JP2004086188A5 - - Google Patents
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- JP2004086188A5 JP2004086188A5 JP2003185174A JP2003185174A JP2004086188A5 JP 2004086188 A5 JP2004086188 A5 JP 2004086188A5 JP 2003185174 A JP2003185174 A JP 2003185174A JP 2003185174 A JP2003185174 A JP 2003185174A JP 2004086188 A5 JP2004086188 A5 JP 2004086188A5
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- JP
- Japan
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003185174A JP4328570B2 (en) | 2002-06-28 | 2003-06-27 | Resist composition and pattern forming method using the same |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002190581 | 2002-06-28 | ||
| JP2003185174A JP4328570B2 (en) | 2002-06-28 | 2003-06-27 | Resist composition and pattern forming method using the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004086188A JP2004086188A (en) | 2004-03-18 |
| JP2004086188A5 true JP2004086188A5 (en) | 2006-06-15 |
| JP4328570B2 JP4328570B2 (en) | 2009-09-09 |
Family
ID=32071827
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003185174A Expired - Fee Related JP4328570B2 (en) | 2002-06-28 | 2003-06-27 | Resist composition and pattern forming method using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4328570B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005274594A (en) * | 2004-03-22 | 2005-10-06 | Canon Inc | Photosensitive resin composition and method for forming resist pattern |
| JP4474256B2 (en) | 2004-09-30 | 2010-06-02 | 富士フイルム株式会社 | Resist composition and pattern forming method using the same |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60203629A (en) * | 1984-03-29 | 1985-10-15 | Toshiba Corp | Photo-polymerizable epoxy resin composition |
| CA2187046A1 (en) * | 1996-10-03 | 1998-04-03 | Alain Vallee | Sulfonylimides and sulfonylmethylides, use thereof as photoinitiators |
| JP3632395B2 (en) * | 1997-09-03 | 2005-03-23 | Ｊｓｒ株式会社 | Radiation sensitive resin composition |
| JP4132642B2 (en) * | 1999-11-15 | 2008-08-13 | 東京応化工業株式会社 | Negative resist substrate and method of manufacturing ion implantation substrate using the same |
| JP4253427B2 (en) * | 2000-09-19 | 2009-04-15 | 富士フイルム株式会社 | Positive resist composition |
| EP1308781A3 (en) * | 2001-10-05 | 2003-09-03 | Shipley Co. L.L.C. | Cyclic sulfonium and sulfoxonium photoacid generators and photoresists containing them |
| JP2003177543A (en) * | 2002-09-30 | 2003-06-27 | Oki Electric Ind Co Ltd | Resist pattern forming method |
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2003
- 2003-06-27 JP JP2003185174A patent/JP4328570B2/en not_active Expired - Fee Related