JP2004110968A - Apparatus and method for radiating electron beam, and apparatus and method for manufacturing disk-shaped body - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus and a method for radiating an electron beam capable of easily curing a material which is hard to cure by irradiation with ultraviolet rays, and easily switching between irradiation and non-irradiation of an electron beam, and to provide an apparatus and a method for manufacturing a disk-shaped body capable of efficiently forming a lubricating layer or the like on the disk-shaped body from the material which is hard to cure by irradiation with ultraviolet rays. <P>SOLUTION: The electron beam radiation apparatus 1 is provided with a rotational drive part 17 for rotationally driving a rotated body 2; a shielding case 10 for housing the rotated body to be rotatable, and an electron beam irradiation part 11 arranged on the shielding case so that an electron beam is irradiated to the surface of the rotated body through an irradiation window 11a; a shutter member 22 which is arranged between the irradiation window and the surface of the rotated body and is movable between an open position where the irradiation window is open for allowing the electron beam therefrom to pass through and a closed position where the irradiation window is closed for shading the electron beam; and a shutter driving mechanism 20 for moving the shutter member so as to switch between irradiation and non-irradiation of the electron beam while the rotated body is rotating. <P>COPYRIGHT: (C)2004,JPO

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to an electron beam irradiation device for electron beam irradiation, an electron beam irradiation method, a disk-shaped body manufacturing apparatus, and a disk-shaped body manufacturing method.
[0002]
[Prior art]
Conventionally, optical disks such as CDs (compact disks) and DVDs (digital versatile disks) have been put into practical use as optical information recording media. Recently, blue-violet semiconductor lasers having an oscillation wavelength of about 400 nm have been developed. Development of next-generation high-density optical discs such as high-density DVDs, which can record at higher densities than DVDs, using blue-violet semiconductor lasers, is underway.
[0003]
FIG. 12 shows an example of a layer configuration currently considered for such a next-generation high-density optical disk. This high-density optical disk has a recording layer 91 for recording information and a light that transmits a laser beam for recording / reproduction so as to enter the recording layer 91 on a base material 90 made of a resin material such as polycarbonate. A transmissive layer 92 and a lubricating layer 93 in consideration of contact with a member on the optical pickup side are sequentially laminated.
[0004]
The light transmitting layer 92 and the lubricating layer 93 are irradiated with ultraviolet light after being applied for curing during their formation. Particularly, the lubricating layer and the like are formed of a silicone compound having a radical polymerizable double bond and a fluorine compound. When formed from a material, if a reaction initiator is added, the properties as a lubricating layer or the like may be inferior. In such a case, if no reaction initiator is added, curing by ultraviolet irradiation is difficult, and sufficient quality is not obtained. A lubrication layer cannot be formed.
[0005]
[Patent Document 1]
JP-A-4-01839
[0006]
[Patent Document 2]
JP-A-11-162015
[0007]
[Patent Document 3]
JP-A-7-292470
[0008]
[Patent Document 4]
JP 2000-64042 A
[0009]
[Problems to be solved by the invention]
The present invention has been made in consideration of the above-described problems of the related art, and has been made in consideration of the above-described problems of the prior art. It is an object to provide an apparatus and an electron beam irradiation method. Further, a disc-shaped body manufacturing apparatus which can easily perform switching between irradiation and non-irradiation of an electron beam, and can efficiently form a resin layer or the like made of a material which is difficult to cure by ultraviolet irradiation on the disc-shaped body. An object of the present invention is to provide a method for manufacturing a disk-shaped body.
[0010]
[Means for Solving the Problems]
In order to achieve the above object, an electron beam irradiation apparatus according to the present invention includes a rotation driving unit that rotationally drives a rotating object, a shielding container that rotatably stores the rotating object, and a rotating container that rotates the rotating object. On the other hand, an electron beam irradiator provided in the shielding container so that an electron beam is irradiated from the irradiation window, and disposed between the irradiation window and the surface of the rotated object, and the electron beam from the irradiation window A shutter member movable between an open position that opens to transmit light and a closed position that closes so as to block the light, and the shutter member that switches between irradiation and non-irradiation of the electron beam during rotation of the rotating body. And a shutter drive mechanism for moving the shutter.
[0011]
According to this electron beam irradiation device, since the surface of the rotating object is irradiated with the electron beam, the surface of the rotating object can be efficiently irradiated with an electron beam having energy larger than that of ultraviolet rays. For this reason, for example, a layer having lubricity (hereinafter simply referred to as “lubricating layer”) or the like made of a material that is difficult to cure by ultraviolet irradiation can be easily cured. In addition, the switching control of irradiation / non-irradiation of the electron beam can be easily executed by the shutter member, and since the power supply of the electron beam irradiation unit does not need to be turned on / off, the startup time of the electron beam irradiation unit is not required. It is efficient when electron beam irradiation is repeated.
[0012]
In the above electron beam irradiation apparatus, it is preferable that the electron beam irradiation section generates an electron beam having an acceleration voltage of 20 to 100 kV. Thereby, particularly, the electron beam energy is efficiently applied to, for example, the resin layer in a thin range from the surface, and the substrate and the like existing thereunder are not affected by the electron beam.
[0013]
Further, the inside of the shielding container is, for example, nitrogen gas, argon gas or CO2. ₂ It is preferable that an atmosphere of an inert gas such as a gas or a mixed gas thereof be provided, and a gas inlet and a gas outlet be provided in the shielding container so that the inert gas flows near the irradiation window. The irradiation window can be cooled by the flow of the inert gas.
[0014]
In this case, by providing a temperature sensor near the irradiation window and adjusting the flow rate of the inert gas based on the temperature measured by the temperature sensor, the vicinity of the irradiation window can be controlled to a certain temperature or lower.
[0015]
Preferably, an oxygen concentration meter for measuring the oxygen concentration in the shielding container is provided. Thereby, it is possible to confirm that the inside of the shielding container has a certain oxygen concentration or less. For example, radical reaction inhibition by oxygen near the irradiated surface of the rotating body to be irradiated with the electron beam is less likely to occur, and good curing is achieved. Reaction can be secured.
[0016]
Further, it is preferable that a vacuum device for reducing the pressure inside the shielding container is provided. This makes it possible to perform the electron beam irradiation in the shielding container reduced to a predetermined pressure, and to easily and efficiently replace the inside of the shielding container with an inert gas atmosphere.
[0017]
Preferably, the shielding container is openable and closable, is made of a metal material such as steel or stainless steel, and has a shielding structure for shielding electron beams from the irradiation window. Thereby, the electron beam and the secondary X-ray can be shielded, and the electron beam and the secondary X-ray do not leak to the outside, which is preferable in terms of safety measures against exposure. In addition, it is preferable to provide a sealing structure for sealing the shielding container in the vicinity of the shielding structure, whereby an electron beam is shielded from a material such as an O-ring constituting the sealing structure, and the electron beam is irradiated. No material degradation occurs.
[0018]
Further, the rotating object has a disk shape, and an electron beam can be irradiated from the irradiation window to a region extending in a radial direction of the surface. For this reason, by simply arranging the electron beam irradiation unit in one radial direction, it is possible to easily and efficiently irradiate the entire rotating disk-shaped rotated object with the electron beam. Note that a plurality of electron beam irradiators may be arranged to irradiate an electron beam at a plurality of radial locations.
[0019]
Preferably, the electron beam irradiation unit includes a plurality of electron beam irradiation tubes arranged in the radial direction. In this case, the radial direction may be either a direction extending radially from the rotation center of the rotated object or a direction extending from the point eccentric to the rotation center of the rotated object to the outer periphery of the rotated object.
[0020]
The plurality of electron beam irradiation tubes may be arranged such that the distribution of the irradiation beam intensity of the electron beam in the radial direction is substantially uniform. In this case, it is preferable to control the time of the electron beam irradiation in accordance with the radial position of the rotating body so that the distribution of the integrated irradiation dose by the electron beam irradiation becomes substantially uniform in the radial direction. . Thereby, the uneven distribution in the radial direction of the integrated irradiation dose of the electron beam irradiation due to the difference in the speed at the radial position on the surface of the rotating body can be corrected to be uniform.
[0021]
For example, when the shutter member is opened, it starts to open at the outer peripheral position on the surface of the rotating body and gradually opens to the inner peripheral position, thereby increasing the irradiation time on the outer peripheral side where the peripheral speed is high, and increasing the peripheral speed. Since the irradiation time can be shortened on the inner peripheral side where the electron beam irradiation is slow, the uneven distribution in the radial direction of the integrated irradiation dose of the electron beam irradiation can be corrected so as to be substantially uniform. In this case, it is preferable that the shutter member is closed by moving in the direction opposite to the opening direction.
[0022]
Further, for example, an opening is provided so as to extend in the radial direction, and the opening and closing of the opening is performed by moving the shutter member to switch between irradiation and non-irradiation of the electron beam. By controlling the time of the electron beam irradiation in accordance with the relative position of the shutter member and the moving speed of the shutter member in accordance with the radial position of the rotating body, the irradiation time is increased on the outer peripheral side where the speed is high, and when the speed is low. Since the irradiation time can be shortened on the peripheral side, the above-described uneven distribution in the radial direction of the integrated irradiation dose of the electron beam irradiation can be corrected to be substantially uniform.
[0023]
Further, the plurality of electron beam irradiation tubes can be arranged such that the irradiation beam intensity of the electron beam in the radial direction has a distribution such that the intensity is higher on the outer side and smaller on the inner side. As a result, in the rotating body that rotates at a constant rotation speed, the irradiation line intensity is increased on the outer peripheral side where the peripheral speed is high, and is decreased on the inner circumferential side where the peripheral speed is low. Can be corrected so that the uneven distribution in the radial direction of the integrated irradiation dose of the electron beam irradiation caused by the difference in the electron beam irradiation becomes substantially uniform.
[0024]
In this case, by configuring the shutter member to open and close at a relatively high speed higher than the rotation speed of the rotating body, a difference in irradiation time when opening and closing the shutter member can be ignored.
[0025]
As described above, the electron beam irradiation can be performed so that the integrated irradiation dose of the electron beam irradiation is distributed substantially uniformly in the radial direction of the rotating object, and the electron beam can be almost uniformly distributed over the entire irradiated surface of the rotating object. , The resin layer can be uniformly and instantly and efficiently cured, for example.
[0026]
In the above-described electron beam irradiation apparatus, an opening is provided so as to extend in the radial direction, and the opening and closing of the opening is performed by moving the shutter member to switch between irradiation and non-irradiation of the electron beam. it can. In this case, it is preferable that the opening is formed in at least one of the shutter member and another member provided between the irradiation window and the surface of the rotated member.
[0027]
An electron beam irradiation method according to the present invention includes a step of rotating and driving a rotatable body accommodated in a sealable shield container, and provided between a surface of the rotatable body and an irradiation window of an electron beam irradiation unit. Moving a shutter member to irradiate the rotating surface of the object to be rotated with an electron beam from the irradiation window; and moving the shutter member after irradiating the electron beam for a predetermined time to block the electron beam. Stopping the irradiation.
[0028]
According to this electron beam irradiation method, since the surface of the rotating object is irradiated with the electron beam, the surface of the rotating object can be efficiently irradiated with an electron beam having energy larger than that of the ultraviolet light. Therefore, for example, a lubricating layer made of a material that is difficult to cure by ultraviolet irradiation can be easily cured. In addition, the switching control of irradiation / non-irradiation of the electron beam can be easily executed by the shutter member, and since the power supply of the electron beam irradiation unit does not need to be turned on / off, the startup time of the electron beam irradiation unit is not required. It is efficient when electron beam irradiation is repeated.
[0029]
In the above electron beam irradiation method, it is preferable that the electron beam irradiation unit has an acceleration voltage of 20 to 100 kV. Thereby, particularly, the electron beam energy is efficiently applied to, for example, the resin layer in a thin range from the surface, and the substrate and the like existing thereunder are not affected by the electron beam.
[0030]
Further, by reducing the pressure in the shielding container and then introducing an inert gas to replace the inert gas atmosphere, the inside of the shielding container can be easily and efficiently made to have an inert gas atmosphere.
[0031]
Further, it is preferable to introduce the inert gas while measuring the oxygen concentration in the shielding container, and by flowing the inert gas from the gas inlet to the gas outlet through the vicinity of the irradiation window. Preferably, the vicinity of the irradiation window is cooled.
[0032]
Preferably, the cooling temperature is controlled by adjusting a flow rate of the inert gas based on a temperature measured by a temperature sensor provided near the irradiation window.
[0033]
Preferably, the rotating member has a disk shape, and irradiates an electron beam from the irradiation window to a region extending in a radial direction of the surface. Note that a plurality of electron beam irradiators may be arranged to irradiate an electron beam at a plurality of radial locations.
[0034]
In this case, the electron beam irradiation can be performed by a plurality of electron beam irradiation tubes arranged in the radial direction as the electron beam irradiation unit.
[0035]
Further, the plurality of electron beam irradiation tubes are arranged so that the distribution of the irradiation intensity of the electron beam in the radial direction is substantially uniform, and the distribution of the integrated irradiation dose by the electron beam irradiation is in the radial direction. It is preferable that the time of the electron beam irradiation is controlled according to the radial position of the rotating body so as to be substantially uniform.
[0036]
Thereby, the uneven distribution in the radial direction of the integrated irradiation dose of the electron beam irradiation caused by the difference in the speed at the radial position on the surface of the rotating body can be corrected to be substantially uniform. By controlling the time by opening to the inner peripheral position gradually at the outer peripheral position of the surface of the rotating body when opening, the irradiation time is increased on the outer peripheral side with a higher peripheral speed, and Since the irradiation time can be shortened on the peripheral side, the above-described uneven distribution in the radial direction of the integrated irradiation dose of the electron beam irradiation can be corrected to be substantially uniform. In this case, it is preferable to close the shutter member by moving the shutter member in a direction opposite to the opening direction.
[0037]
Further, the plurality of electron beam irradiation tubes are arranged in such a manner that the irradiation beam intensity of the electron beam in the radial direction is large on the outer side and smaller on the inner side, so that the rotation speed is constant. In the rotating rotating body, the irradiation beam intensity is increased on the outer peripheral side where the peripheral speed is high, and it is decreased on the inner peripheral side where the peripheral speed is low, so that the electron beam caused by the difference in the velocity at the radial position on the surface of the rotating body The uneven distribution in the radial direction of the integrated irradiation dose of irradiation can be corrected so as to be substantially uniform.
[0038]
In this case, by configuring the shutter member to open and close at a relatively high speed higher than the rotation speed of the rotating body, a difference in irradiation time when opening and closing the shutter member can be ignored.
[0039]
As described above, electron beam irradiation can be performed so that the integrated irradiation dose of electron beam irradiation is distributed almost uniformly in the radial direction of the rotating object, and the entire irradiated surface of the rotating object is uniformly irradiated with the electron beam. Since energy is applied, for example, the lubricating layer can be uniformly and instantly and efficiently cured.
[0040]
An apparatus for manufacturing a disk-shaped body according to the present invention includes the above-described electron beam irradiation device, and uses the rotated body as a disk-shaped body, and cures a lubrication layer and / or a resin layer formed thereon by the electron beam irradiation. It is characterized in that it is configured to be.
[0041]
According to this disk-shaped body manufacturing apparatus, since the surface of the rotating disk-shaped body is irradiated with the electron beam, the surface of the disk-shaped body can be efficiently irradiated with the electron beam having energy larger than that of ultraviolet rays. it can. Therefore, a lubricating layer or the like made of a material that is difficult to cure by ultraviolet irradiation can be easily cured and can be efficiently formed on the disk-shaped body. In addition, the switching control of irradiation / non-irradiation of the electron beam can be easily executed by the shutter member, and since the power supply of the electron beam irradiation unit does not need to be turned on / off, the startup time of the electron beam irradiation unit is not required. In addition, electron beam irradiation can be efficiently repeated on a large number of disk-shaped bodies for forming a lubricating layer, and productivity is improved.
[0042]
In addition, by performing electron beam irradiation so that the integrated irradiation dose of electron beam irradiation is distributed almost uniformly in the radial direction of the disk-shaped object, the energy of the electron beam is uniformly applied to the entire surface to be irradiated of the disk-shaped object. Therefore, the lubricating layer and the like can be uniformly and instantly and efficiently cured.
[0043]
A method for manufacturing a disk-shaped body according to the present invention uses the above-described electron beam irradiation apparatus, or uses the above-described electron beam irradiation method, and sets the rotating body as a disk-shaped body, and forms a lubricating layer formed thereon. And / or curing the resin layer by the electron beam irradiation.
[0044]
According to this method of manufacturing a disk-shaped body, since the surface of the rotating disk-shaped body is irradiated with the electron beam, it is possible to efficiently irradiate the surface of the disk-shaped body with an electron beam having energy larger than that of ultraviolet rays. it can. Therefore, a lubricating layer or the like made of a material that is difficult to cure by ultraviolet irradiation can be easily cured and can be efficiently formed on the disk-shaped body. In addition, the switching control of irradiation / non-irradiation of the electron beam can be easily executed by the shutter member, and since the power supply of the electron beam irradiation unit does not need to be turned on / off, the startup time of the electron beam irradiation unit is not required. In addition, electron beam irradiation can be efficiently repeated on a large number of disk-shaped bodies for forming a resin layer and the like, and productivity is improved.
[0045]
In addition, by performing electron beam irradiation so that the integrated irradiation dose of electron beam irradiation is distributed almost uniformly in the radial direction of the disk-shaped object, the energy of the electron beam is uniformly applied to the entire surface to be irradiated of the disk-shaped object. Therefore, the lubricating layer and the like can be uniformly and instantly and efficiently cured.
[0046]
In the above-described method for manufacturing a disk-shaped body, an electron beam having an accelerating voltage of 20 to 100 kV is used to efficiently apply electron beam energy to a resin layer in a thin range from the surface, and a base material existing below the resin layer. Etc. are not affected by the electron beam.
[0047]
The method of manufacturing the disk-shaped body preferably includes a step of forming a lubrication layer on the disk-shaped body before the irradiation, which is performed before the electron beam irradiation step. Can be cured by electron beam irradiation.
[0048]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, an electron beam irradiation apparatus according to a first embodiment of the present invention and a disk-shaped medium manufacturing apparatus according to a second embodiment will be described with reference to the drawings.
[0049]
<First Embodiment>
[0050]
FIG. 1 is a side view schematically showing an electron beam irradiation apparatus according to an embodiment of the present invention, and FIG. 2 is a plan view schematically showing a shutter member and a shutter driving mechanism of the electron beam irradiation apparatus of FIG. FIG. 3 is a block diagram showing a control system of the electron beam irradiation apparatus of FIG. 1, and FIG. 4 is a flowchart showing an operation of the electron beam irradiation apparatus of FIG.
[0051]
As shown in FIG. 1, the electron beam irradiation apparatus 1 includes a shielding container 10 made of stainless steel for rotatably receiving the rotating body 2 and shielding the electron beam, and a center hole of the rotating body 2. A motor 17 for driving the rotating body 2 held by being engaged with the engaging portion 4 via the rotating shaft 3 and an electron beam with a low acceleration voltage in the radial direction with respect to the rotating body 2 from the irradiation window 11a An electron beam irradiating section 11 for irradiation, a power supply 12 for applying a voltage to the electron beam irradiating section 11, a temperature sensor 24 disposed near the irradiation window 11a, and an irradiation window 11a connected to the temperature sensor 24. A temperature measuring device 13 for measuring a temperature in the vicinity.
[0052]
The electron beam irradiation apparatus 1 includes an oxygen concentration meter 16 for measuring the oxygen concentration in a closed space in the shielding container 10, a vacuum device 18 for evacuating and reducing the pressure in the shielding container 10 via a valve 19, A nitrogen gas source 14 for supplying nitrogen gas to replace the inside with a nitrogen gas atmosphere, and a nitrogen gas is introduced from the nitrogen gas source 14 through a gas inlet 25 and is discharged from a gas outlet 26 through the vicinity of the irradiation window 11a. And a gas flow control valve 15 capable of controlling the gas flow when flowing.
[0053]
The electron beam irradiation apparatus 1 further includes a disk 21 with an opening, which is larger in diameter than the object to be rotated 2 and is disposed between the object to be rotated 2 and the irradiation window 11 a of the electron beam irradiation unit 11. A shutter drive mechanism 20 having a shutter member 22 disposed between the irradiation window 11a and a slider 23 for driving the shutter member 22 is provided.
[0054]
As shown in FIG. 2, the disk 21 has a fan-shaped opening 21 a, and an electron beam from the electron beam irradiation unit 11 passes through the fan-shaped opening 21 a to the radially inner side and the outer side of the rotated body 2. Irradiation is performed on the radial region 2a formed between the two.
[0055]
The shutter member 22 is formed in a rectangular shape from steel or stainless steel that shields an electron beam. When the shutter member 22 is driven by the slider 23 in the sliding direction H in FIG. The electron beam from the electron beam irradiation unit 11 is blocked, and the electron beam is not irradiated on the radial area 2a of the rotating body 2. When the shutter member 22 is driven by the slider 23 in the slide direction H ′ opposite to the above, the shutter member 22 is completely retracted from the opening 21a and moves to the open position where the opening 21a is opened as shown by the solid line in FIG. The electron beam from the irradiation unit 11 is passed, and the electron beam is irradiated on the radial region 2 a of the rotating body 2.
[0056]
As shown in FIG. 2, the electron beam irradiation unit 11 includes column-shaped electron beam irradiation tubes 31, 32, and 33 arranged in the radial direction of the rotating body 2. And the electron beam irradiation tubes 32 and 33 are arranged so as to be at substantially the same radial position on the outer peripheral side.
[0057]
A voltage is applied from the power supply 12 to each of the electron beam irradiation tubes 31 to 33, and an electron beam having an acceleration voltage of 20 to 100 kV is applied to the radial region 2a of the rotating body 2 from each irradiation window.
[0058]
A specific example of the arrangement of the electron beam irradiation tubes 31, 32, and 33 in FIG. 2 in the radial direction will be described with reference to FIG. FIG. 13A is a partial plan view schematically showing a first arrangement example of the electron beam irradiation tube with respect to the rotating body in the electron beam irradiation apparatus 1, and FIG. 13B is a partial plan view of the electron beam in the first arrangement example. FIG. 3 is a distribution diagram schematically showing an irradiation intensity distribution.
[0059]
As shown in FIG. 13A, the electron beam irradiation tubes 31, 32, and 33 are arranged so as to fit within the opening 21a of the disk 21, but the electron beam irradiation tubes 32 and 33 are positioned at their center positions. 32a and 33a are arranged at substantially the same radial position (distance in the radial direction from the center of the rotating body 2) r2 on the outer peripheral side with respect to the rotating body 2, and the center position 31a of the electron beam irradiation tube 31 is covered. It is arranged at a radial position r <b> 1 on the inner peripheral side with respect to the rotating body 2.
[0060]
When the electron beam irradiation tubes 31, 32, and 33 are arranged as shown in FIG. 13A, the irradiation intensity of the electron beam is distributed in the radial direction r of the rotating body 2 as shown in FIG. The distribution is such that the radiation intensity of the line is relatively large on the outer periphery and relatively smaller on the inner periphery.
[0061]
In FIG. 13A, assuming that the time required for one rotation when the rotating body 2 rotates at a constant speed in the rotation direction S at the time of electron beam irradiation is t seconds, the peripheral velocity v1 at the radial position r1 of the rotating body 2 and The peripheral velocity v2 at the radial position r2 can be expressed by the following equations (1) and (2), respectively.
[0062]
v1 = (2π · r1) / t (1)
v2 = (2π · r2) / t (2)
[0063]
Here, since r1 <r2, the relationship between the peripheral velocities v1 and v2 is expressed by the following equation (3).
[0064]
v1 <v2 (3)
[0065]
As described above, in the rotating body 2 that rotates at a constant rotation speed, the peripheral velocity differs as in Expression (3) depending on the radial position r of the surface of the rotating body 2, so that the integrated irradiation dose of electron beam irradiation is smaller than the radius. In the direction area 2a, an uneven distribution such that the distribution becomes large on the inner circumference side and becomes smaller on the outer circumference side is shown. However, by arranging the electron beam irradiation tubes 31, 32, and 33 as shown in FIG. As shown in FIG. 13 (b), since the irradiation intensity of the electron beam is relatively large on the outer periphery side and relatively smaller on the inner periphery side, the uneven distribution of the integrated irradiation dose of the electron beam irradiation in the radial direction can be corrected. Target can be uniform.
[0066]
The moving speed when the shutter 23 is opened and closed by the slider 23 by the shutter driving mechanism 20 is relatively high, and is considerably higher than the rotation speed of the rotating body. The difference in the irradiation time can be ignored. In addition, the positions of the electron beam irradiation tubes 31 to 33 in FIG. 13A may be adjusted so that the distribution of the integrated irradiation dose of the electron beam irradiation becomes more uniform.
[0067]
The electron beam irradiation apparatus 1 of FIGS. 1 and 2 performs the electron beam irradiation while being entirely controlled by the control unit 30 as shown in FIG. 3, but each step S01 of the operation of the electron beam irradiation apparatus 1 is performed. Steps S11 to S11 will be described with reference to FIG.
[0068]
Under the control of the control unit 30, first, the vacuum device 18 is operated to depressurize the inside of the shielding container 10 (S01), the valve 19 is closed, and nitrogen gas is supplied from the nitrogen gas source 14 via the flow control valve 15 to the shielding container. 10 (S02). Thereby, the inside of the shielding container 10 can be easily replaced with the nitrogen atmosphere.
[0069]
Then, the oxygen concentration meter 16 detects that the inside of the shielding container 10 has dropped to a predetermined oxygen concentration (S03), and the rotating body 2 is rotated at a predetermined rotation speed by driving the motor 17 (S04). On the other hand, a voltage is applied from the power supply 12 to the electron beam irradiation unit 11 (S05) to generate an electron beam (S06). At this time, the shutter member 22 is in the closed position, and the generation amount of the electron beam is controlled to be small.
[0070]
Next, the shutter member 22 at the closed position indicated by the broken line in FIG. 2 is moved in the sliding direction H ′ by operating the shutter drive mechanism 20 and driving the slider 23, thereby opening the opening 21a to the open position (S07). ), The amount of generation of the electron beam is controlled to be large, and the electron beam is applied to the surface of the rotating area 2a in the radial direction 2a (S08). Since the electron beam is irradiated in the radial direction of the rotating member 2 thus rotated, the entire surface of the rotating member 2 can be irradiated with the electron beam.
[0071]
Then, after the rotating member 2 is irradiated with the electron beam for a predetermined time, the shutter driving mechanism 20 is similarly operated to move the shutter member 22 in the sliding direction H to close the opening 21a to the closed position ( S09), the electron beam irradiation on the rotating body 2 ends.
[0072]
In addition, while the electron beam is being generated from the electron beam irradiation unit 11, the nitrogen gas from the nitrogen gas source 14 flows from the gas inlet 25 to the gas outlet 26 through the vicinity of the irradiation window 11a. Thereby (S10), it is possible to cool the irradiation window 11a whose temperature rises when an electron beam is generated, and also to cool the shutter member 22. The temperature near the irradiation window 11a is measured by the temperature sensor 24 and the temperature measurement device 13, and the flow rate of the nitrogen gas is controlled by the gas flow control valve 15 based on the measured temperature (S11). Thereby, the temperature near the irradiation window 11a can be controlled to a certain temperature or lower.
[0073]
As described above, according to the electron beam irradiation apparatus of FIGS. 1 to 4, the surface of the rotating object 2 is irradiated with the electron beam, so that the surface of the rotating object 2 is supplied with more energy than the ultraviolet light. The electron beam can be efficiently irradiated. Therefore, for example, a lubricating layer made of a material that is difficult to cure by ultraviolet irradiation can be easily cured.
[0074]
In addition, since an electron beam having an acceleration voltage of 20 to 100 kV is applied, the electron beam energy is efficiently applied to, for example, a resin layer in a thin range from the surface of the rotating body 2, and the electron beam is applied to a base material and the like located below the resin layer. And the deterioration of the base material can be prevented.
[0075]
Further, switching control between irradiation and non-irradiation of the electron beam can be easily executed by the shutter driving mechanism 20 and the shutter member 22.
[0076]
Further, the electron beam irradiation can be performed so that the integrated irradiation dose of the electron beam irradiation is distributed almost uniformly in the radial direction of the rotating body 2, and the irradiation surface of the rotating body 2 is uniformly uniformly irradiated with the electron beam. Since energy can be given by the wire, for example, the resin layer can be uniformly and efficiently cured.
[0077]
Next, a second arrangement example of the electron beam irradiation tubes 31, 32, 33 in the radial direction of FIG. 2 will be described with reference to FIG. FIG. 14A is a partial plan view schematically showing a second arrangement example of the electron beam irradiation tubes 31 to 33 with respect to the rotating body 2 in the electron beam irradiation apparatus 1, and FIG. 14B is a second arrangement example. FIG. 4 is a distribution diagram schematically showing an irradiation intensity distribution of an electron beam in FIG.
[0078]
As shown in FIG. 14A, the electron beam irradiation tubes 31, 32, and 33 have their center positions 31a, 32a, and 33a at the radial positions r11, r12, and r13 of the rotated body 2, and They are arranged so as to fit in the opening 21a of the disk 21 at substantially equal intervals in the direction. When the electron beam irradiation tubes 31, 32, and 33 are arranged in this manner, the irradiation beam intensity of the electron beam is substantially uniformly distributed in the radial direction r of the rotating body 2 as shown in FIG.
[0079]
In FIG. 14A, when the rotating body 2 rotates at a constant speed during electron beam irradiation, if the peripheral velocities at the radial positions r11, r12, and r13 of the rotating body 2 are v11, v12, and v13, respectively, the above equation ( As in 1) to (3), since r11 <r12 <r13, the relationship between the peripheral velocities v11, v12, and v13 is as shown in the following equation (4).
[0080]
v11 <v12 <v13 (4)
[0081]
As described above, in the rotating body 2 that rotates at a constant rotation speed, the peripheral speed differs as in Expression (4) depending on the radial position r of the surface of the rotating body 2, and as shown in FIG. Since the irradiation line intensity shows a substantially uniform distribution at the radial position, the integrated irradiation dose of the irradiation dose in the radial region 2a of the rotating body 2 is large on the inner peripheral side and smaller on the outer peripheral side. Therefore, the distribution of the integrated irradiation dose of the irradiation dose in the radial direction region 2a is controlled to be substantially uniform by configuring the shutter member as shown in FIG.
[0082]
FIG. 15 is a partial plan view similar to FIG. 14A showing a modification of the shutter member, and FIG. 17 is a plan view of the shutter member in FIG. As shown in FIGS. 15 and 17, the shutter member 28 is formed in a disk shape that can rotate in the opening direction R and the opposite closing direction R ′ about the rotation shaft 29, and has a substantially semicircular shape. It is notched, and has a notch 28b formed as shown by a broken line, and has an end 28a formed linearly. Note that the shutter member 28 may be substantially a three-quarter circle or the like as shown by a dashed line in FIG.
[0083]
The rotation shaft 29 of the shutter member 28 is located at an eccentric position with respect to the rotation center of the rotation target 2 (corresponding to the rotation shaft 3). Further, the shutter driving mechanism 20 includes a motor (not shown) that can rotate forward and reverse, and rotates the rotating shaft 29 in the opening direction R and the closing direction R ′ to move the shutter member 28 to open and close.
[0084]
The operation of the shutter member 28 by the shutter drive mechanism 20 will be described. First, the shutter member 28 covers the opening 21a at the closed position indicated by the solid line in FIG. 5, blocks the electron beam, and is in a state where the electron beam is not irradiated. When the shutter member 28 is rotated in the opening direction R about the rotation shaft 29 from this state, the opening 21a is gradually opened from the end 28a of the notch 28b.
[0085]
That is, when the shutter member 28 moves and its end 28a reaches the outer peripheral end 21b of the opening 21a, and passes the end position 41 (of the end 28a) indicated by a dashed line, the opening 21a is moved from the vicinity of the outer peripheral end 21b. open. Subsequently, the shutter member 28 opens the opening 21a from the outer peripheral side to the inner peripheral side while moving the end 28a as shown by the end positions 42, 43, and 44 shown by the dashed line in FIG. . Then, the shutter member 28 substantially opens the opening 21a at the end position 45.
[0086]
The rotation speed of the shutter member 28 that rotates as described above is set to be the same as or equal to the rotation speed of the rotating body 2 that rotates in the rotation direction S during electron beam irradiation. Therefore, the irradiation dose of the electron beam emitted while the shutter member 28 is rotating and opening the opening 21a cannot be ignored, but as described above, the opening 21a is directed from the outer side toward the inner side. The electron beam irradiation time in the radial region 2a of the rotating body 2 is relatively long on the outer circumference side and relatively short on the inner circumference side, so that the radius of the integrated irradiation dose of the electron beam irradiation as described above is increased. Non-uniform distribution in the direction can be corrected and relatively uniform.
[0087]
Further, when the shutter member 28 is rotated in a rotation direction R ′ opposite to the rotation direction R at the same rotation speed as when the shutter member 28 is opened as shown in FIG. The opening 21a is closed while moving to the end positions 45, 44, 43, 42, 41. At this time, since the opening 21a is first closed on the inner peripheral side and then gradually closed on the outer peripheral side, the electron beam irradiation time in the radial region 2a of the rotating body 2 is relatively long on the outer peripheral side and is relatively long on the inner peripheral side. Is relatively short. For this reason, the uneven distribution in the radial direction of the integrated irradiation dose of the electron beam irradiation can be further corrected and made relatively uniform.
[0088]
By appropriately adjusting the position of the rotating shaft 29 of the shutter member 28, the shape of the end portion 28a, the shape of the opening 21a, and the like, the distribution of the integrated irradiation dose of electron beam irradiation in the radial direction can be made more uniform. Further, the positions of the electron beam irradiation tubes 31 to 33 in FIG. 14A may be finely adjusted so as to make the distribution of the integrated irradiation dose of the electron beam irradiation more uniform.
[0089]
<Second embodiment>
[0090]
Next, a disk-shaped medium manufacturing apparatus according to a second embodiment will be described. FIG. 5 to FIG. 9 are side views of a manufacturing apparatus for explaining respective steps for forming a lubricating layer on a disk-shaped medium in the present embodiment.
[0091]
As shown in FIGS. 5 to 9, a disk-shaped medium manufacturing apparatus (hereinafter, simply referred to as “manufacturing apparatus”) 50 generates an electron beam at a low acceleration voltage of 20 to 100 kV and generates a disk-shaped medium. An electron beam irradiating device 1 for irradiating the surface of 49, a disc-shaped medium 49 before irradiation to the electron beam irradiating device 1, and a replacement chamber 52 for receiving the irradiated disk-shaped medium 49a from the electron beam irradiating device 1; A rotating portion 54 that is rotated by a rotating shaft 53 for exchanging the disk-shaped medium before irradiation with the disk-shaped medium after irradiation is provided in a hermetically sealable chamber 51.
[0092]
As shown in FIGS. 5 to 9, the manufacturing apparatus 50 further supplies a disk-shaped medium before irradiation to the exchange chamber 52 and transports the disk-shaped medium so as to discharge the disk-shaped medium after irradiation. 60 is provided.
[0093]
Since the electron beam irradiation apparatus 1 is configured substantially similarly to FIGS. 1 and 2, points different from FIGS. 1 and 2 will be described. That is, in FIG. 1, the shielding container 10 of FIG. 1 is provided with a lower rotating tray portion 10a for rotatably storing the disk-shaped medium 49, and an upper portion on which the electron irradiation unit 11, the shutter driving mechanism 20, and the like are provided. The rotating tray portion 10a is vertically movable and rotated by the rotating portion 54 with respect to the fixed portion 10b, and is movable to the replacement chamber 52 side.
[0094]
As shown in FIG. 5, a shielding portion 55 that shields the electron beam so that the electron beam does not leak outside is provided on the mating surface 10c of the rotating tray portion 10a and the mating surface 10c ′ of the fixed portion 10b. FIG. 10 is an enlarged sectional view showing the shielding portion 55. As shown in FIG. 10, a projection 55a is formed all around the mating surface 10c of the rotating tray portion 10a, and a concave portion 55b is formed so that the projection 55a can enter the mating surface 10c 'of the fixed portion 10b. Are formed all around.
[0095]
Further, a depression 55c is further formed at the bottom of the concave portion 55b constituting the shielding portion 55, and an O-ring 56a is accommodated in the depression 55c to form a sealing portion 56. The hermeticity of the hermetically sealed space 1a formed by combining the rotating tray portion 10a and the fixed portion 10b can be enhanced by the hermetically sealed portion 56.
[0096]
In FIG. 10, since the O-ring 56a of the sealing portion 56 is located in the recess 55c on the bottom side of the concave portion 55b, the electron beam is not directly irradiated, so that the deterioration of the O-ring 56a can be prevented.
[0097]
As shown in FIG. 5, the exchange chamber 52 is moved up and down and rotated by the rotation unit 54 to move to the electron beam irradiation apparatus 1 side and can be replaced with the rotation tray unit 10a. A transport rotation tray section 52b that rotates so as to receive the disk-shaped medium before irradiation by the device 60 and discharge the disk-shaped medium after irradiation to the outside.
[0098]
The chamber 51 has an end 51a and a connecting portion 51b that constitute a part of the replacement room 52. The end portion 51a and the connecting portion 51b are interposed between the rotation tray portion 52a and the transport rotation tray portion 52b of the replacement room 52 to form a mating surface, and a sealed space 52c is formed in the replacement room 52, The transport rotation tray portion 52b forms a part of the chamber 51.
[0099]
Further, a sealing portion 57 made of an O-ring is provided on a mating surface between the end portion 51a and the transport rotation tray portion 52b and a mating surface between the end portion 51b and the transport rotation tray portion 52b. Also, the same shielding portion 55 and sealing portion 56 as those in FIG. 10 are provided on the mating surface between the end portion 51a and the rotating tray portion 52a and on the mating surface between the connecting portion 51b and the rotating tray portion 52a. Have been.
[0100]
The chamber 51 is connected to the fixed portion 10b on the end side of the electron beam irradiation device 1, the connecting portion 51b is connected to the fixed portion 10b near the center, and the transport rotation tray portion 52b is connected to the end portion 51a and the connecting portion 51b. , So that the whole can be sealed. Further, the chamber 51, the transport rotation tray section 52b (62), the rotation tray section 10a, the fixed section 10b, etc. are made of steel or stainless steel, and shield the electron beam so that the electron beam does not leak outside. Has become.
[0101]
Nitrogen gas can be introduced into the chamber 51 from a nitrogen gas inlet 58, and the pressure in a sealed space 52 c in the replacement chamber 52 can be reduced by a vacuum device 59. As shown in FIG. 9, in a state where the entire chamber 51 is sealed, the rotating unit 54 moves downward together with the rotating tray units 10a and 52a in the figure, and when the sealed spaces 1a and 52c are opened, the replacement chamber 52 becomes Since the atmosphere is replaced with nitrogen gas, the inside of the chamber 51 does not affect the nitrogen gas atmosphere in the closed space 1 a of the electron beam irradiation apparatus 1.
[0102]
Further, nitrogen gas can be introduced into the replacement chamber 52 from the nitrogen gas inlet 59b. Further, the nitrogen gas in the chamber 51 can be discharged from the gas discharge port 58a.
[0103]
As shown in FIG. 5, the disk transport device 60 rotates another transport rotation tray portion 62 that can be replaced with the transport rotation tray portion 52 b that forms the exchange chamber 52, and rotates the transport rotation tray portions 52 b and 62. A rotation unit 64 configured to rotate via a shaft 63. Each of the transport rotation tray sections 52b and 62 has a suction section 61 that vacuum-adsorbs the disk medium 49 near the center hole of the disk medium 49. The rotating unit 64 transports the disk-shaped medium between the exchange chamber 52 and the external disk delivery unit 70 by vertical movement and rotation.
[0104]
The disk-shaped medium 49 supplied from the disk delivery unit 70 to the replacement chamber 52 has a light transmitting layer containing a resin material on its surface and a lubricating layer made of a lubricant formed thereon by an external spin coater or the like. I have.
[0105]
The material for forming the light transmitting layer is not particularly limited as long as it is an active energy ray-curable compound. At least one reactive group selected from (meth) acryloyl groups, vinyl groups and mercapto groups is used. It is preferred to have. In addition, a known photopolymerization initiator may be included.
[0106]
Examples of the material for forming the lubricating layer include, but are not limited to, a silicone compound having a radical polymerizable double bond and a fluorine compound. These lubricating layer forming materials are generally difficult to cure by ultraviolet rays when they do not contain a photopolymerization initiator, but can be instantaneously cured by electron beams.
[0107]
Next, the operation of the above-described manufacturing apparatus 50 will be described with reference to flowcharts of FIGS. 5 to 9 and FIG. 11 separately for the irradiation of the disk-shaped medium with the electron beam and the discharge and supply of the disk-shaped medium.
[0108]
<Electron beam irradiation on disk-shaped media>
[0109]
As shown in FIG. 11, first, as shown in FIG. 9, the entire chamber 51 is sealed, and the rotating shaft 53 and the rotating part 54 move downward together with the rotating tray parts 10a, 52a in the figure, and the closed space 1a, After opening 52c, nitrogen gas is introduced into the chamber 51 from the nitrogen gas inlet 58, and the inside is replaced with a nitrogen gas atmosphere (S21). At this time, the nitrogen gas can be replaced while the oxygen concentration in the chamber 51 is measured by the oxygen concentration meter 16.
[0110]
Next, when the rotating shaft 53 and the rotating portion 54 move upward together with the rotating tray portions 10a and 52a in the figure, the closed spaces 1a and 52c are formed as shown in FIG. Then, in the electron beam irradiation apparatus 1, the disk-shaped medium 49 is rotated by the motor 17 in the closed space 1a (S22), and the electron beam irradiation unit 11 is controlled to generate a predetermined amount of electron beams (S23). Nitrogen gas flows from the inlet 25 to the outlet 26 while passing near the irradiation window 11a.
[0111]
Next, as shown in FIG. 6, by opening the shutter member 22 by the shutter driving mechanism 20 (S24), a lubricating layer is formed on the light transmitting layer of the disk-shaped medium 49 rotating from the electron beam irradiation unit 11. The surface is irradiated with an electron beam (S25). After the electron beam irradiation is performed for a predetermined time as shown in FIG. 7, the shutter member 22 is closed by the shutter drive mechanism 20 as shown in FIG. 8 (S26), thereby terminating the electron beam irradiation on the surface of the disk-shaped medium 49. I do. Thus, a disk-shaped medium 49a having a lubricating layer fixed to the surface of the light transmission layer of the disk-shaped medium 49 can be obtained. This is presumably because the light-transmitting layer is cured and the reactive group of the lubricant bonds (cures) with the surface of the light-transmitting layer and the reactive group of another lubricant.
[0112]
<Discharge and supply of disk-shaped media>
[0113]
In a state where the sealed space 52c in the replacement room 52 is formed as shown in FIG. 5, as shown in FIG. 6, the sealed space 52c of the replacement room 52 in which the disk-shaped medium 49a after irradiation is located is opened by the opening valve 59c and It is opened to the atmosphere through the opening 59d (S30).
[0114]
Then, the disk transport device 60 moves the suction unit 61 on the side of the transport rotation tray unit 52b through the rotation shaft 63 and the rotation unit 64 downward in FIG. 6 to suction the disk-shaped medium 49a (S31). . At almost the same time, the disk-shaped medium 49 before irradiation with the lubricating layer formed on the surface of the external disk transfer unit 70 is sucked by the suction unit 61 on the side of another transport rotation tray unit 62 (S32).
[0115]
Next, as shown in FIG. 7, the disk transport device 60 moves the rotating shaft 63 and the rotating portion 64 upward in FIG. 7, thereby moving the disk-shaped medium 49a together with the suction portion 61 and the transport rotating tray portion 52b. The disc-shaped medium 49 is lifted from the disc transfer section 70 together with the suction section 61 and the transport turning tray section 62 at the same time as being lifted from the inside of the turning tray section 52a. Then, the position of the transport rotation tray units 52b and 62 is switched by the rotation of the rotation unit 64 about the rotation shaft 63 (S33).
[0116]
Next, as shown in FIG. 8, the disk transport device 60 moves the rotating shaft 63 and the rotating portion 64 downward in FIG. 7, so that the disk-shaped medium 49 is placed in the rotating tray portion 52a of the replacement chamber 52. It is stored (S34). On the other hand, the disk-shaped medium 49a is transferred to the disk delivery unit 70 (S35), and each suction unit 61 stops suctioning the disk-shaped media 49, 49a and moves upward in the drawing. The disc-shaped medium 49a is ejected from the disc delivery unit 70 to the outside (S36).
[0117]
Then, the pressure in the sealed space 52c in the replacement chamber 52 formed again as described above is reduced by the vacuum device 59, and nitrogen gas is introduced from the nitrogen gas inlet 59b to perform nitrogen gas replacement (S37).
[0118]
As described above, the irradiated disk-shaped medium 49a can be transported from the replacement chamber 52 to the disk delivery unit 70, and at the same time, the unirradiated disk-shaped medium 49 can be transported from the disk delivery unit 70 to the replacement chamber 52. The exchange of the disk-shaped medium 49 can be performed by one rotation of the rotation shaft 63 and the rotation part 64.
[0119]
The exchange of the disk-shaped media 49, 49a is performed during the electron beam irradiation in the electron beam irradiation apparatus 1 as shown in FIGS. 6 and 7, since the closed spaces 1a and 52c are independent. Can be efficient.
[0120]
Next, the operation of exchanging the disk-shaped medium between the exchange room 52 and the electron beam irradiation device 1 will be described. That is, as shown in FIG. 8 described above, the disk-shaped medium 49 before irradiation is accommodated in the rotating tray portion 52a of the replacement chamber 52, and in the electron beam irradiation apparatus 1, the rotation by the motor 17 is stopped (S38). The rotating shaft 53 and the rotating unit 54 move downward in the drawing in a state in which the disk-shaped medium 49a, to which the line irradiation has been completed, is accommodated in the rotating tray unit 10a, so that the rotating tray units 52a and 10a are moved. It moves downward to open the closed spaces 52c and 1a. At this time, since the inside of the sealed space 52c is replaced with a nitrogen gas atmosphere, there is no influence on other portions in the chamber 51.
[0121]
Next, as shown in FIG. 9, the position of the rotating tray portions 52a and 10a is switched by rotating the rotating portion 54 about the rotating shaft 53 in the chamber 51 (S39). As a result, the disc-shaped medium 49 before irradiation accommodated in the rotating tray 52a moves into the electron beam irradiation device 1 (S40), and almost simultaneously with this, the disc-shaped medium 49a accommodated in the rotating tray 10a. Moves into the replacement room 52 (S41).
[0122]
As described above, the exchange of the disk-shaped media 49, 49a between the exchange chamber 52 and the electron beam irradiation apparatus 1 can be performed by one rotation of the rotation shaft 53 and the rotation part 54. Then, as the rotating shaft 53 and the rotating portion 54 move upward in the figure, the rotating tray portions 52a and 10a are moved upward to form the closed spaces 52c and 1a again as shown in FIG. The line irradiation apparatus 1 returns to the above-described step S22, and the replacement room 52 returns to the above-described step S30, and the same operation can be repeated.
[0123]
Note that the rotating shaft 3 of the motor 17 is retracted downward from the rotating portion 54 and the rotating tray portion 10a when the rotating shaft 53 and the rotating portion 54 are rotated. Can rotate.
[0124]
As described above, according to the manufacturing apparatus 50 of FIGS. 5 to 9, the disk-shaped medium 49 having the lubricating layer or the like formed on the surface is rotated, and the acceleration voltage is set to 20 to 100 kV on the rotating disk-shaped medium. Since the electron beam is irradiated at a low accelerating voltage, the disk-shaped medium can be efficiently irradiated with an electron beam having energy larger than that of the ultraviolet light. As a result, the lubricating layer and the like can be formed instantaneously, and the productivity of the formation of the lubricating layer and the like is improved. As a result, the productivity of the disk-shaped medium can be improved.
[0125]
In the chamber 51 and in the disk transfer device 60, the rotating tray portion and the other rotating tray portion are interlocked with each other by one rotation so that the two rotating tray portions are exchanged with each other, so that the disk shape after irradiation can be obtained. Since the medium 49a can be discharged and the disk-shaped medium 49 before irradiation can be supplied and can be continuously and efficiently replaced, the productivity is improved.
[0126]
Further, since an electron beam with a low acceleration voltage of 20 to 100 kV is used, the electron beam energy is efficiently applied to a lubricating layer or the like in a thin range from the surface, and the influence of the electron beam on a base material below the lubricating layer. Do not give.
[0127]
Further, the electron beam irradiation can be performed so that the integrated irradiation dose of the electron beam irradiation is distributed almost uniformly in the radial direction of the rotating body 2, and the irradiation surface of the rotating body 2 is uniformly uniformly irradiated with the electron beam. Since the energy can be given by the wire, the lubricating layer can be uniformly and efficiently cured.
[0128]
Further, switching control of irradiation / non-irradiation of the electron beam can be easily executed by the shutter driving mechanism 20 and the shutter member 22. Further, since it is not necessary to control the power supply 12 of the electron beam irradiation unit 11 on / off, the electron beam irradiation unit is not required. 11 is unnecessary, the disk-shaped medium 49 is supplied to the electron beam irradiation apparatus 1 one after another, and continuous electron beam irradiation can be efficiently repeated, thereby improving the productivity.
[0129]
For example, electron beam irradiation tubes 31 to 33 (FIG. 2) for electron beam irradiation with a low acceleration voltage, which constitute the electron beam irradiation unit 11 of the electron beam irradiation device 1, are commercially available from Ushio Inc. For example, under conditions of an acceleration voltage of 50 KV and a tube current of 0.6 mA / tube, electron beam energy can be efficiently applied to a lubricating layer, a resin layer, and the like within a depth range of about 10 to 20 μm from the surface, and can be provided in less than 1 second. And can be cured instantaneously and efficiently. For example, not only the lubricating layer 93 of the optical disk as shown in FIG. 12, but also at least a portion of the light transmitting layer 92 which is in contact with the lubricating layer 93 can be cured at the same time. In addition, for example, in the optical disk shown in FIG. 12, since the electron beam does not reach the base material 90 below the lubrication layer 93, the base material 90 made of a resin material such as polycarbonate is not damaged, and discoloration, deformation, and deterioration are not caused. No adverse effects such as
[0130]
A window material constituting each irradiation window of each of the electron beam irradiation tubes 31, 32, and 33 is preferably a silicon thin film having a thickness of about 3 μm, and is accelerated by a low acceleration voltage of 100 kV or less which cannot be taken out by a conventional irradiation window. The extracted electron beam can be taken out.
[0131]
Note that, in this specification, “rotation” does not mean that the rotated body continuously rotates in one direction (or the opposite direction) as in the case of rotation, but rotates by a predetermined amount in one direction or the opposite direction. Therefore, it means to stop and then turn to change its position. Further, the "radial direction" of the rotating body means a direction extending radially from the rotation center of the rotating body and a direction extending from the point eccentric to the rotation center of the rotating body to the outer periphery of the rotating body.
[0132]
As described above, the present invention has been described with the embodiments, but the present invention is not limited to these, and various modifications can be made within the technical idea of the present invention. For example, in the apparatus for manufacturing a disk-shaped medium according to the present embodiment, an example has been described in which a light-transmitting layer and a lubricating layer made of the above-described materials are hardened and formed near the surface of a disk-shaped medium such as an optical disk. The present invention is not limited to this, and it goes without saying that the present invention may be applied to curing a resin layer other than the lubricating layer. For example, the present invention may be applied to form only the light transmitting layer 92 under the lubricating layer 93 in FIG. 12, which can be cured instantaneously, is efficient, and contributes to an improvement in productivity.
[0133]
The rotating object to which the electron beam irradiating apparatus 1 can irradiate an electron beam may be various disk-like bodies, and the disk-like body that can be manufactured by the manufacturing apparatus 50 is a disk-like medium such as an optical disk. Although described as an example, it is needless to say that the present invention can be applied to a case where various resin layers are formed on a disk-shaped body other than a medium.
[0134]
In the electron beam irradiation apparatus of FIG. 1 and the manufacturing apparatuses of FIGS. 5 to 9, the tube of the electron beam irradiation tube of the electron beam irradiation unit 11 is considered in consideration of the layer thickness on the surface to be irradiated with the electron beam. It is preferable to determine the voltage and the like. Further, the number of electron beam irradiation tubes constituting the electron beam irradiation unit 11 can be appropriately increased or decreased according to the size or area of the surface to be irradiated.
[0135]
The gas for replacing the atmosphere in the chamber or the electron beam irradiation apparatus is not limited to nitrogen gas, but may be argon gas, helium gas, CO2 gas, or the like. ₂ And the like, or a mixture of two or more of these.
[0136]
FIG. 16A shows another example of the arrangement of the electron beam irradiation tubes 31 to 33 in FIG. As shown in FIG. 16A, the position of the electron beam irradiation tube 33 in FIG. 13A in the radial direction is shifted to the inner peripheral side of the electron beam irradiation tube 32 to irradiate the electron beam as shown in FIG. It may be a quantity intensity distribution.
[0137]
Further, in the present embodiment, the number of electron beam irradiation tubes is three, but may be one or two, or four or more, and the arrangement of the electron beam irradiation tubes in the radial direction. By adjusting the interval, a necessary electron beam irradiation intensity distribution can be obtained.
[0138]
【The invention's effect】
ADVANTAGE OF THE INVENTION According to this invention, a to-be-rotated body, such as a disk-shaped object, can be efficiently irradiated with an electron beam, For example, the material which is hard to harden by ultraviolet irradiation can be easily hardened. An electron beam irradiation apparatus and an electron beam irradiation method that can easily perform irradiation switching can be provided.
[0139]
In addition, it is possible to easily switch between irradiation and non-irradiation of an electron beam, and to efficiently form a lubricating layer, a resin layer, and the like made of a material that is difficult to cure by ultraviolet irradiation on the disk. Can be provided.
[Brief description of the drawings]
FIG. 1 is a side sectional view schematically showing an electron beam irradiation apparatus according to a first embodiment.
FIG. 2 is a plan view schematically showing a shutter member and a shutter driving mechanism of the electron beam irradiation device of FIG.
FIG. 3 is a block diagram showing a control system of the electron beam irradiation apparatus of FIG.
FIG. 4 is a flowchart showing an operation of the electron beam irradiation apparatus of FIG.
FIG. 5 is a side sectional view schematically showing an apparatus for manufacturing a disk-shaped medium according to a second embodiment, illustrating a step immediately before electron beam irradiation for forming a lubricating layer and the like on the disk-shaped medium. FIG.
FIG. 6 is a side sectional view similar to FIG. 5, illustrating an electron beam irradiation for forming a lubricating layer and the like on the disk-shaped medium and a process of replacing the disk-shaped medium with the outside.
FIG. 7 is a side sectional view similar to FIG. 5, illustrating electron beam irradiation for forming a lubricating layer and the like on a disk-shaped medium and a process of replacing the disk-shaped medium with the outside.
FIG. 8 is a side sectional view similar to FIG. 5, showing a preparation process of a replacement process inside a disc-shaped medium for forming a lubricating layer or the like on the disc-shaped medium (decompression, replacement of nitrogen gas, etc. in the replacement chamber); FIG.
FIG. 9 is a side sectional view similar to FIG. 5, illustrating a replacement process inside a disk-shaped medium for forming a lubricating layer and the like on the disk-shaped medium.
FIG. 10 is an enlarged sectional view showing a shielding portion 55 in the manufacturing apparatus of FIGS. 5 to 9;
11 is a flowchart showing steps of irradiating the disk-shaped medium with an electron beam and steps of discharging and supplying the disk-shaped medium in the manufacturing apparatus of FIGS. 5 to 9;
FIG. 12 is a diagram illustrating an example of a layer configuration of an optical disc that can be manufactured by the manufacturing apparatus of FIGS. 5 to 9;
13A is a partial plan view schematically showing a first arrangement example of an electron beam irradiation tube with respect to a rotating body in the electron beam irradiation apparatus 1, and FIG. 13B is a first arrangement example. FIG. 4 is a distribution diagram schematically showing an irradiation intensity distribution of an electron beam in FIG.
14A is a partial plan view schematically showing a second example of the arrangement of electron beam irradiation tubes 31 to 33 with respect to the rotating body 2 in the electron beam irradiation apparatus 1, and FIG. FIG. 9 is a distribution diagram schematically showing an irradiation intensity distribution of an electron beam in an arrangement example 2;
FIG. 15 is a partial plan view similar to FIG. 14A showing a modified example of a shutter member which is preferably applied to a case having an electron beam irradiation intensity distribution as shown in FIG. 14B.
16A is a partial plan view showing a modification of the first arrangement example of the electron beam irradiation tube with respect to the rotating body in the electron beam irradiation apparatus 1, and FIG. 16B is an electron beam in the modification example. FIG. 4 is a distribution diagram schematically showing an irradiation intensity distribution of FIG.
FIG. 17 is a plan view of the shutter member of FIG.
[Explanation of symbols]
1. Electron beam irradiation device
2 ... Rotated object
10 ... shielding container
11 ... Electron beam irradiation unit
11a ・ ・ ・ irradiation window
12 Power supply
13 ・ ・ ・ Temperature measuring device
24 ・ ・ ・ Temperature sensor
14 ... Nitrogen gas source
15 ... Gas flow control valve
16 ... oxygen concentration meter
17 ... motor (rotation drive unit)
18 ・ ・ ・ Vacuum device
20 Shutter drive mechanism
21 ・ ・ ・ Disc
21a ... opening
22 Shutter member
28 Shutter member
29 ・ ・ ・ Rotating axis
30 ... Control unit
31-33 ... Electron beam irradiation tube
50.. Disk manufacturing device
10a: Rotating tray section
10b ... fixed part
51 ... chamber
52 ・ ・ ・ Replacement room
52a: Rotating tray section
52b: transport rotation tray section
53 ... rotating shaft
54 ... rotating part
55 ・ ・ ・ Shielding part
56 ... sealed part
59 ・ ・ ・ Vacuum equipment
60 ・ ・ ・ Disk transport device
62: Rotating tray
70 · · · disk delivery section
92: Light transmitting layer (resin layer)
93 ... lubrication layer

Claims (28)

A rotation drive unit that rotationally drives the rotated body,
A shielding container that rotatably houses the rotated object,
An electron beam irradiator provided in the shielding container so that an electron beam is irradiated from the irradiation window on the surface of the rotating object,
A shutter member that is arranged between the irradiation window and the surface of the rotated body, and that can be moved between an open position that opens to transmit an electron beam from the irradiation window and a closed position that closes to block.
An electron beam irradiation apparatus comprising: a shutter driving mechanism that moves the shutter member so as to switch between irradiation and non-irradiation of the electron beam during rotation of the rotating member. The electron beam irradiation apparatus according to claim 1, wherein the electron beam irradiation unit generates an electron beam having an acceleration voltage of 20 to 100 kV. While the inside of the shielding container is an inert gas atmosphere,
The electron beam irradiation apparatus according to claim 1, wherein a gas inlet and a gas outlet are provided in the shielding container so that the inert gas flows near the irradiation window. The electron beam irradiation apparatus according to claim 3, wherein a temperature sensor is provided near the irradiation window, and a flow rate of the inert gas is adjusted based on a temperature measured by the temperature sensor. The electron beam irradiation apparatus according to any one of claims 1 to 4, further comprising an oxygen concentration meter for measuring an oxygen concentration in the shielding container. The electron beam irradiation apparatus according to claim 1, further comprising a vacuum device for reducing the pressure in the shielding container. The electron beam according to any one of claims 1 to 6, wherein the shielding container is openable and closable, is made of a metal material, and has a shielding structure for shielding an electron beam from the irradiation window. Irradiation device. 8. The device according to claim 1, wherein the rotator has a disk shape, and irradiates an electron beam from the irradiation window to a region extending in a radial direction of the surface. 9. Electron beam irradiation equipment. The electron beam irradiation apparatus according to claim 8, wherein the electron beam irradiation unit includes a plurality of electron beam irradiation tubes arranged in the radial direction. The electron beam irradiation apparatus according to claim 9, wherein the plurality of electron beam irradiation tubes are arranged so that the distribution of irradiation intensity of the electron beam in the radial direction is substantially uniform. 11. The method according to claim 10, wherein the time of the electron beam irradiation is controlled according to a radial position of the rotating body so that an integrated irradiation dose by the electron beam irradiation becomes substantially equal in the radial direction. Electron beam irradiation device. 12. The electron beam irradiation apparatus according to claim 10, wherein when the shutter member opens, the shutter member starts to open at an outer peripheral position on the surface of the rotating body and gradually opens to an inner peripheral position. An opening is provided to extend in the radial direction, and the opening and closing of the opening is performed by moving the shutter member to switch between irradiation and non-irradiation of the electron beam, and a relative position between the shutter member and the opening. The electron beam irradiation apparatus according to any one of claims 10 to 12, wherein a time of the electron beam irradiation is controlled in accordance with a radial position of the rotating member by a moving speed of the shutter member. The said plurality of electron beam irradiation tubes are arranged so that the irradiation beam intensity of the said electron beam in the said radial direction may become distribution which becomes large on an outer peripheral side and becomes small on an inner peripheral side. Electron beam irradiation equipment. 15. The electron beam irradiation apparatus according to claim 14, wherein the shutter member is configured to be opened and closed at a relatively high speed higher than a rotation speed of the rotating body. An opening is provided so as to extend in the radial direction, and irradiation and non-irradiation of the electron beam are switched by opening and closing the opening by movement of the shutter member. The electron beam irradiation apparatus according to any one of claims 15 to 15. Rotationally driving a rotatable body accommodated in a sealable shielding container,
Irradiating an electron beam from the irradiation window to a rotating surface of the rotated object by moving a shutter member provided between the surface of the rotated object and the irradiation window of the electron beam irradiation unit;
Stopping the electron beam irradiation by interrupting the electron beam by moving the shutter member after the electron beam irradiation for a predetermined time. 18. The method according to claim 17, wherein the electron beam irradiation unit has an acceleration voltage of 20 to 100 kV. 19. The electron beam irradiation method according to claim 17, wherein the inside of the shielding container is decompressed and then an inert gas is introduced to replace the atmosphere with an inert gas atmosphere. 21. The electron beam irradiation method according to claim 20, wherein the vicinity of the irradiation window is cooled by flowing the inert gas from a gas inlet toward a gas outlet through the vicinity of the irradiation window. The electron beam irradiation method according to any one of claims 17 to 20, wherein the rotating member has a disk shape, and irradiates an electron beam to a region extending in a radial direction of the surface from the irradiation window. The electron beam irradiation method according to claim 21, wherein the electron beam irradiation is performed by a plurality of electron beam irradiation tubes arranged in the radial direction as the electron beam irradiation unit. The plurality of electron beam irradiation tubes are arranged so that the distribution of irradiation intensity of the electron beam in the radial direction is substantially uniform,
23. The electron beam irradiation time according to claim 22, wherein the electron beam irradiation time is controlled according to a radial position of the rotating body so that a distribution of an integrated irradiation dose by the electron beam irradiation becomes substantially uniform in the radial direction. Electron beam irradiation method. 24. The electron beam irradiation method according to claim 23, wherein the time is controlled by gradually opening the shutter member at an outer peripheral position on the surface of the rotating member to an inner peripheral position. 23. The method according to claim 22, wherein the plurality of electron beam irradiation tubes are arranged such that the irradiation beam intensity of the electron beam in the radial direction has a distribution such that the irradiation beam intensity is large on an outer peripheral side and smaller on an inner peripheral side. Electron beam irradiation method. 26. The electron beam irradiation method according to claim 25, wherein the shutter member is opened and closed at a relatively high speed higher than the rotation speed of the rotating body. 17. The electron beam irradiation apparatus according to claim 1, wherein the rotating body is a disk-shaped body, and a layer having lubricity and / or a resin layer formed thereon is provided with the electron beam. An apparatus for manufacturing a disk-shaped body, wherein the apparatus is configured to be cured by irradiation. The electron beam irradiation apparatus according to any one of claims 1 to 16, or the method using the electron beam irradiation method according to any one of claims 17 to 26, wherein the object to be rotated is formed in a disk shape. A method for manufacturing a disk-shaped body, comprising: curing a layer having lubricity and / or a resin layer formed thereon by the electron beam irradiation.

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