生電極)は、何れか一方のみを移動可能にしてもよく、あるいは両方を移動可能にしてもよい。尚、2つの電極を最近接させた状態では、両電極間(中心間)の間隔が2cm程度になり、最離間させた状態では両電極間の間隔が5〜8cm程度になるようにするとよい。
【0014】
可動側の電極は、例えばプローブ本体に対して揺動自在なアームの先端部に取付けて、該アームを揺動させることによって、他方の電極との間隔を変更させ得るようにするとよい。尚、この場合、電極を取付けるアームは、プローブ本体に対して適度の摩擦抵抗がある状態で取付け、トリートメント時に可動側電極が不用意に移動しないようにする。
【0015】
低周波パルスの発生源(低周波パルス発生器)は、プローブ本体内に内蔵したものでも、外部接続形式のものでもよい。又、低周波パルス発生器のほかに充電式のバッテリーをプローブ本体内に内蔵すると、商業電源の無い場所でも使用できる。
【0016】
本願の低周波発生プローブは、例えば顔面の目尻付近をトリートメントする場合は、2つの電極を最近接(例えば間隔が2cm程度)させた状態で行い、他方、頬や額部分をトリートメントする場合には、両電極を所望間隔(例えば4〜8cmの範囲の所定間隔)まで離間させた状態で行う。そして、両電極を近接させた状態で顔肌(例えば目尻付近)に接触させると、顔肌の小面積範囲に低周波パルスを集中して与えることができ、他方、両電極を離間させた状態で顔肌(例えば頬部分)に接触させると、該各電極が接触する離間した2位置に低周波パルスを与えることができる。尚、顔肌全面をトリートメントする場合は、各電極を接触させる位置を順次移動させていく。
【0017】
【発明の効果】
このように、本願発明の低周波発生プローブによれば、プローブ本体のヘッド部に設けた2つの低周波発生電極間の間隔を自由に調整できる。従って、両電極を近接させた状態では、顔肌の小面積範囲(例えば目尻付近)を集中して低周波パルスによるトリートメントが行えるので、表情筋の弾力化(顔肌のたるみとり)を効率よく(短時間で)達成でき、他方、両電極を離間させた状態では、頬や額部分のように比較的広面積部分の全域を短時間でトリートメントすることができる、という効果がある。
【0018】
【発明の実施の形態】
以下、図1〜図5を参照して本願実施形態を説明すると、図1〜図3には本願第1実施形態の低周波発生プローブを示し、図4には第1実施形態の低周波発生プローブの使用方法を示し、図5には本願第2実施形態の低周波発生プローブを示している。
【0019】
図1〜図3に示す第1実施形態の低周波発生プローブは、ハンディタイプのプローブ本体1のヘッド部11に低周波パルスを発生させる2つの電極2,3を設けている。この実施形態の低周波発生プローブは、プローブ本体1内に低周波パルス発生器8とバッテリー9を内蔵した携帯式に構成している。尚、プローブ本体1の後端部には充電コード接続口4が形成されている。プローブ本体1の上面部には、電源スイッチ5と、出力(強弱)切換スイッチ6と、低周波のパルスモード(3種類)の切換スイッチ7が設けられている。
【0020】
2つの低周波発生電極2,3は、一方の電極をヘッド部11に対して不動状態で固定した固定側電極2とし、他方の電極を固定側電極2に対して近接・離間方向に移動可能な可動側電極3としている。即ち、この第1実施形態では、固定側電極2は、プローブ本体ヘッド部11に固定された固定アーム20の先端部に取付けており、可動側電極3は、プローブ本体ヘッド部11に対して揺動自在に取付けた可動アーム30の先端部に取付けている。尚、図2及び図3に示すように、固定側電極2は固定アーム20の先端部に設けた電極取付台21の下面に露出させており、可動側電極3は可動アーム30の先端部に設けた電極取付台31の下面に露出させている。
【0021】
可動アーム30の基端側は、ヘッド部11の下面側に設けたアーム取付台12(図2参照)にピン13で枢支しており、該可動アーム30が図1及び図3に示すように、実線図示位置と鎖線図示位置(符号30′)の間の角度a(a=約90°)の範囲で揺動し得るようにしている。尚、可動アーム30の基端部とアーム取付台12との間には、図2に示すようにゴムブッシュ14を介在させており、該可動アーム30がプローブ本体ヘッド部11に対して適度の摩擦抵抗がある状態で取付けている。従って、可動アーム30は強制的に(少し強く)揺動させないと移動しないようになっている。
【0022】
可動アーム30を固定アーム20に近接させると(各電極取付台21,31の外面同士が接合する)、可動側電極3が固定側電極2に対して近接し(図示例のものでは各電極2,3の中心間隔Lが約2cmとなる)、可動アーム30を鎖線図示位置(符号30′の位置)まで揺動させると、可動側電極3′が固定側電極2に対して大きく離間する(図示例のものでは各電極2,3′の中心間隔Lが約5cmとなる)。尚、可動アーム30の長さを長くしたり、あるいは可動アームの揺動角度aを大きくすることによって、両電極2,3′間の最大離間間隔Lをさらに大きくすることができる。
【0023】
この第1実施形態の低周波発生プローブは、図4に示すようにして使用される。即ち、例えば顔面の目尻付近をトリートメントする場合は、図4に実線図示するように、2つの電極2,3を最近接(例えば間隔が2cm程度)させた状態で行い、他方、頬や額部分をトリートメントする場合には、鎖線図示するように、両電極2,3を所望間隔(例えば最大間隔)まで離間させた状態で行う。そして、両電極2,3を近接させた状態(実線図示状態)で顔肌に接触させると、各電極2,3から顔肌の小面積範囲に低周波パルスを集中して与えることができ、他方、両電極2,3を離間させた状態(鎖線図示状態)で顔肌に接触させると、該各電極2,3が接触する離間した2位置に低周波パルスを与えることができる。尚、顔肌全面をトリートメントする場合は、各電極2,3を接触させる位置を順次移動させていく。
【0024】
このように、この実施形態の低周波発生プローブを使用すると、プローブ本体1のヘッド部11に設けた2つの低周波発生電極2,3間の間隔を自由に調整できる。そして、両電極2,3を近接させた状態では、顔肌の小面積範囲(例えば目尻付近)を集中して低周波パルスによるトリートメントが行え(表情筋の弾力化を効率よく達成できる)、他方、両電極2,3を離間させた状態では、頬や額部分のように比較的広面積部分の全域を短時間でトリートメントすることができる。
【0025】
図5に示す第2実施形態の低周波発生プローブは、2つの電極2,3ともに、相互に近接・離間方向に移動自在としている。即ち、各電極2,3は、それぞれヘッド部11に対して揺動自在な可動アーム30,30の先端部(各電極取付台21,31の下面)に取付けており、各可動アーム30,30を実線図示位置と鎖線図示位置(符号30′,30′の位置)との間の角度約90°の範囲で揺動させることにより、各電極2,3を近接状態と離間状態に変位させ得るようになっている。この場合、可動アーム30の長さを第1実施形態のものと同じにしたものであっても、両電極2′,3′間の最大離間間隔Lを8cm程度まで拡大できる。
【0026】
尚、この第2実施形態の低周波発生プローブのその他の構成は、第1実施形態のものと同じであり、その説明は第1実施形態のものを援用する。
【0027】
上記各実施形態では、低周波パルス発生器8をプローブ本体1に内蔵したものを採用しているが、該低周波パルス発生器8は、外部接続するものを使用してもよい。又、電源は、バッテリー9に代えて商業電源を使用してもよい。
【図面の簡単な説明】
【図1】本願第1実施形態の低周波発生プローブの平面図である。
【図2】図1の右側面図である。
【図3】図1の底面図である。
【図4】図1の低周波発生プローブの使用方法説明図である。
【図5】本願第2実施形態の低周波発生プローブの平面図である。
【符号の説明】
1はプローブ本体、2,3は電極、11はヘッド部、20は固定アーム、30は可動アームである。
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a low-frequency generation probe configured to generate a low-frequency pulse from a probe head, and particularly to a handy-type low-frequency generation probe suitable for treatment of a face.
[0002]
[Prior art]
There are many low-frequency treatment devices that apply a low-frequency pulse to the skin surface to generate a massage function. As a general low-frequency treatment device of this type, there is one in which two low-frequency generation electrodes are connected to a treatment device main body (low-frequency generator) via lead wires, respectively (for example, see Patent Document 1).
[0003]
In the low-frequency treatment device disclosed in Patent Document 1, since each low-frequency generation electrode is connected to the treatment device main body via a lead wire, there is a degree of freedom in the interval between the two electrodes, and the distance between the electrodes is considerably large. Suitable for massaging two positions at the same time.
[0004]
Further, among known low-frequency treatment devices, there is a handy-type low-frequency generation probe for a treatment in a relatively narrow range such as a face (for example, Patent Document 2). In addition, this type of low-frequency generation probe for the face applies a low-frequency pulse to the facial muscles of the face, thereby stimulating the facial muscles and giving the facial muscles an elasticity to remove the sagging of the facial skin. It has the function of making certain skin.
[0005]
In the low-frequency generation probe (the name of the invention is a biological stimulator) of Patent Document 2, two low-frequency generation electrodes (pulse transmission conductors) are provided at fixed positions at relatively small intervals in the head portion of the probe main body. ) Is installed. Note that the distance between the two low-frequency generation electrodes is unchanged.
[0006]
[Patent Document 1]
JP 2001-212249 A [Patent Document 2]
JP-A-11-89945
[Problems to be solved by the invention]
However, in a low-frequency treatment device in which each low-frequency generating electrode is connected via a lead wire as in Patent Document 1 (Japanese Patent Application Laid-Open No. 2001-212249), the contact positions of the electrodes have a degree of freedom and are separated. Although two positions can be massaged at the same time, there is a problem that each lead wire is entangled or obstructed. In addition, the connection of each electrode to the end of each lead wire is not suitable for treating (massaging) a narrow area such as the face.
[0008]
By the way, in the case of treating (massaging) the face with a low-frequency pulse, for example, in order to concentrate on a small area such as near the outer corner of the eye, it is better to bring two electrodes close to each other (for example, to set an interval of about 2 cm). On the other hand, in order to treat a wide area such as a cheek or a forehead, it is more effective to separate two electrodes (for example, an interval of about 4 to 7 cm) to treat a wide area in a short time.
[0009]
However, in the low-frequency generation probe disclosed in Patent Document 2 (Japanese Patent Application Laid-Open No. H11-89945), two low-frequency generation electrodes are mounted at fixed positions on the head portion of the probe main body (in an invariable state). Each electrode could not be used at an interval suitable for a part of the face (for example, the corner of the eye or the cheek).
[0010]
An object of the present invention is to provide a low-frequency generation probe that mainly performs facial treatment so that two electrodes can be used at an interval suitable for a part of the face.
[0011]
[Means for Solving the Problems]
The present invention has the following configuration as means for solving the above problems. It should be noted that the present invention is mainly directed to a low-frequency generation probe for performing facial treatment.
[0012]
The low-frequency generation probe of the present invention has two electrodes for generating a low-frequency pulse in the head portion of the probe main body, and at least one electrode of the two electrodes is close to the other electrode. It is characterized in that it is provided movably in the separating direction.
[0013]
Only one of the two electrodes (low-frequency generation electrodes) may be movable, or both may be movable. When the two electrodes are closest to each other, the distance between the two electrodes (between the centers) is about 2 cm, and when the electrodes are most separated, the distance between the two electrodes is about 5 to 8 cm. .
[0014]
The movable-side electrode is preferably attached to, for example, the tip of an arm that is swingable with respect to the probe main body, and by swinging the arm, the distance between the movable electrode and the other electrode may be changed. In this case, the arm on which the electrode is to be mounted is mounted in a state where there is an appropriate frictional resistance with respect to the probe main body so that the movable-side electrode does not move accidentally during the treatment.
[0015]
The source of the low-frequency pulse (low-frequency pulse generator) may be built in the probe body or may be of an external connection type. In addition, if a rechargeable battery is incorporated in the probe body in addition to the low-frequency pulse generator, it can be used in places where there is no commercial power supply.
[0016]
The low-frequency generation probe of the present application performs, for example, when treating the vicinity of the outer corner of the face, in a state where two electrodes are closest to each other (for example, an interval of about 2 cm), and on the other hand, when treating the cheek or forehead. This is performed in a state where both electrodes are separated to a desired interval (for example, a predetermined interval in a range of 4 to 8 cm). When the two electrodes are brought into contact with the skin of the face (for example, near the outer corner of the eyes), the low-frequency pulse can be concentrated and applied to a small area of the skin of the face, while the two electrodes are separated from each other. , A low-frequency pulse can be applied to two separate positions where the electrodes are in contact with each other. When treating the entire face skin, the position where each electrode is brought into contact is sequentially moved.
[0017]
【The invention's effect】
As described above, according to the low frequency generation probe of the present invention, the interval between the two low frequency generation electrodes provided on the head portion of the probe main body can be freely adjusted. Therefore, in a state where both electrodes are brought close to each other, treatment with a low-frequency pulse can be performed while concentrating on a small area of the facial skin (for example, near the outer corner of the eye), so that the elasticity of the facial muscles (slack of the facial skin) can be efficiently performed. On the other hand, when both electrodes are separated from each other, there is an effect that the entire area of a relatively large area such as a cheek or a forehead can be treated in a short time.
[0018]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, an embodiment of the present invention will be described with reference to FIGS. 1 to 5. FIGS. 1 to 3 show a low-frequency generation probe of the first embodiment of the present invention, and FIG. 4 shows a low-frequency generation probe of the first embodiment. FIG. 5 shows a low frequency generating probe according to a second embodiment of the present invention.
[0019]
The low-frequency generation probe according to the first embodiment shown in FIGS. 1 to 3 is provided with two electrodes 2 and 3 for generating low-frequency pulses in a head portion 11 of a handy type probe main body 1. The low-frequency generation probe of this embodiment is configured to be portable with a low-frequency pulse generator 8 and a battery 9 built in a probe main body 1. Note that a charging cord connection port 4 is formed at the rear end of the probe main body 1. A power switch 5, an output (strong / weak) changeover switch 6, and a low-frequency pulse mode (three types) changeover switch 7 are provided on the upper surface of the probe body 1.
[0020]
The two low-frequency generating electrodes 2 and 3 are fixed electrodes 2 which are fixed to the head portion 11 in an immovable state with respect to the head portion 11, and the other electrode is movable toward and away from the fixed electrode 2. Movable electrode 3. That is, in the first embodiment, the fixed-side electrode 2 is attached to the distal end of the fixed arm 20 fixed to the probe main body head 11, and the movable-side electrode 3 swings with respect to the probe main body head 11. It is attached to the tip of a movable arm 30 movably attached. As shown in FIGS. 2 and 3, the fixed electrode 2 is exposed on the lower surface of an electrode mount 21 provided at the tip of the fixed arm 20, and the movable electrode 3 is located at the tip of the movable arm 30. It is exposed on the lower surface of the provided electrode mounting base 31.
[0021]
The base end of the movable arm 30 is pivotally supported by a pin 13 on an arm mounting base 12 (see FIG. 2) provided on the lower surface side of the head section 11, and the movable arm 30 is arranged as shown in FIGS. In addition, it is possible to swing within a range of an angle a (a = about 90 degrees) between the position shown by the solid line and the position shown by the dashed line (reference numeral 30 '). A rubber bush 14 is interposed between the base end of the movable arm 30 and the arm mount 12, as shown in FIG. Installed with frictional resistance. Therefore, the movable arm 30 does not move unless it is forcibly (slightly strongly) swung.
[0022]
When the movable arm 30 is brought close to the fixed arm 20 (the outer surfaces of the electrode mounts 21 and 31 are joined to each other), the movable side electrode 3 comes close to the fixed side electrode 2 (in the illustrated example, each electrode 2 , center distance L 1 of 3 is about 2 cm), 'is swung to the position of) the movable side electrode 3' chain line position shown the movable arm 30 (reference numeral 30 is separated largely to the fixed side electrode 2 (in the illustrated example is the center distance L 2 is approximately 5cm of each electrode 2,3 '). Incidentally, or increase the length of the movable arm 30, or by increasing the swing angle a of the movable arm, the maximum separation distance L 2 between the electrodes 2 and 3 'can be further increased.
[0023]
The low-frequency generation probe according to the first embodiment is used as shown in FIG. That is, for example, when a treatment is performed near the outer corner of the face, as shown by a solid line in FIG. 4, the treatment is performed in a state where the two electrodes 2 and 3 are closest to each other (for example, the interval is about 2 cm). Is performed in a state where both electrodes 2 and 3 are separated to a desired interval (for example, a maximum interval) as shown by a chain line. Then, when the electrodes 2 and 3 are brought into contact with the face skin in a state where they are brought close to each other (the state shown by the solid line), low-frequency pulses can be concentrated and applied from the electrodes 2 and 3 to a small area of the face skin, On the other hand, when the electrodes 2 and 3 are brought into contact with the face skin in a state where they are separated (in a state shown by a dashed line), a low-frequency pulse can be applied to two separated positions where the electrodes 2 and 3 come into contact. When the entire face skin is to be treated, the positions where the electrodes 2 and 3 are brought into contact are sequentially moved.
[0024]
As described above, when the low-frequency generation probe of this embodiment is used, the interval between the two low-frequency generation electrodes 2 and 3 provided on the head section 11 of the probe main body 1 can be freely adjusted. Then, in a state where both electrodes 2 and 3 are brought close to each other, a treatment with a low-frequency pulse can be performed by concentrating a small area of the facial skin (for example, near the outer corner of the eye) (the elasticity of the facial muscles can be efficiently achieved). In a state where the two electrodes 2 and 3 are separated from each other, the entire area of a relatively wide area such as a cheek or a forehead can be treated in a short time.
[0025]
In the low-frequency generation probe of the second embodiment shown in FIG. 5, both of the two electrodes 2 and 3 are movable in the directions of approaching and moving away from each other. That is, the electrodes 2 and 3 are attached to the distal ends (the lower surfaces of the electrode mounts 21 and 31) of the movable arms 30 and 30 that are swingable with respect to the head unit 11, respectively. The electrodes 2 and 3 can be displaced between a close state and a separated state by swinging the electrodes 2 and 3 within a range of an angle of about 90 ° between a solid line illustrated position and a chain line illustrated position (positions denoted by reference numerals 30 ′ and 30 ′). It has become. In this case, even if the length of the movable arm 30 were the same as those in the first embodiment can be expanded both electrodes 2 ', 3' the maximum separation distance L 3 between up to about 8 cm.
[0026]
The other configuration of the low-frequency generation probe of the second embodiment is the same as that of the first embodiment, and the description of the low-frequency generation probe is the same as that of the first embodiment.
[0027]
In each of the above embodiments, the low-frequency pulse generator 8 incorporated in the probe main body 1 is employed, but the low-frequency pulse generator 8 may be externally connected. As the power source, a commercial power source may be used instead of the battery 9.
[Brief description of the drawings]
FIG. 1 is a plan view of a low-frequency generation probe according to a first embodiment of the present application.
FIG. 2 is a right side view of FIG.
FIG. 3 is a bottom view of FIG. 1;
FIG. 4 is an explanatory diagram of how to use the low frequency generation probe of FIG. 1;
FIG. 5 is a plan view of a low-frequency generation probe according to a second embodiment of the present application.
[Explanation of symbols]
1 is a probe main body, 2 and 3 are electrodes, 11 is a head part, 20 is a fixed arm, and 30 is a movable arm.

Claims (1)

プローブ本体(1)のヘッド部(11)に低周波パルスを発生させる2つの電極(2,3)を設けるとともに、
前記2つの電極(2,3)のうち、少なくとも一方の電極(2又は3)を他方の電極(3又は2)に対して近接・離間方向に移動可能に設けている、
ことを特徴とする低周波発生プローブ。
The head part (11) of the probe body (1) is provided with two electrodes (2, 3) for generating low-frequency pulses,
At least one electrode (2 or 3) of the two electrodes (2, 3) is provided so as to be movable in a direction of approaching / separating from the other electrode (3 or 2).
A low-frequency generation probe, characterized in that:
JP2002298923A 2002-10-11 2002-10-11 Low-frequency generation probe Pending JP2004129928A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002298923A JP2004129928A (en) 2002-10-11 2002-10-11 Low-frequency generation probe

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002298923A JP2004129928A (en) 2002-10-11 2002-10-11 Low-frequency generation probe

Publications (1)

Publication Number Publication Date
JP2004129928A true JP2004129928A (en) 2004-04-30

Family

ID=32288200

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002298923A Pending JP2004129928A (en) 2002-10-11 2002-10-11 Low-frequency generation probe

Country Status (1)

Country Link
JP (1) JP2004129928A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008136785A (en) * 2006-12-05 2008-06-19 Mutsuro Miyama Electric therapeutic apparatus
GB2473133A (en) * 2009-08-28 2011-03-02 Micromode Medical Ltd Electrostimulation device having relatively moveable electrodes
JP2015508308A (en) * 2011-12-28 2015-03-19 ルゾン,ジョセフ Skin care equipment
US9415203B2 (en) 2009-08-28 2016-08-16 Caci Microlift Limited Electrostimulation devices
JP2017205401A (en) * 2016-05-20 2017-11-24 株式会社ステラ佐々木 Body Treatment Device and Its Probe
US9937343B2 (en) 2009-08-28 2018-04-10 Caci Microlift Limited Electrostimulation skin massage devices

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008136785A (en) * 2006-12-05 2008-06-19 Mutsuro Miyama Electric therapeutic apparatus
GB2473133A (en) * 2009-08-28 2011-03-02 Micromode Medical Ltd Electrostimulation device having relatively moveable electrodes
US8639361B2 (en) 2009-08-28 2014-01-28 Micromode Medical Limited Electrostimulation devices
GB2473133B (en) * 2009-08-28 2014-09-24 Caci Microlift Ltd Electrostimulation devices with relatively moveable electrodes
US9415203B2 (en) 2009-08-28 2016-08-16 Caci Microlift Limited Electrostimulation devices
US9937343B2 (en) 2009-08-28 2018-04-10 Caci Microlift Limited Electrostimulation skin massage devices
EP2289595B1 (en) * 2009-08-28 2021-06-16 CACI Microlift Limited Electrostimulation devices for cosmetics
JP2015508308A (en) * 2011-12-28 2015-03-19 ルゾン,ジョセフ Skin care equipment
JP2017205401A (en) * 2016-05-20 2017-11-24 株式会社ステラ佐々木 Body Treatment Device and Its Probe

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