JP2004034175A5 - - Google Patents

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Publication number
JP2004034175A5
JP2004034175A5 JP2002191402A JP2002191402A JP2004034175A5 JP 2004034175 A5 JP2004034175 A5 JP 2004034175A5 JP 2002191402 A JP2002191402 A JP 2002191402A JP 2002191402 A JP2002191402 A JP 2002191402A JP 2004034175 A5 JP2004034175 A5 JP 2004034175A5
Authority
JP
Japan
Prior art keywords
grooves
polishing
recesses
formed uniformly
polishing surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002191402A
Other languages
Japanese (ja)
Other versions
JP3849593B2 (en
JP2004034175A (en
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2002191402A external-priority patent/JP3849593B2/en
Priority to JP2002191402A priority Critical patent/JP3849593B2/en
Priority to EP03012509A priority patent/EP1369204B1/en
Priority to DE60308946T priority patent/DE60308946T2/en
Priority to US10/449,196 priority patent/US20040014413A1/en
Priority to TW092114938A priority patent/TWI250572B/en
Priority to KR1020030035237A priority patent/KR100669301B1/en
Priority to CNB031406815A priority patent/CN100492597C/en
Publication of JP2004034175A publication Critical patent/JP2004034175A/en
Publication of JP2004034175A5 publication Critical patent/JP2004034175A5/ja
Publication of JP3849593B2 publication Critical patent/JP3849593B2/en
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

研磨面側等に開口する凹部等の各々の平面形状、平面方向の最小寸法、深さ等は同じであってもよいし、変化していてもよい。また、この凹部等は研磨面の全面に均等な間隔で形成されていてもよいし、均等に形成されていなくてもよいが、安定した研磨を行うためには均等に形成されていることが好ましい。更に、研磨パッドは凹部等以外にも各種形状の溝を備えることができる。この溝としては、環状の溝（同心円状の溝）、格子状の溝、螺旋状の溝等が挙げられる。
The planar shape of each of the recesses and the like opened on the polishing surface side and the like, the minimum dimension in the planar direction, the depth and the like may be the same or may be changed. Also, the recesses and the like may be formed on the entire surface of the polishing surface at equal intervals, or may not be formed uniformly, but in order to perform stable polishing, they should be formed uniformly. preferable. Furthermore, the polishing pad can be provided with grooves of various shapes in addition to the recess and the like. Examples of the grooves include annular grooves (concentric grooves), lattice grooves, spiral grooves, and the like .

JP2002191402A 2002-06-03 2002-06-28 Polishing pad and multilayer polishing pad Expired - Fee Related JP3849593B2 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2002191402A JP3849593B2 (en) 2002-06-28 2002-06-28 Polishing pad and multilayer polishing pad
TW092114938A TWI250572B (en) 2002-06-03 2003-06-02 Polishing pad and multi-layer polishing pad
DE60308946T DE60308946T2 (en) 2002-06-03 2003-06-02 Polishing pad and method of making a polishing pad
US10/449,196 US20040014413A1 (en) 2002-06-03 2003-06-02 Polishing pad and multi-layer polishing pad
EP03012509A EP1369204B1 (en) 2002-06-03 2003-06-02 Polishing pad and process for manufacturing a polishing pad
KR1020030035237A KR100669301B1 (en) 2002-06-03 2003-06-02 Polishing Pad and Multi-Layer Polishing Pad
CNB031406815A CN100492597C (en) 2002-06-03 2003-06-03 Polishing mattress and its manufacture and usage method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002191402A JP3849593B2 (en) 2002-06-28 2002-06-28 Polishing pad and multilayer polishing pad

Publications (3)

Publication Number Publication Date
JP2004034175A JP2004034175A (en) 2004-02-05
JP2004034175A5 true JP2004034175A5 (en) 2005-05-26
JP3849593B2 JP3849593B2 (en) 2006-11-22

Family

ID=31700989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002191402A Expired - Fee Related JP3849593B2 (en) 2002-06-03 2002-06-28 Polishing pad and multilayer polishing pad

Country Status (1)

Country Link
JP (1) JP3849593B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5105391B2 (en) * 2005-06-15 2012-12-26 ニッタ・ハース株式会社 Polishing pad
JP5132830B2 (en) * 2012-06-28 2013-01-30 ニッタ・ハース株式会社 Polishing pad
EP3049215B1 (en) 2013-09-25 2021-04-14 3M Innovative Properties Company Composite ceramic abrasive polishing solution
KR102252673B1 (en) * 2013-09-25 2021-05-18 쓰리엠 이노베이티브 프로퍼티즈 컴파니 Multi-layered polishing pads

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